JP4852862B2 - Manufacturing method of color filter and manufacturing method of color liquid crystal display device - Google Patents

Description

  The present invention relates to a color filter used in a color liquid crystal display device by an active matrix display method (for example, Thin Film Transistor drive method; TFT drive method) or an XY orthogonal arrangement matrix display method (XY orthogonal arrangement stripe electrode method) and its color The present invention relates to a color liquid crystal display device using a filter.

  A conventional color filter of a TFT color liquid crystal display device using a general active matrix display method has a pixel pattern in the form of a stripe, a square dot or a polygon dot on a transparent substrate made of glass or plastic. And a transparent colored pattern layer of a blue pattern (B), a green pattern (G), a red pattern (R) (or cyan (C), magenta (M), yellow (Y)). A light absorptive (low reflectivity) black matrix pattern layer (abbreviated as BMX) is provided at the boundary between the layers.

  The BMX is patterned using a chromium metal vapor deposition film or a black pigment colorant, and each transparent colored pattern layer is formed so that its end is overlaid on the BMX.

  An ITO thin film or the like is formed on the entire upper surface of the transparent colored pattern layer and on the inner side of the adhesive sealant around the outer side thereof through an overcoat layer (not shown) made of an appropriate transparent resin such as an epoxy resin if necessary. It has a solid transparent common electrode layer made of a transparent conductive film.

  In addition, a counter electrode plate on which an active matrix electrode made of a pixel electrode and a TFT (Thin Film Transistor) is formed is superposed on the color filter so as to be spaced apart from and parallel to the transparent substrate. The counter electrode plate is a pixel electrode in the form of a matrix wiring pattern made of a transparent ITO thin film by a TFT driving method (liquid crystal display driving method) on the inner surface facing the color filter of a transparent counter electrode substrate made of glass or plastic. And an active matrix electrode layer as a scanning electrode.

  And in the liquid crystal encapsulated cell in the gap between the transparent substrate and the counter electrode substrate, a uniform particle size of 4 to 8 μm is obtained through a liquid crystal alignment film formed on the innermost surfaces of both substrates. The bead spacers are filled with liquid crystal in which transparent bead spacers are dispersed, and the peripheral edges of the substrates are joined to each other in a hermetically sealed state by an adhesive seal material 21 (joint seal material) such as an epoxy resin adhesive. There is a distributed TFT color liquid crystal display device.

  By the way, with the enlargement of the color display panel of the color liquid crystal display device, the assembly process of the liquid crystal cell is changing from the vacuum injection method to the ODF method. In addition, there is a demand for higher definition of panels.

  From these requirements, instead of the conventional bead spacer dispersion type TFT color liquid crystal display device, a photo spacer type (Photo Spacer) of a photo-curing pattern film of a photoresist film using a photoresist by a photolithography method is used as a spacer. There is an increasing demand for TFT color liquid crystal display devices, and the color filters and TFT color liquid crystal display devices are described in Japanese Patent Application Laid-Open No. 2002-350860, Japanese Patent No. 3498020, and the like.

Below, the well-known patent document relevant to this invention is described.
JP 2002-350860 A, Japanese Patent No. 3498020

  However, in order to produce a photo spacer in the current color filter, after applying a transparent colored pattern layer of R, G, B, which is a pixel pattern, the application of a photo spacer forming photoresist, the spacer pattern on the photoresist Various production steps such as pattern exposure using an exposure mask, development processing, and baking of the spacer pattern after development processing are necessary, which increases the number of steps and affects production efficiency.

  The present invention relates to a color filter used in a color liquid crystal display device by an active matrix display method or an XY orthogonal arrangement matrix display method and a photo spacer in a photo spacer type color liquid crystal display device using the color filter. It is to realize the accuracy and efficient production of the photo spacer by enabling the pattern formation during the process of forming each transparent coloring pattern layer.

  According to the first aspect of the present invention, a transparent colored pattern layer 3 that is pixel-divided by at least a black matrix pattern layer 2 on a transparent substrate 1 and an active matrix electrode layer facing the transparent colored pattern layer 3. In a color filter provided with a transparent common electrode layer 5 or a transparent stripe electrode layer 5 in the X direction or Y direction of an XY orthogonal matrix electrode layer, the layer thickness of the transparent coloring pattern layer 3 is made to project. The color filter is characterized in that a photospacer portion 4 for adjusting the cell gap formed thick is provided.

  The invention according to a second aspect of the present invention is the color filter according to the first aspect, wherein an end of the transparent colored pattern layer 3 is formed on the black matrix pattern layer 2 so as to overlap with the protruding photo. The color filter is characterized in that the spacer portion 4 is formed in the transparent colored pattern layer 3 in a region overlapping with the black matrix pattern layer 2.

  According to a third aspect of the present invention, in the color filter according to the first aspect, the projecting photospacer portion 4 is an active matrix electrode layer comprising a pixel electrode layer and a TFT layer in the black matrix pattern layer 2. Each of the color filters is formed in a portion of the transparent colored pattern layer 3 that is overlapped on a region of the black matrix pattern layer 2 corresponding to a portion that hides the TFT layer.

  According to a fourth aspect of the present invention, in the color filter according to any one of the first to third aspects, the liquid crystal alignment protrusion resin layer 6 is formed on the upper end portion of the protrusion-like photospacer portion 4. It is a color filter characterized by being made.

  According to a fifth aspect of the present invention, in the color filter according to any one of the first to third aspects, an overhang portion 4a is provided on a side surface of the protruding photo spacer portion 4, and the photo spacer portion is provided. The color filter is characterized in that a transparent electrode layer 7 that is electrically non-conductive with respect to the transparent common electrode layer 5 is coated on an upper end portion of 4.

The invention according to a sixth aspect of the present invention is the color filter according to any one of the first to fifth aspects, wherein the projecting photospacer portion 4 has red, green, blue of the transparent colored pattern layer 3. Or a transparent coloring pattern layer 3 of any one of the three colors of cyan, magenta, and yellow, or two or three colors.

  The invention according to a seventh aspect of the present invention is the color filter according to any one of the first to sixth aspects, wherein the protruding photo spacer portion 4 is applied to a pattern forming region of the transparent colored pattern layer 3. The photopolymerization curable transparent colored photoresist thus formed is projected and exposed using a halftone exposure mask for adjusting the exposure amount, and the halftone exposure mask is used to expose a region corresponding to the transparent colored pattern layer 3. The color filter is formed by projecting and exposing the relationship between the amount EF and the exposure amount EP of the region corresponding to the photo spacer portion 4 as EF <EP.

  According to an eighth aspect of the present invention, there is provided an active color filter A having the transparent common electrode layer 5 according to any one of the first to seventh aspects, and a TFT layer on the transparent counter electrode substrate 11. The counter electrode plate B on which the matrix electrode layer 13 is formed is overlapped with the electrode layers 5 and 13 facing each other, and is formed on the inner surface of the overlap by the protruding photospacer portion 4 at a predetermined interval. The color liquid crystal display device is characterized in that liquid crystal is sealed in the liquid crystal sealing cell 14, and the end portions of the color filter A and the counter electrode plate B are bonded and sealed with an adhesive sealing material.

  According to a ninth aspect of the present invention, there is provided an active color filter A in which the transparent common electrode layer 5 according to any one of the first to seventh aspects is formed and a TFT layer on the transparent counter electrode substrate 11. The counter electrode plate B on which the counter electrode layer 13 formed of the matrix electrode layer is formed is superposed with the liquid crystal alignment films formed on the electrode layers 5 and 13 facing each other, and is projected on the inner surface of the superposition. Liquid crystal is sealed in a liquid crystal sealing cell 14 formed at a predetermined interval by the photo spacer portion 4 and the end portions of the color filter A and the counter electrode plate B are bonded and sealed with an adhesive sealing material. This is a color liquid crystal display device.

  The invention according to claim 10 of the present invention is a color filter A in which the transparent stripe electrode layer 5 in the X direction or Y direction of the XY orthogonal matrix electrode layer according to any one of claims 1 to 7 is formed, A counter electrode plate B in which a counter electrode layer 13 is formed by a transparent stripe electrode layer in the Y direction or X direction of an XY orthogonal matrix electrode layer on a transparent counter electrode substrate 11, and both electrode layers 5 and 13 are arranged to face each other. Liquid crystal is sealed in a liquid crystal sealing cell 14 formed at a predetermined interval by the photo-spacer portion 4 having a protruding shape on the inner surface of the stacked inner surface, and the color filter A and the counter electrode plate B are mutually connected. The color liquid crystal display device is characterized in that the end portion is bonded and sealed with an adhesive sealing material.

  The invention according to claim 11 of the present invention is a color filter A in which the transparent stripe electrode layer 5 in the X direction or Y direction of the XY orthogonal matrix electrode layer according to any one of claims 1 to 7 is formed, A counter electrode plate B having a counter electrode layer 13 formed of a transparent stripe electrode layer in the Y direction or X direction of an XY orthogonal matrix electrode layer on a transparent counter electrode substrate 11 is formed on both electrode layers 5 and 13 respectively. The liquid crystal alignment films are arranged to be opposed to each other and overlapped, and liquid crystal is sealed in a liquid crystal sealing cell 14 formed at a predetermined interval by the protruding photospacer portion 4 on the inner surface of the stack. The color liquid crystal display device is characterized in that ends of the counter electrode plate B are bonded and sealed with an adhesive sealing material.

The color filter and the color liquid crystal display device of the present invention are a color filter used in a color liquid crystal display device by an active matrix display method or an XY orthogonal arrangement matrix display method, and a color liquid crystal display device using the color filter. When producing a photospacer, a pixel pattern applied on a transparent substrate is subjected to projection exposure using a halftone exposure mask to a material for forming a transparent colored pattern layer of R, G, and B, which is a pixel pattern. A transparent colored pattern layer of R, G, and B, which is a pattern, and a projecting photo spacer can be formed on the pattern layer at the same time, and a photoresist pattern for forming a photo spacer can be applied, and a spacer pattern on the photoresist. Pattern exposure and development processing using an exposure mask, and development processing Steps such as baking of the spacer pattern is not required, it is effective in improving the manufacturing efficiency.

  According to the present invention, the photo spacer in the photo spacer type color liquid crystal display device can be patterned during the process of forming each transparent colored pattern layer such as R, G, B, etc. Can be realized.

  An embodiment of the color filter of the present invention will be described below in detail based on a cross-sectional side view taken along line XX shown in FIG. 1A and a plan view shown in FIG.

  As shown in FIG. 1A, the color filter A of the present invention has a black matrix pattern layer 2 (light-shielding pattern layer) on a transparent substrate 1 made of glass or plastic, and is formed into a pixel shape by the black matrix pattern layer 2. A transparent colored pattern layer 3 of three colors of red (R), green (G), and blue (B) (or cyan, magenta, and yellow), and a part of the transparent colored pattern layer 3 The projecting photospacer portion 4 is provided by a material for forming the transparent colored pattern layer 3.

  The transparent colored pattern layer 3 is formed so that the end thereof overlaps the black matrix pattern layer 2, and the projecting photo spacer portion 4 is formed simultaneously with the pattern formation of the transparent colored pattern layer 3. In the region of the transparent colored pattern layer 3 that overlaps the black matrix pattern layer 2 (non-pixel region in the transparent colored pattern layer 3), the thick colored film portion is integrally formed on the transparent colored pattern layer 3 Is formed.

  As a method for producing the protruding photo-spacer portion 4, a halftone for pattern exposure for projecting and exposing a pattern portion corresponding to the transparent colored pattern layer 3 with an exposure amount EF in patterning the transparent colored pattern layer 3 is used. An exposure mask (photomask) formed with a film portion (suppressed exposure portion) and a transparent portion (normal exposure portion) for projecting and exposing a pattern portion corresponding to the photospacer portion 4 with an exposure amount EP (EP> EF) ) Is used.

  In the region corresponding to the non-formation portion of the transparent coloring pattern on the exposure mask, for example, a light shielding film made of a metal chromium film having a film thickness of about 1000 mm is formed, and the region corresponding to the transparent coloring pattern layer 3 in the pixel region is formed. For example, a halftone film part (semi-transmissive part) made of an ITO (indium tin oxide) film having a thickness of about 2500 mm is formed, and the part corresponding to the photospacer part 4 in the transparent colored pattern layer 3 region is made of glass. It is a total transmission part by a transparent mask substrate such as a plate.

Photopolymerization curing of red (R), green (G) or blue (B) applied on the transparent substrate 1 on which the black matrix layer 2 has been formed in advance by a projection exposure method in which the exposure amount is adjusted using the exposure mask. By pattern exposure to the colored photoresist of the mold and development processing, the resist part exposed at the exposure amount EP in the entire transmission part of the exposure mask is sufficiently cured and has a necessary height. The photo-spacer portion 4 having a thick layer is formed, and the portion exposed by the exposure amount EF in the halftone film portion (semi-transmissive portion) is hardened more sufficiently than the resist portion exposed in the total transmissive portion. Instead, the transparent colored pattern layer 3 having the optimum layer thickness as a colored filter having a layer thickness thinner than that of the photospacer portion 4 is formed.

  On the transparent coloring pattern layer 3, a solid transparent common electrode layer 5 made of an ITO thin film is provided so as to cover the black matrix pattern layer 2, the transparent coloring pattern layer 3, and the photo spacer portion 4. .

  Further, as shown in FIGS. 1A to 1B, a common electrode that covers a region of the transparent colored pattern layer 3 that does not overlap the black matrix pattern layer 2 (a pixel region in the transparent colored pattern layer 3). On the layer 5, a protruding liquid crystal alignment resin layer 6 is formed in one or a plurality of minute dots or linear patterns, or a solid liquid crystal alignment resin layer 6.

  Further, as shown in FIG. 1A, a top resin made of a resin material in which the projecting alignment resin layer 6 is formed on the top of the common electrode layer 5 coated on the top of the projecting photo spacer 4. The layer 6a is formed, and the height of the top of the protruding photo spacer portion 4 including the thickness of the top resin layer 6a is at least higher than the height of the top of the protruding alignment resin layer 6. ing.

  In addition, the protruding photospacer portion 4 of the color filter A of the present invention is a region of the transparent colored pattern layer 3 (non-pixel region in the transparent colored pattern layer 3) that overlaps the black matrix pattern layer 2 as described above. As shown in the plan view of FIG. 1 (b), for example, the active matrix of the black matrix pattern layer 2 is formed integrally with a part of the transparent colored pattern layer 3 in a thick layer. The transparent coloring pattern layer 3 is integrally formed on the transparent coloring pattern layer 3 in the region overlapping with the TFT masking black matrix pattern layer 2a corresponding to the portion of the electrode layer that covers the TFT (Thin Film Transistor) layer. Is formed.

  Another embodiment of the color filter of the present invention will be described in detail below based on the XX side sectional view shown in FIG. 2 (a) and the plan view shown in FIG. 2 (b).

  As shown in FIG. 2A, the color filter A of the present invention has a black matrix pattern layer 2 (light-shielding pattern layer) on a transparent substrate 1 made of glass or plastic, and is formed into a pixel shape by the black matrix pattern layer 2. A transparent colored pattern layer 3 with three colors of red (R), green (G), and blue (B) (or cyan, magenta, and yellow), and a part of the transparent colored pattern layer 3 The protrusion-shaped photospacer portion 4 is provided by a material for forming the transparent colored pattern layer.

  The transparent colored pattern layer 3 is formed so that the end thereof overlaps the black matrix pattern layer 2, and the projecting photo spacer portion 4 is formed simultaneously with the pattern formation of the transparent colored pattern layer 3. As a thick film portion having a thick layer thickness of the transparent colored pattern layer 3 in the region of the transparent colored pattern layer 3 (non-pixel region in the transparent colored pattern layer 3) overlapped on the black matrix pattern layer 2 It is formed integrally with the colored pattern layer 3.

As shown in FIG. 2A, the protrusion-shaped photospacer portion 4 has a side portion of the protrusion-shaped photospacer portion 4 that is thicker toward the top from the base of the protrusion. And an overhang side surface portion 4a having an overhang shape. Note that the formation of the overhang side surface portion 4a is a side etching phenomenon that occurs when a development process (etching process) of a colored photoresist pattern that has been exposed and cured after pattern exposure is performed by taking a relatively long development process time. It can be formed by using.

  On the transparent colored pattern layer 3, a solid common electrode layer 5 made of an ITO thin film is provided so as to cover the black matrix pattern layer 2 and the transparent colored pattern layer 3.

  Further, as shown in FIG. 2A, an ITO coating layer 7 made of an ITO thin film is provided on the top of the protruding photo spacer portion 4 having the overhang side surface portion 4a except for the overhang side surface portion 4a. However, since this ITO thin film is formed by an anisotropic (unidirectional) sputtering vapor deposition method toward the transparent colored pattern layer 3 in a direction perpendicular to the transparent substrate 1, On the overhang side surface portion 4a, the ITO to be sputtered does not enter and the ITO thin film is not formed. Therefore, the common electrode layer 5 and the ITO coating layer 7 are kept electrically non-conductive with each other.

  Further, as shown in FIGS. 2A to 2B, a common electrode that covers a region of the transparent colored pattern layer 3 that does not overlap the black matrix pattern layer 2 (a pixel region in the transparent colored pattern layer 3). On the layer 5, a liquid crystal alignment resin layer 6 is formed in one to a plurality of minute dots or linear patterns, or in a solid shape as necessary.

  Further, as shown in FIG. 2A, a resin in which the protruding alignment resin layer 6 is formed on the top of the ITO coating layer 7 covered on the top of the protruding photospacer portion 4 as necessary. The top resin layer 6a made of a material may be formed, and the height of the top of the protruding alignment resin layer 6 is a protrusion including the thickness of the ITO coating layer 7 or the thickness of the top resin layer 6a. It is formed lower than the height of the top portion of the photo spacer portion 4 having a shape.

  In addition, the protruding photospacer portion 4 of the color filter A of the present invention is a region of the transparent colored pattern layer 3 (non-pixel region in the transparent colored pattern layer 3) that overlaps the black matrix pattern layer 2 as described above. As shown in the plan view of FIG. 2B, for example, among the black matrix pattern layer 2, the TFT layer of the active matrix electrode layer is formed integrally with a part of the transparent colored pattern layer 3. The transparent coloring pattern layer 3 is formed integrally with the transparent coloring pattern layer 3 in a region overlapping with the TFT black matrix pattern layer 2a corresponding to the masking portion.

  The color filter of the present invention forms a color liquid crystal display device by overlapping with a counter electrode plate.

  FIG. 3 shows a color liquid crystal display device constituted by assembling the color filter A and the TFT type counter electrode plate B according to the embodiment of the present invention shown in FIGS. FIG.

  As shown in FIG. 3, on the color filter A, a TFT-type counter electrode plate B is superposed with both electrode layers 5 and 13 arranged facing each other. On the counter electrode plate B, an active matrix electrode layer 13 including a TFT module layer having a TFT transistor layer 12 and a pixel electrode layer is formed on a counter electrode substrate 11.

  The color filter A and the counter electrode plate B are overlapped with the electrode layers 5 and 13 facing each other at a predetermined interval by the protruding photospacer portion 4, and the protruding photospacer portion is arranged on the inner surface side of the overlap. 4 is formed, a liquid crystal sealed cell 14 having a predetermined interval is formed, liquid crystal L is sealed in the liquid crystal sealed cell, and the end portions of the color filter A and the counter electrode plate B are bonded to each other with an adhesive sealing material ( (Not shown).

  A solid liquid crystal alignment film may be formed on each of the electrode layers 5 and 13, and when the liquid crystal alignment resin layer 6 is formed, the solid liquid crystal alignment film is not formed. Also good.

  As shown in FIG. 3, the common electrode layer 5 at the top of the protruding photospacer portion 4 of the color filter A is connected to the active matrix electrode layer 13 of the counter electrode plate B via an insulating layer made of a coating resin layer 6a. Therefore, both electrode layers 5 and 13 can be kept electrically non-conductive.

  FIG. 4 shows a color liquid crystal display constituted by assembling a color filter A according to another embodiment of the present invention shown in FIGS. 2A and 2B and a TFT type counter electrode plate B in an overlapping manner. It is a sectional side view of an apparatus.

  As shown in FIG. 4, on the color filter A, a TFT type counter electrode plate B is superposed with the electrode layers 5 and 13 facing each other. On the counter electrode plate B, an active matrix electrode layer 13 including a TFT module layer having a TFT transistor layer 12 and a pixel electrode layer is formed on a counter electrode substrate 11.

  The color filter A and the counter electrode plate B are overlapped with the electrode layers 5 and 13 facing each other at a predetermined interval by the protruding photospacer portion 4, and the protruding photospacer portion is arranged on the inner surface side of the overlap. 4 is formed, a liquid crystal sealed cell 14 having a predetermined interval is formed, liquid crystal L is sealed in the liquid crystal sealed cell, and the end portions of the color filter A and the counter electrode plate B are bonded to each other with an adhesive sealing material ( (Not shown).

  As shown in FIG. 4, the ITO covering layer 7 formed by the ITO film of the common electrode layer 5 on the top of the protruding photospacer portion 4 of the color filter A has an overhang side surface portion 4 a of the protruding photospacer portion 4. Thus, the non-conductive state is maintained with respect to the common electrode layer 5 on the transparent colored pattern layer 3, and the top of the protruding photospacer portion 4 is The electrode layers 5 and 13 can contact each other in an electrically non-conductive state. Moreover, since it contacts via the insulating layer by the coating resin layer 6a provided as needed, both the electrode layers 5 and 13 can hold | maintain an electrical non-conduction state.

  A solid liquid crystal alignment film may be formed on each of the electrode layers 5 and 13, and when the liquid crystal alignment resin layer 6 is formed, the solid liquid crystal alignment film is not formed. Also good.

(A) is the sectional side view in one Embodiment of the color filter of this invention, (b) is the top view. (A) is the sectional side view in other embodiment of the color filter of this invention, (b) is the top view. 1 is a side sectional view of an embodiment of a color liquid crystal display device of the present invention. The sectional side view in other embodiment of the color liquid crystal display device of this invention.

Explanation of symbols

A ... Color filter B ... Counter electrode plate L ... Liquid crystal 1 ... Transparent substrate 2 ... Black matrix layer 3 ... Transparent colored pattern layer 4 ... Photo spacer part 4a ... Overhang side face part 5 ... Common electrode layer 6 ... Liquid crystal alignment resin layer 6a ... Coating resin layer 7 ... ITO coating layer 11 ... Counter electrode substrate 12 ... TFT layer 13 ... Counter electrode layer (active matrix electrode layer including pixel electrode)
14 ... Liquid crystal sealed cell

Claims (11)

A transparent colored pattern layer 3 pixel-divided by a black matrix pattern layer 2 is formed on the transparent substrate 1, and then a transparent common electrode layer 5 facing the active matrix electrode layer is formed on the transparent colored pattern layer 3. Alternatively, in the method of manufacturing a color filter by forming the transparent stripe electrode layer 5 in the X direction or Y direction of the XY orthogonal matrix electrode layer,
The step of forming the transparent colored pattern layer 3 is a step of forming a transparent colored pattern layer 3 by pattern exposure to a coating film of a colored photoresist and developing it,
In the pattern exposure, when the exposure amount of the pattern portion corresponding to the transparent colored pattern layer 3 is the exposure amount EF, a part of the pattern portion is exposed with an exposure amount EP larger than the exposure amount EF. A method for producing a color filter, characterized in that a portion exposed by EP is formed thick in a protruding shape, and the protruding portion serves as a photospacer portion 4 for cell gap adjustment. In the manufacturing method of the color filter of Claim 1,
An end portion of the transparent coloring pattern layer 3 is formed on the black matrix pattern layer 2 so as to overlap,
The method for producing a color filter, wherein the protruding photo spacer portions 4 are formed in a transparent colored pattern layer 3 in a region overlapping with the black matrix pattern layer 2. In the manufacturing method of the color filter of Claim 1,
The protruding photo-spacer portion 4 is overlaid on the black matrix pattern layer 2 corresponding to the portion of the black matrix pattern layer 2 where the TFT layer of the pixel electrode layer and the TFT layer covers each TFT layer. A method for producing a color filter, comprising: forming a wrapped transparent colored pattern layer 3 portion. In the manufacturing method of the color filter of any one of Claims 1 thru | or 3,
A method for producing a color filter, comprising: coating a resin layer 6 for liquid crystal alignment protrusions on an upper end portion of the protruding photo-spacer portion 4. In the manufacturing method of the color filter of any one of Claims 1 thru | or 3,
The protruding photospacer portion 4 is formed in a shape having an overhang portion 4a on its side surface, and is electrically non-conductive to the transparent common electrode layer 5 at the upper end portion of the photospacer portion 4. A method for producing a color filter, comprising coating the transparent electrode layer 7. In the manufacturing method of the color filter of any one of Claims 1 thru | or 5,
The projecting photo-spacer portion 4 is made of one of the three colors of red, green and blue of the transparent coloring pattern layer 3, or three colors of cyan, magenta and yellow. It forms with the colored pattern layer 3, The manufacturing method of the color filter characterized by the above-mentioned. In the manufacturing method of the color filter of any one of Claims 1 thru | or 6,
A method for producing a color filter, wherein a pattern portion corresponding to the transparent colored pattern layer 3 is projected and exposed with an exposure amount EF using a halftone exposure mask for adjusting the exposure amount . A color filter A in which a transparent common electrode layer 5 is formed and a counter electrode plate B in which an active matrix electrode layer 13 having a TFT layer is formed on a transparent counter electrode substrate 11 are arranged so that both electrode layers 5 and 13 face each other. Liquid crystal is sealed in a liquid crystal sealing cell 14 formed at a predetermined interval by a protruding photospacer portion 4 on the inner surface side of the overlapping, and the end portions of the color filter A and the counter electrode plate B are mutually connected. In a method of manufacturing a color liquid crystal display device by bonding and sealing with an adhesive sealant,
In the method of manufacturing the color filter A, a transparent colored pattern layer 3 divided into pixels by a black matrix pattern layer 2 is formed on a transparent substrate 1, and then an active matrix electrode is formed on the transparent colored pattern layer 3. In a method of manufacturing a color filter by forming a transparent common electrode layer 5 facing the layer,
The step of forming the transparent colored pattern layer 3 is a step of forming a transparent colored pattern layer 3 by pattern exposure to a coating film of a colored photoresist and developing it,
In the pattern exposure, when the exposure amount of the pattern portion corresponding to the transparent colored pattern layer 3 is the exposure amount EF, a part of the pattern portion is exposed with an exposure amount EP larger than the exposure amount EF. A method of manufacturing a color liquid crystal display device, characterized in that a portion exposed by EP is formed thick in a protruding shape, and the protruding portion is used as a photospacer portion 4 for cell gap adjustment. A color filter A having a transparent common electrode layer 5 and a counter electrode plate B having an active matrix electrode layer 13 having a TFT layer on a transparent counter electrode substrate 11 are formed on both electrode layers 5 and 13 respectively. The liquid crystal alignment films are arranged so as to face each other and are superposed, and liquid crystal is enclosed in a liquid crystal encapsulating cell 14 formed at a predetermined interval by a protruding photospacer portion 4 on the inner surface of the superposition, and the color filter A and the counter electrode In a method of manufacturing a color liquid crystal display device by bonding and sealing each other end of the plate B with an adhesive sealing material,
In the method of manufacturing the color filter A, a transparent colored pattern layer 3 divided into pixels by a black matrix pattern layer 2 is formed on a transparent substrate 1, and then an active matrix electrode is formed on the transparent colored pattern layer 3. In a method of manufacturing a color filter by forming a transparent common electrode layer 5 facing the layer,
The step of forming the transparent colored pattern layer 3 is a step of forming a transparent colored pattern layer 3 by pattern exposure to a coating film of a colored photoresist and developing it,
In the pattern exposure, when the exposure amount of the pattern portion corresponding to the transparent colored pattern layer 3 is the exposure amount EF, a part of the pattern portion is exposed with an exposure amount EP larger than the exposure amount EF. A method of manufacturing a color liquid crystal display device, characterized in that a portion exposed by EP is formed thick in a protruding shape, and the protruding portion is used as a photospacer portion 4 for cell gap adjustment. Color filter A in which transparent stripe electrode layer 5 in X direction or Y direction of XY orthogonal matrix electrode layer is formed, and transparent stripe electrode layer in Y direction or X direction of XY orthogonal matrix electrode layer on transparent counter electrode substrate 11 The counter electrode plate B on which the counter electrode layer 13 is formed is overlapped with the electrode layers 5 and 13 facing each other, and formed on the inner surface side of the overlap with a protruding photospacer portion 4 at a predetermined interval. In a method of manufacturing a color liquid crystal display device by enclosing a liquid crystal in a liquid crystal encapsulating cell 14 and bonding and sealing the end portions of the color filter A and the counter electrode plate B with an adhesive sealing material,
Method for producing the color filter A is on a transparent substrate 1, a black matrix pattern layer 2 by forming a transparent colored pattern layer 3 pixel segment, then, on the transparent colored pattern layer 3, X Y orthogonal In the method of manufacturing a color filter by forming a transparent stripe electrode layer 5 in the X direction or Y direction of the matrix electrode layer,
The step of forming the transparent colored pattern layer 3 is a step of forming a transparent colored pattern layer 3 by pattern exposure to a coating film of a colored photoresist and developing it,
In the pattern exposure, when the exposure amount of the pattern portion corresponding to the transparent colored pattern layer 3 is the exposure amount EF, a part of the pattern portion is exposed with an exposure amount EP larger than the exposure amount EF. A method of manufacturing a color liquid crystal display device, characterized in that a portion exposed by EP is formed thick in a protruding shape, and the protruding portion is used as a photospacer portion 4 for cell gap adjustment. Color filter A in which transparent stripe electrode layer 5 in X direction or Y direction of XY orthogonal matrix electrode layer is formed, and transparent stripe electrode layer in Y direction or X direction of XY orthogonal matrix electrode layer on transparent counter electrode substrate 11 The counter electrode plate B on which the counter electrode layer 13 is formed is superposed with the liquid crystal alignment films formed on the electrode layers 5 and 13 facing each other, and a protruding photospacer portion is formed on the inner surface of the superposition. A liquid crystal is sealed in a liquid crystal sealing cell 14 formed at a predetermined interval by 4 and the end portions of the color filter A and the counter electrode plate B are bonded and sealed with an adhesive sealing material, whereby a color liquid crystal display device is obtained. In the method of manufacturing
Method for producing the color filter A is on a transparent substrate 1, a black matrix pattern layer 2 by forming a transparent colored pattern layer 3 pixel segment, then, on the transparent colored pattern layer 3, X Y orthogonal In the method of manufacturing a color filter by forming a transparent stripe electrode layer 5 in the X direction or Y direction of the matrix electrode layer,
The step of forming the transparent colored pattern layer 3 is a step of forming a transparent colored pattern layer 3 by pattern exposure to a coating film of a colored photoresist and developing it,
In the pattern exposure, when the exposure amount of the pattern portion corresponding to the transparent colored pattern layer 3 is the exposure amount EF, a part of the pattern portion is exposed with an exposure amount EP larger than the exposure amount EF. A method of manufacturing a color liquid crystal display device, characterized in that a portion exposed by EP is formed thick in a protruding shape, and the protruding portion is used as a photospacer portion 4 for cell gap adjustment.

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