JP4046884B2 - 位置計測方法および該位置計測法を用いた半導体露光装置 - Google Patents

位置計測方法および該位置計測法を用いた半導体露光装置 Download PDF

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Publication number
JP4046884B2
JP4046884B2 JP08405299A JP8405299A JP4046884B2 JP 4046884 B2 JP4046884 B2 JP 4046884B2 JP 08405299 A JP08405299 A JP 08405299A JP 8405299 A JP8405299 A JP 8405299A JP 4046884 B2 JP4046884 B2 JP 4046884B2
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JP08405299A
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JP2000275010A5 (https=
JP2000275010A (ja
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慎一郎 古賀
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Canon Inc
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Canon Inc
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Priority to JP08405299A priority Critical patent/JP4046884B2/ja
Priority to US09/533,690 priority patent/US6538260B1/en
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Publication of JP2000275010A5 publication Critical patent/JP2000275010A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

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  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP08405299A 1999-03-26 1999-03-26 位置計測方法および該位置計測法を用いた半導体露光装置 Expired - Fee Related JP4046884B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP08405299A JP4046884B2 (ja) 1999-03-26 1999-03-26 位置計測方法および該位置計測法を用いた半導体露光装置
US09/533,690 US6538260B1 (en) 1999-03-26 2000-03-23 Position measuring method, and semiconductor device manufacturing method and apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08405299A JP4046884B2 (ja) 1999-03-26 1999-03-26 位置計測方法および該位置計測法を用いた半導体露光装置

Publications (3)

Publication Number Publication Date
JP2000275010A JP2000275010A (ja) 2000-10-06
JP2000275010A5 JP2000275010A5 (https=) 2006-05-18
JP4046884B2 true JP4046884B2 (ja) 2008-02-13

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JP08405299A Expired - Fee Related JP4046884B2 (ja) 1999-03-26 1999-03-26 位置計測方法および該位置計測法を用いた半導体露光装置

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US (1) US6538260B1 (https=)
JP (1) JP4046884B2 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4178875B2 (ja) * 2002-08-22 2008-11-12 株式会社ニコン マーク位置検出装置、マーク位置検出方法、重ね合わせ測定装置、および、重ね合わせ測定方法
TWI236562B (en) * 2002-11-21 2005-07-21 Hitachi Int Electric Inc A method of detecting a pattern and an apparatus thereof
JP4101076B2 (ja) * 2003-02-06 2008-06-11 キヤノン株式会社 位置検出方法及び装置
US7728953B2 (en) * 2004-03-01 2010-06-01 Nikon Corporation Exposure method, exposure system, and substrate processing apparatus
WO2005083756A1 (ja) * 2004-03-01 2005-09-09 Nikon Corporation 事前計測処理方法、露光システム及び基板処理装置
JP4603814B2 (ja) * 2004-04-23 2010-12-22 キヤノン株式会社 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法
JP3962736B2 (ja) * 2004-10-08 2007-08-22 キヤノン株式会社 露光装置およびデバイス製造方法
US7702157B2 (en) * 2005-03-30 2010-04-20 Kabushiki Kaisha Toshiba Pattern evaluation method, pattern matching method and computer readable medium
JP5507875B2 (ja) 2009-04-14 2014-05-28 キヤノン株式会社 露光装置、露光方法およびデバイス製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5543921A (en) * 1989-05-08 1996-08-06 Canon Kabushiki Kaisha Aligning method utilizing reliability weighting coefficients
JP3634487B2 (ja) 1996-02-09 2005-03-30 キヤノン株式会社 位置合せ方法、位置合せ装置、および露光装置

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US6538260B1 (en) 2003-03-25
JP2000275010A (ja) 2000-10-06

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