JP4482322B2 - 微粒子の製造方法、及び製造装置 - Google Patents
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Description
本実施例においては、微粒子化対象となる原料粒子5の物質として、顔料であるVOPc(オキソバナジウムフタロシアニン)の微粒子化を試みた。VOPcは、水に対して極めて不溶性に近い顔料であり、微粒子化すると水中で高い凝集性を示す。まず、粒径10〜70μmのVOPcの原料粒子を濃度1mg/mlの高濃度懸濁状態で処理チャンバ3である石英角セルに3ml入れたサンプルを6つ作製した。石英角セルとしては、10mm×10mm×40mmのものを用い、その底面に直径φ16mm、厚さ3mmのピエゾ振動子を超音波振動子21(図3参照)として取り付けた。
本実施例においては、実施例1と同様に、微粒子化対象となる原料粒子5の物質として、顔料であるVOPcの微粒子化を試みた。ただし、ここでは、界面活性剤(上記した P-40)を0.1mMの濃度で添加し、微粒子の凝集性を若干抑えた条件とした。また、このように界面活性剤を添加した場合、その凝集性の低さにより共鳴振動ではない超音波照射でも充分に凝集微粒子の再分散が可能である。このため、本実施例では超音波共鳴処理を行わないこととし、サンプルに対し、それぞれ(1)原料粒子自体、(2)超音波処理のみ実施、(3)光破砕処理のみ実施、(4)超音波処理及び光破砕処理を同時に実施、及び(5)高濃度の界面活性剤(10mM)を添加して光破砕処理を実施(比較例)、の5つの異なる条件で処理を行った。なお、超音波処理、及び光破砕処理の条件については、実施例1と同様である。
本実施例においては、微粒子化対象となる原料粒子5の物質として、難溶性の薬物である酪酸クロベタゾン(Clobetasone Butyrate、外用合成副腎皮質ホルモン剤)の微粒子化を試みた。まず、水3mlに対して酪酸クロベタゾンを濃度0.5mg/mlで懸濁し、さらに、界面活性剤(Tween80、分子量1310、臨界ミセル濃度0.012mM)を0.0054mMの濃度で添加してサンプルを調製した。使用した石英角セル等は実施例1と同様である。
Claims (12)
- 被処理液の溶媒中の物質を光破砕して、その物質の微粒子を製造する製造方法であって、
前記被処理液に対して所定波長のレーザ光を照射することによって、前記溶媒中にある前記物質を微粒子化すると同時に、微粒子同士の凝集を防止するための超音波を前記被処理液に照射するとともに、
前記物質の微粒子化に用いられる前記レーザ光の波長は、前記物質の電子遷移に起因する吸光帯よりも長い波長であることを特徴とする微粒子の製造方法。 - 前記被処理液への前記超音波の照射を、前記被処理液を収容する処理チャンバの共鳴振動を利用して行うことを特徴とする請求項1記載の製造方法。
- 前記被処理液を収容する処理チャンバの振動振幅をモニタし、そのモニタ結果に基づいて前記被処理液に照射する前記超音波の周波数を設定することを特徴とする請求項1または2記載の製造方法。
- 前記被処理液を冷却しつつ、前記レーザ光の照射、及び前記超音波の照射を行うことを特徴とする請求項1〜3のいずれか一項記載の製造方法。
- 前記被処理液に対し、分散剤を添加することを特徴とする請求項1〜4のいずれか一項記載の製造方法。
- 前記物質は、有機化合物であることを特徴とする請求項1〜5のいずれか一項記載の製造方法。
- 被処理液の溶媒中の物質を光破砕して、その物質の微粒子を製造する製造装置であって、
前記被処理液を収容する処理チャンバと、
前記処理チャンバ内に収容された前記被処理液に対して、前記溶媒中にある前記物質を微粒子化するための所定波長のレーザ光を照射するレーザ光源と、
前記被処理液に対して、微粒子同士の凝集を防止するための超音波を照射する超音波照射手段と、
前記レーザ光源による前記被処理液に対する前記レーザ光の照射、及び前記超音波照射手段による前記超音波の照射を同時に行うように制御する制御手段と
を備え、
前記レーザ光源から照射される前記レーザ光の波長は、前記物質の電子遷移に起因する吸光帯よりも長い波長であることを特徴とする微粒子の製造装置。 - 前記処理チャンバは、前記被処理液への前記超音波の照射を共鳴振動を利用して行うことが可能なチャンバであることを特徴とする請求項7記載の製造装置。
- 前記処理チャンバの振動振幅をモニタする振動振幅モニタ手段を備え、
前記制御手段は、前記振動振幅モニタ手段でのモニタ結果に基づいて前記被処理液に照射する前記超音波の周波数を設定することを特徴とする請求項7または8記載の製造装置。 - 前記被処理液を冷却しつつ、前記レーザ光の照射、及び前記超音波の照射を行うための冷却手段を備えることを特徴とする請求項7〜9のいずれか一項記載の製造装置。
- 前記被処理液に対し、分散剤を添加することを特徴とする請求項7〜10のいずれか一項記載の製造装置。
- 前記物質は、有機化合物であることを特徴とする請求項7〜11のいずれか一項記載の製造装置。
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JP2003421509A JP4482322B2 (ja) | 2003-12-18 | 2003-12-18 | 微粒子の製造方法、及び製造装置 |
US10/582,786 US7597277B2 (en) | 2003-12-18 | 2004-12-14 | Microparticles, microparticle production method, and microparticle production apparatus |
PCT/JP2004/018657 WO2005058480A2 (ja) | 2003-12-18 | 2004-12-14 | 微粒子、微粒子の製造方法、及び製造装置 |
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JP4482322B2 true JP4482322B2 (ja) | 2010-06-16 |
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