JP4213642B2 - Soldering flux, soldering method and printed circuit board - Google Patents
Soldering flux, soldering method and printed circuit board Download PDFInfo
- Publication number
- JP4213642B2 JP4213642B2 JP2004236407A JP2004236407A JP4213642B2 JP 4213642 B2 JP4213642 B2 JP 4213642B2 JP 2004236407 A JP2004236407 A JP 2004236407A JP 2004236407 A JP2004236407 A JP 2004236407A JP 4213642 B2 JP4213642 B2 JP 4213642B2
- Authority
- JP
- Japan
- Prior art keywords
- organic acid
- soldering
- metal salt
- flux
- soldering flux
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000004907 flux Effects 0.000 title claims description 73
- 238000005476 soldering Methods 0.000 title claims description 43
- 238000000034 method Methods 0.000 title claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 60
- 239000002184 metal Substances 0.000 claims description 57
- 229910052751 metal Inorganic materials 0.000 claims description 57
- 150000007524 organic acids Chemical class 0.000 claims description 49
- 229910000679 solder Inorganic materials 0.000 claims description 47
- 150000003839 salts Chemical class 0.000 claims description 44
- 229910052759 nickel Inorganic materials 0.000 claims description 30
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 claims description 27
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 claims description 26
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 claims description 26
- 239000012190 activator Substances 0.000 claims description 25
- 238000007747 plating Methods 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 22
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 17
- 239000011347 resin Substances 0.000 claims description 17
- 229920005989 resin Polymers 0.000 claims description 17
- 229910052802 copper Inorganic materials 0.000 claims description 16
- 239000010949 copper Substances 0.000 claims description 16
- 229910045601 alloy Inorganic materials 0.000 claims description 10
- 239000000956 alloy Substances 0.000 claims description 10
- 229920000178 Acrylic resin Polymers 0.000 claims description 6
- 239000004925 Acrylic resin Substances 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
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- 229910052797 bismuth Inorganic materials 0.000 claims description 5
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
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- -1 phosphorus compound Chemical class 0.000 description 5
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- JXSRRBVHLUJJFC-UHFFFAOYSA-N 7-amino-2-methylsulfanyl-[1,2,4]triazolo[1,5-a]pyrimidine-6-carbonitrile Chemical compound N1=CC(C#N)=C(N)N2N=C(SC)N=C21 JXSRRBVHLUJJFC-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 235000021355 Stearic acid Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
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- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 3
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- RSWGJHLUYNHPMX-ONCXSQPRSA-N abietic acid Chemical compound C([C@@H]12)CC(C(C)C)=CC1=CC[C@@H]1[C@]2(C)CCC[C@@]1(C)C(O)=O RSWGJHLUYNHPMX-ONCXSQPRSA-N 0.000 description 2
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- 125000000896 monocarboxylic acid group Chemical group 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
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- MHVJRKBZMUDEEV-APQLOABGSA-N (+)-Pimaric acid Chemical compound [C@H]1([C@](CCC2)(C)C(O)=O)[C@@]2(C)[C@H]2CC[C@](C=C)(C)C=C2CC1 MHVJRKBZMUDEEV-APQLOABGSA-N 0.000 description 1
- MHVJRKBZMUDEEV-UHFFFAOYSA-N (-)-ent-pimara-8(14),15-dien-19-oic acid Natural products C1CCC(C(O)=O)(C)C2C1(C)C1CCC(C=C)(C)C=C1CC2 MHVJRKBZMUDEEV-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical class [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 1
- BTXXTMOWISPQSJ-UHFFFAOYSA-N 4,4,4-trifluorobutan-2-one Chemical compound CC(=O)CC(F)(F)F BTXXTMOWISPQSJ-UHFFFAOYSA-N 0.000 description 1
- BQACOLQNOUYJCE-FYZZASKESA-N Abietic acid Natural products CC(C)C1=CC2=CC[C@]3(C)[C@](C)(CCC[C@@]3(C)C(=O)O)[C@H]2CC1 BQACOLQNOUYJCE-FYZZASKESA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 239000001293 FEMA 3089 Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910020816 Sn Pb Inorganic materials 0.000 description 1
- 229910020922 Sn-Pb Inorganic materials 0.000 description 1
- 229910008783 Sn—Pb Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
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- 239000004480 active ingredient Substances 0.000 description 1
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- 229920000180 alkyd Polymers 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229940121375 antifungal agent Drugs 0.000 description 1
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- 230000003078 antioxidant effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
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- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 1
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- 239000011135 tin Substances 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/02—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
- B23K35/0222—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape for use in soldering, brazing
- B23K35/0244—Powders, particles or spheres; Preforms made therefrom
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/42—Printed circuits
Description
本発明は、各種の電子部品をプリント基板上にはんだ付けする際に使用するはんだ付け用フラックスに関し、特に無電解ニッケルメッキが施されているプリント基板の銅ランド上にはんだ付けする際に使用するフラックス、はんだ付け方法およびプリント基板に関するものである。 The present invention relates to a soldering flux used when soldering various electronic components onto a printed circuit board, and particularly used when soldering onto a copper land of a printed circuit board on which electroless nickel plating is applied. The present invention relates to a flux, a soldering method, and a printed circuit board.
従来、電子部品をプリント基板上にはんだ付けする場合、プリント基板に形成された銅のランドに、錫−鉛合金はんだや無鉛はんだを使用してはんだ付けを行なう。前記ランドの表面には、銅の酸化を防止するためにニッケルの無電解メッキが施されることが多い。 Conventionally, when an electronic component is soldered on a printed circuit board, the copper land formed on the printed circuit board is soldered using tin-lead alloy solder or lead-free solder. The surface of the land is often subjected to electroless plating of nickel in order to prevent copper oxidation.
しかし、前記ランドに無電解ニッケルメッキを施す場合には、還元剤として次亜リン酸塩が使用されるため、ニッケルのメッキ層中に微量のリン化合物が残存する。 However, when electroless nickel plating is applied to the land, since a hypophosphite is used as a reducing agent, a trace amount of phosphorus compound remains in the nickel plating layer.
そのため、無電解ニッケルメッキの表面にはんだ合金を使用してはんだ付けする際に、ニッケルメッキ中のニッケルが熔融したはんだ合金中に拡散し、ニッケルメッキ層とはんだ合金との境界に局部的にリンが偏析し、極端に濃化された部分が生じ、接合強度が低下してはんだ付けが剥がれることがあった。 Therefore, when soldering the surface of electroless nickel plating using a solder alloy, the nickel in the nickel plating diffuses into the molten solder alloy and locally binds to the boundary between the nickel plating layer and the solder alloy. Segregated, resulting in an extremely concentrated portion, resulting in a decrease in joint strength and peeling of soldering.
そこで、本発明者らは、先に、無電解ニッケルメッキを施した基板にはんだ付けを行う際に使用するフラックス中に0.1〜20重量%の金属塩を含有させることを提案した(特許文献1)。すなわち、フラックスに金属塩を含有させることにより、金属塩中の金属がニッケルと置換することによって析出し、これによってニッケルとはんだ合金中の金属との反応が抑制され、ランド表面のニッケルがはんだ合金中に拡散するのが抑制される。このため、ランドとはんだの境界においてリンが濃化するのが防止され、はんだの接合強度を向上させることができる。 Therefore, the present inventors have previously proposed that a metal salt of 0.1 to 20% by weight is contained in a flux used when soldering a substrate subjected to electroless nickel plating (patent) Reference 1). That is, by including a metal salt in the flux, the metal in the metal salt is precipitated by substitution with nickel, thereby suppressing the reaction between the nickel and the metal in the solder alloy, and the nickel on the land surface becomes the solder alloy. Diffusion inside is suppressed. For this reason, it is possible to prevent phosphorus from being concentrated at the boundary between the land and the solder, and to improve the bonding strength of the solder.
ところが、上記のように所定量の金属塩を含有したフラックスを長期間保存した場合、製造直後のフラックスと比較して、はんだの接合強度やランド間の絶縁抵抗が大きく低下するなどの問題が生じる。ランド間の絶縁抵抗が低下すると、例えばランド間でショートが起こりやすくなり、はんだ付けおよびプリント基板の信頼性を損なわせることになる。このため、金属塩を含有したフラックスの保存安定性を高めることが要望されていた。
本発明はかかる事情に鑑みなされたものであって、フラックスの保存安定性を高めたはんだ付け用フラックス、これを用いるはんだ付け方法およびプリント基板を提供することを目的とする。 This invention is made | formed in view of this situation, Comprising: It aims at providing the soldering flux which improved the storage stability of the flux, the soldering method using this, and a printed circuit board.
本発明者らは、金属塩を含有したフラックスが有する上記課題を解決すべく鋭意検討を重ねた結果、フラックスを長期間保存した場合、製造直後のフラックスと比較して、はんだの接合強度やランド間の絶縁抵抗が低下するのは、活性剤として添加されている無機酸(通常、アミン塩酸塩の形態で添加される塩酸)によってフラックス中の有機酸金属塩が分解するためであるという知見を得た。絶縁抵抗の低下は、例えば、ランドを有する基板にフラックスをベタ状に印刷し、ついで前記ランド上にはんだボールを載置しリフローさせて、はんだボールをランドに接合するはんだ付け方法において発生しやすい。これは、上記金属塩の分解によって金属が析出してランド間に薄い金属膜を形成し、その金属膜は洗浄により除去されないためと推測される。また、金属塩の一部が分解することにより、金属塩添加による接合強度の改質効果が不十分となるため、接合強度も低下するものと考えられる。 As a result of intensive studies to solve the above-mentioned problems of the flux containing the metal salt, the present inventors have found that when the flux is stored for a long period of time, the solder joint strength and The fact that the insulation resistance decreases during the process is due to the decomposition of the organic acid metal salt in the flux by the inorganic acid added as the activator (usually hydrochloric acid added in the form of amine hydrochloride). Obtained. A decrease in insulation resistance is likely to occur, for example, in a soldering method in which a flux is printed in a solid pattern on a substrate having lands, and then solder balls are placed on the lands and reflowed to join the solder balls to the lands. . This is presumably because the metal is deposited by the decomposition of the metal salt to form a thin metal film between the lands, and the metal film is not removed by washing. In addition, it is considered that the bonding strength is also lowered because a part of the metal salt is decomposed and the effect of improving the bonding strength by adding the metal salt becomes insufficient.
本発明は、このような知見に基づき完成されたものである。すなわち、本発明のはんだ付け用フラックスは、皮膜形成能を有する樹脂と活性剤と溶剤とを含有し、無電解ニッケルメッキを施した基板にはんだ付けを行う際に使用するものであって、フラックス総量に対して0.1〜20重量%の有機酸金属塩を含有し、かつ前記活性剤が前記有機酸金属塩を構成する有機酸と同じ有機酸であるか、それよりも酸性度が低い有機酸であることを特徴とする。 The present invention has been completed based on such findings. That is, the soldering flux of the present invention contains a resin having a film forming ability, an activator, and a solvent, and is used when soldering to an electroless nickel-plated substrate. The organic acid metal salt is contained in an amount of 0.1 to 20% by weight based on the total amount, and the activator is the same organic acid as the organic acid constituting the organic acid metal salt or has a lower acidity than that. It is an organic acid.
このように、本発明によれば、フラックス中に添加される活性剤が前記有機酸金属塩を構成する有機酸と同じ有機酸であるか、それよりも酸性度が低い有機酸であるので、フラックスを長期間保存した場合でも、有機酸金属塩が分解されるのを防止することができ、該金属塩の安定性が向上する。 Thus, according to the present invention, the activator added in the flux is the same organic acid as the organic acid constituting the organic acid metal salt or an organic acid having a lower acidity than that, Even when the flux is stored for a long time, the organic acid metal salt can be prevented from being decomposed, and the stability of the metal salt is improved.
本発明のはんだ付け用フラックスは、さらに、以下の(1)〜(6)のいずれかの構成を有するのが好ましい。
(1)前記有機酸金属塩が、金、銀、銅、鉛、亜鉛、ビスマス、インジウム、アンチモンおよびニッケルから選ばれる金属塩であるのがよく、特に有機酸の銅塩であるのがよい。
(2)前記有機酸金属塩は、カルボキシル基を除く炭化水素基の炭素数が7〜21である飽和脂肪酸の金属塩であるのがよく、特に当該飽和脂肪酸の銅塩であるのがよい。
(3)前記皮膜形成能を有する樹脂はロジンまたはアクリル樹脂である。
(4)前記活性剤がロジンである。
(5)前記皮膜形成能を有する樹脂がロジンであり、かつこのロジンが前記活性剤を兼ねる。
(6)ハロゲン化合物を含有しない。
The soldering flux of the present invention preferably further has one of the following configurations (1) to (6).
(1) The organic acid metal salt may be a metal salt selected from gold, silver, copper, lead, zinc, bismuth, indium, antimony and nickel, and particularly preferably a copper salt of an organic acid.
(2) The organic acid metal salt is preferably a metal salt of a saturated fatty acid having 7 to 21 carbon atoms in the hydrocarbon group excluding the carboxyl group, and particularly preferably a copper salt of the saturated fatty acid.
(3) The resin having the film forming ability is rosin or acrylic resin.
(4) The active agent is rosin.
(5) The resin having the film forming ability is rosin, and this rosin also serves as the activator.
(6) Does not contain halogen compounds.
本発明に係る第1のはんだ付け方法は、表面に無電解ニッケルメッキが施された銅のランドを有する基板に、上記のはんだ付け用フラックスを印刷し、ついで前記ランド上にはんだボールを載置し、加熱してはんだボールをリフローさせて、はんだボールをランドに接合することを特徴とする。使用するはんだボールは、環境への影響の観点から鉛フリーであるのが好ましい。 In a first soldering method according to the present invention, the above soldering flux is printed on a substrate having a copper land having electroless nickel plating on the surface, and then a solder ball is placed on the land. And the solder balls are reflowed by heating to join the solder balls to the lands. The solder balls used are preferably lead-free from the viewpoint of environmental impact.
本発明に係る第2のはんだ付け方法は、表面に無電解ニッケルメッキが施された銅のランドを有する基板に、上記のはんだ付け用フラックスとはんだ粉末とを混合したペーストを印刷し、ついで加熱してペーストをリフローさせて、ランド上にはんだ合金を形成することを特徴とする。 According to the second soldering method of the present invention, a paste having the above soldering flux and solder powder mixed is printed on a substrate having a copper land having an electroless nickel plated surface, and then heated. Then, the paste is reflowed to form a solder alloy on the land.
本発明は、これらのはんだ付け方法によってはんだが接合されたプリント基板をも提供するものである。
なお、基板に無電解ニッケルメッキを施した後、さらにその上にはんだ濡れ性向上を考慮して金など他の金属メッキを施した基板も一般に使用されている。本発明において「無電解ニッケルメッキを施した基板」とは、ニッケルメッキ上にさらに金など他の金属メッキを施した基板も含む概念である。
The present invention also provides a printed circuit board to which solder is joined by these soldering methods.
In general, a substrate is also used in which after the electroless nickel plating is applied to the substrate, another metal plating such as gold is applied on the substrate in consideration of improvement of solder wettability. In the present invention, the “substrate with electroless nickel plating” is a concept including a substrate on which nickel plating and further metal plating such as gold are further applied.
本発明によれば、フラックスを長期間保存した場合でも、活性剤として特定の有機酸を使用しているので、フラックス中の有機酸金属塩の安定性が向上する。このため、無電解ニッケルメッキを施した基板のはんだ付け部分において、ニッケルがはんだへ拡散するのが有機酸金属塩により抑制されてリンの濃化が防止される結果、はんだ付けの接合強度が低下するのを抑制することができる。また、長期保存中に金属塩が分解して金属が析出するのを抑制できるため、ランド間の絶縁抵抗が大きく低下するのを防止することができる。さらに、本発明のフラックスを用いても、はんだ付け性が良好であって、本発明を適用したことによるはんだ付け性の低下は見られない。
また、本発明のフラックスは、塩酸などのハロゲン化合物を含有しないので、有機酸金属塩の安定性を高めることができる。
According to the present invention, even when the flux is stored for a long period of time, since the specific organic acid is used as the activator, the stability of the organic acid metal salt in the flux is improved. For this reason, the diffusion of nickel into the solder is suppressed by the organic acid metal salt in the soldered portion of the substrate subjected to electroless nickel plating, thereby preventing the concentration of phosphorus, resulting in a decrease in the soldering joint strength. Can be suppressed. Moreover, since it can suppress that a metal salt decomposes | disassembles and a metal precipitates during a long-term storage, it can prevent that the insulation resistance between lands falls significantly. Furthermore, even when the flux of the present invention is used, the solderability is good, and no decrease in solderability due to the application of the present invention is observed.
Moreover, since the flux of the present invention does not contain a halogen compound such as hydrochloric acid, the stability of the organic acid metal salt can be improved.
本発明のはんだ付け用フラックスは、皮膜形成能を有する樹脂と活性剤と有機酸金属塩と溶剤とを含有する。皮膜形成能を有する樹脂としては、例えばロジンまたは熱可塑性アクリル樹脂が挙げられる。 The soldering flux of the present invention contains a resin having a film forming ability, an activator, an organic acid metal salt, and a solvent. Examples of the resin having a film forming ability include rosin and a thermoplastic acrylic resin.
アクリル樹脂としては、分子量が10000以下、好ましくは3000〜8000であるのがよい。分子量が10000を超えると、耐亀裂性や耐剥離性が低下するおそれがある。また、活性作用を助長するために、酸価は50以上のものを使用するのが好ましく、はんだ付け時には軟化している必要があるため、軟化点は230℃以下であるのが好ましい。 The acrylic resin has a molecular weight of 10,000 or less, preferably 3000 to 8000. If the molecular weight exceeds 10,000, crack resistance and peel resistance may be reduced. Further, in order to promote the active action, it is preferable to use an acid value of 50 or more, and since it is necessary to soften during soldering, the softening point is preferably 230 ° C. or less.
そのため、アクリル樹脂は、重合性不飽和基を有するモノマー、例えば(メタ)アクリル酸、そのエステル(例えばメチル(メタ)アクリレートなど)、クロトン酸、イタコン酸、(無水)マレイン酸およびそのエステル、(メタ)アクリロニトリル、(メタ)アクリルアミド、塩化ビニル、酢酸ビニル等を使用し、過酸化物等の触媒を用いて、塊状重合法、液状重合法、懸濁重合法、乳化重合法等のラジカル重合により重合されたものを使用するのがよい。 Therefore, the acrylic resin is a monomer having a polymerizable unsaturated group, for example, (meth) acrylic acid, its ester (for example, methyl (meth) acrylate), crotonic acid, itaconic acid, (anhydrous) maleic acid and its ester, Using radical polymerization such as bulk polymerization, liquid polymerization, suspension polymerization, emulsion polymerization, etc., using a catalyst such as peroxide, using (meth) acrylonitrile, (meth) acrylamide, vinyl chloride, vinyl acetate, etc. It is preferable to use a polymerized one.
ロジンとしては、従来からフラックスに用いられているロジンおよびその誘導体を使用することができる。ロジンおよびその誘導体としては、通常のガム、トール、ウッドロジンが用いられ、その誘導体として熱処理した樹脂、重合ロジン、水素添加ロジン、ホルミル化ロジン、ロジンエステル、ロジン変性マレイン酸樹脂、ロジン変性フェノール樹脂、ロジン変性アルキド樹脂等が挙げられる。 As rosin, rosin and its derivatives conventionally used for fluxes can be used. As rosin and its derivatives, ordinary gum, toll, and wood rosin are used, and heat-treated resin, polymerized rosin, hydrogenated rosin, formylated rosin, rosin ester, rosin modified maleic resin, rosin modified phenolic resin, Examples include rosin-modified alkyd resins.
皮膜形成能を有する樹脂の含有量は、フラックス総量に対して20〜80重量%、好ましく30〜65重量%であるのがよい。含有量が20重量%未満になると、濡れ性が悪化するおそれがある。一方、含有量が80重量%を超えると、粘度調整が出来ず、作業性が悪化するおそれがある。 The content of the resin having a film forming ability is 20 to 80% by weight, preferably 30 to 65% by weight, based on the total amount of the flux. When the content is less than 20% by weight, wettability may be deteriorated. On the other hand, if the content exceeds 80% by weight, the viscosity cannot be adjusted and workability may be deteriorated.
本発明のフラックスに添加される有機酸金属塩の金属成分としては、金、銀、銅、鉛、亜鉛、ビスマス、インジウム、アンチモン、ニッケルなどが挙げられ、特に銅が好ましい。また有機酸成分としては、種々の脂肪酸、樹脂酸などが挙げられる。具体的には、ステアリン酸、オクチル酸、ナフテン酸、さらにロジン酸(ロジンの主成分であるアビエチン酸、ピマル酸などのジテルペン酸を含む)といった、アルキル部分の炭素数が通常7〜21程度の飽和脂肪酸、樹脂酸などが挙げられる。
有機酸金属塩の具体例としては、ステアリン酸銅、オクチル酸ビスマス、ナフテン酸銅などが挙げられる。
Examples of the metal component of the organic acid metal salt added to the flux of the present invention include gold, silver, copper, lead, zinc, bismuth, indium, antimony, nickel and the like, and copper is particularly preferable. Examples of the organic acid component include various fatty acids and resin acids. Specifically, stearic acid, octylic acid, naphthenic acid, and rosin acid (including diterpene acids such as abietic acid and pimaric acid, which are the main components of rosin) usually have about 7 to 21 carbon atoms in the alkyl portion. Examples include saturated fatty acids and resin acids.
Specific examples of the organic acid metal salt include copper stearate, bismuth octylate, and copper naphthenate.
有機酸金属塩の含有量はフラックス総量に対して0.1〜20重量%である。含有量が0.1重量%未満になると、ランド表面のニッケルがはんだ合金中に拡散するのを抑制することが困難となり、はんだの接合強度を向上させることができない。一方、含有量が20重量%を超えると、絶縁抵抗が低下するおそれがある。 The content of the organic acid metal salt is 0.1 to 20% by weight with respect to the total flux. When the content is less than 0.1% by weight, it becomes difficult to suppress the nickel on the land surface from diffusing into the solder alloy, and the solder joint strength cannot be improved. On the other hand, if the content exceeds 20% by weight, the insulation resistance may decrease.
本発明における活性剤は、有機酸金属塩を構成する有機酸と同じ有機酸であるか、それよりも酸性度が低い有機酸である。酸性度は、通常、溶液の酸性度定数(電離定数)Ka値やpKa値(−logKa)にて評価することができる。一般には有機酸の炭素数が増大するにつれて、酸性度は低下する傾向にあるので、酸性度が低い有機酸とは、有機酸金属塩を構成する有機酸よりも炭素数が多い有機酸を意味する。例えば、オクチル酸銅に対しては、それよりも炭素数の大きいステアリン酸などの有機酸を活性剤として使用すればよい。また、前記したロジン酸を含むロジンも酸性度の低い有機酸として好適に使用可能である。 The activator in the present invention is the same organic acid as the organic acid constituting the organic acid metal salt or an organic acid having a lower acidity. Acidity, typically, can be evaluated by the acidity constant of the solution (ionization constants) K a values and pK a values (-log K a). In general, since the acidity tends to decrease as the carbon number of the organic acid increases, the organic acid having a low acidity means an organic acid having more carbon atoms than the organic acid constituting the organic acid metal salt. To do. For example, for copper octylate, an organic acid such as stearic acid having a larger carbon number may be used as an activator. Moreover, the rosin containing the above-mentioned rosin acid can also be suitably used as an organic acid having a low acidity.
活性剤として、有機酸金属塩を構成する有機酸よりも酸性度が高い有機酸を使用すると、当該酸が有機酸金属塩を分解するおそれがあるので好ましくない。有機酸金属塩と活性剤(有機酸)との好適な組み合わせを例示すると、例えばステアリン酸銅とステアリン酸、ステアリン酸銅とロジンなどがある。 If an organic acid having higher acidity than the organic acid constituting the organic acid metal salt is used as the activator, it is not preferable because the acid may decompose the organic acid metal salt. Examples of suitable combinations of organic acid metal salts and activators (organic acids) include, for example, copper stearate and stearic acid, copper stearate and rosin, and the like.
活性剤の含有量は、フラックス総量に対して0.1〜30重量%であるのがよい。含有量が0.1重量%未満になると、活性剤の機能、すなわち金属表面の金属酸化物を除去し清浄化するための活性力が不足し、はんだ付け性が低下するおそれがある。一方、含有量が30重量%を超えると、フラックスの皮膜性が低下し、親水性が高くなるので、腐食性および絶縁性が低下するおそれがある。なお、ロジンを樹脂と活性剤の両方の機能を兼ねる使用形態で使用する場合には、ロジンおよびその誘導体の含有量はそれらの両機能が損なわれないような量でなければならない。 The content of the activator is preferably 0.1 to 30% by weight with respect to the total flux. When the content is less than 0.1% by weight, the function of the activator, that is, the active force for removing and cleaning the metal oxide on the metal surface is insufficient, and the solderability may be lowered. On the other hand, if the content exceeds 30% by weight, the film property of the flux is lowered and the hydrophilicity is increased, so that the corrosivity and the insulating property may be lowered. In addition, when using rosin in the usage form which serves as both a resin and an activator, the content of rosin and its derivative must be such an amount that both of these functions are not impaired.
溶剤としては、例えばエチルアルコール、イソプロピルアルコール、エチルセロソルブ、ブチルカルビトール、ヘキシルカルビトール(ジエチレングリコールモノヘキシルエーテル)等のアルコール系溶剤、酢酸エチル、酢酸ブチル等のエステル系溶剤、トルエン、テレピン油等の炭化水素系溶剤等が挙げられる。 Examples of the solvent include alcohol solvents such as ethyl alcohol, isopropyl alcohol, ethyl cellosolve, butyl carbitol, hexyl carbitol (diethylene glycol monohexyl ether), ester solvents such as ethyl acetate and butyl acetate, toluene, turpentine oil, and the like. Examples include hydrocarbon solvents.
溶剤は、フラックス総量に対して5〜70重量%の範囲で添加するのが好ましい。有機溶剤が5重量%未満になると、フラックスの粘性が高くなり、フラックスの塗布性が悪化するおそれがある。一方で、有機溶剤が70重量%を超えると、フラックスとしての有効成分(樹脂等)の割合が小さくなってしまうため、はんだ付け性が低下するおそれがある。 The solvent is preferably added in the range of 5 to 70% by weight based on the total amount of flux. When the organic solvent is less than 5% by weight, the viscosity of the flux increases, and the applicability of the flux may deteriorate. On the other hand, when the organic solvent exceeds 70% by weight, the ratio of the active ingredient (resin or the like) as the flux is decreased, so that the solderability may be deteriorated.
本発明のフラックスは、前記した各成分を混合し、加熱溶融することにより製造される。本発明のフラックスは、前記した成分のほか、チキソ剤などの他の成分を含んでいてもよい。チキソ剤としては、例えば水素添加ひまし油(硬化ひまし油)、蜜ロウ、カルナバワックス、ステアリン酸アミド、ヒドロキシステアリン酸エチレンビスアミド等があげられる。チキソ剤の含有量は、フラックス総量に対して1.0〜25重量%であるのがよい。 The flux of the present invention is produced by mixing the above-described components and heating and melting them. The flux of the present invention may contain other components such as a thixotropic agent in addition to the components described above. Examples of the thixotropic agent include hydrogenated castor oil (hardened castor oil), beeswax, carnauba wax, stearic acid amide, hydroxystearic acid ethylene bisamide and the like. The thixotropic agent content is preferably 1.0 to 25% by weight based on the total flux.
さらに、本発明のフラックスは、従来からフラックスのベース樹脂として用いられている公知のポリエステル樹脂、フェノキシ樹脂、テルペン樹脂等の合成樹脂等を併用してもよく、酸化防止剤、防黴剤、つや消し剤等の添加剤を添加することもできる。 Furthermore, the flux of the present invention may be used in combination with a known polyester resin, phenoxy resin, terpene resin or the like conventionally used as a base resin for the flux, and may be used together with an antioxidant, an antifungal agent, a matte. Additives such as an agent can also be added.
本発明のフラックスは、基板のランドに無電解ニッケルメッキが施されている場合について使用される。当該無電解ニッケルメッキを施すランドの金属は限定されるものではないが、当該金属が銅であることが好ましい。 The flux of the present invention is used in the case where electroless nickel plating is applied to the land of the substrate. The land metal to which the electroless nickel plating is applied is not limited, but the metal is preferably copper.
また、はんだ付けの際のはんだ合金の種類も限定されるものではなく、通常の錫−鉛合金はんだを使用することができ、また錫をベースとして、銀、亜鉛、ビスマス、インジウム、アンチモンなどの金属を混合した、いわゆる無鉛はんだを使用することも可能である。 Also, the type of solder alloy at the time of soldering is not limited, and an ordinary tin-lead alloy solder can be used. Also, based on tin, silver, zinc, bismuth, indium, antimony, etc. It is also possible to use so-called lead-free solder mixed with metal.
本発明のはんだ付け方法は、表面に無電解ニッケルメッキが施された銅のランドを有する基板に、上記のはんだ付け用フラックスをスクリーン印刷などにより印刷し、ついで前記ランド上にはんだボールを載置し、加熱してはんだボールをリフローさせて、はんだボールをランドに接合する。はんだボールとしては、前記した無鉛はんだから形成されるのが環境の上から好ましい。はんだボールのリフローは、印刷後、例えば150〜200℃でプリヒートし、あるいはプリヒートなしで直接170〜250℃の温度で加熱して行なう。印刷およびリフローは、大気中で行なってもよく、窒素、アルゴン、ヘリウムなどの不活性気体中で行なってもよい。 According to the soldering method of the present invention, the soldering flux is printed on a substrate having a copper land having electroless nickel plating on the surface by screen printing or the like, and then a solder ball is placed on the land. Then, the solder balls are reflowed by heating to join the solder balls to the lands. The solder balls are preferably formed from the above lead-free solder from the viewpoint of environment. The solder balls are reflowed after printing, for example, by preheating at 150 to 200 ° C. or directly by heating at a temperature of 170 to 250 ° C. without preheating. Printing and reflow may be performed in the air or in an inert gas such as nitrogen, argon, or helium.
本発明では、表面に無電解ニッケルメッキが施された銅のランドを有する基板に、上記のはんだ付け用フラックスとはんだ粉末とを混合したペーストを印刷し、ついで加熱してペーストをリフローさせて、ランド上にはんだ合金を形成することもできる。 In the present invention, a paste having a mixed soldering flux and solder powder is printed on a substrate having a copper land with electroless nickel plating on the surface, and then heated to reflow the paste, A solder alloy can also be formed on the land.
次に実施例を挙げて本発明のはんだ付け用フラックスを詳細に説明するが、本発明は以下の実施例のみに限定されるものではない。 Next, the soldering flux of the present invention will be described in detail with reference to examples, but the present invention is not limited only to the following examples.
<実験例1〜8および比較例1〜7>
[銅塩と活性剤の選択]
金属塩として次の物質を選択した。
A:(C17H35COO)2Cu
B:(C7H15COO)2Cu
C:(C21H43COO)2Cu
D:(C17H35COO)2Pb
活性剤として次の物質を選択した。
E:C7H15COOH
F:C17H35COOH
G:C21H43COOH
H:(CH3)2CHNH2・HCl
ここで、酸性度の強さは、H>E>F>Gの順である。
<Experimental Examples 1-8 and Comparative Examples 1-7>
[Selection of copper salt and activator]
The following materials were selected as metal salts.
A: (C 17 H 35 COO) 2 Cu
B: (C 7 H 15 COO) 2 Cu
C: (C 21 H 43 COO) 2 Cu
D: (C 17 H 35 COO) 2 Pb
The following substances were selected as activators.
E: C 7 H 15 COOH
F: C 17 H 35 COOH
G: C 21 H 43 COOH
H: (CH 3 ) 2 CHNH 2 .HCl
Here, the strength of the acidity is in the order of H>E>F> G.
[ロジンフラックスの調製]
WW級トールロジン 70重量部
ヘキシルカルビトール 25重量部
水素添加ひまし油 5重量部
上記処方により各物質を混合して120℃に加熱熔融させ、室温に冷却して粘性を有するフラックスを調製した。
[アクリルフラックスの調製]
アクリル樹脂(ロームアンドハース社製のパラロイドB‐48N) 50重量部
ヘキシルカルビトール 45重量部
水素添加ひまし油 5重量部
上記処方により各物質を混合して120℃に加熱熔融させ、室温に冷却して粘性を有するフラックスを調製した。
[Preparation of rosin flux]
WW class tall rosin 70 parts by weight Hexyl carbitol 25 parts by weight Hydrogenated castor oil 5 parts by weight Each material was mixed according to the above formulation, heated and melted to 120 ° C, and cooled to room temperature to prepare a viscous flux.
[Preparation of acrylic flux]
Acrylic resin (Paraloid B-48N, manufactured by Rohm and Haas) 50 parts by weight Hexyl carbitol 45 parts by weight Hydrogenated castor oil 5 parts by weight Each material is mixed according to the above formulation, heated to 120 ° C, and cooled to room temperature. A viscous flux was prepared.
[銅塩、活性剤混合フラックスの調製]
先に選択した金属塩と活性剤および上記により調製したフラックスを混合し、100℃に加熱溶融させ、室温に冷却した。使用したフラックス、金属塩および活性剤の種類と混合割合(重量%)を表1に示す。
The metal salt selected above, the activator and the flux prepared above were mixed, heated and melted to 100 ° C., and cooled to room temperature. Table 1 shows the types of fluxes, metal salts and activators used, and the mixing ratio (% by weight).
[絶縁抵抗の測定]
くし型パターンにランドを配置した基板上に表1の各実施例および比較例で得たフラックスを100μmの厚さでベタ状に印刷し、最高温度250℃においてリフローした。絶縁抵抗の測定に使用したフラックスは、製造直後のフラックスと、40℃で1ヶ月放置したフラックスの2種類である。リフロー後、JIS Z 3197のテスト方法に基づき、基板にDC50Vの電圧を印加したまま、温度85℃、相対湿度85%雰囲気中に1000時間放置後、ランド間の絶縁抵抗の測定を行った。
[Measurement of insulation resistance]
The flux obtained in each of the examples and comparative examples in Table 1 was printed in a solid form with a thickness of 100 μm on a substrate having lands arranged in a comb pattern, and reflowed at a maximum temperature of 250 ° C. There are two types of fluxes used for measuring the insulation resistance: a flux immediately after production and a flux left at 40 ° C. for one month. After the reflow, the insulation resistance between the lands was measured after being left in an atmosphere at a temperature of 85 ° C. and a relative humidity of 85% for 1000 hours with a DC 50V voltage applied to the substrate based on the test method of JIS Z 3197.
[接合強度の測定]
基板上の銅ランドに無電解ニッケルめっきを施し、さらにその上に金のフラッシュめっきを施して直径0.4mmのランドを形成し、当該基板上に、表1の各実施例及び比較例のフラックス(製造直後のもの)を100μmの厚さでベタ状に印刷した。
そして、そのランド上に、直径0.6mmのSn‐3.5Ag‐0.5Cuはんだボールを搭載し、リフローしてはんだボールをランドに接合させた。次いで、当該基板を60℃のブチルカルビトール溶液を入れた超音波洗浄機に浸漬して洗浄し、フラックスを除去した。
次いで、はんだボールの接合強度をDAGE社製DAGE−SERIES−4000Pで測定した(加熱式バンププル強度)。測定は各30点行い、その平均値を接合強度とすると共に、最小値を最小接合強度とした。
[Measurement of bonding strength]
Electroless nickel plating is applied to the copper land on the substrate, and further gold flash plating is applied thereon to form a land having a diameter of 0.4 mm. The flux of each of the examples and comparative examples in Table 1 is formed on the substrate. (Directly after production) was printed in a solid form with a thickness of 100 μm.
Then, an Sn-3.5Ag-0.5Cu solder ball having a diameter of 0.6 mm was mounted on the land and reflowed to join the solder ball to the land. Next, the substrate was immersed and cleaned in an ultrasonic cleaner containing a butyl carbitol solution at 60 ° C. to remove the flux.
Next, the bonding strength of the solder balls was measured with DAGE-SERIES-4000P manufactured by DAGE (heated bump pull strength). The measurement was performed at 30 points, and the average value was used as the bonding strength, and the minimum value was used as the minimum bonding strength.
[濡れ性評価]
150℃で1時間酸化処理した銅板上に、表1の各実施例及び比較例の各フラックス(製造直後のもの)を0.025gのせ、その上に直径1mmのSn‐Pbはんだボールを搭載し、230℃のホットプレートで1分間加熱した。その後、はんだの高さを測定し、下記式より濡れ広がり率を計算した。濡れ広がり率は、活性剤の活性力を評価するものであり、濡れ広がり率が高いほど、活性剤の活性力が高いことを表している。
これらの試験結果を表2に示す。
0.025g of each flux of Examples and Comparative Examples in Table 1 (immediately after manufacture) is placed on a copper plate oxidized at 150 ° C for 1 hour, and a 1-mm diameter Sn-Pb solder ball is mounted thereon. , Heated on a hot plate at 230 ° C. for 1 minute. Thereafter, the height of the solder was measured, and the wetting spread rate was calculated from the following formula. The wetting spread rate evaluates the activity of the activator. The higher the wetting spread rate, the higher the activity of the activator.
These test results are shown in Table 2.
表2に示すように、実施例1〜8のフラックスは、40℃で1ヶ月放置後も絶縁抵抗を大きく低下させることがない。これに対して、比較例2,3,4,6、7においては、金属塩の安定性が悪く、40℃、1ヶ月放置後のフラックスを使用すると絶縁抵抗の低下が認められた。 As shown in Table 2, the fluxes of Examples 1 to 8 do not significantly reduce the insulation resistance even after being left at 40 ° C. for one month. On the other hand, in Comparative Examples 2, 3, 4, 6, and 7, the stability of the metal salt was poor, and a decrease in insulation resistance was observed when using a flux after standing at 40 ° C. for 1 month.
また、実施例1〜8のフラックスは、いずれも高い接合強度を維持している。これに対し比較例1においては、金属塩を含有していないため、平均の接合強度が弱く、また極端に低い接合強度を示す点がある。また、比較例5では活性力が弱いため、低い濡れ広がり率を示した。
Moreover, all the fluxes of Examples 1 to 8 maintain high bonding strength. On the other hand, since Comparative Example 1 does not contain a metal salt, the average bonding strength is weak and the bonding strength is extremely low. Moreover, since the active force was weak in the comparative example 5, the low wetting spread rate was shown.
Claims (12)
A printed circuit board to which solder is joined by the soldering method according to claim 9.
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JP2004236407A JP4213642B2 (en) | 2004-08-16 | 2004-08-16 | Soldering flux, soldering method and printed circuit board |
KR1020040085304A KR101117884B1 (en) | 2004-08-16 | 2004-10-25 | Flux for soldering, soldering method, and printed curcuit board |
MYPI20044864A MY140781A (en) | 2004-08-16 | 2004-11-24 | Flux for soldering, soldering method, and printed circuit board |
CNB2004100973159A CN100571965C (en) | 2004-08-16 | 2004-11-26 | Welding agent for braze, method for welding and printed base plate |
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TWI498184B (en) | 2008-01-31 | 2015-09-01 | Arakawa Chem Ind | Solder flux and solder paste |
KR101140462B1 (en) * | 2010-07-02 | 2012-04-30 | 김성균 | Solder Paste and Flux for Aluminum |
JP5531188B2 (en) * | 2012-03-12 | 2014-06-25 | 株式会社弘輝 | Flux, solder composition and method for manufacturing electronic circuit mounting board |
CN103817461A (en) * | 2014-03-17 | 2014-05-28 | 苏州龙腾万里化工科技有限公司 | Resin-core soldering flux |
JP6511768B2 (en) * | 2014-10-21 | 2019-05-15 | 三菱マテリアル株式会社 | Method of forming solder bumps |
CN104625288A (en) * | 2014-12-23 | 2015-05-20 | 常熟高嘉能源科技有限公司 | Solar cell welding process |
CN106624463A (en) * | 2016-11-30 | 2017-05-10 | 重庆微世特电子材料有限公司 | Activating agent used for water-based soldering flux and preparing method of activating agent |
CN106752518B (en) * | 2016-12-15 | 2019-06-18 | 东莞市先飞电子材料有限公司 | A kind of anti-humidity oil and preparation method thereof |
JP6940963B2 (en) * | 2017-03-10 | 2021-09-29 | 株式会社タムラ製作所 | Flux composition and solder paste |
CN109014656A (en) * | 2018-08-24 | 2018-12-18 | 云南科威液态金属谷研发有限公司 | A kind of halogen-free scaling powder and its preparation method and application |
CN110181136B (en) * | 2019-06-28 | 2021-08-10 | 吴忠仪表有限责任公司 | Brazing method for butterfly piece type labyrinth valve cage installation structure |
KR102591564B1 (en) * | 2021-09-15 | 2023-10-19 | 엘에스이브이코리아 주식회사 | Laser Soldering System |
CN114434047B (en) * | 2021-11-25 | 2023-02-28 | 浙江亚通新材料股份有限公司 | Soldering flux for indium-based solder low-temperature welding and preparation method thereof |
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