JP4809752B2 - 中間調フォトマスク及びその製造方法 - Google Patents

中間調フォトマスク及びその製造方法 Download PDF

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Publication number
JP4809752B2
JP4809752B2 JP2006297284A JP2006297284A JP4809752B2 JP 4809752 B2 JP4809752 B2 JP 4809752B2 JP 2006297284 A JP2006297284 A JP 2006297284A JP 2006297284 A JP2006297284 A JP 2006297284A JP 4809752 B2 JP4809752 B2 JP 4809752B2
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film
pattern
semi
light
forming
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JP2008116517A5 (fr
JP2008116517A (ja
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充紘 三宅
昌典 橋本
昌宏 美作
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SK Electronics Co Ltd
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SK Electronics Co Ltd
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JP2006297284A 2006-11-01 2006-11-01 中間調フォトマスク及びその製造方法 Active JP4809752B2 (ja)

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JP2006297284A JP4809752B2 (ja) 2006-11-01 2006-11-01 中間調フォトマスク及びその製造方法

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JP2006297284A JP4809752B2 (ja) 2006-11-01 2006-11-01 中間調フォトマスク及びその製造方法

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JP2011147602A Division JP2011186506A (ja) 2011-07-01 2011-07-01 中間調フォトマスク

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JP2008116517A JP2008116517A (ja) 2008-05-22
JP2008116517A5 JP2008116517A5 (fr) 2010-11-04
JP4809752B2 true JP4809752B2 (ja) 2011-11-09

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Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5044262B2 (ja) * 2007-04-10 2012-10-10 株式会社エスケーエレクトロニクス 多階調フォトマスク及びその製造方法
JP5219201B2 (ja) * 2008-07-31 2013-06-26 Ｈｏｙａ株式会社 フォトマスク、フォトマスク用ブランク、フォトマスクの製造方法、及びパターン転写方法
TW201030451A (en) * 2008-09-30 2010-08-16 Hoya Corp Multi-tone photomask and method of manufacturing the same
TWI502623B (zh) * 2010-01-07 2015-10-01 Hoya Corp 光罩之製造方法、光罩、及顯示裝置之製造方法
JP2011215197A (ja) 2010-03-31 2011-10-27 Hoya Corp フォトマスク及びその製造方法
JP6117559B2 (ja) * 2013-02-05 2017-04-19 株式会社エスケーエレクトロニクス フォトマスク及びそのフォトマスクの製造方法
JP2015212720A (ja) * 2014-05-01 2015-11-26 Hoya株式会社 多階調フォトマスクの製造方法、多階調フォトマスク及び表示装置の製造方法
KR102294311B1 (ko) * 2014-12-24 2021-08-26 엘지디스플레이 주식회사 유기발광표시패널 및 유기발광표시장치

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127170A (en) * 1976-04-19 1977-10-25 Fujitsu Ltd Mask for patterning
JPS607381B2 (ja) * 1977-05-04 1985-02-23 松下電器産業株式会社 ホトマスクパタ−ン形成法
JPH05188578A (ja) * 1992-01-08 1993-07-30 Seiko Epson Corp フォトマスク、及び、半導体装置の製造方法
JP3115185B2 (ja) * 1993-05-25 2000-12-04 株式会社東芝 露光用マスクとパターン形成方法
JPH0749410A (ja) * 1993-08-06 1995-02-21 Dainippon Printing Co Ltd 階調マスク及びその製造方法
JPH07319148A (ja) * 1994-05-20 1995-12-08 Fujitsu Ltd フォトマスクおよびその作製方法
JPH08123007A (ja) * 1994-10-18 1996-05-17 Fujitsu Ltd 位相シフトレチクル
JP3429125B2 (ja) * 1995-12-21 2003-07-22 沖電気工業株式会社 位相シフトマスク及びそのマスクを用いたレジストパターンの形成方法
KR100215850B1 (ko) * 1996-04-12 1999-08-16 구본준 하프톤 위상 반전 마스크 및_그제조방법
JP3446943B2 (ja) * 1998-09-21 2003-09-16 大日本印刷株式会社 描画用アライメントマークを有する位相シフトマスク
JP2005091855A (ja) * 2003-09-18 2005-04-07 Dainippon Printing Co Ltd 階調マスクの製造方法
JP4521694B2 (ja) * 2004-03-09 2010-08-11 Ｈｏｙａ株式会社 グレートーンマスク及び薄膜トランジスタの製造方法
JP4475510B2 (ja) * 2004-06-25 2010-06-09 Ｈｏｙａ株式会社 リソグラフィーマスクの製造方法、リソグラフィーマスク、及びリソグラフィーマスクの露光方法
JP4587837B2 (ja) * 2005-02-18 2010-11-24 Ｈｏｙａ株式会社 グレートーンマスクの製造方法及びグレートーンマスク
JP4693451B2 (ja) * 2005-03-22 2011-06-01 Ｈｏｙａ株式会社 グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法
JP2007279710A (ja) * 2006-03-16 2007-10-25 Hoya Corp パターン形成方法及びグレートーンマスクの製造方法

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