JP5408652B2 - Charged particle beam writing method and apparatus - Google Patents

Description

  The present invention relates to a charged particle beam drawing method and apparatus for drawing a pattern with a charged particle beam on a sample placed on a movable stage.

  Conventionally, a drawing area on a sample placed on a movable stage is virtually divided into a plurality of strip-shaped stripes, and the movable stage is moved in the longitudinal direction of the stripes. There is known a charged particle beam drawing apparatus in which a pattern is drawn in a stripe on a sample by a charged particle beam irradiated and deflected by a deflector. An example of this type of charged particle beam drawing apparatus is described in, for example, Japanese Patent Application Laid-Open No. 2009-38055 (FIGS. 1 and 2).

  In the charged particle beam drawing apparatus described in Patent Document 1, a charged particle beam irradiated from a charged particle gun and deflected by a deflector during drawing movement of the movable stage in which the movable stage is moved in the longitudinal direction of the first stripe. Thus, a pattern is drawn in the first stripe on the sample. Next, when the drawing of the pattern in the first stripe is finished, the movable stage is moved back so that the movable stage is moved in the short direction of the stripe. Next, drawing movement of the movable stage with respect to the second stripe in which the movable stage is moved in the longitudinal direction of the second stripe is started, and the second stripe on the sample is irradiated by the charged particle beam irradiated from the charged particle gun and deflected by the deflector. A pattern is drawn inside.

1 and 2 of JP 2009-38055 A

  By the way, in the conventional charged particle beam drawing apparatus as described in Patent Document 1, the movable stage moves in the longitudinal direction of the first stripe even after the charged particle beam is finally irradiated into the first stripe. There are cases where the drawing movement of the movable stage is continued unnecessarily.

  That is, in the conventional charged particle beam drawing apparatus as described in Patent Document 1, for example, the position of irradiation of the charged particle beam last irradiated in the first stripe and the downstream end of the frame of the first stripe When there is a NULL region in which no pattern is drawn by the charged particle beam, the movable stage is moved in the longitudinal direction of the first stripe after the charged particle beam is finally irradiated in the first stripe. The drawing movement of the useless movable stage is continued.

  As a result, in the conventional charged particle beam drawing apparatus as described in Patent Document 1, for example, the irradiation position of the charged particle beam last irradiated in the first stripe and the downstream end of the frame of the first stripe If there is a NULL region in which a pattern is not drawn by a charged particle beam during this period, it is not possible to start the movable stage folding back early after the movable stage drawing movement related to the first stripe, and throughput is reduced. It cannot be improved.

  In view of the above-described problems, an object of the present invention is to provide a charged particle beam drawing method and apparatus capable of improving throughput by starting the return movement of the movable stage after drawing movement of the movable stage at an early stage. And

According to one aspect of the present invention, the drawing area on the sample placed on the movable stage is virtually divided into a plurality of strip-like stripes, and the movable stage is moved in the longitudinal direction of the stripes while the movable stage is being drawn. A drawing unit for drawing a pattern in a stripe on the sample by a charged particle beam irradiated from a charged particle gun and deflected by a deflector;
A JOB control unit that controls the entire drawing operation by the charged particle beam drawing apparatus;
A shot data generation unit for generating shot data of a charged particle beam;
A shot buffer for temporarily storing shot data generated by the shot data generation unit;
A drawing control unit that controls drawing by receiving stripe information based on shot data generated by the shot data generation unit from the shot data generation unit and issuing operation requests repeatedly;
In response to an operation request from the drawing control unit, a deflection control unit that controls the deflector based on the shot data temporarily stored in the shot buffer;
In response to an operation request from the drawing controller, a stage controller that controls the movement of the movable stage;
A return movement request storage unit for storing a return movement request of the movable stage issued from the drawing control unit;
When stripe end data attached to shot data of the charged particle beam that is last irradiated in the nth (n is a natural number) stripe is detected by the deflection control unit, the deflection control unit sends the stripe of the nth stripe to the stage control unit. Stripe end signal notifying means for notifying an end signal;
A drawing movement stop means for stopping the drawing movement of the movable stage in which the movable stage is moved in the longitudinal direction of the stripe based on the stripe end signal of the nth stripe notified from the deflection control unit to the stage control unit;
A return movement request storage section reference means for referring to the return movement request storage section after stopping the drawing movement of the movable stage;
A folding back movement executing means for performing a folding back movement of the movable stage, wherein the movable stage is moved at least in the short direction of the stripe based on the folding back movement request when the folding back movement request storage unit stores the folding back movement request; ,
There is provided a charged particle beam drawing apparatus comprising drawing movement start means for starting drawing movement of the movable stage in order to draw a pattern in the (n + 1) th stripe after completion of the return movement of the movable stage.

According to another aspect of the present invention, the drawing stage on the sample placed on the movable stage is virtually divided into a plurality of strip-like stripes, and the movable stage is drawn in the longitudinal direction of the stripes. In a charged particle beam writing method in which a pattern is drawn in a stripe on a sample by a charged particle beam irradiated from a charged particle gun and deflected by a deflector during movement,
During the drawing movement of the movable stage in which the movable stage is moved in the longitudinal direction of the stripe, a pattern is drawn in the nth stripe on the sample by the charged particle beam irradiated from the charged particle gun and deflected by the deflector,
When the deflection control unit detects the stripe end data attached to the shot data of the charged particle beam that is finally irradiated in the nth stripe, the deflection control unit notifies the stage control unit of the stripe end signal of the nth stripe. ,
Based on the stripe end signal of the nth stripe notified from the deflection control unit to the stage control unit, the movable stage stops drawing movement of the movable stage that is moved in the longitudinal direction of the stripe,
Refer to the return movement request storage after the drawing movement of the movable stage stops,
When the return movement request is stored in the return movement request storage unit, based on the return movement request, the movable stage performs a return movement of the movable stage at least in the short direction of the stripe,
After the movable stage is turned back, the movable stage starts moving to draw the movable stage, which is moved in the longitudinal direction of the stripe.
Provided is a charged particle beam writing method characterized in that a pattern is drawn in the (n + 1) th stripe on a sample by a charged particle beam irradiated from a charged particle gun and deflected by a deflector during drawing movement of a movable stage. The

  According to the present invention, the throughput can be improved by starting the folding movement of the movable stage after the drawing movement of the movable stage at an early stage.

1 is a schematic configuration diagram of a charged particle beam drawing apparatus 10 according to a first embodiment. It is a detailed view of the control computer 10b1 shown in FIG. It is a figure for demonstrating an example of the pattern P which can be drawn on the sample M by one shot of the charged particle beam 10a1b in the charged particle beam drawing apparatus 10 of 1st Embodiment. It is the figure which showed roughly an example of the drawing data D shown in FIG. 1 and FIG. 6 is a diagram for explaining a drawing order in which patterns corresponding to figures FG1, FG2,... Included in drawing data D are drawn by the charged particle beam 10a1b. FIG. 6 is a diagram for explaining in detail an example of a drawing order in which patterns P1, P2,... Corresponding to figures FG1, FG2,... Included in drawing data D are drawn by the charged particle beam 10a1b. It is a figure showing an example of the drawing order by which pattern P1 corresponding to figure FG1 contained in drawing data D is drawn by charged particle beam 10a1b. It is a figure for demonstrating in detail the movement of movable stage 10a2a shown in FIG. It is a figure for demonstrating in detail the movement of movable stage 10a2a shown in FIG. It is a figure for demonstrating in detail the movement of movable stage 10a2a shown in FIG. It is a figure for demonstrating in detail the movement of movable stage 10a2a shown in FIG. FIG. 12 is a diagram schematically showing a trajectory of a region A shown in FIGS. 8 to 11 that moves relative to a stripe STR1, STR2, STR3, STR4, STR5, and STR6 on a sample M; The locus of the region A that moves relative to the stripes STR1, STR2, STR3, STR4, STR5, STR6 on the sample M placed on the movable stage 10a2a of the charged particle beam drawing apparatus 10 of the third embodiment is schematically shown. It is the figure shown in.

  A charged particle beam drawing apparatus according to a first embodiment of the present invention will be described below. FIG. 1 is a schematic configuration diagram of a charged particle beam drawing apparatus 10 according to the first embodiment. FIG. 2 is a detailed view of the control computer 10b1 shown in FIG. In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, for example, a charged particle beam 10a1b is irradiated on a sample M such as a mask (blank), a wafer, etc. A drawing unit 10a for drawing a target pattern is provided.

  In the charged particle beam drawing apparatus 10 of the first embodiment, for example, an electron beam is used as the charged particle beam 10a1b. However, in the charged particle beam drawing apparatus 10 of the second embodiment, instead of the charged particle beam 10a1b, for example, It is also possible to use a charged particle beam other than an electron beam such as an ion beam.

  In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, for example, a charged particle gun 10a1a and deflectors 10a1c, 10a1d, which deflect the charged particle beam 10a1b irradiated from the charged particle gun 10a1a, 10a1e and 10a1f and a movable stage 10a2a on which a sample M to be drawn by the charged particle beam 10a1b deflected by the deflectors 10a1c, 10a1d, 10a1e, and 10a1f is placed are provided in the drawing unit 10a.

  Specifically, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIG. 1, for example, a movable stage in which a sample M is placed in a drawing chamber 10a2 constituting a part of the drawing unit 10a. 10a2a is arranged. For example, the movable stage 10a2a is configured to be movable in the X direction (left-right direction in FIG. 1) and the Y direction (front side-back side direction in FIG. 1).

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, for example, an optical barrel 10a1 constituting a part of the drawing unit 10a is provided with a charged particle gun 10a1a, a deflector 10a1c, 10a1d, 10a1e, 10a1f, lenses 10a1g, 10a1h, 10a1i, 10a1j, 10a1k, a first shaping aperture 10a1l, and a second shaping aperture 10a1m are arranged.

  Specifically, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIGS. 1 and 2, for example, when a JOB registration for drawing a pattern on the sample M is performed by an operator, for example. The entire drawing operation by the charged particle beam drawing apparatus 10 is controlled by the JOB control unit 10b1b of the control computer 10b1 of the control unit 10b. Specifically, for example, drawing data D is prepared, a shot data generation start instruction is sent from the JOB control unit 10b1b to the shot data generation unit 10b1c, and shot data is generated based on the drawing data D by the shot data generation unit 10b1c. The Further, for example, based on an instruction from the JOB control unit 10b1b, the sample M is transferred from the outside of the drawing chamber 10a2 onto the movable stage 10a2a in the drawing chamber 10a2. Next, when preparation for drawing is completed, for example, a drawing start instruction is sent from the JOB control unit 10b1b to the drawing control unit 10b1a.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, shot data generated by the shot data generation unit 10b1c of the control computer 10b1 of the control unit 10b is deflected. Before being sent to the control unit 10b1e, it is temporarily stored in the shot buffer 10b1d. Specifically, for example, shot data is generated in advance by the shot data generation unit 10b1c so that the shot buffer 10b1d is filled with the shot data generated by the shot data generation unit 10b1c.

  Further, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, stripes STR1, STR2, STR3, which will be described later, are executed by a control computer 10b1 of the control unit 10b. 5) is generated. The stripe information includes, for example, the frame size of the stripes STR1, STR2, STR3,..., The arrangement coordinates of the stripes STR1, STR2, STR3,. The X-direction (left-right direction in FIG. 5) coordinates of the charged particle beam 10a1b (see FIG. 5) irradiated to the beam, irradiation time distribution data of the charged particle beam 10a1b irradiated in the stripes STR1, STR2, STR3,. include. Specifically, the frame size of the stripes STR1, STR2, STR3,... And the arrangement coordinates of the stripes STR1, STR2, STR3,... On the sample M are for dividing the drawing area size and the drawing area into stripe sizes. Determined by the drawing conditions. After the frame size of the stripes STR1, STR2, STR3,... And the arrangement coordinates of the stripes STR1, STR2, STR3,... On the sample M are determined, the control computer 10b1 of the control unit 10b uses the stripes STR1, STR2, STR3. In the process of generating shot data for each, it is determined whether or not a drawing pattern exists in the stripes STR1, STR2, STR3,. Further, for the stripes STR1, STR2, STR3,... Where the drawing pattern exists, the frame information of the stripes STR1, STR2, STR3,..., The charged particles that are first irradiated into the stripes STR1, STR2, STR3,. The X direction coordinates of the beam 10a1b, irradiation time distribution data of the charged particle beam 10a1b irradiated in the stripes STR1, STR2, STR3,... Are sent to the drawing control unit 10b1a. The stripe information is stored in the shot data generation unit 10b1c until, for example, a stripe information request is sent from the drawing control unit 10b1a to the shot data generation unit 10b1c.

  In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, a drawing start instruction is given from the JOB control unit 10b1b of the control computer 10b1 of the control unit 10b to the drawing control unit 10b1a. When sent, the drawing control unit 10b1a starts the drawing process. Specifically, for example, a stripe information request is sent from the drawing control unit 10b1a to the shot data generation unit 10b1c, and the stripe information is sent from the shot data generation unit 10b1c to the drawing control unit 10b1a. For example, in the drawing control unit 10b1a, based on the stripe information, the moving speed of the movable stage 10a2a being drawn, the run-up distance of the movable stage 10a2a necessary for accelerating to the moving speed, each stripe STR1, STR2, STR3,. The position where the charged particle beam 10a1b (see FIG. 5) is first irradiated in (see FIG. 5) is calculated.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, a shot start request (see FIG. 2) among the operation requests is deflected from the drawing control unit 10b1a. Part 10b1e. Further, for example, a drawing movement request (see FIG. 2) and a return movement request (see FIG. 2) of the operation requests are independently sent from the drawing control unit 10b1a to the stage control unit 10b1f. That is, in the example shown in FIGS. 1 and 2, the drawing movement request and the folding movement request sent from the drawing control unit 10b1a to the stage control unit 10b1f are separated. Specifically, for example, in order to draw a pattern on the entire sample M with the charged particle beam 10a1b, the drawing control unit 10b1a to the deflection control unit 10b1e are repeated for each stripe STR1, STR2, STR3,. A shot start request is sent to the stage control unit 10b1a, and a drawing movement request and a folding movement request are sent from the drawing control unit 10b1a to the stage control unit 10b1f.

  In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, a shot start request is sent from the drawing control unit 10b1a of the control computer 10b1 of the control unit 10b to the deflection control unit 10b1e. When sent, the shot data temporarily stored in the shot buffer 10b1d is sent to the deflection control unit 10b1e. Next, for example, the deflectors 10a1c, 10a1d, 10a1e, and 10a1f are controlled by the deflection controller 10b1e based on the shot data. As a result, the charged particle beam 10a1b from the charged particle gun 10a1a is irradiated to a desired position on the sample M. Is done.

  Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, the shot data generated by the shot data generation unit 10b1c of the control computer 10b1 of the control unit 10b is used. Based on the control of the blanking deflector 10a1c via the deflection control circuit 10b2 by the deflection control unit 10b1e, the charged particle beam 10a1b irradiated from the charged particle gun 10a1a is, for example, the opening 10a1l ′ ( The sample M is allowed to pass through (see FIG. 3A) and is switched between being irradiated with the sample M or blocked by the part other than the opening 10a1l ′ of the first shaping aperture 10a1l, for example. That is, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the irradiation time of the charged particle beam 10a1b can be controlled by controlling the blanking deflector 10a1c.

  Moreover, in the charged particle beam drawing apparatus 10 of 1st Embodiment, as shown in FIG.1 and FIG.2, based on the shot data produced | generated by the shot data production | generation part 10b1c of the control computer 10b1 of the control part 10b, for example, By controlling the beam size variable deflector 10a1d through the deflection control circuit 10b3 by the deflection control unit 10b1e, the charged particle beam 10a1b transmitted through the opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l. Is deflected by the beam size variable deflector 10a1d. Next, all or part of the charged particle beam 10a1b deflected by the beam size variable deflector 10a1d is transmitted through the opening 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m. That is, in the charged particle beam drawing apparatus 10 according to the first embodiment, for example, the charge applied to the sample M is adjusted by adjusting the amount and direction of deflection of the charged particle beam 10a1b by the beam size variable deflector 10a1d. The size and shape of the particle beam 10a1b can be adjusted.

  FIG. 3 is a diagram for explaining an example of a pattern P that can be drawn on the sample M by one shot of the charged particle beam 10a1b in the charged particle beam drawing apparatus 10 of the first embodiment. In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 3A, for example, a pattern P (see FIG. 3A) is drawn on the sample M by the charged particle beam 10a1b. At this time, a part of the charged particle beam 10a1b irradiated from the charged particle gun 10a1a (see FIG. 1) is transmitted through, for example, a square opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l. . As a result, the horizontal sectional shape of the charged particle beam 10a1b transmitted through the opening 10a1l 'of the first shaping aperture 10a1l becomes, for example, a substantially square shape. Next, all or part of the charged particle beam 10a1b transmitted through the opening 10a1l 'of the first shaping aperture 10a1l is transmitted through the opening 10a1m' (see FIG. 3A) of the second shaping aperture 10a1m.

  In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 3A, for example, the light passes through the opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l. A horizontal cross section of the charged particle beam 10a1b transmitted through the opening 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m by deflecting the charged particle beam 10a1b that has been squeezed by the deflector 10a1d (see FIG. 1). The shape can be, for example, a rectangle (square or rectangle) or, for example, a triangle.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 3A, for example, the light passes through the opening 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m. By continuing to irradiate the squeezed charged particle beam 10a1b to a predetermined position on the sample M for a predetermined irradiation time, the aperture 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m was transmitted. A pattern P (see FIG. 3A) having substantially the same shape as the horizontal sectional shape of the charged particle beam 10a1b can be drawn on the sample M.

  That is, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 3A, the aperture 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l is transmitted. By controlling the amount and direction of the charged particle beam 10a1b deflected by the deflector 10a1d (see FIG. 1) by the deflection controller 10b1e (see FIG. 2), for example, the maximum size as shown in FIG. 3A and 3B, which are smaller than the maximum square pattern P, and the maximum size pattern P (see FIG. 3B) (see FIG. 3C, FIG. 3D, and FIG. 3E). ) Pattern P, which is smaller than the maximum size pattern P (see FIG. 3B), as shown in FIG. 3 (F), FIG. 3 (G), FIG. 3 (H) and FIG. Pattern P Etc., and it can be drawn onto the sample M with a single shot of the charged particle beam 10A1b.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, based on the shot data generated by the shot data generation unit 10b1c of the control computer 10b1 of the control unit 10b, By controlling the main deflector 10a1e through the deflection control circuit 10b4 by the deflection controller 10b1e, the charged particle beam 10a1b transmitted through the opening 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m is obtained. It is deflected by the main deflector 10a1e.

  Moreover, in the charged particle beam drawing apparatus 10 of 1st Embodiment, as shown in FIG.1 and FIG.2, based on the shot data produced | generated by the shot data production | generation part 10b1c of the control computer 10b1 of the control part 10b, for example, By controlling the sub deflector 10a1f via the deflection control circuit 10b5 by the deflection control unit 10b1e, the charged particle beam 10a1b deflected by the main deflector 10a1e is further deflected by the sub deflector 10a1f. That is, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the sample M is irradiated by adjusting the amount and direction of deflection of the charged particle beam 10a1b by the main deflector 10a1e and the sub deflector 10a1f. The irradiation position of the charged particle beam 10a1b to be performed can be adjusted.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, a stage movement request (from the drawing control unit 10b1a of the control computer 10b1 of the control unit 10b to the stage control unit 10b1f) ( Specifically, when a drawing movement request or a folding movement request (to be described later) is sent, the movement of the movable stage 10a2a is controlled by the stage control unit 10b1f.

  In the example shown in FIGS. 1 and 2, for example, obtained by converting CAD data (layout data, design data) created by a semiconductor integrated circuit designer into a format for the charged particle beam drawing apparatus 10. The drawing data D is input to the shot data generation unit 10b1c (in detail, via a distributor, a converter, etc.) of the control computer 10b1 of the control unit 10b of the charged particle beam drawing apparatus 10. In general, CAD data (layout data, design data) includes a large number of minute patterns, and the amount of CAD data (layout data, design data) is considerably large. Furthermore, generally, when CAD data (layout data, design data) is converted to another format, the amount of data after conversion further increases. In view of this point, the drawing data D input to the shot data generation unit 10b1c of the control computer 10b1 of the control unit 10b of the charged particle beam drawing apparatus 10 employs data hierarchization and compresses the data amount of the drawing data D. It is planned.

  FIG. 4 is a diagram schematically showing an example of the drawing data D shown in FIGS. In the example shown in FIG. 4, the drawing data D (see FIGS. 1 and 2) applied to the charged particle beam drawing apparatus 10 of the first embodiment includes, for example, a chip hierarchy CP and a frame lower than the chip hierarchy CP. It is hierarchized into a hierarchy FR, a block hierarchy BL lower than the frame hierarchy FR, a cell hierarchy CL lower than the block hierarchy BL, and a graphic hierarchy FG lower than the cell hierarchy CL.

  Specifically, in the example illustrated in FIG. 4, for example, a chip CP1 that is a part of the elements of the chip hierarchy CP corresponds to three frames FR1, FR2, and FR3 that are part of the elements of the frame hierarchy FR. Yes. Further, for example, a frame FR2 which is a part of the elements of the frame hierarchy FR corresponds to 18 blocks BL00,..., BL52 which are parts of the elements of the block hierarchy BL. Further, for example, the block BL21 which is a part of the elements of the block hierarchy BL corresponds to a plurality of cells CLA, CLB, CLC, CLD,. Further, for example, a cell CLA which is a part of the elements of the cell hierarchy CL corresponds to a large number of figures FG1, FG2,.

  In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1, 2, and 4, the graphic hierarchy FG (see FIG. 4) included in the drawing data D (see FIGS. 1 and 2). Patterns corresponding to a large number of figures FG1, FG2,... (See FIG. 4) are drawn on the sample M (see FIG. 1) by the charged particle beam 10a1b (see FIG. 1).

  FIG. 5 is a diagram for explaining a drawing order in which patterns corresponding to the figures FG1, FG2,... Included in the drawing data D are drawn by the charged particle beam 10a1b. In the example shown in FIG. 5, the drawing region on the sample M is virtually divided into, for example, six strip-like stripes STR1, STR2, STR3, STR4, STR5, and STR6.

  In the example shown in FIG. 5, for example, the charged particle beam 10a1b is scanned in the stripe STR1 from the plus side (right side in FIG. 5) to the minus side (left side in FIG. 5), and drawing data D (FIG. 5). 1 and FIG. 2), patterns corresponding to a large number of figures (not shown) included in the stripe STR1 on the sample M are drawn by the charged particle beam 10a1b. Next, for example, the charged particle beam 10a1b is scanned in the stripe STR2 from the negative side (left side in FIG. 5) to the positive side (right side in FIG. 5) and is included in the drawing data D (see FIG. 1). A pattern corresponding to a large number of figures (not shown) is drawn in the stripe STR2 on the sample M by the charged particle beam 10a1b. Next, similarly, patterns corresponding to a large number of figures (not shown) included in the drawing data D (see FIG. 1) are drawn in the stripes STR3, STR4, STR5, STR6 on the sample M by the charged particle beam 10a1b. The

  Specifically, in the example shown in FIG. 5, for example, when a pattern is drawn in the stripe STR1 on the sample M by the charged particle beam 10a1b, the movable stage 10a2a (see FIG. 1) is on the negative side of the X axis (FIG. 5). Control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1) so as to move in the longitudinal direction (left and right direction in FIG. 5) of the stripe STR1 from the left side to the plus side (right side in FIG. 5). The movable stage 10a2a is controlled by the stage control unit 10b1f (see FIG. 2) via the stage control circuit 10b6 (see FIG. 1) based on a drawing movement request (see FIG. 2) from the drawing control unit 10b1a (see FIG. 2). Is done. Next, for example, before the pattern is drawn in the stripe STR2 (see FIG. 5) on the sample M by the charged particle beam 10a1b, the movable stage 10a2a moves from the positive side (upper side in FIG. 5) to the negative side (see FIG. 5). The drawing control unit 10b1a of the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1) so as to move toward the lower side of 5) at least in the short direction of the stripe STR1 (up and down direction in FIG. 5). Based on the return movement request (see FIG. 2) from (see FIG. 2), the movable stage 10a2a is controlled by the stage control unit 10b1f (see FIG. 2) via the stage control circuit 10b6.

  Next, in the example shown in FIG. 5, for example, when a pattern is drawn in the stripe STR2 on the sample M by the charged particle beam 10a1b, the movable stage 10a2a (see FIG. 1) is on the plus side of the X axis (right side in FIG. 5). ) Is drawn by the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1) so as to move in the longitudinal direction (left and right direction in FIG. 5) of the stripe STR2 from the minus side (left side in FIG. 5). Based on a drawing movement request (see FIG. 2) from the control unit 10b1a (see FIG. 2), the movable stage 10a2a is controlled by the stage control unit 10b1f (see FIG. 2) via the stage control circuit 10b6 (see FIG. 1). .

  6 is a diagram for explaining in detail an example of a drawing order in which patterns P1, P2,... Corresponding to the figures FG1, FG2,... Included in the drawing data D are drawn by the charged particle beam 10a1b.

  In the example shown in FIG. 6, for example, a plurality of regions in the stripes STR1, STR2, STR3, STR4, STR5, STR6 (see FIG. 5) of the sample M (see FIG. 5) are called subfields SFn, SFn + 1,. It is further divided by a rectangular virtual area. Specifically, in the example shown in FIG. 6, for example, when the pattern P1 corresponding to the figure FG1 (see FIG. 4) included in the drawing data D (see FIG. 1) is drawn by the charged particle beam 10a1b, first, For example, the shot particle generator 10b1c (see FIG. 2) of the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1) generates the charged particle beam 10a1b in the subfield SFn. Based on the shot data, the main deflector 10a1e (see FIG. 1) is controlled by the deflection controller 10b1e (see FIG. 2) via the deflection control circuit 10b4 (see FIG. 1).

  Next, in the example shown in FIG. 6, for example, when the control of the main deflector 10a1e (see FIG. 1) is completed (when the settling time of the main deflector 10a1e has elapsed), the pattern P1 is drawn by the charged particle beam 10a1b. Further, deflection is performed by the deflection control unit 10b1e (see FIG. 2) based on the shot data generated by the shot data generation unit 10b1c (see FIG. 2) of the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1). The sub deflector 10a1f (see FIG. 1) is controlled via the control circuit 10b5 (see FIG. 1). Next, for example, when the control of the sub deflector 10a1f is completed (when the settling time of the sub deflector 10a1f has elapsed), the control unit starts irradiation of the charged particle beam 10a1b for drawing the pattern P1. Based on the shot data generated by the shot data generation unit 10b1c of the control computer 10b1 of 10b, the blanking deflector 10a1c via the deflection control circuit 10b2 (see FIG. 1) by the deflection control unit 10b1e of the control computer 10b1 of the control unit 10b. (See FIG. 1) is controlled.

  Next, in the example shown in FIG. 6, for example, when drawing of the pattern P1 by the charged particle beam 10a1b is completed, the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1) is stopped so that the irradiation of the charged particle beam 10a1b is stopped. The blanking deflector via the deflection control circuit 10b2 (see FIG. 1) by the deflection control unit 10b1e (see FIG. 2) based on the shot data generated by the shot data generation unit 10b1c (see FIG. 2) of FIG. 10a1c (see FIG. 1) is controlled. Next, for example, based on the shot data generated by the shot data generation unit 10b1c of the control computer 10b1 of the control unit 10b so that the pattern P2 is drawn by the charged particle beam 10a1b, the deflection control circuit 10b5 ( The sub-deflector 10a1f (see FIG. 1) is controlled via (see FIG. 1), and the pattern P2 is drawn in the same manner as the pattern P1.

  Next, in the example illustrated in FIG. 6, for example, when drawing of all the patterns P1, P2,... In the subfield SFn is completed, the control unit 10b is configured so that the charged particle beam 10a1b is irradiated into the subfield SFn + 1. Based on the shot data generated by the shot data generation unit 10b1c (see FIG. 2) of the control computer 10b1 (see FIG. 1) of the control computer 10b1 (see FIG. 1), the deflection control circuit 10b4 (see FIG. 2) 1), the main deflector 10a1e (see FIG. 1) is controlled.

  Next, in the example illustrated in FIG. 6, for example, when the control of the main deflector 10a1e (see FIG. 1) is completed (when the settling time of the main deflector 10a1e has elapsed), the pattern P11 is drawn by the charged particle beam 10a1b. Further, deflection is performed by the deflection control unit 10b1e (see FIG. 2) based on the shot data generated by the shot data generation unit 10b1c (see FIG. 2) of the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1). The sub deflector 10a1f (see FIG. 1) is controlled via the control circuit 10b5 (see FIG. 1), and the pattern P11 is drawn in the same manner as the patterns P1 and P2.

  Next, in the example shown in FIG. 6, for example, when drawing of the pattern P11 by the charged particle beam 10a1b is completed, the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1) is stopped so that the irradiation of the charged particle beam 10a1b is stopped. The blanking deflector via the deflection control circuit 10b2 (see FIG. 1) by the deflection control unit 10b1e (see FIG. 2) based on the shot data generated by the shot data generation unit 10b1c (see FIG. 2) of FIG. 10a1c (see FIG. 1) is controlled. Next, for example, based on the shot data generated by the shot data generation unit 10b1c of the control computer 10b1 of the control unit 10b so that the pattern P12 is drawn by the charged particle beam 10a1b, the deflection control circuit 10b5 ( The sub deflector 10a1f (refer to FIG. 1) is controlled via FIG. 1), and the pattern P12 is drawn in the same manner as the patterns P1, P2, and P11.

  FIG. 7 is a diagram showing an example of a drawing order in which the pattern P1 corresponding to the figure FG1 included in the drawing data D is drawn by the charged particle beam 10a1b. Specifically, FIG. 7 shows the charge necessary for drawing the pattern P1 corresponding to the figure FG1 included in the drawing data D on the sample M by the charged particle beam 10a1b in the charged particle beam drawing apparatus 10 of the first embodiment. It is a figure for demonstrating an example of the number of shots of particle beam 10a1b.

  In the charged particle beam drawing apparatus 10 of the first embodiment, for example, the pattern P1 (see FIG. 6) corresponding to the graphic FG1 (see FIG. 4) included in the drawing data D (see FIGS. 1 and 2) has a maximum size. When the pattern P is larger than the pattern P (see FIG. 3B), a plurality of shots of the charged particle beam 10a1b (see FIG. 3A) are performed as shown in FIG. In other words, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the pattern P1 (see FIG. 6) corresponding to the figure FG1 (see FIG. 4) included in the drawing data D (see FIGS. 1 and 2). Is larger than the maximum size pattern P (see FIG. 3B), etc., the shot data generation unit 10b1c (see FIG. 2) of the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1). Thus, the figure FG1 (see FIG. 4) included in the drawing data D (see FIG. 1 and FIG. 2) is a plurality of small figures corresponding to the patterns P1a, P1b, P1c, P1d, P1e, P1f, P1g, P1h, P1i. (Not shown) is divided on the drawing data to generate shot data. This division processing is generally called “shot division”, “graphic division”, or the like.

  Specifically, in the example shown in FIG. 7, for example, first, as shown in FIG. 7A, the pattern of the maximum size is obtained by the first shot of the charged particle beam 10a1b (see FIG. 3A). A pattern P1a having the same shape as P (see FIG. 3B) is drawn on the sample M.

  More specifically, in the example shown in FIG. 7, for example, the control of the control unit 10b (see FIG. 1) for positioning the charged particle beam 10a1b (see FIG. 3A) in the subfield SFn (see FIG. 6). When the control of the main deflector 10a1e (see FIG. 1) by the deflection controller 10b1e (see FIG. 2) of the computer 10b1 (see FIG. 1) is completed (when the settling time of the main deflector 10a1e has elapsed), the first charged particle As the pattern P1a (see FIG. 7A) is drawn by the shot of the beam 10a1b, the deflection control unit 10b1e (see FIG. 2) uses the deflection control circuit 10b5 (see FIG. 1) based on the shot data. The deflector 10a1f (see FIG. 1) is controlled.

  Next, for example, when the control of the sub deflector 10a1f (see FIG. 1) by the deflection control unit 10b1e (see FIG. 2) of the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1) is completed (sub deflection). In the shot data, the shot of the charged particle beam 10a1b (see FIG. 3A) for drawing the pattern P1a (see FIG. 7A) is started when the settling time of the container 10a1f has elapsed. Based on this, the blanking deflector 10a1c (see FIG. 1) is controlled by the deflection controller 10b1e (see FIG. 2) via the deflection control circuit 10b2 (see FIG. 1). Further, for example, when the control of the sub deflector 10a1f by the deflection control unit 10b1e is completed (when the settling time of the sub deflector 10a1f has elapsed), the charged particle beam 10a1b having a horizontal cross-sectional shape for drawing the pattern P1a Based on the shot data, the beam size variable deflector 10a1d (see FIG. 1) is controlled by the deflection controller 10b1e via the deflection control circuit 10b3 (see FIG. 1) based on the shot data.

  Next, for example, when the irradiation time of the charged particle beam 10a1b (see FIG. 3A) for drawing the pattern P1a (see FIG. 7A) ends, the irradiation of the charged particle beam 10a1b is stopped. Based on the shot data, the blanking deflector via the deflection control circuit 10b2 (see FIG. 1) by the deflection control unit 10b1e (see FIG. 2) of the control computer 10b1 (see FIG. 1) of the control unit 10b (see FIG. 1). 10a1c (see FIG. 1) is controlled.

  Next, in the example shown in FIG. 7, for example, as shown in FIG. 7B, the pattern P of the maximum size (FIG. 3B) is obtained by the second shot of the charged particle beam 10a1b (see FIG. 3A). The pattern P1b having the same shape as that in () is drawn on the sample M. Next, in the example shown in FIG. 7, for example, as shown in FIG. 7C, the pattern P of the maximum size (FIG. 3B) is obtained by the third shot of the charged particle beam 10a1b (see FIG. 3A). ) Reference) A smaller pattern P1c is drawn on the sample M.

  Next, in the example shown in FIG. 7, for example, as shown in FIG. 7D, the pattern P of the maximum size (FIG. 3B) is obtained by the fourth shot of the charged particle beam 10a1b (see FIG. 3A). The pattern P1d having the same shape as that in () is drawn on the sample M. Next, in the example shown in FIG. 7, for example, as shown in FIG. 7E, the pattern P of the maximum size (FIG. 3B) is obtained by the fifth shot of the charged particle beam 10a1b (see FIG. 3A). The pattern P1e having the same shape as that in () is drawn on the sample M. Next, in the example shown in FIG. 7, for example, as shown in FIG. 7 (F), the maximum size pattern P (FIG. 3 (B) is obtained by the sixth shot of the charged particle beam 10a1b (see FIG. 3 (A)). ) Reference) A smaller pattern P1f is drawn on the sample M.

  Next, in the example shown in FIG. 7, for example, as shown in FIG. 7G, the maximum size pattern P (FIG. 3B) is obtained by the seventh shot of the charged particle beam 10 a 1 b (see FIG. 3A). ) Reference) A smaller pattern P1g is drawn on the sample M. Next, in the example shown in FIG. 7, for example, as shown in FIG. 7 (H), the maximum size pattern P (FIG. 3 (B) is obtained by the eighth shot of the charged particle beam 10a1b (see FIG. 3 (A)). ) Reference) A smaller pattern P1h is drawn on the sample M. Next, in the example shown in FIG. 7, for example, as shown in FIG. 7 (I), the maximum size pattern P (FIG. 3 (B) is obtained by the ninth shot of the charged particle beam 10a1b (see FIG. 3 (A)). ) Reference) A smaller pattern P1i is drawn on the sample M.

  As a result, in the example shown in FIG. 7, the pattern P1 corresponding to the figure FG1 (see FIG. 4) included in the drawing data D (see FIGS. 1 and 2) is a charged particle beam 10a1b (see FIG. 3A). Is drawn on the sample M.

  In the example shown in FIG. 7, a shot of a charged particle beam 10a1b (see FIG. 3A) for drawing patterns P1a, P1b, P1d, and P1e having the same shape as the maximum size pattern P (see FIG. 3B). Even if it is performed four times, the pattern P1 cannot be drawn on the sample M, and nine shots of the charged particle beam 10a1b (see FIG. 3A) are required to draw the pattern P1 on the sample M. In order to easily explain this, the charged particle beam 10a1b (see FIG. 3A) for drawing the patterns P1a, P1b, P1d, and P1e having the same shape as the maximum size pattern P (see FIG. 3B). ) Four shots and a charged particle beam 10a1b for drawing patterns P1c, P1f, P1g, P1h, P1i smaller than the maximum size pattern P (see FIG. 3B). Are shot divided into five shots see FIG. 3 (A)). In the actual charged particle beam drawing apparatus 10, shot division is performed so as to avoid drawing a minute pattern such as the pattern P1i (see FIG. 7I). That is, for example, when the pattern P1 (see FIG. 7I) is drawn by nine shots of the charged particle beam 10a1b (see FIG. 3A), the pattern P1 is drawn in the X direction (left-right direction in FIG. 7). 3) A pattern that is divided into 9 equal rows in 3 rows × Y direction (vertical direction in FIG. 7) is drawn by one shot of the charged particle beam 10a1b (see FIG. 3A).

  Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 7A to 7I, a graphic FG1 included in the drawing data D (see FIGS. 1 and 2). During the period in which the pattern P1 corresponding to (see FIG. 4) is drawn in the stripe STR2 (see FIGS. 5 and 6) on the sample M by the charged particle beam 10a1b (see FIG. 3A), for example, The movable stage 10a2a (see FIG. 1) moves in the longitudinal direction (left and right direction in FIG. 5) of the stripe STR2 from the X axis positive side (right side in FIG. 5) toward the negative side (left side in FIG. 5). Based on the drawing movement request (see FIG. 2) sent from the drawing controller 10b1a (see FIG. 2) to the stage controller 10b1f (see FIG. 2), the stage controller 10b1f performs the stage control circuit 10b6 (see FIG. 1). Movable stage 10a2a is controlled via the irradiation).

  In the example shown in FIG. 5, for example, during a period in which a large number of patterns (not shown) are drawn in the stripe STR1 on the sample M by the charged particle beam 10a1b, for example, the movable stage 10a2a (see FIG. 1). The drawing controller 10b1a (see FIG. 2) moves in the longitudinal direction (left and right direction in FIG. 5) of the stripe STR1 from the negative side (left side in FIG. 5) to the positive side (right side in FIG. 5) of the X axis. ) To the stage control unit 10b1f (see FIG. 2), the movable stage 10a2a is controlled by the stage control unit 10b1f via the stage control circuit 10b6 (see FIG. 1). The

  Similarly, in the example shown in FIG. 5, for example, during a period in which a large number of patterns (not shown) are drawn in the stripe STR3 on the sample M by the charged particle beam 10a1b, for example, the movable stage 10a2a (see FIG. 1). ) Moves in the longitudinal direction of the stripe STR3 (left and right in FIG. 5) from the negative side (left side in FIG. 5) to the positive side (right side in FIG. 5) of the X axis (FIG. 2). The movable stage 10a2a is controlled by the stage control unit 10b1f via the stage control circuit 10b6 (see FIG. 1) based on the drawing movement request (see FIG. 2) sent from the reference control unit 10b1f to the stage control unit 10b1f (see FIG. 2). Is done.

  8-11 is a figure for demonstrating in detail the movement of movable stage 10a2a shown in FIG. 8 to 11, A irradiates the charged particle beam 10a1b onto the sample M placed on the movable stage 10a2a by deflecting the charged particle beam 10a1b by the main deflector 10a1e and the sub deflector 10a1f. It shows the possible areas. STR1R indicates the right end of the frame of the stripe STR1 (see FIG. 5), and STR1L indicates the left end of the frame of the stripe STR1. Furthermore, STR2R indicates the right end of the frame of the stripe STR2 (see FIG. 5), and STR2L indicates the left end of the frame of the stripe STR2. STR3R indicates the right end of the frame of the stripe STR3 (see FIG. 5), and STR3L indicates the left end of the frame of the stripe STR3. Furthermore, STR4R indicates the right end of the frame of the stripe STR4 (see FIG. 5).

  In the example shown in FIGS. 5 and 8 to 11, first, a drawing movement request (see FIG. 2) relating to the stripe STR1 (see FIGS. 5, 8, and 9) is sent to the drawing control unit 10b1a (see FIG. 2). To the stage controller 10b1f (see FIG. 2). Specifically, the shot is performed by the start of pattern drawing on the stripe STR1 (see FIGS. 5, 8, and 9) by the charged particle beam 10a1b (see FIGS. 5, 8B, and 9A). Based on the stripe information regarding the stripe STR1 sent from the data generation unit 10b1c (see FIG. 2) to the drawing control unit 10a1a (see FIG. 2), the charged particle beam 10a1b (see FIG. 8B) is first in the stripe STR1. A position PF1 ′ (see FIG. 8A) to be irradiated is calculated. Further, the moving speed of the movable stage 10a2a (see FIGS. 8 and 9) during the drawing of the pattern on the stripe STR1 by the charged particle beam 10a1b (see FIGS. 5, 8B, and 9A) is calculated. . Furthermore, the approach distance ΔX1a (see FIG. 8A) of the movable stage 10a2a necessary for accelerating to the moving speed is calculated.

  Next, in the examples shown in FIGS. 5 and 8 to 11, when the pattern drawing is started on the stripe STR <b> 1 (see FIGS. 5, 8 and 9) by the charged particle beam 10 a 1 b (see FIG. 8B), it is movable. The stage 10a2a (see FIG. 8A) is arranged at the drawing movement start position for the stripe STR1 shown in FIG. That is, in a state where the movable stage 10a2a is arranged at the drawing movement start position with respect to the stripe STR1, the region A is located at the position shown in FIG.

  Next, in the examples shown in FIGS. 5 and 8 to 11, the movable stage 10a2a (see FIGS. 8 and 9) moves from the minus side (left side in FIG. 8) to the plus side (right side in FIG. 8) of the X axis. The drawing movement of the movable stage 10a2a that is moved in the longitudinal direction (left-right direction in FIG. 8) of the stripe STR1 (see FIGS. 5, 8, and 9) is started. Furthermore, based on the shot start request (see FIG. 2) sent from the drawing control unit 10b1a (see FIG. 2) to the deflection control unit 10b1e (see FIG. 2), the charged particle beam 10a1b (FIG. 8B and FIG. 9). The deflectors 10a1c, 10a1d, 10a1e, and 10a1f (see FIG. 1) are controlled in order to irradiate the stripe STR1 (see (A)). Specifically, the pattern PF1 (see FIG. 8B) is placed on the sample M (see FIG. 8B) by the charged particle beam 10a1b (see FIG. 8B) first irradiated in the stripe STR1. Drawing is performed in the stripe STR1.

  That is, in the examples shown in FIGS. 5 and 8 to 11, the portion on the right side of the pattern PF <b> 1 (see FIG. 8C) in the rightmost region of the stripe STR <b> 1 (see FIGS. 5, 8, and 9). Becomes a NULL area (area where a pattern is not drawn) N1R (see FIG. 8C).

  Next, in the examples shown in FIGS. 5 and 8 to 11, the movable stage 10a2a (see FIGS. 8 and 9) moves from the minus side (left side in FIG. 8) to the plus side (right side in FIG. 8) of the X axis. The deflector is irradiated from the charged particle gun 10a1a (see FIG. 1) during the drawing movement of the movable stage 10a2a moved in the longitudinal direction (left and right direction in FIG. 8) of the stripe STR1 (see FIGS. 5, 8, and 9). A pattern is drawn in the stripe STR1 (see FIG. 5) on the sample M (see FIG. 5) by the charged particle beam 10a1b (see FIGS. 1 and 5) deflected by 10a1d, 10a1e, and 10a1f (see FIG. 1). The

  Next, in the example shown in FIGS. 5 and 8 to 11, the movable stage 10a2a (see FIGS. 8 and 9) moves from the minus side (left side in FIG. 9) to the plus side (right side in FIG. 9) of the X axis. During the drawing movement of the movable stage 10a2a moved in the longitudinal direction (left and right direction in FIG. 9) of the stripe STR1 (see FIGS. 5, 8 and 9), the charged particle beam 10a1b (lastly irradiated into the stripe STR1) 9A), the pattern PL1 (see FIG. 9A) is drawn in the stripe STR1 on the sample M (see FIG. 9A).

  That is, in the examples shown in FIGS. 5 and 8 to 11, the left portion of the stripe STR <b> 1 (see FIGS. 5, 8, and 9) is the left portion of the pattern PL <b> 1 (see FIG. 9B). Becomes a NULL area (area where a pattern is not drawn) N1L (see FIG. 9B).

  Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, the shot data generation unit 10b1c (see FIG. 2) passes through the shot buffer 10b1d (see FIG. 2) to the deflection control unit 10b1e (see FIG. 2). Stripe end data (not shown) is attached to the shot data of the charged particle beam 10a1b (see FIG. 9A) that is finally irradiated into the sent stripe STR1 (see FIGS. 5, 8, and 9). ing.

  Therefore, in the examples shown in FIGS. 5 and 8 to 11, when this stripe end data is detected by the deflection control unit 10b1e (see FIG. 2), the deflection control unit 10b1e changes to the stage control unit 10b1f (see FIG. 2). A stripe end signal (see FIG. 2) of the stripe STR1 is notified.

  Next, in the examples shown in FIGS. 5 and 8 to 11, the stripe STR1 (see FIGS. 5, 8, and 9) notified from the deflection control unit 10b1e (see FIG. 2) to the stage control unit 10b1f (see FIG. 2). ) By the charged particle beam 10a1b (see FIG. 9A) last irradiated in the stripe STR1 (see FIG. 9A) based on the stripe end signal (see FIG. 2). )) Is drawn in the stripe STR1 on the sample M (see FIG. 9A), and then the movable stage 10a2a (see FIGS. 8 and 9) is added from the negative side (left side of FIG. 9) of the X axis. The drawing movement of the movable stage 10a2a that is moved in the longitudinal direction (left and right direction in FIG. 9) of the stripe STR1 toward the side (right side in FIG. 9) is stopped in the state shown in FIG. 9 (A). It is.

  That is, in the examples shown in FIGS. 5 and 8 to 11, the left end STR1L (see FIG. 9A) of the frame of the stripe STR1 (see FIG. 9A) is in the region A (see FIG. 9A). The drawing movement of the movable stage 10a2a (see FIG. 9A) from the negative side of the X axis (left side of FIG. 9) to the positive side (right side of FIG. 9) is not continued until entering the stripe STR1. In the state shown in FIG. 9A where the left end STR1L of the frame is not within the area A, the drawing movement of the movable stage 10a2a from the minus side of the X axis toward the plus side is stopped.

  Next, in the examples shown in FIGS. 5 and 8 to 11, the drawing of the movable stage 10a2a (see FIG. 9A) from the minus side (left side in FIG. 9) to the plus side (right side in FIG. 9) of the X axis. After the movement is stopped, the return movement request storage unit 10b1f1 (see FIG. 2) of the stage control unit 10b1f (see FIG. 2) is referred to.

  In the charged particle beam drawing apparatus 10 of the first embodiment, for example, shot data of a charged particle beam 10a1b (see FIG. 8B) first irradiated in the stripe STR1 (see FIG. 8B) is shot. The data generation unit 10b1c (see FIG. 2) relates to the stripe STR2 (see FIGS. 5 and 9C) when it is sent to the deflection control unit 10b1e (see FIG. 2) via the shot buffer 10b1d (see FIG. 2). A temporary drawing movement start position of the movable stage 10a2a (see FIG. 9C) is set, and a return movement request for moving the movable stage 10a2a back to the temporary drawing movement start position is a drawing control unit 10b1a (FIG. 9). 2) and the return movement request storage unit 10b1f1 (FIG. 2) of the stage control unit 10b1f (see FIG. 2). Is stored in the irradiation).

  Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the left end STR2L (see FIG. 9C) of the frame of the stripe STR2 (see FIG. 9C) is the region A (see FIG. The temporary drawing movement start position of the movable stage 10a2a (see FIG. 9C) related to the stripe STR2 (see FIGS. 5 and 9C) is set so as to be located on the right side of (see C).

  That is, in the charged particle beam drawing apparatus 10 of the first embodiment, the drawing movement of the movable stage 10a2a (see FIG. 9A) is stopped in the state shown in FIG. 9A, and the stage control unit 10b1f (FIG. 2) is stopped. At the stage of referring to the return movement request storage unit 10b1f1 (see FIG. 2) of FIG. 9 (C), the movable stage 10a2a (see FIG. 9 (C)) still related to the stripe STR2 (see FIGS. 5 and 9C) shown in FIG. When the drawing movement start position of (see C)) is not fixed, the temporary drawing movement of the movable stage 10a2a related to the stripe STR2 described above from the drawing movement stop position of the movable stage 10a2a related to the stripe STR1 shown in FIG. 9A. The return movement of the movable stage 10a2a, where the movable stage 10a2a is moved to the start position, is started.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, drawing movement of the movable stage 10a2a (see FIG. 9A) related to the stripe STR1 (see FIG. 9A) shown in FIG. 9A. FIG. 9C shows a state in which the movable stage 10a2a is moved back from the stop position to the temporary drawing movement start position of the movable stage 10a2a with respect to the stripe STR2 (see FIG. 9C). When the drawing movement start position of the movable stage 10a2a related to the stripe STR2 is confirmed, and accordingly, the return movement request stored in the return movement request storage unit 10b1f1 (see FIG. 2) is changed (overwritten), the stripe STR2 The drawing movement start position of the movable stage 10a2a with respect to the temporary drawing movement start position It is changed to the drawing movement start position shown in FIG. 9 (C) from.

  Specifically, in this case, for example, based on the return movement request before the change, the return movement of the movable stage 10a2a to which the movable stage 10a2a is moved to the temporary drawing movement start position is started, and the return movement is executed. When the return movement request is changed, the return movement of the movable stage 10a2a is stopped, and then the movable stage 10a2a toward the drawing movement start position shown in FIG. 9C based on the changed return movement request. The folding movement of the movable stage 10a2a to which is moved is started.

  More specifically, in the examples shown in FIGS. 5 and 8 to 11, for example, at the stage where the drawing movement start position of the movable stage 10 a 2 a related to the stripe STR 2 shown in FIG. 9C is determined, the shot data generation unit 10 b 1 c ( Based on the stripe information related to the stripe STR2 sent from the drawing controller 10a1a (see FIG. 2) to the drawing controller 10a1a (see FIG. 2), the position where the charged particle beam 10a1b (see FIG. 9D) is first irradiated in the stripe STR2. PF2 ′ (see FIG. 9C) is calculated. Further, the moving speed of the movable stage 10a2a (see FIGS. 9 and 10) during the drawing of the pattern on the stripe STR2 by the charged particle beam 10a1b (see FIGS. 9D and 10B) is calculated. Furthermore, the approach distance ΔX2a (see FIG. 9C) of the movable stage 10a2a necessary for accelerating to the moving speed is calculated.

  In the charged particle beam drawing apparatus 10 of the first embodiment, for example, the movable stage 10a2a (see FIGS. 8 and 9) is moved from the minus side (left side in FIGS. 8 and 9) to the plus side (FIG. 8). And the drawing movement of the movable stage 10a2a with respect to the stripe STR1 that is moved in the longitudinal direction (left and right direction in FIGS. 8 and 9) of the stripe STR1 (see FIGS. 5, 8, and 9) toward the right side of FIG. In the middle, the drawing movement start position of the movable stage 10a2a related to the stripe STR2 shown in FIG. 9C is confirmed, and the return movement request stored in the return movement request storage unit 10b1f1 (see FIG. 2) is changed accordingly. Even when (overwritten), the drawing movement start position of the movable stage 10a2a with respect to the stripe STR2 is the temporary drawing movement start. It is changed to the drawing movement start position shown in FIG. 9 (C) from the position.

  Specifically, in this case, for example, based on the return movement request after the change, the drawing movement stop position of the movable stage 10a2a related to the stripe STR1 shown in FIG. 9A is related to the stripe STR2 shown in FIG. 9C. The return movement of the movable stage 10a2a is performed so that the movable stage 10a2a is moved to the drawing movement start position of the movable stage 10a2a. More specifically, in the example shown in FIG. 9, for example, during the execution of the folding movement of the movable stage 10 a 2 a, the movable stage 10 a 2 a is positive on the Y axis by the width dimension ΔY 12 (see FIG. 9C) of the stripe STR 2. At the same time it is moved in the short direction (up and down direction in FIG. 9) of the stripe STR2 from the side (upper side in FIG. 9) to the minus side (lower side in FIG. 9), only ΔX12 (see FIG. 9 (C)) The stripe STR2 is moved in the longitudinal direction (left and right direction in FIG. 9) from the negative side (left side in FIG. 9) to the positive side (right side in FIG. 9) of the X axis.

  In this way, in the example shown in FIGS. 5 and 8 to 11, it is movable at the start of pattern drawing on the stripe STR2 (see FIGS. 9 and 10) by the charged particle beam 10a1b (see FIG. 9D). The stage 10a2a (see FIG. 9C) is arranged at the drawing movement start position for the stripe STR2 shown in FIG. 9C. That is, in a state where the movable stage 10a2a is arranged at the drawing movement start position with respect to the stripe STR2, the region A is located at the position shown in FIG. 9C. For example, when the movable stage 10a2a is arranged at the drawing movement start position related to the stripe STR2 shown in FIG. 9C, the return movement request stored in the return movement request storage unit 10b1f1 (see FIG. 2) is deleted.

  Next, in the examples illustrated in FIGS. 5 and 8 to 11, for example, the stripe STR <b> 2 (FIGS. 5, 8, and 8) issued from the drawing control unit 10 b 1 a (see FIG. 2) to the stage control unit 10 b 1 f (see FIG. 2). 9) (see FIG. 2), the movable stage 10a2a (see FIG. 9 and FIG. 10) moves from the plus side (right side in FIG. 9) to the minus side (left side in FIG. 9) of the X axis. Then, the drawing movement of the movable stage 10a2a that is moved in the longitudinal direction (left and right direction in FIG. 9) of the stripe STR2 (see FIGS. 5, 9, and 10) is started. Further, based on the shot start request (see FIG. 2) sent from the drawing control unit 10b1a (see FIG. 2) to the deflection control unit 10b1e (see FIG. 2), the charged particle beam 10a1b (FIG. 9D) and FIG. The deflectors 10a1c, 10a1d, 10a1e, and 10a1f (see FIG. 1) are controlled in order to irradiate the stripe STR2 (see (B)). Specifically, the pattern PF2 (see FIG. 9D) is placed on the sample M (see FIG. 9D) by the charged particle beam 10a1b (see FIG. 9D) first irradiated in the stripe STR2. Drawing is performed in the stripe STR2.

  That is, in the examples shown in FIGS. 5 and 8 to 11, the left portion of the stripe STR <b> 2 (see FIGS. 5, 9, and 10) is located on the left side of the pattern PF <b> 2 (see FIG. 10A). Becomes a NULL area (area where a pattern is not drawn) N2L (see FIG. 10A).

  Next, in the examples shown in FIGS. 5 and 8 to 11, the movable stage 10a2a (see FIGS. 9 and 10) moves from the plus side (right side in FIG. 10) to the minus side (left side in FIG. 10) of the X axis. The deflector is irradiated from the charged particle gun 10a1a (see FIG. 1) during the drawing movement of the movable stage 10a2a moved in the longitudinal direction (left and right direction in FIG. 10) of the stripe STR2 (see FIGS. 5, 9, and 10). A pattern is drawn in the stripe STR2 (see FIG. 5) on the sample M (see FIG. 5) by the charged particle beam 10a1b (see FIGS. 1 and 5) deflected by 10a1d, 10a1e, and 10a1f (see FIG. 1). The

  Next, in the examples shown in FIGS. 5 and 8 to 11, the movable stage 10a2a (see FIGS. 9 and 10) moves from the plus side (right side in FIG. 10) to the minus side (left side in FIG. 10) of the X axis. During the drawing movement of the movable stage 10a2a moved in the longitudinal direction (left and right direction in FIG. 10) of the stripe STR2 (see FIGS. 5, 9, and 10), the charged particle beam 10a1b (lastly irradiated into the stripe STR2) 10B), the pattern PL2 (see FIG. 10B) is drawn in the stripe STR2 on the sample M (see FIG. 10B).

  That is, in the example shown in FIGS. 5 and 8 to 11, the portion on the right side of the pattern PL <b> 2 (see FIG. 10C) in the rightmost region of the stripe STR <b> 2 (see FIGS. 5, 9, and 10). Becomes a NULL area (area where a pattern is not drawn) N2R (see FIG. 10C).

  Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, the shot data generation unit 10b1c (see FIG. 2) passes through the shot buffer 10b1d (see FIG. 2) to the deflection control unit 10b1e (see FIG. 2). Stripe end data (not shown) is attached to the shot data of the charged particle beam 10a1b (see FIG. 10B) that is finally irradiated into the sent stripe STR2 (see FIGS. 5, 9, and 10). ing.

  Therefore, in the examples shown in FIGS. 5 and 8 to 11, when this stripe end data is detected by the deflection control unit 10b1e (see FIG. 2), the deflection control unit 10b1e changes to the stage control unit 10b1f (see FIG. 2). A stripe end signal (see FIG. 2) of the stripe STR2 is notified.

  Next, in the examples shown in FIGS. 5 and 8 to 11, the stripe STR2 (see FIGS. 5, 9, and 10) notified from the deflection control unit 10b1e (see FIG. 2) to the stage control unit 10b1f (see FIG. 2). ) By the charged particle beam 10a1b (see FIG. 10B) last irradiated in the stripe STR2 (see FIG. 10B) based on the stripe end signal (see FIG. 2). )) Is drawn in the stripe STR2 on the sample M (see FIG. 10B), the movable stage 10a2a (see FIGS. 9 and 10) is minus from the plus side (right side in FIG. 10) of the X axis. The drawing movement of the movable stage 10a2a that is moved in the longitudinal direction (left and right direction in FIG. 10) of the stripe STR2 toward the side (left side in FIG. 10) is schematically illustrated in FIG. It is stopped in the state shown in).

  That is, in the examples shown in FIGS. 5 and 8 to 11, the right end STR2R (see FIG. 10B) of the frame of the stripe STR2 (see FIG. 10B) is in the region A (see FIG. 10B). The drawing movement of the movable stage 10a2a (see FIG. 10B) from the positive side of the X axis (right side of FIG. 10) to the negative side (left side of FIG. 10) is not continued until it enters, but instead of the stripe STR2. In the state shown in FIG. 10B in which the right end STR2R of the frame is not within the area A, the drawing movement of the movable stage 10a2a from the plus side to the minus side of the X axis is stopped.

  Next, in the examples shown in FIGS. 5 and 8 to 11, the drawing of the movable stage 10a2a (see FIG. 10B) from the plus side (right side of FIG. 10) to the minus side (left side of FIG. 10) of the X axis. After the movement is stopped, the return movement request storage unit 10b1f1 (see FIG. 2) of the stage control unit 10b1f (see FIG. 2) is referred to.

  In the charged particle beam drawing apparatus 10 of the first embodiment, for example, shot data of a charged particle beam 10a1b (see FIG. 9D) first irradiated in the stripe STR2 (see FIG. 9D) is shot. The stripe STR3 (see FIG. 5 and FIG. 10D) is sent from the data generation unit 10b1c (see FIG. 2) to the deflection control unit 10b1e (see FIG. 2) via the shot buffer 10b1d (see FIG. 2). A temporary drawing movement start position of the movable stage 10a2a (see FIG. 10D) is set, and a return movement request for returning the movable stage 10a2a to the temporary drawing movement start position is a drawing control unit 10b1a (FIG. 10). 2) and the return movement request storage unit 10b1f1 (see FIG. 2) of the stage control unit 10b1f (see FIG. 2). Is stored in the second reference).

  Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the right end STR3R (see FIG. 10D) of the frame of the stripe STR3 (see FIG. 10D) is the region A (see FIG. The temporary drawing movement start position of the movable stage 10a2a (see FIG. 10 (D)) related to the stripe STR3 (see FIG. 5 and FIG. 10 (D)) is set so as to be located on the left side with respect to D).

  That is, in the charged particle beam drawing apparatus 10 of the first embodiment, the drawing movement of the movable stage 10a2a (see FIG. 10B) is stopped in the state shown in FIG. 10B, and the stage control unit 10b1f (FIG. 2) is stopped. At the stage when the return movement request storage unit 10b1f1 (see FIG. 2) of FIG. 10 is referred to, the movable stage 10a2a (see FIG. 10 (D)) of the stripe STR3 (see FIGS. 5 and 10D) shown in FIG. If the drawing movement start position of (see D)) is not fixed, the temporary drawing movement of the movable stage 10a2a related to the stripe STR3 described above from the drawing movement stop position of the movable stage 10a2a related to the stripe STR2 shown in FIG. The movable stage 10a2a is moved back to the start position. That.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, drawing movement of the movable stage 10a2a (see FIG. 10B) related to the stripe STR2 (see FIG. 10B) shown in FIG. 10B. FIG. 10D shows the movable stage 10a2a that is moved from the stop position to the temporary drawing movement start position of the movable stage 10a2a with respect to the stripe STR3 (see FIG. 10D). When the drawing movement start position of the movable stage 10a2a with respect to the stripe STR3 is confirmed, and accordingly, the folding movement request stored in the folding movement request storage unit 10b1f1 (see FIG. 2) is changed (overwritten), the stripe STR3. The drawing movement start position of the movable stage 10a2a with respect to the temporary drawing is From moving start position is changed to the drawing movement start position shown in FIG. 10 (D).

  Specifically, in this case, for example, based on the return movement request before the change, the return movement of the movable stage 10a2a to which the movable stage 10a2a is moved to the temporary drawing movement start position is started, and the return movement is executed. When the return movement request is changed, the return movement of the movable stage 10a2a is stopped, and then the movable stage 10a2a is moved toward the drawing movement start position shown in FIG. 10D based on the changed return movement request. The folding movement of the movable stage 10a2a to which is moved is started.

  More specifically, in the example shown in FIGS. 5 and 8 to 11, for example, when the drawing movement start position of the movable stage 10 a 2 a with respect to the stripe STR 3 shown in FIG. 10D is determined, the shot data generation unit 10 b 1 c ( Based on the stripe information regarding the stripe STR3 sent from the drawing controller 10a1a (see FIG. 2) to the drawing controller 10a1a (see FIG. 2), the position where the charged particle beam 10a1b (see FIG. 11A) is first irradiated in the stripe STR3. PF3 ′ (see FIG. 10D) is calculated. Further, the moving speed of the movable stage 10a2a (see FIGS. 10 and 11) while the pattern is being drawn on the stripe STR3 by the charged particle beam 10a1b (see FIG. 11A) is calculated. Furthermore, the approach distance ΔX3a (see FIG. 10D) of the movable stage 10a2a necessary for accelerating to the moving speed is calculated.

  In the charged particle beam drawing apparatus 10 according to the first embodiment, for example, the movable stage 10a2a (see FIGS. 9 and 10) is moved from the plus side (left side in FIGS. 9 and 10) to the minus side (FIG. 9). And the drawing movement of the movable stage 10a2a with respect to the stripe STR2 moved in the longitudinal direction (left and right direction in FIGS. 9 and 10) of the stripe STR2 (see FIGS. 5, 9, and 10) toward the right side of FIG. During this, the drawing movement start position of the movable stage 10a2a with respect to the stripe STR3 shown in FIG. 10D is confirmed, and accordingly, the folding movement request stored in the folding movement request storage unit 10b1f1 (see FIG. 2) is changed. Even when (overwritten), the drawing movement start position of the movable stage 10a2a with respect to the stripe STR3 is temporary. It is changed from the drawing movement start position to the drawing movement start position shown in FIG. 10 (D).

  Specifically, in this case, for example, based on the return movement request after the change, the drawing movement stop position of the movable stage 10a2a related to the stripe STR2 shown in FIG. 10B is related to the stripe STR3 shown in FIG. The return movement of the movable stage 10a2a is performed so that the movable stage 10a2a is moved to the drawing movement start position of the movable stage 10a2a. More specifically, in the example shown in FIG. 10, for example, during the execution of the folding movement of the movable stage 10 a 2 a, the movable stage 10 a 2 a is positive on the Y axis by the width dimension ΔY 23 (see FIG. 10D) of the stripe STR 3. At the same time it is moved in the short direction (up and down direction in FIG. 10) of the stripe STR3 from the side (upper side in FIG. 10) to the minus side (lower side in FIG. 10), only ΔX23 (see FIG. 10 (D)) The stripe STR3 is moved in the longitudinal direction (left and right direction in FIG. 10) from the positive side (right side in FIG. 10) to the negative side (left side in FIG. 10) of the X axis.

  In this way, in the example shown in FIGS. 5 and 8 to 11, it is movable at the start of pattern drawing on the stripe STR3 (see FIGS. 10 and 11) by the charged particle beam 10a1b (see FIG. 11A). The stage 10a2a (see FIG. 10D) is arranged at the drawing movement start position for the stripe STR3 shown in FIG. That is, in a state where the movable stage 10a2a is arranged at the drawing movement start position with respect to the stripe STR3, the region A is located at the position shown in FIG. For example, when the movable stage 10a2a is arranged at the drawing movement start position related to the stripe STR3 shown in FIG. 10D, the return movement request stored in the return movement request storage unit 10b1f1 (see FIG. 2) is deleted.

  Next, in the examples illustrated in FIGS. 5 and 8 to 11, for example, the stripe STR <b> 3 (FIG. 5, FIG. 8 and FIG. 8) issued from the drawing control unit 10 b 1 a (see FIG. 2) to the stage control unit 10 b 1 f (see FIG. 2). 9) (see FIG. 2), the movable stage 10a2a (see FIGS. 10 and 11) moves from the minus side (left side in FIG. 10) to the plus side (right side in FIG. 10) of the X axis. Then, the drawing movement of the movable stage 10a2a that is moved in the longitudinal direction (left and right direction in FIG. 10) of the stripe STR3 (see FIGS. 5, 10, and 11) is started. Further, based on the shot start request (see FIG. 2) sent from the drawing control unit 10b1a (see FIG. 2) to the deflection control unit 10b1e (see FIG. 2), the charged particle beam 10a1b (see FIG. 11A) is sent. The deflectors 10a1c, 10a1d, 10a1e, and 10a1f (see FIG. 1) are controlled to irradiate the stripe STR3. Specifically, the pattern PF3 (see FIG. 11A) is placed on the sample M (see FIG. 11A) by the charged particle beam 10a1b (see FIG. 11A) first irradiated in the stripe STR3. It is drawn in the stripe STR3.

  That is, in the examples shown in FIGS. 5 and 8 to 11, the portion on the right side of the pattern PF3 (see FIG. 11B) in the rightmost region of the stripe STR3 (see FIGS. 5, 10, and 11). Becomes a NULL area (area where a pattern is not drawn) N3R (see FIG. 11B).

  Next, in the examples shown in FIGS. 5 and 8 to 11, the movable stage 10a2a (see FIGS. 10 and 11) moves from the minus side (left side in FIG. 11) to the plus side (right side in FIG. 11) of the X axis. The deflector is irradiated from the charged particle gun 10a1a (see FIG. 1) during the drawing movement of the movable stage 10a2a moved in the longitudinal direction (left and right direction in FIG. 11) of the stripe STR3 (see FIGS. 5, 10, and 11). A pattern is drawn in the stripe STR3 (see FIG. 5) on the sample M (see FIG. 5) by the charged particle beam 10a1b (see FIGS. 1 and 5) deflected by 10a1d, 10a1e, and 10a1f (see FIG. 1). The

  That is, in the examples shown in FIGS. 5 and 8 to 11, for example, shot data of the charged particle beam 10 a 1 b (see FIG. 9A) that is finally irradiated into the stripe STR 1 (see FIG. 9A) is included. Before being generated by the shot data generation unit 10b1c (see FIG. 2), that is, before the drawing movement stop position of the movable stage 10a2a (see FIG. 9A) related to the stripe STR1 shown in FIG. Then, drawing of the pattern PF1,... (See FIG. 8B) in the stripe STR1 on the sample M (see FIG. 8B) by the charged particle beam 10a1b (see FIG. 8B) is started. it can.

  In other words, in the examples shown in FIGS. 5 and 8 to 11, for example, a shot of the charged particle beam 10a1b (see FIG. 9D) that is first irradiated into the stripe STR2 (see FIG. 9D). Before the data is generated by the shot data generation unit 10b1c (see FIG. 2), that is, the drawing movement start position of the movable stage 10a2a (see FIG. 9C) related to the stripe STR2 shown in FIG. 9C is determined. Before, a temporary drawing movement start position of the movable stage 10a2a with respect to the stripe STR2 is set, and a pattern in the stripe STR1 on the sample M (see FIG. 8B) by the charged particle beam 10a1b (see FIG. 8B) is set. Drawing of PF1,... (See FIG. 8B) can be started.

  Similarly, in the examples shown in FIGS. 5 and 8 to 11, for example, shot data of the charged particle beam 10a1b (see FIG. 10B) that is finally irradiated into the stripe STR2 (see FIG. 10B). Is generated by the shot data generation unit 10b1c (see FIG. 2), that is, before the drawing movement stop position of the movable stage 10a2a (see FIG. 10B) related to the stripe STR2 shown in FIG. Then, drawing of the pattern PF2,... (See FIG. 9D) in the stripe STR2 on the sample M (see FIG. 9D) by the charged particle beam 10a1b (see FIG. 9D) is started. Can do.

  In other words, in the example shown in FIGS. 5 and 8 to 11, for example, a shot of the charged particle beam 10a1b (see FIG. 11A) that is first irradiated into the stripe STR3 (see FIG. 11A). Before the data is generated by the shot data generation unit 10b1c (see FIG. 2), that is, the drawing movement start position of the movable stage 10a2a (see FIG. 10D) related to the stripe STR3 shown in FIG. Before, the temporary drawing movement start position of the movable stage 10a2a with respect to the stripe STR3 is set, and the pattern in the stripe STR2 on the sample M (see FIG. 9D) by the charged particle beam 10a1b (see FIG. 9D) is set. Drawing of PF2,... (See FIG. 9D) can be started.

  FIG. 12 is a diagram schematically showing the trajectory of the region A shown in FIGS. 8 to 11 that moves relative to the stripes STR1, STR2, STR3, STR4, STR5, and STR6 on the sample M. FIG. In FIG. 12, an arrow A1 indicates the locus of the region A (see FIGS. 8A to 9A) during the drawing movement of the movable stage 10a2a (see FIG. 1) regarding the stripe STR1. An arrow A12 indicates a region A during the return movement of the movable stage 10a2a to which the movable stage 10a2a is moved from the drawing movement stop position of the movable stage 10a2a related to the stripe STR1 to the drawing movement start position of the movable stage 10a2a related to the stripe STR2 (FIG. 9A). (See FIG. 9C). An arrow A1 ′ is useless after the charged particle beam 10a1b (see FIG. 9A) is finally irradiated into the stripe STR1 of the conventional charged particle beam drawing apparatus 10 in which the stripe end signal (see FIG. 2) is not notified. The locus of the area A during the drawing movement of the movable stage 10a2a is shown.

  In FIG. 12, an arrow A2 indicates the locus of the region A (see FIGS. 9C to 10B) during the drawing movement of the movable stage 10a2a (see FIG. 1) regarding the stripe STR2. An arrow A23 indicates a region A during the return movement of the movable stage 10a2a to which the movable stage 10a2a is moved from the drawing movement stop position of the movable stage 10a2a related to the stripe STR2 to the drawing movement start position of the movable stage 10a2a related to the stripe STR3 (FIG. 10B). (See FIG. 10D). An arrow A2 ′ is useless after the charged particle beam 10a1b (see FIG. 10B) is finally irradiated into the stripe STR2 of the conventional charged particle beam drawing apparatus 10 in which the stripe end signal (see FIG. 2) is not notified. The locus of the area A during the drawing movement of the movable stage 10a2a is shown.

  Further, in FIG. 12, an arrow A3 indicates the locus of the region A (see FIG. 10D) during the drawing movement of the movable stage 10a2a (see FIG. 1) regarding the stripe STR3. An arrow A34 indicates the locus of the area A during the return movement of the movable stage 10a2a to which the movable stage 10a2a is moved from the drawing movement stop position of the movable stage 10a2a with respect to the stripe STR3 to the drawing movement start position of the movable stage 10a2a with respect to the stripe STR4. . An arrow A3 ′ indicates that the useless movable stage 10a2a is being drawn and moved after the charged particle beam 10a1b is finally irradiated into the stripe STR3 of the conventional charged particle beam drawing apparatus 10 in which the stripe end signal (see FIG. 2) is not notified. The locus of region A is shown.

  In FIG. 12, an arrow A4 indicates the locus of the region A during the drawing movement of the movable stage 10a2a (see FIG. 1) regarding the stripe STR4. An arrow A45 indicates the locus of the area A during the return movement of the movable stage 10a2a to which the movable stage 10a2a is moved from the drawing movement stop position of the movable stage 10a2a with respect to the stripe STR4 to the drawing movement start position of the movable stage 10a2a with respect to the stripe STR5. . An arrow A4 ′ indicates that the useless movable stage 10a2a is being drawn and moved after the charged particle beam 10a1b is finally irradiated into the stripe STR4 of the conventional charged particle beam drawing apparatus 10 in which the stripe end signal (see FIG. 2) is not notified. The locus of region A is shown.

  Further, in FIG. 12, an arrow A5 indicates the locus of the area A during the drawing movement of the movable stage 10a2a (see FIG. 1) regarding the stripe STR5. An arrow A56 indicates the locus of the area A during the return movement of the movable stage 10a2a to which the movable stage 10a2a is moved from the drawing movement stop position of the movable stage 10a2a with respect to the stripe STR5 to the drawing movement start position of the movable stage 10a2a with respect to the stripe STR6. . An arrow A5 ′ indicates that the useless movable stage 10a2a is being drawn and moved after the charged particle beam 10a1b is finally irradiated into the stripe STR5 of the conventional charged particle beam drawing apparatus 10 to which the stripe end signal (see FIG. 2) is not notified. The locus of region A is shown.

  In FIG. 12, an arrow A6 indicates the locus of the area A during the drawing movement of the movable stage 10a2a (see FIG. 1) regarding the stripe STR6. An arrow A6 ′ indicates that the useless movable stage 10a2a is being drawn and moved after the charged particle beam 10a1b is finally irradiated into the stripe STR6 of the conventional charged particle beam drawing apparatus 10 in which the stripe end signal (see FIG. 2) is not notified. The locus of region A is shown.

  In the example shown in FIGS. 8 to 12, the drawing movement request (see FIG. 2) of the movable stage 10a2a (see FIG. 1) and the folding movement request (see FIG. 2) of the movable stage 10a2a are separated. Furthermore, the temporary drawing movement start position of the movable stage 10a2a with respect to the stripe STR2 can be set when the drawing movement of the movable stage 10a2a (see FIG. 1) with respect to the stripe STR1 is started. Therefore, in the examples shown in FIGS. 8 to 12, shot data of the charged particle beam 10a1b (see FIG. 9D) that is first irradiated into the stripe STR2 is not generated, and the movable stage 10a2a related to the stripe STR2 With the drawing movement start position (see FIG. 9C) not determined, the drawing movement of the movable stage 10a2a with respect to the stripe STR1 can be started.

  In the example shown in FIGS. 8 to 12, stripe end data is attached to shot data of the charged particle beam 10a1b (see FIG. 9A) that is finally irradiated into the stripe STR1. Further, based on the stripe end signal (see FIG. 2) notified to the stage controller 10b1f (see FIG. 2) when the stripe end data is detected by the deflection controller 10b1e (see FIG. 2), an arrow in FIG. The drawing movement of the movable stage 10a2a with respect to the stripe STR1 is stopped as indicated by A1, and the folding movement of the movable stage 10a2a is started as indicated by an arrow A12 in FIG. Therefore, in the example shown in FIGS. 8 to 12, the folding movement of the movable stage 10a2a is earlier than the case where the drawing movement of the movable stage 10a2a regarding the useless stripe STR1 is continued as shown by the arrow A1 ′ in FIG. As a result, throughput can be improved.

  Further, in the example shown in FIG. 12, when the drawing movement of the movable stage 10a2a related to the stripe STR6 indicated by the arrow A6 in FIG. 12 is stopped, the return movement request is stored in the return movement request storage unit 10b1f1 (see FIG. 2). Not. Therefore, the folding movement of the movable stage 10a2a is not executed after the drawing movement of the movable stage 10a2a with respect to the stripe STR6 is stopped.

  FIG. 13 shows the locus of the region A that moves relative to the stripes STR1, STR2, STR3, STR4, STR5, and STR6 on the sample M placed on the movable stage 10a2a of the charged particle beam drawing apparatus 10 of the third embodiment. FIG.

  In the charged particle beam lithography apparatus 10 of the first embodiment, as shown in FIG. 12, the region A is directed from the X axis plus side (right side in FIG. 12) toward the X axis minus side (left side in FIG. 12). The region A is moved relative to the stripes STR1, STR3, and STR5, and the region A moves from the negative side of the X axis (left side in FIG. 12) to the stripes STR2, STR4, and STR6 from the positive side of the X axis (right side in FIG. 12). However, in the charged particle beam drawing apparatus 10 of the third embodiment, instead, as shown in FIG. 13, the region A is moved from the negative side of the X axis (left side of FIG. 13) to the X axis. It is also possible to move relative to the stripes STR1, STR2, STR3, STR4, STR5, STR6 toward the plus side (right side in FIG. 13).

    In the fourth embodiment, the first to third embodiments described above can be appropriately combined.

DESCRIPTION OF SYMBOLS 10 Charged particle beam drawing apparatus 10a Drawing part 10a1a Charged particle gun 10a1b Charged particle beam 10a1c, 10a1d Deflector 10a1e Deflector 10a2a Movable stage 10b Control part 10b1 Control computer 10b1a Drawing control part 10b1b JOB control part 10b10b Shot data Shot buffer 10b1e Deflection control unit 10b1f Stage control unit 10b1f1 Folding movement request storage unit M Sample STR1, STR2, STR3 Stripe STR4, STR5, STR6 Stripe

Claims (5)

The drawing area on the sample placed on the movable stage is virtually divided into a plurality of strip-shaped stripes, and the movable stage is moved in the longitudinal direction of the stripe. A drawing unit that draws a pattern in a stripe on a sample by a charged particle beam deflected by a vessel;
A JOB control unit that controls the entire drawing operation by the charged particle beam drawing apparatus;
A shot data generation unit for generating shot data of a charged particle beam;
A shot buffer for temporarily storing shot data generated by the shot data generation unit;
A drawing control unit that controls drawing by receiving stripe information based on shot data generated by the shot data generation unit from the shot data generation unit and repeatedly issuing operation requests;
In response to an operation request from the drawing controller, a deflection controller that controls the deflector based on shot data temporarily stored in the shot buffer;
In response to an operation request from the drawing controller, a stage controller that controls the movement of the movable stage;
A return movement request storage unit for storing a return movement request of the movable stage issued from the drawing control unit;
A stripe end signal of the nth stripe is sent from the deflection control unit to the stage control unit when stripe end data attached to shot data of the charged particle beam finally irradiated in the nth stripe is detected by the deflection control unit. Stripe end signal notifying means for notifying
A drawing movement stop means for stopping the drawing movement of the movable stage that is moved in the longitudinal direction of the stripe based on the stripe end signal of the nth stripe notified from the deflection control unit to the stage control unit;
A return movement request storage section reference means for referring to the return movement request storage section after stopping the drawing movement of the movable stage;
When the return movement request is stored in the return movement request storage unit, the return movement executing means for executing the return movement of the movable stage based on the return movement request so that the movable stage is moved at least in the short direction of the stripe. When,
A charged particle beam drawing apparatus comprising drawing movement start means for starting drawing movement of the movable stage in order to draw a pattern in the (n + 1) th stripe after completion of the return movement of the movable stage. The drawing area on the sample placed on the movable stage is virtually divided into a plurality of strip-shaped stripes, and the movable stage is moved in the longitudinal direction of the stripe. In a charged particle beam writing method in which a pattern is drawn in a stripe on a sample by a charged particle beam deflected by a vessel,
During the drawing movement of the movable stage in which the movable stage is moved in the longitudinal direction of the stripe, a pattern is drawn in the nth stripe on the sample by the charged particle beam irradiated from the charged particle gun and deflected by the deflector,
When the deflection control unit detects the stripe end data attached to the shot data of the charged particle beam that is finally irradiated in the nth stripe, the deflection control unit notifies the stage control unit of the stripe end signal of the nth stripe. ,
Based on the stripe end signal of the nth stripe notified from the deflection control unit to the stage control unit, the movable stage stops drawing movement of the movable stage that is moved in the longitudinal direction of the stripe,
Refer to the return movement request storage after the drawing movement of the movable stage stops,
When the return movement request is stored in the return movement request storage unit, based on the return movement request, the movable stage performs a return movement of the movable stage at least in the short direction of the stripe,
After the movable stage is turned back, the movable stage starts moving to draw the movable stage, which is moved in the longitudinal direction of the stripe.
A charged particle beam drawing method, wherein a pattern is drawn in an (n + 1) th stripe on a sample by a charged particle beam irradiated from a charged particle gun and deflected by a deflector during drawing movement of a movable stage.   3. The charging according to claim 2, wherein the drawing of the pattern in the n-th stripe on the sample is started before the generation of shot data of the charged particle beam finally irradiated in the n-th stripe is completed. Particle beam drawing method.   When the folding movement request stored in the folding movement request storage unit is changed during the drawing movement of the movable stage relating to the nth stripe, the drawing movement start position of the movable stage relating to the (n + 1) th stripe is changed. The charged particle beam drawing method according to claim 3, wherein:   Stored in the return movement request storage unit during execution of the return movement of the movable stage in which the movable stage is moved from the drawing movement stop position of the movable stage related to the nth stripe to the temporary drawing start position of the movable stage related to the (n + 1) th stripe. 5. The charged particle beam drawing method according to claim 4, wherein the drawing movement start position of the movable stage with respect to the (n + 1) th stripe is changed when the return movement request is changed.

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