JP6162145B2 - 自己組織化可能な重合体及びリソグラフィにおける使用方法 - Google Patents
自己組織化可能な重合体及びリソグラフィにおける使用方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/107—Post-treatment of applied coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/007—After-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- Health & Medical Sciences (AREA)
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- Polymers & Plastics (AREA)
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- General Chemical & Material Sciences (AREA)
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Description
[0001] 本出願は、参照することによりその全体が本明細書に組み込まれる2012年1月13日に出願された米国特許仮出願第61/586,419号の利益を主張する。
自己組織化可能なブロック共重合体の層を有する基板を提供することであって、ブロック共重合体は、親水性ブロック及び疎水性ブロックを含む分子を有し、層は外表面を有する、提供することと、
層の外表面上に第1界面活性剤を堆積させることであって、第1界面活性剤が、疎水性尾部及び親水性頭部基を有する分子を有し、親水性頭部基は、第1界面活性剤をブロック共重合体の親水性ブロックに吸着させるように適合された、堆積させることと、
自己組織化可能なブロック共重合体の自己組織化を引き起こして、基板上の層から自己組織化可能なブロック共重合体の秩序アレイを形成するために、層を処理することと、を含む、方法が提供される。
第1界面活性剤、ブロック共重合体、及び溶媒を含む液体組成物の膜を基板上に堆積させることと、
溶媒を蒸発により除去して、自己組織化可能なブロック共重合体の層を形成することと、によって成されてもよく、
第1界面活性剤は、ブロック共重合体に対して不混和であり、溶媒が除去される時に、外表面に向けて移動し、かつ外表面上に堆積させられる。
Claims (16)
- 基板上に自己組織化可能なブロック共重合体の秩序アレイを形成する方法であって、
自己組織化可能なブロック共重合体の層を有する基板を提供することであって、前記ブロック共重合体は親水性ブロック及び疎水性ブロックを含む分子を有し、前記層は外表面を有することと、
前記層の前記外表面上に第1界面活性剤を堆積させることであって、前記第1界面活性剤が、疎水性尾部及び親水性頭部基を有する分子を有し、前記親水性頭部基は、前記ブロック共重合体の前記親水性ブロックに前記第1界面活性剤を吸着させることと、
前記自己組織化可能なブロック共重合体の自己組織化を引き起こして、前記基板上の前記層から前記自己組織化可能なブロック共重合体の前記秩序アレイを形成するために前記層を処理することと、を含み、
前記第1界面活性剤の前記疎水性尾部基及び前記親水性頭部基は、開裂可能な連結基によって結合され、該方法は、前記自己組織化可能なブロック共重合体の自己組織化を引き起こすために前記層を処理した後に、前記開裂可能な連結基を開裂することと、開裂に続いて前記疎水性尾部基を除去することをさらに含む、方法。 - 前記第1界面活性剤は、前記ブロック共重合体の分子量の20%以下の分子量を有する、請求項1に記載の方法。
- 前記親水性頭部基は、前記ブロック共重合体の前記親水性ブロックの1つ又は複数の単量体と同じ1つ又は複数の単量体の低重合体部分である、請求項1又は2に記載の方法。
- 前記第1界面活性剤の前記疎水性尾部基は前記ブロック共重合体の前記疎水性ブロックに対して不混和である、請求項1〜3のいずれかに記載の方法。
- 前記第1界面活性剤の前記疎水性尾部基は過フッ素化部分を含む、請求項4に記載の方法。
- 前記第1界面活性剤の前記疎水性尾部基はポリジメチルシロキサン部分を含む、請求項4に記載の方法。
- 前記第1界面活性剤は、溶媒及び前記第1界面活性剤を含む液体組成物から吸着により前記外表面上に堆積させられる、請求項1〜6のいずれかに記載の方法。
- 前記第1界面活性剤は、前記液体組成物からラングミュアーブロジェット堆積法により前記外表面上に堆積させられる、請求項7に記載の方法。
- 前記第1界面活性剤は、気相から蒸着により前記外表面上に堆積させられる、請求項1〜6のいずれかに記載の方法。
- 前記第1界面活性剤は、コンタクトプリンティングにより前記外表面上に堆積させられる、請求項1〜6のいずれかに記載の方法。
- 前記第1界面活性剤、前記ブロック共重合体、及び溶媒を含む液体組成物の膜を前記基板上に堆積させることと、
前記溶媒を蒸発により除去して、自己組織化可能なブロック共重合体の前記層を形成することと、によって、前記自己組織化可能なブロック共重合体の前記層を前記基板上に提供することを含み、
前記第1界面活性剤は、前記ブロック共重合体に対して不混和であり、前記溶媒が除去される時に、前記外表面に向けて移動し、かつ前記外表面上に堆積させられる、請求項1〜6のいずれかに記載の方法。 - 前記第1界面活性剤の分子の前記疎水性尾部同士は互いに架橋結合するように適合され、前記第1界面活性剤の前記外表面上への堆積に続き、前記疎水性尾部は互いに架橋結合される、請求項1〜11のいずれかに記載の方法。
- 前記層の前記外表面上に前記第1界面活性剤を堆積させることは、前記外表面上に第2界面活性剤を堆積させることを含み、前記第2界面活性剤は、前記第2界面活性剤を前記ブロック共重合体の疎水性ブロックに吸着させる第2頭部基と、前記ブロック共重合体の前記親水性ブロック及び前記疎水性ブロックのいずれに対しても不混和である第2尾部基と、を有する、請求項1〜12のいずれかに記載の方法。
- 前記第1界面活性剤の前記尾部基と前記第2界面活性剤の前記尾部基とは化学的に同一である、請求項13に記載の方法。
- レジストエッチングによって基板の表面をパターニングするリソグラフィ方法であって、請求項1〜14のいずれかに記載の方法によって前記基板の前記表面上に自己組織化可能なブロック共重合体の秩序アレイを提供することを含み、自己組織化可能なブロック共重合体層の前記秩序アレイはレジスト層として使用される、リソグラフィ方法。
- 基板の表面にデバイストポグラフィを形成する方法であって、前記基板をエッチングして前記デバイストポグラフィを提供する際に、請求項1〜14のいずれかに記載の方法によって前記基板上に形成される自己組織化可能なブロック共重合体の秩序アレイをレジスト層として使用することを含む、デバイストポグラフィを形成する方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US201261586419P | 2012-01-13 | 2012-01-13 | |
US61/586,419 | 2012-01-13 | ||
PCT/EP2012/075989 WO2013104499A1 (en) | 2012-01-13 | 2012-12-18 | Self-assemblable polymer and methods for use in lithography |
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JP2015510258A JP2015510258A (ja) | 2015-04-02 |
JP6162145B2 true JP6162145B2 (ja) | 2017-07-12 |
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US (1) | US20140346141A1 (ja) |
JP (1) | JP6162145B2 (ja) |
KR (1) | KR102018771B1 (ja) |
CN (1) | CN104053628B (ja) |
NL (1) | NL2010004A (ja) |
WO (1) | WO2013104499A1 (ja) |
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US8999623B2 (en) | 2013-03-14 | 2015-04-07 | Wiscousin Alumni Research Foundation | Degradable neutral layers for block copolymer lithography applications |
US9382444B2 (en) * | 2013-06-24 | 2016-07-05 | Dow Global Technologies Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
JP6232226B2 (ja) * | 2013-08-09 | 2017-11-15 | 東京応化工業株式会社 | 相分離構造を含む構造体の製造方法 |
US9574107B2 (en) | 2015-02-16 | 2017-02-21 | International Business Machines Corporation | Fluoro-alcohol additives for orientation control of block copolymers |
US9738765B2 (en) * | 2015-02-19 | 2017-08-22 | International Business Machines Corporation | Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers |
US10259907B2 (en) | 2015-02-20 | 2019-04-16 | Az Electronic Materials (Luxembourg) S.À R.L. | Block copolymers with surface-active junction groups, compositions and processes thereof |
US9633847B2 (en) * | 2015-04-10 | 2017-04-25 | Tokyo Electron Limited | Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition |
WO2018008481A1 (ja) * | 2016-07-07 | 2018-01-11 | Jsr株式会社 | パターン形成用組成物及びパターン形成方法 |
EP3454121A1 (en) * | 2017-09-06 | 2019-03-13 | IMEC vzw | Method for manufacturing a mask |
CN110556297A (zh) * | 2019-08-02 | 2019-12-10 | 复旦大学 | 一种10纳米以下硅基鳍式场效应晶体管的制备方法 |
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US5643864A (en) * | 1994-08-19 | 1997-07-01 | Rhone-Poulenc, Inc. | Anionic surfactants having multiple hydrophobic and hydrophilic groups |
JPH10286515A (ja) * | 1997-04-17 | 1998-10-27 | Canon Inc | 薄膜の形成方法 |
US6790775B2 (en) * | 2002-10-31 | 2004-09-14 | Hewlett-Packard Development Company, L.P. | Method of forming a through-substrate interconnect |
JP4321706B2 (ja) * | 2003-09-25 | 2009-08-26 | 大日本印刷株式会社 | 積層体およびその製造方法 |
JP4997765B2 (ja) * | 2003-12-04 | 2012-08-08 | 旭硝子株式会社 | 含フッ素化合物、撥水性組成物および薄膜 |
US20070126001A1 (en) * | 2005-12-05 | 2007-06-07 | Sung-Yool Choi | Organic semiconductor device and method of fabricating the same |
US7347953B2 (en) | 2006-02-02 | 2008-03-25 | International Business Machines Corporation | Methods for forming improved self-assembled patterns of block copolymers |
US8361337B2 (en) * | 2007-03-19 | 2013-01-29 | The University Of Massachusetts | Method of producing nanopatterned templates |
US7959975B2 (en) * | 2007-04-18 | 2011-06-14 | Micron Technology, Inc. | Methods of patterning a substrate |
US8999492B2 (en) | 2008-02-05 | 2015-04-07 | Micron Technology, Inc. | Method to produce nanometer-sized features with directed assembly of block copolymers |
US8133341B2 (en) * | 2008-04-01 | 2012-03-13 | Wisconsin Alumni Research Foundation | Molecular transfer printing using block copolymers |
US7713753B2 (en) | 2008-09-04 | 2010-05-11 | Seagate Technology Llc | Dual-level self-assembled patterning method and apparatus fabricated using the method |
EP2199855B1 (en) * | 2008-12-19 | 2016-07-20 | Obducat | Methods and processes for modifying polymer material surface interactions |
NL2005865A (en) * | 2010-02-16 | 2011-08-17 | Asml Netherlands Bv | Imprint lithography. |
US8336003B2 (en) * | 2010-02-19 | 2012-12-18 | International Business Machines Corporation | Method for designing optical lithography masks for directed self-assembly |
US8822139B2 (en) * | 2010-04-14 | 2014-09-02 | Asml Netherlands B.V. | Method for providing an ordered layer of self-assemblable polymer for use in lithography |
US9233840B2 (en) * | 2010-10-28 | 2016-01-12 | International Business Machines Corporation | Method for improving self-assembled polymer features |
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KR20140123529A (ko) | 2014-10-22 |
NL2010004A (en) | 2013-07-16 |
US20140346141A1 (en) | 2014-11-27 |
KR102018771B1 (ko) | 2019-09-05 |
JP2015510258A (ja) | 2015-04-02 |
CN104053628B (zh) | 2017-10-13 |
CN104053628A (zh) | 2014-09-17 |
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