JP3773139B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

Info

Publication number
JP3773139B2
JP3773139B2 JP08107597A JP8107597A JP3773139B2 JP 3773139 B2 JP3773139 B2 JP 3773139B2 JP 08107597 A JP08107597 A JP 08107597A JP 8107597 A JP8107597 A JP 8107597A JP 3773139 B2 JP3773139 B2 JP 3773139B2
Authority
JP
Japan
Prior art keywords
group
acid
groups
alkyl
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP08107597A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10274845A (ja
JPH10274845A5 (enrdf_load_stackoverflow
Inventor
利明 青合
敏 滝田
一也 上西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP08107597A priority Critical patent/JP3773139B2/ja
Priority to DE69800164T priority patent/DE69800164T2/de
Priority to US09/050,007 priority patent/US6037098A/en
Priority to EP98105753A priority patent/EP0869393B1/en
Priority to KR1019980011177A priority patent/KR100496174B1/ko
Publication of JPH10274845A publication Critical patent/JPH10274845A/ja
Publication of JPH10274845A5 publication Critical patent/JPH10274845A5/ja
Application granted granted Critical
Publication of JP3773139B2 publication Critical patent/JP3773139B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP08107597A 1997-03-31 1997-03-31 ポジ型感光性組成物 Expired - Fee Related JP3773139B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP08107597A JP3773139B2 (ja) 1997-03-31 1997-03-31 ポジ型感光性組成物
DE69800164T DE69800164T2 (de) 1997-03-31 1998-03-30 Positiv-arbeitende photoempfindliche Zusammensetzung
US09/050,007 US6037098A (en) 1997-03-31 1998-03-30 Positive photosensitive composition
EP98105753A EP0869393B1 (en) 1997-03-31 1998-03-30 Positive photosensitive composition
KR1019980011177A KR100496174B1 (ko) 1997-03-31 1998-03-31 포지티브감광성조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08107597A JP3773139B2 (ja) 1997-03-31 1997-03-31 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JPH10274845A JPH10274845A (ja) 1998-10-13
JPH10274845A5 JPH10274845A5 (enrdf_load_stackoverflow) 2004-10-07
JP3773139B2 true JP3773139B2 (ja) 2006-05-10

Family

ID=13736278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08107597A Expired - Fee Related JP3773139B2 (ja) 1997-03-31 1997-03-31 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP3773139B2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150122073A (ko) 2014-04-22 2015-10-30 신에쓰 가가꾸 고교 가부시끼가이샤 광 산발생제, 화학 증폭형 레지스트 재료 및 패턴 형성 방법

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002079691A1 (en) * 2001-03-30 2002-10-10 The Arizona Board Of Regents On Behalf Of The University Of Arizona Materials, methods, and uses for photochemical generation of acids and/or radical species
JP2003186197A (ja) * 2001-12-19 2003-07-03 Sony Corp レジスト材料及び露光方法
JP2003186198A (ja) * 2001-12-19 2003-07-03 Sony Corp レジスト材料及び露光方法
KR100881307B1 (ko) 2004-02-20 2009-02-03 도오꾜오까고오교 가부시끼가이샤 패턴 형성 재료용 기재, 포지티브형 레지스트 조성물 및레지스트 패턴 형성 방법
JP3946715B2 (ja) 2004-07-28 2007-07-18 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4468119B2 (ja) 2004-09-08 2010-05-26 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
JP4837323B2 (ja) * 2004-10-29 2011-12-14 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法および化合物
US7981588B2 (en) 2005-02-02 2011-07-19 Tokyo Ohka Kogyo Co., Ltd. Negative resist composition and method of forming resist pattern
JP4397834B2 (ja) * 2005-02-25 2010-01-13 東京応化工業株式会社 ポジ型レジスト組成物、レジストパターン形成方法および化合物
JP5138157B2 (ja) 2005-05-17 2013-02-06 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4813103B2 (ja) 2005-06-17 2011-11-09 東京応化工業株式会社 化合物、ポジ型レジスト組成物およびレジストパターン形成方法
JP4732038B2 (ja) 2005-07-05 2011-07-27 東京応化工業株式会社 化合物、ポジ型レジスト組成物およびレジストパターン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150122073A (ko) 2014-04-22 2015-10-30 신에쓰 가가꾸 고교 가부시끼가이샤 광 산발생제, 화학 증폭형 레지스트 재료 및 패턴 형성 방법
US9366958B2 (en) 2014-04-22 2016-06-14 Shin-Etsu Chemical Co., Ltd. Photoacid generator, chemically amplified resist composition, and patterning process

Also Published As

Publication number Publication date
JPH10274845A (ja) 1998-10-13

Similar Documents

Publication Publication Date Title
JP3587325B2 (ja) ポジ型感光性組成物
JP3613491B2 (ja) 感光性組成物
EP0869393B1 (en) Positive photosensitive composition
JP3679205B2 (ja) ポジ型感光性組成物
JP3591672B2 (ja) ポジ型感光性組成物
US6200729B1 (en) Positive photosensitive composition
EP0803775A1 (en) Positive working photosensitive composition
JPH0954437A (ja) 化学増幅型ポジレジスト組成物
JP3773139B2 (ja) ポジ型感光性組成物
JPH09309874A (ja) ポジ型感光性組成物
JP3802179B2 (ja) ポジ型フォトレジスト組成物
JPH1010715A (ja) ポジ型感光性組成物
JPH09258435A (ja) ポジ型感光性組成物
JPH11344808A (ja) ポジ型フォトレジスト組成物
JPH10123703A (ja) ポジ型感光性組成物
JP3778391B2 (ja) ポジ型感光性組成物
JP3890358B2 (ja) ポジ型感光性樹脂組成物及びパターン形成方法
JP3741330B2 (ja) ポジ型フォトレジスト組成物及びそれを用いるパターン形成方法
JPH1090882A (ja) 化学増幅型ポジレジスト組成物
JP3907135B2 (ja) ポジ型感光性組成物
JP4272805B2 (ja) ポジ型感放射線性組成物
JP3638068B2 (ja) ポジ型感光性組成物
JP3890375B2 (ja) ポジ型感光性組成物
JPH11153870A (ja) ポジ型感光性組成物
JP3746854B2 (ja) 感光性組成物

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050908

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050921

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20051107

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060208

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060210

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090224

Year of fee payment: 3

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090224

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090224

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090224

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100224

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100224

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110224

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees