JP3413464B2 - Capacitance-type force sensor - Google Patents

Capacitance-type force sensor

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JP3413464B2
JP3413464B2 JP19864599A JP19864599A JP3413464B2 JP 3413464 B2 JP3413464 B2 JP 3413464B2 JP 19864599 A JP19864599 A JP 19864599A JP 19864599 A JP19864599 A JP 19864599A JP 3413464 B2 JP3413464 B2 JP 3413464B2
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electrode plate
movable electrode
portion
capacitance
force sensor
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JP2001027570A (en )
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和廣 岡田
森本  英夫
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ニッタ株式会社
株式会社ワコー
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【発明の詳細な説明】 【0001】 【発明の属する技術分野】この発明は、静電容量式力覚センサに関するものである。 BACKGROUND OF THE INVENTION [0001] [Technical Field of the Invention The present invention relates to a capacitance type force sensor. 【0002】 【従来の技術】静電容量式力覚センサとして、既に、図 2. Description of the Prior Art capacitance type force sensor, already Figure
12に示すようなものわが社で開発し、出願している。 One as shown in 12 developed by our company, have been filed. 【0003】この静電容量式力覚センサは、図12に示すように、固定電極群90aが形成された基板90と、全体が弾性を有するゴムにより成形され且つ少なくとも前記固定電極群90aと対向する面が導電性ゴムにより構成されている可動電極板91と、前記可動電極板91と一体成形されたシリコンゴム製の操作部92とを具備しており、前記固定電極群90aと可動電極板91とから複数の可変静電容量部93が構成されていると共に、前記操作部92に加えた力の大きさと方向に対応して各可変静電容量部93の静電容量が変化するようにしてある。 [0003] The capacitance type force sensor, as shown in FIG. 12, a substrate 90 fixed electrodes 90a are formed, the whole is molded by rubber having an elastic and at least the fixed electrodes 90a and opposed the movable electrode plate 91 which faces and is made of conductive rubber, the has and a movable electrode plate 91 and the operating portion 92 made of silicone rubber integrally molded, the fixed electrodes 90a and the movable electrode plate 91. with are configured a plurality of variable capacitance section 93, as the capacitance of the operating portion of the force applied to the 92 size and corresponding to the direction the variable capacitance section 93 changes and Aru. 【0004】この静電容量式力覚センサの構造を採用した場合、従来のセンサの如き面倒な組み立て作業が少なく且つ部品点数を増やすことなく容易に防水及び防塵対策ができるというメリットがある。 [0004] When employing the structure of the capacitive force sensor is advantageous in that it is easily waterproof and dustproof without such troublesome assembly work of the conventional sensor is small and increasing the number of components. 【0005】しかしながら、上記センサでは、操作部92 However, in the above sensor, the operation unit 92
に加えた力の一部が当該操作部3の弾性変形力に変換されてしまうことから可動電極板91の変形量が小さく、このため可変静電容量部93における静電容量の変化が少ないという問題が生じることが判った。 Small amount of deformation of the movable electrode plate 91 that some of the force applied to the thus converted into elastic deformation force of the operation unit 3, as this since the change in capacitance of the variable capacitance unit 93 is small a problem that has been found to occur. すなわち、このセンサは、操作部92に加えた力に対する感度が低いという問題ある。 That is, this sensor is a problem that sensitivity is low for a force applied to the manipulating unit 92. 【0006】 【発明が解決しようとする課題】そこで、この発明では、面倒な組み立て作業が少なく、部品点数を増やすことなく容易に防水及び防塵対策ができ、センサーとしての感度が高い静電容量式力覚センサを提供することを課題とする。 [0006] The present invention To solve the above problems, in this invention, less troublesome assembly work can easily be waterproof and dustproof without increasing the number of parts, the sensitivity of the sensor is high capacitive and to provide a force sensor. 【0007】 【課題を解決するための手段】(請求項1記載の発明) この発明の静電容量式力覚センサは、固定電極群が形成された基板と、平面視円形状のエラストマーの上下面中央部分に平面視円形状の凹みを設ける態様で、ダイヤフラム部を形成すると共に、少なくとも固定電極群と対向する部分を導電性エラストマーで形成してある可動電極板と、可動電極板と別体であると共に、下端から離れた位置に外周突出鍔を有し且つ上記ダイヤフラム部よりも剛性が大きい短軸状の操作部と、孔を有する上壁kを具備しており、前記可動電極板を基板と上壁とにより挟み込む態様で取り付けてあり、前記取り付け状態において、固定電極群が下側の凹み内に、操作部の外周突出鍔及びこれより下側部分が上側の凹み内に、それぞれ収容され [0007] SUMMARY OF THE INVENTION (the invention according to claim 1) capacitive force sensor of the present invention comprises a substrate group fixed electrode is formed, on the plan view circular elastomer in a manner to provide a circular in plan view of the recess in the bottom surface central portion, to form a diaphragm portion, and the movable electrode plate is formed with at least in a portion that faces the fixed electrode group with a conductive elastomer, the movable electrode plate and another member with it, the short shaft-like operating portion rigidity is larger than and the diaphragm portion has an outer peripheral projecting flange in a position at a distance from the lower end, and comprises a top wall k having a hole, said movable electrode plate It is attached in a manner sandwiching the substrate and the upper wall, in the mounted state, in the group fixed electrode lower recess, the outer peripheral projecting flange and a lower portion than that of the operation unit in the upper recess, accommodating respectively It is いると共に、孔Hから操作部の短軸部の上部が突出し且つ外周突出鍔の周縁上面が孔の構成壁下面と当接している。 Together are the peripheral upper surface of and the outer peripheral projecting flange upper projecting the minor axis portion of the operation portion from the hole H is in contact with the structure wall lower surface of the hole. (請求項2記載の発明) この発明の静電容量式力覚センサは、上記請求項1記載の発明に関し、操作部は、ゴム、樹脂又は金属により構成されている。 Capacitive force sensor (according the invention in claim 2, wherein) the invention relates to the invention of the first aspect, the operation unit, rubber, and is made of resin or metal. (請求項3記載の発明) この発明の静電容量式力覚センサは、上記請求項1又は2記載の発明に関し、固定電極群は、180°間隔で電極が配置されたものであり、二つの可変静電容量部での静電容量の変化により操作部に作用したX軸方向の力の大きさ及び正負方向が検出できるようにしてある。 Capacitive force sensor (according the invention in claim 3, wherein) the invention relates to the invention of the claim 1 or 2, wherein the fixed electrode group, which electrodes are arranged at 180 ° intervals, two One of the magnitude and the positive and negative directions of the X-axis direction force acting on the operating unit by a change in capacitance in the variable capacitance section are to be detected. (請求項4記載の発明) この発明の静電容量式力覚センサは、上記請求項1又は2記載の発明に関し、固定電極群は、90°間隔で電極が配置されたものであり、一方の直線上で対向する可変静電容量部の静電容量の変化により操作部に作用したX Capacitive force sensor (according the invention in claim 4, wherein) the invention relates to the invention of the claim 1 or 2, wherein the fixed electrode group, which electrodes are arranged at intervals of 90 °, whereas X acting on the operating unit by a change in capacitance of the variable capacitance portion facing in a straight line on the
軸方向の力の大きさ及び正負方向が検出でき、他方の直線上で対向する可変静電容量部の静電容量の変化により操作部に作用したY軸方向の力の大きさ及び正負方向が検出できるようにしてある。 Axial detectable size and the positive and negative directions of the forces, the magnitude and the positive and negative directions of the variable capacitance unit electrostatic Y-axis direction force acting on the operating unit by a change in capacitance of the opposing the other straight line It is to be able to detect. (請求項5記載の発明) この発明の静電容量式力覚センサは、上記請求項4記載の発明に関し、90°間隔で配置された四つの電極で囲まれた基板部分に独立する電極を形成してあり、前記した独立する電極と可動電極板とにより構成される可変静電容量部の静電容量の変化により操作部に作用したZ軸方向の力の大きさ及び正負方向が検出できるようにしてある。 Capacitive force sensor (claim 5 the invention described) This invention relates to the invention of the fourth aspect, the electrodes independently substrate portion surrounded by four electrodes arranged at intervals of 90 ° Yes formed, magnitude and positive or negative direction of the the independent electrodes and the movable electrode plate and the constructed variable capacitance unit electrostatic Z-axis direction force acting on the operating unit by a change in capacitance of detectable It is so. (請求項6記載の発明) この発明の静電容量式力覚センサは、上記請求項1乃至5のいずれかに記載の発明に関し、可動電極板には操作部を囲む態様で周凸部が形成されており、前記周凸部を取付部材に押圧する態様で可動電極板を取り付けたときには、周凸部の弾性復帰力により取付部材と可動電極板との間のシール性が確保されるようにしてある。 Capacitive force sensor (claim 6 invention described) This invention relates to the invention described in any one of the claims 1 to 5, the movable electrode plate peripheral protrusions in a manner surrounding the operating unit is formed and, when fitted with a movable electrode plate in a manner that presses the peripheral projections on the mounting member, the elastic restoring force of the circumferential projection part are as sealing between the mounting member and the movable electrode plate is secured. (請求項7記載の発明) この発明の静電容量式力覚センサは、上記請求項1記載の発明に関し、基板と可動電極板とを金属フレームで包み込むと共に前記金属フレームの一部を折り曲げて可動電極板が基板及び金属フレームに対して圧接する態様で固定してあり、前記可動電極板の弾性復帰力によって生じるシール性により可変静電容量部に異物が外部から侵入しないようにしてある。 Capacitive force sensor (according the invention in claim 7, wherein) the invention relates to the invention of the first aspect, the substrate and the movable electrode plate by bending a portion of said metal frame with wrap a metal frame movable electrode plate Yes fixed in a manner to be pressed against the substrate and the metal frame, the foreign matter to the variable capacitance unit by sealing property caused by the elastic restoring force of the movable electrode plate are to not penetrate from the outside. (請求項8記載の発明) この発明の静電容量式力覚センサは、上記請求項7記載の発明に関し、金属フレームが導電性を有するものであり、前記金属フレームを介して可動電極板を特定の電圧に保持するようにしてある。 Capacitive force sensor (according the invention in claim 8, wherein) the invention relates to the invention of the seventh aspect, which metal frame is electrically conductive, the movable electrode plate via the metallic frame It is to be held at a particular voltage. (請求項9記載の発明) この発明の静電容量式力覚センサは、上記請求項1乃至8のいずれかに記載の発明に関し、基板又は可動電極板の対向面のうち少なくともいずれか一方に、固定電極板と可動電極板との間の間隙があまり小さくならないようにする突起を設けてある。 Capacitive force sensor (according the invention in claim 9, wherein) the invention relates to the invention described in any one of the claims 1 to 8, on at least one of the opposing surfaces of the substrate or the movable electrode plate , the gap between the fixed electrode plate and the movable electrode plate is provided with protrusions to avoid too small. (請求項10記載の発明) この発明の静電容量式力覚センサは、上記請求項5記載の発明に関し、90°間隔で配置された四つの電極で囲まれた基板部分に独立する接点用ランドを形成すると共に、前記接点用ランドと対向する可動電極板部分に電気接点となる突起を形成し、前記突起と接点用ランドとによりスイッチを構成させてある。 Capacitive force sensor (claim 10 the invention described) This invention relates to the invention of the fifth aspect, for contact to separate the substrate portion surrounded by four electrodes arranged at intervals of 90 ° to form a land, said the electrical contact projection formed on the contact lands and the opposing movable electrode plate portions, are to constitute the switch by said projection and the contact lands. 【0008】なお、上記発明の静電容量式力覚センサの機能については、以下の発明の実施の形態の欄で詳述する。 [0008] Incidentally, the function of the capacitive force sensor of the invention will be described in detail in the section of the embodiment of the invention that follows. 【0009】 【発明の実施の形態】以下、この発明を実施例として示した図面に従って説明する。 DETAILED DESCRIPTION OF THE INVENTION Hereinafter, will be explained with reference to the drawings showing the invention as an example. (実施形態1)図1は、この発明の実施形態1の静電容量式力覚センサSの断面図を示している。 (Embodiment 1) FIG. 1 shows a sectional view of a capacitance type force sensor S according to the first embodiment of the present invention. 【0010】この静電容量式力覚センサSは、基本的には図1に示すように、基板1と、前記基板1上に配置された可動電極板2と、前記可動電極板2上に配置され且つ可動電極板2に力を伝達できる硬質性の操作部3を具備するものであり、同図に示す如く最下位置にある基板1をケーシングKの上壁kにビスBにより取り付けるようにして形成されている。 [0010] The capacitance type force sensor S, as is basically shown in FIG. 1, a substrate 1, and the movable electrode plate 2 disposed on the substrate 1, on the movable electrode plate 2 is intended to include a rigid property of the operation unit 3 disposed possible and transmit force to the movable electrode plate 2, as the substrate 1 in the lowest position as shown in FIG attached by screws B into the wall k on the casing K It is formed in to. 【0011】基板1は、図1や図2に示すように、その上面に円環状の接点用ランドL、及びレジスタ膜Rで覆われた固定電極Dx+,Dx−,Dy+,Dy−,Dz [0011] substrate 1, as shown in FIGS. 1 and 2, the contact lands L annular in its upper surface, and the fixed electrodes Dx covered by the register layer R +, Dx-, Dy +, Dy-, Dz
+が形成されていると共に、下面に静電容量/電圧変換用の電子部品Eが配置されており、また、四隅には上記ビスBを挿通するための貫通孔hを穿設してある。 + With is formed, the lower surface are arranged electronic components E of the capacitance / voltage conversion, the addition, the four corners are drilled through holes h for inserting the screws B. なお、固定電極Dx+,Dx−,Dy+,Dy−,Dz+ The fixed electrode Dx +, Dx-, Dy +, Dy-, Dz +
をレジスト膜Rで覆ってあるのは、後述する可動電極板2と直接接触するようなことがないようにするためである。 From are covered with the resist film R is so that there is no such thing as direct contact with the movable electrode plate 2 to be described later. 【0012】可動電極板2は、平面視円形状の導電性を付加したシリコンゴムにより成形されており、図1に示すように、上下の中央部分に、レジスト膜Rで覆われた部分が入る程度の大きさの円形状の凹み20,21を設ける態様で、ダイヤフラム部22を形成してある。 [0012] The movable electrode plate 2 is formed by silicone rubber obtained by adding a circular in plan view of the conductive, as shown in FIG. 1, the central portion of the upper and lower, entering the portions covered by the resist film R on the order of magnitude of the embodiments providing a circular recess 20, 21, it is formed a diaphragm portion 22. そして、この可動電極板2は図1に示すように、これの外周部付近の周凸部29が、ケーシングKの上壁kと基板1とにより挟圧保持(両方から押圧力が作用した状態での保持)される態様で設置されている。 Then, as shown in the movable electrode plate 2 is 1, the circumferential protrusion 29 of the vicinity of the outer peripheral portion of this is, in a state where the pressing force is applied from the clamp holding (both by the walls k and the substrate 1 on the casing K It is installed in a manner to be retained). なお、この実施形態では可動電極板2をシリコンゴムで構成しているが、これに限定されることなく、常温付近で大きなゴム弾性を示す高分子物質(エラストマー)であればよく、例えば、架橋した天然ゴムや合成ゴム、熱可塑性ウレタンゴム、スパンデックスやポリカーボネート弾性樹脂、スポンジゴムなどが採用できる。 Although constitute the movable electrode plate 2 of silicon rubber in this embodiment, without being limited thereto, it may be a polymer material showing a large rubber elasticity at about room temperature (elastomers), such as crosslinked and natural rubber, synthetic rubber, thermoplastic urethane rubber, spandex or polycarbonate elastic resin, such as sponge rubber can be employed. 【0013】操作部3は、図1に示すように、硬質樹脂により形成された短軸状のもので、下端近傍には外周突出鍔30を具備するものとしてある。 [0013] Operation unit 3, as shown in FIG. 1, be of like short axis formed by a hard resin, is near the lower end there as comprising an outer projecting flange 30. そして、この操作部3は、図1に示すように、これの軸下端と凹み20の底面とが、外周突出鍔30と上壁kとが、それぞれ当接する態様で、可動電極板2と上壁kとの間に挟み込まれている。 Then, the operation unit 3, as shown in FIG. 1, and the 20 bottom recess and this axial lower end, and the outer peripheral projecting flange 30 and the upper wall k, respectively abutting manner, the movable electrode plate 2 and the upper It is sandwiched between the wall k. なお、この操作部3に適用できる材料としては、可動電極板2のダイヤフラム部22よりも剛性が大きいものであればゴムであっても使用でき、当然として金属も使用できる。 As the material that can be applied to the operation portion 3, as long as rigidity is greater than the diaphragm portion 22 of the movable electrode plate 2 even rubber can be used, of course a metallized can be used. 【0014】なお、図1に示すように、上記可動電極板2は操作部3に力を加えるとダイヤフラム部22に応力が集中して変形する起歪体を形成しており、可動電極板2 [0014] Incidentally, as shown in FIG. 1, the movable electrode plate 2 forms a flexure element that stress on the diaphragm portion 22 when a force to the operating unit 3 is deformed concentrated, the movable electrode plate 2
の固定電極と対向する部分は、後述するように固定電極Dx+,Dx−,Dy+,Dy−,Dz+との関係で可変静電容量部Cx+,Cx−,Cy+,Cy−,Cz+ Fixed electrode facing the portion of the fixed electrode Dx + as described later, Dx-, Dy +, Dy-, Dz + variable capacitance unit in relation to the Cx +, Cx-, Cy +, Cy-, Cz +
を構成する電極Dとして機能するものとしてある。 There as functions as an electrode D which constitutes the. 【0015】ここで、図1に示す如く静電容量式センサSをケーシングKへ取り付けた状態では、以下に示す機能が発揮されている。 [0015] Here, in the state in which the capacitive sensor S attached to the casing K as shown in FIG. 1, functions described below are exerted. 可動電極板2の周凸部29が、ケーシングKの上壁kと基板1とにより挟圧保持される態様で設置されていることから、基板1と下側の周凸部29との圧接により可変静電容量部Cx+,Cx−,Cy+,Cy−,Cz+への液体やゴミの侵入が阻止(シール性が発揮)されていると共に、上壁kの下面と上側の周凸部29との圧接により上壁kに形成された孔Hからの液体やゴミの侵入が阻止(シール性が発揮)されている。 Circumferential projection part 29 of the movable electrode plate 2, because it is installed in the manner clamp held by the wall k and the substrate 1 on the casing K, variable capacitance by pressure contact with the circumferential protrusion 29 of the substrate 1 and the lower part Cx +, Cx-, Cy +, Cy-, with penetration of liquid or dust into Cz + is blocked (sealing property exhibited), the upper wall k by pressure contact with the circumferential protrusion 29 of the lower surface and the upper top wall k penetration of liquid or dust from the formed hole H is blocked (sealing property exhibited). 上記した可動電極板2の周凸部29と接点用ランドLとの圧接により可動電極板2がGND電位となる。 The movable electrode plate 2 becomes GND potential by pressure contact with the circumferential protrusion 29 and the contact land L of the movable electrode plate 2 described above. よって、接点用ランドLと固定電極Dx+,Dx−,Dy Therefore, the fixed electrode and the contact land L Dx +, Dx-, Dy
+,Dy−,Dz+との間に電位差を設けることにより可変静電容量部Cx+,Cx−,Cy+,Cy−,Cz +, Dy-, Dz + variable capacitance by providing a potential difference between the portions Cx +, Cx-, Cy +, Cy-, Cz
+とを発生させることができる。 + And it can be generated. 可動電極板2及び操作部3を上板kと基板1との間で挟み込み、前記上板kに基板1をビスBで止めるだけで簡単に組み上がる。 Sandwiching the movable electrode plate 2 and the operation unit 3 between the upper plate k and the substrate 1, the only easily assembled with up stopping the substrate 1 to the upper plate k with screws B. 【0016】この静電容量式力覚センサSは上記のような構成であるから、操作部3を操作すると以下に示すように機能する。 [0016] Since the capacitance type force sensor S is a structure as described above, functions as follows and operates the operation section 3. 【0017】このセンサSでは、操作部3に力を加えると可動電極2のダイヤフラム部22は変形することとなるが、操作部3は可動電極板2に比べて剛性が大きいので、操作部3に加えた力はダイヤフラム部22に効率良く伝達される。 [0017] In the sensor S, but when a force in the operation unit 3 diaphragm portion 22 of the movable electrode 2 so that the deformed, since the operation unit 3 is high rigidity as compared with the movable electrode plate 2, the operation unit 3 force applied to is efficiently transmitted to the diaphragm portion 22. したがって、当該ダイヤフラム部22は大きく変形し、電極Dとして機能するダイヤフラム部22と固定電極Dx+,Dx−,Dy+,Dy−,Dz+により形成される可変静電容量部Cx+,Cx−,Cy+,C Therefore, the diaphragm portion 22 is greatly deformed, the diaphragm portion 22 which functions as an electrode D fixed electrode Dx +, Dx-, Dy +, Dy-, Dz + variable capacitance portion is formed by Cx +, Cx-, Cy +, C
y−,Cz+の静電容量が大きく変化することになる。 y-, so that the capacitance of Cz + greatly changes. 【0018】ここで、操作部3に傾倒する力が加わると、図3に示すように、電極Dとして機能するダイヤフラム部22と固定電極Dx+との間のギャップが小さくなり、可変静電容量部Cx+の静電容量は増加する。 [0018] Here, the force of tilting the operation unit 3 is applied, as shown in FIG. 3, the gap between the diaphragm portion 22 and the fixed electrode Dx + functioning as an electrode D is reduced, the variable capacitance unit capacitance of Cx + is increased. これに対して、電極Dと固定電極Dx−との間のギャップは増加又は減少するが、その変化量は電極Dと固定電極D In contrast, although the gap between the electrode D and the fixed electrode Dx- increases or decreases, the fixed electrode D the amount of change to the electrode D
x+との間の変化に比べて小さく可変静電容量部Cx− Small variable capacitance unit as compared to the change between the x + CX-
の静電容量の変化量は少ない。 The amount of change in the capacitance is small. 更に、この場合において、電極Dと固定電極Dz+との間のギャップは小さくなるので、可変静電容量部Cz+の静電容量は大きくなる。 Further, in this case, since the gap between the electrode D fixed electrode Dz + becomes smaller, the variable capacitance unit Cz + capacitance of increases. 【0019】また、操作部3を押し込む方向に力を加えると、図4に示すように、電極Dと固定電極Dz+との間のギャップは小さくなるため、可変静電容量部Cz+ Further, when a force in a direction to push the operation portion 3, as shown in FIG. 4, since the gap between the electrode D fixed electrode Dz + becomes smaller, the variable capacitance unit Cz +
の静電容量は大きくなる。 Capacitance is large. 同様に、電極Dと固定電極D Similarly, electrode D and the fixed electrode D
x+,Dx−,Dy+,Dy−との間のギャップは等しく小さくなり、それに応じて可変静電容量部Cx+,C x +, Dx-, Dy +, equally reduces the gap between the Dy-, variable capacitance unit Cx + accordingly, C
x−,Cy+,Cy−は大きくなる。 x-, Cy +, Cy- increases. 【0020】この静電容量式力覚センサSでは、複数の電子部品Eにより構成された図5に示すような回路(ブロック図)を具備させてあり、可変静電容量部Cx+, [0020] In the capacitance type force sensor S, Yes by comprising a circuit as shown in FIG. 5, which is constituted by a plurality of electronic components E (block diagram), a variable capacitance unit Cx +,
Cx−,Cy+,Cy−,Cz+の静電容量の変化から操作部3に加えた力の大きさと方向を電圧出力(Vx, Cx-, Cy +, Cy-, Cz of the force applied to the operating unit 3 from the change in capacitance + magnitude and direction voltage output (Vx,
Vy,Vz)として検出できるようにしてある。 Vy, are to be detected as Vz). なお、 It should be noted that,
図5中、符号Cz−で示されたものはダミーの固定容量であるが、この固定容量Cz−の存在は絶対条件ではない。 In FIG. 5, but those designated Cz- is a fixed capacitance of the dummy, the presence of the fixed capacity Cz- is not an absolute requirement. また、図5中の点線で囲まれた部分を定電圧源に置き替えても良い。 It may also be replaced with a portion surrounded by a dotted line in FIG. 5 to a constant voltage source. 【0021】図6に、図5の回路と対応する具体的な回路を示す(Y軸及びZ軸の回路は省略している)。 [0021] FIG. 6, concrete shows a circuit corresponding to the circuit of FIG. 5 (circuit of the Y-axis and Z-axis is omitted). 図6 Figure 6
中、符号R1, R2, R3は固定抵抗、符号EXは排他的論理回路、符号C1は固定容量を示している。 Among numeral R1, R2, R3 are fixed resistors, reference numeral EX exclusive logic circuit, reference numeral C1 denotes a fixed displacement. (実施形態2)この実施形態2の静電容量式力覚センサSは上記実施形態1のそれとほぼ同様の構成としてあるが、図7に示すように、ダイヤフラム部22の中央に突起 (Embodiment 2) capacitive force sensor S of this embodiment 2 is one as substantially the same structure as that of the first embodiment, as shown in FIG. 7, the projection in the center of the diaphragm portion 22
23を垂下させてあると共に、前記突起23の下端をレジスト膜Rに当接(近接)させてある。 23 together are to drooping, are brought into contact (close) the lower end of the projection 23 to the resist film R. 【0022】したがって、可動電極板2をシリコンゴムにより構成しているため実施形態1のセンサSではX軸及びY軸方向の感度に対してZ軸方向の感度が大きすぎるものとなっているが、この実施形態2のセンサSでは突起23の存在によりZ軸方向の感度を抑えたものに調整されたものになっている。 [0022] Thus, although it is assumed sensitivity of the Z-axis direction movable electrode plate 2 to the sensor X axis and the Y-axis direction of the sensitivity in the S of the first embodiment because of the arrangement of silicon rubber is too large It has become those adjusted to those with reduced sensitivity in the Z-axis direction by the presence of the sensor S in the projection 23 of the second embodiment. (実施形態3)この実施形態3の静電容量式力覚センサSは上記実施形態1のそれとほぼ同様の構成としてあるが、操作部3を、図8に示すように、ダイヤフラム部22 (Embodiment 3) Although the capacitance type force sensor S of this embodiment 3 is the substantially the same structure as that of the first embodiment, the operating unit 3, as shown in FIG. 8, the diaphragm portion 22
の上面に軸状の突起24を設けると共に前記突起24にキャップ31を接着するようにして構成してある。 Of the upper surface to provide a shaft-like projections 24 are configured so as to bond the cap 31 to the projection 24. (実施形態4)この実施形態4の静電容量式力覚センサSは上記実施形態1のそれとほぼ同様の構成としてあるが、操作部3を、図9に示すように、背の低い押しボタンにしたものである。 Although Embodiment 4 capacitive force sensor S of this embodiment 4 is as substantially the same structure as that of the first embodiment, the operating unit 3, as shown in FIG. 9, shorty push button it is obtained by the. (実施形態5)この実施形態5の静電容量式力覚センサSは単独での組み立てを考慮したものであり、図10や図 (Embodiment 5) capacitive force sensor S of this embodiment 5 is obtained by considering the assembly alone, FIGS. 10 and
11に示すように、基板1に可動電極板2と操作部3とを積み上げる態様で金属フレームF内に収容すると共に、 As shown in 11, while housed in the metal frame F in a manner that pile up on the substrate 1 and the movable electrode plate 2 and the operation unit 3,
前記金属フレームFにおける上壁f1と折曲片f2とにより基板1と可動電極板2と操作部3とを積層した状態で挟圧保持したものである。 It is obtained by nipping held in a state of laminating the upper wall f1 and bent pieces f2 by the substrate 1 and the movable electrode plate 2 and the operation portion 3 in the metal frame F. なお、図10中、符号f3で示されているのはハンダ付きリード端子であり、これを介して可動電極板2と電気的接続状態である接点用ランドLと固定電極Dx+,Dx−,Dy+,Dy−との間に電位差が付与されている。 In FIG. 10, what is indicated by reference numeral f3 is solder with lead terminals, + contact land L and the fixed electrode Dx is electrically connected state and the movable electrode plate 2 through which, Dx-, Dy + , the potential difference is applied between the Dy-. (その他の実施形態) 基板1又は可動電極板2の対向面のうち少なくともいずれか一方に、固定電極と可動電極板2との間の間隙があまり小さくならないようにする突起を設けるようにすることができる。 To either at least one of (Other Embodiments) facing surface of the substrate 1 or the movable electrode plate 2, the gap between the stationary electrode and the movable electrode plate 2 is to provide a projection to avoid too small can. 90°間隔で配置された固定電極Dx+,Dx−,D Fixed electrode is arranged at 90 ° intervals Dx +, Dx-, D
y+,Dy−で囲まれた基板1部分に独立する接点用ランドを形成すると共に、前記接点用ランドと対向する可動電極板2部分に電気接点となる突起を形成し、前記突起と接点用ランドとによりスイッチを構成させるようにすることができる。 y +, to form the contact lands which separate the substrate 1 portion surrounded by Dy-, to form a protrusion serving as electrical contacts to the movable electrode plate 2 portion facing the contact lands, the projection and the contact lands It may be so as to constitute the switch by the. 【0023】 【発明の効果】この発明は上記のような構成であるから次の効果を有する。 [0023] [Effect of the Invention] Since this invention is configured as described above has the following advantages. 【0024】発明の実施形態の欄の説明から明らかなように、面倒な組み立て作業が少なく、部品点数を増やすことなく容易に防水及び防塵対策ができ、センサーとしての感度が高い静電容量式力覚センサを提供できた。 [0024] As apparent from the description of the column of the embodiment of the invention, less troublesome assembly work, the number of parts can easily waterproof and dustproof without increasing capacitance type force sensitive as a sensor We were able to provide an objective sensor.

【図面の簡単な説明】 【図1】この発明の実施形態1の静電容量式力覚センサの断面図。 BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view of a capacitive force sensor according to the first embodiment of the present invention. 【図2】前記静電容量式力覚センサを構成する基板上に形成されている固定電極及び接点用ランドの平面図。 Figure 2 is a plan view of a fixed electrode and contact lands are formed on a substrate constituting the capacitive force sensor. 【図3】前記静電容量式力覚センサの操作部をX軸方向に傾倒させた状態を示す断面図。 3 is a cross-sectional view showing a state where the operating portion of the capacitive force sensor is tilted in the X-axis direction. 【図4】前記静電容量式力覚センサの操作部をZ軸方向に押し込んだ状態を示す断面図。 4 is a cross-sectional view showing a state where pushing the operating portion of the capacitive force sensor in the Z axis direction. 【図5】前記静電容量式力覚センサに採用されている静電容量−電圧変換回路のブロック図。 [5] The electrostatic capacitance is adopted in the capacitive force sensor - block diagram of a voltage conversion circuit. 【図6】前記静電容量−電圧変換回路の具体的回路。 [6] The capacitance - specific circuit of the voltage conversion circuit. 【図7】この発明の実施形態2の静電容量式力覚センサの断面図。 7 is a cross-sectional view of a capacitance type force sensor according to the second embodiment of the present invention. 【図8】この発明の実施形態3の静電容量式力覚センサの断面図。 Figure 8 is a cross-sectional view of the capacitance type force sensor according to the third embodiment of the present invention. 【図9】この発明の実施形態4の静電容量式力覚センサの断面図。 Figure 9 is a cross-sectional view of a capacitance type force sensor of the fourth embodiment of the present invention. 【図10】この発明の実施形態5の静電容量式力覚センサの断面図。 Figure 10 is a cross-sectional view of a capacitance type force sensor according to Embodiment 5 of the present invention. 【図11】この発明の実施形態5の静電容量式力覚センサの外観斜視図。 [11] external perspective view of a capacitive force sensor according to Embodiment 5 of the present invention. 【図12】先行技術の静電容量式力覚センサの断面図。 Figure 12 is a cross-sectional view of a capacitance type force sensor of the prior art. 【符号の説明】 S 静電容量式力覚センサD 可動電極板Dx+ 固定電極板Dx− 固定電極板Dy+ 固定電極板Dy− 固定電極板Dz− 固定電極板Cx+ 固定電極板Cx− 固定電極板Cy+ 固定電極板Cy− 固定電極板Cz− 固定電極板1 基板2 可動電極板3 操作部 [Reference Numerals] S capacitive force sensor D movable electrode plate Dx + fixed electrode plate Dx- fixed electrode plate Dy + fixed electrode plate Dy- fixed electrode plate Dz- fixed electrode plate Cx + fixed electrode plate Cx- fixed electrode plate Cy + the fixed electrode plate Cy- fixed electrode plate Cz- fixed electrode plate 1 substrate 2 movable electrode plate 3 operating unit

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開2000−193538(JP,A) 特開2000−292271(JP,A) 特開 平7−200164(JP,A) 特開 平6−324801(JP,A) 特開 平7−151623(JP,A) 特開 平9−265347(JP,A) (58)調査した分野(Int.Cl. 7 ,DB名) G01L 1/14 G01L 5/16 G06F 3/033 330 ────────────────────────────────────────────────── ─── of the front page continued (56) reference Patent 2000-193538 (JP, a) JP 2000-292271 (JP, a) JP flat 7-200164 (JP, a) JP flat 6-324801 ( JP, a) JP flat 7-151623 (JP, a) JP flat 9-265347 (JP, a) (58 ) investigated the field (Int.Cl. 7, DB name) G01L 1/14 G01L 5/16 G06F 3/033 330

Claims (1)

  1. (57)【特許請求の範囲】 【請求項1】 固定電極群が形成された基板と、平面視円形状のエラストマーの上下面中央部分に平面視円形状の凹みを設ける態様で、ダイヤフラム部を形成すると共に、少なくとも固定電極群と対向する部分を導電性エラストマーで形成してある可動電極板と、可動電極板と別体であると共に、下端から離れた位置に外周突出鍔を有し且つ上記ダイヤフラム部よりも剛性が大きい短軸状の操作部と、孔を有する上壁を具備しており、前記可動電極板を基板と上壁とにより挟み込む態様で取り付けてあり、前記取り付け状態において、固定電極群が下側の凹み内に、操作部の外周突出鍔及びこれより下側部分が上側の凹み内に、それぞれ収容されていると共に、孔から操作部の短軸部の上部が突出し且つ外周突出鍔の周 (57) and the substrate [Claims 1. A fixed electrode group is formed, in a manner to provide a circular in plan view of the recess in the upper and lower surfaces a central portion of the circular shape in plan view of the elastomer, the diaphragm portion and forming a movable electrode plate is formed with at least in a portion that faces the fixed electrode group with a conductive elastomer, as well as a movable electrode plate and another member, and has an outer peripheral projecting flange at a position away from the lower end the and a minor axis like operating portion rigidity is larger than the diaphragm portion, and comprises a top wall having a hole, said movable electrode plate is attached in a manner sandwiching the substrate and the upper wall, in the mounted state, fixed into the recess electrode group is lower, in recessed outer peripheral projecting flange and a lower portion than that of the operation section of the upper, together are accommodated, respectively, protruding upper portion of the minor axis portion of the operation portion from the hole and the outer periphery circumference of the projecting collar 上面が孔の構成壁下面と当接していることを特徴とする静電容量式力覚センサ。 Capacitive force sensor having an upper surface, characterized in that is in contact with the structure wall lower surface of the hole. 【請求項2】 操作部は、ゴム、樹脂又は金属により構成されていることを特徴とする請求項1記載の静電容量式力覚センサ。 Wherein the operation unit, capacitive force sensor according to claim 1, characterized in that it is constituted rubber, a resin or a metal. 【請求項3】 固定電極群は、180°間隔で電極が配置されたものであり、二つの可変静電容量部での静電容量の変化により操作部に作用したX軸方向の力の大きさ及び正負方向が検出できるようにしてあることを特徴とする請求項1又は2記載の静電容量式力覚センサ。 3. A stationary electrode group, which electrodes are arranged at 180 ° intervals, the X-axis direction force acting on the operating unit by a change in capacitance at the two variable capacitance unit size and capacitive force sensor of claim 1 or 2, wherein the positive and negative directions are to be detected. 【請求項4】 固定電極群は、90°間隔で電極が配置されたものであり、一方の直線上で対向する可変静電容量部の静電容量の変化により操作部に作用したX軸方向の力の大きさ及び正負方向が検出でき、他方の直線上で対向する可変静電容量部の静電容量の変化により操作部に作用したY軸方向の力の大きさ及び正負方向が検出できるようにしてあることを特徴とする請求項1又は2記載の静電容量式力覚センサ。 4. A fixed electrode group has been arranged an electrode at intervals of 90 °, X-axis direction acts on the operation unit by a change in capacitance of the variable capacitance portion facing in one straight line force magnitude and positive and negative directions can be detected, it can be detected magnitude and the positive and negative directions of the force of the Y-axis direction acts on the operation unit by a change in capacitance of the variable capacitance portion facing the other straight line capacitive force sensor of claim 1, wherein that you have manner. 【請求項5】 90°間隔で配置された四つの電極で囲まれた基板部分に独立する電極を形成してあり、前記した独立する電極と可動電極板とにより構成される可変静電容量部の静電容量の変化により操作部に作用したZ軸方向の力の大きさ及び正負方向が検出できるようにしてあることを特徴とする請求項4記載の静電容量式力覚センサ。 5. Yes electrodes are formed to be independent of the substrate portion surrounded by four electrodes arranged at intervals of 90 °, the variable capacitance unit composed of the electrode and the movable electrode plate to separate the above capacitive force sensor of claim 4, wherein the magnitude and the positive and negative directions of the electrostatic Z-axis direction force acting on the operating unit by a change in capacitance of are to be detected. 【請求項6】 可動電極板には操作部を囲む態様で周凸部が形成されており、前記周凸部を取付部材に押圧する態様で可動電極板を取り付けたときには、周凸部の弾性復帰力により取付部材と可動電極板との間のシール性が確保されるようにしてあることを特徴とする請求項1乃至5のいずれかに記載の静電容量式力覚センサ。 6. have circumferential protrusion in a manner to the movable electrode plate surrounding the operation portion is formed, when fitted with a movable electrode plate in a manner that presses the peripheral projections on the mounting member includes a mounting member by the elastic restoring force of the circumferential protrusion capacitive force sensor according to any one of claims 1 to 5, characterized in that sealing property are to be secured between the movable electrode plate. 【請求項7】 基板と可動電極板とを金属フレームで包み込むと共に前記金属フレームの一部を折り曲げて可動電極板が基板及び金属フレームに対して圧接する態様で固定してあり、前記可動電極板の弾性復帰力によって生じるシール性により可変静電容量部に異物が外部から侵入しないようにしてあることを特徴とする請求項1記載の静電容量式力覚センサ。 7. Yes fixed in a manner movable electrode plate and the substrate and the movable electrode plate by bending a portion of said metal frame with wrap a metal frame is pressed against the substrate and the metal frame, the movable electrode plate capacitive force sensor of claim 1, wherein the foreign matter to the variable capacitance unit by sealing property caused by the elastic restoring force of are to not penetrate from the outside. 【請求項8】 金属フレームが導電性を有するものであり、前記金属フレームを介して可動電極板を特定の電圧に保持するようにしてあることを特徴とする請求項7記載の静電容量式力覚センサ。 8. are those metal frame is electrically conductive, claim 7 capacitive type, wherein the through the metal frame are so as to hold the movable electrode plate to a particular voltage force sensor. 【請求項9】 基板又は可動電極板の対向面のうち少なくともいずれか一方に、固定電極板と可動電極板との間の間隙があまり小さくならないようにする突起を設けてあることを特徴とする請求項1乃至8のいずれかに記載の静電容量式覚センサ。 9. A on at least one of the opposing surfaces of the substrate or the movable electrode plate, wherein the gap between the fixed electrode plate and the movable electrode plate is provided with protrusions to avoid too small capacitance ShikiSatoshi sensor according to any of claims 1 to 8. 【請求項10】 90°間隔で配置された四つ電極で囲まれた基板部分に独立する接点用ランドを形成すると共に、前記接点用ランドと対向する可動電極板部分に電気接点となる突起を形成し、前記突起と接点用ランドとによりスイッチを構成させてあることを特徴とする請求項5記載の静電容量式覚センサ。 10. to form a contact land to independently substrate portion surrounded by the four electrodes arranged at intervals of 90 °, the projections serving as electrical contacts to the movable electrode plate portions facing the contact land formed, the capacitance ShikiSatoshi sensor of claim 5, wherein a which had been configured to switch a said projection and the contact lands.
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