JP5919830B2 - 着色感光性樹脂組成物 - Google Patents

着色感光性樹脂組成物 Download PDF

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Publication number
JP5919830B2
JP5919830B2 JP2012006797A JP2012006797A JP5919830B2 JP 5919830 B2 JP5919830 B2 JP 5919830B2 JP 2012006797 A JP2012006797 A JP 2012006797A JP 2012006797 A JP2012006797 A JP 2012006797A JP 5919830 B2 JP5919830 B2 JP 5919830B2
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Japan
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group
solvent
mass
meth
resin composition
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JP2012006797A
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English (en)
Japanese (ja)
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JP2012181506A (ja
Inventor
公之 城内
公之 城内
小山 恵範
恵範 小山
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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Priority to JP2012006797A priority Critical patent/JP5919830B2/ja
Publication of JP2012181506A publication Critical patent/JP2012181506A/ja
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
JP2012006797A 2011-02-08 2012-01-17 着色感光性樹脂組成物 Active JP5919830B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012006797A JP5919830B2 (ja) 2011-02-08 2012-01-17 着色感光性樹脂組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011024653 2011-02-08
JP2011024653 2011-02-08
JP2012006797A JP5919830B2 (ja) 2011-02-08 2012-01-17 着色感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2012181506A JP2012181506A (ja) 2012-09-20
JP5919830B2 true JP5919830B2 (ja) 2016-05-18

Family

ID=46587353

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012006797A Active JP5919830B2 (ja) 2011-02-08 2012-01-17 着色感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP5919830B2 (ko)
KR (1) KR101910521B1 (ko)
CN (1) CN102629076A (ko)
TW (1) TWI578105B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102914943B (zh) * 2011-08-04 2018-01-12 住友化学株式会社 着色固化性树脂组合物
WO2013089197A1 (ja) * 2011-12-14 2013-06-20 日本化薬株式会社 キサンテン化合物
JP5938895B2 (ja) * 2011-12-26 2016-06-22 住友化学株式会社 着色硬化性樹脂組成物
KR101988696B1 (ko) * 2014-03-11 2019-06-12 동우 화인켐 주식회사 청색 감광성 수지 조성물, 이를 포함하는 청색 컬러필터 및 표시장치
CN105867068A (zh) * 2015-02-06 2016-08-17 奇美实业股份有限公司 彩色滤光片用蓝色感光性树脂组合物及其应用
KR102069143B1 (ko) * 2015-08-25 2020-01-22 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이를 이용하는 컬러 필터
CN107450268B (zh) * 2016-05-30 2021-03-16 住华科技股份有限公司 彩色光刻胶组成物及其介电常数损失率的检测方法
JP7007119B2 (ja) * 2016-08-24 2022-02-10 東友ファインケム株式会社 着色硬化性樹脂組成物、カラーフィルタ、及び表示装置
JP7131089B2 (ja) * 2018-06-01 2022-09-06 東洋インキScホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2460491A1 (de) * 1974-12-20 1976-07-01 Hoechst Ag Verfahren zur herstellung von xanthenfarbstoffen
JP4752556B2 (ja) * 2005-09-22 2011-08-17 Jsr株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP2007163911A (ja) * 2005-12-15 2007-06-28 Toyo Ink Mfg Co Ltd 着色組成物およびカラーフィルタ
JP2007219499A (ja) * 2006-01-18 2007-08-30 Fujifilm Electronic Materials Co Ltd 光硬化性組成物並びにそれを用いたカラーフィルタ及びその製造方法
JP4788485B2 (ja) * 2006-06-13 2011-10-05 住友化学株式会社 着色感光性樹脂組成物
JP2008088272A (ja) * 2006-09-29 2008-04-17 Fujifilm Corp 硬化性着色組成物、カラーフィルタ、及びカラーフィルタを用いた液晶表示装置
JP2008164886A (ja) * 2006-12-28 2008-07-17 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
JP5122168B2 (ja) * 2007-03-29 2013-01-16 東京応化工業株式会社 着色感光性樹脂組成物、カラーフィルター、及び液晶表示ディスプレイ
JP2009265641A (ja) * 2008-03-31 2009-11-12 Sumitomo Chemical Co Ltd カラーフィルター
JP5504627B2 (ja) * 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物
TWI475320B (zh) * 2009-02-13 2015-03-01 Sumitomo Chemical Co 著色感光性樹脂組成物及彩色濾光片
TW201111447A (en) * 2009-07-14 2011-04-01 Sumitomo Chemical Co Production method of pigment dispersion solution
JP4492760B1 (ja) * 2009-12-01 2010-06-30 東洋インキ製造株式会社 カラーフィルタ用青色着色組成物、およびカラーフィルタ

Also Published As

Publication number Publication date
KR20120090840A (ko) 2012-08-17
TWI578105B (zh) 2017-04-11
JP2012181506A (ja) 2012-09-20
KR101910521B1 (ko) 2018-10-22
CN102629076A (zh) 2012-08-08
TW201235784A (en) 2012-09-01

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