JP6141500B2 - Substrate pretreatment to reduce filling time in nanoimprint lithography - Google Patents

Substrate pretreatment to reduce filling time in nanoimprint lithography Download PDF

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Publication number
JP6141500B2
JP6141500B2 JP2016154767A JP2016154767A JP6141500B2 JP 6141500 B2 JP6141500 B2 JP 6141500B2 JP 2016154767 A JP2016154767 A JP 2016154767A JP 2016154767 A JP2016154767 A JP 2016154767A JP 6141500 B2 JP6141500 B2 JP 6141500B2
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Prior art keywords
substrate
imprint resist
pretreatment
nanoimprint lithography
pretreatment composition
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JP2016154767A
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Japanese (ja)
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JP2017055108A (en
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クスナトディノフ ニャーズ
クスナトディノフ ニャーズ
スタコウィアック ティモシー
スタコウィアック ティモシー
リウ ウェイジュン
リウ ウェイジュン
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キヤノン株式会社
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Priority to US201562215316P priority Critical
Priority to US62/215,316 priority
Priority to US15/004,679 priority patent/US20170068159A1/en
Priority to US15/004,679 priority
Priority to US15/195,789 priority patent/US20170066208A1/en
Priority to US15/195,789 priority
Application filed by キヤノン株式会社 filed Critical キヤノン株式会社
Publication of JP2017055108A publication Critical patent/JP2017055108A/en
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Publication of JP6141500B2 publication Critical patent/JP6141500B2/en
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