JP3673608B2 - 電子ビーム照明装置及び該装置を備えた電子ビーム露光装置 - Google Patents

電子ビーム照明装置及び該装置を備えた電子ビーム露光装置 Download PDF

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Publication number
JP3673608B2
JP3673608B2 JP00544097A JP544097A JP3673608B2 JP 3673608 B2 JP3673608 B2 JP 3673608B2 JP 00544097 A JP00544097 A JP 00544097A JP 544097 A JP544097 A JP 544097A JP 3673608 B2 JP3673608 B2 JP 3673608B2
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Japan
Prior art keywords
electron
electron beam
optical system
light source
lenses
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Expired - Fee Related
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JP00544097A
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Japanese (ja)
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JPH10199469A (ja
JPH10199469A5 (enrdf_load_stackoverflow
Inventor
真人 村木
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Canon Inc
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Canon Inc
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Priority to JP00544097A priority Critical patent/JP3673608B2/ja
Priority to US09/007,107 priority patent/US5981954A/en
Publication of JPH10199469A publication Critical patent/JPH10199469A/ja
Publication of JPH10199469A5 publication Critical patent/JPH10199469A5/ja
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Publication of JP3673608B2 publication Critical patent/JP3673608B2/ja
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JP00544097A 1997-01-16 1997-01-16 電子ビーム照明装置及び該装置を備えた電子ビーム露光装置 Expired - Fee Related JP3673608B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP00544097A JP3673608B2 (ja) 1997-01-16 1997-01-16 電子ビーム照明装置及び該装置を備えた電子ビーム露光装置
US09/007,107 US5981954A (en) 1997-01-16 1998-01-14 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00544097A JP3673608B2 (ja) 1997-01-16 1997-01-16 電子ビーム照明装置及び該装置を備えた電子ビーム露光装置

Publications (3)

Publication Number Publication Date
JPH10199469A JPH10199469A (ja) 1998-07-31
JPH10199469A5 JPH10199469A5 (enrdf_load_stackoverflow) 2004-11-11
JP3673608B2 true JP3673608B2 (ja) 2005-07-20

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JP00544097A Expired - Fee Related JP3673608B2 (ja) 1997-01-16 1997-01-16 電子ビーム照明装置及び該装置を備えた電子ビーム露光装置

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JP (1) JP3673608B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001267221A (ja) * 2000-03-17 2001-09-28 Canon Inc 荷電粒子線露光装置及びデバイス製造方法
EP2019415B1 (en) * 2007-07-24 2016-05-11 IMS Nanofabrication AG Multi-beam source
JP7198092B2 (ja) * 2018-05-18 2022-12-28 株式会社ニューフレアテクノロジー マルチ電子ビーム照射装置、マルチ電子ビーム検査装置及びマルチ電子ビーム照射方法
CN118841298B (zh) * 2024-09-23 2025-01-17 季华恒一(佛山)半导体科技有限公司 一种聚焦束流自动调整系统、方法及离子注入机

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Publication number Publication date
JPH10199469A (ja) 1998-07-31

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