JP5638353B2 - アンテナ素子の磁芯コアの製造方法 - Google Patents
アンテナ素子の磁芯コアの製造方法 Download PDFInfo
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- JP5638353B2 JP5638353B2 JP2010255323A JP2010255323A JP5638353B2 JP 5638353 B2 JP5638353 B2 JP 5638353B2 JP 2010255323 A JP2010255323 A JP 2010255323A JP 2010255323 A JP2010255323 A JP 2010255323A JP 5638353 B2 JP5638353 B2 JP 5638353B2
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- magnetic core
- antenna element
- laminated
- magnetic
- thin films
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- Manufacturing Cores, Coils, And Magnets (AREA)
Description
1a 薄膜
2 レーザー溶接部
A 絶縁テープ
B コイル
Claims (1)
- 鉄系アモルファス磁性合金又はコバルト系アモルファス磁性合金で形成された複数の薄膜を積層させたアンテナ素子の磁芯コアであって、
前記アンテナ素子の磁芯コアの積層させた複数の薄膜にレーザー光線を照射して、
該積層させた複数の薄膜の側面の複数箇所にレーザー溶接部を形成して固着し、
前記薄膜が、前記レーザー溶接部との境界において、深さ方向に実質的に20μmの再結晶化部分を有することを特徴とするアンテナ素子の磁芯コアの製造方法。
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JP2010255323A JP5638353B2 (ja) | 2010-10-28 | 2010-10-28 | アンテナ素子の磁芯コアの製造方法 |
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JP2010255323A JP5638353B2 (ja) | 2010-10-28 | 2010-10-28 | アンテナ素子の磁芯コアの製造方法 |
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JP2012095255A JP2012095255A (ja) | 2012-05-17 |
JP5638353B2 true JP5638353B2 (ja) | 2014-12-10 |
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JP2010255323A Active JP5638353B2 (ja) | 2010-10-28 | 2010-10-28 | アンテナ素子の磁芯コアの製造方法 |
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Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6142114A (ja) * | 1984-08-06 | 1986-02-28 | Mitsui Petrochem Ind Ltd | 積層アモルフアス磁性合金薄帯の端部固定法 |
JPS6246912A (ja) * | 1985-08-22 | 1987-02-28 | Mitsubishi Chem Ind Ltd | 高純度ケイ素の製造方法 |
JPH11186061A (ja) * | 1997-12-18 | 1999-07-09 | Toshiba Corp | 小型トランス |
JP2003110341A (ja) * | 2001-09-27 | 2003-04-11 | Mitsubishi Materials Corp | アンテナの磁芯部材 |
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