JP3197055B2 - A method for producing a card-type liquid crystal recording medium and a liquid crystal recording medium produced by the method. - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for continuously producing a card type liquid crystal recording medium and a recording medium produced by the method.

[0002]

2. Description of the Related Art It has been proposed to use an image recording medium having an information recording layer in which liquid crystal is dispersed in a resin body and modulate the orientation of liquid crystal by voltage application exposure to record an image.
Such image recording includes a transparent support, a transparent conductive layer, a photoconductor composed of a photoconductive layer, and an information recording layer in which liquid crystal is dispersed in a resin body, a transparent conductive layer, and a recording medium composed of a transparent support. When an image is exposed from the photoconductor side or the recording medium side while a voltage is applied between the photoconductor and the transparent conductive layer of the recording medium, the exposed portion of the photoconductive layer becomes conductive and the photoconductor and the recording medium are A discharge is generated between the layers, and a strong electric field is applied to the information recording layer. As a result, the orientation of the liquid crystal dispersed in the resin body changes, and the information is recorded as a visible image. In this case, when the liquid crystal dispersed in the resin body is a smectic liquid crystal, the memory property is particularly large, and the modulated orientation is maintained as it is even if the electric field is removed, and the image can be read even if left for a long time. is there. Since this visualized image is erased by heating to a temperature near the isotropic phase transition of the liquid crystal, it can be reused.

[0003]

When a recording medium using such a liquid crystal is recorded on an information recording layer by voltage application exposure while facing a photoreceptor, a liquid crystal seeping phenomenon occurs on the surface of the information recording layer, There is a problem that noise occurs when information is recorded, and it is difficult to maintain a constant distance between the photoconductor and the recording medium.

The liquid crystal recording medium is suitable for use as a card because it can be easily read optically. In such a case, the photosensitive member and the liquid crystal recording medium are integrally formed and the distance between them is increased. It is desirable to fix it. However, in the case of such a card-type liquid crystal recording medium, it is necessary to form a transparent electrode or the like on the information recording layer, but the information recording layer in which liquid crystal is dispersed in a resin body is soft, and such It is difficult to form an electrode on the information recording layer, the electrode is easily damaged, and the above-mentioned bleeding of the liquid crystal becomes a problem. In particular, when the card is placed in a harsh environment such as touching a human hand, the card is likely to be scratched or deformed, and this becomes noise and affects the reliability of data. Eliminating such noise sources is extremely important. Further, there has been a demand for technology development for continuously producing card-type liquid crystal recording media.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and can prevent bleeding of liquid crystal, cracks, scratches, deformation and the like of electrodes, and can continuously produce a card-type liquid crystal recording medium. An object of the present invention is to provide a method for producing a card-type liquid crystal recording medium and a liquid crystal recording medium produced by the method.

[0006]

According to the present invention, a transparent common electrode is formed on a continuously supplied transparent first base film by sputtering, and the transparent common electrode is formed along one edge of the base film on the transparent common electrode. Depositing a metal for contact reinforcement, coating a charge generation layer, a photoconductive layer comprising a charge transport layer and a transparent insulating layer on the transparent common electrode, and applying one of the second base film to the continuously supplied second base film. While pattern-sputtering a transparent area selection electrode extending in a band shape from the edge to the other edge,
A step of pattern-depositing a metal for contact reinforcement at the base of the area selection electrode, a first base film on which a transparent common electrode, a photoconductive layer and a transparent insulating layer are formed, and a second base film on which an area selection electrode is formed Are continuously supplied, and an information recording layer for writing information in a region corresponding to an area selection electrode in which liquid crystal is dispersed and fixed in an ultraviolet-curable or thermosetting resin is sequentially coated on the first or second base film. A method of manufacturing a card-type liquid crystal recording medium comprising a step of abutting both base films and curing the resin by ultraviolet irradiation or heating, and a step of cutting the resin into a predetermined length after curing; and a card-type liquid crystal recording medium manufactured by the method It is characterized by.

[0007]

According to the present invention, an ITO common electrode, a contact reinforcing metal, a photoconductive layer, and a transparent insulating layer are laminated on a continuously supplied first base film so that the contact reinforcing metal is exposed. On the other hand, after the area selection electrodes are sequentially formed on the continuously supplied second base film, the first and second base films are continuously supplied, and the liquid crystal is dispersed in the resin on one base film. An information recording layer for writing information is coated on a region corresponding to the dispersed and fixed area selection electrode, and the two are butted together. The resin is cured by ultraviolet irradiation or heating, and cut to obtain a card-type liquid crystal recording medium. As a result, by curing the resin, it is possible to continuously produce a card-type liquid crystal recording medium that does not exude liquid crystal and does not damage the transparent electrode on the information recording layer during recording and reproduction. In addition, the storage area is selected according to the common electrode and which area selection electrode is to be applied with a voltage, a certain area is a color image, another area is a monochrome image, and another area is digital data. Since information can be written by selecting an area, the usability as a card can be enhanced.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, the basic structure of a card type liquid crystal recording medium of the present invention will be described with reference to FIG. FIG. 1A is a plan view, and FIG. 1B is a cross-sectional view taken along the line AA of FIG.
Is a transparent substrate, 2 is an area selection electrode (ITO electrode), 3 is a photoconductive layer, 3a is a charge generation layer, 3b is a charge transport layer, 5 is a transparent insulating layer, 6 is an information recording layer, 7 is a transparent common electrode ( IT
O electrode) and 8 are protective layers.

[0009] ITO is formed on the entire surface of a transparent substrate 1 made of plastic, glass, or the like by sputtering or the like. The area selection electrode 2 made of a plurality of band-shaped ITO is formed by etching with the mixed solution. A photoconductive layer 3 composed of a charge generation layer 3a and a charge transport layer 3b is sequentially coated so that the electrode portion of the region 10 is exposed on this electrode, and then a transparent insulating layer 5 and an information recording layer 6 are formed. The exposure of the electrode portion in the region 10 may be performed by forming the respective layers on the entire surface and then shaving the end portions. The transparent insulating layer 5 is a barrier between the photoconductive layer made of a fluorine-containing polymer and the information recording layer. Next, an ITO electrode 7 is formed on the entire surface of the information recording layer 6, and the information recording layer is soft, and the I
Since the TO electrode 7 is easily damaged, the protective layer 8 is formed.

The information recording layer 6 shown in FIG. 1 is a liquid crystal-polymer composite film in which a low molecular liquid crystal material is dispersed and fixed in a resin body. As the liquid crystal material, a smectic liquid crystal, a nematic liquid crystal, a cholesteric liquid crystal or a liquid crystal of these materials is used. Although a mixture can be used, it is preferable to use a smectic liquid crystal from the viewpoint of so-called memory property that maintains the orientation of the liquid crystal and permanently retains information.

The smectic liquid crystal includes a liquid crystal material exhibiting a smectic A phase such as a cyanobiphenyl-based, cyanoterphenyl-based, phenylester-based, or fluorine-based one having a long carbon chain at the terminal group of a substance exhibiting liquid crystallinity. A liquid crystal material exhibiting a smectic C phase used as a liquid crystal;
Alternatively, a liquid crystal substance exhibiting smectic H, G, E, F, or the like can be given.

Also, a nematic liquid crystal may be used, and a memory property can be improved by mixing with a smectic or cholesteric liquid crystal. For example, Schiff base type, azoxy type, azo type, phenyl benzoate type, Cyclohexylic acid phenyl ester type, biphenyl type, terphenyl type, phenylcyclohexane type,
Known nematic liquid crystals such as phenylpyridine, phenyloxazine, polycyclic ethane, phenylcyclohexene, cyclohexylpyrimidine, phenyl and tolane can be used.

When selecting a liquid crystal material, a material having a different direction of the refractive index is preferred because contrast can be obtained.

As the resin body, a solvent-soluble resin having compatibility with a common solvent with the liquid crystal material, for example, methacrylic resin, polyester resin, polystyrene resin, and a copolymer or the like mainly composed of these, or a monomer, Radiation-curable resins having compatibility with the liquid crystal material in the state of the oligomer or having compatibility with the common solvent, such as acrylates and methacrylates, and further thermosetting resins,
For example, an epoxy resin, a silicone resin, etc. can be mentioned. Particularly, when an ultraviolet curable resin is used, phenomena such as oozing of the liquid crystal are suppressed even if a large amount of liquid crystal is contained, and image unevenness due to oozing of the liquid crystal on the surface is obtained. Further, it is possible to prevent a decrease in conductivity due to the occurrence of cracks or the like of the transparent electrode layer laminated on the information recording layer surface.

Examples of such an ultraviolet-curable resin include monomers and oligomers such as dipentaerythritol hexaacrylate, trimethylolpropane triacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, and isocyanuric acid (modified with ethylene oxide). ) Multifunctional monomers such as triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, neopentyl glycol diacrylate, hexanediol diacrylate, etc. or polyfunctional urethane and ester oligomers, and further nonylphenol-modified acrylates, N- Monofunctional monomers such as vinyl-2-pyrrolidone and 2-hydroxy-3-phenoxypropyl acrylate; Oligomer, and the like.

The use of a UV-curable resin to form a crosslinked structure can prevent the liquid crystal from seeping out, and can directly provide an ITO electrode by sputtering or the like. .

Further, a mixture obtained by mixing polyvinyl alcohol or the like with a liquid crystal material to form a microcapsule can also be used.

The mixing ratio between the liquid crystal material and the resin body is preferably such that the content of the liquid crystal material is 10% by weight to 90% by weight, preferably 40% by weight to 80% by weight. If there is, even if information is recorded and the liquid crystal phase is aligned, the transmittance is low, and if it exceeds 90% by weight, phenomena such as oozing of the liquid crystal occur, which is not preferable. By including a large amount of liquid crystal in the resin, the contrast ratio can be improved and the operating voltage can be reduced.

In the method of forming the information recording layer, in the case of a solvent-soluble type, a resin body and a liquid crystal material are dissolved in a solvent, and the solution is coated on a photoconductive layer or a transparent insulating layer described later by a blade coater or a roll coater. Alternatively, it is formed by coating with a general coater such as a spin coater and drying and removing the solvent. In the case of an ultraviolet curable resin, it is formed by further irradiating ultraviolet rays to cure. If necessary, a leveling agent may be added to improve the coating suitability or the surface property. Further, by forming the information recording layer by a coating method, the thickness of the information recording layer can be controlled uniformly. According to the laminating method, it is difficult to use a solvent and it is difficult to obtain uniformity of the gap. This is because it is necessary to pass through a spacer to make the uniformity, which causes noise.

The film thickness affects the resolution. When the film thickness after drying is 0.1 μm to 10 μm, preferably 3 μm to 8 μm, the operating voltage can be reduced while maintaining high resolution. If the film thickness is too thin, the contrast of the information recording portion is low, and if it is too thick, the operating voltage becomes high, which is not preferable.

The photoconductive layer 3 is a conductive layer capable of generating photocarriers (electrons and holes) in the irradiated portion when irradiated with light and allowing the carriers to move in the layer width. Is a layer in which the effect is remarkable when there is.
Hereinafter, a method for forming the photoconductive material and the photoconductive layer will be described.

(A) As the silicon photoconductive layer, (1)
Silicon alone, (2) doped with impurities (B,
Al, Ga, In, Tl, etc. are made P-type (hole transport type) by doping, and P, Ag, Sb, Bi, etc. are made N-type (electron transport type) by doping. As a method, a silane gas and an impurity gas are introduced into a low vacuum together with a hydrogen gas or the like (10 ^{-2 to 1} Torr),
A film is formed by depositing on an electrode substrate heated or not heated by glow discharge, or is formed by a thermochemical reaction on a heated electrode substrate, or a solid material is deposited by vapor deposition and sputtering. Used in layers or laminations. The film thickness is 1 to 50 μm.

(B) As the selenium photoconductive layer, (1) selenium alone, (2) selenium telluride, (3) arsenic selenium compound (As
₂ Se ₃ ), (4) arsenic selenium compound + Te, etc., which are produced by vapor deposition and sputtering. Further, these (1) to (4) may be combined to form a laminated photoconductive layer. The thickness is the same as that of the silicon photoconductive layer.

(C) The cadmium sulfide (CdS) photoconductive layer is prepared by coating, vapor deposition, or sputtering. In the case of vapor deposition, solid particles of CdS are placed on a tungsten board and vapor deposition is performed by resistance heating or EB (electron beam) vapor deposition. In the case of sputtering, it is deposited on a substrate in argon plasma using a CdS target. In this case, CdS is usually deposited in an amorphous state, but a crystalline alignment film (oriented in the film thickness direction) can be obtained by selecting sputtering conditions. For coating, CdS particles (particle size 1
-100 μm) is dispersed in a binder, and a solvent is added to coat on a substrate. .

(D) The zinc oxide (Zn O) photoconductive layer is formed by a coating method or a CVD method. The coating method is obtained by dispersing ZnS particles (particle diameter: 1 to 100 μm) in a binder, adding a solvent, and coating the substrate. Further, as the CVD method, an organic metal such as diethyl zinc or dimethyl zinc and an oxygen gas are mixed in a low vacuum (10 ^{-2 to 1} Torr), and the electrode substrate (15) is heated.
(0-400 ° C.), and deposited as a zinc oxide film. Also in this case, a film oriented in the film thickness direction can be obtained.

(E) Examples of the organic photoconductive layer include a single-layer type photoconductive layer and a function-separated type photoconductive layer. (A) The single-layer type photoconductive layer is composed of a mixture of the following charge generating substance and charge transporting substance.

<Charge-generating substance> A substance which easily absorbs light to generate electric charge. Examples thereof include azo pigments, disazo pigments, trisazo pigments, phthalocyanine pigments, perylene pigments, pyrylium dyes, and cyanine dyes. And a methine dye.

<Charge transporting substance type> A substance having a good ionized charge transporting property, for example, hydrazone type, pyrazoline type, polyvinylcarbazole type, carbazole type, stilbene type, anthracene type, naphthalene type, tridiphenylmethane type, azine type , Amines and aromatic amines.

Further, a charge transfer complex may be formed by forming a complex between the charge generating substance and the charge transporting substance.

Usually, the photoconductive layer has photosensitive characteristics determined by the light absorption characteristics of the charge generation material. However, when a complex is formed by mixing the charge generation material and the charge transport material, the light absorption characteristics change, for example, polyvinyl carbazole ( PVK) can only be felt in the ultraviolet, and trinitrofluorenone (TNF)
Although only the vicinity of the wavelength of 00 nm is felt, the PVK-TNF complex comes to feel up to the wavelength range of 650 nm.

The thickness of such a single-layer photoconductive layer is 10
~ 50 μm is preferred.

(B) Function-separated type photoconductive layer The charge-generating material easily absorbs light, but has the property of trapping light, while the charge-transporting material has good charge-transporting properties but good light-absorbing properties. Absent. Therefore, the two are separated to try to fully exhibit their characteristics.
This is a type in which the following charge generation layer and charge transport layer are laminated.

<Charge Generating Layer> Examples of the substance forming the charge generating layer 3a include azo, bisazo, trisazo, phthalocyanine, acid xansen dye, cyanine, styryl dye, pyrylium dye, and perylene type. ,
There are methine type, a-Se, a-Si, azurenium salt type, squarium salt type and the like.

<Charge Transport Layer> Examples of the substance forming the charge transport layer 3b include hydrazone, pyrazoline, and P
There are VK type, carbazole type, oxazole type, triazole type, aromatic amine type, amine type, triphenylmethane type, polycyclic aromatic compound type and the like.

The method for producing the function-separated type photoconductive layer is as follows.
First, the charge generating substance is dissolved in a solvent and applied on the electrode, and then the charge transport layer is dissolved in the solvent and applied to the charge transport layer. The charge generation layer is 0.1 to 10 μm, and the charge transport layer is 10 to 50 μm.
It is preferable that the thickness be set to μm.

In any of the single-layer system and the function-separated type, silicone resin, styrene-butadiene copolymer resin, epoxy resin, acrylic resin, saturated or unsaturated polyester resin, polycarbonate resin, polyvinyl acetal are used as binders. 0.1 to 10 parts of a resin, a phenol resin, a polymethyl methacrylate (PMMA) resin, a melamine resin, a polyimide resin, and the like are added to each part of the charge generating material and the charge transporting material so as to be easily attached. As a coating method, a dipping method, an evaporation method, a sputtering method, or the like can be used.

The material of the transparent electrode layer is not particularly limited as long as the specific resistance value is 10 ⁶ Ω · cm or less.
Examples thereof include an inorganic metal oxide conductive film and an organic conductive film such as a quaternary ammonium salt. Such an electrode is formed on a support by a method such as vapor deposition, sputtering, CVD, coating, plating, dipping, and electrolytic polymerization. It is necessary to change the film thickness depending on the electrical characteristics of the material constituting the electrode and the applied voltage at the time of recording information.
In the case of the TO film, the angle is about 100 to 3000 °.

The transparent substrate 1 is for supporting the card type liquid crystal recording medium in a strong manner. The material and thickness of the transparent substrate 1 are not particularly limited as long as it has a certain strength capable of supporting the information recording layer. Instead, rigid bodies such as glass and plastic sheets are used. Note that, on the other surface of the transparent substrate on which the transparent electrode layer is provided, a layer having an antireflection effect is laminated as necessary, or the transparent substrate is adjusted to a film thickness capable of exhibiting the antireflection effect. Alternatively, antireflection properties may be imparted by combining the two.

The transparent insulating layer 6 is particularly suitable when the photoconductive layer is an organic photosensitive layer formed using a solvent, and the liquid crystal elutes due to the interaction between the photoconductive layer and the information recording layer.
It is provided for the purpose of preventing the occurrence of image unevenness due to elution of the photoconductive material by the solvent of the liquid crystal.

Therefore, it is necessary that the transparent insulating layer has no compatibility with any of the organic photoconductive layer forming material and the information recording layer forming material. Occurs, and the resolution is deteriorated, so that insulation is required. Further, since the transparent insulating layer lowers the distribution voltage applied to the information recording layer or deteriorates the resolution, the thinner the film, the better it is, preferably 1 μm or less.

However, thinning not only causes image noise due to the interaction with time, but also causes a problem of penetration due to defects such as pinholes when the layers are coated.
Permeability is the solid content ratio of the material to be laminated, the type of solvent,
Since the thickness varies depending on the viscosity, the film thickness of the material to be laminated and applied is appropriately set. In order to prevent these problems, the following materials can be laminated and used.
In consideration of the voltage distribution applied to each layer, a material having a high dielectric constant as well as a thin film is preferable.

Such a transparent insulating layer is used as an inorganic material.
_{SiO 2, TiO 2, CeO 2} , Al 2 O 3, GeO 2, Si 3 N 4, AlN, Ti
It is good to laminate by vapor deposition method and sputtering method using N etc., and using aqueous solution such as polyvinyl alcohol, aqueous polyurethane, water glass etc. as water-soluble resin with low compatibility with organic solvent, spin coating method, blade It may be laminated by a coating method, a roll coating method, or the like. Further, a coatable fluorine resin, for example, a perfluoro resin having a cyclic ether structure is dissolved in a fluorine-based solvent and applied by a spin coating method, or a blade coating method. Alternatively, they may be laminated by a roll coating method or the like.

When selecting a coating type transparent insulating material,
It is necessary that the solvent does not dissolve the photoconductive layer, does not dissolve in the material constituting the information recording layer when forming the information recording layer, or does not dissolve in the solvent when coating.

When the photoconductive layer is made of an inorganic material, it is not necessary to provide a transparent insulating layer when there is no interaction such as liquid crystal seepage with the information recording layer.

In the recording medium having the structure shown in FIG. 1, a storage area is selected according to a common electrode and an area selection electrode to which a voltage is applied. In other areas, you can write information by selecting an area such as digital data,
The usability as a card can be enhanced.

Next, a method for producing the card type liquid crystal recording medium of the present invention will be described with reference to FIGS. In FIG. 2A, for example, a base film 11 made of transparent PET having a width of about 54 mm and a thickness of about 188 μm is prepared. An ITO common electrode 12 is formed on the continuously supplied base film 11 by pattern sputtering or the like. At the same time, the metal 13 for contact reinforcement is formed on the ITO transparent electrode along one edge of the base film.
Is formed by pattern evaporation. Although the transparent common electrode 12 is formed so as not to extend to the side opposite to the contact electrode 13 in the drawing, it may be formed over the entire surface.

FIG. 2 is a sectional view of the base film taken along line AA.
The result is as shown in FIG.

Next, as shown in FIG. 2C, the contact electrode 1 was placed on the base film 11 on which the transparent electrode was formed.
The photogenerating layer 14b composed of the charge generation layer 14b, the charge transport layer 14a, and the intermediate layer 15 composed of the transparent insulating layer are sequentially laminated so that the layer 3 is exposed.

On the other hand, as shown in FIG. 2D, a base film 16 made of PET having the same width and substantially the same thickness as the base film 11 is continuously supplied from a roller 23, wound up by a roller 24, and continuously wound. An area selection electrode 17 made of ITO is formed. The selection electrode 17 is composed of a plurality of strip-shaped electrodes extending from one edge of one base film to the other edge, and a metal 18 for contact reinforcement is pattern-deposited on a root portion of each electrode. This BB cross section is shown in FIG.

The base film 11 on which the transparent common electrode, the photoconductive layer, and the transparent insulating layer are formed and the base film 16 on which the area selection electrode is formed are successively and successively arranged as shown in FIG. And an information recording layer 1 in which liquid crystal is dispersed and fixed in, for example, an ultraviolet-curable or thermosetting resin.
9 is continuously coated on the base film 16 from the supply device 27, and these films 11 and 16 are abutted by rollers 30 and 31 so that the sides on which electrodes are formed are opposed to each other. In the sandwiched state, the resin is cured by irradiating ultraviolet rays from the ultraviolet irradiation device 28 or by heating. After the resin is cured, it is cut to a predetermined length, and a sectional view of FIG.
As shown in the plan view of (b), a card-type liquid crystal recording medium is continuously manufactured. In FIG. 2F, the liquid crystal layer is coated on the base film 16,
The film 11 may be coated.

As shown in FIG. 4, a band-shaped hole 42 is formed in a drum 40, a deposition source 41 is disposed in the drum, and the base film 16 is formed in the drum. The area selection electrode and the contact electrode may be formed by vapor deposition by continuously and successively supplying them.

[0052]

As described above, according to the present invention, a card-type liquid crystal recording medium capable of preventing bleeding of liquid crystal and damage, deformation, etc. of an ITO electrode formed on an information recording layer is continuously produced. It becomes possible.

[Brief description of the drawings]

FIG. 1 is a diagram showing a basic configuration of a card-type liquid crystal recording medium of the present invention.

FIG. 2 illustrates a method for manufacturing a liquid crystal recording medium.

FIG. 3 is a diagram for explaining a manufactured liquid crystal recording medium.

FIG. 4 is a diagram illustrating a method of forming an area selection electrode.

[Explanation of symbols]

11, 16: base film, 12: transparent common electrode, 1
3 ... contact reinforcing electrode, 14 ... photoconductive layer, 15 ... intermediate layer, 17 ... area selection electrode, 18 ... contact reinforcing electrode, 19 ... information recording layer.

────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-3-221919 (JP, A) JP-A-4-86807 (JP, A) JP-A-63-216759 (JP, A) (58) Field (Int.Cl. ⁷ , DB name) G02F 1/1334 G02F 1/13 505 G03G 15/00 G02F 1/1343 G11B 7/24 501

Claims (2)

(57) [Claims] 1. A transparent common electrode is formed on a continuously supplied transparent first base film by sputtering, and a metal for contact reinforcement is deposited on the transparent common electrode along one edge of the base film. A step of coating a photoconductive layer comprising a charge generation layer, a charge transport layer and a transparent insulating layer on the transparent common electrode, from one edge to the other edge of the continuously supplied second base film. A step of pattern-sputtering a transparent area-selecting electrode extending in a strip shape and pattern-depositing a metal for contact reinforcement at the root of the area-selecting electrode; a first step in which a transparent common electrode, a photoconductive layer and a transparent insulating layer are formed; Second film with base film and area selection electrode formed
The base film is continuously supplied to each of the first and second base films, and the liquid crystal is dispersed and fixed in an ultraviolet curable or thermosetting resin .
A card type liquid crystal comprising a step of coating an information recording layer for writing information in a corresponding area, abutting both base films to cure the resin by ultraviolet irradiation or heating, and cutting the resin to a predetermined length after curing. Recording medium production method. 2. A card-type liquid crystal recording medium produced by the method according to claim 1.