JP3335082B2 - Flat type micro lens - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to relates to a plate type micro lens utilizing a liquid crystal display device or the like.

[0002]

2. Description of the Related Art A liquid crystal display device is used in a projector television (PTV). This liquid crystal display element is 2
Liquid crystal is injected into a gap formed between the glass plates, and a TFT (thin film transistor) made of amorphous silicon or polysilicon is formed on a surface of each glass plate in contact with the liquid crystal, corresponding to each pixel. In a PTV using a transmissive liquid crystal display element, irradiation light is applied to the liquid crystal display element from a xenon lamp, a metal halide lamp, or the like, and is transmitted to an emission side through a pixel opening of the liquid crystal display element. The formed image is projected on a screen via a projection lens.

[0003] In order to increase the ratio of the irradiating light transmitted through the liquid crystal display element by condensing the irradiating light to the pixel opening and to make the projected image brighter, two glass substrates constituting the liquid crystal display element are used. A flat microlens is bonded to the glass substrate on the side where the irradiation light is incident so that the irradiation light is focused on the pixel opening. One disclosed in Japanese Patent Publication No. 225303 is known. In addition, there are methods disclosed in JP-A-2-42401, JP-A-2-116809, and US Pat. No. 5,513,289.

A method for manufacturing a flat microlens disclosed in Japanese Patent Application Laid-Open No. 7-225303 will be described below with reference to FIG. First, a photosensitive film is formed on the substrate surface as shown in FIG. 20A, and then the photosensitive film is irradiated with an electron beam to form a lens portion as shown in FIG. Make a master. Next, as shown in FIG. 3C, nickel or the like is laminated on the surface of the microlens array master by electroforming.
Further, as shown in FIG. 3D, the laminate is peeled from the microlens array master to produce a stamper (inverted type).
Then, as shown in FIG. 7E, the ultraviolet-curable resin is poured into the concave portion of the stamper, and as shown in FIG. As shown in ()), the ultraviolet-curable resin is cured, and thereafter, as shown in FIG. (H), the cured ultraviolet-curable resin is peeled off from the stamper together with the transparent substrate. Then, a cover glass is attached to the surface of the peeled transparent substrate on which the lens portion is formed with the ultraviolet-curable resin, and a low-refractive-index adhesive resin is poured into and adhered to the cover glass to form a flat microlens.

[0005]

The above-mentioned conventional flat plate type
In the case of a micro lens , a resist is irradiated with an electron beam to form a lens portion. However, it is difficult to form a minute lens shape with high accuracy by this method. The flat microlens to be incorporated in the liquid crystal display device is preferably a dense microlens in which a large number of lens portions are tightly packed in a plan view, but a dense microlens array is manufactured by the above-described conventional manufacturing method. Difficult.
Further, in order to manufacture a liquid crystal display element, a step of forming an electrode by vapor deposition or the like is required. In this step, the temperature of the atmosphere is at least 180 ° C. Accordingly, at least 18 high refractive resins are used for the flat microlens.
Although heat resistance at 0 ° C. is required, the heat resistance of conventional resins is not sufficient, and discoloration (yellowing), peeling, cracks, fogging, and the like are likely to occur.

[0006]

In order to solve the above-mentioned problems, the present invention provides a liquid crystal display element for a projector television.
A flat-type microlens that constitutes a
In the mold microlens , a high-refractive-index resin material and a low-refractive-index resin material are laminated in a region sandwiched between the first and second glass substrates, and a boundary surface between these two types of resin materials is a microsphere or a microsphere. The cylindrical surfaces are arranged one-dimensionally or two-dimensionally, and the composition of the first and second glass substrates is
Any one of composition 1) to composition 4), and
The resin material has a general formula (R′-S-S-S-S-R-S-R ')
The main component is a resin represented by Where S is
Sulfur, R is a cyclic unsaturated hydrocarbon, a cyclic saturated hydrocarbon,
Any of linear unsaturated hydrocarbon and linear saturated hydrocarbon
Or R 'is an acryloyl group, a methacryloyl group, an epoxy group
Group, isocyanate group, amino group, acyl group, carbo group
Organizing with xyl, alkoxylyl and vinyl groups
One of the compounds. (Composition 1) SiO ₂ : 45% to 75% by weight B ₂ O ₃ : 8.0% to 19.0% by weight BaO: 4.2% to 14% by weight MO (M is other than Ba) Divalent metal): 10% by weight or more and 30
% By weight R ₂ O (R is a monovalent metal): 10% by weight or less (composition 2) SiO ₂ : 45% by weight to 75% by weight B ₂ O ₃ : 9.5% by weight to 12.5% by weight BaO: 4.2 to 14% by weight MO (M is a divalent metal other than Ba): 10 to 30% by weight
% By weight R ₂ O (R is a monovalent metal): 10% by weight or less (composition 3) SiO ₂ : 45 to 75% by weight B ₂ O ₃ : 8.0 to 19.0% by weight BaO: 4.2 to 14% by weight MO (M is a divalent metal other than Ba): 10 to 30% by weight
Wt% R ₂ O (R is a monovalent metal): 1% by weight (composition 4) SiO _2: 45 wt% to 75 wt% B ₂ O _3: 8.0 wt% or more 19.0% by weight BaO: 4.2 to 10% by weight MO (M is a divalent metal other than Ba): 10 to 30% by weight
Wt% R ₂ O (R is a monovalent metal): 10 wt% or less

[0007] A second method for manufacturing the above-mentioned flat microlens is described.
The method 1 includes the following first to sixth steps. (First Step) By performing wet etching on the surface of a glass substrate serving as a molding die through a mask, a large number of minute concave portions having a spherical or cylindrical shape are formed one-dimensionally or two-dimensionally on the surface of the glass substrate. Forming step. (Second Step) A step of performing a wet etching again without using a mask on the surface of the glass substrate serving as a molding die in which the minute recesses are formed in the first step, thereby arranging a large number of minute recesses densely. (Third step) A mold release agent is applied to the surface of a glass substrate which is formed in the second step and has a fine concave portion arranged in a dense state and is a forming die.
A step of applying a photocurable or thermosetting high refractive index resin material thereon; (Fourth step) A step of laminating the first glass substrate on the high refractive index resin material applied in the third step, developing the high refractive index resin material, and then curing the high refractive index resin material. (Fifth Step) The high-refractive-index resin material cured in the fourth step and the first glass substrate are separated from the glass substrate serving as a molding die, and a cured high-refractive-index resin material layer on the first glass substrate Applying a low-refractive-index resin material on the substrate. (Sixth step) A step of laminating a second glass substrate on the low refractive index resin material applied in the fifth step, developing the low refractive index resin material, and then curing the low refractive index resin material.

[0008] The second method for manufacturing the above-mentioned flat microlens is as follows.
Method 2 comprises the following first to seventh steps. (First Step) By performing wet etching on the surface of a glass substrate serving as a molding die through a mask, a large number of minute concave portions having a spherical or cylindrical shape are formed one-dimensionally or two-dimensionally on the surface of the glass substrate. Forming step. (Second Step) A step of performing a wet etching again without using a mask on the surface of the glass substrate serving as a molding die in which the minute recesses are formed in the first step, thereby arranging a large number of minute recesses densely. (Third Step) A step of transferring a surface shape having a large number of minutely arranged concave portions of the glass substrate serving as a molding die formed in the second step to an inversion mold made of nickel or the like. (Fourth Step) A step of applying a release agent to the surface of the reversal mold prepared in the third step, and applying a photocurable or thermosetting low refractive index resin material thereon. (Fifth step) A step of laminating a second glass substrate on the low refractive index resin material applied in the fourth step, developing the low refractive index resin material, and then curing the low refractive index resin material. (Sixth step) The low-refractive-index resin material cured in the fifth step and the second glass substrate are separated from the inversion mold, and a high-refractive-index resin material layer on the second glass substrate is placed on the cured low-refractive-index resin material layer. A step of applying a refractive index resin material; (Seventh Step) A step of stacking the first glass substrate on the high refractive index resin material applied in the sixth step, developing the high refractive index resin material, and then curing the high refractive index resin material.

A second method for manufacturing the above-mentioned flat microlens
The method 3 includes the following first to eighth steps. (First Step) By performing wet etching on the surface of a glass substrate serving as a molding die through a mask, a large number of minute concave portions having a spherical or cylindrical shape are formed one-dimensionally or two-dimensionally on the surface of the glass substrate. Forming step. (Second Step) A step in which the fine recesses are densely arranged by performing wet etching again without using a mask on the surface of the glass substrate serving as a molding die having a large number of minute recesses formed in the first step. (Third Step) A step of transferring a surface shape having a large number of minutely arranged concave portions of the glass substrate to be a molding die formed in the second step to a first inversion mold made of nickel or the like. (Fourth Step) A step of transferring the surface shape of the first inversion mold produced in the third step to a second inversion mold made of nickel or the like. (Fifth Step) A step of applying a release agent to the surface of the second inversion mold produced in the fourth step, and applying a photocurable or thermosetting high refractive index resin material thereon. (Sixth step) A step of stacking the first glass substrate on the high refractive index resin material applied in the fifth step, developing the high refractive index resin material, and then curing the high refractive index resin material. (Seventh step) The high refractive index resin material cured in the sixth step and the first glass substrate are separated from the second inversion mold, and the cured high refractive index resin material layer on the first glass substrate is removed. A step of applying a low refractive index resin material thereon. (Eighth Step) A step of stacking the second glass substrate on the low refractive index resin material applied in the seventh step, developing the low refractive index resin material, and then curing the low refractive index resin material.

As the release agent applied to the surface of the glass substrate as a mold, a fluorine compound or a silicon compound is suitable. As the organic silicon compound, polysiloxane, chlorosilane compound, alkoxysilane compound,
And a dissolvable organic solvent such as water and alcohol, a hydrocarbon-based organic solvent, or a fluorine-based organic solvent.
Further, the above-mentioned organosilicon compound containing fluorine has a remarkably low surface tension of the release layer and shows good release properties. These may be used as a mixture.

The polysiloxane is preferably a linear, branched, or cyclic polydimethylsiloxane or a fluorine-containing polydimethylsiloxane. Further, in addition to polydimethylsiloxane, those having the following groups in the molecular structure thereof may be mentioned. Polysiloxanes having hydroxyl groups such as terminal silanol polydimethylsiloxane, terminal silanol polydiphenylsiloxane, terminal diphenylsilanol polydimethylphenylsiloxane, terminal carbinol polydimethylsiloxane, terminal hydroxypropyl polydimethylsiloxane, polydimethyl-hydroxyalkylenoxide methylsiloxane Polysiloxane having an amino group such as bis (aminopropyldimethyl) siloxane, aminopropylpolydimethylsiloxane at the end, aminoalkyl group-containing T-structure polydimethylsiloxane, dimethylaminopolydimethylsiloxane at the end; glycidoxypropylpolydimethylsiloxane at the end; Glycidoxypropyl-containing T-structure polydimethylsiloxane, polyglycidoxypropylmethylsiloxane Poly glycidoxypropyl methyl -
Polysiloxane having a glycidoxyalkyl group such as dimethylsiloxane copolymer; polysiloxane having a mercaptoalkyl group such as mercaptopropyl polydimethylsiloxane, polymercaptopropylmethylsiloxane, and mercaptopropyl-containing T-structure polydimethylsiloxane; ethoxypolydimethyl terminal Polysiloxane having an alkoxy group, such as siloxane, trimethoxysilyl polydimethylsiloxane at one end, and polydimethyl-octyloxymethylsiloxane copolymer; carboxypropyl polydimethylsiloxane at the end; carboxypropyl-containing T-structure polydimethylsiloxane; Polysiloxane having a carboxyalkyl group such as dimethylsiloxane; polybis (cyanopropyl Polysiloxane having a cyanoalkyl group, such as siloxane, polycyanopropylmethylsiloxane, polycyanopropyl-dimethylsiloxane copolymer, and polycyanopropylmethyl-methylphenylsiloxane copolymer; and hexamethyldisiloxane, polydimethylsiloxane-alkylene oxide copolymer For example, those which can be dissolved in water or a water-soluble organic solvent such as ethanol, isopropyl alcohol, and ethylene glycol are also used. These may be used in a mixed system.

As the chlorosilane compound and the alkoxysilane compound, those represented by the following general formulas are suitable. R1m-Si-R2n wherein R1 is an alkyl group having 1 to 20 carbon atoms, a fluoroalkyl group, or -O-, CO2-, SO2N (C
3H7)-or an alkyl or fluoroalkyl group having a structure such as -CONH-, R2 is chlorine or an alkoxy group having 1 to 6 carbon atoms, m = 1, 2 or 3, n =
1, 2, or 3, m + n = 4. Representative examples include C ₁₈ H ₃₇ SiCl ₃ , C ₁₈ H ₃₇ Si (OCH ₃ ) ₃ , C ₁₂
H ₂₅ SiCl ₃ , C ₁₂ H ₂₅ Si (OCH ₃ ) ₃ , CF ₃ (C
F ₂ ) ₇ CH ₂ CH ₂ Si (OCH ₃ ) ₃ , CF ₃ (CF ₂ ) ₇ C
_{H 2 CH 2 SiCl 3, CF} 3 (CF 2) 7 CH 2 CH 2 Si (C
H ₃ ) (OCH ₃ ) ₃ , CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si
(CH ₃ ) Cl ₂ , CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ SiCl ₃ ,
CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₃ ) ₃ , CF ₃ C
_{H 2 CH 2 SiCl 3, CF} 3 CH 2 CH 2 Si (OCH 3) 3,
C ₈ F ₁₇ SO ₂ N (C ₃ H ₇ ) CH ₂ CH ₂ CH ₂ Si (OCH
₃ ) ₃ , C ₇ F ₁₅ CONHCH ₂ CH ₂ CH ₂ Si (OCH ₃ )
_{3, C 8 F 17 CO 2} CH 2 CH 2 CH 2 Si (OCH 3) 3, C 8
_{F 17 -O-CF (CF 2} ) CONH- (CH 2) 3 Si (O
_{CH 3) 3, CF 3 (} CF 2 CF 2 O) n- (CF 2 O) m-
Si (OCH ₃ ) ₃ , CF ₃ (C ₃ F ₆ O) n-Si (OC
_{H 3) 3, CF 3 (} C 3 F 6 O) n-Si (OC 2 H 5) 3, C
_{F 3 (C 2 F 4 (} CF 3) O) n-Si (OCH 3) 3, CF 3
_{(C 2 F 4 (CF 3} ) O) , such as _{n-Si (OC 2 H 5} ) 3 and the like, which may be mixed, also partially hydrolyzed condensation advance acid, an alkali or the like A product may be prepared and then used.

As typical examples of the disilazane compound, hexamethyldisilazane, CF3 (CF2) 7
CH2CH2Si (NH) 3/2 and the like may be used, and these may be used as a mixture, or may be used after previously preparing a partially hydrolyzed condensate with an acid, an alkali or the like.

As the organic fluorine compound used as the release agent, commercially available fluorine-based surfactants such as perfluoroalkyl sulfonate, perfluoroalkyl carboxylate, perfluoroalkyl phosphate, nadono anion, Cations such as fluoroalkyltrimethylammonium salts, perfluoroalkylethylene oxide adducts, perfluoroalkyl group-hydrophilic group-containing oligomers, perfluoroalkyl group-hydrophilic group-lipophilic group-containing oligomers, perfluoroalkyl betaines, etc. Nonionic and fluorine-containing polymer compounds exhibiting surface activity performance are exemplified. It is also possible to use a commercially available water repellent, for example, Florad FC722 manufactured by Sumitomo 3M, Dickguard series manufactured by Dainippon Ink Industries, Ltd. Commercially available fluorine-based lubricants, for example, Montecatini Co., Ltd. Fomblin, DuPont Crytox,
And Daikin's Demnum may be used as a mixture. The basic structure is CF3 (CF2CF2O) n-
(CF2O) m-CF3, CF3 (C3F6O) nCF3, C
F3 (C2F4 (CF3) O) nCF3, and the like,
Those having a functional group such as a carboxyl, hydroxyalkyl, methyl ester, or isocyanate group at these terminals are commercially available.

Other brand names that can be used as the release agent include a fluorine-based release agent manufactured by Daikin Co.,
F3130, GF3030, GF3030, GF633
0, GU2070, ME810, GF6030 and the like.

Preferred examples of the high refractive index resin material include:
A resin having a thiol bond (RSH), a resin having a sulfide bond (RSR ′), or a resin having a general formula (R ′)
-S-R-S-S-R-R ') as a main component. However, S is sulfur, H is hydrogen, R is any of a cyclic unsaturated hydrocarbon, a cyclic saturated hydrocarbon, a linear unsaturated hydrocarbon, and a linear saturated hydrocarbon, R ′ is an acryloyl group, a methacryloyl group, Any of organic compounds having an epoxy group, an isocyanate group, an amino group, an acyl group, a carboxyl group, an alkoxyl group, and a vinyl group.

Specific examples of the high-refractive-index resin material include a polymer starting from a monomer having the structural formula shown in the following (Chemical Formula 1) to (Chemical Formula 9).

[0017] ★

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[0018] ★

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[0019] ★

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[0020] ★

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[0021] ★

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★

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[0023] ★

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[0024]

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★

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Preferred examples of the low refractive index resin material include:
A fluorine resin, an acrylic resin, or an epoxy resin is given.

Further, a coupling agent is applied to any one of the interface between the glass substrate and the high-refractive-index resin material, the glass substrate and the low-refractive-index resin material, or between the glass substrate and the low-refractive-index resin material. Is preferred. Examples of the coupling agent include γ-glycidopropyltrimethoxysilane or γ-mercaptopropyltrimethoxysilane.

The high refractive index resin material may contain a thiol-based curing agent. Examples of the thiol-based curing agent include pentaerythritol tetrakisthiopropionate represented by the following (Chemical Formula 10) and trihydroxyethyl isocyanate β-mercaptopropionic acid represented by the following (Chemical Formula 11).

★

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[0030] ★

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Further, a curing accelerator may be contained in addition to the thiol-based curing agent. Examples of the curing accelerator include dibutyltin dilaurate represented by the following (Formula 12).

★

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Further , a glass substrate or a flat plate serving as a molding die
The following are the glass substrates that make up the micro lens
The borosilicate glass having the composition described in (1) is used. (Composition 1) SiO ₂ : 45 wt% to 75 wt% B ₂ O ₃ : 8.0 wt% to 19.0 wt% BaO: 4.2 wt% to 14 wt% MO (M is other than Ba) Divalent metal): 10% by weight or more and 30
% By weight R ₂ O (R is a monovalent metal): 10% by weight or less (Composition 2) SiO ₂ : 45% by weight to 75% by weight B ₂ O ₃ : 9.5% by weight to 12.5% by weight BaO: 4.2 to 14% by weight MO (M is a divalent metal other than Ba): 10 to 30% by weight
Wt% R ₂ O (R is a monovalent metal): 10 wt% or less (composition 3) SiO _2: 45 wt% to 75 wt% B ₂ O _3: 8.0 wt% or more 19.0% by weight BaO: 4.2 to 14% by weight MO (M is a divalent metal other than Ba): 10 to 30% by weight
% By weight R ₂ O (R is a monovalent metal): 1% by weight or less (Composition 4) SiO ₂ : 45% by weight to 75% by weight B ₂ O ₃ : 8.0% by weight to 19.0% by weight BaO: 4.2 to 10% by weight MO (M is a divalent metal other than Ba): 10 to 30% by weight
% By weight or less R ₂ O (R is a monovalent metal): 10% by weight or less

[0036]

Embodiments of the present invention will be described below with reference to the accompanying drawings. Here, FIGS. 1-9 this onset
FIG. 2 is a diagram showing a first method for manufacturing a flat microlens according to the present invention. First, as shown in FIG. 1, a mask 2 having a large number of small holes 2 a formed on a surface of a glass substrate 1 serving as a molding die is overlapped. Next, the surface covered with the mask 2 is HF (hydrogen fluoride).
Immerse in a system etchant and perform wet etching.

Since the wet etching is an isotropic etching, a substantially hemispherical concave portion 3 is formed one-dimensionally or two-dimensionally at a portion corresponding to the small hole 2a as shown in FIG. The recess 3 may be a groove having a semicircular cross section. In this case, a lenticular lens is formed.

Next, the mask 2 is removed, and the surface on which the concave portions 3 are formed is again wet-etched. By this etching, as shown in FIG. 3A, the thickness of the glass substrate 1 serving as a molding die is reduced, and the surface including the concave portion 3 is uniformly etched. As shown in b), the concavities have a dense shape with no gaps in plan view. Note that FIG. 3B shows a state in which the shape is dense in a honeycomb shape (hexagonal shape).
Can be made dense in a quadrangular shape by the arrangement.

As shown in FIG. 4, a release agent layer 4 made of a fluorine-based or silicone-based material is formed on the surface of the glass substrate 1 on which the concave portions are densely arranged by the above etching. Examples of the method of forming the release agent layer 4 include spin coating, dipping, a method in which the material is adsorbed on the surface of the glass substrate as vapor, and a method in which the material is immersed in a liquid in which the material is dissolved and adsorbed on the surface. It is baked after being applied to the surface of the glass substrate 1.

After that, as shown in FIG. 5, a photo-curable or thermo-curable high refractive index resin material 5 is applied to the surface on which the release agent layer 4 is formed, and further, as shown in FIG. The glass substrate 6 is pressed from above the high refractive index resin material 5 to expand the high refractive index resin material 5. Note that a film of a coupling agent is formed on the surface of the first glass substrate 6 which is in contact with the high-refractive-index resin material 5, or the mold release slightly transfers to the surface of the high-refractive-index resin material 5 at the time of releasing. It is preferable that the agent is removed by washing with a solvent or the like.

As described above, in a state where the first glass substrate 6 is placed on the high refractive index resin material 5, the high refractive index resin material 5 is cured by irradiating or heating with ultraviolet rays.
The first glass substrate 6 and the high refractive index resin material 5 cured into a convex lens shape are peeled off from the glass substrate 1 as shown in FIG.

Next, as shown in FIG. 8, a photocurable or thermosetting low refractive index resin material 7 is applied on the high refractive index resin material 5 cured in a convex lens shape. This low-refractive-index resin material 7 also functions as an adhesive.

Further, as shown in FIG. 9, the second glass substrate 8 is pressed from above the low-refractive-index resin material 7, and after the low-refractive-index resin material 7 is developed, it is cured. The glass substrate 6 and the second glass substrate 8 are polished as necessary to have a predetermined thickness to complete a flat microlens. Note that a coupling agent film should be formed on the interface between the high-refractive-index resin material 5 and the low-refractive-index resin material 7 and the interface between the low-refractive-index resin material 7 and the second glass substrate 8. Is preferred.

FIGS. 10 to 14 show a flat type mask according to the present invention .
It is a figure which shows the 2nd manufacturing method of an ikro lens , and the process until a dense concave part is formed in the surface of the glass substrate 1 is 1st.
Since the method is the same as that described above , the description is omitted.

In the second method , as shown in FIG. 10, the surface shape of the glass substrate 1 in which the concave portions are densely arranged is transferred to an inversion mold 11 made of nickel or the like by electroforming or the like. The same release agent coating as in the first invention is applied. Next, as shown in FIG. 11, a photo-curable or thermo-curable low-refractive-index resin material 7 is applied on the reversing mold 11, and
As shown in FIG. 2, the second glass substrate 8 was placed on the low-refractive-index resin material 7, and after the low-refractive-index resin material 7 was developed, the low-refractive-index resin material 7 was cured and then cured. The low-refractive-index resin material 7 and the second glass substrate 8 are separated from the inversion mold 11, and as shown in FIG. 13, the high-refractive-index resin material 5 is applied on the cured low-refractive-index resin material 7, Further, as shown in FIG. 14, the first glass substrate 6 is placed on the high-refractive-index resin material 5, and after the high-refractive-index resin material 5 is developed, the high-refractive-index resin material 5 is cured. Good.

FIGS. 15 to 19 show a flat type mask according to the present invention .
It is a figure which shows the 3rd manufacturing method of an ikro lens , and the process until a dense concave part is formed in the surface of the glass substrate 1 is 1st.
Since the method is the same as that described above , the description is omitted.

In the third method , the surface shape of the first inversion mold 11 made of nickel or the like is transferred to the second inversion mold 12 made of nickel or the like as shown in FIG. A release agent coating similar to the invention is applied. Next, a photo-curing or thermosetting high-refractive-index resin material 5 is applied on the second inversion mold 12, and then, as shown in FIG. Overlay the substrate 6,
After the high-refractive-index resin material 6 is developed, the high-refractive-index resin material 6 is hardened, and the first glass substrate 6 and the high-refractive-index resin material 5 hardened into a convex lens shape are formed as shown in FIG.
Then, as shown in FIG. 18, a light-curable or thermosetting low-refractive-index resin material 7 is applied on the high-refractive-index resin material 5 cured into a convex lens shape, as shown in FIG.
Further, as shown in FIG. 19, the second glass substrate 8 is pressed from above the low-refractive-index resin material 7, and the low-refractive-index resin material 7 is cured after being developed.

[0048]

As described above , according to the present invention,
For example, since a minute concave portion is formed on the surface of the glass substrate by wet etching, the lens portion can be formed with high precision. Further, since the wet etching is performed again with the mask removed, a dense microlens array in which a large number of lens portions are tightly packed without gaps in plan view can be manufactured. Furthermore, considering the process of manufacturing the liquid crystal display device,
It is necessary to use special high-refractive-index resins and low-refractive-index resins that can withstand high-temperature processing at about 180 ° C., but these resins generally have low mold release properties. Therefore, the mold cannot be peeled or the mold is damaged at the time of peeling, and good molding cannot be performed. However, according to the present invention, since the mold releasing agent is applied to the mold, the mold can be easily peeled and the mold is damaged. Do not give. In addition, such a micro lens has an irregularity of 10 μm.
Although it has an extremely fine uneven shape of about 10 μm to about 10 μm, if a release agent is applied at an appropriate concentration, a release agent film having a uniform thickness on the order of submicrons is possible, and is manufactured by glass etching. Can accurately transfer the fine irregularities of the original. In particular, when the fluorine-based release agent is soluble in an organic solvent such as isooctane, and the release agent film is partially peeled off after repeated use and the release property is reduced, If necessary, the mold release agent on the mold surface can be washed away, and the mold release agent can be applied again, which is convenient.

Further, in the first method, the step of transferring to the Ni stamper is not required, there is no risk of shape change or defect addition in the stamper manufacturing step, and the glass original plate is less expensive than the Ni stamper. .

In the second method, most of the high refractive index resin materials shown in the present application are difficult to be photocurable and are often thermosetting. In such a case, it is effective to use an inversion type made of Ni or the like as in the second invention.

Further, in the third method , some resins have high resistance at the time of peeling even if a release agent is used. Therefore, when glass is used as a mold, glass having fine irregularities is formed at the time of release. Although the chip may be slightly chipped, chipping of the stamper can be suppressed by using the same stamper as the glass master and the male and female.

[Brief description of the drawings]

FIG. 1 is a view showing a manufacturing process of a flat microlens according to the present invention.

FIG. 2 is a view showing a manufacturing process of the flat plate type micro lens.

3A is a view showing a manufacturing process of the flat plate type micro lens, and FIG. 3B is a plan view of FIG.

FIG. 4 is a view showing a manufacturing process of the flat plate type micro lens.

FIG. 5 is a view showing a manufacturing process of the flat plate type micro lens.

FIG. 6 is a diagram showing a manufacturing process of the flat plate type micro lens.

FIG. 7 is a view showing a manufacturing process of the flat plate type micro lens.

FIG. 8 is a view showing a manufacturing process of the flat plate type micro lens.

FIG. 9 is a sectional view of a flat microlens according to the present invention.

FIG. 10 is a diagram showing another embodiment of the manufacturing process of the flat microlens according to the present invention.

FIG. 11 is a view showing another embodiment of the manufacturing process of the flat plate type micro lens.

FIG. 12 is a view showing another embodiment of the manufacturing process of the flat plate type micro lens.

FIG. 13 is a view showing another embodiment of the manufacturing process of the flat plate type micro lens.

FIG. 14 is a view showing another embodiment of the manufacturing process of the flat plate type micro lens.

FIG. 15 is a view showing another embodiment of the manufacturing process of the flat plate type micro lens.

FIG. 16 is a view showing another embodiment of the manufacturing process of the flat plate type micro lens.

FIG. 17 is a view showing another embodiment of the manufacturing process of the flat plate type micro lens.

FIG. 18 is a view showing another embodiment of the manufacturing process of the flat plate type micro lens.

FIG. 19 is a view showing another embodiment of the manufacturing process of the flat plate type micro lens.

FIG. 20 is a view showing a manufacturing process of a conventional flat plate type micro lens.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Glass substrate used as a shaping die, 2 ... Mask, 3 ... Depression,
4 release agent layer, 5 high refractive index resin material, 6 first glass substrate, 7 low refractive index resin material, 8 second glass substrate, 11 reverse type (first reverse type) , 12... Second inversion type.

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI G02F 1/13357 G02F 1/1335 530 (72) Inventor Takashi Kishimoto 3-5-1, Doshomachi, Chuo-ku, Osaka-shi, Osaka Nippon Sheet Glass (72) Inventor Naoto Hirayama 3-5-11, Doshumachi, Chuo-ku, Osaka-shi, Osaka Nippon Sheet Glass Co., Ltd. Japanese Unexamined Patent Publication No. Hei 7-225303 (JP, A) Japanese Unexamined Patent Publication No. Hei 7-251464 (JP, A) Japanese Unexamined Patent Publication No. Hei 7-281007 (JP, A) Japanese Unexamined Patent Publication No. Hei 6-242303 (JP, A) JP, A)

Claims (1)

(57) [Claims] 1. A liquid crystal display for a projector television.
This is a flat microlens that constitutes an element.
In the plate-type microlens , a high-refractive-index resin material and a low-refractive-index resin material are stacked in a region sandwiched between the first and second glass substrates, and a boundary surface between these two types of resin materials is a microsphere or The micro-cylindrical surfaces are arranged one-dimensionally or two-dimensionally, and the compositions of the first and second glass substrates are as follows.
Any one of composition 1) to composition 4), and
The resin material has a general formula (R′-S-S-S-S-R-S-R ')
Characterized in that the resin represented by
Icro lens. Where S is sulfur and R is cyclic unsaturated carbon
Hydrogen, cyclic saturated hydrocarbon, linear unsaturated hydrocarbon, direct
Any of the chain saturated hydrocarbons, R ′ is an acryloyl group,
Methacryloyl group, epoxy group, isocyanate group,
Mino group, acyl group, carboxyl group, alkoxyl
Or an organic compound having a vinyl group. (Composition 1) SiO ₂ : 45% to 75% by weight B ₂ O ₃ : 8.0% to 19.0% by weight BaO: 4.2% to 14% by weight MO (M is other than Ba) Divalent metal): 10% by weight or more and 30
% By weight R ₂ O (R is a monovalent metal): 10% by weight or less (composition 2) SiO ₂ : 45% by weight to 75% by weight B ₂ O ₃ : 9.5% by weight to 12.5% by weight BaO: 4.2 to 14% by weight MO (M is a divalent metal other than Ba): 10 to 30% by weight
% By weight R ₂ O (R is a monovalent metal): 10% by weight or less (composition 3) SiO ₂ : 45 to 75% by weight B ₂ O ₃ : 8.0 to 19.0% by weight BaO: 4.2 to 14% by weight MO (M is a divalent metal other than Ba): 10 to 30% by weight
Wt% R ₂ O (R is a monovalent metal): 1% by weight (composition 4) SiO _2: 45 wt% to 75 wt% B ₂ O _3: 8.0 wt% or more 19.0% by weight BaO: 4.2 to 10% by weight MO (M is a divalent metal other than Ba): 10 to 30% by weight
Wt% R ₂ O (R is a monovalent metal): 10 wt% or less