JP4211185B2 - Cvd, ale apparatus for a glass substrate storage jig - Google Patents

Cvd, ale apparatus for a glass substrate storage jig Download PDF

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JP4211185B2
JP4211185B2 JP2000058004A JP2000058004A JP4211185B2 JP 4211185 B2 JP4211185 B2 JP 4211185B2 JP 2000058004 A JP2000058004 A JP 2000058004A JP 2000058004 A JP2000058004 A JP 2000058004A JP 4211185 B2 JP4211185 B2 JP 4211185B2
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glass substrate
cvd
jig
supporting
portion
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JP2001240972A (en )
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岡田  伸彦
和重 末松
和彦 杉浦
保之 田中
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株式会社デンソー
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【0001】 [0001]
【発明の属する技術分野】 BACKGROUND OF THE INVENTION
本発明は、半導体素子の製造プロセスにおけるガラス基板への薄膜形成、例えば金属膜、酸化膜などの成膜を行ったり、或いはガラス基板への単結晶層のエピタキシャル成膜を行なう半導体成膜装置における反応容器内でのガラス基板の収納治具に関するものである。 The present invention relates to a thin film formed on the glass substrate in a manufacturing process of semiconductor devices, for example, a metal film, or perform film formation, such as oxide film, or the reaction in the semiconductor film forming apparatus for performing epitaxial deposition of monocrystalline layers on the glass substrate it relates housing jig of the glass substrate in the vessel.
【0002】 [0002]
【従来の技術】 BACKGROUND OF THE INVENTION
ガラス基板に絶縁膜を形成するCVDやALE(Atomic Layer Epitaxy)装置等では、約300℃以上の高温が大型ガラス基板に印加される場合がある。 The CVD or ALE (Atomic Layer Epitaxy) apparatus or the like to form an insulating film on a glass substrate, there is a case where a high temperature of at least about 300 ° C. is applied to the large-size glass substrate. このような大型ガラス基板をALE装置にて処理する場合、反応容器内での大型ガラス基板の支持として、熱変形を考慮すると図7のようにガラス面を点で支持する方法が容易に考えられる。 When processing such a large-size glass substrate by ALE apparatus, as the support of a large glass substrate in a reaction vessel, a method of supporting the glass surface at a point is easily considered as consideration thermal deformation and 7 . これは、台座Aに固定された位置決めピンBによってガラス基板Cを支持する方法である。 This is a method for supporting a glass substrate C by the positioning pin B, which is fixed to the pedestal A. この場合、反応容器内の成膜ガスがガラス基板の裏面に容易に回り込んでしまうため、ガラス基板の一部しか正常部が得られなかったり、成膜後に膜を剥離するという余分な工程を必要とするという問題があった。 In this case, since the deposition gas in the reaction vessel will wraps around easily on the rear surface of the glass substrate, or not normal portion is obtained only a part of the glass substrate, an extra step of peeling off the film after film formation there has been a problem that it requires.
【0003】 [0003]
また、このガラス基板の裏面への成膜ガスの回り込みを防止するには、シール性を向上させれば良く、ガラス基板の周囲と裏面とをシール材でシールする方法が考えられる。 Also, to prevent the wraparound of the film forming gas to the rear surface of the glass substrate, it is sufficient to improve the sealing properties, a method of sealing is considered a circumference and rear surface of the glass substrate with a sealant. しかし、CVDやALE装置等で300℃以上の高温が印加される場合は、ゴム等の軟弱なシール部品が適用できず、金属によるシール即ちガラスと金属を接触させることが必須となっている。 However, if a high temperature of 300 ° C. or more CVD or ALE apparatus or the like is applied, can not be applied soft sealing components such as rubber, contacting the seal or glass and metal by the metal it is essential. しかしながら、高温下においては金属とガラスの線膨張係数の違いによるガラス基板とこれを保持する治具との温度変形差により、ガラスの欠け・割れが発生してしまう。 However, in a high temperature by the thermal deformation difference between the jig for holding the glass substrate due to a difference in linear expansion coefficient between the metal and glass, chipping-cracking of the glass occurs. 生産効率を向上するために、ガラス基板が大型化すると特にこの問題は重要である。 To improve production efficiency, especially when the glass substrate is enlarged This problem is significant.
【0004】 [0004]
【発明が解決しようとする課題】 [Problems that the Invention is to Solve
本発明の目的は、このガスのガラス基板の回り込みによるガラス基板裏面への成膜量が、ガス流の方向とガスの乱流とに相関関係があることに着目し、ガラス基板の割れ・欠けとガラス基板裏面への成膜との2つの問題を解決したCVD,ALE装置用ガラス基板収納治具を提供することである。 An object of the present invention, the deposition amount of the glass substrate back surface by diffraction of the glass substrate of this gas, and noticed that there is a correlation and turbulence direction and gas in the gas flow, cracking, chipping of the glass substrate it is that two problems resolved CVD with film formation on the glass substrate backside provides an ALE device glass substrate storage jig.
【0005】 [0005]
【課題を解決するための手段】 In order to solve the problems]
本発明は、前記課題を解決するための手段として、特許請求の範囲の各請求項に記載のCVD,ALE装置用ガラス基板収納治具を提供する。 The present invention provides, as means for solving the above problems, CVD according to the following claims, provides an ALE device glass substrate storage jig.
請求項1に記載のCVD,ALE装置用ガラス基板収納治具は、ガラス基板の4つの側面を支える上部カバー部、下部支持部及び左右側面支持部のうち少なくともガス流の下流に位置する下部支持部がガラス基板の下辺表面を覆う押え壁を有することにより、ガス流下流に位置するガラス基板の下部でのガラス基板裏面への回り込むガス量が最も多い回り込みを防止でき、正常な成膜部が多くなり、生産性が向上する。 Glass substrate storage jig for the CVD, ALE apparatus according to claim 1, an upper cover portion for supporting the four side surfaces of the glass substrate, a lower support which is located downstream of at least the gas flow out of the lower support portion and the left and right side supports parts by having a pressing wall covering the bottom side surface of the glass substrate, can be prevented wraparound highest gas volume goes around to the glass substrate rear surface of the lower glass substrate located downstream gas flow, the normal film forming unit the more, the productivity is improved.
【0006】 [0006]
請求項2の該収納治具は、ガラス基板の4つの側面を支える上部カバー部、下部支持部及び左右側面支持部とを備えていて、上部カバー部、下部支持部及び左右側面支持部の各々が、ガラス基板の各周辺表面を覆う押え壁を有することにより、ガラス基板の各周辺でのガス流の回り込みが防止でき、ガス流の回り込みが更に改善される。 The housing jig of claim 2, the upper cover portion for supporting the four side surfaces of the glass substrate, provided with a lower support portion and the left and right side supports, an upper cover portion, each of the lower support portion and the left and right side supports but by having a retainer wall for covering the peripheral surface of the glass substrate, wraparound of the gas flow at the periphery of the glass substrate can be prevented, wraparound gas flow is further improved.
請求項3の該収納治具は、押え壁のガラス基板と接する側と反対側の端部を流線形にしたものであり、ガス流が押え壁の端部に当って乱流となることを低減でき、ガス流が押え壁の流線形に沿ってスムーズに流れるので、ガス流のガラス基板裏面への回り込みが一層改善される。 The housing jig of claim 3, which has the end opposite the side in contact with the glass substrate pressing wall streamlined, to be a turbulent flow hits the end of the wall gas flow presser reduction can, therefore flows smoothly along the streamlined wall gas flow pressing, wraparound to the glass substrate backside gas flow is further improved.
【0007】 [0007]
請求項4の該収納治具は、ガラス基板を挟持する押え壁と裏面支持部との間隔を可変することで、成膜中の熱による材料の熱膨張差による変形を吸収でき、ガラス基板の割れ・欠けを防止できる。 The housing jig of claim 4, by varying the distance between the pressing wall and the back support portion for holding the glass substrate, can absorb the deformation caused by thermal expansion difference of the material due to heat during the film formation, the glass substrate cracking, chipping can be prevented. 更にガラス基板をセットする際に挿入部位(間隔)を拡げ、挿入後に該部位を狭めることで、セット時のガラス基板の割れ・欠けも防止できる。 Further expand the insertion site (interval) when setting the glass substrate, by narrowing the said site after insertion, cracking, chipping of the glass substrate during the set can be prevented.
請求項5の該収納治具は、前記押え壁と前記裏面支持部との間隔を可変にする機構を具体化したものであり、請求項4と同様の作用効果を奏する。 The housing jig of claim 5, is an embodiment of a mechanism for the distance between the pressing wall and the back supporting portion in the variable, the same effects as claim 4.
請求項6の該収納治具は、ガラス基板を2枚一組として裏面支持部の両側で支持することにより、ガラス基板を効率よく支持でき、ほぼ2倍の生産効率を上げることができる。 The housing jig of claim 6, by supporting both sides of the back support portion of the glass substrate as a set of two sheets, the glass substrate can be efficiently support, can be increased almost twice the production efficiency.
【0008】 [0008]
【発明の実施の形態】 DETAILED DESCRIPTION OF THE INVENTION
以下図面を参照して、本発明の実施の形態のCVD,ALE装置用ガラス基板収納治具について説明する。 With reference to the accompanying drawings, CVD embodiment of the present invention, the ALE apparatus for a glass substrate storage jig will be described. 一般にCVD,ALE装置においては、図6に示すように反応容器1内に成膜するガラス基板10を収納した収納治具20を載置する支持台2が設けられ、反応容器1には原料ガスを供給するための供給管3とガスを排気するための排気管4が接続されている。 CVD, the ALE apparatus generally support base 2 for mounting the housing jig 20 housing the glass substrate 10 for forming is provided in the reaction vessel 1 as shown in FIG. 6, the reaction vessel 1 feed gas the exhaust pipe 4 is connected for exhausting the supply pipe 3 and the gas to supply. このガラス基板10は、垂直状又は水平状或いは傾斜状に多数並置される。 The glass substrate 10 is juxtaposed multiple vertically-like or horizontally or inclined. 供給される原料ガス、例えばAlCl 3 ,TiCl 2等は、反応容器1内の高温雰囲気中で同じく供給された水(H 2 O)と反応し、ガラス基板10上にAl 23又はTiO 2等の膜を生成すると同時にガス状の副生成物を発生する。 Raw material gas to be supplied, for example AlCl 3, TiCl 2, etc., also supplied water in a high temperature atmosphere in the reaction vessel 1 (H 2 O) and reacted, Al 2 O 3 or TiO 2 on a glass substrate 10 at the same time to produce a film of equal generating a gaseous by-product. これが排気管4から排気される。 This is exhausted from the exhaust pipe 4.
【0009】 [0009]
図1は、本発明の実施の形態のガラス基板収納治具20を示している。 Figure 1 shows a glass substrate storage jig 20 of the embodiment of the present invention. 収納治具20は、ガラス基板10の裏面を支える裏面支持部21と、ガラス基板10の4つの側面を支える上部カバー部22、下部支持部23及び側面支持部24とから構成されている。 Receiving jig 20 comprises a back supporting portion 21 for supporting the back surface of the glass substrate 10, an upper cover portion 22 for supporting the four side surfaces of the glass substrate 10, and a lower support 23 and the side supports 24. 更にこれら上部カバー部22、下部支持部23及び側面支持部24は、ガラス基板10の表面周辺を覆うための押え壁25をそれぞれ有している。 In addition, these upper cover portion 22, the lower support portion 23 and the side supports 24 has a retainer wall 25 for covering the surface periphery of the glass substrate 10, respectively. したがって、図2,3に示されるように、ガラス基板10は、裏面支持部21と押え壁25とにより挟持されるようになる。 Accordingly, as shown in FIG. 2, the glass substrate 10 will be sandwiched between the back supporting portion 21 and the pressing wall 25.
この押え壁25は、それぞれ対応する上部カバー部22、下部支持部23及び側面支持部24に一体に形成されてよく、又は別体として形成され溶接、ボルト等により固着してもよい。 This pressing wall 25, the corresponding upper cover portion 22, the lower support portion 23 and the side supports 24 may be formed integrally or formed welded separately, may be secured by bolts or the like. また、図示されてはいないが、裏面支持部21と、上部カバー部22、下部支持部23及び側面支持部24とは、ボルト等により数個所で締結されている。 Further, although not shown, a back support 21, the upper cover portion 22 and the lower support portion 23 and the side supports 24 are fastened in several places by bolts or the like.
【0010】 [0010]
図1に示されたものでは、ガラス基板10の4辺に渡って押え壁25が設けられているが、実際にはガス流は下流に位置するガラス基板10の下部から裏面に回り込むのが最も多く、図2に示されるように、ガラス基板10の裏面支持部21と、押え壁25を有する下部支持部23のみを設けるだけで、かなりの効果を上げることができるものである。 The one shown in FIG. 1, the pressing wall 25 over the four sides of the glass substrate 10 is provided, in practice most from flowing to the rear surface from the bottom of the glass substrate 10 the gas stream is located downstream the many, as shown in FIG. 2, a back support portion 21 of the glass substrate 10, only by providing only the lower support portion 23 having a pressing wall 25, is capable of raising a considerable effect.
【0011】 [0011]
図3は、押え壁25の別の実施の形態を示すもので、ここでは押え壁25のガラス基板10と接しない方の端部26を流線形にしている。 Figure 3 shows another embodiment of the pressing wall 25, here it is the end 26 of the person who is not in contact with the glass substrate 10 of the pressing wall 25 streamlines. これは、図2のように押え壁25の該端部26が角部を形成していると、ガス流がこの角部に当って乱流を発生し、押え壁25とガラス基板10との隙間から入り込みガラス基板10の裏面にいくらか回り込むために、このガス漏れを更に防止するために流線形にしたものである。 This end portion 26 of the pressing wall 25 as shown in FIG. 2 as forming a corner, the turbulence generated gas flow hitting this corner, the pressing wall 25 and the glass substrate 10 to somewhat go around to the back surface of the glass substrate 10 enters the gap is obtained by streamlined in order to prevent the gas leakage further. これにより、ガス流はスムーズになり、乱流の発生が押えられる。 Thus, the gas flow becomes smooth, the generation of turbulence is pressed. なお、図3に示されるように下部支持部23の下端部も流線形にすると一層効果が上がる。 Incidentally, more effective, but the lower end of the lower support portion 23 also streamlines as shown in Figure 3.
【0012】 [0012]
図4の(a)は、更に別の実施の形態を示すもので、押え壁25と裏面支持部21と間隔を可変にする構造としている。 (A) of FIG. 4, but showing still another embodiment has a structure that the pressing wall 25 and the back supporting portion 21 interval variable. これは成膜中の熱によるガラス基板10と収納治具20との熱膨張差から、この間隔が不規則に変形する。 This the difference in thermal expansion between the glass substrate 10 due to heat during the film formation and the storage jig 20, this interval is irregularly deformed. そこでガラス基板10の側面の支持部である上部カバー部22、下部支持部23及び側面支持部24と裏面支持部21との締結を、溶接等の完全固定式から数mm程度ずれて可動する構造とすることで、この変形を吸収しガラスの割れ・欠けを防止するようにしている。 Therefore the upper cover portion 22 is a support portion of the side surface of the glass substrate 10, the fastening of the lower support portion 23 and the side supports 24 and the back support portion 21, is completely fixed offset several mm from the equation movable welding structure with, so as to prevent cracking, chipping of the glass to absorb the deformation.
【0013】 [0013]
図4の(b)は、この1つの実施例を示している。 (B) in FIG. 4 shows this one embodiment. 下部支持部23には、裏面支持部21に締結するための孔27が穿設される。 The lower support 23, holes 27 for fastening the backing portion 21 is bored. ボルト等の締結具30を挿通する穴31が明けられた円筒状のカラー32が、下部支持部23の孔27内に配置される。 Cylindrical collar 32 having a hole 31 for inserting the fasteners 30 such as bolts are drilled is placed in the hole 27 of the lower support portion 23. 孔27の内径は、カラー32の外径より大きく、カラー32が横方向に数mm程度移動できる大きさとなっている。 The inner diameter of the hole 27 is larger than the outer diameter of the collar 32, is sized to collar 32 can be moved several mm in the transverse direction. カラー32の前後には孔27より大きな径のワッシャー33が配置される。 Washers 33 of larger diameter than the hole 27 in the front and rear of the collar 32 is arranged. このような状態で、締結具30をワッシャー33及びカラー32を挿通し、裏面支持部21のねじ穴に螺合することで裏面支持部21と下部支持部23とが締結される。 In this state, the fastener 30 inserted through the washer 33 and the collar 32, and a back supporting section 21 and the lower support portion 23 is fastened by screwing into the screw hole of the back support portion 21. このような締結個所がガラス基板10の1側辺当り数個所設けられる。 Such fastening points are provided at multiple locations per side edge of the glass substrate 10. なお、下部支持部23の表面からワッシャー33が突出しないように、下部支持部23の表面にはワッシャー33の収容部が形成されている。 Note that, as the washer 33 from the surface of the lower support portion 23 does not protrude, housing part of the washer 33 is formed on the surface of the lower support portion 23.
この構造により下部支持部23は裏面支持部21に対して横方向に数mm程度移動できる。 Lower support 23 by this structure can be moved several mm transversely to the backing 21. 即ち裏面支持部21と押え壁25との間隔が可変にできるものである。 That distance between the back supporting portion 21 and the holding wall 25 is intended to be variable.
従って、ガラス基板の大型化によって厳しくなった熱膨張差による変形の影響を排除できる。 Therefore, it is possible to eliminate the influence of deformation due to thermal expansion difference became stricter by larger glass substrate.
【0014】 [0014]
前記のように下部支持部23と裏面支持部21との可動構造は、大型ガラス基板10をセットする際に、裏面支持部21と押え壁25とで形成される挿入部位を拡げ、ガラス基板を挿入後に手で押す等によって狭めることで、セット時のガラスの欠け・割れを防止することもできる。 Movable structure of the lower support portion 23 and the back support 21 as described above, when setting the large-size glass substrate 10, expanding the insertion site formed by the back supporting portion 21 and the pressing wall 25, a glass substrate by narrowing the like pressed by hand after insertion, it is possible to prevent chipping-cracking of the glass during the setting.
なお、下部支持部23以外の上部カバー部22及び側面支持部24にも、前記の裏面支持部21との可動構造を採用できるものである。 Also the upper cover portion 22 and the side supports 24 other than the lower support portion 23, in which can be employed movable structure and said back supporting portion 21.
【0015】 [0015]
図5は更に別の実施の形態を示すもので、裏面支持部21の両面にガラス基板10を配置したものである。 Figure 5 is intended to show still another embodiment is obtained by placing the glass substrate 10 on both sides of the back support portion 21. 当然、この場合には押え壁25は、上部カバー部22、下部支持部23及び側面支持部24とも両側に設けられている。 Of course, the pressing wall 25 is in this case, the upper cover portion 22, are provided on both sides both lower support 23 and side support 24. また、前記した押え壁25の端部26の流線形化及び裏面支持部21と支持部22,23,24との可動な締結構造を適宜採用できるものである。 Moreover, in which the movable fastening structure between streamlining and back support 21 and the support portion 22, 23 and 24 of the end portion 26 of the pressing wall 25 described above may be employed as appropriate.
このように裏面支持部の両側を有効に利用することで、省スペースでなおかつ約2倍のガラス基板を収納できる。 By thus effectively utilizing both sides of the back support portion can yet accommodating approximately twice the glass substrate in a space-saving.
なお、本実施の形態では、ガラス基板を垂直に多数並置する場合を例にとって説明しているが、水平に多数並置する場合においても適用可能なものである。 In the present embodiment, it is assumed that the for example when juxtaposing a large number of glass substrates vertically, but also applicable in the case of juxtaposed multiple horizontally. その場合は、原料ガスを反応容器内に横方向から導入して、ガス状副生成物を横方向から排出する等の工夫が必要であろう。 In that case, the raw material gas is introduced laterally into the reaction vessel, may be necessary to devise such discharging the gaseous by-products from the side.
【0016】 [0016]
以上説明したように本発明のCVD,ALE装置用ガラス基板収納治具においては、ガラス基板の成膜の不具合部を減少できると共に大型のガラス基板であっても割れ・欠けを防止することができ、かつ省スペースで大量のガラス基板を収納できるので、1バッチの処理時間が約12時間程かかるCVD,ALE装置にあっては、その生産効率を格段に改善できるものである。 CVD of the present invention as described above, in the ALE apparatus for a glass substrate storage jig can be prevented even cracking, chipping a large-sized glass substrate is possible reduce the problem of deposition of a glass substrate and so it can be stored a large amount of glass substrate in a space-saving, processing time for one batch is CVD which take about 12 hours, in the ALE apparatus, in which the production efficiency can be significantly improved.
【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS
【図1】本発明の実施の形態のCVD,ALE装置用ガラス基板収納治具の斜視図である。 [1] CVD embodiment of the present invention, is a perspective view of the ALE apparatus for a glass substrate storage jig.
【図2】本発明の収納治具の一部側面拡大図である。 Figure 2 is a partially enlarged side view of the housing jig of the present invention.
【図3】本発明の別の実施の形態の収納治具の一部側面拡大図である。 3 is a partially enlarged side view of a housing jig another embodiment of the present invention.
【図4】(a)は本発明の更に別の実施の形態の収納治具の一部側面拡大図で、(b)はその一実施例を示す一部側面拡大断面図である。 4 (a) is a further partially enlarged side view of the housing jig of another embodiment of the present invention, and (b) is partially enlarged side sectional view showing an embodiment thereof.
【図5】本発明の更に別の実施の形態の収納治具の一部側面拡大図である。 5 is a further partially enlarged side view of the housing jig of another embodiment of the present invention.
【図6】CVD,ALE装置の反応容器内に配置されたガラス基板収納治具を概念的に説明する図である。 [6] CVD, is a diagram conceptually illustrating the placed glass substrate storage fixture in a reaction vessel of the ALE apparatus.
【図7】従来のガラス基板収納治具を説明する図である。 7 is a diagram illustrating a conventional glass substrate storage jig.
【符号の説明】 DESCRIPTION OF SYMBOLS
10…ガラス基板20…収納治具21…裏面支持部22…上部カバー部23…下部支持部24…側面支持部25…押え壁26…端部30…締結具32…カラー33…ワッシャー 10 ... glass substrate 20 ... housing jig 21 ... backing portion 22 ... upper cover portion 23 ... lower support 24 ... side support 25 ... pressing wall 26 ... end 30 ... fastener 32 ... collar 33 ... washer

Claims (6)

  1. 原料ガスを使用して反応容器内で薄膜形成されるガラス基板を支持するためのCVD,ALE装置用ガラス基板収納治具において、この収納治具が、 Source gas CVD for supporting a glass substrate formed as a thin film in a reaction vessel using, in ALE apparatus for a glass substrate storage jig, the housing jig,
    ガラス基板の裏面を支持する裏面支持部と、 And the back support for supporting the back surface of the glass substrate,
    ガラス基板の4つの側面を支える上部カバー部、下部支持部及び左右側面支持部と、 Upper cover portion for supporting the four side surfaces of the glass substrate, and a lower support portion and the left and right side supports,
    より構成され、 It is more structure,
    少なくともガス流の下流に位置する該下部支持部がガラス基板の下辺表面を覆う押え壁を有していることを特徴とするCVD,ALE装置用ガラス基板収納治具。 CVD of said lower support portion positioned downstream of at least the gas flow, characterized in that it has a pressing wall covering the bottom side surface of the glass substrate, ALE apparatus for a glass substrate storage jig.
  2. ガラス基板の残りの3の側面を支える上部カバー部、左右側面支持部もそれぞれガラス基板の周辺表面を覆う押え壁を有していることを特徴とする請求項1に記載のCVD,ALE装置用ガラス基板収納治具。 Upper cover portion for supporting the remaining three sides of the glass substrates, CVD according to claim 1, characterized in that it has a pressing wall covering the periphery surface of the left and right sides respectively supporting portion also glass substrate, a ALE device glass substrate storage jig.
  3. 前記押え壁のガラス基板と接する側と反対側の端部を流線形として、ガス流の抵抗を低減したことを特徴とする請求項1又は2に記載のCVD,ALE装置用ガラス基板収納治具。 As streamlined the end opposite to the side in contact with the glass substrate of the pressing wall, CVD according to claim 1 or 2, characterized in that a reduced resistance of the gas flow, ALE apparatus for a glass substrate storage jig .
  4. ガラス基板を挟持する前記押え壁と前記裏面支持部との間隔が可変となっていることを特徴とする請求項1〜3のいずれか一項に記載のCVD,ALE装置用ガラス基板収納治具。 The sandwich glass substrate pressing wall and CVD according to claim 1 the distance between the back support portion is characterized in that is variable, ALE apparatus for a glass substrate storage jig .
  5. 前記押え壁と前記裏面支持部との間を可変とする機構が、ボルトを挿通する穴を有する円筒状カラーを、少なくとも前記下部支持部に穿孔された、カラーの外径よりやや大きい径の孔内に配置し、該カラーを利用して前記下部支持部と前記裏面支持部とをボルトで締結することよりなることを特徴とする請求項4に記載のCVD,ALE装置用ガラス基板収納治具。 Mechanism for varying between said retainer wall and the back support portion, a cylindrical collar having a bore for inserting bolts, drilled at least in the lower support portion, slightly larger diameter of the hole than the outer diameter of the collar disposed within, CVD according to claim 4, by utilizing the color, characterized in that consists in fastening the said back supporting portion and the lower supporting portion with bolts, ALE apparatus for a glass substrate storage jig .
  6. ガラス基板が2枚一組として裏面支持部の両側で保持されていることを特徴とする請求項1〜5のいずれか一項に記載のCVD,ALE装置用ガラス基板収納治具。 CVD according to any one of claims 1 to 5, characterized in that the glass substrate is held on both sides of the back support portion as a set of two sheets, a glass substrate storage jig ALE apparatus.
JP2000058004A 2000-02-29 2000-02-29 Cvd, ale apparatus for a glass substrate storage jig Expired - Fee Related JP4211185B2 (en)

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