JP6111306B2 - 光酸発生官能基及び塩基溶解度向上官能基を有する繰り返し単位を含むポリマー、関連フォトレジスト組成物、ならびに電子デバイスを形成する方法 - Google Patents

光酸発生官能基及び塩基溶解度向上官能基を有する繰り返し単位を含むポリマー、関連フォトレジスト組成物、ならびに電子デバイスを形成する方法 Download PDF

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JP6111306B2
JP6111306B2 JP2015198976A JP2015198976A JP6111306B2 JP 6111306 B2 JP6111306 B2 JP 6111306B2 JP 2015198976 A JP2015198976 A JP 2015198976A JP 2015198976 A JP2015198976 A JP 2015198976A JP 6111306 B2 JP6111306 B2 JP 6111306B2
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photoacid
independently
generating
repeating units
repeating unit
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JP2016104849A5 (https=
JP2016104849A (ja
Inventor
ポール・ジェイ・ラボーム
ヴィップル・ジェイン
ジェームズ・ダブリュ・サッカリー
ジェームズ・エフ・キャメロン
スザンヌ・エム・コーリー
エイミー・エム・クウォック
デイヴィット・エイ・ヴァレリー
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DuPont Electronic Materials International LLC
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Rohm and Haas Electronic Materials LLC
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F228/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
    • C08F228/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a bond to sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2015198976A 2014-10-10 2015-10-07 光酸発生官能基及び塩基溶解度向上官能基を有する繰り返し単位を含むポリマー、関連フォトレジスト組成物、ならびに電子デバイスを形成する方法 Active JP6111306B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462062347P 2014-10-10 2014-10-10
US62/062,347 2014-10-10

Publications (3)

Publication Number Publication Date
JP2016104849A JP2016104849A (ja) 2016-06-09
JP2016104849A5 JP2016104849A5 (https=) 2017-02-16
JP6111306B2 true JP6111306B2 (ja) 2017-04-05

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JP2015198976A Active JP6111306B2 (ja) 2014-10-10 2015-10-07 光酸発生官能基及び塩基溶解度向上官能基を有する繰り返し単位を含むポリマー、関連フォトレジスト組成物、ならびに電子デバイスを形成する方法

Country Status (5)

Country Link
US (1) US9606434B2 (https=)
JP (1) JP6111306B2 (https=)
KR (1) KR101786641B1 (https=)
CN (1) CN105504118B (https=)
TW (1) TWI589596B (https=)

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Also Published As

Publication number Publication date
TWI589596B (zh) 2017-07-01
CN105504118A (zh) 2016-04-20
TW201613985A (en) 2016-04-16
US20160102158A1 (en) 2016-04-14
JP2016104849A (ja) 2016-06-09
US9606434B2 (en) 2017-03-28
KR20160042776A (ko) 2016-04-20
CN105504118B (zh) 2019-04-30
KR101786641B1 (ko) 2017-10-19

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