JP5849405B2 - Manufacturing method of semiconductor device - Google Patents

Manufacturing method of semiconductor device Download PDF

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JP5849405B2
JP5849405B2 JP2011032150A JP2011032150A JP5849405B2 JP 5849405 B2 JP5849405 B2 JP 5849405B2 JP 2011032150 A JP2011032150 A JP 2011032150A JP 2011032150 A JP2011032150 A JP 2011032150A JP 5849405 B2 JP5849405 B2 JP 5849405B2
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heating
tool
connection
electronic component
pressing
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JP2012174722A (en
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永井 朗
朗 永井
大久保 恵介
恵介 大久保
榎本 哲也
哲也 榎本
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
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    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/731Location prior to the connecting process
    • H01L2224/73101Location prior to the connecting process on the same surface
    • H01L2224/73103Bump and layer connectors
    • H01L2224/73104Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83191Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on the semiconductor or solid-state body

Description

本発明は、半導体装置の製造方法に関する。   The present invention relates to a method for manufacturing a semiconductor device.

近年、電子機器の小型化、薄型化が進展している。これに伴い、電子機器の製造に用いられる半導体ウェハは、バックグラインドによって例えば50μm以下の薄さまで薄膜化されるようになっている。薄膜化された半導体ウェハをダイシングして得られる半導体チップは、複数個集積され、高集積化した電子部品として利用される。このような半導体チップを基板に接続する際、半導体チップが割れることを抑制するため、半導体チップと基板とを接続するダイボンド材を予め半導体ウェハに貼り付け、この状態で半導体ウェハをダイシングして、ダイボンド材付き半導体チップに個片化する方式が採用されている。   In recent years, electronic devices are becoming smaller and thinner. Accordingly, a semiconductor wafer used for manufacturing an electronic device is thinned to a thickness of, for example, 50 μm or less by back grinding. A plurality of semiconductor chips obtained by dicing a thinned semiconductor wafer are integrated and used as highly integrated electronic components. When connecting such a semiconductor chip to the substrate, in order to prevent the semiconductor chip from cracking, a die bond material for connecting the semiconductor chip and the substrate is previously attached to the semiconductor wafer, and in this state, the semiconductor wafer is diced, A method of dividing into a semiconductor chip with a die bond material is employed.

また、近年、電子部品の高速化に伴い、接続端子間距離が短いフリップチップ実装が注目されている。フリップチップ実装においても、薄膜化された半導体ウェハから得られる半導体チップを基板に実装することが検討されており、フリップチップ実装に用いられる接続材料であるフィルム状接着剤を予め半導体ウェハに貼り付け、この状態で半導体ウェハをダイシングして接着剤付半導体チップを得て、この接着剤付半導体チップを基板に実装する方式が提案されている(特許文献1参照)。   In recent years, flip chip mounting with a short distance between connection terminals has been attracting attention as the speed of electronic components has increased. Also in flip chip mounting, it has been studied to mount a semiconductor chip obtained from a thinned semiconductor wafer on a substrate, and a film adhesive, which is a connection material used for flip chip mounting, is previously attached to the semiconductor wafer. In this state, there has been proposed a method of dicing a semiconductor wafer to obtain a semiconductor chip with an adhesive and mounting the semiconductor chip with an adhesive on a substrate (see Patent Document 1).

国際公開第2007/148724号パンフレットInternational Publication No. 2007/148724 Pamphlet 特開平6−333980号公報JP-A-6-333980 特開平9−162544号公報JP 9-162544 A 特許第4032481号公報Japanese Patent No. 4032481 特開2005−294652号公報JP-A-2005-294652 特開2009−44001号公報JP 2009-44001 A 特開2001−223295号公報JP 2001-223295 A

ところで、上記のような方法でフリップチップ実装を行う際、加熱及び加圧時に、接続材料が接続面からはみ出し、このはみ出した接続材料が加熱及び加熱を行う加熱加圧ツールに付着して加熱加圧ツールの表面を汚染するツール汚染が発生する場合がある。特に、半導体チップの薄膜化に伴い、ツール汚染は顕著に発生するようになってきている。ツール汚染を除去しないでフリップチップ実装を継続した場合、半導体チップと加熱加圧ツールとの間の平行度が保てない、半導体チップと加熱加圧ツールとの接触が不完全となり熱が十分に伝わらない等の原因によって接続状態が不完全となるおそれがある。このため、量産工程においては、品質の安定化を図るため、ツール汚染の防止が求められている。   By the way, when flip-chip mounting is performed by the above method, the connecting material protrudes from the connection surface during heating and pressurization, and the protruding connecting material adheres to a heating and pressing tool for heating and heating, and heat is applied. Tool contamination can occur that contaminates the surface of the pressure tool. In particular, along with the thinning of the semiconductor chip, tool contamination has become noticeable. If flip chip mounting is continued without removing tool contamination, the parallelism between the semiconductor chip and the heating and pressing tool cannot be maintained. There is a risk that the connection will be incomplete due to reasons such as not being transmitted. For this reason, in the mass production process, prevention of tool contamination is required in order to stabilize the quality.

ツール汚染を防止する方法として、電気的接続と機械的接続とが同時に行えるACF(Anisotropic Conductive Film)を用いた実装を行う場合には、半導体チップと加熱加圧ツールとの間にテフロン(登録商標)シートなどの付着防止シートを挿入して加熱及び加圧を行う方法が提案されている(特許文献2〜6参照)。これらの方法では、ロールに巻かれた付着防止シートを当該ロールから送り出し、送り出された付着防止シートを加熱加圧ツールと半導体チップとの間に介在させて加熱及び加圧を行い、加熱及び加圧に使用された部分の付着防止シートを別のロールで巻き取る、いわゆるロールtoロール方式の方法が採用されており、これにより量産対応が可能となっている。   As a method of preventing tool contamination, when mounting using an ACF (Anisotropic Conductive Film) capable of performing electrical connection and mechanical connection simultaneously, Teflon (registered trademark) is provided between the semiconductor chip and the heating and pressing tool. ) There has been proposed a method in which an adhesion preventing sheet such as a sheet is inserted and heated and pressurized (see Patent Documents 2 to 6). In these methods, an adhesion prevention sheet wound around a roll is sent out from the roll, and the delivered adhesion prevention sheet is interposed between a heating and pressing tool and a semiconductor chip to perform heating and pressurization. A so-called roll-to-roll method is employed in which the part of the adhesion preventing sheet used for the pressure is wound up by another roll, which enables mass production.

また、半導体を実装する際、はんだ層を有する接続端子が使用される場合がある。このような接続端子を使用する場合、接続部分の温度は、例えばはんだ溶融温度である250℃前後の高温とする必要がある。そして、加熱加圧ツールによって当該接続部分を250℃前後に加熱するためには、加熱加圧ツールの温度は例えば300℃以上の高温とする必要がある。しかし、テフロン(登録商標)シートなどの付着防止シートの耐熱性は低く、加熱加圧時に付着防止シートのシート基材が分解してしまうおそれがある。従って、加熱温度が高い実装方法では、ツール汚染を防止することが困難になるという問題がある。   Moreover, when mounting a semiconductor, the connection terminal which has a solder layer may be used. When such a connection terminal is used, the temperature of the connection portion needs to be a high temperature around 250 ° C., which is a solder melting temperature, for example. And in order to heat the said connection part to about 250 degreeC with a heating-and-pressing tool, the temperature of a heating-and-pressing tool needs to be high temperature of 300 degreeC or more, for example. However, the heat resistance of an adhesion preventing sheet such as a Teflon (registered trademark) sheet is low, and the sheet base material of the adhesion preventing sheet may be decomposed during heating and pressing. Therefore, the mounting method with a high heating temperature has a problem that it is difficult to prevent tool contamination.

そこで、耐熱性のあるシート基材として、アルミ箔などの金属箔を利用することが考えられる。なお、基板材料の加熱プレス加工においては、アルミ箔がクッション材として用いられることもある(特許文献7)。しかし、上記のようなロールtoロール方式による実装にアルミ箔からなる付着防止シートを適用しても、アルミ箔は破れやすいため、接続材料がアルミ箔に付着し、この接続材料が付着した箇所からアルミ箔がロールの送りによって破れてアルミ箔を巻き取れなくなるおそれがある。また、ロールtoロール方式のような面積の大きい付着防止シートを使用する方法に、アルミ箔からなる付着防止シートを適用しても、加熱加圧ツールからアルミ箔に伝わった熱が当該アルミ箔において大量に放熱され、実装のための熱が電子部品に十分に伝わらなくなるおそれがある。従って、付着防止シートにアルミ箔を用いて量産対応することは困難であると考えられる。   Therefore, it is conceivable to use a metal foil such as an aluminum foil as a heat-resistant sheet base material. Note that aluminum foil may be used as a cushioning material in the hot press processing of the substrate material (Patent Document 7). However, even if an anti-adhesion sheet made of aluminum foil is applied to the roll-to-roll method as described above, the aluminum foil is easily broken, so that the connection material adheres to the aluminum foil, and from the location where this connection material adheres There is a possibility that the aluminum foil is torn by the roll feed and the aluminum foil cannot be wound. In addition, even when an adhesion prevention sheet made of aluminum foil is applied to a method using a large area adhesion prevention sheet such as a roll-to-roll method, the heat transferred from the heating / pressurizing tool to the aluminum foil in the aluminum foil A large amount of heat is dissipated, and heat for mounting may not be sufficiently transmitted to the electronic components. Therefore, it is considered difficult to deal with mass production using an aluminum foil for the adhesion preventing sheet.

本発明は、上記事情に鑑みてなされたものであり、電子部品を接続して半導体装置を製造する際に、加熱加圧ツールに接続材料が付着することを防止するツール保護材において不具合を発生させることなく、加熱加圧ツールの汚染を防止し、歩留りを向上させることができる半導体装置の製造方法を提供することを目的とする。   The present invention has been made in view of the above circumstances, and when a semiconductor device is manufactured by connecting electronic components, a problem occurs in the tool protection material that prevents the connection material from adhering to the heating and pressing tool. It is an object of the present invention to provide a method for manufacturing a semiconductor device that can prevent contamination of the heating and pressing tool and improve the yield without causing them.

本発明に係る半導体装置の製造方法は、相対向する電子部品の間に接続材料を介在させ、相対向する電子部品の少なくともいずれか一方の電子部品を加熱加圧ツールによって加熱及び加圧し、相対向する電子部品を接続して半導体装置を製造する半導体装置の製造方法であって、加熱加圧ツールの加熱加圧面と電子部品の被加熱加圧面との間に、加熱加圧面と同等の大きさで、金属箔、シリコンチップ、及びセラミックシートのいずれか一つからなるツール保護材を介在させて加熱及び加圧を行うことを特徴とする。   In the method of manufacturing a semiconductor device according to the present invention, a connecting material is interposed between opposing electronic components, and at least one of the opposing electronic components is heated and pressurized with a heating and pressing tool, A semiconductor device manufacturing method for manufacturing a semiconductor device by connecting electronic components facing each other, and having a size equivalent to the heating and pressing surface between the heating and pressing surface of the heating and pressing tool and the heated and pressing surface of the electronic component Now, heating and pressurization are performed by interposing a tool protective material made of any one of a metal foil, a silicon chip, and a ceramic sheet.

本発明に係る半導体装置の製造方法では、電子部品を加熱加圧ツールによって加熱及び加圧する際に、加熱加圧面と被加熱加圧面との間に、金属箔、シリコンチップ、及びセラミックシートのいずれか一つからなるツール保護材が介される。これら金属箔、シリコンチップ、及びセラミックシートは、例えば300℃程度の高温でも分解することがないため、ツール保護材が分解することなく、接続材料が加熱加圧面に付着することを防止することができる。よって、本発明に係る半導体装置の製造方法では、電子部品を接続して半導体装置を製造する際に、加熱加圧ツールに接続材料が付着することを防止するツール保護材において不具合を発生させることなく、加熱加圧ツールの汚染を防止し、歩留りを向上させることができる。   In the method for manufacturing a semiconductor device according to the present invention, when an electronic component is heated and pressed by a heating and pressing tool, any one of a metal foil, a silicon chip, and a ceramic sheet is interposed between the heating and pressing surface and the heated and pressing surface. The tool protection material which consists of these is interposed. Since these metal foil, silicon chip, and ceramic sheet are not decomposed even at a high temperature of, for example, about 300 ° C., the tool protective material is not decomposed and the connection material can be prevented from adhering to the heating and pressing surface. it can. Therefore, in the method of manufacturing a semiconductor device according to the present invention, when a semiconductor device is manufactured by connecting electronic components, a failure occurs in the tool protection material that prevents the connection material from adhering to the heating and pressing tool. In addition, contamination of the heating and pressing tool can be prevented and the yield can be improved.

ここで、加熱加圧面の面積を、被加熱加圧面の面積以上とすることが好ましい。こうすると、被加熱加圧面を均一に加圧できると共に、電子部品を十分加熱することができる。   Here, it is preferable that the area of the heating and pressing surface is equal to or larger than the area of the heated and pressing surface. If it carries out like this, while being able to pressurize a to-be-heated pressurization surface uniformly, an electronic component can fully be heated.

また、ツール保護材を、吸着保持手段を用いて加熱加圧ツールの加熱加圧面と電子部品の被加熱加圧面との間に搬送することが好ましい。こうすると、加熱加圧面と被加熱加圧面との間にツール保護材を介在させた後、すぐ加熱及び加圧を行うことが可能となり、製造サイクルを短縮して量産対応することができる。   Moreover, it is preferable to convey a tool protection material between the heating and pressing surface of the heating and pressing tool and the heated and pressing surface of the electronic component using the suction holding means. If it carries out like this, after interposing a tool protective material between a heating-pressing surface and a to-be-heated pressing surface, it will become possible to heat and press immediately, and a manufacturing cycle can be shortened and it can respond to mass production.

また、ツール保護材の表面に、離型処理剤を塗布することが好ましい。こうすると、加熱加圧面及び被加熱加圧面から容易にツール保護材を剥がすことができる。   Moreover, it is preferable to apply a mold release treatment agent to the surface of the tool protection material. If it carries out like this, a tool protection material can be easily peeled off from a heating-pressing surface and a to-be-heated pressing surface.

本発明によれば、電子部品を接続して半導体装置を製造する際に、加熱加圧ツールに接続材料が付着することを防止するツール保護材において不具合を発生させることなく、加熱加圧ツールの汚染を防止し、歩留りを向上させることができる半導体装置の製造方法を提供することができる。   According to the present invention, when a semiconductor device is manufactured by connecting electronic components, the tool protective material for preventing the connection material from adhering to the heating and pressing tool does not cause a problem, and the heating and pressing tool is provided. It is possible to provide a method for manufacturing a semiconductor device capable of preventing contamination and improving yield.

一方の電子部品に接続材料が貼り付けられた状態を示す模式断面図である。It is a schematic cross section which shows the state by which the connection material was affixed on one electronic component. 相対向する電子部品を仮接続する工程を示す模式断面図である。It is a schematic cross section which shows the process of temporarily connecting the electronic components which oppose each other. 相対向する電子部品が仮接続された状態を示す模式断面図である。It is a schematic cross section which shows the state by which the electronic component which opposes was temporarily connected. 加熱加圧ツールと電子部品との間にツール保護材が介された状態を示す模式断面図である。It is a schematic cross section which shows the state by which the tool protective material was interposed between the heating-pressing tool and the electronic component. 相対向する電子部品を本接続する工程を示す模式断面図である。It is a schematic cross section which shows the process of carrying out this connection of the electronic components which oppose each other. 本接続後、電子部品から加熱加圧ツールが外された状態を示す模式断面図である。It is a schematic cross section which shows the state by which the heating-and-pressing tool was removed from the electronic component after this connection. 電子部品からツール保護材が除去された状態を示す模式断面図である。It is a schematic cross section which shows the state from which the tool protection material was removed from the electronic component. ツール保護材をトレーに収納した状態を示す斜視図である。It is a perspective view which shows the state which accommodated the tool protection material in the tray.

以下、図面を参照して、本発明の実施形態に係る半導体装置の製造方法を詳細に説明する。   Hereinafter, with reference to drawings, the manufacturing method of the semiconductor device concerning the embodiment of the present invention is explained in detail.

図1は、一方の電子部品に接続材料が貼り付けられた状態を示す模式断面図である。図1に示すように、本実施形態に係る半導体装置の製造方法では、まず、第1電子部品1に接続材料4を付着させる。   FIG. 1 is a schematic cross-sectional view showing a state where a connection material is attached to one electronic component. As shown in FIG. 1, in the method for manufacturing a semiconductor device according to this embodiment, first, a connection material 4 is attached to the first electronic component 1.

第1電子部品1は、半導体チップや基板等の電子部品である。この第1電子部品1は、直方体状を呈しており、第1接続端子11が複数形成された第1接続面12を有している。第1電子部品1において、第1接続面12と対向する面は、背面13となっている。   The first electronic component 1 is an electronic component such as a semiconductor chip or a substrate. The first electronic component 1 has a rectangular parallelepiped shape and has a first connection surface 12 on which a plurality of first connection terminals 11 are formed. In the first electronic component 1, the surface facing the first connection surface 12 is a back surface 13.

第1接続端子11は、突起状の電極であり、めっき、印刷、ワイヤーボンディング等によって形成されている。第1接続端子11は、角柱状、円柱状、球状、先鋭状等を呈している。第1接続端子11は、金、ニッケル、銅、及びはんだ等の材料から形成されている。また、第1接続端子11は、銅ピラー上にはんだを付けることで形成されても良い。   The first connection terminal 11 is a protruding electrode, and is formed by plating, printing, wire bonding, or the like. The first connection terminal 11 has a prismatic shape, a cylindrical shape, a spherical shape, a sharp shape, or the like. The first connection terminal 11 is made of a material such as gold, nickel, copper, and solder. Moreover, the 1st connection terminal 11 may be formed by attaching a solder on a copper pillar.

接続材料4は、電子部品を接続するためのものである。接続材料4は、フィルム状のものでも良く、液状の材料を第1接続面12に塗布、印刷、又はスピンコートして形成されたものでも良い。電子部品が半導体チップである場合、接続材料4は、個片化され半導体チップにされた状態の電子部品に接着されても良いし、個片化され半導体チップにされる前の状態のウェハに接着され、ウェハと共にダイシング等の手段により個片化されても良い。接続材料4は、電子部品を接続した際、これらの間に生じる空隙を十分充填できる程度に、第1接続面12の全面にわたって接着される。   The connection material 4 is for connecting electronic components. The connection material 4 may be in the form of a film, or may be formed by applying, printing, or spin coating a liquid material to the first connection surface 12. When the electronic component is a semiconductor chip, the connection material 4 may be bonded to the electronic component in a state of being separated into semiconductor chips, or may be applied to a wafer in a state before being separated into semiconductor chips. It may be bonded and separated into pieces together with the wafer by means such as dicing. The connection material 4 is bonded over the entire surface of the first connection surface 12 to such an extent that a gap generated therebetween can be sufficiently filled when electronic components are connected.

図2は、相対向する電子部品を仮接続する工程を示す模式断面図、図3は相対向する電子部品が仮接続された状態を示す模式断面図である。図2に示すように、本実施形態に係る製造方法では、次に、第1電子部品1と第2電子部品2との仮接続を行う。第2電子部品2は、半導体チップや基板等の電子部品であって第1電子部品2と同様な構成をしており、第2接続端子21が複数形成された第2接続面22、及び背面23を有している。   FIG. 2 is a schematic cross-sectional view showing a process of temporarily connecting opposing electronic components, and FIG. 3 is a schematic cross-sectional view showing a state where the opposing electronic components are temporarily connected. As shown in FIG. 2, in the manufacturing method according to the present embodiment, next, temporary connection between the first electronic component 1 and the second electronic component 2 is performed. The second electronic component 2 is an electronic component such as a semiconductor chip or a substrate and has the same configuration as that of the first electronic component 2, a second connection surface 22 on which a plurality of second connection terminals 21 are formed, and a back surface. 23.

第1電子部品1と第2電子部品2との仮接続には、ステージ6及び加熱加圧ツール3を有する接続装置100を使用する。ステージ6は、電子部品を載置するための台であり、例えば第2電子部品2が載置される。   For temporary connection between the first electronic component 1 and the second electronic component 2, a connection device 100 having a stage 6 and a heating and pressing tool 3 is used. The stage 6 is a table for placing electronic components. For example, the second electronic component 2 is placed thereon.

加熱加圧ツール3は、相対向する電子部品の間に接続材料を介在させ、これらの電子部品を加熱及び加圧して接続(仮接続、及び本接続)する装置である。加熱加圧ツール3は、本実施形態では、第1電子部品1の背面13を加熱及び加圧する。すなわち、背面13が被加熱加圧面となっている。   The heating and pressing tool 3 is a device that interposes connection materials between opposing electronic components, and connects (temporary connection and main connection) by heating and pressing these electronic components. In the present embodiment, the heating and pressing tool 3 heats and pressurizes the back surface 13 of the first electronic component 1. That is, the back surface 13 is a heated pressure surface.

加熱加圧ツール3は、電子部品を加熱及び加圧する加熱加圧面31を有している。この加熱加圧面31の面積は被加熱加圧面である背面13の面積以上となっている。このため、背面13を加熱及び加圧する際に、当該背面13に負荷される荷重が均一となり、第1電子部品1が薄い場合に当該第1電子部品1が割れることが抑制されると共に、背面13の全体が加熱され、接続材料4が十分加熱される。   The heating and pressing tool 3 has a heating and pressing surface 31 for heating and pressing electronic components. The area of the heating and pressing surface 31 is equal to or larger than the area of the back surface 13 that is the surface to be heated and pressed. For this reason, when the back surface 13 is heated and pressurized, the load applied to the back surface 13 becomes uniform, and when the first electronic component 1 is thin, the first electronic component 1 is prevented from cracking, and the back surface 13 is heated, and the connecting material 4 is sufficiently heated.

加熱加圧面31には吸引孔(不図示)が設けられており、この吸引孔にはポンプ等の吸引手段(不図示)が接続されている。この吸引手段によって吸引孔内の空気を吸引することで、加熱加圧面31に当接された部材を吸着して保持することが可能となっている。また、加熱加圧ツール3には、加熱加圧面31で保持した部材を搬送できるように、モータ等の駆動部(不図示)が設けられている。このように、加熱加圧ツール3には、加熱加圧面31に当接した部材を吸着して保持し、保持した部材を搬送する吸着保持手段が設けられている。なお、加熱加圧ツール3はステージ6の周囲を移動するため、加熱加圧ツール3の大きさはステージ6の周囲に設けられている不図示の隣接部品に接触しない程度の大きさであることが好ましい。   The heating and pressurizing surface 31 is provided with a suction hole (not shown), and suction means (not shown) such as a pump is connected to the suction hole. By sucking the air in the suction hole by this suction means, the member in contact with the heating and pressing surface 31 can be sucked and held. The heating and pressing tool 3 is provided with a drive unit (not shown) such as a motor so that the member held on the heating and pressing surface 31 can be conveyed. As described above, the heating and pressing tool 3 is provided with suction holding means for sucking and holding the member in contact with the heating and pressing surface 31 and transporting the held member. In addition, since the heating and pressing tool 3 moves around the stage 6, the heating and pressing tool 3 has a size that does not contact an adjacent component (not shown) provided around the stage 6. Is preferred.

このような構成の接続装置100を用いて、第1電子部品1及び第2電子部品2の仮接続を行う。まず、加熱加圧ツール3により第1電子部品1の背面13を吸着して第1電子部品1を保持する。次に、保持した第1電子部品1をステージ6に載置された第2電子部品2の上方まで搬送し、第1電子部品1の接続面12と第2電子部品2の接続面22とが接続材料4を介して相対向するように位置決めを行う。そして、加熱加圧ツール3により第1電子部品1を加熱及び加圧する。これにより、図3に示すように、第1電子部品1と第2電子部品2とが仮接続される。   The first electronic component 1 and the second electronic component 2 are temporarily connected using the connection device 100 having such a configuration. First, the back surface 13 of the first electronic component 1 is sucked by the heating and pressing tool 3 to hold the first electronic component 1. Next, the held first electronic component 1 is conveyed to above the second electronic component 2 placed on the stage 6, and the connection surface 12 of the first electronic component 1 and the connection surface 22 of the second electronic component 2 are connected. Positioning is performed so as to face each other through the connecting material 4. Then, the first electronic component 1 is heated and pressurized by the heating and pressing tool 3. Thereby, as shown in FIG. 3, the 1st electronic component 1 and the 2nd electronic component 2 are temporarily connected.

仮接続の際の加熱加圧ツール3の温度は、接続材料4が軟化して第1電子部品1及び第2電子部品2に貼りつく一方、接続材料4の硬化反応が進行しない程度の温度であり、例えば、60℃〜100℃である。また、仮接続の際の加熱加圧ツール3の圧力は、接続材料4が第1電子部品1及び第2電子部品2に貼りつき、搬送の際の振動などによって仮接続された第1電子部品1及び第2電子部品2が動いたり剥がれたりしないように固定される程度の圧力であって、さらに、過度に接続材料4が変形したり、接続材料4が第1電子部品1及び第2電子部品2の間からはみ出さない程度の圧力であり、例えば、0.1〜1.5MPa程度である。   The temperature of the heating and pressurizing tool 3 at the time of temporary connection is such a temperature that the connecting material 4 is softened and sticks to the first electronic component 1 and the second electronic component 2 while the curing reaction of the connecting material 4 does not proceed. Yes, for example, 60 ° C to 100 ° C. In addition, the pressure of the heating and pressing tool 3 at the time of temporary connection is such that the connection material 4 sticks to the first electronic component 1 and the second electronic component 2 and is temporarily connected by vibration during transportation. The pressure is such that the first and second electronic components 2 are fixed so that they do not move or peel off, and the connecting material 4 is excessively deformed, or the connecting material 4 becomes the first electronic component 1 and the second electronic component. The pressure is such that it does not protrude from between the components 2, and is, for example, about 0.1 to 1.5 MPa.

図4は、加熱加圧ツールと電子部品との間にツール保護材が介された状態を示す模式断面図である。図4に示すように、本実施形態に係る半導体装置の製造方法では、次に、加熱加圧ツール3と第1電子部品1との間にツール保護材5を介在させる。   FIG. 4 is a schematic cross-sectional view showing a state in which a tool protective material is interposed between the heating and pressing tool and the electronic component. As shown in FIG. 4, in the method for manufacturing a semiconductor device according to this embodiment, a tool protection material 5 is then interposed between the heating and pressing tool 3 and the first electronic component 1.

ツール保護材5は、後述する本接続における加熱及び加圧の際、第1電子部品1及び第2電子部品2の間からはみ出した接続材料4が加熱加圧ツール3に付着することを防止するためのものである。ツール保護材5は、板状を呈しており、加熱加圧面31と同等の大きさとなっている。このため、加熱及び加圧の際、第1電子部品1及び第2電子部品2の間からはみ出した接続材料4が加熱加圧ツール3に付着することが抑制されると共に、ツール保護材5における放熱量の増加を抑制でき、電子部品へ十分熱を与えることができる。   The tool protection material 5 prevents the connection material 4 protruding from between the first electronic component 1 and the second electronic component 2 from adhering to the heating and pressing tool 3 during heating and pressurization in the main connection described later. Is for. The tool protection member 5 has a plate shape and has the same size as the heating and pressing surface 31. For this reason, at the time of heating and pressing, the connection material 4 protruding from between the first electronic component 1 and the second electronic component 2 is suppressed from adhering to the heating and pressing tool 3, and An increase in the amount of heat radiation can be suppressed, and sufficient heat can be applied to the electronic component.

ツール保護材5は、金属箔、シリコンチップ、及びセラミックシートのいずれか一つから形成されている。ツール保護材5として金属箔を用いる場合、アルミ箔や銅箔等を用いることができる。このうち、市販品を容易に入手できる点で、アルミ箔を用いることが好ましい。ツール保護材5としてアルミ箔を用いる場合、その厚みに特に制限が無いが、一般的に入手できる10μm程度の厚みのものを用いることが好ましい。また、ツール保護材5としてアルミ箔を用いる場合、当該アルミ箔に折れ曲がりやしわがないことが好ましい。折れ曲がりやしわをなくすと、背面13と加熱加圧面31との間の平行度を良好にすることができ、加熱及び加圧の際に傾きが発生することを抑制できる。   The tool protection material 5 is formed from any one of a metal foil, a silicon chip, and a ceramic sheet. When a metal foil is used as the tool protective material 5, an aluminum foil, a copper foil, or the like can be used. Among these, it is preferable to use an aluminum foil in that a commercially available product can be easily obtained. When an aluminum foil is used as the tool protective material 5, the thickness is not particularly limited, but it is preferable to use a generally available thickness of about 10 μm. Moreover, when using aluminum foil as the tool protection material 5, it is preferable that the said aluminum foil does not bend and wrinkle. When bending and wrinkles are eliminated, the parallelism between the back surface 13 and the heating and pressing surface 31 can be improved, and the occurrence of inclination during heating and pressing can be suppressed.

ツール保護材5としてシリコンチップを用いる場合、鏡面処理したシリコンチップ、酸化膜付のシリコンチップ、及び窒化膜付のシリコンチップのいずれかのシリコンチップを用いることが好ましい。シリコンチップの厚みは、好ましくは150μm〜700μmであり、より好ましくは400μm〜700μmである。シリコンチップが150μm以上であれば、加熱及び加熱の際に、第1電子部品1及び第2電子部品2の間からはみ出した接続材料4によって背面13に付着したツール保護材5を当該背面13から剥がす際、ツール保護材5が割れることが抑制される。   When a silicon chip is used as the tool protection member 5, it is preferable to use any one of a mirror-finished silicon chip, a silicon chip with an oxide film, and a silicon chip with a nitride film. The thickness of the silicon chip is preferably 150 μm to 700 μm, more preferably 400 μm to 700 μm. If the silicon chip is 150 μm or more, the tool protection material 5 attached to the back surface 13 by the connecting material 4 protruding from between the first electronic component 1 and the second electronic component 2 during the heating and heating is removed from the back surface 13. When peeling off, it is suppressed that the tool protection material 5 is cracked.

ツール保護材5としてセラミックシートを用いる場合、耐熱性、放射性、耐腐食性、及び金属との密着性に優れた完全無機質のシリカアルミナ系のセラミックシートを用いることが好ましい。   When a ceramic sheet is used as the tool protective material 5, it is preferable to use a completely inorganic silica-alumina-based ceramic sheet excellent in heat resistance, radiation, corrosion resistance, and adhesion to metal.

背面13と当接するツール保護材5の表面には、第1電子部品1の特性を悪化させない程度に、離型処理剤が塗布されている。離型処理材としては、例えば市販のシリコン系離型処理剤が用いられる。   A mold release treatment agent is applied to the surface of the tool protection member 5 in contact with the back surface 13 to such an extent that the characteristics of the first electronic component 1 are not deteriorated. As the release treatment material, for example, a commercially available silicon release treatment agent is used.

ここで、図8は、ツール保護材をトレーに収納した状態を示す斜視図である。図8に示すように、ツール保護材5は、トレー7に収納されており、加熱加圧ツール3に吸着されて搬送される。加熱加圧ツール3は高温に昇温されるため、トレー7は金属性であることが好ましい。   Here, FIG. 8 is a perspective view showing a state in which the tool protection material is stored in the tray. As shown in FIG. 8, the tool protection material 5 is accommodated in the tray 7, and is sucked and conveyed by the heating and pressing tool 3. Since the heating and pressing tool 3 is heated to a high temperature, the tray 7 is preferably metallic.

このようなツール保護材5を、加熱加圧ツール3により吸着してトレー7から搬送し、図4に示すように、加熱加圧ツール3の加熱加圧面31と第1電子部品1の背面13との間に介在させる。   Such a tool protection material 5 is adsorbed by the heating / pressurizing tool 3 and conveyed from the tray 7, and as shown in FIG. 4, the heating / pressurizing surface 31 of the heating / pressurizing tool 3 and the back surface 13 of the first electronic component 1. Intervene between.

図5は、相対向する電子部品を本接続する工程を示す模式断面図である。図5に示すように、本実施形態に係る半導体装置の製造方法では、次に、第1電子部品1と第2電子部品2との本接続を行う。この本接続は、加熱加圧面31と背面13との間にツール保護材5を介在させた後、すぐに行われる。この際、加熱及び加圧によって接続材料4が第1電子部品1及び第2電子部品2の間から絞りだされてはみ出し、第1接続端子11及び第2接続端子21が接続される。また、第1電子部品1及び第2電子部品2の間からはみ出した接続材料4は、ツール保護材5に付着する。   FIG. 5 is a schematic cross-sectional view showing a process of permanently connecting electronic components facing each other. As shown in FIG. 5, in the method for manufacturing the semiconductor device according to the present embodiment, next, the main connection between the first electronic component 1 and the second electronic component 2 is performed. This main connection is performed immediately after the tool protective material 5 is interposed between the heating and pressing surface 31 and the back surface 13. At this time, the connection material 4 is squeezed out from between the first electronic component 1 and the second electronic component 2 by heating and pressurization, and the first connection terminal 11 and the second connection terminal 21 are connected. Further, the connection material 4 protruding from between the first electronic component 1 and the second electronic component 2 adheres to the tool protection material 5.

本接続の際の加熱加圧ツール3の温度は、接続材料4の硬化が進行し、第1接続端子11及び第2接続端子21が接続される温度であることが好ましい。例えば、接続材料4がエポキシ樹脂を含む材料であり、第1接続端子11及び第2接続端子21がはんだである場合、接続材料4の温度が240℃〜260℃に達するように加熱加圧ツール3の温度を調整する。また、本接続の際の加熱加圧ツール3の圧力は、第1接続端子11及び第2接続端子21の間に接続材料4が介在したまま残ることなく、第1接続端子11及び第2接続端子21が当接する圧力であり、例えば、0.1〜1.5MPa程度である。   It is preferable that the temperature of the heating and pressing tool 3 at the time of this connection is a temperature at which the connection material 4 is cured and the first connection terminal 11 and the second connection terminal 21 are connected. For example, when the connection material 4 is a material containing an epoxy resin and the first connection terminal 11 and the second connection terminal 21 are solder, a heating and pressing tool is used so that the temperature of the connection material 4 reaches 240 ° C. to 260 ° C. Adjust the temperature of 3. Further, the pressure of the heating and pressing tool 3 at the time of the main connection does not remain with the connection material 4 interposed between the first connection terminal 11 and the second connection terminal 21, and the first connection terminal 11 and the second connection The pressure with which the terminal 21 abuts, for example, about 0.1 to 1.5 MPa.

図6は、本接続後、電子部品から加熱加圧ツールが外された状態を示す模式断面図である。図6に示すように、本接続後、背面13から加熱加圧ツール3を外すと、はみ出した接続材料4によってツール保護材5が背面13に付着した状態となる。   FIG. 6 is a schematic cross-sectional view showing a state where the heating and pressing tool is removed from the electronic component after the main connection. As illustrated in FIG. 6, after the main connection, when the heating and pressing tool 3 is removed from the back surface 13, the tool protection material 5 is attached to the back surface 13 by the protruding connection material 4.

図7は、電子部品からツール保護材が除去された状態を示す模式断面図である。図7に示すように、背面13からツール保護材5を除去すると、第1電子部品1及び第2電子部品2からなる接続体が得られる。ツール保護材5は、接続材料4の冷却後に、例えば、作業者がピンセット等を用いて手動で背面13から剥ぎ取ることや、粘着テープによって背面13から剥ぎ取ることで除去できる。   FIG. 7 is a schematic cross-sectional view showing a state where the tool protection material is removed from the electronic component. As shown in FIG. 7, when the tool protection member 5 is removed from the back surface 13, a connection body including the first electronic component 1 and the second electronic component 2 is obtained. The tool protection material 5 can be removed after the connection material 4 is cooled, for example, by an operator manually peeling it from the back surface 13 using tweezers or the like, or by peeling it from the back surface 13 with an adhesive tape.

以上、本実施形態に係る半導体装置の製造方法では、第1電子部品1を加熱加圧ツール3によって加熱及び加圧する際に、加熱加圧面31と被加熱加圧面である背面13との間に、金属箔、シリコンチップ、及びセラミックシートのいずれか一つからなるツール保護材5が介される。これら金属箔、シリコンチップ、及びセラミックシートは、はんだ溶融温度よりも高温である300℃程度でも分解することがないため、ツール保護材5が分解することなく、接続材料4が加熱加圧面31に付着することを防止することができる。よって、本実施形態に係る半導体装置の製造方法では、第1電子部品1及び第2電子部品2を接続して半導体装置を製造する際に、加熱加圧ツール3に接続材料4が付着することを防止するツール保護材5において不具合を発生させることなく、加熱加圧ツール3の汚染を防止し、歩留りを向上させることができる。   As described above, in the method for manufacturing a semiconductor device according to the present embodiment, when the first electronic component 1 is heated and pressed by the heating and pressing tool 3, the heating and pressing surface 31 and the back surface 13 that is the heated and pressed surface are interposed. A tool protective material 5 made of any one of metal foil, silicon chip, and ceramic sheet is interposed. Since these metal foil, silicon chip, and ceramic sheet are not decomposed even at about 300 ° C., which is higher than the solder melting temperature, the tool protective material 5 is not decomposed, and the connection material 4 is applied to the heating and pressing surface 31. Adhesion can be prevented. Therefore, in the manufacturing method of the semiconductor device according to the present embodiment, the connection material 4 adheres to the heating and pressing tool 3 when the first electronic component 1 and the second electronic component 2 are connected to manufacture the semiconductor device. It is possible to prevent the heating and pressing tool 3 from being contaminated and improve the yield without causing any trouble in the tool protection material 5 that prevents the above.

また、本実施形態に係る半導体装置の製造方法では、加熱加圧面31の面積を、被加熱加圧面である背面13の面積以上としているため、背面13を均一に加圧できると共に、第1電子部品1を十分加熱することができる。   Further, in the method of manufacturing a semiconductor device according to the present embodiment, the area of the heating and pressing surface 31 is equal to or larger than the area of the back surface 13 that is the surface to be heated and pressed. The component 1 can be sufficiently heated.

また、本実施形態に係る半導体装置の製造方法では、ツール保護材5を、吸着保持手段が設けられている加熱加圧ツール3を用いて当該加熱加圧ツール3の加熱加圧面31と被加熱加圧面である第1電子部品1の背面13との間に搬送するため、すぐ加熱及び加圧を行うことが可能であり、製造サイクルを短縮して量産対応することができる。   In the method for manufacturing a semiconductor device according to the present embodiment, the tool protective material 5 is heated by using the heating / pressurizing tool 3 provided with the suction holding means and the heating / pressurizing surface 31 of the heating / pressurizing tool 3. Since it conveys between the back surfaces 13 of the 1st electronic component 1 which is a pressurization surface, it is possible to heat and press immediately, and it can respond to mass production by shortening a manufacturing cycle.

また、本実施形態に係る半導体装置の製造方法では、背面13と当接するツール保護材5の表面に離型処理剤を塗布しているため、背面13から容易にツール保護材5を剥がすことができる。   Further, in the method for manufacturing a semiconductor device according to the present embodiment, since the release treatment agent is applied to the surface of the tool protection material 5 that contacts the back surface 13, the tool protection material 5 can be easily peeled off from the back surface 13. it can.

以下、実施例を挙げて本発明に係る半導体装置の製造方法を具体的に説明する。但し、本発明はこれら実施例に限定されるものではない。   Hereinafter, a method for manufacturing a semiconductor device according to the present invention will be specifically described with reference to examples. However, the present invention is not limited to these examples.

<接続材料の準備>
トルエンと酢酸エチルとの混合溶媒中に、フェノキシ樹脂(東都化成株式会社製ZX1356−2)10質量部、フェノキシ樹脂(東都化成株式会社製FX−293)20質量部、エポキシ樹脂(ジャパンエポキシレジン株式会社製1032H60)30質量部、エポキシ樹脂(東都化成株式会社製YDF−170)20質量部、マイクロカプセル型潜在性硬化剤含有マスターバッチ(旭化成エレクトロニクス株式会社製HX3941HP)20質量部、アジピン酸(関東化学製)5質量部、及び平均粒径0.8μmのムライト粒子75質量部を溶解及び分散し、ワニスを得た。得られたワニスを支持体である厚さ50μmのポリエチレンテレフタレート(以下、「PET」という)フィルム(帝人デュポンフィルム社製AH−3)にロールコータを用いて塗布し、70℃のオーブンで10分間乾燥させて、厚み30μmの接続材料を得た。
<Preparation of connection material>
In a mixed solvent of toluene and ethyl acetate, 10 parts by mass of phenoxy resin (ZX1356-2 manufactured by Toto Kasei Co., Ltd.), 20 parts by mass of phenoxy resin (FX-293 manufactured by Toto Kasei Co., Ltd.), epoxy resin (Japan Epoxy Resin Co., Ltd.) 30 parts by mass of 1032H60 manufactured by company, 20 parts by mass of epoxy resin (YDF-170 manufactured by Toto Kasei Co., Ltd.), 20 parts by mass of a master capsule containing a microcapsule type latent curing agent (HX3941HP manufactured by Asahi Kasei Electronics Co., Ltd.), adipic acid (Kanto) (Chemical) 5 parts by mass and 75 parts by mass of mullite particles having an average particle size of 0.8 μm were dissolved and dispersed to obtain a varnish. The obtained varnish was applied to a 50 μm-thick polyethylene terephthalate (hereinafter referred to as “PET”) film (AH-3 manufactured by Teijin DuPont Films), which is a support, using a roll coater, and then in an oven at 70 ° C. for 10 minutes. It was made to dry and the connection material of thickness 30micrometer was obtained.

(実施例1)
<半導体チップへの接続材料の貼り付け>
銅ピラー先端に鉛フリーはんだ層(Sn−3.5Ag:融点221℃)を有する構造の接続端子が形成された半導体チップ(日立超LSIシステムズ製JTEG PHASE11_80、サイズ7.3mm×7.3mm、接続端子ピッチ80μm、接続端子数328、厚み0.15mm)を準備した。ステージ温度40℃に設定された熱圧着装置のステージ上に、接続端子が形成された接続面が上を向くように半導体チップを設置した。接続材料を支持体と共に7.5mm×7.5mmに切り出した。切り出した接続材料の接着面が半導体チップの接続面に当接するように、ステージ上に設置された半導体チップに接続材料を積層した。クッション材として厚さ30μmのシリコーンゴムシートを接続材料に積層した。熱圧着装置の温度を110℃に設定し、荷重27N(圧力が0.5MPaとなる荷重)で5秒間プレスした。接続材料から支持体を除去し、接続面に接続材料が接着された状態の半導体チップを得た。
(Example 1)
<Affixing connection material to semiconductor chip>
A semiconductor chip (JTEG PHASE11_80 manufactured by Hitachi Ultra LSI Systems, size 7.3 mm x 7.3 mm, connected) having a connection terminal having a lead-free solder layer (Sn-3.5 Ag: melting point 221 ° C) at the tip of the copper pillar A terminal pitch of 80 μm, a connection terminal number of 328, and a thickness of 0.15 mm) were prepared. A semiconductor chip was placed on the stage of a thermocompression bonding apparatus set at a stage temperature of 40 ° C. so that the connection surface on which the connection terminals were formed faced up. The connecting material was cut into 7.5 mm × 7.5 mm together with the support. The connecting material was laminated on the semiconductor chip placed on the stage so that the cut-out bonding surface of the connecting material was in contact with the connecting surface of the semiconductor chip. A silicone rubber sheet having a thickness of 30 μm was laminated on the connection material as a cushioning material. The temperature of the thermocompression bonding apparatus was set to 110 ° C., and pressing was performed for 5 seconds with a load of 27 N (a load with a pressure of 0.5 MPa). The support was removed from the connection material to obtain a semiconductor chip with the connection material adhered to the connection surface.

<基板及び半導体チップの仮接続>
基板として、プリフラックス処理によって防錆皮膜が形成された銅配線パターンを接続面に有するガラスエポキシ基板を準備した。ステージ温度40℃に設定されたフリップチップボンダー(パナソニックファクトリーソリューションズ製FCB3)のステージ上に基板を吸着して固定した。接続材料が接着された状態の上記半導体チップをフリップチップボンダーのチップトレーに設置した。加熱加圧面のサイズが10mm×10mmである吸引機構付の加熱加圧ツールでチップトレーに設置された半導体チップを吸着して保持し、ステージ上に固定された基板の上方まで搬送して、位置合わせを行った。そして、荷重25N、温度100℃(接続材料の到達温度90℃)で5秒間加熱及び加圧を行い、半導体チップ及び基板を仮接続した。なお、接続材料の到達温度は、K型熱電対を半導体チップ及び基板の間に挟んで測定した(以下同様)。
<Temporary connection of substrate and semiconductor chip>
As a substrate, a glass epoxy substrate having a copper wiring pattern with a rust preventive film formed by preflux treatment on the connection surface was prepared. The substrate was adsorbed and fixed on the stage of a flip chip bonder (FCB3 manufactured by Panasonic Factory Solutions) set at a stage temperature of 40 ° C. The semiconductor chip with the connection material adhered thereto was placed on a chip tray of a flip chip bonder. The semiconductor chip placed on the chip tray is sucked and held by a heating / pressurizing tool with a suction mechanism whose size of the heating / pressurizing surface is 10 mm × 10 mm, and transported to above the substrate fixed on the stage. Combined. Then, heating and pressurization were performed for 5 seconds at a load of 25 N and a temperature of 100 ° C. (connecting material reached temperature of 90 ° C.) to temporarily connect the semiconductor chip and the substrate. The ultimate temperature of the connection material was measured by sandwiching a K-type thermocouple between the semiconductor chip and the substrate (the same applies hereinafter).

<基板及び半導体チップの本接続>
厚さ12μmのアルミ箔(市販品)を10mm×10mmに切り出し、金属性トレーに収納した。加熱加圧ツールを210℃に設定し、アルミ箔の外形形状を認識して当該アルミ箔が加熱加圧面に収まるように位置合わせした後、アルミ箔を加熱加圧ツールで吸着して保持し、ステージ上の半導体チップの上方まで搬送して位置合わせを行った。そして、荷重25N、温度210℃(接続材料の到達温度180℃)で10秒間加熱及び加圧を行い、さらに温度を290℃(接続材料の到達温度250℃)まで昇温しながら10秒間加熱及び加圧を行った。これにより、接続端子先端のはんだが溶融し、接続端子と銅配線とが接続され、半導体チップと基板とからなる接続体が得られた。接続後、加熱加圧ツールを上昇させて接続体から外し、接続体を室温になるまで冷却させた後、接続体に付着したアルミ箔を除去した。アルミ箔の除去後、接続材料の一部がアルミ箔に付着していたが、加熱加圧ツールには接続材料は付着しておらず、ツール汚染は発生しなかった。接続体の抵抗値を測定した結果、抵抗値は半導体チップが良好に接続されている状態を示す12Ωであり、接続が良好に行われたことが確認された。
<Main connection of substrate and semiconductor chip>
A 12 μm-thick aluminum foil (commercially available) was cut into 10 mm × 10 mm and stored in a metallic tray. After setting the heating and pressing tool to 210 ° C., recognizing the outer shape of the aluminum foil and aligning the aluminum foil so that it fits on the heating and pressing surface, the aluminum foil is adsorbed and held by the heating and pressing tool, The wafer was positioned above the semiconductor chip on the stage and aligned. Then, heating and pressurizing are performed for 10 seconds at a load of 25 N and a temperature of 210 ° C. (arrival temperature of the connecting material of 180 ° C.), and further heating and pressurizing for 10 seconds while raising the temperature to 290 ° C. Pressurization was performed. Thereby, the solder at the tip of the connection terminal was melted, the connection terminal and the copper wiring were connected, and a connection body composed of the semiconductor chip and the substrate was obtained. After the connection, the heating and pressing tool was raised and removed from the connection body, and the connection body was cooled to room temperature, and then the aluminum foil adhered to the connection body was removed. After the removal of the aluminum foil, a part of the connecting material adhered to the aluminum foil, but the connecting material did not adhere to the heating and pressing tool, and no tool contamination occurred. As a result of measuring the resistance value of the connection body, it was confirmed that the resistance value was 12Ω indicating a state in which the semiconductor chip was well connected, and the connection was made well.

(実施例2)
半導体チップと当接するアルミ箔の面に、スプレー式離型処理剤(信越シリコーン製KF−965SP)を吹きつけて離型処理を施した点以外は、実施例1と同様である。接続体からのアルミ箔の除去後、接続材料の一部がアルミ箔に付着していたが、加熱加圧ツールには接続材料は付着しておらず、ツール汚染は発生しなかった。接続体の抵抗値を測定した結果、抵抗値は半導体チップが良好に接続されている状態を示す12Ωであり、接続が良好に行われたことが確認された。
(Example 2)
The same as Example 1 except that a spray-type release treatment agent (KF-965SP manufactured by Shin-Etsu Silicone) was sprayed onto the surface of the aluminum foil that is in contact with the semiconductor chip. After removal of the aluminum foil from the connection body, a part of the connection material adhered to the aluminum foil, but the connection material did not adhere to the heating and pressing tool, and no tool contamination occurred. As a result of measuring the resistance value of the connection body, it was confirmed that the resistance value was 12Ω indicating a state in which the semiconductor chip was well connected, and the connection was made well.

(実施例3)
アルミ箔に代えて、表面ミラー処理した厚さ550μmのシリコンチップを使用した点以外は、実施例1と同様である。接続体からのシリコンチップの除去後、接続材料の一部がシリコンチップに付着していたが、加熱加圧ツールには接続材料は付着しておらず、ツール汚染は発生しなかった。接続体の抵抗値を測定した結果、抵抗値は半導体チップが良好に接続されている状態を示す12Ωであり、接続が良好に行われたことが確認された。
(Example 3)
The same as Example 1 except that a silicon chip having a thickness of 550 μm subjected to surface mirror treatment was used instead of the aluminum foil. After removal of the silicon chip from the connection body, a part of the connection material adhered to the silicon chip, but the connection material did not adhere to the heating and pressing tool, and no tool contamination occurred. As a result of measuring the resistance value of the connection body, it was confirmed that the resistance value was 12Ω indicating a state in which the semiconductor chip was well connected, and the connection was made well.

(比較例1)
ツール保護材であるアルミ箔を使用しなかった点以外は、実施例1と同様である。本接続の際、接続材料が半導体チップと基板との間からはみ出し、加熱加圧ツールに付着した。冷却後、加熱加圧ツールを上昇させて、加熱加圧ツールを接続体から剥ぎ取った。剥ぎ取り後、加熱加圧ツールには接続材料が付着しており、製造を継続するためには、カッターを使用して付着した接続材料を加熱加圧ツールから削り落とす必要があった。接続体の抵抗値を測定した結果、接続体の一部に断線が生じており、抵抗値は測定できなかった。このことから、本発明に係る半導体の製造方法では、接続された電子部品から加熱加圧ツールを外す際、はみ出した接続材料によって電子部品が引っ張られて断線が発生するという不具合を防止できるという効果を得られることが確認できた。
(Comparative Example 1)
Example 1 is the same as Example 1 except that the aluminum foil as a tool protective material was not used. During this connection, the connection material protruded from between the semiconductor chip and the substrate and adhered to the heating and pressing tool. After cooling, the heating and pressing tool was raised, and the heating and pressing tool was peeled off from the connection body. After peeling off, the connecting material is attached to the heating and pressing tool, and in order to continue the production, it is necessary to scrape the attached connecting material from the heating and pressing tool using a cutter. As a result of measuring the resistance value of the connection body, disconnection occurred in a part of the connection body, and the resistance value could not be measured. From this, in the semiconductor manufacturing method according to the present invention, when removing the heating and pressing tool from the connected electronic component, it is possible to prevent a problem that the electronic component is pulled by the protruding connection material and disconnection occurs. It was confirmed that

(比較例2)
アルミ箔に代えて、厚さ50μmのテフロン(登録商標)シート(ニチアス製ナフロンシート)を使用した点以外は、実施例1と同様である。加熱加圧ツールを290℃まで昇温した際、テフロン(登録商標)シートが溶解して異臭がしたため、本接続を中断する必要があった。
(Comparative Example 2)
It is the same as that of Example 1 except that a Teflon (registered trademark) sheet having a thickness of 50 μm (Nitrous Naflon sheet) is used instead of the aluminum foil. When the temperature of the heating / pressurizing tool was raised to 290 ° C., the Teflon (registered trademark) sheet was melted and had a bad odor, so it was necessary to interrupt this connection.

以上より、本発明に係る半導体装置の製造方法では、電子部品を接続して半導体装置を製造する際に、加熱加圧ツールと電子部品との間にアルミ箔、シリコンチップ、及びセラミックシートのいずれか一つからなるツール保護材を介することで、ツール保護材において不具合を発生させることなく、加熱加圧ツールの汚染を防止し、歩留りを向上できることが確認できた。   As described above, in the method for manufacturing a semiconductor device according to the present invention, any one of an aluminum foil, a silicon chip, and a ceramic sheet is interposed between the heating and pressing tool and the electronic component when the electronic component is connected to manufacture the semiconductor device. It was confirmed that by using such a tool protection material, contamination of the heating and pressing tool can be prevented and the yield can be improved without causing problems in the tool protection material.

1…第1電子部品、2…第2電子部品、3…加熱加圧ツール、4…接続材料、5…ツール保護材、13…背面(被加熱加圧面)、31…加熱加圧面。   DESCRIPTION OF SYMBOLS 1 ... 1st electronic component, 2 ... 2nd electronic component, 3 ... Heating and pressing tool, 4 ... Connection material, 5 ... Tool protection material, 13 ... Back surface (heated and pressed surface), 31 ... Heating and pressing surface.

Claims (5)

相対向する電子部品の間に接続材料を介在させ、前記相対向する電子部品の少なくともいずれか一方の電子部品を加熱加圧ツールによって加熱及び加圧し、前記相対向する電子部品を接続して半導体装置を製造する半導体装置の製造方法であって、
前記加熱加圧ツールの加熱加圧面と前記電子部品の被加熱加圧面との間に、前記加熱加圧面と同等の大きさで、シリコンチップ、セラミックシート、及び厚さが12μm以下の金属箔のいずれか一つからなり、300℃で分解しないツール保護材を介在させて前記加熱及び前記加圧を行うこと、を特徴とする半導体装置の製造方法。
A connecting material is interposed between the opposing electronic components, and at least one of the opposing electronic components is heated and pressed by a heating and pressing tool, and the opposing electronic components are connected to form a semiconductor. A method of manufacturing a semiconductor device for manufacturing a device,
Between the heating and pressing surface of the heating and pressing tool and the heated and pressing surface of the electronic component, a silicon chip, a ceramic sheet, and a metal foil having a thickness of 12 μm or less, having the same size as the heating and pressing surface. A method for manufacturing a semiconductor device, comprising the step of performing the heating and the pressurization with a tool protective material that does not decompose at 300 ° C.
相対向する電子部品の間に接続材料を介在させ、前記相対向する電子部品の少なくともいずれか一方の電子部品を加熱加圧ツールによって加熱及び加圧し、前記相対向する電子部品を接続して半導体装置を製造する半導体装置の製造方法であって、
前記加熱加圧ツールの加熱加圧面と前記電子部品の被加熱加圧面との間に、前記加熱加圧面と同等の大きさで、シリコンチップ、セラミックシート、及び厚さが12μm以下の金属箔のいずれか一つからなるツール保護材(ただし、フッ素樹脂層を備えるツール保護材を除く)を介在させて前記加熱及び前記加圧を行うこと、を特徴とする半導体装置の製造方法。
A connecting material is interposed between the opposing electronic components, and at least one of the opposing electronic components is heated and pressed by a heating and pressing tool, and the opposing electronic components are connected to form a semiconductor. A method of manufacturing a semiconductor device for manufacturing a device,
Between the heating and pressing surface of the heating and pressing tool and the heated and pressing surface of the electronic component, a silicon chip, a ceramic sheet, and a metal foil having a thickness of 12 μm or less, having the same size as the heating and pressing surface. A method of manufacturing a semiconductor device, characterized in that the heating and the pressurization are performed with a tool protective material (excluding a tool protective material having a fluororesin layer) made of any one interposed.
前記加熱加圧面の面積を、前記被加熱加圧面の面積以上とすることを特徴とする請求項1又は2に記載の半導体装置の製造方法。 The method of manufacturing a semiconductor device according to claim 1 or 2, characterized in that said area of heat pressing surface, the more area of the heated pressing surface. 前記ツール保護材を、吸着保持手段を用いて前記加熱加圧ツールの前記加熱加圧面と前記電子部品の前記被加熱加圧面との間に搬送することを特徴とする請求項1〜のいずれか一項に記載の半導体装置の製造方法。 Any said tool protection material, according to claim 1 to 3, characterized by conveying between the heated pressing surface of the heating surfaces and the electronic component of the heating and pressing tool with a suction holding means A method for manufacturing a semiconductor device according to claim 1. 前記ツール保護材の表面に、離型処理剤を塗布することを特徴とする請求項1〜のいずれか一項に記載の半導体装置の製造方法。 The method of manufacturing a semiconductor device according to any one of claims 1 to 4, characterized in that the the surface of the tool protection material, applying a parting agent.
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