JP3734009B2 - クロロシラン類中のボロン化合物の分離方法及びクロロシラン類蒸発用組成物 - Google Patents

クロロシラン類中のボロン化合物の分離方法及びクロロシラン類蒸発用組成物 Download PDF

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Publication number
JP3734009B2
JP3734009B2 JP17081799A JP17081799A JP3734009B2 JP 3734009 B2 JP3734009 B2 JP 3734009B2 JP 17081799 A JP17081799 A JP 17081799A JP 17081799 A JP17081799 A JP 17081799A JP 3734009 B2 JP3734009 B2 JP 3734009B2
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JP
Japan
Prior art keywords
chlorosilanes
boron
naf
single crystal
boron compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP17081799A
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English (en)
Japanese (ja)
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JP2001002407A (ja
Inventor
秀一 宮尾
網雄 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP17081799A priority Critical patent/JP3734009B2/ja
Priority to KR1020000033126A priority patent/KR100721090B1/ko
Priority to TW89111887A priority patent/TW572848B/zh
Publication of JP2001002407A publication Critical patent/JP2001002407A/ja
Application granted granted Critical
Publication of JP3734009B2 publication Critical patent/JP3734009B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10778—Purification
    • C01B33/10784—Purification by adsorption

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP17081799A 1999-06-17 1999-06-17 クロロシラン類中のボロン化合物の分離方法及びクロロシラン類蒸発用組成物 Expired - Fee Related JP3734009B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP17081799A JP3734009B2 (ja) 1999-06-17 1999-06-17 クロロシラン類中のボロン化合物の分離方法及びクロロシラン類蒸発用組成物
KR1020000033126A KR100721090B1 (ko) 1999-06-17 2000-06-16 클로로실란류 중의 붕소 화합물의 분리 방법 및클로로실란류 증발용 조성물
TW89111887A TW572848B (en) 1999-06-17 2000-06-16 Separation method of boron compound in chlorosilanes and composition for evaporating chlorosilanes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17081799A JP3734009B2 (ja) 1999-06-17 1999-06-17 クロロシラン類中のボロン化合物の分離方法及びクロロシラン類蒸発用組成物

Publications (2)

Publication Number Publication Date
JP2001002407A JP2001002407A (ja) 2001-01-09
JP3734009B2 true JP3734009B2 (ja) 2006-01-11

Family

ID=15911893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17081799A Expired - Fee Related JP3734009B2 (ja) 1999-06-17 1999-06-17 クロロシラン類中のボロン化合物の分離方法及びクロロシラン類蒸発用組成物

Country Status (3)

Country Link
JP (1) JP3734009B2 (zh)
KR (1) KR100721090B1 (zh)
TW (1) TW572848B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4588396B2 (ja) * 2003-09-25 2010-12-01 昭和電工株式会社 テトラフルオロシランの製造方法
JP4328303B2 (ja) * 2004-09-16 2009-09-09 株式会社サンリック 太陽光発電用多結晶シリコン原料および太陽光発電用シリコンウェーハ
JP4714196B2 (ja) 2007-09-05 2011-06-29 信越化学工業株式会社 トリクロロシランの製造方法および多結晶シリコンの製造方法
JP4659798B2 (ja) 2007-09-05 2011-03-30 信越化学工業株式会社 トリクロロシランの製造方法
JP4714198B2 (ja) 2007-09-05 2011-06-29 信越化学工業株式会社 クロロシラン類の精製方法
JP4714197B2 (ja) 2007-09-05 2011-06-29 信越化学工業株式会社 トリクロロシランの製造方法および多結晶シリコンの製造方法
JP5542026B2 (ja) 2010-10-27 2014-07-09 信越化学工業株式会社 クロロシラン類の精製方法
DE102014013250B4 (de) * 2014-09-08 2021-11-25 Christian Bauch Verfahren zur Aufreinigung halogenierter Oligosilane

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1088820B (it) 1977-12-05 1985-06-10 Smiel Spa Processo di purificazione di clorosilani impiegabili nella preparazione di silicio per elettronica
US4755370A (en) 1982-03-18 1988-07-05 General Electric Company Purification of silicon halides
JP2846408B2 (ja) * 1990-05-30 1999-01-13 川崎製鉄株式会社 シリコンの精製方法
JPH04300206A (ja) * 1991-03-28 1992-10-23 Osaka Titanium Co Ltd シリコン塩化物の精製方法

Also Published As

Publication number Publication date
KR100721090B1 (ko) 2007-05-23
TW572848B (en) 2004-01-21
JP2001002407A (ja) 2001-01-09
KR20010049557A (ko) 2001-06-15

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