JP4685713B2 - Method for manufacturing substrate for liquid crystal device - Google Patents

Description

  The present invention relates to a liquid crystal device substrate, a method for manufacturing a liquid crystal device substrate, and a liquid crystal device.

  A projection display device that projects an image on a screen is known. In this projection display device, a liquid crystal panel is mainly used for image formation. Such a liquid crystal panel usually has an alignment film set so as to develop a predetermined pretilt angle in order to align liquid crystal molecules in a certain direction. In order to manufacture such an alignment film, a method of rubbing a thin film made of a polymer compound such as polyimide formed on a substrate with a cloth such as rayon in one direction is known.

  However, an alignment film composed of a polymer compound such as polyimide may cause photodegradation depending on the use environment, use time, and the like. When such photodegradation occurs, constituent materials such as the alignment film and the liquid crystal layer are decomposed, and the decomposition products may adversely affect the performance of the liquid crystal. In addition, the rubbing process generates static electricity and dust, which reduces the reliability and the like. An inorganic alignment film formed by oblique deposition is also known as an alignment film that can solve such problems.

However, the formation of the inorganic alignment film by the oblique deposition method has a problem that a large apparatus is required and it is extremely difficult to obtain a film having a uniform thickness. Therefore, as a method for forming an inorganic alignment film that can more easily form an inorganic alignment film having a uniform thickness, an inorganic alignment film having pores is formed using a solution containing an inorganic oxide precursor and a surfactant. A method is disclosed (for example, see Patent Document 1).
JP 2005-78034 A

  Although the inorganic alignment film disclosed in Patent Document 1 also has a certain degree of alignment regulating force, further improvement in the alignment regulating force is desired. The present invention is a liquid crystal device substrate comprising an alignment film that can be formed by a simple method, hardly undergoes photodegradation, and has sufficient alignment regulating force, a method for manufacturing the same, and a liquid crystal using the substrate for a liquid crystal device The object is to provide a device.

In order to solve the above problems, a substrate for a liquid crystal device according to the present invention is a method for producing a substrate for a liquid crystal device comprising a base material and an alignment film disposed on the base material, An application step of applying a solution containing an inorganic oxide precursor, a hydrolysis accelerator, and a silicon compound precursor having a linear carbon chain on the material to form a coating film, and the coating film by calcining, the inorganic oxide precursor is changed into an inorganic oxide and, seen including a firing step of obtaining the orientation film straight chains on the said inorganic oxide film is formed, The inorganic oxide precursor is converted into an inorganic oxide by hydrolysis, and the silicon compound precursor having the linear carbon chain is converted into a silicon compound having a linear carbon chain by hydrolysis, thereby promoting the hydrolysis. The agents are hydroxyacetone, acetoin, 3-hydroxy-3-me Lu-2-butanone, fructose, glycolic acid ester, lactic acid ester, 2-hydroxy-isobutyric acid ester, thioglycolic acid ester, malic acid ester, tartaric acid ester, citric acid ester, 1-buten-3-ol, 2-methyl It consists of 3-buten-2-ol, 1-penten-3-ol, 1-hexen-3-ol, crotyl alcohol, 3-methyl-2-buten-1-ol, tinamyl alcohol, and acetone cyanohydrin. At least one compound selected from the group, wherein the coating step involves dissolving the inorganic oxide precursor, the hydrolysis accelerator, and the silicon compound precursor having a linear carbon chain in a solvent. A step of producing a first solution by dispersing, a step of producing a second solution by mixing water with the first solution; A step of applying said second solution onto the substrate, characterized in that it comprises a, drying the second solution the coating.

  According to such a substrate for a liquid crystal device, the alignment of liquid crystal molecules can be regulated along the pores, and the alignment regulating force by the linear carbon chain extends to the liquid crystal molecules, so that the alignment of the liquid crystal molecules is reliably regulated. Accordingly, a highly reliable liquid crystal device can be provided using the substrate. Further, since the base film having pores is composed of an inorganic compound, it has an alignment film having sufficient light resistance. Furthermore, since a hydrophobic linear carbon chain is formed on the surface of the alignment film, moisture adsorption to the alignment film hardly occurs, and high reliability can be ensured.

  In the substrate for a liquid crystal device of the present invention, the pores may have a microporous structure mainly having a pore diameter of 2 nm or less. With such a structure having pores, it becomes possible to suitably regulate the alignment of liquid crystal molecules. Moreover, by setting the pore diameter to 2 nm or less, the flatness of the film is improved and the translucency is also improved.

  In the substrate for a liquid crystal device of the present invention, the linear carbon chain included in the alignment film may be, for example, one having 3 to 25 carbon atoms. In the case of a linear carbon chain having less than 3 carbon atoms, sufficient alignment regulating force may not be applied to the liquid crystal molecules, and even when the number of carbon atoms exceeds 25, the alignment regulating force of the liquid crystal molecules does not work sufficiently There is.

  Next, in order to solve the above-described problem, a method for manufacturing a substrate for a liquid crystal device according to the present invention includes: a silicon substrate having an inorganic oxide precursor, a hydrolysis accelerator, and a linear carbon chain on a substrate; An application step of applying a solution containing a compound precursor to form a coating film, and baking the coating film, thereby changing the inorganic oxide precursor to an inorganic oxide, on the inorganic oxide film And a baking step for obtaining the alignment film in which a linear carbon chain is formed.

  With such a manufacturing method, the liquid crystal device substrate according to the present invention can be easily and reliably manufactured. That is, conventionally, an oblique deposition method has been adopted when forming an inorganic alignment film, and this requires an expensive large-scale apparatus as described above, but in the present invention, a solution is applied and the coating film is applied. Since the inorganic alignment film can be obtained only by firing, it is very troublesome. The inorganic alignment film of the present invention is a hydrolyzed product of a silicon compound precursor having a linear carbon chain with respect to a base film having a microporous structure obtained by hydrolyzing an inorganic oxide precursor. A linear carbon chain that is a part of the structure is formed. Therefore, the obtained alignment film has a structure in which a linear carbon chain is formed on a base film having a microporous structure. Moreover, in this invention, an acid and a base catalyst become unnecessary by selectively producing | generating the precursor which produces | generates a porous body, and using the hydrolysis promoter which accelerates | stimulates hydrolysis. Therefore, the influence on the manufacturing apparatus due to impurities and the influence on the characteristics of the liquid crystal device substrate to be manufactured are small.

  In the production method of the present invention, the coating step includes dissolving or dispersing the inorganic oxide precursor, the hydrolysis accelerator, and the silicon compound precursor having a linear carbon chain in a solvent. A step of creating one solution, a step of mixing water with the first solution to create a second solution, a step of applying the second solution on the substrate, and the applied second solution And a step of drying. By adopting such a coating method, the manufacture of the substrate for the liquid crystal device and thus the liquid crystal device can be made simpler and more reliable.

  The inorganic oxide precursor is appropriately selected according to the type of the target inorganic oxide and is not particularly limited. For example, an alkoxide such as methoxide, ethoxide, propoxide, isopropoxide, butoxide is used. Can do. When the target inorganic oxide is silicon oxide, ethoxytetraethoxysilane (TEOS) or tetramethoxysilane is preferable as the inorganic oxide precursor. As the hydrolysis accelerator, at least one compound selected from the group consisting of hydroxyaldehyde derivatives (or hydroxyketone derivatives), hydroxycarboxylic acid derivatives, allyl alcohol derivatives, and hydroxynitrile derivatives can be used. Examples of hydroxyaldehyde derivatives (or hydroxyketone derivatives) include hydroxyacetone, acetoin, 3-hydroxy-3-methyl-2-butanone, and fructose. Examples of hydroxycarboxylic acid derivatives include glycolic acid esters, Examples include lactic acid esters, 2-hydroxy-isobutyric acid esters, thioglycolic acid esters, malic acid esters, tartaric acid esters, and citric acid esters. Examples of allyl alcohol derivatives include 1-buten-3-ol, 2-methyl -3-buten-2-ol, 1-penten-3-ol, 1-hexen-3-ol, crotyl alcohol, 3-methyl-2-buten-1-ol, and tinamyl alcohol; Examples of nitrile derivatives include acetone Hydrin, and the like. As the silicon compound having a linear carbon chain, a silicon compound having an unsubstituted alkyl group such as hexyl, heptyl, octyl, dodecyl, hexadecyl, octadecyl or the like can be used. Examples of silicon compounds having a straight carbon chain include hexyltrimethoxysilane, hexyltriethoxysilane, heptyltrimethoxysilane, heptyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, octyltrimethoxysilane, octyl Examples include triethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxysilane, octadecyltrimethoxysilane, and octadecyltriethoxysilane.

  Next, in order to solve the above-described problem, the liquid crystal device of the present invention is characterized in that a liquid crystal layer is sandwiched between a pair of substrates facing each other, and the substrate is composed of the substrate for a liquid crystal device. In this case, a highly reliable liquid crystal device can be provided, and if the liquid crystal device is manufactured by the above-described method, a highly reliable liquid crystal device can be provided simply and reliably. Become. In the liquid crystal device of the present invention, the liquid crystal layer may be made of a liquid crystal having an initial alignment state of vertical alignment and a negative dielectric anisotropy. This is because the alignment film is suitable for vertically aligning liquid crystal molecules.

  The liquid crystal device of the present invention can be used as, for example, a liquid crystal television or a mobile phone display screen, a personal computer monitor, or a light modulation device of a liquid crystal projector. By using it for such an application, it is possible to provide an electronic device having excellent display characteristics. Further, by manufacturing the liquid crystal device by the above manufacturing method, the above-described electronic device can be provided at low cost.

  Hereinafter, embodiments according to the present invention will be described with reference to the drawings. In addition, in each figure, in order to make each layer and each member the size which can be recognized on drawing, the scale is varied for every layer and each member.

[Liquid Crystal Device]
The liquid crystal device of the present embodiment described below is an active matrix transmissive liquid crystal device using a TFT (Thin-Film Transistor) element as a switching element. In addition, the liquid crystal device of the present embodiment is configured by the liquid crystal device substrate according to the present invention.

  FIG. 1 is an equivalent circuit diagram of switching elements, signal lines, and the like in a plurality of pixels arranged in a matrix that constitutes an image display region of the transmissive liquid crystal device of this embodiment. FIG. 2 is a plan view showing the structure of a plurality of pixel groups adjacent to each other on a TFT array substrate on which data lines, scanning lines, pixel electrodes and the like are formed. FIG. 3 is a cross-sectional view of the element region of the transmissive liquid crystal device of this embodiment, and is a cross-sectional view taken along the line A-A ′ of FIG. 2. FIG. 4 is a cross-sectional view schematically showing a plurality of pixel regions in the transmissive liquid crystal device of this embodiment. 3 and 4, the upper side in the drawing is the light incident side, and the lower side in the drawing is the viewing side (observer side).

  In the transmissive liquid crystal device according to the present embodiment, as shown in FIG. 1, a plurality of pixels arranged in a matrix that constitutes an image display region are subjected to energization control for the pixel electrode 9 and the pixel electrode 9. TFT elements 30 as the switching elements are formed, and the data line 6 a to which an image signal is supplied is electrically connected to the source of the TFT element 30. Image signals S1, S2,..., Sn to be written to the data line 6a are supplied line-sequentially in this order, or are supplied for each group to a plurality of adjacent data lines 6a.

  In addition, the scanning line 3a is electrically connected to the gate of the TFT element 30, and scanning signals G1, G2,..., Gm are applied to the plurality of scanning lines 3a in a pulse-sequential manner at predetermined timing. The Further, the pixel electrode 9 is electrically connected to the drain of the TFT element 30, and the image signal S1, S2,... Supplied from the data line 6a is turned on by turning on the TFT element 30 as a switching element for a certain period. , Sn is written at a predetermined timing.

  A predetermined level of image signals S1, S2,..., Sn written to the liquid crystal via the pixel electrode 9 is held for a certain period with the common electrode described later. The liquid crystal modulates light by changing the orientation and order of the molecular assembly according to the applied voltage level, thereby enabling gradation display. Here, in order to prevent the held image signal from leaking, a storage capacitor 70 is added in parallel with the liquid crystal capacitor formed between the pixel electrode 9 and the common electrode.

  Next, the planar structure of the transmissive liquid crystal device of this embodiment will be described with reference to FIG. As shown in FIG. 2, a rectangular pixel electrode 9 (outlined by a dotted line portion 9A) made of a transparent conductive material such as indium tin oxide (hereinafter abbreviated as “ITO”) is formed on the TFT array substrate. A plurality of pixels are provided in a matrix, and data lines 6 a, scanning lines 3 a, and capacitor lines 3 b are provided along the vertical and horizontal boundaries of the pixel electrode 9. In the present embodiment, each pixel electrode 9 and the area where the data line 6a, the scanning line 3a, the capacitor line 3b, etc. are arranged so as to surround each pixel electrode 9 are pixels, and are arranged in a matrix. The display can be displayed for each pixel.

  The data line 6a is electrically connected to a source region (described later) through a contact hole 5 in the semiconductor layer 1a made of, for example, a polysilicon film constituting the TFT element 30, and the pixel electrode 9 is connected to the semiconductor layer 1a. Among these, it is electrically connected to a drain region described later via a contact hole 8. In addition, the scanning line 3a is disposed so as to face a channel region (a region with a diagonal line rising to the left in the figure), which will be described later, in the semiconductor layer 1a, and the scanning line 3a serves as a gate electrode at a portion facing the channel region. Function.

  The capacitor line 3b is formed from a main line portion extending in a substantially straight line along the scanning line 3a (that is, a first region formed along the scanning line 3a in a plan view) and a portion intersecting the data line 6a. And a protruding portion (that is, a second region extending along the data line 6 a when viewed in a plan view) protruding toward the previous stage (upward in the drawing) along the data line 6 a. In FIG. 2, a plurality of first light shielding films 11 a are provided in a region indicated by a diagonal line rising to the right.

  Next, a cross-sectional structure of the transmissive liquid crystal device of this embodiment will be described with reference to FIGS. In FIG. 4, some components such as switching elements are omitted in view of the visibility of the drawing. As shown in FIGS. 3 and 4, in the transmissive liquid crystal device of the present embodiment, a TFT array substrate (liquid crystal device substrate) 10 and a counter substrate (liquid crystal device substrate) 20 disposed opposite thereto are provided. A liquid crystal layer 50 is sandwiched therebetween. The liquid crystal layer 50 is made of a liquid crystal having an initial alignment state of vertical alignment and a negative dielectric anisotropy, and the transmissive liquid crystal device is a display device of a vertical alignment mode.

  The TFT array substrate 10 is mainly composed of a substrate body 10A made of a light-transmitting material such as quartz, a pixel electrode 9 formed on the surface of the liquid crystal layer 50, and an alignment film 40. The counter substrate 20 is made of glass or The substrate main body 20A made of a translucent material such as quartz, the common electrode 21 formed on the liquid crystal layer 50 side surface, and the alignment film 60 are mainly configured. As shown in FIG. 3, in the TFT array substrate 10, pixel electrodes 9 are provided on the surface of the substrate body 10 </ b> A on the liquid crystal layer 50 side, and each pixel electrode 9 is controlled to be switched to a position adjacent to each pixel electrode 9. A pixel switching TFT element 30 is provided.

  The pixel switching TFT element 30 has an LDD (Lightly Doped Drain) structure, and includes a scanning line 3a, a channel region 1a ′ of the semiconductor layer 1a in which a channel is formed by an electric field from the scanning line 3a, and the scanning line 3a. A gate insulating film 2 that insulates the semiconductor layer 1a, a data line 6a, a low concentration source region 1b and a low concentration drain region 1c of the semiconductor layer 1a, and a high concentration source region 1d and a high concentration drain region 1e of the semiconductor layer 1a. ing.

  Further, a second contact hole 5 leading to the high concentration source region 1d and a contact hole 8 leading to the high concentration drain region 1e are formed on the substrate main body 10A including the scanning line 3a and the gate insulating film 2. An interlayer insulating film 4 is formed. That is, the data line 6 a is electrically connected to the high concentration source region 1 d through the contact hole 5 that penetrates the second interlayer insulating film 4. Further, on the data line 6a and the second interlayer insulating film 4, a third interlayer insulating film 7 having a contact hole 8 leading to the high concentration drain region 1e is formed. That is, the high concentration drain region 1 e is electrically connected to the pixel electrode 9 through the contact hole 8 that penetrates the second interlayer insulating film 4 and the third interlayer insulating film 7.

  Further, in this embodiment, the gate insulating film 2 is extended from a position facing the scanning line 3a and used as a dielectric film, the semiconductor film 1a is extended to form the first storage capacitor electrode 1f, and further opposed thereto. The storage capacitor 70 is configured by using a part of the capacitor line 3b to be a second storage capacitor electrode.

  On the surface of the TFT array substrate 10 on the liquid crystal layer 50 side of the substrate body 10A, the TFT switching substrate 30 is transmitted through the region where the pixel switching TFT elements 30 are formed. The return light reflected at the interface 10 and air and returning to the liquid crystal layer 50 side is prevented from entering at least the channel region 1a ′ and the low concentration source / drain regions 1b and 1c of the semiconductor layer 1a. A first light shielding film 11a is provided. Further, a first interlayer insulation for electrically insulating the semiconductor layer 1a constituting the pixel switching TFT element 30 from the first light shielding film 11a is provided between the first light shielding film 11a and the pixel switching TFT element 30. A film 12 is formed. Further, as shown in FIG. 2, in addition to providing the first light-shielding film 11a on the TFT array substrate 10, the first light-shielding film 11a is electrically connected to the capacitor line 3b at the preceding stage or the subsequent stage through the contact hole 13. Configured to connect to.

  An alignment film 40 is formed on the TFT array substrate 10 on the liquid crystal layer 50 side, that is, on the pixel electrode 9 and the third interlayer insulating film 7. The alignment film 40 controls the alignment of the liquid crystal molecules in the liquid crystal layer 50 when no voltage is applied.

  On the other hand, the counter substrate 20 has a surface on the liquid crystal layer 50 side of the substrate body 20A, which is a region facing the formation region of the data line 6a, the scanning line 3a, and the pixel switching TFT element 30, that is, an opening region of each pixel unit. The second light-shielding film 23 for preventing incident light from entering the channel region 1a ′, the low-concentration source region 1b, and the low-concentration drain region 1c of the semiconductor layer 1a of the pixel switching TFT element 30 in the other regions. Is provided.

  Furthermore, the common electrode 21 made of ITO or the like is formed over the substantially entire surface of the substrate body 20A on which the second light shielding film 23 is formed, and the alignment film 60 is formed on the liquid crystal layer 50 side. Is formed. The alignment film 60 controls the alignment of the liquid crystal molecules in the liquid crystal layer 50 when no voltage is applied.

  Here, as shown in FIG. 5, the alignment film 40 (60) has a structure in which linear carbon chains 42 (62) are monomolecularly formed on a base film 41 (61) made of an inorganic oxide. It has. The base film 41 (61) is made of silicon oxide and has a microporous structure having fine holes 43 with a pore diameter of 2 nm or less (2 nm in this embodiment) on the surface. Moreover, as the linear carbon chain 42 (62), one having 3 to 25 carbon atoms (18 carbon atoms in the present embodiment) is formed. Thus, the alignment film 40 (60) provided in the liquid crystal device of the present embodiment is not subjected to the rubbing process. That is, the alignment film 40 (60) aligns the liquid crystal molecules 51 along the fine holes 43, and further aligns the liquid crystal molecules 51 along the linear carbon chains 42 (62).

  Therefore, when the rubbing process is performed as in the prior art, the display quality is not deteriorated due to the streaks formed on the film surface, and the yield is not reduced due to the rubbing process. Improvement of display quality and improvement of manufacturing efficiency are achieved. Further, as described above, the alignment of the liquid crystal molecules 51 can be regulated along the microscopic holes 43, and the alignment regulating force by the linear carbon chain 42 (62) also reaches the liquid crystal molecules 51. It becomes possible to regulate the orientation. Further, since the base film 41 (61) having the fine holes 43 is made of an inorganic oxide, it also has sufficient light resistance. Further, since the hydrophobic linear carbon chain 42 (62) is formed on the surface of the alignment film 40 (60), moisture adsorption to the alignment film 40 (60) hardly occurs, and high reliability is ensured. It becomes possible to do.

Next, a method for manufacturing the liquid crystal device of this embodiment will be described. In addition, the manufacturing method of the liquid crystal device of this embodiment employs the manufacturing method of the substrate for a liquid crystal device according to the present invention.
First, a TFT array substrate 10 that is a substrate for a liquid crystal device is formed.
Here, a translucent substrate 10A made of glass or the like is prepared, and a first light shielding film 11a, a first interlayer insulating film 12, a semiconductor layer 1a, various wirings 3a, 3b, 6a, insulating films 4, 7, The pixel electrode 9 and the like are formed by a known method. Subsequently, an alignment film 40 is formed on the third interlayer insulating film 7 including the pixel electrode 9.

Specifically, the alignment film 40 is formed by a process of creating a silica sol solution as shown in FIG. 6 and a baking process as shown in FIG.
First, when preparing a silica sol solution, as shown in FIG. 6, a solution A (S1) in which TMOS, hydroxyacetone, and ODS are dissolved or dispersed in methanol is stirred at 25 ° C. (S2). Water and methanol are added thereto, and the mixed solution is stirred at 40 ° C. for 1 day (S3). Then, this is allowed to stand at room temperature (S4), and then diluted with a diluent solvent (alcohol solvent, glycol ether solvent, etc.) to obtain a silica sol solution (S5). The solution A is 12.5 mmol of hydroxyacetone, 1.5 mmol of ODS, and 10 mol of methanol with respect to 12.5 mmol of TMOS. The additive is 4 mmol water and 10 ml methanol. Here, in the solution A, it is preferable that ODS which is a silicon compound precursor having a linear carbon chain is 0.25 mol or less with respect to 1 mol of TMOS which is an inorganic oxide precursor. This is to facilitate the preparation of the solution. In solution A, TMOS, which is an inorganic oxide precursor, becomes an inorganic oxide by a hydrolysis reaction, and ODS, which is a silicon compound precursor having a linear carbon chain, is also linear by a hydrolysis reaction. It becomes a silicon compound having a carbon chain.

Next, after the substrate with the pixel electrode (ITO) is subjected to UV ozone cleaning (S11), the silica sol solution is formed on the substrate to a thickness of about 50 nm by using a spin coat method (S12). Thereafter, the film is dried (S13), followed by main firing (S14) to obtain the alignment film 40. The temporary drying is performed at 80 ° C. for 5 minutes, and the main baking is performed at 200 ° C. for 1 hour.
Through the alignment film forming process as described above, the TFT array substrate 10 which is a substrate for a liquid crystal device according to the present invention is produced.

  On the other hand, a counter substrate 20 is also formed separately from the TFT array substrate 10 described above. In this case, after preparing the substrate 20A, the light shielding film 23 and the counter electrode 21 are formed on the substrate 20A by using the same method as that for forming the TFT array substrate 10, and further referring to FIGS. Thus, the counter substrate 20 is obtained by forming the alignment film 60 using the method described above.

Thereafter, the TFT array substrate 10 and the counter substrate 20 are bonded together via a sealing agent, and further a liquid crystal having negative dielectric anisotropy is injected from a liquid crystal injection port formed in the sealing agent to obtain a liquid crystal panel. The liquid crystal device of this embodiment is manufactured by connecting wiring.
As described above, the manufacturing method of the liquid crystal device according to the present embodiment forms the vertical alignment films 40 and 60 under relatively mild conditions without a rubbing process in the alignment film forming step. Therefore, the manufacturing method has a high manufacturing efficiency, and a rubbing streak is hardly generated in the manufactured liquid crystal device, so that the manufacturing method is very reliable.

  Moreover, in this embodiment, since the inorganic alignment films 40 and 60 are obtained only by apply | coating the mixed solution which consists of the solutions A and B, and baking the coating film, it will become very labor-saving. Furthermore, in this embodiment, since the hydrolysis accelerator selectively generates a precursor that generates a porous body and promotes hydrolysis, an acid / base catalyst is not required. Therefore, the influence of the impurities on the manufacturing apparatus and the characteristics of the manufactured substrates 10 and 20 are small.

  The inorganic oxide precursor described above is appropriately selected according to the type of the target inorganic oxide and is not particularly limited. For example, an alkoxide such as methoxide, ethoxide, propoxide, isopropoxide, butoxide is used. Can be used. When the target inorganic oxide is silicon oxide, ethoxytetraethoxysilane (TEOS) or tetramethoxysilane is preferable as the inorganic oxide precursor. As the hydrolysis accelerator, at least one compound selected from the group consisting of hydroxyaldehyde derivatives (or hydroxyketone derivatives), hydroxycarboxylic acid derivatives, allyl alcohol derivatives, and hydroxynitrile derivatives can be used. Examples of hydroxyaldehyde derivatives (or hydroxyketone derivatives) include hydroxyacetone, acetoin, 3-hydroxy-3-methyl-2-butanone, and fructose. Examples of hydroxycarboxylic acid derivatives include glycolic acid esters, Examples include lactic acid esters, 2-hydroxy-isobutyric acid esters, thioglycolic acid esters, malic acid esters, tartaric acid esters, and citric acid esters. Examples of allyl alcohol derivatives include 1-buten-3-ol, 2-methyl -3-buten-2-ol, 1-penten-3-ol, 1-hexen-3-ol, crotyl alcohol, 3-methyl-2-buten-1-ol, and tinamyl alcohol; Examples of nitrile derivatives include acetone Hydrin, and the like. As the silicon compound having a linear carbon chain, a silicon compound having an unsubstituted alkyl group such as hexyl, heptyl, octyl, dodecyl, hexadecyl, octadecyl or the like can be used. Examples of silicon compounds having a straight carbon chain include hexyltrimethoxysilane, hexyltriethoxysilane, heptyltrimethoxysilane, heptyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, octyltrimethoxysilane, octyl Examples include triethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxysilane, octadecyltrimethoxysilane, and octadecyltriethoxysilane.

The liquid crystal device and the method for manufacturing the same according to an embodiment of the present invention have been described above. However, the present invention is not limited to this, and the description of each claim is made without departing from the scope described in each claim. The present invention is not limited to the wording, and the range that can be easily replaced by those skilled in the art can be added as appropriate, and improvements based on knowledge that the person skilled in the art normally has can be added as appropriate.
For example, in the present embodiment, only an active matrix liquid crystal device using TFT elements has been described. However, the present invention is not limited to this, and the active matrix liquid crystal using TFD (Thin-Film Diode) elements is used. The present invention can also be applied to a device, a passive matrix liquid crystal device, and the like. In the present embodiment, only the transmissive liquid crystal device has been described. However, the present invention is not limited to this, and can be applied to a reflective or transflective liquid crystal device. Thus, the present invention can be applied to a liquid crystal device having any structure.

[Electronics]
Examples of electronic devices including the liquid crystal device of the above embodiment will be described.
FIG. 8A is a perspective view showing an example of a mobile phone. In FIG. 8A, reference numeral 500 denotes a mobile phone body, and reference numeral 501 denotes a liquid crystal display unit using the liquid crystal device of the above embodiment.

  FIG. 8B is a perspective view showing an example of a portable information processing apparatus such as a word processor or a personal computer. In FIG. 8B, reference numeral 600 denotes an information processing apparatus, reference numeral 601 denotes an input unit such as a keyboard, reference numeral 603 denotes an information processing apparatus body, and reference numeral 602 denotes a liquid crystal display unit using the liquid crystal device of the above embodiment. .

  FIG. 8C is a perspective view showing an example of a wristwatch type electronic device. In FIG. 8C, reference numeral 700 denotes a watch body, and reference numeral 701 denotes a liquid crystal display unit using the liquid crystal device of the above embodiment.

  As described above, the electronic apparatus shown in FIG. 8 uses the above-described liquid crystal device as an example of the present invention for the display unit, so that there is no problem that rubbing streaks are displayed, for example, when a rubbing process is performed. Thus, the display device can maintain the display quality for a long time.

[Projection type display device]
Next, a configuration of a projection display device (projector) including the liquid crystal device according to the above embodiment as a light modulation unit will be described with reference to FIG. FIG. 9 is a schematic configuration diagram showing a main part of a projection display device using the liquid crystal device of the above embodiment as a light modulation device. In FIG. 9, 810 is a light source, 813 and 814 are dichroic mirrors, 815, 816 and 817 are reflection mirrors, 818 is an incident lens, 819 is a relay lens, 820 is an exit lens, 822, 823 and 824 are liquid crystal light modulators, Reference numeral 825 denotes a cross dichroic prism, and reference numeral 826 denotes a projection lens.

  The light source 810 includes a lamp 811 such as a metal halide and a reflector 812 that reflects the light of the lamp. The dichroic mirror 813 that reflects blue light and green light transmits red light out of the light flux from the light source 810 and reflects blue light and green light. The transmitted red light is reflected by the reflection mirror 817 and is incident on the red light liquid crystal light modulation device 822 including the liquid crystal device as an example of the present invention.

  On the other hand, of the color light reflected by the dichroic mirror 813, the green light is reflected by the dichroic mirror 814 that reflects green light, and enters the liquid crystal light modulator 823 for green light that includes the above-described liquid crystal device according to the present invention. . Note that the blue light also passes through the second dichroic mirror 814. For blue light, light guide means 821 comprising a relay lens system including an incident lens 818, a relay lens 819, and an exit lens 820 is provided in order to compensate for the difference in optical path length from green light and red light. Through this, the blue light is incident on the liquid crystal light modulation device 824 for blue light provided with the liquid crystal device as an example of the present invention.

  The three color lights modulated by the respective light modulation devices are incident on the cross dichroic prism 825. In this prism, four right-angle prisms are bonded together, and a dielectric multilayer film that reflects red light and a dielectric multilayer film that reflects blue light are formed in a cross shape on the inner surface. These dielectric multilayer films combine the three color lights to form light representing a color image. The synthesized light is projected onto the screen 827 by the projection lens 826 which is a projection optical system, and the image is enlarged and displayed.

  Since the projection type display device having the above-described structure includes the liquid crystal device as an example of the present invention described above, there is no problem that rubbing streaks are displayed, for example, when the rubbing process is performed, and the display quality is improved. The display device can be maintained for a long time.

1 is an equivalent circuit diagram of switching elements, signal lines, etc. in a liquid crystal device according to an embodiment of the present invention. FIG. 2 is a plan view showing a structure of a plurality of pixel groups adjacent to each other on a TFT array substrate in the liquid crystal device of FIG. 1. Sectional drawing which shows the element structure about the liquid crystal device of FIG. FIG. 2 is a cross-sectional view schematically showing a configuration of a pixel region of the liquid crystal device of FIG. Explanatory drawing which shows the structure of an alignment film typically. Explanatory drawing which shows 1 process about the manufacturing method of the board | substrate for liquid crystal devices. Explanatory drawing which shows 1 process about the manufacturing method of the board | substrate for liquid crystal devices. FIG. 14 is a perspective view illustrating some examples of the electronic apparatus according to the invention. The figure which shows an example about the projection type display apparatus which concerns on this invention.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 10 ... TFT array substrate, 20 ... Counter substrate, 10A, 20A ... Substrate body, 40, 60 ... Alignment film, 50 ... Liquid crystal layer

Claims (1)

A method for producing a substrate for a liquid crystal device comprising a base material and an alignment film disposed on the base material,
Applying a solution containing an inorganic oxide precursor, a hydrolysis accelerator, and a silicon compound precursor having a linear carbon chain on the substrate to form a coating film;
By firing the coating film, the inorganic oxide precursor is changed to an inorganic oxide, and a firing step for obtaining the alignment film in which a linear carbon chain is formed on the inorganic oxide film, and seen including,
The inorganic oxide precursor becomes an inorganic oxide by hydrolysis,
The silicon compound precursor having a linear carbon chain becomes a silicon compound having a linear carbon chain by hydrolysis,
The hydrolysis accelerator is hydroxyacetone, acetoin, 3-hydroxy-3-methyl-2-butanone, fructose, glycolic acid ester, lactic acid ester, 2-hydroxy-isobutyric acid ester, thioglycolic acid ester, malic acid ester, Tartaric acid ester, citrate ester, 1-buten-3-ol, 2-methyl-3-buten-2-ol, 1-penten-3-ol, 1-hexen-3-ol, crotyl alcohol, 3-methyl At least one compound selected from the group consisting of 2-buten-1-ol, tinamyl alcohol, and acetone cyanohydrin;
The coating process includes
A step of dissolving or dispersing the inorganic oxide precursor, the hydrolysis accelerator, and the silicon compound precursor having a linear carbon chain in a solvent to form a first solution;
Mixing the water with the first solution to create a second solution;
Applying the second solution onto the substrate;
And a step of drying the applied second solution . A method of manufacturing a substrate for a liquid crystal device.

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