JP4131137B2 - Interposer substrate continuity inspection method - Google Patents

Interposer substrate continuity inspection method Download PDF

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Publication number
JP4131137B2
JP4131137B2 JP2002207870A JP2002207870A JP4131137B2 JP 4131137 B2 JP4131137 B2 JP 4131137B2 JP 2002207870 A JP2002207870 A JP 2002207870A JP 2002207870 A JP2002207870 A JP 2002207870A JP 4131137 B2 JP4131137 B2 JP 4131137B2
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Japan
Prior art keywords
continuity
substrate
wiring layer
electrode
connection electrode
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JP2002207870A
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JP2004053292A (en
Inventor
直之 秋山
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Toppan Inc
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Toppan Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15172Fan-out arrangement of the internal vias
    • H01L2924/15173Fan-out arrangement of the internal vias in a single layer of the multilayer substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15192Resurf arrangement of the internal vias

Description

【0001】
【発明の属する技術分野】
本発明は、半導体素子をプリント配線板上に実装するための半導体パッケージの部材として用いられるインターポーザ基板の配線層の導通状態を検査するインターポーザ基板の導通検査方法に関する。
【0002】
【従来の技術】
パソコンやOA機器、家電製品、音響機器、ゲーム機などに代表される電子機器においては半導体素子を直接プリント配線板上に実装することが難しいため、ほとんどの場合、半導体素子はインターポーザと呼ばれる基板に搭載された半導体パッケージという形態にしてから、電子機器装置に実装されている。
近年、これらの電子機器は小型・高性能化の一途をたどっており、半導体パッケージについても更なる小型化、配線の高密度化の要求が高まってきている。
【0003】
半導体パッケージにおいて、半導体素子が搭載される電子回路基板には絶縁基材の表面に電気的な導通をとるための配線層が設けられている。電子回路基板としては、絶縁基材の片面に配線層を形成したものから始まり、配線層の高密度化が進むにつれて、両面配線板、あるいは絶縁層と配線層を交互に積み重ねた多層型配線板が作り出されるようになってきた。
代表的な電子回路基板として、ポリイミドに代表される絶縁性材料のテープや板材を芯材とした配線板があり、近年は両面に配線層が存在するテープ状の両面配線板(インターポーザ基板)、通称2メタルTABに対する要求が高くなっている。
【0004】
両面配線板は片面配線板に比べて両面に配線層が存在するだけではなく、バイアホールと呼ばれる表裏の配線層を電気的に接続するための構造を有する点に特徴がある。
バイアホールは、絶縁基材の両面に銅箔を貼り付けた両面銅箔積層板に配線層を形成する際、まず、絶縁基材及び銅箔にビア用孔をレーザー加工等で形成し、このビア用孔に電解銅めっき等で導体層を埋め込むなどして形成し、絶縁基材表裏の銅箔を電気的に接続する。その後、表裏の銅箔をパターニング処理して配線層及び電極を形成することで、2メタルのインターポーザ基板が得られる。
【0005】
インターポーザ基板の配線層はプリント配線基板に実装するための基板接続用電極とICチップ接続用電極との間を電気的に接続している。通常は、実装の形態から、絶縁基材の一方の面にICチップ接続用電極と配線層が形成され、絶縁基材の他方の面に基板接続用電極が形成されており、配線層と基板接続用電極とはビアホールにて電気的に接続されている。この配線層が途中で断線したり、隣り合う配線層とショートしていたりすると製品としての価値が無くなってしまうため、出荷前に外観検査や電気検査などを行っている。
【0006】
【発明が解決しようとする課題】
配線層の導通検査方法は、配線層の両端に針状の検査用プローブを接触させて電気抵抗を測定し、判定するのが一般的である。
配線層が片面のみの1メタルBGA基板の場合は、基板接続用電極とICチップ接続用電極は同じ面にあるので、検査用プローブは1つの面側に配置して、それぞれの電極に接触させて電気的な検査を行うことが多い。
一方、2メタルBGA基板では、ICチップをインターポーザ基板の中心部に搭載し、基板接続用電極がICチップより外側に配置するファンアウト型の場合、配線層の数をできるだけ多くするため、ICチップ接続用電極とは反対側に、基板接続用電極を配置することが多い。
【0007】
この様な形態の場合、検査用プローブを両面に配置してそれぞれの電極に押し当てることが必要になる。この際、インターポーザ基板の厚みが100μm以下になると、柔軟性の関係から、表裏の電極に検査用プローブを正確に押し当てることが難しくなる。このため、装置は複雑になり、非常に高価なものとなる。
【0008】
また、近年の傾向として、半導体パッケージのサイズが小さくなる一方、電極数は多くなる傾向にある。このため、ICチップ接続用電極は30〜100μm角になってきており、検査用プローブを精度よく接触させることが難しいという問題点がある。
また、電極数の増加と微細化傾向のインターポーザ基板の導通検査を効率良く、精度良く検査するために、従来の検査プローブを用いた導通検査から、絶縁基材上に検査電極が多数配置された検査治具を使って導通検査を行う方法が導入されている。この場合も、表裏の電極に検査電極を精度良く位置合わせするのは難しいという問題を有する。
【0009】
本発明は上記問題点に鑑み考案されたもので、2メタルBGA等のインターポーザ基板の配線層の導通検査を同一面で検査できるようにしたインターポーザ基板の導通検査方法を提供することを目的とする。
【0010】
【課題を解決するための手段】
本発明において上記課題を達成するために、まず請求項1においては、絶縁基材の一方の面に基板接続用電極が、他方の面に前記基板接続用電極とビア接続された配線層及びICチップ接続用電極が形成され、かつ、前記基板接続用電極はICチップ搭載領域より外側に配置されてなるインターポーザ基板の前記配線層の導通検査方法であって、前記絶縁基材の前記基板接続用電極と同一面のICチップ搭載領域に前記配線層とビア接続された共通測定電極を設けて、前記基板接続用電極と前記共通測定電極に測定検査プローブを押し当て、前記配線層の導通状態を検査するようにしたことを特徴とするインターポーザ基板の導通検査方法としたものである。
【0011】
また、請求項2においては、前記共通測定電極が少なくとも2個以上設けられていることを特徴とする請求項1記載のインターポーザ基板の導通検査方法としたものである。
【0012】
【発明の実施の形態】
本発明のインターポーザ基板の導通検査方法は、中間製品である導通検査用インターポーザ基板のICチップ搭載部に共通測定電極を設けて、導通検査用インターポーザ基板の同一面で測定検査プローブを押し当て、配線層の導通状態を検査できるようにしたものである。
導通検査用インターポーザ基板の導通検査は複数の配線層の端部を共通測定電極に接続して、個々の配線層の導通及び配線層間の短絡を判定しているが、共通測定電極は2個以上いくつでも良いが、配線層間の短絡を効率よく、正確に検出するためには、隣り合う配線層を異なる共通測定電極に接続することで、隣り合う配線層が短絡しているかどうかを判定することができる2個の共通測定電極を設けることが好適である。
上記共通測定電極は導通検査が終了した時点で金型でICチップ搭載領域及び共通測定電極を抜き加工してデバイスホールを作製するか、エッチング加工等で共通測定電極を除去する等の方法で、製品状態のインターポーザ基板を得る。
【0013】
以下、インターポーザ基板の導通検査方法について説明する。
まず、50μm厚のポリイミド基板からなる絶縁基材11の両面に12μm厚の銅箔を貼り付けた銅貼り積層板の銅箔の所定位置にレーザー加工等によりビア用孔を形成して、電解銅めっきを行い、所定厚の導体層及びフィルドビア22を形成し、導体層上に、フォトレジストを塗布して感光層を形成し、パターン露光、現像等の一連のパターニング処理を行って、基板接続用電極23、共通測定電極51及び52、配線層21、ICチップ接続用電極24及び測定用配線リード25をそれぞれ形成し、ソルダーレジストパターンを形成した後ニッケル、金めっきを行って、絶縁基材11の同一面に基板接続用電極23、共通測定電極51及び52を設けた2メタルBGAの導通検査用インターポーザ基板50を作製する(図1(a)、(b)及び(c)参照)。
ここで、共通測定電極51及び52はICチップ搭載領域に形成されており、共通測定電極51及び52は測定用配線リード25及びフィルドビア22を介してICチップ接続用電極24と電気的に接続されている。
【0014】
次に、測定検査プローブ101を導通検査用インターポーザ基板50の基板接続用電極23に、測定検査プローブ102a及び102bを共通測定電極51及び52に押し当て、配線層21の導通を、配線層21間の短絡を検査装置100にて判定する(図2参照)。ここで、測定検査プローブ102a及び102bはそのままで、測定検査プローブ101を順次移動して全配線層の導通状態の検査を行う。
【0015】
以下、導通検査用インターポーザ基板50の共通測定電極を2個用いて配線層の導通、配線層間の短絡の正常/異常を判定する導通検査方法について説明する。
図3は、配線層21a及び21bに断線、短絡がない状態の事例を示すもので、測定検査プローブ101を基板接続用電極23aに接続し、測定検査プローブ102aを共通測定電極51に、測定検査プローブ102bを共通測定電極52に接続して導通検査を実施すると、配線層21a及び21bに断線、短絡がないため、短絡表示灯がOFFに、導通表示灯がONに表示され、配線層21aの導通状態は正常、配線層21aと配線層21b間の短絡は正常と検査装置100にて判定される(図3参照)。さらに、測定検査プローブ101を順次移動させて、全配線層の導通検査を行う。
【0016】
図4は、配線層21aに断線があり、配線層21aと及び配線層21b間には短絡がない状態の事例を示すもので、測定検査プローブ101を基板接続用電極23aに接続し、測定検査プローブ102aを共通測定電極51に、測定検査プローブ102bを共通測定電極52に接続して導通検査を実施すると、導通表示灯がOFFに、短絡表示灯がOFFに表示され、配線層21aが導通状態は異常、配線層21aと配線層21b間の短絡は正常と検査装置100にて判定される(図4参照)。
【0017】
図5は、配線層21aと配線層21b間に短絡、配線層21aと及び配線層21bには断線がない状態の事例を示すもので、測定検査プローブ101を基板接続用電極23aに接続し、測定検査プローブ102aを共通測定電極51に、測定検査プローブ102bを共通測定電極52に接続して導通検査を実施すると、導通表示灯がONに、短絡表示灯がONに表示され、配線層21aが導通状態は正常、配線層21aと配線層21b間の短絡は異常と検査装置100にて判定される(図5参照)。
【0018】
こうして、導通検査用インターポーザ基板50のすべての配線層の導通検査を実施した後良品と判定された導通検査用インターポーザ基板50について、ICチップ搭載領域の共通測定電極51及び52、測定用配線リード25が形成された絶縁基材を金型にて抜き加工して、図6(a)、(b)及び(c)に示すような、中心部にデバイスホール41を有するインターポーザ基板60を作製する。
【0019】
【発明の効果】
本発明のインターポーザ基板の導通検査方法を適用することにより、同一面での測定用プローブを用いた導通検査が可能になり、さらに、共通測定電極を複数個設けることにより、インターポーザ基板の配線層の導通及び配線層間の短絡状態を効率よく、正確に検査することができ、導通検査分野での優れた実用上の効果を発揮する。
【図面の簡単な説明】
【図1】(a)は、本発明のインターポーザ基板の導通検査方法に用いる導通検査用インターポーザ基板の一例の表面を示す模式平面図である。
(b)は、(a)をA−A’線で切断した模式構成断面図である。
(c)は、本発明のインターポーザ基板の導通検査方法に用いる導通検査用インターポーザ基板の一例の裏面を示す模式平面図である。
【図2】導通検査用インターポーザ基板を用いて導通検査を行っている状態を示す説明図である。
【図3】共通測定電極と基板接続用電極を用いて導通検査を行っている状態を示す説明図である。
【図4】共通測定電極と基板接続用電極を用いて導通検査を行っている状態を示す説明図である。
【図5】共通測定電極と基板接続用電極を用いて導通検査を行っている状態を示す説明図である。
【図6】(a)は、導通検査を終了して、共通測定電極及び測定用配線リードを除去した状態を示すインターポーザ基板の表面を示す模式平面図である。
(b)は、(a)をA−A’線で切断した模式構成断面図である。
(c)は、導通検査を終了して、共通測定電極及び測定用配線リードを除去した状態を示すインターポーザ基板の裏面を示す模式平面図である。
【符号の説明】
11……絶縁基材
21、21a、21b……配線層
22……フィルドビア
23、23a、23b……基板接続用電極
24……ICチップ接続用電極
25……測定用配線リード
41……デバイスホール
50……導通検査用インターポーザ基板
51、52……共通測定電極
60……インターポーザ基板
100……検査装置
101、102a、102b……測定検査プローブ
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an interposer substrate continuity inspection method for inspecting a continuity state of a wiring layer of an interposer substrate used as a member of a semiconductor package for mounting a semiconductor element on a printed wiring board.
[0002]
[Prior art]
In electronic devices such as personal computers, OA equipment, home appliances, audio equipment, and game machines, it is difficult to mount semiconductor elements directly on a printed wiring board. In most cases, semiconductor elements are placed on a substrate called an interposer. The semiconductor package is mounted on an electronic device after being in the form of a mounted semiconductor package.
In recent years, these electronic devices have been continuously reduced in size and performance, and the demand for further downsizing of semiconductor packages and higher density of wiring has been increased.
[0003]
In a semiconductor package, an electronic circuit board on which a semiconductor element is mounted is provided with a wiring layer for electrically conducting on the surface of an insulating base. An electronic circuit board starts with a wiring layer formed on one side of an insulating base, and as the wiring layer density increases, double-sided wiring boards, or multilayer wiring boards in which insulating layers and wiring layers are alternately stacked Has been created.
As a typical electronic circuit board, there is a wiring board having an insulating material tape or plate material represented by polyimide as a core material, and in recent years a tape-like double-sided wiring board (interposer board) in which wiring layers exist on both sides, The demand for the so-called 2-metal TAB is increasing.
[0004]
The double-sided wiring board is characterized in that it has a structure for electrically connecting the front and back wiring layers called via holes as well as wiring layers on both sides as compared to the single-sided wiring board.
When forming a wiring layer on a double-sided copper foil laminate with copper foil pasted on both sides of an insulating base material, via holes are first formed in the insulating base material and copper foil by laser processing or the like. The via holes are formed by embedding a conductor layer by electrolytic copper plating or the like, and the copper foils on the front and back of the insulating base material are electrically connected. Thereafter, the copper foils on the front and back sides are patterned to form a wiring layer and electrodes, whereby a two-metal interposer substrate is obtained.
[0005]
The wiring layer of the interposer substrate electrically connects the substrate connection electrode for mounting on the printed wiring substrate and the IC chip connection electrode. Usually, from the mounting form, an IC chip connection electrode and a wiring layer are formed on one surface of the insulating base material, and a substrate connection electrode is formed on the other surface of the insulating base material. The connection electrode is electrically connected via a via hole. If this wiring layer is disconnected in the middle, or if it is short-circuited with an adjacent wiring layer, its value as a product is lost. Therefore, an appearance inspection and an electrical inspection are performed before shipment.
[0006]
[Problems to be solved by the invention]
In a wiring layer continuity inspection method, generally, a needle-like inspection probe is brought into contact with both ends of a wiring layer to measure and determine electric resistance.
In the case of a one-metal BGA substrate with only one side of the wiring layer, the substrate connection electrode and the IC chip connection electrode are on the same surface, so the inspection probe is placed on one surface side and brought into contact with each electrode. In many cases, electrical inspection is performed.
On the other hand, in the case of a 2-metal BGA substrate, in the case of a fan-out type in which an IC chip is mounted at the center of the interposer substrate and the substrate connection electrodes are arranged outside the IC chip, the number of wiring layers is increased as much as possible. In many cases, the substrate connection electrode is arranged on the side opposite to the connection electrode.
[0007]
In the case of such a configuration, it is necessary to place inspection probes on both sides and press them against the respective electrodes. At this time, if the thickness of the interposer substrate is 100 μm or less, it becomes difficult to accurately press the inspection probe to the front and back electrodes due to flexibility. This complicates the device and is very expensive.
[0008]
Further, as a recent trend, the size of the semiconductor package is reduced, while the number of electrodes is increased. For this reason, the IC chip connection electrode has become 30-100 μm square, and there is a problem that it is difficult to contact the inspection probe with high accuracy.
In addition, in order to efficiently and accurately inspect the continuity inspection of interposer substrates that have an increasing number of electrodes and miniaturization, many inspection electrodes are arranged on the insulating base material from the continuity inspection using a conventional inspection probe. A method of conducting a continuity test using an inspection jig has been introduced. Also in this case, there is a problem that it is difficult to accurately align the inspection electrodes with the front and back electrodes.
[0009]
The present invention has been devised in view of the above problems, and an object of the present invention is to provide a continuity inspection method for an interposer substrate that enables a continuity inspection of a wiring layer of an interposer substrate such as a two-metal BGA to be inspected on the same surface. .
[0010]
[Means for Solving the Problems]
In order to achieve the above-mentioned object in the present invention, first, in claim 1, a wiring layer and an IC in which a substrate connection electrode is connected to one surface of an insulating base and the other surface is via-connected to the substrate connection electrode A method for inspecting the continuity of the wiring layer of the interposer substrate in which a chip connection electrode is formed and the substrate connection electrode is disposed outside the IC chip mounting region , wherein the insulating base material is used for the substrate connection A common measurement electrode via-connected to the wiring layer is provided in the IC chip mounting region on the same surface as the electrode, and a measurement inspection probe is pressed against the substrate connection electrode and the common measurement electrode, and the conduction state of the wiring layer is determined. This is a continuity inspection method for an interposer substrate characterized by being inspected.
[0011]
According to claim 2, there is provided the interposer substrate continuity inspection method according to claim 1, wherein at least two or more common measurement electrodes are provided.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
In the interposer substrate continuity inspection method of the present invention, a common measurement electrode is provided on the IC chip mounting portion of the interposer substrate for continuity inspection, which is an intermediate product, and the measurement inspection probe is pressed on the same surface of the interposer substrate for continuity inspection, and wiring It enables to check the conduction state of the layer.
In the continuity test of the interposer substrate for continuity test, the ends of multiple wiring layers are connected to a common measurement electrode to determine the continuity of each wiring layer and the short circuit between the wiring layers. Any number is acceptable, but in order to detect a short circuit between wiring layers efficiently and accurately, it is necessary to determine whether adjacent wiring layers are short-circuited by connecting adjacent wiring layers to different common measurement electrodes. It is preferable to provide two common measuring electrodes that can be used.
When the above-mentioned common measurement electrode is completed, the IC chip mounting area and the common measurement electrode are removed from the die when the continuity test is completed to create a device hole, or the common measurement electrode is removed by etching or the like. An interposer substrate in the product state is obtained.
[0013]
The interposer substrate continuity inspection method will be described below.
First, via holes are formed by laser processing or the like at predetermined positions on a copper foil of a copper-clad laminate in which a copper foil having a thickness of 12 μm is adhered to both surfaces of an insulating base material 11 made of a polyimide substrate having a thickness of 50 μm. Plating is performed to form a conductor layer and filled via 22 having a predetermined thickness, and a photoresist is applied on the conductor layer to form a photosensitive layer, and a series of patterning processes such as pattern exposure and development are performed to connect the substrate. The electrode 23, the common measurement electrodes 51 and 52, the wiring layer 21, the IC chip connection electrode 24, and the measurement wiring lead 25 are respectively formed, and after forming the solder resist pattern, nickel and gold plating are performed, and the insulating substrate 11 is formed. A two-metal BGA continuity test interposer substrate 50 having a substrate connection electrode 23 and common measurement electrodes 51 and 52 provided on the same surface is prepared (FIGS. 1A and 1B). And (c)).
Here, the common measurement electrodes 51 and 52 are formed in the IC chip mounting region, and the common measurement electrodes 51 and 52 are electrically connected to the IC chip connection electrode 24 via the measurement wiring lead 25 and the filled via 22. ing.
[0014]
Next, the measurement test probe 101 a substrate connection electrode 23 of the conductivity test for the interposer substrate 50 is pressed against the measurement test probe 102a and 102b to a common measuring electrode 51 and 52, the conduction of the wiring layer 21, the wiring layer 21 A short circuit is determined by the inspection apparatus 100 (see FIG. 2). Here, the measurement test probe 102a and 102b as it is, by sequentially moving the measurement test probe 101 a inspecting the continuity of all wiring layers.
[0015]
Hereinafter, a continuity inspection method for determining normality / abnormality of the continuity of the wiring layer and the short circuit between the wiring layers using two common measurement electrodes of the interposer substrate 50 for continuity inspection will be described.
Figure 3 is a disconnection in the wiring layers 21a and 21b, illustrates a case of the absence of a short circuit, the measurement test probe 101 a connected to the substrate connection electrode 23a, the measurement test probe 102a to a common measuring electrode 51, measured When the inspection probe 102b is connected to the common measurement electrode 52 and the continuity test is performed, the wiring layers 21a and 21b are not disconnected or short-circuited. Therefore, the short-circuit indicator lamp is turned off and the continuity indicator lamp is turned on, and the wiring layer 21a is displayed. The inspection device 100 determines that the continuity state is normal and the short circuit between the wiring layer 21a and the wiring layer 21b is normal (see FIG. 3). Furthermore, by sequentially moving the measurement test probe 101 a, performs a continuity test of the entire wiring layer.
[0016]
4, there is disconnection in the wiring layer 21a, shows the case of the absence of short circuit between the wiring layers 21a and and the wiring layer 21b, and connect the measurement test probe 101 a substrate connection electrode 23a, the measurement When the inspection probe 102a is connected to the common measurement electrode 51 and the measurement inspection probe 102b is connected to the common measurement electrode 52 to conduct the continuity test, the continuity indicator lamp is turned OFF, the short-circuit indicator lamp is turned OFF, and the wiring layer 21a is conductive. The inspection apparatus 100 determines that the state is abnormal and the short circuit between the wiring layer 21a and the wiring layer 21b is normal (see FIG. 4).
[0017]
Figure 5 is a short circuit between the wiring layers 21a and the wiring layer 21b, shows the wiring layers 21a and and examples of the absence of disconnection in the wiring layer 21b, the measurement test probe 101 a connected to the substrate connection electrode 23a When the measurement / inspection probe 102a is connected to the common measurement electrode 51 and the measurement / inspection probe 102b is connected to the common measurement electrode 52 to conduct the continuity test, the continuity indicator lamp is turned on and the short-circuit indicator lamp is turned on, and the wiring layer 21a is displayed. However, the inspection apparatus 100 determines that the conduction state is normal and the short circuit between the wiring layer 21a and the wiring layer 21b is abnormal (see FIG. 5).
[0018]
In this way, with respect to the continuity test interposer substrate 50 that has been determined to be non-defective after conducting the continuity test on all the wiring layers of the continuity test interposer substrate 50, the common measurement electrodes 51 and 52 in the IC chip mounting area, and the measurement wiring lead 25 The insulating base material formed with is punched with a mold to produce an interposer substrate 60 having a device hole 41 at the center as shown in FIGS. 6 (a), 6 (b) and 6 (c).
[0019]
【The invention's effect】
By applying the interposer substrate continuity inspection method of the present invention, it becomes possible to perform continuity inspection using a measurement probe on the same surface, and by providing a plurality of common measurement electrodes, the wiring layer of the interposer substrate It is possible to efficiently and accurately inspect the continuity and the short-circuit state between the wiring layers, and exhibit an excellent practical effect in the continuity inspection field.
[Brief description of the drawings]
FIG. 1A is a schematic plan view showing the surface of an example of an interposer substrate for continuity testing used in the interposer substrate continuity testing method of the present invention.
(B) is a schematic cross-sectional view of (a) cut along line AA ′.
(C) is a schematic top view which shows the back surface of an example of the interposer board | substrate for continuity inspection used for the continuity inspection method of the interposer board | substrate of this invention.
FIG. 2 is an explanatory diagram showing a state in which a continuity test is performed using a continuity test interposer substrate.
FIG. 3 is an explanatory diagram showing a state in which a continuity test is performed using a common measurement electrode and a substrate connection electrode.
FIG. 4 is an explanatory diagram showing a state in which a continuity test is performed using a common measurement electrode and a substrate connection electrode.
FIG. 5 is an explanatory diagram showing a state in which a continuity test is performed using a common measurement electrode and a substrate connection electrode.
FIG. 6A is a schematic plan view showing the surface of the interposer substrate in a state where the continuity test is completed and the common measurement electrode and the measurement wiring lead are removed.
(B) is a schematic cross-sectional view of (a) cut along line AA ′.
(C) is a schematic top view which shows the back surface of the interposer board | substrate which shows the state which complete | finished the conduction | electrical_connection test and removed the common measurement electrode and the measurement wiring lead.
[Explanation of symbols]
11 ... Insulating base material 21, 21a, 21b ... Wiring layer 22 ... Filled via 23, 23a, 23b ... Substrate connection electrode 24 ... IC chip connection electrode 25 ... Measurement wiring lead 41 ... Device hole 50 .. Interposer substrates 51 and 52 for continuity inspection... Common measurement electrode 60... Interposer substrate 100... Inspection devices 101 a , 102 a and 102 b.

Claims (2)

絶縁基材の一方の面に基板接続用電極が、他方の面に前記基板接続用電極とビア接続された配線層及びICチップ接続用電極が形成され、かつ、前記基板接続用電極はICチップ搭載領域より外側に配置されてなるインターポーザ基板の前記配線層の導通検査方法であって、前記絶縁基材の前記基板接続用電極と同一面のICチップ搭載領域に前記配線層とビア接続された共通測定電極を設けて、前記基板接続用電極と前記共通測定電極に測定検査プローブを押し当て、前記配線層の導通状態を検査するようにしたことを特徴とするインターポーザ基板の導通検査方法。A substrate connection electrode is formed on one surface of the insulating base, a wiring layer and an IC chip connection electrode connected to the substrate connection electrode and vias are formed on the other surface , and the substrate connection electrode is an IC chip A method for inspecting the continuity of the wiring layer of the interposer substrate disposed outside the mounting region, wherein the wiring layer and the via are connected to the IC chip mounting region on the same surface as the substrate connecting electrode of the insulating base. A method for inspecting the continuity of an interposer substrate, characterized in that a common measurement electrode is provided, a measurement inspection probe is pressed against the substrate connection electrode and the common measurement electrode, and the continuity state of the wiring layer is inspected. 前記共通測定電極が少なくとも2個以上設けられていることを特徴とする請求項1記載のインターポーザ基板の導通検査方法。  The interposer substrate continuity inspection method according to claim 1, wherein at least two of the common measurement electrodes are provided.
JP2002207870A 2002-07-17 2002-07-17 Interposer substrate continuity inspection method Expired - Fee Related JP4131137B2 (en)

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