JP3791975B2 - ホモダイン干渉受信計及びその受信法 - Google Patents

ホモダイン干渉受信計及びその受信法 Download PDF

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Publication number
JP3791975B2
JP3791975B2 JP22409196A JP22409196A JP3791975B2 JP 3791975 B2 JP3791975 B2 JP 3791975B2 JP 22409196 A JP22409196 A JP 22409196A JP 22409196 A JP22409196 A JP 22409196A JP 3791975 B2 JP3791975 B2 JP 3791975B2
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spatially separated
component
phase
polarized
beams
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JPH09126900A (ja
JPH09126900A5 (https=
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デ グルート ピーター
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Zygo Corp
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Zygo Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J2009/0261—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods polarised

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Optical Communication System (AREA)
JP22409196A 1995-09-05 1996-08-26 ホモダイン干渉受信計及びその受信法 Expired - Fee Related JP3791975B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/523559 1995-09-05
US08/523,559 US5663793A (en) 1995-09-05 1995-09-05 Homodyne interferometric receiver and calibration method having improved accuracy and functionality

Publications (3)

Publication Number Publication Date
JPH09126900A JPH09126900A (ja) 1997-05-16
JPH09126900A5 JPH09126900A5 (https=) 2004-08-19
JP3791975B2 true JP3791975B2 (ja) 2006-06-28

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JP22409196A Expired - Fee Related JP3791975B2 (ja) 1995-09-05 1996-08-26 ホモダイン干渉受信計及びその受信法

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US (1) US5663793A (https=)
JP (1) JP3791975B2 (https=)
DE (1) DE19635907C2 (https=)

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AU2003234413A1 (en) * 2002-05-13 2003-11-11 Zygo Corporation Compensation for geometric effects of beam misalignments in plane mirror interferometers
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US7428685B2 (en) * 2002-07-08 2008-09-23 Zygo Corporation Cyclic error compensation in interferometry systems
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US7262860B2 (en) * 2002-07-29 2007-08-28 Zygo Corporation Compensation for errors in off-axis interferometric measurements
US7274462B2 (en) * 2002-09-09 2007-09-25 Zygo Corporation In SITU measurement and compensation of errors due to imperfections in interferometer optics in displacement measuring interferometry systems
US7321432B2 (en) * 2002-09-09 2008-01-22 Zygo Corporation Measurement and compensation of errors in interferometers
US7075619B2 (en) * 2002-12-12 2006-07-11 Zygo Corporation In-process correction of stage mirror deformations during a photolithography exposure cycle
WO2004113826A2 (en) * 2003-06-19 2004-12-29 Zygo Corporation Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers
US7327465B2 (en) * 2003-06-19 2008-02-05 Zygo Corporation Compensation for effects of beam misalignments in interferometer metrology systems
US7180603B2 (en) * 2003-06-26 2007-02-20 Zygo Corporation Reduction of thermal non-cyclic error effects in interferometers
US7057737B2 (en) * 2003-08-29 2006-06-06 4D Technology Corporation Common optical-path testing of high-numerical-aperture wavefronts
US7230717B2 (en) * 2003-08-28 2007-06-12 4D Technology Corporation Pixelated phase-mask interferometer
US7079251B2 (en) * 2003-10-16 2006-07-18 4D Technology Corporation Calibration and error correction in multi-channel imaging
WO2005045529A2 (en) * 2003-11-04 2005-05-19 Zygo Corporation Characterization and compensation of errors in multi-axis interferometry system
US7379190B2 (en) * 2004-01-05 2008-05-27 Zygo Corporation Stage alignment in lithography tools
WO2005067579A2 (en) * 2004-01-06 2005-07-28 Zygo Corporation Multi-axis interferometers and methods and systems using multi-axis interferometers
US7310152B2 (en) * 2004-03-03 2007-12-18 Zygo Corporation Interferometer assemblies having reduced cyclic errors and system using the interferometer assemblies
US7206069B2 (en) * 2004-03-29 2007-04-17 Lucent Technologies Inc. Optical analyzers of polarization properties
US7280224B2 (en) * 2004-04-22 2007-10-09 Zygo Corporation Interferometry systems and methods of using interferometry systems
US7375823B2 (en) * 2004-04-22 2008-05-20 Zygo Corporation Interferometry systems and methods of using interferometry systems
WO2006014406A2 (en) 2004-06-30 2006-02-09 Zygo Corporation Interferometric optical assemblies and systems including interferometric optical assemblies
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
US7433049B2 (en) * 2005-03-18 2008-10-07 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
US7508527B2 (en) 2005-04-11 2009-03-24 Zetetic Institute Apparatus and method of in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
JP2008541130A (ja) * 2005-05-18 2008-11-20 ゼテテック インスティテュート 光学系フレアを原位置および原位置以外で測定する装置および方法
WO2007019548A2 (en) * 2005-08-08 2007-02-15 Zetetic Institute Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry
WO2007025147A2 (en) * 2005-08-26 2007-03-01 Zetetic Institute Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry
WO2007059249A2 (en) * 2005-11-15 2007-05-24 Zetetic Institute Interferometer with coherent artifact reduction plus vibration and enviromental compensation
DE102007025037B3 (de) * 2007-05-29 2008-12-18 Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Technologie, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt Verfahren zum Ermitteln eines Frequenz- und/oder Phasenunterschieds
US7576868B2 (en) * 2007-06-08 2009-08-18 Zygo Corporation Cyclic error compensation in interferometry systems
US7821647B2 (en) * 2008-02-21 2010-10-26 Corning Incorporated Apparatus and method for measuring surface topography of an object
KR101335233B1 (ko) * 2009-01-28 2013-11-29 가부시키가이샤 코베루코 카겐 형상 측정 장치
WO2012106246A2 (en) 2011-02-01 2012-08-09 Zygo Corporation Interferometric heterodyne optical encoder system
CN102266116B (zh) * 2011-06-08 2014-03-26 广东中烟工业有限责任公司 一种再造烟叶及其制备方法和应用
KR101514679B1 (ko) * 2014-04-10 2015-04-24 한국표준과학연구원 상태 변분 원리를 이용한 진동 변위 측정 방법
IL275224B2 (en) 2017-12-13 2025-01-01 Asml Holding Nv Beam Splitting Prism Systems
US11262191B1 (en) 2018-07-12 2022-03-01 Onto Innovation Inc. On-axis dynamic interferometer and optical imaging systems employing the same
US12216051B2 (en) 2022-01-21 2025-02-04 Onto Innovation Inc. Dynamic phase-shift interferometer utilizing a synchronous optical frequency-shift
CN114719951A (zh) * 2022-03-01 2022-07-08 天津大学 适用于测量微振动的光学系统

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EP0561015A1 (de) * 1992-03-17 1993-09-22 International Business Machines Corporation Interferometrische Phasenmessung
US5243649A (en) * 1992-09-29 1993-09-07 The Johns Hopkins University Apparatus and method for quantum mechanical encryption for the transmission of secure communications
US5557399A (en) * 1995-03-22 1996-09-17 Zygo Corporation Optical gap measuring apparatus and method

Also Published As

Publication number Publication date
DE19635907C2 (de) 1999-02-18
JPH09126900A (ja) 1997-05-16
US5663793A (en) 1997-09-02
DE19635907A1 (de) 1997-03-06

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