JP5632627B2 - Quartz crystal - Google Patents
Quartz crystal Download PDFInfo
- Publication number
- JP5632627B2 JP5632627B2 JP2010058440A JP2010058440A JP5632627B2 JP 5632627 B2 JP5632627 B2 JP 5632627B2 JP 2010058440 A JP2010058440 A JP 2010058440A JP 2010058440 A JP2010058440 A JP 2010058440A JP 5632627 B2 JP5632627 B2 JP 5632627B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- vibration
- main
- mounting
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910052904 quartz Inorganic materials 0.000 title claims description 77
- 239000010453 quartz Substances 0.000 title claims description 77
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials data:image/svg+xml;base64,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 data:image/svg+xml;base64,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 O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 77
- 238000001039 wet etching Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 description 22
- 230000001629 suppression Effects 0.000 description 11
- 238000005530 etching Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 230000005284 excitation Effects 0.000 description 9
- 238000005520 cutting process Methods 0.000 description 8
- 230000004048 modification Effects 0.000 description 8
- 238000006011 modification reaction Methods 0.000 description 8
- 239000010931 gold Substances 0.000 description 6
- 239000011651 chromium Substances 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- 230000002238 attenuated Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound data:image/svg+xml;base64,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 data:image/svg+xml;base64,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 [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 239000004575 stone Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N chromium Chemical compound data:image/svg+xml;base64,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 data:image/svg+xml;base64,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 [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000002250 progressing Effects 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000002542 deteriorative Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000003287 optical Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000000149 penetrating Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Images
Description
本発明は、水晶振動子を構成する水晶振動片に関するものである。
The present invention relates to a crystal resonator element constituting a crystal resonator.
圧電効果が期待できる材料としては、様々なものが知られているが、精度が良く安定した周波数が得られる水晶が従来から好適に使用されている。そして、この水晶を利用したデバイスの１つとして、水晶振動子が知られている。
この水晶振動子は、所定の形状に形成された水晶振動板に電極膜が形成された水晶振動片と、この水晶振動片を気密状態でパッケージングする保持器と、で主に構成されており、各種電子機器内に内蔵されている。 Various materials are known as materials that can be expected to have a piezoelectric effect. Conventionally, quartz that can obtain a stable and accurate frequency is preferably used. A crystal resonator is known as one of devices using this crystal.
This crystal unit is mainly composed of a crystal resonator element in which an electrode film is formed on a crystal diaphragm formed in a predetermined shape, and a holder for packaging the crystal resonator element in an airtight state. Built in various electronic devices.
この水晶振動子は、所定の形状に形成された水晶振動板に電極膜が形成された水晶振動片と、この水晶振動片を気密状態でパッケージングする保持器と、で主に構成されており、各種電子機器内に内蔵されている。 Various materials are known as materials that can be expected to have a piezoelectric effect. Conventionally, quartz that can obtain a stable and accurate frequency is preferably used. A crystal resonator is known as one of devices using this crystal.
This crystal unit is mainly composed of a crystal resonator element in which an electrode film is formed on a crystal diaphragm formed in a predetermined shape, and a holder for packaging the crystal resonator element in an airtight state. Built in various electronic devices.
水晶振動片は、保持器内で実装される表面実装部品とされており、実装部材を介して実装されている。この際、水晶振動片は、実装部材によって機械的に保持されているだけでなく、実装部材を介して自身の電極膜と保持器側のインナー電極とが電気的接続されるようになっている。そのため、実装部材としては、導電性接着剤や金バンプ等が好適に用いられている。
The quartz crystal resonator element is a surface-mounted component that is mounted in a cage, and is mounted via a mounting member. At this time, the crystal vibrating piece is not only mechanically held by the mounting member, but also its own electrode film and the inner electrode on the cage side are electrically connected via the mounting member. . Therefore, as the mounting member, a conductive adhesive, a gold bump or the like is preferably used.
また、水晶振動片を実装する場合には、高い実装強度を確保して品質を維持することが重要であるが、これと同時に励起された振動に極力影響を与えずに実装を行うことが重要とされている。つまり、振動特性を低下させることなく実装することが重要である。
そのため、水晶振動片に対する実装部材の位置を、強度的な観点や振動特性に考慮した観点に基づいて決定することが必要である。 In addition, when mounting a crystal resonator element, it is important to ensure high mounting strength and maintain quality, but at the same time, it is important to mount without affecting the excited vibration as much as possible. It is said that. That is, it is important to mount without deteriorating the vibration characteristics.
For this reason, it is necessary to determine the position of the mounting member with respect to the quartz crystal resonator element based on a viewpoint in consideration of strength and vibration characteristics.
そのため、水晶振動片に対する実装部材の位置を、強度的な観点や振動特性に考慮した観点に基づいて決定することが必要である。 In addition, when mounting a crystal resonator element, it is important to ensure high mounting strength and maintain quality, but at the same time, it is important to mount without affecting the excited vibration as much as possible. It is said that. That is, it is important to mount without deteriorating the vibration characteristics.
For this reason, it is necessary to determine the position of the mounting member with respect to the quartz crystal resonator element based on a viewpoint in consideration of strength and vibration characteristics.
ところで、水晶はその結晶性や圧電性によって色々な振動モードが存在しており、振動モードによって周波数を決定するパラメータが異なっている。このうち、厚みがパラメータとなる水晶振動片として、厚み滑り振動するＡＴ振動片が知られている。
このＡＴ振動片は、水晶をＡＴカット（表裏の主面がＸ軸回りにＺ軸から半時計方向に約３５度１５分の角度となるようにカット）した後に所定の厚さ及び矩形状に外形形成されたＡＴ振動板（水晶振動板）と、該ＡＴ振動板の主面に形成された電極膜と、で構成された振動片であり、電極膜に電圧が印加されるとＡＴ振動板が厚み滑り振動するものである。 Incidentally, quartz has various vibration modes depending on its crystallinity and piezoelectricity, and parameters for determining the frequency differ depending on the vibration mode. Among these, an AT vibrating piece that performs thickness-slip vibration is known as a quartz crystal vibrating piece whose thickness is a parameter.
This AT vibrating piece is formed into a predetermined thickness and rectangular shape after AT is cut (cut so that the main surfaces of the front and back surfaces are at an angle of about 35 degrees 15 minutes from the Z axis in the counterclockwise direction around the X axis). It is a vibration piece composed of an externally formed AT diaphragm (quartz crystal diaphragm) and an electrode film formed on the main surface of the AT diaphragm. When a voltage is applied to the electrode film, the AT diaphragm Oscillates in thickness and thickness.
このＡＴ振動片は、水晶をＡＴカット（表裏の主面がＸ軸回りにＺ軸から半時計方向に約３５度１５分の角度となるようにカット）した後に所定の厚さ及び矩形状に外形形成されたＡＴ振動板（水晶振動板）と、該ＡＴ振動板の主面に形成された電極膜と、で構成された振動片であり、電極膜に電圧が印加されるとＡＴ振動板が厚み滑り振動するものである。 Incidentally, quartz has various vibration modes depending on its crystallinity and piezoelectricity, and parameters for determining the frequency differ depending on the vibration mode. Among these, an AT vibrating piece that performs thickness-slip vibration is known as a quartz crystal vibrating piece whose thickness is a parameter.
This AT vibrating piece is formed into a predetermined thickness and rectangular shape after AT is cut (cut so that the main surfaces of the front and back surfaces are at an angle of about 35 degrees 15 minutes from the Z axis in the counterclockwise direction around the X axis). It is a vibration piece composed of an externally formed AT diaphragm (quartz crystal diaphragm) and an electrode film formed on the main surface of the AT diaphragm. When a voltage is applied to the electrode film, the AT diaphragm Oscillates in thickness and thickness.
このようなＡＴ振動片においては、その厚みを中央部から端部に向けて徐々に薄く形成すると、端部での振動変位の減衰量が大きくなり、中央部に振動エネルギーを閉じ込める効果を期待できることが知られている。この効果は、ＣＩ値やＱ値等の周波数特性の向上に繋がるものである。従って、ＡＴ振動片を作製する場合にはこのような形状にすることが好ましいとされている。具体的には、ＡＴ振動板の主面を凸形曲面にしたコンベックス形状や、主面の中央部と端部との間を斜面で繋いだベベル形状等である。
In such an AT resonator element, if the thickness is gradually reduced from the center toward the end, the attenuation of vibration displacement at the end increases, and the effect of confining vibration energy in the center can be expected. It has been known. This effect leads to improvement of frequency characteristics such as CI value and Q value. Therefore, it is preferable to make such a shape when manufacturing the AT vibrating piece. Specifically, a convex shape in which the main surface of the AT diaphragm is a convex curved surface, a bevel shape in which a central portion and an end portion of the main surface are connected by an inclined surface, and the like.
このうち、ベベル加工を施した水晶振動片を実装する場合において、上述した実装強度及び振動特性を考慮した圧電振動子が知られている（特許文献１参照）。
この圧電振動子においては、実装部材としてバンプを採用しており、その位置をベべリング円弧に沿って等高線状に複数配置している。しかも、圧電振動片の曲率に合わせてバンプの大きさを変化させて、保持する際の高さの違いを吸収している。
このように、バンプを等高線状に複数配置したうえ保持する際の高さの違いを吸収しているので、高い実装強度を確保している。また、振動特性に影響を与え難いベベル加工の部分にバンプを位置させているので、バンプによって振動が阻害され難く、振動特性に影響を与え難い。 Among these, when mounting a quartz vibrating piece subjected to beveling, a piezoelectric vibrator is known in consideration of the mounting strength and vibration characteristics described above (see Patent Document 1).
In this piezoelectric vibrator, bumps are employed as mounting members, and a plurality of positions are arranged along contour lines along the beveling arc. Moreover, the size of the bump is changed in accordance with the curvature of the piezoelectric vibrating piece to absorb the difference in height when it is held.
As described above, since a plurality of bumps are arranged in a contour line and the difference in height when the bumps are held is absorbed, high mounting strength is ensured. In addition, since the bump is positioned at the beveled portion that hardly affects the vibration characteristics, the vibration is not easily inhibited by the bump, and the vibration characteristics are not easily affected.
この圧電振動子においては、実装部材としてバンプを採用しており、その位置をベべリング円弧に沿って等高線状に複数配置している。しかも、圧電振動片の曲率に合わせてバンプの大きさを変化させて、保持する際の高さの違いを吸収している。
このように、バンプを等高線状に複数配置したうえ保持する際の高さの違いを吸収しているので、高い実装強度を確保している。また、振動特性に影響を与え難いベベル加工の部分にバンプを位置させているので、バンプによって振動が阻害され難く、振動特性に影響を与え難い。 Among these, when mounting a quartz vibrating piece subjected to beveling, a piezoelectric vibrator is known in consideration of the mounting strength and vibration characteristics described above (see Patent Document 1).
In this piezoelectric vibrator, bumps are employed as mounting members, and a plurality of positions are arranged along contour lines along the beveling arc. Moreover, the size of the bump is changed in accordance with the curvature of the piezoelectric vibrating piece to absorb the difference in height when it is held.
As described above, since a plurality of bumps are arranged in a contour line and the difference in height when the bumps are held is absorbed, high mounting strength is ensured. In addition, since the bump is positioned at the beveled portion that hardly affects the vibration characteristics, the vibration is not easily inhibited by the bump, and the vibration characteristics are not easily affected.
ところで、この種の圧電振動子は、近年の電子機器の小型化、コンパクト化傾向に伴って、さらなる小型化が求められている。この点は、圧電振動子の１つでもある水晶振動子に関しても同様である。
そのため、水晶振動子のサイズを決定しうる水晶振動片自体のサイズを、より小型化することが求められている。従来、水晶振動片を作製する場合、水晶から所定の切断角度で切り出された水晶板に対して機械加工で外形形成することで、水晶振動片とすることが一般的であった。しかしながら、機械加工では加工精度に限界があり、より微細で小型な水晶振動片を作製することが難しくなりつつある。そこで、現在では、水晶振動片の加工方法が、機械加工からフォトリソグラフィ技術及びエッチング加工技術を利用した方法に変化しつつあるのが現状である。 By the way, this type of piezoelectric vibrator is required to be further miniaturized with the recent trend toward downsizing and downsizing of electronic devices. This also applies to a crystal resonator that is also one of piezoelectric resonators.
For this reason, it is required to further reduce the size of the crystal resonator element itself that can determine the size of the crystal resonator. Conventionally, when producing a quartz crystal vibrating piece, it is common to form a quartz crystal vibrating piece by mechanically forming a quartz crystal plate cut out from a quartz crystal at a predetermined cutting angle. However, machining has a limit in machining accuracy, and it is becoming difficult to produce a finer and smaller quartz crystal resonator element. Therefore, at present, the processing method of the crystal vibrating piece is changing from mechanical processing to a method using a photolithography technique and an etching processing technique.
そのため、水晶振動子のサイズを決定しうる水晶振動片自体のサイズを、より小型化することが求められている。従来、水晶振動片を作製する場合、水晶から所定の切断角度で切り出された水晶板に対して機械加工で外形形成することで、水晶振動片とすることが一般的であった。しかしながら、機械加工では加工精度に限界があり、より微細で小型な水晶振動片を作製することが難しくなりつつある。そこで、現在では、水晶振動片の加工方法が、機械加工からフォトリソグラフィ技術及びエッチング加工技術を利用した方法に変化しつつあるのが現状である。 By the way, this type of piezoelectric vibrator is required to be further miniaturized with the recent trend toward downsizing and downsizing of electronic devices. This also applies to a crystal resonator that is also one of piezoelectric resonators.
For this reason, it is required to further reduce the size of the crystal resonator element itself that can determine the size of the crystal resonator. Conventionally, when producing a quartz crystal vibrating piece, it is common to form a quartz crystal vibrating piece by mechanically forming a quartz crystal plate cut out from a quartz crystal at a predetermined cutting angle. However, machining has a limit in machining accuracy, and it is becoming difficult to produce a finer and smaller quartz crystal resonator element. Therefore, at present, the processing method of the crystal vibrating piece is changing from mechanical processing to a method using a photolithography technique and an etching processing technique.
しかしながら、フォトリソグラフィ技術やエッチング加工を利用する場合には、水晶振動片にコンベックス形状やベベル形状を形成することは困難であり、実際上、ほぼ不可能に近い。従って、ベベル加工の部分にバンプを配置した従来の実装方法を採用することができず、これに変わる新たな実装方法が求められている。
However, when using a photolithography technique or an etching process, it is difficult to form a convex shape or a bevel shape on the crystal vibrating piece, and practically it is almost impossible. Therefore, a conventional mounting method in which bumps are arranged in a beveled portion cannot be adopted, and a new mounting method is demanded instead.
本発明は、このような事情に考慮してなされたもので、その目的は、エッチング加工を利用して外形形成した場合であっても、振動特性の低下を抑制しながら高い実装強度で実装を行えることができる水晶振動片を提供することである。
The present invention has been made in view of such circumstances, and its purpose is to mount with high mounting strength while suppressing deterioration of vibration characteristics even when the outer shape is formed by etching. It is to provide a crystal vibrating piece that can be performed.
本発明は、前記課題を解決するために以下の手段を提供する。
（１）本発明に係る水晶振動片は、ＡＴカットされた水晶板がウェットエッチング加工により平面視矩形状に形成された水晶振動板と、該水晶振動板の表裏主面上にそれぞれ形成された一対の電極膜と、前記水晶振動板の一方の主面上における前記一対の電極膜上にそれぞれ形成され、外部電極と一対の電極膜とを導通させると共に前記水晶振動板を保持する一対の実装部材と、を備え、前記水晶振動板が、前記一方の主面に対して鈍角となる角度で傾斜した傾斜面を少なくとも側面の一部に有し、前記一対の実装部材のうち少なくとも一方が、前記傾斜面と前記一方の主面との間に形成される稜線上、又は、該稜線の延長線上に形成されていることを特徴とする。 The present invention provides the following means in order to solve the above problems.
(1) The quartz crystal resonator element according to the present invention is formed on a quartz diaphragm in which an AT-cut quartz plate is formed in a rectangular shape in a plan view by wet etching, and on the front and back main surfaces of the quartz diaphragm. A pair of electrode films and a pair of mountings formed on the pair of electrode films on one main surface of the crystal diaphragm, respectively, to conduct the external electrode and the pair of electrode films and to hold the crystal diaphragm Members, and the crystal diaphragm has an inclined surface inclined at an obtuse angle with respect to the one main surface in at least a part of the side surface, and at least one of the pair of mounting members is It is formed on a ridge line formed between the inclined surface and the one main surface or on an extension line of the ridge line.
（１）本発明に係る水晶振動片は、ＡＴカットされた水晶板がウェットエッチング加工により平面視矩形状に形成された水晶振動板と、該水晶振動板の表裏主面上にそれぞれ形成された一対の電極膜と、前記水晶振動板の一方の主面上における前記一対の電極膜上にそれぞれ形成され、外部電極と一対の電極膜とを導通させると共に前記水晶振動板を保持する一対の実装部材と、を備え、前記水晶振動板が、前記一方の主面に対して鈍角となる角度で傾斜した傾斜面を少なくとも側面の一部に有し、前記一対の実装部材のうち少なくとも一方が、前記傾斜面と前記一方の主面との間に形成される稜線上、又は、該稜線の延長線上に形成されていることを特徴とする。 The present invention provides the following means in order to solve the above problems.
(1) The quartz crystal resonator element according to the present invention is formed on a quartz diaphragm in which an AT-cut quartz plate is formed in a rectangular shape in a plan view by wet etching, and on the front and back main surfaces of the quartz diaphragm. A pair of electrode films and a pair of mountings formed on the pair of electrode films on one main surface of the crystal diaphragm, respectively, to conduct the external electrode and the pair of electrode films and to hold the crystal diaphragm Members, and the crystal diaphragm has an inclined surface inclined at an obtuse angle with respect to the one main surface in at least a part of the side surface, and at least one of the pair of mounting members is It is formed on a ridge line formed between the inclined surface and the one main surface or on an extension line of the ridge line.
本発明に係る水晶振動片においては、一対の実装部材によって保持（マウント）されていると共に、実装部材を介して電極膜が外部電極に導通された状態となっている。ここで、一対の実装部材を通じて外部電極から電圧が印加されると、水晶振動板の表裏主面上にそれぞれ形成された一対の電極膜に電圧が印加される。すると、水晶振動板が励起されて厚み滑り振動する。そのため、水晶振動片は一対の実装部材によって保持された状態で厚み滑り振動するようになっている。
In the quartz crystal resonator element according to the present invention, it is held (mounted) by a pair of mounting members, and the electrode film is electrically connected to the external electrode through the mounting members. Here, when a voltage is applied from the external electrode through the pair of mounting members, the voltage is applied to the pair of electrode films respectively formed on the front and back main surfaces of the crystal diaphragm. Then, the quartz diaphragm is excited and vibrates in thickness. For this reason, the quartz crystal vibrating piece vibrates in a thickness-shear manner while being held by a pair of mounting members.
ところで、水晶振動板は、水晶をＡＴカットすることで得られた水晶板にウェットエッチング加工を施すことで外形形成されたものである。従って、機械加工と異なり微細化、小型化に対応することが可能である。
しかも、水晶振動板の側面の一部には、実装部材が設けられている一方の主面に対して鈍角となる角度で傾斜した傾斜面がウェットエッチング加工によって形成されている。つまり、水晶特有のエッチング異方性を利用して傾斜面が形成されている。特に、この傾斜面は一方の主面に対して鈍角に形成されているので、電極膜にて励起された振動を傾斜面にて減衰させることが可能である。つまり、稜線上又はその稜線の延長線上にて、振動を減衰させることができる。 By the way, the crystal diaphragm is formed by applying a wet etching process to a crystal plate obtained by AT-cutting the crystal. Therefore, unlike machining, it is possible to cope with miniaturization and miniaturization.
In addition, an inclined surface that is inclined at an obtuse angle with respect to one main surface on which the mounting member is provided is formed on a part of the side surface of the crystal diaphragm by wet etching. That is, the inclined surface is formed by utilizing the etching anisotropy unique to quartz. In particular, since this inclined surface is formed at an obtuse angle with respect to one main surface, vibration excited by the electrode film can be attenuated by the inclined surface. That is, the vibration can be attenuated on the ridge line or an extension line of the ridge line.
しかも、水晶振動板の側面の一部には、実装部材が設けられている一方の主面に対して鈍角となる角度で傾斜した傾斜面がウェットエッチング加工によって形成されている。つまり、水晶特有のエッチング異方性を利用して傾斜面が形成されている。特に、この傾斜面は一方の主面に対して鈍角に形成されているので、電極膜にて励起された振動を傾斜面にて減衰させることが可能である。つまり、稜線上又はその稜線の延長線上にて、振動を減衰させることができる。 By the way, the crystal diaphragm is formed by applying a wet etching process to a crystal plate obtained by AT-cutting the crystal. Therefore, unlike machining, it is possible to cope with miniaturization and miniaturization.
In addition, an inclined surface that is inclined at an obtuse angle with respect to one main surface on which the mounting member is provided is formed on a part of the side surface of the crystal diaphragm by wet etching. That is, the inclined surface is formed by utilizing the etching anisotropy unique to quartz. In particular, since this inclined surface is formed at an obtuse angle with respect to one main surface, vibration excited by the electrode film can be attenuated by the inclined surface. That is, the vibration can be attenuated on the ridge line or an extension line of the ridge line.
従って、一対の実装部材のうち少なくとも一方の実装部材をこの稜線上又は稜線の延長線上に形成することで、励起された振動を阻害し難くすることができる。よって、振動特性の低下を抑制しながら、水晶振動片の実装を行うことができる。また、従来と同様に実装部材を利用して実装を行えるので、高い実装強度に関しても確保することができる。
Therefore, it is possible to make it difficult to inhibit the excited vibration by forming at least one of the pair of mounting members on the ridgeline or an extension of the ridgeline. Therefore, the quartz crystal resonator element can be mounted while suppressing the deterioration of the vibration characteristics. Moreover, since mounting can be performed using a mounting member as in the conventional case, high mounting strength can be ensured.
（２）本発明に係る水晶振動片は、上記本発明の水晶振動片において、前記傾斜面が、水晶結晶のＸ軸方向に沿った前記側面の全長に亘って形成され、前記実装部材が、前記稜線上に形成されていることを特徴とする。
(2) The quartz crystal resonator element according to the invention is the quartz crystal resonator element according to the invention, wherein the inclined surface is formed over the entire length of the side surface along the X-axis direction of the quartz crystal. It is formed on the ridgeline.
本発明に係る水晶振動片においては、傾斜面が側面の全長に亘って形成されているので、ウェットエッチング加工時に傾斜面を形成し易い。また、一対の実装部材のうち少なくとも一方の実装部材が稜線上に形成されているので、励起された振動をより阻害し難く、振動特性の低下をより効果的に抑制することができる。
更に、傾斜面が水晶結晶のＸ軸方向に沿った側面の全長に亘って形成されているので、
稜線に輪郭振動が生じ難い。従って、輪郭振動によって厚みすべり振動が阻害されてしまうことを抑制でき、この点においても振動特性の低下をより効果的に抑制し易い。 In the quartz crystal resonator element according to the present invention, since the inclined surface is formed over the entire length of the side surface, it is easy to form the inclined surface during wet etching. Further, since at least one mounting member of the pair of mounting members is formed on the ridgeline, it is difficult to inhibit the excited vibration, and the deterioration of the vibration characteristics can be more effectively suppressed.
Furthermore, since the inclined surface is formed over the entire length of the side surface along the X-axis direction of the quartz crystal,
Contour vibration hardly occurs on the ridgeline. Therefore, it is possible to suppress the thickness-shear vibration from being hindered by the contour vibration, and in this respect as well, it is easy to more effectively suppress the deterioration of the vibration characteristics.
更に、傾斜面が水晶結晶のＸ軸方向に沿った側面の全長に亘って形成されているので、
稜線に輪郭振動が生じ難い。従って、輪郭振動によって厚みすべり振動が阻害されてしまうことを抑制でき、この点においても振動特性の低下をより効果的に抑制し易い。 In the quartz crystal resonator element according to the present invention, since the inclined surface is formed over the entire length of the side surface, it is easy to form the inclined surface during wet etching. Further, since at least one mounting member of the pair of mounting members is formed on the ridgeline, it is difficult to inhibit the excited vibration, and the deterioration of the vibration characteristics can be more effectively suppressed.
Furthermore, since the inclined surface is formed over the entire length of the side surface along the X-axis direction of the quartz crystal,
Contour vibration hardly occurs on the ridgeline. Therefore, it is possible to suppress the thickness-shear vibration from being hindered by the contour vibration, and in this respect as well, it is easy to more effectively suppress the deterioration of the vibration characteristics.
（３）本発明に係る水晶振動片は、上記本発明の水晶振動片において、前記傾斜面が、水晶結晶のＺ’軸方向に沿った前記側面の全長に亘って形成され、前記実装部材が、共に前記稜線上に形成されていることを特徴とする水晶振動片。
(3) The quartz crystal resonator element according to the invention is the quartz crystal resonator element according to the invention, wherein the inclined surface is formed over the entire length of the side surface along the Z′-axis direction of the quartz crystal, and the mounting member is Both are formed on the ridge line.
本発明に係る水晶振動片においては、傾斜面が側面の全長に亘って形成されているので、ウェットエッチング加工時に傾斜面を形成し易い。また、一対の実装部材の両方が稜線上に形成されているので、電極膜にて励起された振動をより阻害し難く、振動特性の低下をより効果的に抑制することができる。
ところで、励起された振動は、水晶結晶のＺ’軸方向に沿った側面において位相が零に等しい。そして、この側面に沿って傾斜面が形成され、その傾斜面の稜線上に一対の実装部材を形成していることからも振動特性の低下をより効果的に抑制し易い。 In the quartz crystal resonator element according to the present invention, since the inclined surface is formed over the entire length of the side surface, it is easy to form the inclined surface during wet etching. In addition, since both the pair of mounting members are formed on the ridgeline, it is difficult to inhibit the vibration excited by the electrode film, and the deterioration of the vibration characteristics can be more effectively suppressed.
By the way, the phase of the excited vibration is equal to zero on the side surface along the Z′-axis direction of the quartz crystal. And since the inclined surface is formed along this side surface and the pair of mounting members are formed on the ridgeline of the inclined surface, it is easy to suppress the deterioration of the vibration characteristics more effectively.
ところで、励起された振動は、水晶結晶のＺ’軸方向に沿った側面において位相が零に等しい。そして、この側面に沿って傾斜面が形成され、その傾斜面の稜線上に一対の実装部材を形成していることからも振動特性の低下をより効果的に抑制し易い。 In the quartz crystal resonator element according to the present invention, since the inclined surface is formed over the entire length of the side surface, it is easy to form the inclined surface during wet etching. In addition, since both the pair of mounting members are formed on the ridgeline, it is difficult to inhibit the vibration excited by the electrode film, and the deterioration of the vibration characteristics can be more effectively suppressed.
By the way, the phase of the excited vibration is equal to zero on the side surface along the Z′-axis direction of the quartz crystal. And since the inclined surface is formed along this side surface and the pair of mounting members are formed on the ridgeline of the inclined surface, it is easy to suppress the deterioration of the vibration characteristics more effectively.
（４）本発明に係る水晶振動片は、上記本発明の水晶振動片において、前記傾斜面が、水晶結晶のＸ軸方向に沿った前記側面に部分的に形成され、前記実装部材が、前記一方の主面上であって且つ前記稜線の延長線上に位置するように形成されていることを特徴とする。
(4) The quartz crystal resonator element according to the invention is the quartz crystal resonator element according to the invention, wherein the inclined surface is partially formed on the side surface along the X-axis direction of the quartz crystal, and the mounting member is It is formed so that it may be located on one main surface and the extended line of the said ridgeline.
本発明に係る水晶振動片においては、傾斜面がＸ軸方向に沿った側面の全長に亘って形成されているのではなく、部分的に形成されている。そして、一対の実装部材のうち少なくとも一方の実装部材は、その傾斜面の稜線上ではなく、一方の主面上の平坦部分であって且つ稜線の延長線上に位置するように形成されている。従って、振動特性の低下を抑制しながら、平坦部分を利用して実装部材をより安定に形成することができ、実装品質をより高めることができる。
更に、傾斜面が水晶結晶のＸ軸方向に沿った側面に形成されているので、稜線に輪郭振動が生じ難い。従って、輪郭振動によって厚みすべり振動が阻害されてしまうことを抑制でき、振動特性の低下を抑制し易い。 In the quartz crystal resonator element according to the present invention, the inclined surface is not formed over the entire length of the side surface along the X-axis direction, but is formed partially. At least one mounting member of the pair of mounting members is formed not on the ridge line of the inclined surface but on a flat portion on one main surface and on the extension line of the ridge line. Therefore, the mounting member can be formed more stably using the flat portion while suppressing the deterioration of the vibration characteristics, and the mounting quality can be further improved.
Furthermore, since the inclined surface is formed on the side surface along the X-axis direction of the quartz crystal, contour vibration hardly occurs on the ridgeline. Therefore, it is possible to suppress the thickness-shear vibration from being hindered by the contour vibration, and it is easy to suppress the deterioration of the vibration characteristics.
更に、傾斜面が水晶結晶のＸ軸方向に沿った側面に形成されているので、稜線に輪郭振動が生じ難い。従って、輪郭振動によって厚みすべり振動が阻害されてしまうことを抑制でき、振動特性の低下を抑制し易い。 In the quartz crystal resonator element according to the present invention, the inclined surface is not formed over the entire length of the side surface along the X-axis direction, but is formed partially. At least one mounting member of the pair of mounting members is formed not on the ridge line of the inclined surface but on a flat portion on one main surface and on the extension line of the ridge line. Therefore, the mounting member can be formed more stably using the flat portion while suppressing the deterioration of the vibration characteristics, and the mounting quality can be further improved.
Furthermore, since the inclined surface is formed on the side surface along the X-axis direction of the quartz crystal, contour vibration hardly occurs on the ridgeline. Therefore, it is possible to suppress the thickness-shear vibration from being hindered by the contour vibration, and it is easy to suppress the deterioration of the vibration characteristics.
（５）本発明に係る水晶振動片は、上記本発明の水晶振動片において、前記電極膜が、前記傾斜面上にも形成されていることを特徴とする。
(5) The crystal vibrating piece according to the present invention is characterized in that, in the crystal vibrating piece of the present invention, the electrode film is also formed on the inclined surface.
本発明に係る水晶振動片においては、電極膜が傾斜面上にも形成されているので、実装時に仮に実装部材が一方の主面上の平坦部分から傾斜面側に広がってしまったとしても、電極膜との導通を確保することができる。従って、電極膜と外部電極との導通性を確実にすることができ、実装品質を向上することができると共に安定した振動特性を維持することができる。
In the quartz crystal resonator element according to the present invention, since the electrode film is also formed on the inclined surface, even if the mounting member spreads from the flat portion on one main surface to the inclined surface side during mounting, Conductivity with the electrode film can be ensured. Therefore, the electrical connection between the electrode film and the external electrode can be ensured, the mounting quality can be improved, and stable vibration characteristics can be maintained.
本発明に係る水晶振動片によれば、エッチング加工を利用して外形形成されているので、微細化、小型化に対応することができるうえ、振動特性の低下を抑制しながら高い実装強度で実装を行うことができる。
According to the quartz crystal resonator element according to the present invention, since the outer shape is formed by using etching processing, it is possible to cope with miniaturization and miniaturization, and mounting with high mounting strength while suppressing deterioration of vibration characteristics. It can be performed.
以下、本発明に係る実施形態を、図１から図２１を参照して説明する。なお、本実施形態では、厚み滑り振動片（水晶振動片）を有する表面実装型の水晶振動子を例に挙げて説明する。
Hereinafter, embodiments according to the present invention will be described with reference to FIGS. In the present embodiment, a surface-mounted crystal resonator having a thickness-shear resonator element (crystal resonator element) will be described as an example.
本実施形態の水晶振動子１は、図１に示すように、ベース基板２とリッド基板３とで２層に積層された箱状に形成されており、内部のキャビティＣ内に厚み滑り振動片４がマウントされている。なお、図１は、水晶振動子１の分解斜視図である。
厚み滑り振動片４は、水晶振動板１０と、この水晶振動板１０の表裏主面上にそれぞれ形成された一対の電極膜２０と、で主に構成されている。 As shown in FIG. 1, the crystal resonator 1 according to the present embodiment is formed in a box shape in which a base substrate 2 and a lid substrate 3 are laminated in two layers. 4 is mounted. FIG. 1 is an exploded perspective view of the crystal unit 1.
The thickness-sliding vibration piece 4 is mainly composed of a crystal diaphragm 10 and a pair of electrode films 20 formed on the front and back main surfaces of the crystal diaphragm 10.
厚み滑り振動片４は、水晶振動板１０と、この水晶振動板１０の表裏主面上にそれぞれ形成された一対の電極膜２０と、で主に構成されている。 As shown in FIG. 1, the crystal resonator 1 according to the present embodiment is formed in a box shape in which a base substrate 2 and a lid substrate 3 are laminated in two layers. 4 is mounted. FIG. 1 is an exploded perspective view of the crystal unit 1.
The thickness-sliding vibration piece 4 is mainly composed of a crystal diaphragm 10 and a pair of electrode films 20 formed on the front and back main surfaces of the crystal diaphragm 10.
水晶振動板１０は、図２に示すように、Ｘ軸、Ｙ軸、Ｚ軸で水晶結晶の座標軸が定義された水晶のランバード原石６をＡＴカット（表裏主面がＸ軸回りにＺ軸から半時計方向に約３５度１５分の角度となるようにカット）されることで得られた水晶板７を、その後、ウェットエッチング加工によって平面視矩形状に形成されたものである。
なお、図２は、水晶板７の切断角度及び水晶結晶の座標軸を説明するためのランバード原石６の斜視図である。また、本実施形態においてＺ’軸とは、図１に示すように、水晶振動板１０の表裏主面上においてＸ軸と直交する方向の結晶軸であり、Ｙ’軸とはＸ軸及びＺ’軸に対して直交する結晶軸をいう。 As shown in FIG. 2, the quartz diaphragm 10 is formed by AT-cutting the quartz lambard ore 6 in which the coordinate axes of the quartz crystal are defined by the X axis, the Y axis, and the Z axis (the front and back main surfaces are rotated from the Z axis around the X axis). The quartz plate 7 obtained by cutting the lens so as to have an angle of about 35 degrees 15 minutes in the counterclockwise direction is formed into a rectangular shape in plan view by wet etching after that.
FIG. 2 is a perspective view of the lumbar raw stone 6 for explaining the cutting angle of the quartz plate 7 and the coordinate axes of the quartz crystal. Further, in the present embodiment, the Z ′ axis is a crystal axis in a direction orthogonal to the X axis on the front and back main surfaces of the crystal diaphragm 10 as shown in FIG. 1, and the Y ′ axis is the X axis and the Z axis. 'A crystal axis perpendicular to the axis.
なお、図２は、水晶板７の切断角度及び水晶結晶の座標軸を説明するためのランバード原石６の斜視図である。また、本実施形態においてＺ’軸とは、図１に示すように、水晶振動板１０の表裏主面上においてＸ軸と直交する方向の結晶軸であり、Ｙ’軸とはＸ軸及びＺ’軸に対して直交する結晶軸をいう。 As shown in FIG. 2, the quartz diaphragm 10 is formed by AT-cutting the quartz lambard ore 6 in which the coordinate axes of the quartz crystal are defined by the X axis, the Y axis, and the Z axis (the front and back main surfaces are rotated from the Z axis around the X axis). The quartz plate 7 obtained by cutting the lens so as to have an angle of about 35 degrees 15 minutes in the counterclockwise direction is formed into a rectangular shape in plan view by wet etching after that.
FIG. 2 is a perspective view of the lumbar raw stone 6 for explaining the cutting angle of the quartz plate 7 and the coordinate axes of the quartz crystal. Further, in the present embodiment, the Z ′ axis is a crystal axis in a direction orthogonal to the X axis on the front and back main surfaces of the crystal diaphragm 10 as shown in FIG. 1, and the Y ′ axis is the X axis and the Z axis. 'A crystal axis perpendicular to the axis.
水晶振動板１０について詳細に説明する。
本実施形態の水晶振動板１０は、図３から図５に示すように、Ｘ軸方向に沿って長辺が延在し、Ｚ’軸方向に沿って短辺が延在するように、ウェットエッチング加工によって平面視矩形状に形成された振動板である。
水晶振動板１０の表裏主面１０ａ、１０ｂ（表側の主面（他方の主面）１０ａ及び裏側の主面（一方の主面）１０ｂ）は、共に平坦面とされている。 The crystal diaphragm 10 will be described in detail.
As shown in FIGS. 3 to 5, the quartz crystal plate 10 of the present embodiment is wet so that the long side extends along the X-axis direction and the short side extends along the Z′-axis direction. It is a diaphragm formed into a rectangular shape in plan view by etching.
Both the front and back main surfaces 10a and 10b (the front-side main surface (the other main surface) 10a and the back-side main surface (the one main surface) 10b) of the quartz crystal plate 10 are flat surfaces.
本実施形態の水晶振動板１０は、図３から図５に示すように、Ｘ軸方向に沿って長辺が延在し、Ｚ’軸方向に沿って短辺が延在するように、ウェットエッチング加工によって平面視矩形状に形成された振動板である。
水晶振動板１０の表裏主面１０ａ、１０ｂ（表側の主面（他方の主面）１０ａ及び裏側の主面（一方の主面）１０ｂ）は、共に平坦面とされている。 The crystal diaphragm 10 will be described in detail.
As shown in FIGS. 3 to 5, the quartz crystal plate 10 of the present embodiment is wet so that the long side extends along the X-axis direction and the short side extends along the Z′-axis direction. It is a diaphragm formed into a rectangular shape in plan view by etching.
Both the front and back main surfaces 10a and 10b (the front-side main surface (the other main surface) 10a and the back-side main surface (the one main surface) 10b) of the quartz crystal plate 10 are flat surfaces.
なお、図３は、図１に示す厚み滑り振動片４を裏側から見た斜視図である。図４は、図３に示す厚み滑り振動片４を矢印Ａ方向から見た平面図である。図５は、図４に示す厚み滑り振動片４を矢印Ｂ方向から見た側面図である。
FIG. 3 is a perspective view of the thickness-shear vibration piece 4 shown in FIG. 1 as viewed from the back side. 4 is a plan view of the thickness-shear vibration piece 4 shown in FIG. FIG. 5 is a side view of the thickness-shear vibration piece 4 shown in FIG.
また、水晶振動板１０は、平面視矩形状に形成されているので４つの側面を有している。即ち、Ｘ軸方向に沿った長辺側の２つの側面と、Ｚ’軸方向に沿った短辺側の２つの側面と、を有している。
このうち、Ｘ軸方向に沿った側面は、その全長に亘って表裏主面１０ａ、１０ｂに対して鈍角となる角度で傾斜した傾斜面（以下、傾斜面１１と称する）とされている。この際、一方の傾斜面１１は、表側の主面１０ａにおいてＺ’軸方向の＋側に設けられており、他方の傾斜面１１は、裏側の主面１０ｂにおいてＺ’軸方向の−側に設けられている。なお、これら傾斜面１１は、水晶結晶の自然面であるｍ面であり、表裏主面１０ａ、１０ｂとのなす角度θ（図５参照）は、略１５０度程度とされている。 Further, since the quartz diaphragm 10 is formed in a rectangular shape in plan view, it has four side surfaces. That is, it has two long side surfaces along the X-axis direction and two short side surfaces along the Z′-axis direction.
Among these, the side surface along the X-axis direction is an inclined surface (hereinafter referred to as an inclined surface 11) inclined at an obtuse angle with respect to the front and back main surfaces 10 a and 10 b over the entire length. At this time, one inclined surface 11 is provided on the + side in the Z′-axis direction on the main surface 10a on the front side, and the other inclined surface 11 is on the − side in the Z′-axis direction on the main surface 10b on the back side. Is provided. These inclined surfaces 11 are m-planes that are natural surfaces of quartz crystals, and an angle θ (see FIG. 5) formed with the front and back main surfaces 10a and 10b is about 150 degrees.
このうち、Ｘ軸方向に沿った側面は、その全長に亘って表裏主面１０ａ、１０ｂに対して鈍角となる角度で傾斜した傾斜面（以下、傾斜面１１と称する）とされている。この際、一方の傾斜面１１は、表側の主面１０ａにおいてＺ’軸方向の＋側に設けられており、他方の傾斜面１１は、裏側の主面１０ｂにおいてＺ’軸方向の−側に設けられている。なお、これら傾斜面１１は、水晶結晶の自然面であるｍ面であり、表裏主面１０ａ、１０ｂとのなす角度θ（図５参照）は、略１５０度程度とされている。 Further, since the quartz diaphragm 10 is formed in a rectangular shape in plan view, it has four side surfaces. That is, it has two long side surfaces along the X-axis direction and two short side surfaces along the Z′-axis direction.
Among these, the side surface along the X-axis direction is an inclined surface (hereinafter referred to as an inclined surface 11) inclined at an obtuse angle with respect to the front and back main surfaces 10 a and 10 b over the entire length. At this time, one inclined surface 11 is provided on the + side in the Z′-axis direction on the main surface 10a on the front side, and the other inclined surface 11 is on the − side in the Z′-axis direction on the main surface 10b on the back side. Is provided. These inclined surfaces 11 are m-planes that are natural surfaces of quartz crystals, and an angle θ (see FIG. 5) formed with the front and back main surfaces 10a and 10b is about 150 degrees.
上記一対の電極膜２０は、図１、図３及び図５に示すように、それぞれ励振電極２１、引出電極２２及びマウント電極２３で構成されている。
このうち、励振電極２１は、水晶振動板１０の表裏主面１０ａ、１０ｂの略中央部分にそれぞれ形成され、該水晶振動板１０を挟んで向かい合うように形成されている。また、水晶振動板１０の表裏主面１０ａ、１０ｂの端部（Ｘ軸方向の−側）には、マウント電極２３が短辺に沿って間隔を開けて形成されている。この際、表側の主面１０ａに形成されたマウント電極２３と、裏側の主面１０ｂに形成されたマウント電極２３とは、傾斜面１１上に形成された側面電極２３ａを介して電気的に接続されている。 The pair of electrode films 20 are composed of an excitation electrode 21, an extraction electrode 22, and a mount electrode 23, respectively, as shown in FIGS.
Among these, the excitation electrode 21 is formed in the substantially center part of the front and back main surfaces 10a and 10b of the quartz crystal plate 10, and is formed so as to face each other with the quartz plate 10 interposed therebetween. In addition, mount electrodes 23 are formed on the end portions (the negative side in the X-axis direction) of the front and back main surfaces 10a and 10b of the quartz crystal plate 10 at intervals along the short side. At this time, the mount electrode 23 formed on the front-side main surface 10a and the mount electrode 23 formed on the back-side main surface 10b are electrically connected via the side electrode 23a formed on the inclined surface 11. Has been.
このうち、励振電極２１は、水晶振動板１０の表裏主面１０ａ、１０ｂの略中央部分にそれぞれ形成され、該水晶振動板１０を挟んで向かい合うように形成されている。また、水晶振動板１０の表裏主面１０ａ、１０ｂの端部（Ｘ軸方向の−側）には、マウント電極２３が短辺に沿って間隔を開けて形成されている。この際、表側の主面１０ａに形成されたマウント電極２３と、裏側の主面１０ｂに形成されたマウント電極２３とは、傾斜面１１上に形成された側面電極２３ａを介して電気的に接続されている。 The pair of electrode films 20 are composed of an excitation electrode 21, an extraction electrode 22, and a mount electrode 23, respectively, as shown in FIGS.
Among these, the excitation electrode 21 is formed in the substantially center part of the front and back main surfaces 10a and 10b of the quartz crystal plate 10, and is formed so as to face each other with the quartz plate 10 interposed therebetween. In addition, mount electrodes 23 are formed on the end portions (the negative side in the X-axis direction) of the front and back main surfaces 10a and 10b of the quartz crystal plate 10 at intervals along the short side. At this time, the mount electrode 23 formed on the front-side main surface 10a and the mount electrode 23 formed on the back-side main surface 10b are electrically connected via the side electrode 23a formed on the inclined surface 11. Has been.
また、マウント電極２３のうち、一方のマウント電極２３は引出電極２２を介して表側の主面１０ａ上に形成された一方の励振電極２１に電気的に接続され、他方のマウント電極２３は引出電極２２を介して裏側の主面１０ｂ上に形成された他方の励振電極２１に電気的に接続されている。
なお、上述した励振電極２１、引出電極２２及びマウント電極２３からなる電極膜２０は、金等の単層膜や、クロム等の金属を下地層とした上に金等の金属層を積層した積層膜で形成されている。 Of the mount electrodes 23, one mount electrode 23 is electrically connected to one excitation electrode 21 formed on the front main surface 10 a via the extraction electrode 22, and the other mount electrode 23 is an extraction electrode. 22 is electrically connected to the other excitation electrode 21 formed on the main surface 10 b on the back side.
The electrode film 20 composed of the excitation electrode 21, the extraction electrode 22 and the mount electrode 23 is a single layer film such as gold, or a laminate in which a metal layer such as gold is laminated on a metal such as chromium. It is formed of a film.
なお、上述した励振電極２１、引出電極２２及びマウント電極２３からなる電極膜２０は、金等の単層膜や、クロム等の金属を下地層とした上に金等の金属層を積層した積層膜で形成されている。 Of the mount electrodes 23, one mount electrode 23 is electrically connected to one excitation electrode 21 formed on the front main surface 10 a via the extraction electrode 22, and the other mount electrode 23 is an extraction electrode. 22 is electrically connected to the other excitation electrode 21 formed on the main surface 10 b on the back side.
The electrode film 20 composed of the excitation electrode 21, the extraction electrode 22 and the mount electrode 23 is a single layer film such as gold, or a laminate in which a metal layer such as gold is laminated on a metal such as chromium. It is formed of a film.
このように構成された厚み滑り振動片４は、図３から図５に示すバンプや導電性接着剤等の一対の実装部材２５を利用して、図１に示すようにベース基板２の上面にマウント（保持）されている。より具体的には、ベース基板２の上面に形成されたインナー電極（外部電極）３０に対して、水晶振動板１０の裏側の主面１０ｂに形成された一対のマウント電極２３が一対の実装部材２５を介してそれぞれ接触した状態でマウントされている。
これにより、厚み滑り振動片４は、ベース基板２の上面に機械的に保持されると共に、インナー電極３０とマウント電極２３とがそれぞれ導通された状態となっている。 The thickness-shear vibrating piece 4 configured as described above is formed on the upper surface of the base substrate 2 as shown in FIG. 1 using a pair of mounting members 25 such as bumps and conductive adhesives shown in FIGS. Mounted (held). More specifically, with respect to the inner electrode (external electrode) 30 formed on the upper surface of the base substrate 2, the pair of mount electrodes 23 formed on the main surface 10 b on the back side of the quartz crystal plate 10 is a pair of mounting members. 25 in a state where they are in contact with each other.
Accordingly, the thickness shear vibrating piece 4 is mechanically held on the upper surface of the base substrate 2, and the inner electrode 30 and the mount electrode 23 are electrically connected to each other.
これにより、厚み滑り振動片４は、ベース基板２の上面に機械的に保持されると共に、インナー電極３０とマウント電極２３とがそれぞれ導通された状態となっている。 The thickness-shear vibrating piece 4 configured as described above is formed on the upper surface of the base substrate 2 as shown in FIG. 1 using a pair of mounting members 25 such as bumps and conductive adhesives shown in FIGS. Mounted (held). More specifically, with respect to the inner electrode (external electrode) 30 formed on the upper surface of the base substrate 2, the pair of mount electrodes 23 formed on the main surface 10 b on the back side of the quartz crystal plate 10 is a pair of mounting members. 25 in a state where they are in contact with each other.
Accordingly, the thickness shear vibrating piece 4 is mechanically held on the upper surface of the base substrate 2, and the inner electrode 30 and the mount electrode 23 are electrically connected to each other.
ところで、上述した一対の実装部材２５は、水晶振動板１０の裏側の主面１０ｂ上における一対のマウント電極２３上にそれぞれ形成されており、上記したように外部電極でもあるインナー電極３０とマウント電極２３とを互いに導通させると共に、水晶振動板１０を機械的に保持する役割を担っている。
しかも、一対の実装部材２５のうち一方の実装部材２５は、水晶振動板１０の裏側の主面１０ｂと傾斜面１１との間に形成される稜線Ｅ上に跨るように形成されている。なお、他方の実装部材２５は、水晶振動板１０の裏側の主面１０ｂ上の平坦部分に形成されている。 By the way, the above-described pair of mounting members 25 are respectively formed on the pair of mount electrodes 23 on the main surface 10b on the back side of the crystal diaphragm 10, and as described above, the inner electrode 30 and the mount electrode which are also external electrodes 23 are connected to each other, and the quartz diaphragm 10 is mechanically held.
In addition, one mounting member 25 of the pair of mounting members 25 is formed so as to straddle the ridge line E formed between the main surface 10 b on the back side of the quartz crystal plate 10 and the inclined surface 11. The other mounting member 25 is formed on a flat portion on the main surface 10 b on the back side of the crystal diaphragm 10.
しかも、一対の実装部材２５のうち一方の実装部材２５は、水晶振動板１０の裏側の主面１０ｂと傾斜面１１との間に形成される稜線Ｅ上に跨るように形成されている。なお、他方の実装部材２５は、水晶振動板１０の裏側の主面１０ｂ上の平坦部分に形成されている。 By the way, the above-described pair of mounting members 25 are respectively formed on the pair of mount electrodes 23 on the main surface 10b on the back side of the crystal diaphragm 10, and as described above, the inner electrode 30 and the mount electrode which are also external electrodes 23 are connected to each other, and the quartz diaphragm 10 is mechanically held.
In addition, one mounting member 25 of the pair of mounting members 25 is formed so as to straddle the ridge line E formed between the main surface 10 b on the back side of the quartz crystal plate 10 and the inclined surface 11. The other mounting member 25 is formed on a flat portion on the main surface 10 b on the back side of the crystal diaphragm 10.
ベース基板２は、例えばソーダ石灰ガラスからなる透明の基板であり、平面視矩形の板状に形成されている。リッド基板３は、ベース基板２と同様に、例えばソーダ石灰ガラスからなる透明な基板であり、ベース基板２に対して重ね合わせ可能な大きさで板状に形成されている。
また、ベース基板２の接合面（リッド基板３が接合される面）側には、厚み滑り振動片４が収まる矩形状の凹部２ａが形成されている。この凹部２ａは、両基板２、３が重ね合わされたときに、厚み滑り振動片４を収容するキャビティＣとなるキャビティ用凹部である。
そして、ベース基板２は、この凹部２ａをリッド基板３側に対向させた状態で該リッド基板３に対して陽極接合されている。なお、ベース基板２の接合面には、陽極接合用の接合膜３１が凹部２ａの周囲を囲むように形成されている。 The base substrate 2 is a transparent substrate made of, for example, soda lime glass, and is formed in a plate shape having a rectangular shape in plan view. Similar to the base substrate 2, the lid substrate 3 is a transparent substrate made of, for example, soda lime glass, and is formed in a plate shape with a size that can be superimposed on the base substrate 2.
In addition, a rectangular recess 2 a in which the thickness shear vibration piece 4 is accommodated is formed on the side of the base substrate 2 where the lid substrate 3 is joined (surface to which the lid substrate 3 is joined). The recess 2 a is a cavity recess that becomes a cavity C that accommodates the thickness-shear vibration piece 4 when the substrates 2 and 3 are overlapped.
The base substrate 2 is anodically bonded to the lid substrate 3 with the concave portion 2a facing the lid substrate 3 side. A bonding film 31 for anodic bonding is formed on the bonding surface of the base substrate 2 so as to surround the recess 2a.
また、ベース基板２の接合面（リッド基板３が接合される面）側には、厚み滑り振動片４が収まる矩形状の凹部２ａが形成されている。この凹部２ａは、両基板２、３が重ね合わされたときに、厚み滑り振動片４を収容するキャビティＣとなるキャビティ用凹部である。
そして、ベース基板２は、この凹部２ａをリッド基板３側に対向させた状態で該リッド基板３に対して陽極接合されている。なお、ベース基板２の接合面には、陽極接合用の接合膜３１が凹部２ａの周囲を囲むように形成されている。 The base substrate 2 is a transparent substrate made of, for example, soda lime glass, and is formed in a plate shape having a rectangular shape in plan view. Similar to the base substrate 2, the lid substrate 3 is a transparent substrate made of, for example, soda lime glass, and is formed in a plate shape with a size that can be superimposed on the base substrate 2.
In addition, a rectangular recess 2 a in which the thickness shear vibration piece 4 is accommodated is formed on the side of the base substrate 2 where the lid substrate 3 is joined (surface to which the lid substrate 3 is joined). The recess 2 a is a cavity recess that becomes a cavity C that accommodates the thickness-shear vibration piece 4 when the substrates 2 and 3 are overlapped.
The base substrate 2 is anodically bonded to the lid substrate 3 with the concave portion 2a facing the lid substrate 3 side. A bonding film 31 for anodic bonding is formed on the bonding surface of the base substrate 2 so as to surround the recess 2a.
また、上述したインナー電極３０は、ベース基板２を貫通する図示しないスルーホール等を利用して、ベース基板２の下面に形成された図示しない一対の外部電極に電気的に接続されている。この際、一方の外部電極は、一方のインナー電極３０を介して厚み滑り振動片４の一方のマウント電極２３に電気的に接続されるようになっている。また、他方の外部電極は、他方のインナー電極３０を介して厚み滑り振動片４の他方のマウント電極２３に電気的に接続されるようになっている。
Further, the inner electrode 30 described above is electrically connected to a pair of external electrodes (not shown) formed on the lower surface of the base substrate 2 using a through hole (not shown) penetrating the base substrate 2. At this time, one external electrode is electrically connected to one mount electrode 23 of the thickness-shear vibrating piece 4 via one inner electrode 30. The other external electrode is electrically connected to the other mount electrode 23 of the thickness-shear vibrating piece 4 via the other inner electrode 30.
このように構成された水晶振動子１を作動させる場合には、ベース基板２に形成された外部電極に対して、所定の駆動電圧を印加する。これにより、実装部材２５及びマウント電極２３を介して厚み滑り振動片４の励振電極２１に電圧を印加させることができ、実装部材２５によってマウントされた状態で厚み滑り振動させることができる。
そして、この厚み滑り振動を、例えば、ＭＨｚ帯の発振周波数を有する制御、通信機用の振動源等として好適に利用することができる。 When the crystal resonator 1 configured as described above is operated, a predetermined drive voltage is applied to the external electrode formed on the base substrate 2. As a result, a voltage can be applied to the excitation electrode 21 of the thickness-shear vibration piece 4 via the mounting member 25 and the mount electrode 23, and thickness-shear vibration can be caused in a state of being mounted by the mounting member 25.
The thickness shear vibration can be suitably used as, for example, a control having an oscillation frequency in the MHz band, a vibration source for a communication device, or the like.
そして、この厚み滑り振動を、例えば、ＭＨｚ帯の発振周波数を有する制御、通信機用の振動源等として好適に利用することができる。 When the crystal resonator 1 configured as described above is operated, a predetermined drive voltage is applied to the external electrode formed on the base substrate 2. As a result, a voltage can be applied to the excitation electrode 21 of the thickness-shear vibration piece 4 via the mounting member 25 and the mount electrode 23, and thickness-shear vibration can be caused in a state of being mounted by the mounting member 25.
The thickness shear vibration can be suitably used as, for example, a control having an oscillation frequency in the MHz band, a vibration source for a communication device, or the like.
次に、上述した厚み滑り振動片４の製造方法について以下に説明する。
はじめに、水晶の原石である図２に示すランバード原石６を用意した後、Ｘ線回析法等によりＡＴカットを行うための角度測定を行う。次いで、測定した切断角度でランバード原石６をＡＴカットして水晶板７を作製する。次いで、この水晶板７を適宜ラッピング加工して、所望の厚みに調整する。 Next, a method for manufacturing the above-described thickness shear vibrating piece 4 will be described below.
First, after preparing a lumbard raw stone 6 shown in FIG. 2 which is a raw crystal of quartz, an angle measurement for performing AT cut is performed by an X-ray diffraction method or the like. Next, the quartz plate 7 is produced by AT-cutting the lumbar raw stone 6 at the measured cutting angle. Next, the quartz plate 7 is appropriately lapped and adjusted to a desired thickness.
はじめに、水晶の原石である図２に示すランバード原石６を用意した後、Ｘ線回析法等によりＡＴカットを行うための角度測定を行う。次いで、測定した切断角度でランバード原石６をＡＴカットして水晶板７を作製する。次いで、この水晶板７を適宜ラッピング加工して、所望の厚みに調整する。 Next, a method for manufacturing the above-described thickness shear vibrating piece 4 will be described below.
First, after preparing a lumbard raw stone 6 shown in FIG. 2 which is a raw crystal of quartz, an angle measurement for performing AT cut is performed by an X-ray diffraction method or the like. Next, the quartz plate 7 is produced by AT-cutting the lumbar raw stone 6 at the measured cutting angle. Next, the quartz plate 7 is appropriately lapped and adjusted to a desired thickness.
次いで、図６に示すように、水晶板７の表裏主面７ａ、７ｂにウェットエッチング加工するためのマスクＭを形成する工程を行う。
具体的には、まず水晶板７の表裏主面７ａ、７ｂにクロムを成膜してＣｒ膜を形成した後、このＣｒ膜上に金を成膜してＡｕ膜を重ねて形成する。そして、これらＣｒ膜及びＡｕ膜をフォトリソ技術によりエッチングして、図６に示すようにマスクＭを形成する。
この際、本実施形態では、表側の主面７ａに形成されるマスクＭを裏側の主面７ｂに形成されるマスクＭに対してＺ’軸方向に所定量（数μｍ）Ｈだけずれるように形成する。 Next, as shown in FIG. 6, a process of forming a mask M for performing wet etching on the front and back main surfaces 7a and 7b of the crystal plate 7 is performed.
Specifically, first, chromium is formed on the front and back main surfaces 7a and 7b of the crystal plate 7 to form a Cr film, and then gold is formed on the Cr film to overlap the Au film. Then, the Cr film and the Au film are etched by a photolithographic technique to form a mask M as shown in FIG.
At this time, in the present embodiment, the mask M formed on the front main surface 7a is shifted by a predetermined amount (several μm) H in the Z′-axis direction with respect to the mask M formed on the back main surface 7b. Form.
具体的には、まず水晶板７の表裏主面７ａ、７ｂにクロムを成膜してＣｒ膜を形成した後、このＣｒ膜上に金を成膜してＡｕ膜を重ねて形成する。そして、これらＣｒ膜及びＡｕ膜をフォトリソ技術によりエッチングして、図６に示すようにマスクＭを形成する。
この際、本実施形態では、表側の主面７ａに形成されるマスクＭを裏側の主面７ｂに形成されるマスクＭに対してＺ’軸方向に所定量（数μｍ）Ｈだけずれるように形成する。 Next, as shown in FIG. 6, a process of forming a mask M for performing wet etching on the front and back main surfaces 7a and 7b of the crystal plate 7 is performed.
Specifically, first, chromium is formed on the front and back main surfaces 7a and 7b of the crystal plate 7 to form a Cr film, and then gold is formed on the Cr film to overlap the Au film. Then, the Cr film and the Au film are etched by a photolithographic technique to form a mask M as shown in FIG.
At this time, in the present embodiment, the mask M formed on the front main surface 7a is shifted by a predetermined amount (several μm) H in the Z′-axis direction with respect to the mask M formed on the back main surface 7b. Form.
次いで、水晶板７を両面からウェットエッチング加工する。すると、水晶特有のエッチング異方性によって、マスクされていない水晶板７の露出面には、図７に示すように水晶結晶の自然面であるｍ面３５と、その以外の結晶面３６とが現れはじめる。つまり、水晶板７の表側には、Ｚ’軸方向の＋側にｍ面３５が現れ、Ｚ’軸方向の−側に結晶面３６が現れはじめる。一方、水晶板７の裏側には、表側とは点対称に、Ｚ’軸方向の＋側に結晶面３６が現れ、Ｚ’軸方向の−側にｍ面３５が現れはじめる。
そして、時間の経過に伴って、図８に示すようにエッチングが進行し、さらなる進行に伴って図９に示すようにマスクされていない部分が完全に除去され、最終的には図１０に示すように、ｍ面３５が残ることになる。これにより、このｍ面３５を傾斜面１１として利用することができる。 Next, the quartz plate 7 is wet-etched from both sides. Then, due to the etching anisotropy peculiar to quartz, the exposed surface of the unmasked quartz plate 7 has an m-plane 35 that is a natural plane of the quartz crystal and a crystal plane 36 other than that as shown in FIG. It begins to appear. That is, on the front side of the crystal plate 7, the m-plane 35 appears on the + side in the Z′-axis direction, and the crystal plane 36 begins to appear on the − side in the Z′-axis direction. On the other hand, on the back side of the crystal plate 7, the crystal plane 36 appears on the + side in the Z′-axis direction and the m-plane 35 begins to appear on the − side in the Z′-axis direction, in point symmetry with the front side.
Then, the etching progresses as time passes as shown in FIG. 8, and the unmasked portion is completely removed as shown in FIG. 9 as further progressing, and finally, as shown in FIG. Thus, the m-plane 35 remains. Thereby, this m surface 35 can be utilized as the inclined surface 11.
そして、時間の経過に伴って、図８に示すようにエッチングが進行し、さらなる進行に伴って図９に示すようにマスクされていない部分が完全に除去され、最終的には図１０に示すように、ｍ面３５が残ることになる。これにより、このｍ面３５を傾斜面１１として利用することができる。 Next, the quartz plate 7 is wet-etched from both sides. Then, due to the etching anisotropy peculiar to quartz, the exposed surface of the unmasked quartz plate 7 has an m-plane 35 that is a natural plane of the quartz crystal and a crystal plane 36 other than that as shown in FIG. It begins to appear. That is, on the front side of the crystal plate 7, the m-plane 35 appears on the + side in the Z′-axis direction, and the crystal plane 36 begins to appear on the − side in the Z′-axis direction. On the other hand, on the back side of the crystal plate 7, the crystal plane 36 appears on the + side in the Z′-axis direction and the m-plane 35 begins to appear on the − side in the Z′-axis direction, in point symmetry with the front side.
Then, the etching progresses as time passes as shown in FIG. 8, and the unmasked portion is completely removed as shown in FIG. 9 as further progressing, and finally, as shown in FIG. Thus, the m-plane 35 remains. Thereby, this m surface 35 can be utilized as the inclined surface 11.
この時点で水晶板７を平面視矩形状に外形形成でき、図１に示す水晶振動板１０を得ることができる。特に、Ｘ軸方向に沿った側面の全長に亘って傾斜面１１を形成することができる。そして、最後に、作製した水晶振動板１０の外表面上にフォトリソ技術等を利用して、励振電極２１、引出電極２２及びマウント電極２３からなる一対の電極膜２０を形成する。これにより、図１に示す厚み滑り振動片４を得ることができる。
At this time, the crystal plate 7 can be formed in a rectangular shape in plan view, and the crystal diaphragm 10 shown in FIG. 1 can be obtained. In particular, the inclined surface 11 can be formed over the entire length of the side surface along the X-axis direction. Finally, a pair of electrode films 20 including the excitation electrode 21, the extraction electrode 22, and the mount electrode 23 are formed on the outer surface of the manufactured quartz crystal plate 10 by using a photolithography technique or the like. Thereby, the thickness shear vibration piece 4 shown in FIG. 1 can be obtained.
上述したように、本実施形態の水晶振動板１０は、水晶板７にウェットエッチング加工を施すことで外形形成されたものであるので、機械加工と異なり、微細化、小型化に対応することが可能である。
しかも、水晶振動板１０のＸ軸方向に沿った長辺側の側面には、水晶特有のエッチング異方性を利用して傾斜面１１が形成されている。特に、この傾斜面１１は、表裏主面１０ａ、１０ｂに対して鈍角に形成されているので、励振電極２１で励起された振動を傾斜面１１にて減衰させることが可能である。つまり、稜線Ｅ上にて振動を減衰させることができる。 As described above, the quartz diaphragm 10 of the present embodiment is formed by applying wet etching to the quartz plate 7, and therefore, unlike machining, it can cope with miniaturization and miniaturization. Is possible.
In addition, an inclined surface 11 is formed on the side surface on the long side along the X-axis direction of the crystal vibrating plate 10 by utilizing etching anisotropy peculiar to crystal. In particular, since the inclined surface 11 is formed at an obtuse angle with respect to the front and back main surfaces 10a and 10b, the vibration excited by the excitation electrode 21 can be attenuated by the inclined surface 11. That is, vibration can be attenuated on the ridge line E.
しかも、水晶振動板１０のＸ軸方向に沿った長辺側の側面には、水晶特有のエッチング異方性を利用して傾斜面１１が形成されている。特に、この傾斜面１１は、表裏主面１０ａ、１０ｂに対して鈍角に形成されているので、励振電極２１で励起された振動を傾斜面１１にて減衰させることが可能である。つまり、稜線Ｅ上にて振動を減衰させることができる。 As described above, the quartz diaphragm 10 of the present embodiment is formed by applying wet etching to the quartz plate 7, and therefore, unlike machining, it can cope with miniaturization and miniaturization. Is possible.
In addition, an inclined surface 11 is formed on the side surface on the long side along the X-axis direction of the crystal vibrating plate 10 by utilizing etching anisotropy peculiar to crystal. In particular, since the inclined surface 11 is formed at an obtuse angle with respect to the front and back main surfaces 10a and 10b, the vibration excited by the excitation electrode 21 can be attenuated by the inclined surface 11. That is, vibration can be attenuated on the ridge line E.
従って、一方の実装部材２５をこの稜線Ｅ上に形成することで、励起された振動を阻害し難くすることができる。よって、振動特性の低下を抑制しながら、厚み滑り振動片４の実装を行うことができる。また、従来と同様に実装部材２５を利用して実装を行えるので、高い実装強度に関しても確保することができる。
Therefore, by forming one mounting member 25 on the ridge line E, it is possible to make it difficult to inhibit the excited vibration. Therefore, the thickness-shear vibrating piece 4 can be mounted while suppressing a decrease in vibration characteristics. Moreover, since mounting can be performed using the mounting member 25 as in the conventional case, high mounting strength can be ensured.
上述したように、本実施形態の厚み滑り振動片４によれば、エッチング加工を利用して外形形成されているので、微細化、小型化に対応することができるうえ、振動特性の低下を抑制しながら高い実装強度で実装を行うことができる。
更に、本実施形態では、傾斜面１１がＸ軸方向に沿った側面の全長に亘って形成されているので、稜線Ｅに輪郭振動が生じ難い。従って、輪郭振動によって厚み滑り振動が阻害されてしまうことを抑制でき、この点においても振動特性の低下をより効果的に抑制し易い。 As described above, according to the thickness-shear vibrating piece 4 of the present embodiment, since the outer shape is formed by using etching processing, it is possible to cope with miniaturization and miniaturization, and suppress deterioration of vibration characteristics. However, mounting can be performed with high mounting strength.
Furthermore, in this embodiment, since the inclined surface 11 is formed over the entire length of the side surface along the X-axis direction, contour vibration hardly occurs on the ridge line E. Therefore, it is possible to prevent the thickness-shear vibration from being hindered by the contour vibration, and in this respect also, it is easy to more effectively suppress the deterioration of the vibration characteristics.
更に、本実施形態では、傾斜面１１がＸ軸方向に沿った側面の全長に亘って形成されているので、稜線Ｅに輪郭振動が生じ難い。従って、輪郭振動によって厚み滑り振動が阻害されてしまうことを抑制でき、この点においても振動特性の低下をより効果的に抑制し易い。 As described above, according to the thickness-shear vibrating piece 4 of the present embodiment, since the outer shape is formed by using etching processing, it is possible to cope with miniaturization and miniaturization, and suppress deterioration of vibration characteristics. However, mounting can be performed with high mounting strength.
Furthermore, in this embodiment, since the inclined surface 11 is formed over the entire length of the side surface along the X-axis direction, contour vibration hardly occurs on the ridge line E. Therefore, it is possible to prevent the thickness-shear vibration from being hindered by the contour vibration, and in this respect also, it is easy to more effectively suppress the deterioration of the vibration characteristics.
なお、本発明の技術範囲は上記実施形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲において種々の変更を加えることが可能である。
The technical scope of the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention.
例えば、上記実施形態では、水晶振動子１の一例として表面実装型を例に挙げて説明したが、シリンダパッケージタイプであっても構わない。
For example, in the above-described embodiment, the surface mount type has been described as an example of the crystal resonator 1, but a cylinder package type may be used.
また、上記実施形態では、Ｘ軸方向に沿った側面の両方を傾斜面１１としたが、一方の側面を水晶振動板１０の裏側の主面１０ｂに対して傾斜する傾斜面１１としても構わない。この場合であっても、振動特性の低下を抑制しながら高い実装強度で実装を行うことができる。但し、Ｘ軸方向に沿った側面の両方を傾斜面１１とすることが、輪郭振動を効果的に抑制することができる点で好ましい。
In the above-described embodiment, both side surfaces along the X-axis direction are the inclined surfaces 11, but one side surface may be the inclined surface 11 that is inclined with respect to the main surface 10 b on the back side of the crystal diaphragm 10. . Even in this case, mounting can be performed with high mounting strength while suppressing a decrease in vibration characteristics. However, it is preferable that both the side surfaces along the X-axis direction be the inclined surfaces 11 in that the contour vibration can be effectively suppressed.
また、上記実施形態では、Ｘ軸方向に沿った側面の全長に亘って傾斜面１１を形成したが、部分的に形成しても構わない。
例えば、図１１から図１３に示すように、水晶振動板１０の裏側の主面１０ｂに対して鈍角となる角度で傾斜した傾斜面１１を、Ｘ軸方向に沿った側面の一方に部分的に形成した厚み滑り振動片（水晶振動片）４０としても構わない。
この際、一方の実装部材２５は、水晶振動板１０の裏側の主面１０ｂ上であって、且つ、部分的に形成された傾斜面１１と裏側の主面１０ｂとの間に形成される稜線Ｅの延長線上に位置するように形成されている。つまり、一方の実装部材２５は、傾斜面１１の稜線Ｅ上ではなく、裏側の主面１０ｂの平坦部分（実装平面部）に乗りながら稜線Ｅの延長線上に位置するように形成されている。 Moreover, in the said embodiment, although the inclined surface 11 was formed over the full length of the side surface along a X-axis direction, you may form partially.
For example, as shown in FIGS. 11 to 13, an inclined surface 11 inclined at an obtuse angle with respect to the main surface 10 b on the back side of the crystal diaphragm 10 is partially formed on one side surface along the X-axis direction. The thickness-shear vibrating piece (quartz vibrating piece) 40 formed may be used.
At this time, one mounting member 25 is on the main surface 10b on the back side of the crystal diaphragm 10, and is formed between the partially formed inclined surface 11 and the main surface 10b on the back side. It is formed so as to be located on an extension line of E. That is, one mounting member 25 is formed not on the ridge line E of the inclined surface 11 but on the extended line of the ridge line E while riding on the flat portion (mounting flat surface portion) of the main surface 10b on the back side.
例えば、図１１から図１３に示すように、水晶振動板１０の裏側の主面１０ｂに対して鈍角となる角度で傾斜した傾斜面１１を、Ｘ軸方向に沿った側面の一方に部分的に形成した厚み滑り振動片（水晶振動片）４０としても構わない。
この際、一方の実装部材２５は、水晶振動板１０の裏側の主面１０ｂ上であって、且つ、部分的に形成された傾斜面１１と裏側の主面１０ｂとの間に形成される稜線Ｅの延長線上に位置するように形成されている。つまり、一方の実装部材２５は、傾斜面１１の稜線Ｅ上ではなく、裏側の主面１０ｂの平坦部分（実装平面部）に乗りながら稜線Ｅの延長線上に位置するように形成されている。 Moreover, in the said embodiment, although the inclined surface 11 was formed over the full length of the side surface along a X-axis direction, you may form partially.
For example, as shown in FIGS. 11 to 13, an inclined surface 11 inclined at an obtuse angle with respect to the main surface 10 b on the back side of the crystal diaphragm 10 is partially formed on one side surface along the X-axis direction. The thickness-shear vibrating piece (quartz vibrating piece) 40 formed may be used.
At this time, one mounting member 25 is on the main surface 10b on the back side of the crystal diaphragm 10, and is formed between the partially formed inclined surface 11 and the main surface 10b on the back side. It is formed so as to be located on an extension line of E. That is, one mounting member 25 is formed not on the ridge line E of the inclined surface 11 but on the extended line of the ridge line E while riding on the flat portion (mounting flat surface portion) of the main surface 10b on the back side.
従って、振動特性の低下を抑制しながら、平坦部分を利用して一方の実装部材２５をより安定に形成することができ、実装品質を高めることができる。また、実装時の加重を一対の実装部材２５の両方に対して均等に負荷させることができるので、この点においても実装品質を高めることができる。
Therefore, one mounting member 25 can be formed more stably using the flat portion while suppressing the deterioration of the vibration characteristics, and the mounting quality can be improved. Moreover, since the weight at the time of mounting can be equally loaded with respect to both of a pair of mounting members 25, mounting quality can be improved also in this point.
なお、上記のように厚み滑り振動片４０を構成した場合、さらに図１４及び図１５に示すように、水晶振動板１０の表側の主面１０ａに対して傾斜した傾斜面１１に関しても、Ｘ軸方向に沿った側面に部分的に形成しても構わない。こうすることで、一対の実装部材２５が形成される、Ｘ軸方向の−側の端部の表裏を共に平坦にすることができるので、水晶振動板１０の機械的強度を高めることができ、実装時のマウント信頼性を向上することができる。
When the thickness-shear vibrating piece 40 is configured as described above, the X-axis is also applied to the inclined surface 11 inclined with respect to the main surface 10a on the front side of the crystal vibrating plate 10, as shown in FIGS. You may form partially on the side surface along a direction. By doing so, both the front and back of the negative side end in the X-axis direction where the pair of mounting members 25 are formed can be flattened, so that the mechanical strength of the crystal diaphragm 10 can be increased, Mount reliability at the time of mounting can be improved.
ところで、通常、水晶には「旋光性」があり、結晶面の現れ方の違いによって右水晶と左水晶に分かれることが知られている。そして、右水晶からＡＴカットされた水晶板７をウェットエッチング加工した場合には、図１６に示すように、水晶の結晶構造上、水晶振動板１０の角部に切欠部４１が現れてしまうことが知られている。
従って、傾斜面１１を部分的に形成する場合には、この切欠部４１が小さい角部を実装平面部として利用することが好ましい。
なお、左水晶からＡＴカットされた水晶板７をウェットエッチング加工した場合には、水晶振動板１０のＸ軸方向の−側の角部の切欠部４１が小さくなる。従って、この場合には、切欠部４１の位置に合わせて傾斜面１１等を形成すれば良い。つまり、左水晶を利用する場合には、図１６に示すように水晶振動板１０のＸ軸方向の−側を実装平面部とすることが好ましい。なお、右水晶の場合には、これとは逆にＸ軸方向の＋側を実装平面部とすることが好ましい。 By the way, it is generally known that quartz has “optical rotation” and is divided into a right crystal and a left crystal depending on how crystal planes appear. When the crystal plate 7 AT cut from the right crystal is wet-etched, a notch 41 appears at the corner of the crystal diaphragm 10 due to the crystal structure of the crystal as shown in FIG. It has been known.
Therefore, when the inclined surface 11 is partially formed, it is preferable to use a corner portion having a small cutout portion 41 as a mounting plane portion.
In addition, when the crystal plate 7 AT-cut from the left crystal is subjected to wet etching, the cutout portion 41 at the corner on the negative side in the X-axis direction of the crystal vibration plate 10 becomes small. Therefore, in this case, the inclined surface 11 or the like may be formed in accordance with the position of the notch 41. That is, when the left crystal is used, it is preferable that the negative side in the X-axis direction of the crystal diaphragm 10 is a mounting plane part as shown in FIG. In the case of the right crystal, on the contrary, it is preferable to set the + side in the X-axis direction as the mounting plane part.
従って、傾斜面１１を部分的に形成する場合には、この切欠部４１が小さい角部を実装平面部として利用することが好ましい。
なお、左水晶からＡＴカットされた水晶板７をウェットエッチング加工した場合には、水晶振動板１０のＸ軸方向の−側の角部の切欠部４１が小さくなる。従って、この場合には、切欠部４１の位置に合わせて傾斜面１１等を形成すれば良い。つまり、左水晶を利用する場合には、図１６に示すように水晶振動板１０のＸ軸方向の−側を実装平面部とすることが好ましい。なお、右水晶の場合には、これとは逆にＸ軸方向の＋側を実装平面部とすることが好ましい。 By the way, it is generally known that quartz has “optical rotation” and is divided into a right crystal and a left crystal depending on how crystal planes appear. When the crystal plate 7 AT cut from the right crystal is wet-etched, a notch 41 appears at the corner of the crystal diaphragm 10 due to the crystal structure of the crystal as shown in FIG. It has been known.
Therefore, when the inclined surface 11 is partially formed, it is preferable to use a corner portion having a small cutout portion 41 as a mounting plane portion.
In addition, when the crystal plate 7 AT-cut from the left crystal is subjected to wet etching, the cutout portion 41 at the corner on the negative side in the X-axis direction of the crystal vibration plate 10 becomes small. Therefore, in this case, the inclined surface 11 or the like may be formed in accordance with the position of the notch 41. That is, when the left crystal is used, it is preferable that the negative side in the X-axis direction of the crystal diaphragm 10 is a mounting plane part as shown in FIG. In the case of the right crystal, on the contrary, it is preferable to set the + side in the X-axis direction as the mounting plane part.
また、傾斜面１１を部分的に形成する場合には、図１７に示すように、傾斜面１１上にもマウント電極２３を形成することが好ましい。
こうすることで、実装時に仮に実装部材２５が裏側の主面１０ｂの平坦部分から傾斜面１１側に広がってしまったとしても、マウント電極２３との導通を確保することができる。従って、マウント電極２３とインナー電極３０との導通性を確実なものにすることができ、実装品質を向上することができるうえ、安定した振動特性を維持することができる。 When the inclined surface 11 is partially formed, it is preferable to form the mount electrode 23 on the inclined surface 11 as shown in FIG.
By doing so, even if the mounting member 25 spreads from the flat portion of the main surface 10b on the back side to the inclined surface 11 side during mounting, electrical connection with the mount electrode 23 can be ensured. Therefore, the electrical continuity between the mount electrode 23 and the inner electrode 30 can be ensured, the mounting quality can be improved, and stable vibration characteristics can be maintained.
こうすることで、実装時に仮に実装部材２５が裏側の主面１０ｂの平坦部分から傾斜面１１側に広がってしまったとしても、マウント電極２３との導通を確保することができる。従って、マウント電極２３とインナー電極３０との導通性を確実なものにすることができ、実装品質を向上することができるうえ、安定した振動特性を維持することができる。 When the inclined surface 11 is partially formed, it is preferable to form the mount electrode 23 on the inclined surface 11 as shown in FIG.
By doing so, even if the mounting member 25 spreads from the flat portion of the main surface 10b on the back side to the inclined surface 11 side during mounting, electrical connection with the mount electrode 23 can be ensured. Therefore, the electrical continuity between the mount electrode 23 and the inner electrode 30 can be ensured, the mounting quality can be improved, and stable vibration characteristics can be maintained.
また、上記実施形態では、Ｘ軸方向に沿った側面に傾斜面１１を形成したが、Ｚ’軸方向に沿った側面に形成しても構わない。
例えば、図１８及び図１９に示すように、Ｚ’軸方向に沿った側面の全長に亘って傾斜面１１を形成しても構わない。そして、この場合には、一対の実装部材２５を傾斜面１１と裏側の主面１０ｂとの間の稜線Ｅ上に共に形成することが可能である。
このように厚み滑り振動片（水晶振動片）５０を構成した場合には、一対の実装部材２５の両方が稜線Ｅ上に形成されているので、励起された振動をより阻害し難く、振動特性の低下をより効果的に抑制することができる。 In the above-described embodiment, the inclined surface 11 is formed on the side surface along the X-axis direction, but may be formed on the side surface along the Z′-axis direction.
For example, as shown in FIGS. 18 and 19, the inclined surface 11 may be formed over the entire length of the side surface along the Z′-axis direction. In this case, the pair of mounting members 25 can be formed together on the ridge line E between the inclined surface 11 and the main surface 10b on the back side.
When the thickness-shear vibrating piece (quartz crystal vibrating piece) 50 is configured in this way, since both the pair of mounting members 25 are formed on the ridge line E, it is more difficult to inhibit the excited vibration and vibration characteristics. Can be more effectively suppressed.
例えば、図１８及び図１９に示すように、Ｚ’軸方向に沿った側面の全長に亘って傾斜面１１を形成しても構わない。そして、この場合には、一対の実装部材２５を傾斜面１１と裏側の主面１０ｂとの間の稜線Ｅ上に共に形成することが可能である。
このように厚み滑り振動片（水晶振動片）５０を構成した場合には、一対の実装部材２５の両方が稜線Ｅ上に形成されているので、励起された振動をより阻害し難く、振動特性の低下をより効果的に抑制することができる。 In the above-described embodiment, the inclined surface 11 is formed on the side surface along the X-axis direction, but may be formed on the side surface along the Z′-axis direction.
For example, as shown in FIGS. 18 and 19, the inclined surface 11 may be formed over the entire length of the side surface along the Z′-axis direction. In this case, the pair of mounting members 25 can be formed together on the ridge line E between the inclined surface 11 and the main surface 10b on the back side.
When the thickness-shear vibrating piece (quartz crystal vibrating piece) 50 is configured in this way, since both the pair of mounting members 25 are formed on the ridge line E, it is more difficult to inhibit the excited vibration and vibration characteristics. Can be more effectively suppressed.
特に、励振電極２１で励起された振動は、Ｚ’軸方向に沿った側面において位相が零に等しいことが知られている。そのため、この側面に沿って傾斜面１１を形成し、その傾斜面１１の稜線Ｅ上に一対の実装部材２５を形成することで、振動特性の低下をより効果的に抑制し易い。
In particular, it is known that the vibration excited by the excitation electrode 21 has a phase equal to zero on the side surface along the Z′-axis direction. Therefore, by forming the inclined surface 11 along this side surface and forming the pair of mounting members 25 on the ridge line E of the inclined surface 11, it is easy to more effectively suppress the deterioration of the vibration characteristics.
なお、Ｚ’軸方向に沿った側面のうちＸ軸方向の＋側に位置する側面に関しては、図２０に示すように垂直面にしても構わないし、図２１に示すように切妻状に形成しても構わない。いずれの場合であっても、同様の作用効果を奏することができる。
Of the side surfaces along the Z′-axis direction, the side surface positioned on the + side in the X-axis direction may be a vertical surface as shown in FIG. 20, or may be formed as a gable as shown in FIG. It doesn't matter. In either case, the same effects can be achieved.
Ｅ…稜線
４、４０、５０…厚み滑り振動片（水晶振動片）
７…水晶板
１０…水晶振動板
１０ｂ…裏側の主面（水晶振動板の一方の主面）
１１…傾斜面
２０…電極膜
２５…実装部材
３０…インナー電極（外部電極） E ... Ridge line 4, 40, 50 ... Thickness sliding vibration piece (crystal vibration piece)
7 ... Crystal plate 10 ... Crystal plate 10b ... Main surface on the back side (one main surface of the crystal plate)
DESCRIPTION OF SYMBOLS 11 ... Inclined surface 20 ... Electrode film 25 ... Mounting member 30 ... Inner electrode (external electrode)
４、４０、５０…厚み滑り振動片（水晶振動片）
７…水晶板
１０…水晶振動板
１０ｂ…裏側の主面（水晶振動板の一方の主面）
１１…傾斜面
２０…電極膜
２５…実装部材
３０…インナー電極（外部電極） E ... Ridge line 4, 40, 50 ... Thickness sliding vibration piece (crystal vibration piece)
7 ... Crystal plate 10 ... Crystal plate 10b ... Main surface on the back side (one main surface of the crystal plate)
DESCRIPTION OF SYMBOLS 11 ... Inclined surface 20 ... Electrode film 25 ... Mounting member 30 ... Inner electrode (external electrode)
Claims (2)
- ＡＴカットされた水晶板がウェットエッチング加工により平面視矩形状に形成された水晶振動板と、
該水晶振動板の表裏主面上にそれぞれ形成された一対の電極膜と、
前記水晶振動板の一方の主面上における前記一対の電極膜上にそれぞれ形成され、外部電極と一対の電極膜とを導通させると共に前記水晶振動板を保持する一対の実装部材と、を備え、
前記水晶振動板は、前記一方の主面に対して鈍角となる角度で傾斜した傾斜面を側面の一部に有し、
前記一対の実装部材のうち少なくとも一方は、前記一方の主面上であって且つ前記傾斜面と前記一方の主面との間に形成される稜線の延長線上に位置するように形成され、
前記傾斜面は、水晶結晶のＸ軸方向に沿って形成されていることを特徴とする水晶振動片。 A quartz crystal plate in which an AT-cut quartz plate is formed in a rectangular shape in plan view by wet etching;
A pair of electrode films respectively formed on the front and back main surfaces of the crystal diaphragm;
A pair of mounting members that are respectively formed on the pair of electrode films on one main surface of the crystal diaphragm, and that conduct the external electrode and the pair of electrode films and hold the crystal diaphragm,
The quartz crystal plate has an inclined surface that is inclined at an obtuse angle with respect to the one main surface as a part of the side surface,
At least one of the pair of mounting members is formed on the one main surface and on an extension line of a ridge line formed between the inclined surface and the one main surface,
The inclined surface is formed along the X-axis direction of the quartz crystal. - 請求項１に記載の水晶振動片において、
前記電極膜は、前記傾斜面上にも形成されていることを特徴とする水晶振動片。 The quartz crystal resonator element according to claim 1 ,
The quartz crystal resonator element, wherein the electrode film is also formed on the inclined surface.
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| JP5251082B2 (en) * | 2007-11-22 | 2013-07-31 | セイコーエプソン株式会社 | Piezoelectric vibrating piece, piezoelectric device, and method of manufacturing piezoelectric vibrating piece |
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