JP3863786B2 - 半導体製造装置および半導体装置の製造方法 - Google Patents
半導体製造装置および半導体装置の製造方法 Download PDFInfo
- Publication number
- JP3863786B2 JP3863786B2 JP2002014962A JP2002014962A JP3863786B2 JP 3863786 B2 JP3863786 B2 JP 3863786B2 JP 2002014962 A JP2002014962 A JP 2002014962A JP 2002014962 A JP2002014962 A JP 2002014962A JP 3863786 B2 JP3863786 B2 JP 3863786B2
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- heater
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- manufacturing apparatus
- wafer
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002014962A JP3863786B2 (ja) | 2002-01-24 | 2002-01-24 | 半導体製造装置および半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002014962A JP3863786B2 (ja) | 2002-01-24 | 2002-01-24 | 半導体製造装置および半導体装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003218040A JP2003218040A (ja) | 2003-07-31 |
| JP2003218040A5 JP2003218040A5 (https=) | 2005-08-04 |
| JP3863786B2 true JP3863786B2 (ja) | 2006-12-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002014962A Expired - Lifetime JP3863786B2 (ja) | 2002-01-24 | 2002-01-24 | 半導体製造装置および半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3863786B2 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9018567B2 (en) * | 2011-07-13 | 2015-04-28 | Asm International N.V. | Wafer processing apparatus with heated, rotating substrate support |
| JP6605398B2 (ja) * | 2015-08-04 | 2019-11-13 | 株式会社Kokusai Electric | 基板処理装置、半導体の製造方法およびプログラム |
| TWI611043B (zh) | 2015-08-04 | 2018-01-11 | 日立國際電氣股份有限公司 | 基板處理裝置、半導體裝置之製造方法及記錄媒體 |
| KR102127130B1 (ko) * | 2017-02-17 | 2020-06-26 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 반도체 장치의 제조 방법 및 프로그램 |
| KR20190109216A (ko) * | 2018-03-15 | 2019-09-25 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치 및 반도체 장치의 제조 방법 |
| US10714362B2 (en) | 2018-03-15 | 2020-07-14 | Kokusai Electric Corporation | Substrate processing apparatus and method of manufacturing semiconductor device |
| JP7463211B2 (ja) * | 2020-06-26 | 2024-04-08 | 株式会社フェローテックマテリアルテクノロジーズ | 角度調整装置および回転伝達機構 |
| CN215925072U (zh) | 2020-09-24 | 2022-03-01 | 株式会社国际电气 | 基板处理装置 |
| US20250029848A1 (en) * | 2021-12-02 | 2025-01-23 | Acm Research (Shanghai), Inc. | High-temperature tube furnace |
-
2002
- 2002-01-24 JP JP2002014962A patent/JP3863786B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003218040A (ja) | 2003-07-31 |
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