JP5486057B2 - 薄膜太陽電池の製造方法 - Google Patents
薄膜太陽電池の製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 22
- 238000000034 method Methods 0.000 title claims description 22
- 239000004065 semiconductor Substances 0.000 claims description 70
- 239000000758 substrate Substances 0.000 claims description 33
- 239000010408 film Substances 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 5
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- 239000011669 selenium Substances 0.000 description 20
- 239000010949 copper Substances 0.000 description 16
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 14
- 238000007781 pre-processing Methods 0.000 description 14
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 10
- 229910052711 selenium Inorganic materials 0.000 description 10
- 229910052717 sulfur Inorganic materials 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 8
- 239000011593 sulfur Substances 0.000 description 8
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 229910052733 gallium Inorganic materials 0.000 description 7
- 239000011787 zinc oxide Substances 0.000 description 7
- 229910052738 indium Inorganic materials 0.000 description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000010248 power generation Methods 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 3
- 239000005083 Zinc sulfide Substances 0.000 description 3
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910052984 zinc sulfide Inorganic materials 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 240000002329 Inga feuillei Species 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
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- 239000000446 fuel Substances 0.000 description 1
- 239000005431 greenhouse gas Substances 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- GKCNVZWZCYIBPR-UHFFFAOYSA-N sulfanylideneindium Chemical compound [In]=S GKCNVZWZCYIBPR-UHFFFAOYSA-N 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
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- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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Description
[第1の実施の形態に係るCIS系薄膜太陽電池の構造]
まず、第1の実施の形態に係るCIS系薄膜太陽電池の構造について説明する。図1は、第1の実施の形態に係るCIS系薄膜太陽電池を例示する平面図である。図2は、図1のA−A線に沿う部分断面図である。図3は、図1のB−B線に沿う部分断面図である。
次に、第1の実施の形態に係るCIS系薄膜太陽電池の製造方法について説明する。図4〜図9は、第1の実施の形態に係るCIS系薄膜太陽電池の製造工程を例示する図である。なお、図4及び図5は、図2に対応する部分断面図である。
第1の実施の形態では、第3の分割溝14xを形成する前に前処理パターン14zを形成する例を示したが、第1の分割溝12xを形成する前に、前処理パターンを形成してもよい。
第1の実施の形態では、半導体層13及び第2の電極14のX方向の一端から他端にかけてX方向に平行な直線状の溝である前処理パターン14zを形成する例を示した。ここでは、前処理パターンの他の例について示す。なお、図10〜図13は、各々図8(a)に対応する部分平面図である。
11 基板
12 第1の電極
12x、13x、14x 分割溝
13 半導体層
14 第2の電極
14z、24z、34z、44z、54z 前処理パターン
19 セル
100 針
Claims (9)
- 基板上に第1の電極を成膜する第1の電極成膜工程と、
前記第1の電極を分割する第1の分割溝を形成し、前記第1の分割溝内に前記基板の表面を露出させる第1の分割溝形成工程と、
前記第1の電極上及び前記第1の分割溝内に半導体層を成膜する半導体層成膜工程と、
前記半導体層を分割する第2の分割溝を形成し、前記第2の分割溝内に前記第1の電極の表面を露出させる第2の分割溝形成工程と、
前記半導体層上及び前記第2の分割溝内に第2の電極を成膜する第2の電極成膜工程と、
前記第2の電極及び前記半導体層を分割する第3の分割溝を形成し、前記第3の分割溝内に前記第1の電極の表面を露出させる第3の分割溝形成工程と、を有し、
前記第1の分割溝を形成する工程、前記第2の分割溝を形成する工程、前記第3の分割溝を形成する工程のうち少なくとも一つの工程は、
前記分割溝を形成する層の前記分割溝の形成開始点を予め除去して開口部を形成し、前記開口部内に前記分割溝を形成する層の下層の表面を露出させる開口部形成工程と、
前記開口部上に配した針を前記開口部内で下降させ、前記開口部内に露出する前記下層の表面に前記針を接触させ、前記針を所定方向に走査して前記分割溝を形成する分割溝形成工程と、を含む薄膜太陽電池の製造方法。 - 前記開口部形成工程では、前記所定方向に垂直な方向に1本の連続した直線状の前記開口部を形成する請求項1記載の薄膜太陽電池の製造方法。
- 前記開口部形成工程では、前記所定方向に垂直な方向に離散的に配される複数の開口部を形成する請求項1記載の薄膜太陽電池の製造方法。
- 前記少なくとも一つの工程は、
前記分割溝形成工程の後、前記開口部を含む部分を切断する切断工程を含む請求項1乃至3の何れか一項記載の薄膜太陽電池の製造方法。 - 前記開口部形成工程では、メカニカルスクライブにより前記開口部を形成する請求項1乃至4の何れか一項記載の薄膜太陽電池の製造方法。
- 前記開口部形成工程は、前記第2の電極成膜工程と前記第3の分割溝形成工程との間に行われ、前記開口部内に前記第1の電極の表面を露出させる請求項1乃至5の何れか一項記載の薄膜太陽電池の製造方法。
- 前記開口部形成工程は、前記半導体層成膜工程と前記第2の分割溝形成工程との間に行われ、前記開口部内に前記第1の電極の表面を露出させる請求項1乃至6の何れか一項記載の薄膜太陽電池の製造方法。
- 前記開口部形成工程は、前記第1の電極成膜工程と前記第1の分割溝形成工程との間に行われ、前記開口部内に前記基板の表面を露出させる請求項1乃至7の何れか一項記載の薄膜太陽電池の製造方法。
- 前記基板はガラス基板であり、前記第1の電極が裏面電極として機能し、前記半導体層が化合物半導体から形成され、前記第2の電極が透明導電膜である請求項1乃至8の何れか一項記載の薄膜太陽電池の製造方法。
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Application Number | Priority Date | Filing Date | Title |
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JP2012198904A JP5486057B2 (ja) | 2012-09-10 | 2012-09-10 | 薄膜太陽電池の製造方法 |
PCT/JP2013/073119 WO2014038462A1 (ja) | 2012-09-10 | 2013-08-29 | 薄膜太陽電池の製造方法 |
US14/423,169 US9735307B2 (en) | 2012-09-10 | 2013-08-29 | Method of manufacturing thin-film solar cell |
EP13835807.2A EP2894674A4 (en) | 2012-09-10 | 2013-08-29 | METHOD FOR MANUFACTURING THIN FILM SOLAR CELL |
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JP2012198904A JP5486057B2 (ja) | 2012-09-10 | 2012-09-10 | 薄膜太陽電池の製造方法 |
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JP5486057B2 true JP5486057B2 (ja) | 2014-05-07 |
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JP6589362B2 (ja) * | 2015-05-08 | 2019-10-16 | 三星ダイヤモンド工業株式会社 | 薄膜太陽電池の加工装置、および、薄膜太陽電池の加工方法 |
JP6488940B2 (ja) | 2015-08-07 | 2019-03-27 | 富士電機株式会社 | 半導体装置 |
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JP2000261020A (ja) | 1999-03-12 | 2000-09-22 | Sharp Corp | 集積型薄膜太陽電池 |
JP3867230B2 (ja) | 2002-09-26 | 2007-01-10 | 本田技研工業株式会社 | メカニカルスクライブ装置 |
JP4358549B2 (ja) | 2003-04-28 | 2009-11-04 | 株式会社カネカ | 透光性薄膜太陽電池モジュール |
JP4064340B2 (ja) | 2003-12-25 | 2008-03-19 | 昭和シェル石油株式会社 | 集積型薄膜太陽電池の製造方法 |
WO2010071201A1 (ja) | 2008-12-19 | 2010-06-24 | シャープ株式会社 | 膜除去方法、光電変換装置の製造方法、光電変換装置、および膜除去装置 |
JP2010165879A (ja) | 2009-01-16 | 2010-07-29 | Fujifilm Corp | スクライブ加工装置、及びスクライブ加工方法 |
KR101574616B1 (ko) * | 2009-04-10 | 2015-12-04 | 반도키코 가부시키가이샤 | 유리판 선긋기 방법 및 선긋기 장치 |
DE102010013253B4 (de) | 2010-03-29 | 2018-04-19 | Oc3 Ag | Verfahren zum Strukturieren von CIGS-Dünnschichtsolarzellen |
KR20130109786A (ko) * | 2012-03-28 | 2013-10-08 | 삼성에스디아이 주식회사 | 태양전지 및 이의 제조방법 |
KR20140066285A (ko) * | 2012-11-22 | 2014-06-02 | 삼성에스디아이 주식회사 | 태양 전지 및 이의 제조 방법 |
KR20140135904A (ko) * | 2013-05-16 | 2014-11-27 | 삼성에스디아이 주식회사 | 박막 태양전지를 형성하는 제조방법, 박막 태양전지를 형성하는 제조장치, 및 상기 제조방법에 의해 형성된 버퍼층을 포함하는 박막 태양전지 |
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WO2014038462A1 (ja) | 2014-03-13 |
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US9735307B2 (en) | 2017-08-15 |
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EP2894674A4 (en) | 2015-09-23 |
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