JP6144236B2 - 基板処理方法、記憶媒体及び基板処理装置 - Google Patents

基板処理方法、記憶媒体及び基板処理装置 Download PDF

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JP6144236B2
JP6144236B2 JP2014128586A JP2014128586A JP6144236B2 JP 6144236 B2 JP6144236 B2 JP 6144236B2 JP 2014128586 A JP2014128586 A JP 2014128586A JP 2014128586 A JP2014128586 A JP 2014128586A JP 6144236 B2 JP6144236 B2 JP 6144236B2
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JP2016009727A (ja
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俣 雄 亮 二
俣 雄 亮 二
川 俊 行 塩
川 俊 行 塩
ピーター ディーエリア
ピーター ディーエリア
山 司 平
山 司 平
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Tokyo Electron Ltd
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JP2014128586A 2014-06-23 2014-06-23 基板処理方法、記憶媒体及び基板処理装置 Active JP6144236B2 (ja)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230039541A (ko) 2021-09-13 2023-03-21 도쿄엘렉트론가부시키가이샤 기판 처리 장치 및 기판 처리 방법

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WO2021039449A1 (ja) * 2019-08-29 2021-03-04 東京エレクトロン株式会社 基板処理装置および基板処理方法
JP7433178B2 (ja) * 2020-09-17 2024-02-19 東京エレクトロン株式会社 処理装置

Family Cites Families (3)

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Publication number Priority date Publication date Assignee Title
JPH10242113A (ja) * 1997-02-24 1998-09-11 Omega Semicon Denshi Kk ベーパ乾燥装置
JP3128643B2 (ja) * 1997-04-02 2001-01-29 東京エレクトロン株式会社 洗浄・乾燥処理装置
JP2003174075A (ja) * 2001-12-05 2003-06-20 Semi Techno:Kk 基板のピッチ変換装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230039541A (ko) 2021-09-13 2023-03-21 도쿄엘렉트론가부시키가이샤 기판 처리 장치 및 기판 처리 방법

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