JP6103867B2 - 光電変換素子および光電変換素子の製造方法 - Google Patents
光電変換素子および光電変換素子の製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 51
- 238000006243 chemical reaction Methods 0.000 title claims description 25
- 239000013078 crystal Substances 0.000 claims description 189
- 239000000758 substrate Substances 0.000 claims description 68
- 239000004065 semiconductor Substances 0.000 claims description 57
- 238000000034 method Methods 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 32
- 238000010030 laminating Methods 0.000 claims description 10
- 239000012670 alkaline solution Substances 0.000 claims description 6
- 238000001039 wet etching Methods 0.000 claims description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 54
- 229920002120 photoresistant polymer Polymers 0.000 description 34
- 238000005530 etching Methods 0.000 description 18
- 229910021419 crystalline silicon Inorganic materials 0.000 description 12
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 238000000059 patterning Methods 0.000 description 6
- 239000000969 carrier Substances 0.000 description 5
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- 239000003513 alkali Substances 0.000 description 4
- 238000007687 exposure technique Methods 0.000 description 4
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002101 nanobubble Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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Description
Claims (7)
- 第1導電型の半導体基板と、
前記半導体基板の一方の表面の全面に設けられたi型非単結晶膜と、
前記i型非単結晶膜の一部の表面上に設けられた第1導電型非単結晶膜と、
前記i型非単結晶膜の他の一部の表面上に設けられた第2導電型非単結晶膜と、
前記第1導電型非単結晶膜上に設けられた第1導電型用電極と、
前記第2導電型非単結晶膜上に設けられた第2導電型用電極と、を備え、
前記半導体基板と前記i型非単結晶膜との界面は平坦であり、
前記半導体基板は、前記半導体基板と前記i型非単結晶膜との界面における水平方向の間隔が10μm以下の任意の領域において最大高低差が1μm未満であって、
前記第1導電型非単結晶膜と前記半導体基板との間における前記i型非単結晶膜の膜厚が、前記第2導電型非単結晶膜と前記半導体基板との間における前記i型非単結晶膜の膜厚よりも薄い、光電変換素子。 - 前記i型非単結晶膜は、i型非晶質膜である、請求項1に記載の光電変換素子。
- 第1導電型の半導体基板の一方の表面の全面にi型非単結晶膜を積層する工程と、
前記i型非単結晶膜の表面上に第2導電型非単結晶膜を積層する工程と、
前記第2導電型非単結晶膜の一部の表面上にマスク材を設置する工程と、
前記i型非単結晶膜の少なくとも一部を残すように前記マスク材から露出している前記第2導電型非単結晶膜を除去する工程と、
前記第2導電型非単結晶膜の表面上および前記i型非単結晶膜の表面上に第1導電型非単結晶膜を形成する工程と、
前記i型非単結晶膜の表面上に前記第1導電型非単結晶膜の一部を残すように、前記第2導電型非単結晶膜の前記表面上の前記第1導電型非単結晶膜を除去する工程と、
前記第1導電型非単結晶膜の表面上および前記第2導電型非単結晶膜の表面上に電極層を形成する工程と、を含み、
前記第1導電型非単結晶膜と前記半導体基板との間における前記i型非単結晶膜の膜厚が、前記第2導電型非単結晶膜と前記半導体基板との間における前記i型非単結晶膜の膜厚よりも薄い、光電変換素子の製造方法。 - 前記第1導電型非単結晶膜を除去する工程は、アルカリ溶液を用いたウエットエッチングにより行なわれる、請求項3に記載の光電変換素子の製造方法。
- 前記i型非単結晶膜を積層する工程は、1回のみ行なわれる、請求項3または4に記載の光電変換素子の製造方法。
- 前記i型非単結晶膜は、i型非晶質膜である、請求項3から5のいずれか1項に記載の光電変換素子の製造方法。
- 前記i型非単結晶膜を積層する工程において、前記i型非単結晶膜は、前記半導体基板の平坦な前記表面上に形成される、請求項3から6のいずれか1項に記載の光電変換素子の製造方法。
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JP2012200239A JP6103867B2 (ja) | 2012-09-12 | 2012-09-12 | 光電変換素子および光電変換素子の製造方法 |
CN201380047351.1A CN104620395A (zh) | 2012-09-12 | 2013-09-09 | 光电转换元件以及光电转换元件的制造方法 |
PCT/JP2013/074208 WO2014042114A1 (ja) | 2012-09-12 | 2013-09-09 | 光電変換素子および光電変換素子の製造方法 |
US14/426,421 US20150221801A1 (en) | 2012-09-12 | 2013-09-09 | Photoelectric conversion element and method of manufacturing photoelectric conversion element |
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WO2015122257A1 (ja) * | 2014-02-13 | 2015-08-20 | シャープ株式会社 | 光電変換素子 |
WO2015145944A1 (ja) * | 2014-03-25 | 2015-10-01 | パナソニックIpマネジメント株式会社 | 光電変換素子及び光電変換素子の製造方法 |
US9231129B2 (en) * | 2014-03-28 | 2016-01-05 | Sunpower Corporation | Foil-based metallization of solar cells |
US20150380581A1 (en) * | 2014-06-27 | 2015-12-31 | Michael C. Johnson | Passivation of light-receiving surfaces of solar cells with crystalline silicon |
JP6898737B2 (ja) * | 2014-12-15 | 2021-07-07 | シャープ株式会社 | 半導体基板の製造方法、光電変換素子の製造方法および光電変換素子 |
WO2017033232A1 (ja) | 2015-08-21 | 2017-03-02 | シャープ株式会社 | 光電変換素子 |
CN107924957A (zh) * | 2015-09-09 | 2018-04-17 | 夏普株式会社 | 太阳能电池及太阳能电池的制造方法 |
EP3457448B1 (en) * | 2016-05-09 | 2022-06-15 | Kaneka Corporation | Stacked photoelectric conversion device and method for producing same |
CN106098801A (zh) * | 2016-06-23 | 2016-11-09 | 盐城普兰特新能源有限公司 | 一种异质结太阳能电池及其制备方法 |
JP7221276B2 (ja) * | 2018-03-23 | 2023-02-13 | 株式会社カネカ | 太陽電池の製造方法、および、太陽電池 |
WO2020217999A1 (ja) * | 2019-04-23 | 2020-10-29 | 株式会社カネカ | 太陽電池の製造方法および太陽電池 |
CN112133774A (zh) * | 2020-10-12 | 2020-12-25 | 青海黄河上游水电开发有限责任公司光伏产业技术分公司 | 一种背结背接触太阳能电池及其制作方法 |
CN113809186A (zh) * | 2021-09-13 | 2021-12-17 | 福建金石能源有限公司 | 一种采用形成电极、开槽绝缘二步法的背接触异质结太阳能电池制造方法 |
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JP4302822B2 (ja) * | 1999-06-25 | 2009-07-29 | ソニー株式会社 | 炭素系複合構造体及びその製造方法 |
JP2003298078A (ja) * | 2002-03-29 | 2003-10-17 | Ebara Corp | 光起電力素子 |
JP2004080000A (ja) * | 2003-06-09 | 2004-03-11 | Toshiba Corp | 半導体記憶装置の製造方法 |
US7199395B2 (en) * | 2003-09-24 | 2007-04-03 | Sanyo Electric Co., Ltd. | Photovoltaic cell and method of fabricating the same |
US20070169808A1 (en) * | 2006-01-26 | 2007-07-26 | Kherani Nazir P | Solar cell |
JP2007281156A (ja) * | 2006-04-06 | 2007-10-25 | Japan Advanced Institute Of Science & Technology Hokuriku | 裏面電極型半導体へテロ接合太陽電池ならびにその製造方法と製造装置 |
US20080000522A1 (en) * | 2006-06-30 | 2008-01-03 | General Electric Company | Photovoltaic device which includes all-back-contact configuration; and related processes |
FR2906406B1 (fr) * | 2006-09-26 | 2008-12-19 | Commissariat Energie Atomique | Procede de realisation de cellule photovoltaique a heterojonction en face arriere. |
JP2008300440A (ja) * | 2007-05-29 | 2008-12-11 | Sanyo Electric Co Ltd | 太陽電池セル及び太陽電池モジュール |
JP5207852B2 (ja) * | 2008-06-30 | 2013-06-12 | 三洋電機株式会社 | 太陽電池及びその製造方法 |
KR101142861B1 (ko) * | 2009-02-04 | 2012-05-08 | 엘지전자 주식회사 | 태양 전지 및 그 제조 방법 |
WO2010104098A1 (ja) * | 2009-03-10 | 2010-09-16 | 三洋電機株式会社 | 太陽電池の製造方法及び太陽電池 |
CN102185030B (zh) * | 2011-04-13 | 2013-08-21 | 山东力诺太阳能电力股份有限公司 | 基于n型硅片的背接触式hit太阳能电池制备方法 |
CN102214720B (zh) * | 2011-06-10 | 2013-07-24 | 山东力诺太阳能电力股份有限公司 | 基于p型硅片的背接触异质结太阳电池 |
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2012
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2013
- 2013-09-09 CN CN201380047351.1A patent/CN104620395A/zh active Pending
- 2013-09-09 WO PCT/JP2013/074208 patent/WO2014042114A1/ja active Application Filing
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US20150221801A1 (en) | 2015-08-06 |
JP2014056918A (ja) | 2014-03-27 |
WO2014042114A1 (ja) | 2014-03-20 |
CN104620395A (zh) | 2015-05-13 |
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