JP4589270B2 - 液晶表示素子用基板合着装置 - Google Patents
液晶表示素子用基板合着装置 Download PDFInfo
- Publication number
- JP4589270B2 JP4589270B2 JP2006172221A JP2006172221A JP4589270B2 JP 4589270 B2 JP4589270 B2 JP 4589270B2 JP 2006172221 A JP2006172221 A JP 2006172221A JP 2006172221 A JP2006172221 A JP 2006172221A JP 4589270 B2 JP4589270 B2 JP 4589270B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- vent
- liquid crystal
- crystal display
- bonding apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims description 148
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 41
- 238000000034 method Methods 0.000 claims description 36
- 230000008569 process Effects 0.000 claims description 31
- 238000013022 venting Methods 0.000 claims description 16
- 238000001179 sorption measurement Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 9
- 238000007789 sealing Methods 0.000 description 9
- 238000012790 confirmation Methods 0.000 description 8
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000005086 pumping Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133354—Arrangements for aligning or assembling substrates
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
- Y10T156/1702—For plural parts or plural areas of single part
- Y10T156/1744—Means bringing discrete articles into assembled relationship
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
第一に、本発明の基板合着装置は、基板を吸着して落下させる静電チャックを複数の静電ブロックに細分して各静電ブロックにメインベント穴と複数のサブベント穴を形成し、ベント工程時に複数のメイン配管を通して各メインベント穴にガスを注入するため、ベント工程時にベントの均一度を大きく向上させ、基板合着不良を防止することができる。
627 ベント用サブ配管
932 上部静電チャック
933A 複数の第1静電ブロック
933B 複数の第2静電ブロック
946 メインベント穴
947a,947b サブベント穴
948a 第1ベント溝
948b 第2ベント溝
Claims (6)
- ベント工程によって第1及び第2基板を合着する基板合着装置であって、
前記第2基板を吸着する下部吸着プレートと、
複数のブロックで構成され、前記各ブロックの吸着によって前記第1基板を吸着し、前記吸着された前記第1基板を前記第2基板側に落下させる上部吸着プレートと、
前記各ブロックの中心に形成され、ベント時にガスが注入される複数のメインベント穴と、
前記各ブロックの前記メインベント穴の両側に構成され、前記ベント時にガスが注入される少なくとも2個のサブベント穴と、
前記各ブロックに形成された前記メインベント穴に連結され、真空ポンプからガスを前記メインベント穴に注入する複数のベント用メイン配管と、
前記各ベント用メイン配管から分岐して前記少なくとも2個のサブベント穴のそれぞれに連結され、前記ガスを前記少なくとも2個のサブベント穴に注入するベント用サブ配管と、
を備えて構成されることを特徴とする、液晶表示素子用基板合着装置。 - 前記少なくとも2個のサブベント穴は、前記メインベント穴を間に置いて前記各ブロックに形成されることを特徴とする、請求項1に記載の液晶表示素子用基板合着装置。
- 前記各ブロックは、
前記メインベント穴から放射状に分岐して形成された複数の第1ベント溝と、
前記サブベント穴のそれぞれから放射状に分岐して形成された複数の第2ベント溝と、
をさらに備えることを特徴とする、請求項1に記載の液晶表示素子用基板合着装置。 - 前記各ブロックは、
前記複数の第1ベント溝のそれぞれの末端に円形に形成された複数の第1円形溝と、
前記複数の第2ベント溝のそれぞれの末端に円形に形成された複数の第2円形溝と、
をさらに備えることを特徴とする、請求項3に記載の液晶表示素子用基板合着装置。 - 前記上部吸着プレートに吸着された前記第1基板は、前記各ブロックに印加される電源のオフ時、前記メインベント穴及び少なくとも2個のサブベント穴に注入されるガスによって前記第2基板側に落下することを特徴とする、請求項1に記載の液晶表示素子用基板合着装置。
- 前記各ブロックは、印加される電源によって前記基板を吸着する静電チャックであることを特徴とする、請求項1に記載の液晶表示素子用基板合着装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050133121A KR100898793B1 (ko) | 2005-12-29 | 2005-12-29 | 액정표시소자용 기판 합착 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007183543A JP2007183543A (ja) | 2007-07-19 |
JP4589270B2 true JP4589270B2 (ja) | 2010-12-01 |
Family
ID=36637272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006172221A Active JP4589270B2 (ja) | 2005-12-29 | 2006-06-22 | 液晶表示素子用基板合着装置 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7839477B2 (ja) |
JP (1) | JP4589270B2 (ja) |
KR (1) | KR100898793B1 (ja) |
CN (1) | CN100474079C (ja) |
DE (1) | DE102006024946B4 (ja) |
FR (1) | FR2895693B1 (ja) |
GB (1) | GB2433819B (ja) |
TW (1) | TWI346226B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100942304B1 (ko) * | 2008-06-02 | 2010-02-16 | 주식회사 에이디피엔지니어링 | 기판척, 기판합착장치 |
US8245751B2 (en) | 2007-11-07 | 2012-08-21 | Advanced Display Process Engineering Co., Ltd. | Substrate bonding apparatus |
US8408262B2 (en) * | 2009-10-08 | 2013-04-02 | International Business Machines Corporation | Adaptive chuck for planar bonding between substrates |
KR102012044B1 (ko) * | 2012-09-03 | 2019-08-20 | 리쿠아비스타 비.브이. | 전기습윤 표시 패널용 기판 합착 장치 및 이를 이용한 기판의 합착 방법 |
JP7267877B2 (ja) * | 2019-09-05 | 2023-05-02 | キオクシア株式会社 | 基板貼合装置 |
CN112757315A (zh) * | 2020-12-29 | 2021-05-07 | 富智康精密组件(北京)有限公司 | 侧放工件机械手及侧放工件的方法 |
CN114083700B (zh) * | 2021-11-01 | 2024-08-06 | 深圳市高美福商显科技有限公司 | 一种液晶显示面板加工装置及方法 |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0634983A (ja) * | 1992-07-17 | 1994-02-10 | Sharp Corp | 貼合わせ装置 |
JPH08220548A (ja) * | 1995-02-14 | 1996-08-30 | Ushio Inc | 液晶パネルの貼り合わせ方法および装置 |
JP2001525616A (ja) * | 1997-12-01 | 2001-12-11 | アプライド マテリアルズ インコーポレイテッド | 基板を迅速に解除できる静電チャック |
JP2003233053A (ja) * | 2002-02-06 | 2003-08-22 | Lg Phillips Lcd Co Ltd | 液晶表示素子用貼り合わせ装置 |
JP2003233080A (ja) * | 2002-02-05 | 2003-08-22 | Lg Phillips Lcd Co Ltd | 合着装置及びこれを用いた液晶表示装置の製造方法 |
JP2004170974A (ja) * | 2002-11-16 | 2004-06-17 | Lg Phillips Lcd Co Ltd | 液晶表示素子製造工程用基板貼り合せ装置 |
JP2004170975A (ja) * | 2002-11-15 | 2004-06-17 | Lg Phillips Lcd Co Ltd | 液晶表示素子製造装置及びこれを利用した製造方法 |
JP2004212444A (ja) * | 2002-12-27 | 2004-07-29 | Internatl Business Mach Corp <Ibm> | 液晶表示装置の製造方法及び貼り合わせ装置 |
JP2005202431A (ja) * | 2000-11-30 | 2005-07-28 | Fujitsu Ltd | 貼合せ基板製造システム |
JP2005258468A (ja) * | 2002-03-19 | 2005-09-22 | Fujitsu Ltd | 貼合せ基板製造装置 |
JP2005258325A (ja) * | 2004-03-15 | 2005-09-22 | Fujitsu Ltd | 貼合せ基板製造装置及び貼合せ基板製造方法 |
WO2005098522A1 (ja) * | 2004-04-09 | 2005-10-20 | Shin-Etsu Engineering Co., Ltd. | 粘着チャック装置 |
JP2005326873A (ja) * | 2002-07-19 | 2005-11-24 | Hitachi Industries Co Ltd | 基板組立装置 |
JP2006201330A (ja) * | 2005-01-19 | 2006-08-03 | Fujitsu Ltd | 貼合せ基板製造装置及び貼合せ基板製造方法 |
Family Cites Families (108)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2905768A (en) * | 1954-09-24 | 1959-09-22 | Ibm | Air head |
US2880030A (en) * | 1956-06-22 | 1959-03-31 | Ballantine & Sons P | Apparatus for handling materials |
US2916059A (en) * | 1958-02-18 | 1959-12-08 | Lan J Wong | Evacuation valve cup |
US3466079A (en) * | 1965-09-08 | 1969-09-09 | Western Electric Co | Pressurized fluid pickup device |
GB1165382A (en) * | 1966-08-08 | 1969-09-24 | Pilkington Brothers Ltd | Improvements in or relating to Vacuum Holding Apparatus |
US3499714A (en) * | 1966-10-13 | 1970-03-10 | Electroglas Inc | Mask alignment apparatus |
US3499640A (en) * | 1967-08-03 | 1970-03-10 | Electroglas Inc | Chuck assembly for automatic wafer die sort machine |
US3608946A (en) * | 1968-11-19 | 1971-09-28 | Dow Chemical Co | Device for handling of a filter membrane |
US3740900A (en) * | 1970-07-01 | 1973-06-26 | Signetics Corp | Vacuum chuck assembly for semiconductor manufacture |
JPS504544B1 (ja) * | 1970-12-21 | 1975-02-20 | ||
US3741012A (en) * | 1971-04-30 | 1973-06-26 | Ashland Oil Inc | Method for determining tack |
JPS49104059A (ja) * | 1973-01-23 | 1974-10-02 | ||
US3884061A (en) * | 1973-11-02 | 1975-05-20 | Boeing Co | Vacuum parts holder |
GB1526933A (en) * | 1974-09-13 | 1978-10-04 | Johnson Matthey Co Ltd | Vacuum head for handling transfers |
US4026091A (en) * | 1976-03-25 | 1977-05-31 | Pearson Walter G | Article handling and placement apparatus |
PL104888B1 (pl) * | 1976-10-16 | 1979-09-29 | Budowlany Bytom Zaklad | Prozniowe zawiesie do transportu plyt |
JPS55166219A (en) * | 1979-06-14 | 1980-12-25 | Yachiyoda Kogyo Kk | Amendment of surface of windshield glass |
US4448404A (en) * | 1980-11-18 | 1984-05-15 | Nippon Kogaku K. K. | Device for holding a sheet-like sample |
EP0100648A3 (en) * | 1982-07-29 | 1985-08-07 | Yoshiaki Nagaura | Holding a workpiece |
US4710094A (en) * | 1984-03-06 | 1987-12-01 | Asm Fico Tooling, B.V. | Automatic continuously cycleable molding system and method |
US4818169A (en) * | 1985-05-17 | 1989-04-04 | Schram Richard R | Automated wafer inspection system |
US4852926A (en) * | 1988-01-11 | 1989-08-01 | Littell Edmund R | Vacuum cup construction |
DE3926121A1 (de) * | 1989-08-08 | 1991-02-14 | Focke & Co | Vorrichtung zum foerdern von lagen aus einer mehrzahl von einzelgegenstaenden |
US5238499A (en) * | 1990-07-16 | 1993-08-24 | Novellus Systems, Inc. | Gas-based substrate protection during processing |
US5230741A (en) * | 1990-07-16 | 1993-07-27 | Novellus Systems, Inc. | Gas-based backside protection during substrate processing |
JPH0521584A (ja) * | 1991-07-16 | 1993-01-29 | Nikon Corp | 保持装置 |
US5539609A (en) * | 1992-12-02 | 1996-07-23 | Applied Materials, Inc. | Electrostatic chuck usable in high density plasma |
JP2919158B2 (ja) * | 1992-02-10 | 1999-07-12 | キヤノン株式会社 | 基板保持装置 |
FR2688323B1 (fr) * | 1992-03-03 | 1994-04-29 | France Telecom | Machine d'assemblage pour cellules a cristaux liquides. |
JP3224157B2 (ja) * | 1992-03-31 | 2001-10-29 | キヤノン株式会社 | X線マスクとその製造方法、並びに該x線マスクを用いたデバイス製造方法とx線露光装置 |
US5308645A (en) * | 1992-08-07 | 1994-05-03 | Delco Electronics Corporation | Method and apparatus for through hole substrate printing |
JPH06244269A (ja) * | 1992-09-07 | 1994-09-02 | Mitsubishi Electric Corp | 半導体製造装置並びに半導体製造装置におけるウエハ真空チャック装置及びガスクリーニング方法及び窒化膜形成方法 |
US5350479A (en) * | 1992-12-02 | 1994-09-27 | Applied Materials, Inc. | Electrostatic chuck for high power plasma processing |
KR100238629B1 (ko) * | 1992-12-17 | 2000-01-15 | 히가시 데쓰로 | 정전척을 가지는 재치대 및 이것을 이용한 플라즈마 처리장치 |
DE69432383D1 (de) * | 1993-05-27 | 2003-05-08 | Applied Materials Inc | Verbesserungen betreffend Substrathalter geeignet für den Gebrauch in Vorrichtungen für die chemische Abscheidung aus der Dampfphase |
US5584746A (en) * | 1993-10-18 | 1996-12-17 | Shin-Etsu Handotai Co., Ltd. | Method of polishing semiconductor wafers and apparatus therefor |
EP0692156A1 (en) * | 1994-01-31 | 1996-01-17 | Applied Materials, Inc. | Electrostatic chuck with conformal insulator film |
EP0669644B1 (en) * | 1994-02-28 | 1997-08-20 | Applied Materials, Inc. | Electrostatic chuck |
US5535090A (en) * | 1994-03-03 | 1996-07-09 | Sherman; Arthur | Electrostatic chuck |
JPH07263529A (ja) * | 1994-03-18 | 1995-10-13 | Hitachi Ltd | 静電吸着装置 |
US5979475A (en) * | 1994-04-28 | 1999-11-09 | Hitachi, Ltd. | Specimen holding method and fluid treatment method of specimen surface and systems therefor |
US5646814A (en) * | 1994-07-15 | 1997-07-08 | Applied Materials, Inc. | Multi-electrode electrostatic chuck |
JP3553204B2 (ja) * | 1995-04-28 | 2004-08-11 | アネルバ株式会社 | Cvd装置 |
US5522975A (en) * | 1995-05-16 | 1996-06-04 | International Business Machines Corporation | Electroplating workpiece fixture |
US5572786A (en) * | 1995-09-11 | 1996-11-12 | Aluminum Company Of America | Method for holding a workpiece by vacuum |
JP3650248B2 (ja) * | 1997-03-19 | 2005-05-18 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US6111634A (en) * | 1997-05-28 | 2000-08-29 | Lam Research Corporation | Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing |
US6108091A (en) * | 1997-05-28 | 2000-08-22 | Lam Research Corporation | Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing |
SG87916A1 (en) * | 1997-12-26 | 2002-04-16 | Canon Kk | Sample separating apparatus and method, and substrate manufacturing method |
JPH11264991A (ja) * | 1998-01-13 | 1999-09-28 | Matsushita Electric Ind Co Ltd | 液晶表示素子の製造方法 |
JP4082770B2 (ja) * | 1998-02-02 | 2008-04-30 | 富士機械製造株式会社 | 電気部品搬送装置ならびにそれにおける保持具交換方法および装置 |
JP4296587B2 (ja) * | 1998-02-09 | 2009-07-15 | 株式会社ニコン | 基板支持装置、基板搬送装置及びその方法、基板保持方法、並びに露光装置及びその製造方法 |
US6032997A (en) * | 1998-04-16 | 2000-03-07 | Excimer Laser Systems | Vacuum chuck |
WO1999064209A1 (fr) * | 1998-06-08 | 1999-12-16 | Kuraitekku Co., Ltd. | Coupelle de retenue et d'aspiration pour matiere lamellaire |
JP3929175B2 (ja) * | 1998-06-27 | 2007-06-13 | 株式会社安川電機 | 静電吸着装置 |
JP2000021963A (ja) * | 1998-07-06 | 2000-01-21 | Nippon Steel Corp | 静電吸着装置 |
US6190732B1 (en) * | 1998-09-03 | 2001-02-20 | Cvc Products, Inc. | Method and system for dispensing process gas for fabricating a device on a substrate |
US6572814B2 (en) * | 1998-09-08 | 2003-06-03 | Applied Materials Inc. | Method of fabricating a semiconductor wafer support chuck apparatus having small diameter gas distribution ports for distributing a heat transfer gas |
US6358129B2 (en) * | 1998-11-11 | 2002-03-19 | Micron Technology, Inc. | Backing members and planarizing machines for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods of making and using such backing members |
JP3623122B2 (ja) * | 1999-02-12 | 2005-02-23 | 信越半導体株式会社 | 研磨用ワーク保持盤およびワークの研磨装置ならびにワークの研磨方法 |
KR100686613B1 (ko) * | 1999-02-25 | 2007-02-27 | 카부시키가이샤 타이헤이세이사쿠쇼 | 베니어시트권취롤로의 테이프급송장치 |
US6271676B1 (en) * | 1999-03-02 | 2001-08-07 | Tsk America, Inc. | Spiral chuck |
WO2000064790A1 (en) * | 1999-04-27 | 2000-11-02 | Univeyor A/S | Apparatus for handling layers of palletised goods |
JP2001222017A (ja) * | 1999-05-24 | 2001-08-17 | Fujitsu Ltd | 液晶表示装置及びその製造方法 |
US6873087B1 (en) * | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
JP3228923B2 (ja) * | 2000-01-18 | 2001-11-12 | イビデン株式会社 | 半導体製造・検査装置用セラミックヒータ |
DE10008111A1 (de) * | 2000-02-22 | 2001-08-23 | Krauss Maffei Kunststofftech | Vorrichtung zum Vakuumpressen von DVD-Substraten |
JP2001253777A (ja) * | 2000-03-13 | 2001-09-18 | Ibiden Co Ltd | セラミック基板 |
EP2085181A1 (en) * | 2000-07-31 | 2009-08-05 | Ebara Corporation | Substrate holding apparatus and substrate polishing apparatus |
US6527625B1 (en) * | 2000-08-31 | 2003-03-04 | Multi-Planar Technologies, Inc. | Chemical mechanical polishing apparatus and method having a soft backed polishing head |
US7520800B2 (en) * | 2003-04-16 | 2009-04-21 | Duescher Wayne O | Raised island abrasive, lapping apparatus and method of use |
JP3742000B2 (ja) * | 2000-11-30 | 2006-02-01 | 富士通株式会社 | プレス装置 |
DE10104510B4 (de) * | 2001-01-31 | 2005-06-23 | Neuhäuser GmbH | Vorrichtung zum Transport von Werkstücken |
US6939206B2 (en) * | 2001-03-12 | 2005-09-06 | Asm Nutool, Inc. | Method and apparatus of sealing wafer backside for full-face electrochemical plating |
US6855037B2 (en) * | 2001-03-12 | 2005-02-15 | Asm-Nutool, Inc. | Method of sealing wafer backside for full-face electrochemical plating |
US6611417B2 (en) * | 2001-03-22 | 2003-08-26 | Winbond Electronics Corporation | Wafer chuck system |
JP2003037088A (ja) | 2001-07-25 | 2003-02-07 | Nec Kansai Ltd | Cmp装置 |
JP4224959B2 (ja) | 2001-08-21 | 2009-02-18 | 株式会社日立プラントテクノロジー | 液晶基板の組立装置 |
JP4846943B2 (ja) * | 2001-09-06 | 2011-12-28 | 東京エレクトロン株式会社 | ウエハ搬送具及びウエハ搬送システム |
JP3953767B2 (ja) * | 2001-10-01 | 2007-08-08 | シャープ株式会社 | 液晶表示装置の製造方法及び製造装置 |
JP2003158173A (ja) * | 2001-11-20 | 2003-05-30 | Oki Electric Ind Co Ltd | ウェハホルダ |
KR100778848B1 (ko) * | 2002-03-22 | 2007-11-22 | 엘지.필립스 엘시디 주식회사 | 합착기 |
KR100469354B1 (ko) * | 2002-02-06 | 2005-02-02 | 엘지.필립스 엘시디 주식회사 | 액정 표시 장치의 제조 방법 |
TW200303593A (en) * | 2002-02-19 | 2003-09-01 | Olympus Optical Co | Substrate sucking apparatus |
KR100469359B1 (ko) * | 2002-02-20 | 2005-02-02 | 엘지.필립스 엘시디 주식회사 | 액정표시소자용 합착 장치 |
KR100469360B1 (ko) * | 2002-02-22 | 2005-02-02 | 엘지.필립스 엘시디 주식회사 | 액정표시소자의 제조 장비용 진공 합착 장치 및 구동 방법 |
US6784970B2 (en) * | 2002-02-27 | 2004-08-31 | Lg.Philips Lcd Co., Ltd. | Method of fabricating LCD |
US7102726B2 (en) * | 2002-03-15 | 2006-09-05 | Lg. Philips Lcd Co., Ltd. | System for fabricating liquid crystal display and method of fabricating liquid crystal display using the same |
US7040525B2 (en) * | 2002-03-20 | 2006-05-09 | Lg.Philips Lcd Co., Ltd. | Stage structure in bonding machine and method for controlling the same |
KR100480819B1 (ko) * | 2002-03-20 | 2005-04-06 | 엘지.필립스 엘시디 주식회사 | 합착기 챔버의 크리닝 방법 |
US6793756B2 (en) * | 2002-03-22 | 2004-09-21 | Lg. Phillips Lcd Co., Ltd. | Substrate bonding apparatus for liquid crystal display device and method for driving the same |
KR100685923B1 (ko) * | 2002-03-25 | 2007-02-23 | 엘지.필립스 엘시디 주식회사 | 합착 장치 및 이를 이용한 액정표시장치의 제조 방법 |
TWI314656B (ja) * | 2002-05-23 | 2009-09-11 | Hannstar Display Corp | |
US7295279B2 (en) * | 2002-06-28 | 2007-11-13 | Lg.Philips Lcd Co., Ltd. | System and method for manufacturing liquid crystal display devices |
JP2004061846A (ja) * | 2002-07-29 | 2004-02-26 | Nec Kagoshima Ltd | 液晶表示パネルの製造方法および液晶表示パネル |
KR100720447B1 (ko) * | 2002-11-16 | 2007-05-22 | 엘지.필립스 엘시디 주식회사 | 액정표시소자용 기판 합착 장치 |
US7275577B2 (en) * | 2002-11-16 | 2007-10-02 | Lg.Philips Lcd Co., Ltd. | Substrate bonding machine for liquid crystal display device |
KR100662497B1 (ko) | 2002-11-18 | 2007-01-02 | 엘지.필립스 엘시디 주식회사 | 액정표시소자 제조 공정용 기판 합착 장치 |
US7494560B2 (en) * | 2002-11-27 | 2009-02-24 | International Business Machines Corporation | Non-plasma reaction apparatus and method |
DE10259836A1 (de) * | 2002-12-19 | 2004-07-15 | Siemens Ag | Greifer und Betriebsverfahren |
JP4448297B2 (ja) * | 2002-12-27 | 2010-04-07 | 株式会社荏原製作所 | 基板研磨装置及び基板研磨方法 |
US7105056B2 (en) * | 2002-12-30 | 2006-09-12 | Cardinal Cg Company | Pneumatic handling and recoating apparatus and method of use |
US20040212205A1 (en) * | 2003-01-30 | 2004-10-28 | Linker Frank V. | Method and apparatus for handling semiconductor wafers and interleafs |
US6892769B2 (en) * | 2003-06-30 | 2005-05-17 | Lg.Philips Lcd Co., Ltd. | Substrate bonding apparatus for liquid crystal display device panel |
JP2005123292A (ja) * | 2003-10-15 | 2005-05-12 | Canon Inc | 収納装置、当該収納装置を用いた露光方法 |
US7199994B1 (en) * | 2004-01-12 | 2007-04-03 | Advanced Micro Devices Inc. | Method and system for flattening a reticle within a lithography system |
CN100376945C (zh) | 2004-06-11 | 2008-03-26 | 鸿富锦精密工业(深圳)有限公司 | 基板贴合装置和基板贴合制程 |
KR100615100B1 (ko) * | 2005-08-16 | 2006-08-22 | 삼성전자주식회사 | 연마 패드 클리너 및 이를 갖는 화학기계적 연마 장치 |
-
2005
- 2005-12-29 KR KR1020050133121A patent/KR100898793B1/ko active IP Right Grant
-
2006
- 2006-05-10 GB GB0609307A patent/GB2433819B/en active Active
- 2006-05-16 TW TW095117278A patent/TWI346226B/zh active
- 2006-05-29 DE DE102006024946A patent/DE102006024946B4/de active Active
- 2006-05-30 FR FR0604789A patent/FR2895693B1/fr active Active
- 2006-06-22 JP JP2006172221A patent/JP4589270B2/ja active Active
- 2006-06-26 CN CNB2006100926034A patent/CN100474079C/zh active Active
- 2006-06-30 US US11/478,378 patent/US7839477B2/en active Active
Patent Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0634983A (ja) * | 1992-07-17 | 1994-02-10 | Sharp Corp | 貼合わせ装置 |
JPH08220548A (ja) * | 1995-02-14 | 1996-08-30 | Ushio Inc | 液晶パネルの貼り合わせ方法および装置 |
JP2001525616A (ja) * | 1997-12-01 | 2001-12-11 | アプライド マテリアルズ インコーポレイテッド | 基板を迅速に解除できる静電チャック |
JP2005202431A (ja) * | 2000-11-30 | 2005-07-28 | Fujitsu Ltd | 貼合せ基板製造システム |
JP2003233080A (ja) * | 2002-02-05 | 2003-08-22 | Lg Phillips Lcd Co Ltd | 合着装置及びこれを用いた液晶表示装置の製造方法 |
JP2003233053A (ja) * | 2002-02-06 | 2003-08-22 | Lg Phillips Lcd Co Ltd | 液晶表示素子用貼り合わせ装置 |
JP2005258468A (ja) * | 2002-03-19 | 2005-09-22 | Fujitsu Ltd | 貼合せ基板製造装置 |
JP2005326873A (ja) * | 2002-07-19 | 2005-11-24 | Hitachi Industries Co Ltd | 基板組立装置 |
JP2004170975A (ja) * | 2002-11-15 | 2004-06-17 | Lg Phillips Lcd Co Ltd | 液晶表示素子製造装置及びこれを利用した製造方法 |
JP2004170974A (ja) * | 2002-11-16 | 2004-06-17 | Lg Phillips Lcd Co Ltd | 液晶表示素子製造工程用基板貼り合せ装置 |
JP2004212444A (ja) * | 2002-12-27 | 2004-07-29 | Internatl Business Mach Corp <Ibm> | 液晶表示装置の製造方法及び貼り合わせ装置 |
JP2005258325A (ja) * | 2004-03-15 | 2005-09-22 | Fujitsu Ltd | 貼合せ基板製造装置及び貼合せ基板製造方法 |
WO2005098522A1 (ja) * | 2004-04-09 | 2005-10-20 | Shin-Etsu Engineering Co., Ltd. | 粘着チャック装置 |
JP2006201330A (ja) * | 2005-01-19 | 2006-08-03 | Fujitsu Ltd | 貼合せ基板製造装置及び貼合せ基板製造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE102006024946A1 (de) | 2007-07-12 |
GB0609307D0 (en) | 2006-06-21 |
GB2433819B (en) | 2008-05-21 |
CN100474079C (zh) | 2009-04-01 |
FR2895693B1 (fr) | 2010-09-17 |
TWI346226B (en) | 2011-08-01 |
KR100898793B1 (ko) | 2009-05-20 |
GB2433819A (en) | 2007-07-04 |
FR2895693A1 (fr) | 2007-07-06 |
JP2007183543A (ja) | 2007-07-19 |
TW200725053A (en) | 2007-07-01 |
CN1991528A (zh) | 2007-07-04 |
US7839477B2 (en) | 2010-11-23 |
KR20070070500A (ko) | 2007-07-04 |
DE102006024946B4 (de) | 2011-05-19 |
US20070151673A1 (en) | 2007-07-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4199647B2 (ja) | 液晶表示素子製造装置及びこれを利用した製造方法 | |
JP4098705B2 (ja) | 液晶表示素子製造工程用基板貼り合せ装置 | |
US7163033B2 (en) | Substrate bonding apparatus for liquid crystal display device panel | |
JP4589270B2 (ja) | 液晶表示素子用基板合着装置 | |
KR100720447B1 (ko) | 액정표시소자용 기판 합착 장치 | |
JP2004310023A (ja) | 液晶表示素子用基板貼り合せ装置 | |
KR100720423B1 (ko) | 액정표시소자용 기판 합착 장치 및 이를 이용한 평탄도보정 방법 | |
KR20070056316A (ko) | 기판 흡착용 정전척과 이를 이용한 액정표시소자용 기판합착 장치와 기판 합착 방법 | |
KR100589234B1 (ko) | 평판표시소자 제조를 위한 기판 처리 장치 | |
KR101308429B1 (ko) | 액정 표시장치의 제조장치 및 제조방법 | |
JP2010126342A (ja) | 基板チャック及びこれを有する基板合着装置 | |
KR100904260B1 (ko) | 합착기의 스테이지 및 정전척 제어 장치 및 제어 방법 | |
KR100698054B1 (ko) | 액정표시소자의 합착 장치 | |
KR100720448B1 (ko) | 액정표시소자 제조 공정용 기판 합착 장치 및 그 제어방법 | |
KR101358952B1 (ko) | 평판 표시패널의 합착장치 | |
KR100617034B1 (ko) | 액정표시소자 제조용 합착 장치와 이를 이용한 로딩 방법 | |
JP4954968B2 (ja) | 粘着チャック及びこれを有する基板合着装置 | |
KR100731047B1 (ko) | 액정 표시 패널 제조용 기판 합착 장치 | |
KR101048696B1 (ko) | 액정표시소자 제조용 합착 장치 및 제어 방법 | |
KR100995635B1 (ko) | 액정표시소자 제조용 합착 장치 | |
KR20090093554A (ko) | 기판합착장치 및 기판합착방법 | |
JP2010145533A (ja) | 基板合着装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090819 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20091119 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20091125 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091221 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100329 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20100629 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20100702 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100729 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100816 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100909 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 4589270 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130917 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |