JP5491913B2 - 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法 - Google Patents

化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法 Download PDF

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JP5491913B2
JP5491913B2 JP2010056798A JP2010056798A JP5491913B2 JP 5491913 B2 JP5491913 B2 JP 5491913B2 JP 2010056798 A JP2010056798 A JP 2010056798A JP 2010056798 A JP2010056798 A JP 2010056798A JP 5491913 B2 JP5491913 B2 JP 5491913B2
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acid
phenyl
biphenylylthio
chemically amplified
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JP2010244034A5 (https=
JP2010244034A (ja
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一生 鈴木
秀基 木村
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San Apro KK
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JP2010056798A 2009-03-18 2010-03-12 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法 Active JP5491913B2 (ja)

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JP2010056798A JP5491913B2 (ja) 2009-03-18 2010-03-12 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの製造方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011063796A (ja) * 2009-08-20 2011-03-31 San Apro Kk 光酸発生剤，光硬化性組成物及びポジ型フォトレジスト組成物

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JP7790991B2 (ja) * 2021-02-12 2025-12-23 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

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JPS61100557A (ja) * 1984-10-22 1986-05-19 ゼネラル・エレクトリツク・カンパニイ トリアリールスルホニウム塩およびその製法
JPH10287643A (ja) * 1997-04-10 1998-10-27 Nippon Kayaku Co Ltd 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
EP1902019B1 (en) * 2005-07-01 2010-07-07 Basf Se Sulphonium salt initiators
WO2007032109A1 (ja) * 2005-09-15 2007-03-22 Konica Minolta Medical & Graphic, Inc. 光硬化性組成物、光硬化性インク組成物及びそれを用いる印刷方法とレジスト用組成物
JP2008120700A (ja) * 2006-11-08 2008-05-29 San Apro Kk スルホニウム塩

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011063796A (ja) * 2009-08-20 2011-03-31 San Apro Kk 光酸発生剤，光硬化性組成物及びポジ型フォトレジスト組成物

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