JP4794475B2 - 下向き式ガラス薄型化方法 - Google Patents
下向き式ガラス薄型化方法 Download PDFInfo
- Publication number
- JP4794475B2 JP4794475B2 JP2007041918A JP2007041918A JP4794475B2 JP 4794475 B2 JP4794475 B2 JP 4794475B2 JP 2007041918 A JP2007041918 A JP 2007041918A JP 2007041918 A JP2007041918 A JP 2007041918A JP 4794475 B2 JP4794475 B2 JP 4794475B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- display panel
- downward
- thinning
- etchant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Surface Treatment Of Glass (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Description
30、330 エッチング液
100 浸漬法
110 セル領域
120 隔壁
140 バブル
150 外部のハウジング
200、300 噴射法
220 ノズル
Claims (3)
- ガラスやディスプレイパネルを固定する固定部により該ガラスやディスプレイパネルを垂直に立て、
エッチング液が流れ出る流量調節部のエッチング液排出口の幅を調節して、該ガラスやディスプレイパネルの上部から下部に均一な流量で或いは流量を変えながらエッチング液を該ガラスやディスプレイパネルの表面に沿って流し、
前記ガラスやディスプレイパネルの幅に対応するように前記エッチング液排出口の幅を調節してエッチング液を流すことによって、前記ガラスやディスプレイパネルを薄型化する、
ことを特徴とする下向き式ガラス薄型化方法。 - 前記エッチング液が、前記ガラスやディスプレイパネルの上部に設置された1つのノズル部から該ガラスやディスプレイパネルの両面のそれぞれに分岐して、均一な流量で或いは流量を変えながら、該ガラスやディスプレイパネルの下部に流れる、
ことを特徴とする請求項1に記載の下向き式ガラス薄型化方法。 - 前記エッチング液は、HF溶液であることを特徴とする請求項1又は2に記載の下向き式ガラス薄型化方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2006-0138924 | 2006-12-29 | ||
KR1020060138924A KR100835745B1 (ko) | 2006-12-29 | 2006-12-29 | 하향식 유리 박형화 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008162877A JP2008162877A (ja) | 2008-07-17 |
JP4794475B2 true JP4794475B2 (ja) | 2011-10-19 |
Family
ID=39610181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007041918A Expired - Fee Related JP4794475B2 (ja) | 2006-12-29 | 2007-02-22 | 下向き式ガラス薄型化方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4794475B2 (ja) |
KR (1) | KR100835745B1 (ja) |
CN (1) | CN101209902B (ja) |
TW (1) | TWI350275B (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100889949B1 (ko) * | 2008-04-10 | 2009-03-20 | 주식회사 엠엠테크 | 하향식 기판 박형화장치 및 이를 이용한 박형화 시스템 |
KR101021931B1 (ko) * | 2008-11-26 | 2011-03-16 | 주식회사 엠엠테크 | 복합형 에칭 장치 및 이를 이용한 에칭 시스템 |
KR101631615B1 (ko) * | 2008-12-31 | 2016-06-17 | 엘지디스플레이 주식회사 | 롤 프린트용 인쇄판의 제조방법 및 이를 이용한 액정표시장치의 제조방법 |
KR100978678B1 (ko) * | 2010-02-08 | 2010-08-27 | 노바테크인더스트리 주식회사 | 투명 전극 일체형 봉지 모듈의 제조 방법 |
KR101026744B1 (ko) | 2010-09-29 | 2011-04-08 | 주식회사 아바텍 | 유리기판 에칭장치 |
CN102101755A (zh) * | 2011-01-07 | 2011-06-22 | 福州华映视讯有限公司 | 玻璃基板的薄化方法 |
KR101223877B1 (ko) * | 2011-03-14 | 2013-01-17 | 노바테크인더스트리 주식회사 | 초박판 패널 제조 시스템 |
CN102108009B (zh) * | 2011-03-31 | 2013-05-01 | 信利半导体有限公司 | 自动蚀刻减薄装置 |
KR101277161B1 (ko) * | 2011-07-08 | 2013-06-20 | 주식회사 엠엠테크 | 글라스 박형화 시스템 |
WO2014091561A1 (ja) * | 2012-12-11 | 2014-06-19 | 富士技研工業株式会社 | 液晶ガラスのエッチング装置に用いる薬液の更新方法、薬液更新用ノズル及び更新用薬液 |
JP6279271B2 (ja) * | 2013-09-27 | 2018-02-14 | Hoya株式会社 | 電子機器用カバーガラスのガラス基板の製造方法 |
CN104445976A (zh) * | 2014-12-03 | 2015-03-25 | 上海天马微电子有限公司 | 一种玻璃基板的薄化工艺方法 |
KR101673417B1 (ko) | 2015-07-14 | 2016-11-07 | 에스피텍 주식회사 | 두께 편차를 최소화한 초박형 유리의 제조방법 |
WO2018020531A1 (ja) * | 2016-07-27 | 2018-02-01 | 株式会社 電硝エンジニアリング | ガラス基板の研磨方法および研磨装置 |
CN107219163A (zh) * | 2017-05-10 | 2017-09-29 | 东旭科技集团有限公司 | 一种测量玻璃化学减薄速率的设备和方法 |
CN107572833A (zh) * | 2017-08-02 | 2018-01-12 | 深圳市华星光电技术有限公司 | 玻璃板的蚀刻方法、蚀刻装置及显示面板 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6121934A (ja) | 1984-07-10 | 1986-01-30 | Nippon Sheet Glass Co Ltd | ガラス棒のエツチング方法 |
JP2551123B2 (ja) * | 1988-11-04 | 1996-11-06 | 富士通株式会社 | 連続表面処理装置 |
JP2781895B2 (ja) * | 1989-10-17 | 1998-07-30 | 石川島播磨重工業株式会社 | カーテンコータ |
CN2249484Y (zh) * | 1995-09-27 | 1997-03-12 | 蒋维均 | 膜分离技术再生蚀刻液及无排放废液的电解蚀刻机 |
JPH09330899A (ja) * | 1996-06-12 | 1997-12-22 | Kaijo Corp | 超音波シャワー装置及び該装置を具備した超音波洗浄装置 |
JPH10247635A (ja) * | 1997-03-04 | 1998-09-14 | Kaijo Corp | ウェーハ等の洗浄処理装置及びその方法 |
JPH10317168A (ja) | 1997-05-14 | 1998-12-02 | Sharp Corp | エッチング装置 |
KR100652040B1 (ko) * | 2000-12-29 | 2006-11-30 | 엘지.필립스 엘시디 주식회사 | 유리기판 식각장치 |
JP2003064486A (ja) * | 2001-02-20 | 2003-03-05 | Minoru Nakatani | ポーラスセラミックスを組み込んだシャワープレートを持つエッチング装置 |
JP3883819B2 (ja) | 2001-05-10 | 2007-02-21 | 日本電信電話株式会社 | エッチング溶液およびエッチング方法 |
CN2615098Y (zh) * | 2003-05-07 | 2004-05-12 | 郭明宏 | 垂直式薄板蚀刻机的输送装置 |
JP4421956B2 (ja) * | 2003-07-18 | 2010-02-24 | 芝浦メカトロニクス株式会社 | 基板の処理装置及び処理方法 |
JP4422591B2 (ja) * | 2004-01-08 | 2010-02-24 | 新日本製鐵株式会社 | スライド型塗装装置とこれを用いた塗装方法 |
-
2006
- 2006-12-29 KR KR1020060138924A patent/KR100835745B1/ko not_active IP Right Cessation
-
2007
- 2007-02-22 JP JP2007041918A patent/JP4794475B2/ja not_active Expired - Fee Related
- 2007-03-01 TW TW096107049A patent/TWI350275B/zh not_active IP Right Cessation
- 2007-03-07 CN CN2007100797536A patent/CN101209902B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TWI350275B (en) | 2011-10-11 |
TW200827315A (en) | 2008-07-01 |
CN101209902B (zh) | 2012-03-14 |
JP2008162877A (ja) | 2008-07-17 |
CN101209902A (zh) | 2008-07-02 |
KR100835745B1 (ko) | 2008-06-09 |
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