JP5403991B2 - Floor polish composition - Google Patents

Description

  The present invention relates to a floor polish composition, and particularly relates to a floor polish composition for applying gloss to a floor surface of an office building or a store to give gloss.

  In recent years, with the modernization of office buildings and stores, the required performance for floor polish is increasing to brighten and enhance the beauty of the room. As such floor polish, synthetic resin emulsion-based floor polish is widely used. Synthetic resin emulsion-based floor polishes are glossy on the floor surface by simply leaving to dry after application, and have been widely used in recent years. The synthetic resin emulsion floor polish is required to have various performances such as black heel mark resistance and high gloss. In order to improve these various performances, various types of synthetic resin emulsion floor polishes have been researched and developed.

As a floor polish of a synthetic resin emulsion system for the purpose of improving the above various properties, for example, a floor polish composition (Patent Document 1) containing an acrylic resin emulsion having a glass transition point in a specific range and a specific glycol ether, A coating composition (Patent Document 2) containing an acrylic resin emulsion having a glass transition point in a specific range and a molecular weight in a specific range, and an acrylic resin having a glass transition point in a specific range and an acid value in a specific range. A floor polish composition (Patent Document 3) and an aqueous emulsion composition for floor polish (Patent Document 4) containing an acrylic resin emulsion having a glass transition point in a specific range and a particle diameter in a specific range are disclosed. .
JP 2006-77190 A JP 2004-217878 A JP 2004-59745 A JP 09-95642 A

  The synthetic resin emulsion resin, which is the main component of the conventional floor polish described above, has an inherent minimum film-forming temperature (MFT). In order to form a film, a film-forming aid (such as an organic solvent) such as an organic solvent is used as an essential component. It was necessary to add a film auxiliary). On the other hand, the film forming auxiliary agent which is an essential component is a volatile organic compound (VOC) and has recently been pointed out as a cause of sick house syndrome.

  In order to improve the indoor environment, it is desired to develop a floor polish composition that does not contain a volatile organic compound (VOC) and that can satisfy various performances such as black heel mark resistance and high gloss. If the MFT of the synthetic resin emulsion is lowered by internal plasticization or external plasticization, the film-forming property is improved even without a film formation aid. However, since only an extremely soft film can be obtained with this, the black heel mark resistance is remarkably inferior and cannot be practically used.

  Accordingly, the present invention provides a floor polish composition that has good film-forming properties and can satisfy various performances such as black heel mark resistance and high gloss without containing a volatile organic compound (VOC). The task is to do.

  The present invention will be described below. In order to facilitate understanding of the present invention, reference numerals in the accompanying drawings are appended in parentheses, but the present invention is not limited to the illustrated embodiment.

As a result of earnest studies on the above problems, the present inventors have completed the following invention.
1st this invention is the floor polish composition containing acrylic resin emulsion, Comprising: The resin particle in this acrylic resin emulsion has a core-shell structure, Tg of this shell part is -50 degreeC or more and 20 degreeC A floor polish composition which is:

In the first aspect of the present invention, Tg of the core portion in the core-shell structure of the resin particles, Ru der least 50 ° C.. If the Tg of the core part is too low, the heel mark resistance may be poor.

  In the first aspect of the present invention, the solid content ratio between the core part and the shell part in the core-shell structure of the resin particles is preferably a mass ratio of core part / shell part = 50/50 or more and 95/5 or less. If the solid content ratio between the core portion and the shell portion is within such a range, the film-forming property and the heel mark resistance can be further improved.

  In the first aspect of the present invention, the resin particle comprises a polymer having a monomer unit derived from an ethylenically unsaturated carboxylic acid, and the proportion of the monomer unit derived from the ethylenically unsaturated carboxylic acid is 100% by mass of the whole polymer. 3 mass% or more and 30 mass% or less is preferable. The ethylenically unsaturated carboxylic acid is preferably acrylic acid or methacrylic acid. By providing a polymer containing a monomer unit derived from an ethylenically unsaturated carboxylic acid at a predetermined ratio, there is an effect that both peelability and water resistance are compatible.

  The floor polish composition of the present invention contains an acrylic resin emulsion containing resin particles having a predetermined core-shell structure, and thus has good film-forming properties without containing a volatile organic compound (VOC). In addition, it has excellent black heel mark resistance and high gloss.

  Hereinafter, the present invention will be described based on embodiments shown in the drawings.

<Floor polish composition>
The floor polish composition part of this invention contains the predetermined acrylic resin emulsion demonstrated below.
(Acrylic resin emulsion)
The acrylic resin emulsion used in the present invention is an acrylic resin emulsion obtained by emulsion polymerization of an ethylenically unsaturated monomer.

  Examples of the ethylenically unsaturated monomer include methyl acrylate, methyl methacrylate (hereinafter sometimes abbreviated as MMA), ethyl acrylate, ethyl methacrylate, n-propyl acrylate, and n methacrylate. -Propyl, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate (hereinafter sometimes abbreviated as BA), n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate T-butyl acrylate, t-butyl methacrylate, n-hexyl acrylate, n-hexyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, 2-ethylhexyl acrylate (hereinafter sometimes abbreviated as 2-EHA) ), 2-ethylhexyl methacrylate, octyl acrylate, meta (Meth) acrylic acid alkyl esters such as octyl yllate; ethylenically unsaturated compounds such as styrene (hereinafter may be abbreviated as St), α-methylstyrene, vinyltoluene, chlorostyrene, 2,4-dibromostyrene, etc. Aromatic monomers; ethylenically unsaturated nitriles such as acrylonitrile and methacrylonitrile; acrylic acid, methacrylic acid (hereinafter sometimes abbreviated as MAA), crotonic acid, maleic acid and anhydrides thereof, fumarate And monomers capable of radical polymerization such as ethylenically unsaturated carboxylic acids such as acid and itaconic acid. In addition, (meth) acrylic acid means acrylic acid and methacrylic acid. These ethylenically unsaturated monomers may be used alone or in combination of two or more. In addition, it is preferable that a (meth) acrylic unsaturated monomer is essential, and in this case, the proportion of monomers other than the (meth) acrylic unsaturated monomer is ethylenically unsaturated. It is preferable to make it 70% or less with respect to the whole monomer.

  Any conventionally known emulsifier can be used as the emulsifier used in producing the acrylic resin emulsion. For example, sodium styrene sulfonate, sodium vinyl sulfonate, Latemul S-180A (manufactured by Kao Corporation), Eleminol JS-2 (manufactured by Sanyo Chemical Co., Ltd.), Aqualon HS-10 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), Adekaria soap SE -10N (Asahi Denka Kogyo Co., Ltd.).

  The amount of these emulsifiers to be used is preferably 0.5 mass with respect to 100 mass parts of the total amount of ethylenically unsaturated monomers in consideration of the chemical stability, mechanical stability, etc. of the acrylic resin emulsion. It is the range below 5 parts by mass.

In producing the acrylic resin emulsion used in the present invention, conventionally known polymerization conditions can be employed. For example, a method of thermal polymerization or redox polymerization of the monomer mixture at 40 ° C. or higher and 80 ° C. or lower in the presence of the emulsifier and the free radical generating catalyst can be employed. Examples of the free radical generating catalyst include potassium persulfate (K ₂ S ₂ O ₈ ), sodium persulfate (Na ₂ S ₂ O ₈ ), ammonium persulfate ((NH ₄ ) ₂ S ₂ O ₈ ), persulfate An aqueous catalyst such as hydrogen oxide water can be used, and in some cases, redox polymerization can be performed using these catalysts in combination with a reducing agent such as acidic sodium sulfite and amines.

  As the acrylic resin emulsion used in the present invention, the resin particles in the emulsion preferably have a “core-shell structure”, and the Tg of the shell part is preferably −50 ° C. or more and 20 ° C. or less. . Moreover, it is preferable that Tg of the core part of the acrylic resin emulsion which has a core-shell structure is 50 degreeC or more.

  As a method for producing such an acrylic resin emulsion having a core-shell structure, any conventionally known method may be employed. For example, among the above-mentioned ethylenically unsaturated monomers, a core part having a Tg of 50 ° C. or more is formed. Examples include a multi-stage emulsion polymerization method in which a monomer that forms a shell part having a Tg of −50 ° C. or more and 20 ° C. or less is emulsion-polymerized after the monomer to be emulsion-polymerized.

  In the present invention, since the Tg of the polymer forming the shell part is -50 ° C. or higher and 20 ° C. or lower, the MFT is low, and the film-forming property is good even without adding a film forming aid such as an organic solvent. Can be. Further, since the Tg of the polymer forming the core portion is 50 ° C. or higher, the shell portion and the core portion are sintered after film formation to form a hard film having good black heel mark resistance. .

  In the acrylic resin emulsion having a core-shell structure, the solid content ratio of the core part to the shell part is preferably a mass ratio, and preferably core part / shell part = 50/50 or more and 95/5 or less. By setting the solid content ratio of the core part and the shell part in such a range, a floor polish composition with better film-forming properties and heel mark resistance can be obtained.

  The resin particle includes a polymer having a monomer unit derived from an ethylenically unsaturated carboxylic acid, and the proportion of the monomer unit derived from the ethylenically unsaturated carboxylic acid is 3% by mass or more, based on 100% by mass of the whole polymer. It is preferable that it is 30 mass% or less. Moreover, as an ethylenically unsaturated carboxylic acid which is a monomer, Preferably, acrylic acid or methacrylic acid is mentioned.

  By providing a polymer containing a monomer unit derived from an ethylenically unsaturated carboxylic acid at a predetermined ratio, there is an effect that both peelability and water resistance are compatible. If the proportion of the monomer unit derived from the ethylenically unsaturated carboxylic acid is too small, the peelability is inferior, and conversely if too large, the water resistance is inferior.

  The floor polish composition of the present invention preferably further contains a wax. It is preferable to use a wax (wax emulsion) obtained by emulsifying and dispersing an oxidized polyethylene wax having a melting point of 70 ° C. to 150 ° C. in water using an emulsifier. By using such a high melting point wax, more excellent heel mark resistance can be obtained.

  The solid content ratio of the acrylic resin emulsion and the wax emulsion is preferably acrylic resin part / wax part = 50/50 or more and 95/5 or less in terms of mass ratio. If the amount of wax used is within such a range, more excellent heel mark resistance can be obtained.

  In the floor polish composition of the present invention, polyvalent metal compounds, alkali-soluble resins, pH adjusters, preservatives, antifoaming agents, antibacterial agents, fragrances, dyes, urethane resins, colloidal silica, fluorescence A brightener, an ultraviolet absorber, etc. can be blended.

  Specifically, the floor polish composition of the present invention is an alkali-soluble resin or emulsion that is used as an auxiliary agent, for example, to help level the polymer or wax, or to improve peelability, if necessary. Contains appropriate amounts of fluorosurfactants that lower surface tension and improve wettability to the floor, polyvalent metal compounds to improve detergent resistance and peelability, other emulsifiers, preservatives, antifoaming agents, etc. You can also

  EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention concretely, this invention is not limited to these. Hereinafter, unless otherwise specified, “parts” and “%” represent “parts by mass” and “mass%”, respectively.

<Preparation of acrylic resin emulsion>
(Production Example 1)
A polymerization vessel equipped with a stirrer was charged with 100 parts of ion-exchanged water and 2 parts of Eleminol JS-2 (manufactured by Sanyo Chemical Co., Ltd.), and the temperature in the reaction vessel was raised to 80 ° C. while stirring while feeding nitrogen gas. After the temperature increase, the following monomer mixture (a-1) and an aqueous initiator solution were dropped into the reaction vessel, and polymerization was performed. The dropping time was 2 hours for the monomer mixture (a-1) and 4 hours for the initiator aqueous solution. After completion of the dropwise addition of the monomer mixed solution (a-1), the monomer mixed solution (a-2) was subsequently added dropwise to complete the polymerization while maintaining 80 ° C. The dropping time of the monomer mixture (a-2) was 2 hours. An acrylic resin emulsion (emulsion A) having a Tg of 0 ° C. in the shell part, a Tg of 66 ° C. in the core part and a solid content of 40% was obtained. Table 1 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed liquid (a-1) is 13 parts of 2-EHA, 50 parts of St, and 7 parts of MAA. The polymerization composition (shell part) of the monomer mixture (a-2) is 17 parts BA, 10 parts MMA, and 3 parts MAA. The aqueous initiator solution comprises 0.3 part of ammonium persulfate and 50 parts of ion exchange water.

(Production Example 2)
An acrylic resin emulsion (emulsion B) having a shell part Tg of −41 ° C., a core part Tg of 80 ° C., and a solid content of 40% is obtained in the same manner as in Production Example 1 except that the following monomer mixture is used. It was. Table 1 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed liquid (b-1) is 2-EHA 11 parts, St 70 parts, and MAA 9 parts. The polymerization composition (shell part) of the monomer mixture (b-2) is 9 parts BA and 1 part MAA.

(Production Example 3)
An acrylic resin emulsion (emulsion C) having a shell part Tg of 12 ° C., a core part Tg of 57 ° C., and a solid content of 40% was obtained in the same manner as in Production Example 1 except that the following monomer mixture was used. Table 1 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed liquid (c-1) is 15 parts of 2-EHA, 36 parts of St, and 9 parts of MAA. The polymerization composition (shell part) of the monomer mixture (c-2) is 20 parts BA, 14 parts MMA, and 6 parts MAA.

(Production Example 4)
An acrylic resin emulsion (emulsion D) having a Tg of -5 ° C., a Tg of 61 ° C. of the core part, and a solid content of 40% was obtained in the same manner as in Production Example 1 except that the following monomer mixture was used. . Table 1 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed solution (d-1) is BA 16 parts, MMA 60 parts, and MAA 4 parts. The polymerization composition (shell part) of the monomer mixture (d-2) is 12 parts of 2-EHA, 7 parts of St, and 1 part of MAA.

(Production Example 5)
An acrylic resin emulsion (emulsion E) having a Tg of -18 ° C., a Tg of 67 ° C., and a solid content of 40% is obtained in the same manner as in Production Example 1 except that the following monomer mixture is used. It was. Table 1 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed liquid (e-1) is 2-EHA 20 parts, MMA 40 parts, and MAA 20 parts. The polymerization composition (shell part) of the monomer mixture (e-2) is 15 parts BA and 5 parts MAA.

(Comparative Production Example 1)
An acrylic resin emulsion (emulsion F) having a Tg of 43 ° C. and a solid content of 40% was prepared in the same manner as in Production Example 1 except that only the monomer mixture (f) shown below was used and the monomer dropping time was 4 hours. Obtained. Table 2 shows the composition of the monomers.

  The polymerization composition of the monomer mixture (f) is 17 parts BA, 13 parts 2-EHA, 10 parts MMA, 50 parts St, and 10 parts MAA.

(Comparative Production Example 2)
An acrylic resin emulsion (emulsion G) having a Tg of 31 ° C. in the shell part, 66 ° C. in the core part and 40% solid content was obtained in the same manner as in Production Example 1 except that the following monomer mixture was used. Table 2 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed solution (g-1) is 13 parts of 2-EHA, 50 parts of St, and 7 parts of MAA. The polymerization composition (shell part) of the monomer mixture (g-2) is BA 11 parts, MMA 16 parts, and MAA 3 parts.

(Reference Production Example 1)
An acrylic resin emulsion (emulsion H) having a shell part Tg of 0 ° C., a core part Tg of 39 ° C., and a solid content of 40% was obtained in the same manner as in Production Example 1 except that the following monomer mixture was used. Table 2 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed solution (h-1) is 23 parts of 2-EHA, 40 parts of St, and 7 parts of MAA. The polymerization composition (shell part) of the monomer mixture (h-2) is 17 parts BA, 10 parts MMA, and 3 parts MAA.

(Reference Production Example 2)
An acrylic resin emulsion (emulsion I) having a shell part Tg of -14 ° C, a core part Tg of 74 ° C, and a solid content of 40% was obtained in the same manner as in Production Example 1 except that the following monomer mixture was used. . Table 2 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed liquid (i-1) is 2-EHA 6 parts, St 30 parts, and MAA 4 parts. The polymerization composition (shell part) of the monomer mixture (i-2) is 40 parts BA, 14 parts MMA, and 6 parts MAA.

(Reference Production Example 3)
An acrylic resin emulsion (emulsion J) having a Tg of -5 ° C, a Tg of 59 ° C, and a solid content of 40% was obtained in the same manner as in Production Example 1 except that the following monomer mixture was used. . Table 2 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed liquid (j-1) is 13 parts of 2-EHA, 56.3 parts of St, and 0.7 parts of MAA. The polymerization composition (shell part) of the monomer mixture (j-2) is 17 parts BA, 12.7 parts MMA, and 0.3 parts MAA.

(Reference Production Example 4)
An acrylic resin emulsion (emulsion K) having a Tg of 5 ° C., a Tg of 76 ° C. and a solid content of 40% was obtained in the same manner as in Production Example 1 except that the following monomer mixture was used. Table 2 shows the composition of the monomers.

  The polymerization composition (core part) of the monomer mixed liquid (k-1) is 2-EHA 20 parts, MMA 30 parts, and MAA 30 parts. The polymerization composition (shell part) of the monomer mixture (k-2) is BA 12.5 parts and MAA 7.5 parts.

<Examples 1-5, Comparative Examples 1-3, Reference Examples 1-4>
Using the emulsions A to E produced in Production Examples 1 to 5, aqueous floor polish compositions having the compositions shown in Table 3 were prepared, and the performance was measured (Examples 1 to 5). Moreover, the aqueous floor polish composition which has the composition of Table 4 was prepared using the emulsion FK manufactured by comparative manufacture example 1-2 and reference manufacture example 1-4, and the performance was measured (comparative example). 1-3, Reference Examples 1-4).

（注１）炭酸亜鉛溶液：容器に水５４．０ｇを入れ、撹拌しながら酸化亜鉛１０ｇを水中に分散した。２８％アンモニア水１８ｇ、炭酸アンモニア１８ｇを加え、炭酸亜鉛溶液を得た（亜鉛有効成分８．０％）。
（注２）ワックスエマルション：ハイテックＥ４Ｂ（東邦化学工業社製、固形分４０％）
（注３）アルカリ可溶性樹脂：スチレン・マレイン酸アンモニウム溶液（固形分１５％）
（注４）濡れ剤：フッ素系界面活性剤サーフロンＳ−１１１（セイミケミカル）

(Note 1) Zinc carbonate solution: 54.0 g of water was placed in a container, and 10 g of zinc oxide was dispersed in water while stirring. 18 g of 28% ammonia water and 18 g of ammonia carbonate were added to obtain a zinc carbonate solution (zinc active ingredient 8.0%).
(Note 2) Wax emulsion: Hitech E4B (Toho Chemical Industries, solid content 40%)
(Note 3) Alkali-soluble resin: Styrene / ammonium maleate solution (solid content 15%)
(Note 4) Wetting agent: Fluorosurfactant Surflon S-111 (Seimi Chemical)

（注１）〜（注４）については、表３におけるものと同様である。
（注５）ＴＢＥＰ：トリブトキエチルホスフェート（可塑剤）
（注６）ＤＥＧＭＥ：ジエチレングリコールモノエチルエーテル（皮膜形成助剤）

(Note 1) to (Note 4) are the same as those in Table 3.
(Note 5) TBEP: Tributoxyethyl phosphate (plasticizer)
(Note 6) DEGME: Diethylene glycol monoethyl ether (film formation aid)

About each obtained floor polish composition, film forming property, glossiness, heel mark resistance, water resistance, and peelability were measured. The results of Examples are shown in Table 5, and the results of Comparative Examples and Reference Examples are shown in Table 6. Each measuring method is as follows.
(1) Film-forming property In accordance with JFPA standard-02 “Adjustment of test base material”, a sample was applied three times using a homogeneous vinyl tile (manufactured by Toli Co., Ltd., Machiko S-Plane) and measured according to the following criteria: evaluated.
Good: The polish film has no defects and the film-forming property is good.
Defect: There is a defect (crack) in the polished film, and the film forming property is poor.

(2) Glossiness According to JFPA standard-10 “Method of measuring glossiness”, the sample was measured after coating three times using a composition vinyl tile (manufactured by Tori Co., Ltd., Pneumatic V).
The glossiness (60 ° specular high glossiness) is higher when the numerical value is larger. A glossiness of 60% or higher is a good gloss.

(3) Heel Mark Resistance According to JFPA standard-11 “Testing method for heel mark resistance”, a sample was applied three times using a composition vinyl tile (manufactured by Tori Co., Ltd., New Machico V) and measured.
The degree of the heel mark attached to the test piece was evaluated by a 5-point method.
5 points: No heel mark attached.
4 points: The heel mark is slightly adhered, but the aesthetic appearance is maintained.
3 points: A heel mark is adhered and the aesthetics are lowered to a practical limit.
2 points: Many heel marks are attached and unsightly.
1 point: The heel mark adheres remarkably much.

(4) Water resistance In accordance with JFPA standard-13 “Test method for water resistance”, the sample was measured after coating three times using a composition vinyl tile (manufactured by Toli Co., Ltd., New Machiko V).
It was examined whether or not the polished film after removing water droplets had a whitening phenomenon (decrease in gloss, cloudy white).
Good: No whitening phenomenon.
Defect: There is a whitening phenomenon.

(5) Peelability In accordance with JFPA standard-15 “Peelability test method”, the sample was measured after coating three times using a composition vinyl tile (manufactured by Tori Co., Ltd., Pneumatic V).
The number of reciprocating drives required for complete removal of the polish film was measured.
Excellent: Can be removed 25 to 50 times.
Good: Can be removed 51 to 100 times.
Normal: Can be removed 101 to 200 times.
Bad: 201 times or more.

  From Tables 5 and b, it was found that the floor polish compositions of the present invention (Examples 1 to 5) were excellent in film forming property, high glossiness, and excellent heel mark resistance. On the other hand, the compositions of Comparative Examples 1 and 3 were remarkably inferior in film-forming properties and could not withstand practical use. The composition of Comparative Example 2 is a conventional floor polish composition blended with a film forming aid, and has excellent film forming properties, high glossiness, and excellent heel mark resistance.

  In Reference Example 1, the Tg of the core part was too small as compared with the preferred range of the present invention, and thus the heel mark resistance was poor. In Reference Example 2, the solid content ratio of the core part and the shell part was inferior in heel mark resistance because the ratio of the core part was too small compared to the preferred range of the present invention. In Reference Example 3, the ratio of the monomer unit derived from the ethylenically unsaturated carboxylic acid (MAA unit) was too small compared with the preferred range of the present invention, and therefore the peelability was poor. In Reference Example 4, the water resistance was inferior because the ratio of monomer units derived from ethylenically unsaturated carboxylic acid (MAA units) was too large.

  While the present invention has been described in connection with embodiments that are presently the most practical and preferred, the present invention is not limited to the embodiments disclosed herein. However, the invention can be changed as appropriate without departing from the spirit or concept of the invention that can be read from the claims and the entire specification, and a floor polish composition with such a change is also included in the technical scope of the present invention. It must be understood as a thing.

Claims (5)

A floor polish composition containing an acrylic resin emulsion, resin particles of the acrylic resin emulsion has a core-shell structure state, and are a Tg of -50 ° C. or higher 20 ° C. or less of the shell portion, the core Tg parts are Ru der least 50 ° C., floor polish composition. The floor polish composition according to claim 1, wherein a solid content ratio of the core part to the shell part in the core-shell structure of the resin particles is a core part / shell part = 50/50 or more and 95/5 or less. object. The resin particle includes a polymer having a monomer unit derived from an ethylenically unsaturated carboxylic acid, and the proportion of the monomer unit derived from the ethylenically unsaturated carboxylic acid is 3% by mass or more, based on 100% by mass of the whole polymer. The floor polish composition of Claim 1 or 2 which is 30 mass% or less. The floor polish composition according to claim 3 , wherein the ethylenically unsaturated carboxylic acid is acrylic acid or methacrylic acid. The floor polish composition in any one of Claims 1-4 which does not contain a volatile organic compound.