JP4642818B2 - 回折格子の製造方法 - Google Patents

回折格子の製造方法 Download PDF

Info

Publication number
JP4642818B2
JP4642818B2 JP2007201570A JP2007201570A JP4642818B2 JP 4642818 B2 JP4642818 B2 JP 4642818B2 JP 2007201570 A JP2007201570 A JP 2007201570A JP 2007201570 A JP2007201570 A JP 2007201570A JP 4642818 B2 JP4642818 B2 JP 4642818B2
Authority
JP
Japan
Prior art keywords
ray
diffraction grating
photosensitive resin
absorbing metal
ray absorbing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007201570A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009037023A5 (fr
JP2009037023A (ja
Inventor
服部　　正
大二 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NANO CREATE COMPANY, LTD.
Original Assignee
NANO CREATE COMPANY, LTD.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NANO CREATE COMPANY, LTD. filed Critical NANO CREATE COMPANY, LTD.
Priority to JP2007201570A priority Critical patent/JP4642818B2/ja
Publication of JP2009037023A publication Critical patent/JP2009037023A/ja
Publication of JP2009037023A5 publication Critical patent/JP2009037023A5/ja
Application granted granted Critical
Publication of JP4642818B2 publication Critical patent/JP4642818B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Measurement Of Radiation (AREA)
JP2007201570A 2007-08-02 2007-08-02 回折格子の製造方法 Expired - Fee Related JP4642818B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007201570A JP4642818B2 (ja) 2007-08-02 2007-08-02 回折格子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007201570A JP4642818B2 (ja) 2007-08-02 2007-08-02 回折格子の製造方法

Publications (3)

Publication Number Publication Date
JP2009037023A JP2009037023A (ja) 2009-02-19
JP2009037023A5 JP2009037023A5 (fr) 2010-09-24
JP4642818B2 true JP4642818B2 (ja) 2011-03-02

Family

ID=40438991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007201570A Expired - Fee Related JP4642818B2 (ja) 2007-08-02 2007-08-02 回折格子の製造方法

Country Status (1)

Country Link
JP (1) JP4642818B2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8895934B2 (en) 2010-01-08 2014-11-25 Canon Kabushiki Kaisha Microstructure manufacturing method

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6281969B2 (ja) * 2009-06-16 2018-02-21 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 傾けられた格子及び傾けられた格子の製造方法
US8999435B2 (en) * 2009-08-31 2015-04-07 Canon Kabushiki Kaisha Process of producing grating for X-ray image pickup apparatus
JP2015178683A (ja) * 2010-01-08 2015-10-08 キヤノン株式会社 金属吸収格子及びタルボ干渉計
JP5660910B2 (ja) * 2010-03-30 2015-01-28 富士フイルム株式会社 放射線画像撮影用グリッドの製造方法
DE102010017426A1 (de) * 2010-06-17 2011-12-22 Karlsruher Institut für Technologie Gitter aus mindestens zwei Materialien für die Röntgenbildgebung
US9748012B2 (en) 2010-12-21 2017-08-29 Konica Minolta, Inc. Method for manufacturing metal grating structure, metal grating structure manufactured by the method, and X-ray imaging device using the metal grating structure
JP5893252B2 (ja) * 2011-02-15 2016-03-23 キヤノン株式会社 微細構造体の製造方法
JP5804726B2 (ja) * 2011-02-24 2015-11-04 キヤノン株式会社 微細構造体の製造方法
JP5656726B2 (ja) * 2011-04-15 2015-01-21 株式会社日立ハイテクサイエンス Ｘ線タルボ干渉計用位相型回折格子の製造方法
JP5860613B2 (ja) * 2011-05-26 2016-02-16 株式会社オプトニクス精密 Ｘ線干渉計用の回折格子及びその製造方法
JP6070555B2 (ja) 2011-07-27 2017-02-01 コニカミノルタ株式会社 金属格子の製造方法
JP5871549B2 (ja) * 2011-07-29 2016-03-01 キヤノン株式会社 Ｘ線遮蔽格子の製造方法
JP6245794B2 (ja) 2011-07-29 2017-12-13 キヤノン株式会社 遮蔽格子の製造方法
KR101306185B1 (ko) 2011-12-28 2013-09-17 단국대학교 산학협력단 엑스선 간섭계의 나노 격자 제조 방법
JP6667215B2 (ja) 2014-07-24 2020-03-18 キヤノン株式会社 Ｘ線遮蔽格子、構造体、トールボット干渉計、ｘ線遮蔽格子の製造方法
JP7059545B2 (ja) * 2017-09-20 2022-04-26 大日本印刷株式会社 構造体の製造方法、および構造体
JP7319106B2 (ja) * 2019-06-28 2023-08-01 株式会社ミツトヨ 格子部品およびその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61174502A (ja) * 1985-01-29 1986-08-06 Shimadzu Corp 軟ｘ線用光学素子
JPH06192841A (ja) * 1992-12-24 1994-07-12 Canon Inc 貴金属単結晶群の形成方法並びに適用品及びその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61174502A (ja) * 1985-01-29 1986-08-06 Shimadzu Corp 軟ｘ線用光学素子
JPH06192841A (ja) * 1992-12-24 1994-07-12 Canon Inc 貴金属単結晶群の形成方法並びに適用品及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8895934B2 (en) 2010-01-08 2014-11-25 Canon Kabushiki Kaisha Microstructure manufacturing method

Also Published As

Publication number Publication date
JP2009037023A (ja) 2009-02-19

Similar Documents

Publication Publication Date Title
JP4642818B2 (ja) 回折格子の製造方法
JP4663742B2 (ja) 回折格子の製造方法
JP4608679B2 (ja) Ｘ線タルボ干渉計に用いられる位相型回折格子と振幅型回折格子の製造方法
JP5420923B2 (ja) Ｘ線タルボ回折格子の製造方法
JP2009042528A (ja) 回折格子の製造方法
JP5459659B2 (ja) Ｘ線位相コントラスト像の撮像に用いられる位相格子、該位相格子を用いた撮像装置、ｘ線コンピューター断層撮影システム
JP5451150B2 (ja) Ｘ線用線源格子、ｘ線位相コントラスト像の撮像装置
US7639786B2 (en) X-ray optical transmission grating of a focus-detector arrangement of an X-ray apparatus for generating projective or tomographic phase contrast recordings of a subject
US9036773B2 (en) Method for X-ray phase contrast and dark-field imaging using an arrangement of gratings in planar geometry
JP5660910B2 (ja) 放射線画像撮影用グリッドの製造方法
JP5162453B2 (ja) 非干渉性多色ｘ線源を用いた定量的位相コントラスト画像法及び断層撮影法のための干渉計
JP5158699B2 (ja) Ｘ線撮像装置、及び、これに用いるｘ線源
JP6460226B2 (ja) Ｘ線撮影装置
JP5601909B2 (ja) Ｘ線撮像装置及びこれを用いるｘ線撮像方法
US20070183582A1 (en) Focus-detector arrangement for generating projective or tomographic phase contrast recordings with X-ray optical gratings
JP2013536403A (ja) 少なくとも二つの材料から成るｘ線撮像用の格子
TW201109851A (en) Wavefront measuring method and device, and exposure method and device
JP2016032573A (ja) トールボット干渉計、トールボット干渉システム、及び縞走査法
WO2013084421A1 (fr) Microstructure et appareil d'imagerie doté de la microstructure
JP5804726B2 (ja) 微細構造体の製造方法
JP6828217B2 (ja) Ｘ線位相コントラスト及び／又は暗視野イメージングのための回折格子およびその製造方法
Wen et al. Boosting phase contrast with a grating Bonse–Hart interferometer of 200 nanometre grating period
US20150179292A1 (en) X-ray shield grading and method for fabricating the same
WO2012081376A1 (fr) Grilles pour radiographie et système de radiographie
US20160256122A1 (en) Imaging System and Imaging Method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100611

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100722

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100722

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20100722

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20100722

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20100722

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20100827

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100914

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100928

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101124

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101201

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131210

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees