JP4402078B2 - ステージ装置 - Google Patents

ステージ装置 Download PDF

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Publication number
JP4402078B2
JP4402078B2 JP2006169422A JP2006169422A JP4402078B2 JP 4402078 B2 JP4402078 B2 JP 4402078B2 JP 2006169422 A JP2006169422 A JP 2006169422A JP 2006169422 A JP2006169422 A JP 2006169422A JP 4402078 B2 JP4402078 B2 JP 4402078B2
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JP
Japan
Prior art keywords
pair
stage
guide portions
supported
sliders
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006169422A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007331087A (ja
Inventor
真 原田
雄二 小林
達也 小原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Priority to JP2006169422A priority Critical patent/JP4402078B2/ja
Priority to TW096120547A priority patent/TW200818217A/zh
Priority to KR1020070059427A priority patent/KR100919391B1/ko
Priority to CNB2007101100524A priority patent/CN100521143C/zh
Publication of JP2007331087A publication Critical patent/JP2007331087A/ja
Application granted granted Critical
Publication of JP4402078B2 publication Critical patent/JP4402078B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Machine Tool Units (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2006169422A 2006-06-19 2006-06-19 ステージ装置 Expired - Fee Related JP4402078B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006169422A JP4402078B2 (ja) 2006-06-19 2006-06-19 ステージ装置
TW096120547A TW200818217A (en) 2006-06-19 2007-06-07 Stage apparatus
KR1020070059427A KR100919391B1 (ko) 2006-06-19 2007-06-18 스테이지장치
CNB2007101100524A CN100521143C (zh) 2006-06-19 2007-06-19 载台装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006169422A JP4402078B2 (ja) 2006-06-19 2006-06-19 ステージ装置

Publications (2)

Publication Number Publication Date
JP2007331087A JP2007331087A (ja) 2007-12-27
JP4402078B2 true JP4402078B2 (ja) 2010-01-20

Family

ID=38931053

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006169422A Expired - Fee Related JP4402078B2 (ja) 2006-06-19 2006-06-19 ステージ装置

Country Status (4)

Country Link
JP (1) JP4402078B2 (zh)
KR (1) KR100919391B1 (zh)
CN (1) CN100521143C (zh)
TW (1) TW200818217A (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101339914B (zh) * 2008-08-27 2010-06-16 中国科学院长春光学精密机械与物理研究所 二维电动位移平台
JP4964853B2 (ja) * 2008-09-24 2012-07-04 住友重機械工業株式会社 ステージ装置
KR102482124B1 (ko) * 2016-01-25 2022-12-27 한화정밀기계 주식회사 칩 부품 마운터의 오차 최소화 방법
TWI602261B (zh) * 2016-06-03 2017-10-11 Siacin International Co Ltd Platform level automatic calibration device
CN107580413A (zh) * 2016-07-05 2018-01-12 翔庆精密工业有限公司 平台水平自动校正装置
JP6771160B2 (ja) * 2018-08-21 2020-10-21 パナソニックIpマネジメント株式会社 搬送ステージとそれを使用したインクジェット装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3746730B2 (ja) * 2002-04-24 2006-02-15 株式会社目白プレシジョン ステージ装置
JP4443891B2 (ja) * 2003-10-23 2010-03-31 住友重機械工業株式会社 ステージ装置
JP2005331402A (ja) * 2004-05-20 2005-12-02 Sumitomo Heavy Ind Ltd ステージ装置

Also Published As

Publication number Publication date
CN101093813A (zh) 2007-12-26
CN100521143C (zh) 2009-07-29
KR100919391B1 (ko) 2009-09-29
JP2007331087A (ja) 2007-12-27
TW200818217A (en) 2008-04-16
TWI360133B (zh) 2012-03-11
KR20070120441A (ko) 2007-12-24

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