JP5369177B2 - プラズマディスプレイパネル用emiフィルタ - Google Patents
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- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
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- C—CHEMISTRY; METALLURGY
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
- C03C17/3676—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use as electromagnetic shield
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- G—PHYSICS
- G02—OPTICS
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- G02B1/11—Anti-reflection coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
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- G02B5/28—Interference filters
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- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/44—Optical arrangements or shielding arrangements, e.g. filters, black matrices, light reflecting means or electromagnetic shielding means
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0094—Shielding materials being light-transmitting, e.g. transparent, translucent
- H05K9/0096—Shielding materials being light-transmitting, e.g. transparent, translucent for television displays, e.g. plasma display panel
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
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Description
Claims (19)
- プラズマディスプレイパネルと、プラズマディスプレイパネルの前部に設けた電磁妨害(EMI)フィルタとを備え、前記EMIフィルタは、ガラス基板によって支持されたEMI被膜を備え、前記EMI被膜は、前記ガラス基板から遠ざかる順に以下の層:
窒化ケイ素からなる第1層、
少なくとも2.2の屈折率(n)を有する第1の高屈折率層、
酸化亜鉛からなる第1層、
酸化亜鉛からなる第1層と接触する銀からなる第1のEMI遮蔽層、
銀からなる第1のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第1層、
第1の金属酸化物層、
酸化亜鉛からなる第2層、
酸化亜鉛からなる第2層と接触する銀からなる第2のEMI遮蔽層、
銀からなる第2のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第2層、
第2の金属酸化物層、
酸化亜鉛からなる第3層、
酸化亜鉛からなる第3層と接触する銀からなる第3のEMI遮蔽層、
銀からなる第3のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第3層、
第3の金属酸化物層、
および保護層
を有し、銀からなる第3のEMI遮蔽層は、銀からなる第1のEMI遮蔽層より厚く、銀からなる第2のEMI遮蔽層は、銀からなる第1のEMI遮蔽層以下の膜厚を有する、プラズマディスプレイ装置。 - 第1の高屈折率層は、チタン酸化物を含む、請求項1に記載のプラズマディスプレイ装置。
- ガラス基板およびこれに結合したEMI被膜は、少なくとも55%の可視透過率を有する、請求項1に記載のプラズマディスプレイ装置。
- 銀からなる第3のEMI遮蔽層は、銀からなる第1のEMI遮蔽層よりも厚い、請求項1に記載のプラズマディスプレイ装置。
- 銀からなる第3のEMI遮蔽層は、銀からなる第1および第2のEMI遮蔽層のいずれよりも厚い、請求項1に記載のプラズマディスプレイ装置。
- チタン酸化物からなり、第2および第3のEMI遮蔽層間に位置する少なくとも2.2の屈折率を有する第2の高屈折率層をさらに有する、請求項1に記載のプラズマディスプレイ装置。
- チタン酸化物からなる高屈折率層は、第1および第2のEMI遮蔽層間に位置しない、請求項6に記載のプラズマディスプレイ装置。
- プラズマディスプレイパネルと、プラズマディスプレイパネルの前部に設けた電磁妨害(EMI)フィルタとを備え、前記EMIフィルタは、ガラス基板によって支持されたEMI被膜を備え、前記EMI被膜は、前記ガラス基板から遠ざかる順に以下の層:
酸化亜鉛からなる第1層、
酸化亜鉛からなる第1層と接触する銀からなる第1のEMI遮蔽層、
銀からなる第1のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第1層、
酸化亜鉛からなる第2層、
酸化亜鉛からなる第2層と接触する銀からなる第2のEMI遮蔽層、
銀からなる第2のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第2層、
酸化亜鉛からなる第3層、
酸化亜鉛からなる第3層と接触する銀からなる第3のEMI遮蔽層、
銀からなる第3のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第3層、
および保護層
を有し、銀からなる第3のEMI遮蔽層は、銀からなる第1のEMI遮蔽層より厚く、銀からなる第2のEMI遮蔽層は、銀からなる第1のEMI遮蔽層以下の膜厚を有する、プラズマディスプレイ装置。 - 銀からなる第3のEMI遮蔽層は、銀からなる第1および/または第2のEMI遮蔽層よりも少なくとも1nm厚い、請求項8に記載のプラズマディスプレイ装置。
- ガラス基板およびこれに結合したEMI被膜が、少なくとも55%の可視透過率を有する、請求項8に記載のプラズマディスプレイ装置。
- ガラス基板および第1のEMI遮蔽層間に位置するが、第1および第2のEMI遮蔽層間に位置しない、チタン酸化物からなる高屈折率層をさらに有する、請求項8に記載のプラズマディスプレイ装置。
- ガラス基板によって支持され、かつ、ガラス基板から遠ざかる順に以下の層:
酸化亜鉛からなる第1層、
酸化亜鉛からなる第1層と接触する銀からなる第1のEMI遮蔽層、
銀からなる第1のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第1層、
酸化亜鉛からなる第2層、
酸化亜鉛からなる第2層と接触する銀からなる第2のEMI遮蔽層、
銀からなる第2のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第2層、
酸化亜鉛からなる第3層、
酸化亜鉛からなる第3層と接触する銀からなる第3のEMI遮蔽層、
銀からなる第3のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第3層、
および保護層
を有するEMI被膜を備え、銀からなる第3のEMI遮蔽層は、銀からなる第1のEMI遮蔽層より厚く、銀からなる第2のEMI遮蔽層は、銀からなる第1のEMI遮蔽層以下の膜厚を有する、ディスプレイ装置用のEMIフィルタ。 - プラズマディスプレイパネルと、プラズマディスプレイパネルの前部に設けた電磁妨害(EMI)フィルタとを備え、前記EMIフィルタは、ガラス基板によって支持されたEMI被膜を備え、前記EMI被膜は、前記ガラス基板から遠ざかる順に以下の層:
窒化ケイ素からなる第1層、
酸化亜鉛からなる第1層、
酸化亜鉛からなる第1層と接触する銀からなる第1のEMI遮蔽層、
銀からなる第1のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第1層、
第1の金属酸化物層、
酸化亜鉛からなる第2層、
酸化亜鉛からなる第2層と接触する銀からなる第2のEMI遮蔽層、
銀からなる第2のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第2層、
第2の金属酸化物層、
酸化亜鉛からなる第3層、
酸化亜鉛からなる第3層と接触する銀からなる第3のEMI遮蔽層、
銀からなる第3のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第3層、
第3の金属酸化物層、
および保護層
を有し、Niおよび/またはCrの酸化物からなる第3層は、Niおよび/またはCrの酸化物からなる第1および/または第2層の両方またはいずれか一方よりも少なく酸化され、銀からなる第3のEMI遮蔽層は、銀からなる第1のEMI遮蔽層より厚く、銀からなる第2のEMI遮蔽層は、銀からなる第1のEMI遮蔽層以下の膜厚を有する、プラズマディスプレイ装置。 - Niおよび/またはCrの酸化物からなる第3層は、Niおよび/またはCrの酸化物からなる第1および第2層の両方よりも少なく酸化される、請求項13に記載のプラズマディスプレイ装置。
- 銀からなる第4のEMI遮蔽層および少なくとも第3の金属酸化物層より上に位置するNiおよび/またはCrの酸化物からなる第4層をさらに有し、
Niおよび/またはCrの酸化物からなる第4層は、Niおよび/またはCrの酸化物からなる第1、第2および第3層のうち少なくとも2層よりも少なく酸化される、請求項13に記載のプラズマディスプレイ装置。 - 窒化ケイ素からなる第1層は、x/yが0.76から1.5までのSixNy層を有する、請求項13に記載のプラズマディスプレイ装置。
- 窒化ケイ素からなる第1層は、x/yが0.85から1.2までのSixNy層を有する、請求項13に記載のプラズマディスプレイ装置。
- プラズマディスプレイパネルと、プラズマディスプレイパネルの前部に設けた電磁妨害(EMI)フィルタとを備え、前記EMIフィルタは、ガラス基板によって支持されたEMI被膜を備え、前記EMI被膜は、前記ガラス基板から遠ざかる順に以下の層:
窒化ケイ素からなる第1層、
酸化亜鉛からなる第1層、
酸化亜鉛からなる第1層と接触する銀からなる第1のEMI遮蔽層、
銀からなる第1のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第1層、
第1の金属酸化物層、
酸化亜鉛からなる第2層、
酸化亜鉛からなる第2層と接触する銀からなる第2のEMI遮蔽層、
銀からなる第2のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第2層、
第2の金属酸化物層、
酸化亜鉛からなる第3層、
酸化亜鉛からなる第3層と接触する銀からなる第3のEMI遮蔽層、
銀からなる第3のEMI遮蔽層と接触するNiおよび/またはCrの酸化物からなる第3層、
第3の金属酸化物層、
および保護層
を有し、窒化ケイ素からなる第1層は、x/yが0.85から1.2までのSixNy層を有し、銀からなる第3のEMI遮蔽層は、銀からなる第1のEMI遮蔽層より厚く、銀からなる第2のEMI遮蔽層は、銀からなる第1のEMI遮蔽層以下の膜厚を有する、プラズマディスプレイ装置。 - 少なくとも第1および第2のEMI遮蔽層間に位置する窒化ケイ素からなる別の層をさらに有し、当該窒化ケイ素からなる別の層は、x/yが0.85から1.2までのSix
Ny層を有する、請求項18に記載のプラズマディスプレイ装置。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7193608P | 2008-05-27 | 2008-05-27 | |
US61/071,936 | 2008-05-27 | ||
US12/230,033 | 2008-08-21 | ||
US12/230,033 US7713633B2 (en) | 2008-05-27 | 2008-08-21 | EMI filter for plasma display panel |
PCT/US2009/002559 WO2009145864A1 (en) | 2008-05-27 | 2009-04-27 | Emi filter for plasma display panel |
Publications (3)
Publication Number | Publication Date |
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JP2011522287A JP2011522287A (ja) | 2011-07-28 |
JP2011522287A5 JP2011522287A5 (ja) | 2012-05-24 |
JP5369177B2 true JP5369177B2 (ja) | 2013-12-18 |
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JP2011511592A Expired - Fee Related JP5369177B2 (ja) | 2008-05-27 | 2009-04-27 | プラズマディスプレイパネル用emiフィルタ |
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US (3) | US7713633B2 (ja) |
EP (1) | EP2294904A1 (ja) |
JP (1) | JP5369177B2 (ja) |
KR (1) | KR20110021854A (ja) |
BR (1) | BRPI0912047A2 (ja) |
TW (1) | TW201007224A (ja) |
WO (1) | WO2009145864A1 (ja) |
Families Citing this family (23)
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US7713633B2 (en) * | 2008-05-27 | 2010-05-11 | Guardian Industries Corp. | EMI filter for plasma display panel |
US8329304B2 (en) * | 2008-05-27 | 2012-12-11 | Guardian Industries Corp. | Plasma display panel including TCC EMI filter, and/or method of making the same |
US8592059B2 (en) * | 2008-08-21 | 2013-11-26 | Guardian Industries Corp. | Plasma display panel including EMI filter, and/or method of making the same |
US8147975B2 (en) * | 2008-08-21 | 2012-04-03 | Guardian Industries Corp. | Plasma display panel including frameless EMI filter, and/or method of making the same |
MX2012008288A (es) * | 2010-01-19 | 2012-08-31 | Guardian Industries | Panel reflector secundario mejorado (srp) con recubrimiento tratable con calor para aplicaciones de energia solar concentrada y/o metodos para hacer el mismo. |
US10654748B2 (en) | 2010-03-29 | 2020-05-19 | Vitro Flat Glass Llc | Solar control coatings providing increased absorption or tint |
US8865325B2 (en) * | 2010-03-29 | 2014-10-21 | Ppg Industries Ohio, Inc. | Tempered and non-tempered glass coatings having similar optical characteristics |
US9932267B2 (en) * | 2010-03-29 | 2018-04-03 | Vitro, S.A.B. De C.V. | Solar control coatings with discontinuous metal layer |
US10654747B2 (en) | 2010-03-29 | 2020-05-19 | Vitro Flat Glass Llc | Solar control coatings with subcritical copper |
DE102011052540B4 (de) * | 2010-08-11 | 2017-10-26 | Corning Precision Materials Co., Ltd. | Mehrschichtiger Gegenstand und Verfahren zu seiner Herstellung |
US9242895B2 (en) | 2012-09-07 | 2016-01-26 | Guardian Industries Corp. | Coated article with low-E coating having absorbing layers for low film side reflectance and low visible transmission |
FR3005048B1 (fr) * | 2013-04-30 | 2020-09-25 | Saint Gobain | Substrat muni d'un empilement a proprietes thermiques |
US8940400B1 (en) | 2013-09-03 | 2015-01-27 | Guardian Industries Corp. | IG window unit including double silver coating having increased SHGC to U-value ratio, and corresponding coated article for use in IG window unit or other window |
KR20190133013A (ko) * | 2017-03-10 | 2019-11-29 | 가디언 글라스, 엘엘씨 | 유리 기판의 양측에 트리플 실버 코팅 및 유전체 코팅을 갖는 ig 윈도우 유닛 |
JP7025665B2 (ja) * | 2017-05-12 | 2022-02-25 | セントラル硝子株式会社 | 日射遮蔽部材 |
US10451783B2 (en) * | 2017-05-22 | 2019-10-22 | Viavi Solutions Inc. | Induced transmission filter having plural groups of alternating layers of dielectric material for filtering light with less than a threshold angle shift |
FR3072957B1 (fr) * | 2017-10-30 | 2019-10-18 | Saint-Gobain Glass France | Substrat muni d'un empilement a proprietes thermiques |
US11078718B2 (en) | 2018-02-05 | 2021-08-03 | Vitro Flat Glass Llc | Solar control coatings with quadruple metallic layers |
FR3082199B1 (fr) * | 2018-06-12 | 2020-06-26 | Saint-Gobain Glass France | Materiau comprenant un empilement a proprietes thermiques et esthetiques |
FR3082198B1 (fr) | 2018-06-12 | 2020-06-26 | Saint-Gobain Glass France | Materiau comprenant un empilement a proprietes thermiques et esthetique |
GB201820002D0 (en) * | 2018-12-07 | 2019-01-23 | Pilkington Group Ltd | Coated glass pane |
FR3099413B1 (fr) * | 2019-07-30 | 2021-10-29 | Saint Gobain | Materiau comprenant un substrat muni d’un empilement a proprietes thermiques pour affichage tête haute |
CN113448003B (zh) * | 2020-03-26 | 2022-07-15 | 比亚迪股份有限公司 | 一种黑色膜层组件及其制备方法和电子设备 |
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TW446637B (en) * | 1996-05-28 | 2001-07-21 | Mitsui Chemicals Inc | Transparent laminates and optical filters for displays using the same |
JP2000294980A (ja) | 1999-04-06 | 2000-10-20 | Nippon Sheet Glass Co Ltd | 透光性電磁波フィルタおよびその製造方法 |
KR100424254B1 (ko) * | 1999-08-06 | 2004-03-22 | 삼성에스디아이 주식회사 | 플라즈마 표시 장치용 광학 필터 |
US7879448B2 (en) | 2000-07-11 | 2011-02-01 | Guardian Industires Corp. | Coated article with low-E coating including IR reflecting layer(s) and corresponding method |
US7267879B2 (en) * | 2001-02-28 | 2007-09-11 | Guardian Industries Corp. | Coated article with silicon oxynitride adjacent glass |
US7344782B2 (en) * | 2000-07-10 | 2008-03-18 | Guardian Industries Corp. | Coated article with low-E coating including IR reflecting layer(s) and corresponding method |
US6576349B2 (en) * | 2000-07-10 | 2003-06-10 | Guardian Industries Corp. | Heat treatable low-E coated articles and methods of making same |
JP2002197925A (ja) * | 2000-12-26 | 2002-07-12 | Bridgestone Corp | 透明導電フィルム及びその製造方法 |
KR100786854B1 (ko) * | 2001-02-06 | 2007-12-20 | 삼성에스디아이 주식회사 | 디스플레용 필터막, 그 제조방법 및 이를 포함하는 표시장치 |
US6936347B2 (en) * | 2001-10-17 | 2005-08-30 | Guardian Industries Corp. | Coated article with high visible transmission and low emissivity |
US6787005B2 (en) * | 2002-09-04 | 2004-09-07 | Guardian Industries Corp. | Methods of making coated articles by sputtering silver in oxygen inclusive atmosphere |
FR2859721B1 (fr) * | 2003-09-17 | 2006-08-25 | Saint Gobain | Substrat transparent muni d'un empilement de couches minces pour un blindage electromagnetique |
FR2862961B1 (fr) * | 2003-11-28 | 2006-02-17 | Saint Gobain | Substrat transparent utilisable alternativement ou cumulativement pour le controle thermique, le blindage electromagnetique et le vitrage chauffant. |
KR100827401B1 (ko) * | 2004-10-18 | 2008-05-06 | 삼성코닝정밀유리 주식회사 | 전자파 차폐 필터와 그 제조 방법 및 그를 포함하는pdp 장치 |
KR20060046935A (ko) * | 2004-11-12 | 2006-05-18 | 삼성코닝 주식회사 | 신규 블랙 매트릭스, 그 제조방법 및 그를 이용한평판표시소자 및 전자파차폐 필터 |
KR20070111488A (ko) | 2005-02-17 | 2007-11-21 | 아사히 가라스 가부시키가이샤 | 도전성 적층체, 플라즈마 디스플레이용 전자파 차폐 필름및 플라즈마 디스플레이용 보호판 |
JPWO2006090798A1 (ja) | 2005-02-25 | 2008-07-24 | 旭硝子株式会社 | 電磁波遮蔽積層体およびこれを用いたディスプレイ装置 |
KR20080025367A (ko) * | 2005-07-07 | 2008-03-20 | 아사히 가라스 가부시키가이샤 | 플라즈마 디스플레이 패널용 전자파 차폐 필름 및 보호판 |
EP1829835A1 (de) * | 2006-03-03 | 2007-09-05 | Applied Materials GmbH & Co. KG | Infrarotstrahlung reflektierendes Schichtsystem sowie Verfahren zu seiner Herstellung |
US7713633B2 (en) * | 2008-05-27 | 2010-05-11 | Guardian Industries Corp. | EMI filter for plasma display panel |
-
2008
- 2008-08-21 US US12/230,033 patent/US7713633B2/en not_active Expired - Fee Related
-
2009
- 2009-04-27 KR KR1020107027422A patent/KR20110021854A/ko not_active Application Discontinuation
- 2009-04-27 EP EP09755227A patent/EP2294904A1/en not_active Withdrawn
- 2009-04-27 JP JP2011511592A patent/JP5369177B2/ja not_active Expired - Fee Related
- 2009-04-27 WO PCT/US2009/002559 patent/WO2009145864A1/en active Application Filing
- 2009-04-27 BR BRPI0912047A patent/BRPI0912047A2/pt not_active IP Right Cessation
- 2009-05-11 TW TW098115541A patent/TW201007224A/zh unknown
-
2010
- 2010-03-25 US US12/659,912 patent/US7931971B2/en not_active Expired - Fee Related
-
2011
- 2011-03-24 US US13/064,426 patent/US8298678B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW201007224A (en) | 2010-02-16 |
JP2011522287A (ja) | 2011-07-28 |
US7931971B2 (en) | 2011-04-26 |
WO2009145864A1 (en) | 2009-12-03 |
US20100187990A1 (en) | 2010-07-29 |
US7713633B2 (en) | 2010-05-11 |
KR20110021854A (ko) | 2011-03-04 |
EP2294904A1 (en) | 2011-03-16 |
US8298678B2 (en) | 2012-10-30 |
US20090297864A1 (en) | 2009-12-03 |
US20110169402A1 (en) | 2011-07-14 |
BRPI0912047A2 (pt) | 2016-11-01 |
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