JP6013279B2 - 成膜装置 - Google Patents
成膜装置 Download PDFInfo
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- JP6013279B2 JP6013279B2 JP2013124687A JP2013124687A JP6013279B2 JP 6013279 B2 JP6013279 B2 JP 6013279B2 JP 2013124687 A JP2013124687 A JP 2013124687A JP 2013124687 A JP2013124687 A JP 2013124687A JP 6013279 B2 JP6013279 B2 JP 6013279B2
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- Prior art keywords
- film forming
- hearth
- auxiliary
- pair
- auxiliary coils
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/3442—Applying energy to the substrate during sputtering using an ion beam
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/354—Introduction of auxiliary energy into the plasma
- C23C14/358—Inductive energy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
Description
これにより、蒸発源に対してプラズマビームが導かれる位置を容易に調整することができる。また、成膜材料の中心にプラズマビームが導かれるように調整することで、成膜材料が局所的に昇華又は蒸発することが抑制され、成膜材料を均一に昇華又は蒸発させることができる。その結果、成膜材料の昇華又は蒸発を安定させて連続運転の時間を延ばすことができる。
このように一対の補助コイルが輪ハースの正面側に配置されていると、一対の補助コイルによる磁場を輪ハースの正面側に発生させて、プラズマビームが導かれる位置を容易に調整することができる。
例えば、成膜装置が複数の主ハース及び輪ハースを備える場合、それぞれの主ハース及び輪ハースの相対位置を調整するには手間がかかる。本発明の成膜装置は、プラズマが導かれる位置を容易に調整することができるので、複数の主ハース及び輪ハースを備える場合に特に有効である。
Claims (5)
- 真空チャンバー内でプラズマビームによって成膜材料を加熱して蒸発させ、前記成膜材料の蒸発粒子を成膜対象物に付着させる成膜装置であって、
前記真空チャンバー内で前記プラズマビームを生成するプラズマ源と、
蒸発源となる前記成膜材料が充填されると共に、前記プラズマビームを前記成膜材料へ導く、または前記プラズマビームが導かれる主陽極である主ハースと、
前記主ハースの周囲に配置されると共に、前記プラズマビームを誘導する補助陽極である輪ハースと、
前記輪ハースの軸線方向から見て前記蒸発源を挟んで両側に配置された一対の補助コイルと、
前記成膜対象物が配置される方を正面とした場合、前記一対の補助コイルの正面側の極性が互いに異なるように前記一対の補助コイルに直流電流を供給する補助コイル電源部と、を備えることを特徴とする成膜装置。 - 少なくとも2対の前記補助コイルを有し、
前記一対の補助コイル同士は、異なる方向に前記主ハースを挟んで配置されていることを特徴とする請求項1に記載の成膜装置。 - 前記一対の補助コイルは、前記輪ハースの正面側に配置されていることを特徴とする請求項1又は2に記載の成膜装置。
- 前記補助コイルに供給される直流電流を調整して、前記補助コイルにより生成される磁場を調整する磁場調整部を更に備えることを特徴とすることを特徴とする請求項1〜3の何れか一項に記載の成膜装置。
- 前記真空チャンバー内に、前記主ハース及び前記輪ハースを複数組備え、
前記主ハース及び前記輪ハースに対応して、前記プラズマ源及び前記一対の補助コイルがそれぞれ設けられていることを特徴とする請求項1〜4の何れか一項に記載の成膜装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013124687A JP6013279B2 (ja) | 2013-06-13 | 2013-06-13 | 成膜装置 |
TW103113673A TWI534281B (zh) | 2013-06-13 | 2014-04-15 | Film forming device |
KR1020140046565A KR20140145536A (ko) | 2013-06-13 | 2014-04-18 | 성막장치 |
CN201410160234.2A CN104233201B (zh) | 2013-06-13 | 2014-04-21 | 成膜装置 |
KR1020160138400A KR101773890B1 (ko) | 2013-06-13 | 2016-10-24 | 성막장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013124687A JP6013279B2 (ja) | 2013-06-13 | 2013-06-13 | 成膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015000988A JP2015000988A (ja) | 2015-01-05 |
JP6013279B2 true JP6013279B2 (ja) | 2016-10-25 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013124687A Active JP6013279B2 (ja) | 2013-06-13 | 2013-06-13 | 成膜装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6013279B2 (ja) |
KR (2) | KR20140145536A (ja) |
CN (1) | CN104233201B (ja) |
TW (1) | TWI534281B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016079456A (ja) * | 2014-10-16 | 2016-05-16 | 住友重機械工業株式会社 | 成膜装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116884827B (zh) * | 2023-09-06 | 2023-12-05 | 艾瑞森表面技术(苏州)股份有限公司 | 真空等离子装置及加工方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4947404A (en) * | 1987-11-16 | 1990-08-07 | Hanks Charles W | Magnet structure for electron-beam heated evaporation source |
JPH04218667A (ja) * | 1990-04-05 | 1992-08-10 | Kawasaki Steel Corp | イオンプレーティング装置 |
JP3021536B2 (ja) * | 1990-05-02 | 2000-03-15 | 日本真空技術株式会社 | ホローカソード放電を利用した加熱装置 |
US5677012A (en) * | 1994-12-28 | 1997-10-14 | Sumitomo Heavy Industries, Ltd. | Plasma processing method and plasma processing apparatus |
JP2946404B2 (ja) * | 1996-03-25 | 1999-09-06 | 住友重機械工業株式会社 | イオンプレーティング装置 |
CN1149303C (zh) * | 1997-09-26 | 2004-05-12 | 住友重机械工业株式会社 | 离子喷镀装置 |
JP3944317B2 (ja) * | 1998-06-09 | 2007-07-11 | 住友重機械工業株式会社 | Cu成膜方法 |
JP2000026953A (ja) * | 1998-07-09 | 2000-01-25 | Sumitomo Heavy Ind Ltd | プラズマ処理方法及びプラズマ処理装置 |
JP2000282223A (ja) | 1999-03-31 | 2000-10-10 | Sumitomo Heavy Ind Ltd | 成膜装置及び方法 |
JP2002030426A (ja) * | 2000-07-07 | 2002-01-31 | Sumitomo Heavy Ind Ltd | 成膜方法及び装置 |
JP2009235554A (ja) | 2008-03-28 | 2009-10-15 | Sumitomo Heavy Ind Ltd | 成膜装置及び成膜方法 |
JP2010116615A (ja) * | 2008-11-14 | 2010-05-27 | Alps Electric Co Ltd | イオンプレーティング装置およびプラズマビーム照射位置調整プログラム |
JP5456716B2 (ja) | 2011-03-30 | 2014-04-02 | 住友重機械工業株式会社 | 成膜装置 |
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2013
- 2013-06-13 JP JP2013124687A patent/JP6013279B2/ja active Active
-
2014
- 2014-04-15 TW TW103113673A patent/TWI534281B/zh active
- 2014-04-18 KR KR1020140046565A patent/KR20140145536A/ko active Application Filing
- 2014-04-21 CN CN201410160234.2A patent/CN104233201B/zh active Active
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2016
- 2016-10-24 KR KR1020160138400A patent/KR101773890B1/ko active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016079456A (ja) * | 2014-10-16 | 2016-05-16 | 住友重機械工業株式会社 | 成膜装置 |
Also Published As
Publication number | Publication date |
---|---|
CN104233201B (zh) | 2017-05-24 |
KR101773890B1 (ko) | 2017-09-01 |
KR20160128260A (ko) | 2016-11-07 |
TW201446992A (zh) | 2014-12-16 |
KR20140145536A (ko) | 2014-12-23 |
CN104233201A (zh) | 2014-12-24 |
TWI534281B (zh) | 2016-05-21 |
JP2015000988A (ja) | 2015-01-05 |
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