JP3832914B2 - 電子ビーム露光装置及び該装置を用いたデバイス製造方法 - Google Patents

電子ビーム露光装置及び該装置を用いたデバイス製造方法 Download PDF

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Publication number
JP3832914B2
JP3832914B2 JP00544197A JP544197A JP3832914B2 JP 3832914 B2 JP3832914 B2 JP 3832914B2 JP 00544197 A JP00544197 A JP 00544197A JP 544197 A JP544197 A JP 544197A JP 3832914 B2 JP3832914 B2 JP 3832914B2
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Prior art keywords
electron
optical system
electron beam
electron optical
openings
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Expired - Fee Related
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JP00544197A
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Japanese (ja)
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JPH10208996A (ja
JPH10208996A5 (enrdf_load_stackoverflow
Inventor
真人 村木
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Canon Inc
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Canon Inc
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Priority to JP00544197A priority Critical patent/JP3832914B2/ja
Priority to US09/007,107 priority patent/US5981954A/en
Publication of JPH10208996A publication Critical patent/JPH10208996A/ja
Publication of JPH10208996A5 publication Critical patent/JPH10208996A5/ja
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JP00544197A 1997-01-16 1997-01-16 電子ビーム露光装置及び該装置を用いたデバイス製造方法 Expired - Fee Related JP3832914B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP00544197A JP3832914B2 (ja) 1997-01-16 1997-01-16 電子ビーム露光装置及び該装置を用いたデバイス製造方法
US09/007,107 US5981954A (en) 1997-01-16 1998-01-14 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00544197A JP3832914B2 (ja) 1997-01-16 1997-01-16 電子ビーム露光装置及び該装置を用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JPH10208996A JPH10208996A (ja) 1998-08-07
JPH10208996A5 JPH10208996A5 (enrdf_load_stackoverflow) 2004-11-11
JP3832914B2 true JP3832914B2 (ja) 2006-10-11

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JP00544197A Expired - Fee Related JP3832914B2 (ja) 1997-01-16 1997-01-16 電子ビーム露光装置及び該装置を用いたデバイス製造方法

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JP (1) JP3832914B2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104122758A (zh) * 2013-04-26 2014-10-29 佳能株式会社 绘画装置和物品的制造方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4756776B2 (ja) * 2001-05-25 2011-08-24 キヤノン株式会社 荷電粒子線露光装置、荷電粒子線露光方法およびデバイス製造方法
EP2302458B1 (en) * 2002-10-25 2016-09-14 Mapper Lithography Ip B.V. Lithography system
JP2006032613A (ja) * 2004-07-15 2006-02-02 Hitachi High-Technologies Corp 電子ビーム電流計測方法、電子ビーム描画方法および装置
JP2012238770A (ja) * 2011-05-12 2012-12-06 Canon Inc 静電レンズアレイ、描画装置、及びデバイスの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104122758A (zh) * 2013-04-26 2014-10-29 佳能株式会社 绘画装置和物品的制造方法
US9236224B2 (en) 2013-04-26 2016-01-12 Canon Kabushiki Kaisha Drawing apparatus and method of manufacturing article
CN104122758B (zh) * 2013-04-26 2017-04-12 佳能株式会社 绘画装置和物品的制造方法

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Publication number Publication date
JPH10208996A (ja) 1998-08-07

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