JP2553574B2 - Silver stripper - Google Patents

Silver stripper

Info

Publication number
JP2553574B2
JP2553574B2 JP18374487A JP18374487A JP2553574B2 JP 2553574 B2 JP2553574 B2 JP 2553574B2 JP 18374487 A JP18374487 A JP 18374487A JP 18374487 A JP18374487 A JP 18374487A JP 2553574 B2 JP2553574 B2 JP 2553574B2
Authority
JP
Japan
Prior art keywords
silver
stripping solution
acid
copper
test piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP18374487A
Other languages
Japanese (ja)
Other versions
JPS6428385A (en
Inventor
富雄 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NE Chemcat Corp
Original Assignee
NE Chemcat Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NE Chemcat Corp filed Critical NE Chemcat Corp
Priority to JP18374487A priority Critical patent/JP2553574B2/en
Publication of JPS6428385A publication Critical patent/JPS6428385A/en
Application granted granted Critical
Publication of JP2553574B2 publication Critical patent/JP2553574B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • C23F1/30Acidic compositions for etching other metallic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/44Compositions for etching metallic material from a metallic material substrate of different composition

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は銀剥離液に関する。TECHNICAL FIELD The present invention relates to a silver stripping solution.

より詳細には、本発明は、めっき等の手段によって金
属基体の表面に固定された銀固着物を金属基体をいため
ることなく選択的に剥離し、また不必要な部分の薄い銀
固着物のために製品として認められない物の不必要な部
分の薄い銀固有物を、他の必要な部分の厚い銀固着物の
外観を損なわずかつ金属基体をいためることなく、剥離
することができる銀剥離液に関する。
More specifically, the present invention selectively peels a silver adherent fixed on the surface of a metal base by means such as plating without damaging the metal base, and also provides a thin silver adherent in an unnecessary portion. Silver stripping solution that can remove the thin silver-specific material in unnecessary parts of the product that is not recognized as a product, without damaging the appearance of thick silver adherents in other necessary parts and without damaging the metal substrate. Regarding

(従来技術) 従来、銀めっきを施しためっき製品等から銀を剥離す
る方法は各種利用、報告されている。
(Prior Art) Conventionally, various methods for peeling silver from a plated product or the like plated with silver have been reported.

硝酸或は王水等を用いて金属基体も含めて銀を溶解す
る従来の方法では、金属基体の再利用は当然不可能であ
り、また酸の使用による作業環境への影響、排水処理等
の問題がある。
The conventional method of dissolving silver including nitric acid or aqua regia in a metallic base material cannot naturally reuse the metallic base material. Also, the influence of the use of acid on the working environment, wastewater treatment, etc. There's a problem.

エチレンジアミン四酢酸又はそのアルカリ塩と過酸化
水素(特開昭52−78632)により銀の錯塩を形成させる
錯化法では、溶解した銀は化学的に安定したキレート化
合物になっているのでイオン置換によって析出すること
がないと記載されているが、銀の溶解量が0.1〜0.2g/
程度で銀の置換析出が認められ、銀の溶解処理量として
は不充分である。
In the complexation method of forming a silver complex salt with ethylenediaminetetraacetic acid or its alkali salt and hydrogen peroxide (Japanese Patent Laid-Open No. 52-78632), the dissolved silver is a chemically stable chelate compound. Although it is described that it does not precipitate, the amount of silver dissolved is 0.1 to 0.2 g /
Substitutional precipitation of silver was observed to some extent, and the amount of silver solution processed was insufficient.

また、アンモニウム塩と過酸化水素(特開昭55−1640
75)により銀の錯塩を形成させる錯化法では、銀の完全
な溶解は困難であり、たとえ完全に溶解が出来たとして
も金属基体への銀の置換析出が起り、或は金属基体を再
使用に耐えない程度に腐蝕してしまうことが多く、また
不必要な部分の薄い銀固着物を剥離した時、他の必要な
部分の厚い銀固着物の外観は損なわれてしまう。
In addition, ammonium salts and hydrogen peroxide (JP-A-55-1640)
In the complexation method of forming a complex salt of silver according to 75), it is difficult to completely dissolve silver, and even if the silver is completely dissolved, substitutional deposition of silver on the metal substrate occurs, or the metal substrate is re-formed. In many cases, it corrodes to the extent that it cannot be used, and when the unnecessary thin portion of the silver fixing material is peeled off, the appearance of the other necessary portion of the thick silver fixing material is impaired.

さらにまた、電解方法においても同様に、金属基体を
再使用に耐えない程度に腐蝕し、また不必要な部分の薄
い銀固着物を剥離すると他の必要な部分の厚い銀固着物
の外観は損なわれてしまう。
Furthermore, also in the electrolysis method, the metal substrate is also corroded to the extent that it cannot be reused, and the peeling of the thin silver adherents in unnecessary portions impairs the appearance of thick silver adherents in other necessary portions. Get lost.

シアン化合物と有機酸化剤又はチオ尿素等を用いる方
法においても同様である。
The same applies to the method using a cyanide compound and an organic oxidant or thiourea.

(発明の目的) 本発明の目的は、多量の銀の溶解処理が可能で、金属
基体を損傷することなく、金属基体表面に固着した銀固
着物を効果的に溶解、剥離し金属基体の再使用を可能に
する金属基体の再使用目的(以下、「金属基体の再使用
目的」という)に使用する銀剥離液、及び不必要な部分
に薄い銀固着物が存在するために製品として認められな
い物をその不必要な部分の薄い銀固着物を剥離した時、
金属基体同様他の必要な部分の厚い銀固着物の外観を損
なわずに製品化する目的(以下、「製品の修正目的」と
いう)に使用する銀剥離液を提供することにある。
(Object of the invention) The object of the present invention is to enable dissolution treatment of a large amount of silver, and to effectively dissolve and peel off silver adhered matter fixed to the surface of the metal substrate without damaging the metal substrate to re-deposit the metal substrate. It is recognized as a product because of the silver stripping solution used for the purpose of reusing the metal substrate (hereinafter referred to as "the purpose of reusing the metal substrate") and the presence of thin silver adherents in unnecessary parts. When you peel off the unnecessary silver thin adhered material on the unnecessary part,
Another object of the present invention is to provide a silver stripping solution which is used for the purpose of commercializing the product without impairing the appearance of a thick silver-fixed product in other necessary portions as in the case of a metal substrate (hereinafter referred to as "product modification purpose").

(問題点を解決する手段) 本発明は、上記の問題点を解決する手段として、溶液
中において遊離の塩素イオンを生じせしめ得る塩素化有
機化合物から選ばれる少なくとも1種を0.01〜50g/、
及びアンモニウム塩、アミノ基及び/又はイミノ基を含
有する化合物から選ばれる少なくとも1種を0.01〜70g/
含有し、さらに、過酸化水素を1〜250g/含有する
銀剥離液を提供するものである。
(Means for Solving Problems) As a means for solving the above problems, the present invention comprises 0.01 to 50 g / of at least one selected from chlorinated organic compounds capable of producing free chlorine ions in a solution.
And at least one compound selected from ammonium salts, compounds containing an amino group and / or an imino group, in an amount of 0.01 to 70 g /
The present invention provides a silver stripping solution containing hydrogen peroxide in an amount of 1 to 250 g / hydrogen.

本発明の銀剥離液に含有される溶液中において遊離の
塩素イオンを生じせしめ得る塩素化有機化合物(以下、
「塩素化有機化合物」という)は、金属基体の損傷を防
止し、溶解した銀イオンを塩化銀として系外に除き、置
換析出を防止する作用を有するものである。この様な塩
素化有機化合物は、酸性溶液中において遊離の塩素イオ
ンを生じせしめ得るものであればよいが、特に好ましい
ものとして、クロロアニス酸、クロロ安息香酸、クロロ
ケイ皮酸、クロロ酢酸、クロロサリチル酸、クロロスル
ホン酸、クロロニコチン酸、クロロフェニル酢酸、クロ
ロフェノキシ酢酸、クロロフタル酸、クロロプロピオン
酸、クロロベンゼンスルホン酸、クロロマレイン酸、ク
ロロマンデル酸、クロロ酪酸等の塩素化有機酸及びその
塩及びその誘導体、アセチルクロリド、オキサリルクロ
リド、フタロイルクロリド、プロピオニルクロリド、ベ
ンゾイルクロリド、マロニルクロリド等のハロゲン化ア
シル及びその誘導体、及びクロロアニリン、クロロベン
ジルピリジン等のハロゲン化物及びその誘導体等を挙げ
ることができる。
Chlorinated organic compounds capable of producing free chlorine ions in the solution contained in the silver stripper of the present invention (hereinafter,
The "chlorinated organic compound") has a function of preventing damage to the metal substrate and removing the dissolved silver ions as silver chloride out of the system to prevent substitution precipitation. Such a chlorinated organic compound may be one that can generate free chlorine ions in an acidic solution, but as particularly preferable, chloroanisic acid, chlorobenzoic acid, chlorocinnamic acid, chloroacetic acid, chlorosalicylic acid, Chlorinated organic acids such as chlorosulfonic acid, chloronicotinic acid, chlorophenylacetic acid, chlorophenoxyacetic acid, chlorophthalic acid, chloropropionic acid, chlorobenzenesulfonic acid, chloromaleic acid, chloromandelic acid, and chlorobutyric acid, and salts and derivatives thereof, acetyl. Acyl halides and derivatives thereof such as chloride, oxalyl chloride, phthaloyl chloride, propionyl chloride, benzoyl chloride and malonyl chloride, and halides such as chloroaniline and chlorobenzylpyridine and derivatives thereof, etc. It can be.

通常これらの塩素化有機化合物のうち1種又は2種以
上を0.01〜50g/、好ましくは0.1〜20g/の濃度で含
有させる。金属基体の再使用目的には、5〜20g/、製
品の修正目的には0.1〜5g/の濃度で含有させることが
好ましい。0.01g/以下では金属基体と銀の置換析出が
おこり、又、金属基体の保護効果が不充分であり、金属
基体の腐蝕がおこり、実用的でない。塩素化有機化合物
の濃度が50g/を超えると、銀固着物の剥離速度が減少
し、また溶解が困難又は不可能となる。
Usually, one or more of these chlorinated organic compounds are contained in a concentration of 0.01 to 50 g /, preferably 0.1 to 20 g /. It is preferable that the metal substrate is contained in a concentration of 5 to 20 g / for the purpose of reuse, and a concentration of 0.1 to 5 g / for the purpose of correcting the product. If it is less than 0.01 g / g, substitutional precipitation of the metal substrate and silver will occur, and the effect of protecting the metal substrate will be insufficient, resulting in corrosion of the metal substrate, which is not practical. When the concentration of the chlorinated organic compound exceeds 50 g /, the peeling speed of the silver-fixed matter decreases and the dissolution becomes difficult or impossible.

アンモニウム塩、アミノ基及び/又はイミノ基を含有
する化合物(以下、「アンモニア化合物」という)は、
溶解された銀イオンを錯化することにより、その溶解を
促進する作用を有する。この様なアンモニア化合物とし
ては、例えば、安息香酸アンモニウム、クエン酸アンモ
ニウム、コハク酸アンモニウム、酢酸アンモニウム、硝
酸アンモニウム、炭酸アンモニウム、フタル酸アンモニ
ウム、硝酸アンモニウム等のアンモニウム塩、アミノピ
リジン、エタノールアミン、エチルアミン、エチレンジ
アミン、キノリルアミン、ジエチルアミン、トリメチル
アミン、プロパンジアミン、メチルアミン等のアミン化
合物及びその誘導体、プロパンイミン等のイミン化合物
及びその誘導体等を挙げることができる。
A compound containing an ammonium salt, an amino group and / or an imino group (hereinafter referred to as “ammonia compound”) is
By complexing the dissolved silver ion, it has the effect of promoting the dissolution. As such an ammonia compound, for example, ammonium benzoate, ammonium citrate, ammonium succinate, ammonium acetate, ammonium nitrate, ammonium carbonate, ammonium phthalate, ammonium salts such as ammonium nitrate, aminopyridine, ethanolamine, ethylamine, ethylenediamine, Examples thereof include amine compounds such as quinolylamine, diethylamine, trimethylamine, propanediamine and methylamine and their derivatives, and imine compounds such as propaneimine and their derivatives.

これらのアンモニア化合物のうち1種又は2種以上を
0.01〜70g/、好ましくは0.1〜50g/の濃度で含有さ
せる。金属基体の再使用目的には、5〜50g/、製品の
修正目的には0.1〜5g/の濃度で含有させることが好ま
しい。0.01g/以下では銀固着物の溶解速度が減少し、
実用的ではない。又、70g/を超えると金属基体の保護
効果が不充分であり、金属基体の腐蝕がおこることがあ
り、金属基体の再利用が困難となることがある。
One or more of these ammonia compounds
It is contained at a concentration of 0.01 to 70 g /, preferably 0.1 to 50 g /. It is preferable that the metal substrate is contained in a concentration of 5 to 50 g / for reuse and 0.1 to 5 g / for modification of the product. If it is less than 0.01g /, the dissolution rate of silver adherent will decrease,
Not practical. If it exceeds 70 g /, the effect of protecting the metal substrate is insufficient, corrosion of the metal substrate may occur, and it may be difficult to reuse the metal substrate.

過酸化水素は、酸化剤として銀固着物を速やかに溶解
する作用を有するものであり、通常過酸化水素水として
使用される。過酸化水素は1〜250g/、好ましくは3
〜200g/の濃度で含有させる。金属基体の再使用目的
には、60〜200g/、製品の修正目的には3〜60g/の
濃度で含有させることが好ましい。1g/以下では銀固
着物の溶解速度が減少し、実用的ではない。又、250g/
を超えると金属基体の保護効果が不充分であり、金属
基体の腐蝕がおこることがあり、金属基体の再使用が困
難となることがある。
Hydrogen peroxide has a function of rapidly dissolving a silver-fixed substance as an oxidizing agent, and is usually used as hydrogen peroxide solution. Hydrogen peroxide is 1-250 g /, preferably 3
Include at a concentration of ~ 200g /. It is preferable that the metal substrate is contained in a concentration of 60 to 200 g / for the purpose of reuse, and the concentration of 3 to 60 g / for the purpose of correcting the product. If it is 1 g / g or less, the dissolution rate of silver-adhered substances decreases, which is not practical. Also, 250g /
If it exceeds, the protective effect of the metal substrate is insufficient, corrosion of the metal substrate may occur, and it may be difficult to reuse the metal substrate.

本発明の銀剥離液の使用条件として、pHは特に制限は
ないが、低い方が銀固着物の剥離速度は大であり、通常
3〜7程度で使用するのが好ましい。温度も特に制限は
ないが、高い方が銀固着物の剥離速度は大であり、通常
20〜60℃程度で使用するのが好ましい。又、銀剥離液は
攪拌しなくても剥離は進行するが、銀固着物の剥離を促
進する上で攪拌することが好ましいことは当然である。
The conditions for using the silver stripping solution of the present invention are not particularly limited to pH, but the lower the pH, the higher the stripping speed of the silver-fixed material, and it is usually preferred to use the pH of about 3 to 7. The temperature is also not particularly limited, but the higher the temperature, the higher the peeling speed of the silver adhered matter,
It is preferably used at about 20 to 60 ° C. Further, although the peeling of the silver stripping solution proceeds without stirring, it is naturally preferable to stir the silver stripping solution to promote the peeling of the silver-fixed material.

本発明の銀剥離液が適用される銀固着物の形態として
は、例えば、電気めっき、無電気めっき、化学蒸着法
(CVD法)、物理蒸着法(PVD法)、ペーストの焼き付け
等により金属基体表面の全体或は一部に形成された銀皮
膜が挙げられるが、これに限定されず、あらゆる形態の
銀固着物の剥離に使用することができる。
Examples of the form of the silver adherent to which the silver stripping solution of the present invention is applied include electroplating, electroless plating, chemical vapor deposition (CVD), physical vapor deposition (PVD), paste baking, and the like. Examples thereof include a silver film formed on the entire surface or a part of the surface, but the present invention is not limited to this, and can be used for peeling a silver adhered material in any form.

銀固着物が固定されている金属基体の金属の種類は特
に限定されないが、本発明の銀剥離液は、基体が銅及び
銅合金の他、亜鉛、ニッケル、鉄、クロム、チタン、ニ
オブ、モリブデン又はこれらの金属を基とする合金の場
合に有効であり、金属基体を損傷することなく銀固着物
を剥離することができる。又、金属基体の形状、形態は
まったく制限されず、金属、セラミックス、プラスチッ
ク、ゴム等の上に形成された金属被覆層のごときものも
包含される。
The type of metal of the metal substrate to which the silver adherent is fixed is not particularly limited, but the silver stripping solution of the present invention has a substrate of copper, copper alloy, zinc, nickel, iron, chromium, titanium, niobium, molybdenum. Alternatively, it is effective in the case of alloys based on these metals, and the silver adhered substance can be peeled off without damaging the metal substrate. Further, the shape and form of the metal substrate is not limited at all, and includes a metal coating layer formed on metal, ceramics, plastic, rubber or the like.

本発明の銀剥離液を銀固着物に施す方法は、特に限定
されないが、通常、基体ごと銀剥離液中に浸漬する方法
が一般的である。適当時間銀剥離液に浸漬し、目的の銀
皮膜が溶解したならば金属基体を液から引き揚げて水洗
して銀剥離液を洗い落とし、酸洗いすることにより、金
属基体表面に形成されていた不活性層は、溶解して容易
に除去でき、かつその表面は直ちに再び銀被覆を施すこ
とが可能な程度に平滑な面を保っている。
The method of applying the silver stripping solution of the present invention to a silver-fixed material is not particularly limited, but generally a method of immersing the whole substrate in the silver stripping solution is common. When the target silver film is dissolved by immersing it in the silver stripping solution for an appropriate time, the metal substrate is lifted from the solution, washed with water to wash off the silver stripping solution, and then pickled to remove the inertness formed on the surface of the metal substrate. The layer dissolves and can be easily removed, and its surface remains so smooth that it can be immediately recoated with silver.

使用した銀剥離液は、これらの剥離を繰り返し、液中
の有効成分がある程度以下になったら、銀は既に一部塩
化銀として析出しているが、塩素イオンを添加すること
により、銀を塩化銀として析出させる。この方法によっ
て銀を効率良く回収することができる。
The silver stripping solution used was repeatedly stripped, and when the active ingredient in the solution fell below a certain level, silver had already partially precipitated as silver chloride. Precipitate as silver. By this method, silver can be efficiently recovered.

(実施例) 以下、本発明を実施例及び比較例に従って詳細に説明
するが、特にこれらに限定されるものではない。
(Examples) Hereinafter, the present invention will be described in detail according to Examples and Comparative Examples, but is not particularly limited thereto.

実施例1 クロロ安息香酸5g/、安息香酸アンモニウム20g/
、過酸化水素200g/を含有する水溶液からなる銀剥
離液を調製し、安息香酸又は28%アンモニア水をpH調整
試薬として用いて該銀剥離液のpHを5.0、温度を30℃に
調整した。次に、この銀剥離液に、25×40mm、厚さ1mm
の銅板に銅をストライクめっきしたものの上に厚さ5μ
mの銀スポットめっきを施したものをテストピースとし
て浸漬した。
Example 1 Chlorobenzoic acid 5 g /, ammonium benzoate 20 g /
A silver stripping solution consisting of an aqueous solution containing 200 g / hydrogen peroxide was prepared, and the pH of the silver stripping solution was adjusted to 5.0 and the temperature was adjusted to 30 ° C. using benzoic acid or 28% aqueous ammonia as a pH adjusting reagent. Next, in this silver stripper, 25 × 40 mm, thickness 1 mm
5μ thickness on the strike plate of copper on the copper plate
What was subjected to m spot silver plating was immersed as a test piece.

7分後に銀は完全に溶解した。銀剥離後の銅板を水
洗、酸洗、乾燥をした後、得られたその銅板は、全面が
均一であり、銀スポットの痕跡も認められなかった。こ
の銅板に再度5μmの銀スポットめっきを施したが、用
いたテストピースの外観となんら差異は認められず、基
体(銅板)の腐蝕はなく、再使用が可能であった。
After 7 minutes the silver had completely dissolved. After the copper plate after the silver peeling was washed with water, pickled and dried, the obtained copper plate was uniform on the entire surface and no trace of silver spots was observed. This copper plate was again subjected to silver spot plating of 5 μm, but no difference was observed with the appearance of the test piece used, and there was no corrosion of the substrate (copper plate), and reuse was possible.

又、この銀剥離液に銀粉1.5g/を添加、溶解後、同
様にテストピースを処理したところ、10分後に銀が完全
に溶解し、銀の置換析出も見られず、銀粉の添加、溶解
前と同様な結果が得られた。
Also, after adding and dissolving 1.5 g of silver powder to this silver stripping solution and treating the test piece in the same manner, the silver was completely dissolved after 10 minutes and no substitution precipitation of silver was observed. Similar results were obtained as before.

実施例2 実施例1において、銀スポットめっきを施さない以外
は実施例1と同様にして8時間銀剥離液に浸漬した。浸
漬後の銅板を水洗、酸洗い、乾燥をした後、得られたそ
の銅板は、全面が均一であり、浸漬前のテストピースの
外観となんら差異は認められなかった。又、浸漬前後に
おける銅板の重量は測定誤差範囲において同一であり、
表面粗さにも差異がなく、基体(銅板)の腐蝕は認めら
れなかった。
Example 2 It was immersed in a silver stripping solution for 8 hours in the same manner as in Example 1 except that the silver spot plating was not performed. After the copper plate after the immersion was washed with water, pickled and dried, the obtained copper plate was uniform on the entire surface, and no difference from the appearance of the test piece before the immersion was observed. Also, the weight of the copper plate before and after immersion is the same within the measurement error range,
There was no difference in surface roughness, and no corrosion of the substrate (copper plate) was observed.

又、この銀剥離液に銀粉1.5g/を添加、溶解後、同
様にテストピースを処理したところ、銀の置換析出も見
られず、銀粉の添加、溶解前と同様な結果が得られた。
When 1.5 g / g of silver powder was added to this silver stripping solution and dissolved, and then a test piece was treated in the same manner, substitution precipitation of silver was not observed, and the same results as before addition and dissolution of silver powder were obtained.

実施例3 実施例1において、テストピースを25×40mm、厚さ0.
25mmの鉄−ニッケル合金板(42合金板)を使用した(銅
ストライクめっきおよび銀スポットめっき無)以外は実
施例1と同様にして8時間銀剥離液に浸漬した。浸漬後
の42合金板を水洗、酸洗、乾燥をした後、得られたその
42合金板は、全面が均一であり、浸漬前のテストピース
の外観となんら差異は認められなかった。又、浸漬前後
における42合金板の重量は測定誤差範囲において同一で
あり、表面粗さにも差異がなく、基体(42合金板)の腐
蝕は認められなかった。
Example 3 In Example 1, the test piece was 25 × 40 mm, and the thickness was 0.
It was immersed in a silver stripping solution for 8 hours in the same manner as in Example 1 except that a 25 mm iron-nickel alloy plate (42 alloy plate) was used (without copper strike plating and silver spot plating). The 42 alloy plate after immersion was washed with water, pickled and dried, and then obtained
The 42 alloy plate was uniform on the entire surface, and no difference was observed from the appearance of the test piece before immersion. Further, the weight of the 42 alloy plate before and after the immersion was the same in the measurement error range, there was no difference in surface roughness, and no corrosion of the substrate (42 alloy plate) was observed.

又、この銀剥離液に銀粉1.5g/を添加、溶解後、同
様にテストピースを処理したところ、銀の置換析出も見
られず、銀粉の添加、溶解前と同様な結果が得られた。
When 1.5 g / g of silver powder was added to this silver stripping solution and dissolved, and then a test piece was treated in the same manner, substitution precipitation of silver was not observed, and the same results as before addition and dissolution of silver powder were obtained.

実施例4 クロロ酢酸0.1g/、酢酸アンモニウム0.1g/、過酸
化水素33g/を含有する水溶液からなる銀剥離液を調製
し、酢酸又は28%アンモニア水をpH調整試薬として用い
て該銀剥離液のpHを4.0、温度を40℃に調整した。次
に、この銀剥離液に、厚さ0.25mmのリン青銅のリードフ
レームに銅をストライクめっきしたものの上に厚さ5μ
m(スポットA)と0.1μm(スポットB)の銀スポッ
トめっきを施したものをテストピースとして浸漬した。
Example 4 A silver stripping solution comprising an aqueous solution containing 0.1 g of chloroacetic acid / 0.1 g of ammonium acetate / 33 g / of hydrogen peroxide was prepared and the silver stripping solution was prepared by using acetic acid or 28% ammonia water as a pH adjusting reagent. The pH was adjusted to 4.0 and the temperature was adjusted to 40 ° C. Next, this silver stripper is applied to a lead bronze bronze with a thickness of 0.25 mm, which is strike-plated with copper.
Those subjected to silver spot plating of m (spot A) and 0.1 μm (spot B) were immersed as test pieces.

30秒後にスポットBの銀は完全に溶解した。銀剥離後
のリードフレームを水洗、酸洗、乾燥をした後、スポッ
トAの銀膜厚は4.9μmであり、外観は良好であった。
銅部分の外観及び表面粗さは剥離前後で差異はなく、腐
蝕は認められなかった。
After 30 seconds, the silver in spot B was completely dissolved. After the lead frame after silver peeling was washed with water, pickled and dried, the silver film thickness of spot A was 4.9 μm and the appearance was good.
The appearance and surface roughness of the copper part were the same before and after peeling, and no corrosion was observed.

又、この銀剥離液に適時クロロ酢酸、酢酸アンモニウ
ム、過酸化水素を上記と同一比率で補充しながら、銀粉
1.7g/を添加、溶解後、同様にテストピースを処理し
たところ、銀の置換析出も見られず、銀粉の添加、溶解
前と同様な結果が得られた。
Also, this silver stripping solution should be replenished with chloroacetic acid, ammonium acetate and hydrogen peroxide at the same ratios as above, while adding silver powder
When 1.7 g / was added and dissolved, and the test piece was treated in the same manner, substitution precipitation of silver was not observed, and the same results as before addition and dissolution of silver powder were obtained.

実施例5 クロロスルホン酸20g/、硫酸アンモニウム50g/、
過酸化水素133g/を含有する水溶液からなる銀剥離液
を調製し、硫酸又は28%アンモニア水をpH調整試薬して
用いて該銀剥離液のpHを5.0、温度を50℃に調整した。
次に、この銀剥離液に、25×40mm、厚さ1mmの鉄入り銅
合金板に銅をストライクめっきしたものの上に厚さ5μ
mの銀スポットめっきを施したものをテストピースとし
て浸漬した。
Example 5 Chlorosulfonic acid 20 g /, ammonium sulfate 50 g /,
A silver stripping solution consisting of an aqueous solution containing 133 g / of hydrogen peroxide was prepared, and the pH of the silver stripping solution was adjusted to 5.0 and the temperature was adjusted to 50 ° C. using sulfuric acid or 28% ammonia water as a pH adjusting reagent.
Next, this silver stripper was strike-plated with copper on a copper alloy plate containing iron with a thickness of 25 × 40 mm and a thickness of 1 mm, and a thickness of 5 μ
What was subjected to m spot silver plating was immersed as a test piece.

5分後に銀は完全に溶解した。銀剥離後の銅板を水
洗、酸洗、乾燥をした後、得られたその銅合金板は、全
面が均一であり、銀スポットの痕跡も認められなかっ
た。この銅合金板に再度5μmの金スポットめっきを施
したが、用いたテストピースの外観となんら差異は認め
られず、基体の腐蝕はなく、再使用が可能であった。
After 5 minutes the silver had completely dissolved. After the copper plate after the silver peeling was washed with water, pickled and dried, the obtained copper alloy plate was uniform on the entire surface and no trace of silver spots was observed. This copper alloy plate was again subjected to 5 μm gold spot plating, but no difference was observed from the appearance of the test piece used, and there was no corrosion of the substrate, and reuse was possible.

又、この銀剥離液に銀粉1.5g/を添加、溶解後、同
様にテストピースを処理したところ、7分後に銀が完全
に溶解し、銀の置換析出も見られず、銀粉の添加、溶解
前と同様な結果が得られた。
In addition, after adding and dissolving 1.5 g of silver powder to this silver stripping solution and treating the test piece in the same manner, the silver was completely dissolved after 7 minutes and no substitution precipitation of silver was observed. Similar results were obtained as before.

実施例6 クロロプロピオン酸1g/、トリメチルアミン2g/、
過酸化水素3g/を含有する水溶液からなる銀剥離液を
調製し、プロピオン酸又は28%アンモニア水をpH調整試
薬として用いて該銀剥離液のpHを3.5、温度を40℃に調
整した。次に、この銀剥離液に、0.25mm、錫入り銅合金
のリードフレームに銅をストライクめっきしたものの上
に厚さ5μm(スポットA)と0.05μm(スポットB)
の銀スポットめっきを施したものをテストピースとして
浸漬した。
Example 6 Chloropropionic acid 1 g /, trimethylamine 2 g /,
A silver stripping solution consisting of an aqueous solution containing 3 g of hydrogen peroxide was prepared, and the pH of the silver stripping solution was adjusted to 3.5 and the temperature was adjusted to 40 ° C. using propionic acid or 28% ammonia water as a pH adjusting reagent. Next, this silver stripping solution is applied to a lead frame made of copper alloy containing tin and having a thickness of 5 μm (spot A) and 0.05 μm (spot B) on a lead alloy of copper alloy containing tin.
What was subjected to silver spot plating was immersed as a test piece.

20秒後にスポットBの銀は完全に溶解した。銀剥離後
のリードフレームを水洗、酸洗、乾燥をした後、スポッ
トAの銀膜厚は4.9μmであり、やや光沢がなくなった
以外外観は良好であった。銅部分の外観及び表面粗さは
剥離前後で差異はなく腐蝕は認められなかった。
After 20 seconds, the silver in spot B was completely dissolved. After the lead frame after the silver peeling was washed with water, pickled and dried, the silver film thickness of the spot A was 4.9 μm, and the appearance was good except that the gloss was slightly lost. The appearance and surface roughness of the copper portion were the same before and after peeling, and no corrosion was observed.

又、この銀剥離液に適時クロロプロピオン酸、トリメ
チルアミン、過酸化水素を上記と同一比率で補充しなが
ら、銀粉1.0g/を添加、溶解後、同様にテストピース
を処理したところ、銀の置換析出も見られず、銀粉の添
加、溶解前と同様な結果が得られた。
Further, while adding chloropropionic acid, trimethylamine, and hydrogen peroxide in the same ratio as above to this silver stripping solution at a suitable time, 1.0 g / g of silver powder was added and dissolved, and then the test piece was treated in the same manner. The same results as before the addition and dissolution of silver powder were obtained.

実施例7 クロロ酢酸5g/、炭酸アンモニウム10g/、過酸化
水素200g/を含有する水溶液からなる銀剥離液を調製
し、酢酸又は28%アンモニア水をpH調整試薬として用い
て該銀剥離液のpHを3.5、温度を60℃に調整した。次
に、この銀剥離液に、25×40mm、厚さ1mmのクロム入り
の銅合金板に銅をストライクめっきしたものの上に厚さ
5μmの銀スポットめっきを施したものをテストピース
として浸漬した。
Example 7 A silver stripper was prepared from an aqueous solution containing chloroacetic acid 5 g /, ammonium carbonate 10 g /, and hydrogen peroxide 200 g /, and the pH of the silver stripper was adjusted using acetic acid or 28% ammonia water as a pH adjusting reagent. Was adjusted to 3.5 and the temperature was adjusted to 60 ° C. Next, a 25 × 40 mm, 1 mm thick chromium-containing copper alloy plate, which was strike-plated with copper, was plated with silver spot plating with a thickness of 5 μm, and immersed in this silver stripping solution as a test piece.

4分後に銀は完全に溶解した。銀剥離後の銅板を水
洗、酸洗、乾燥をした後、得られたその銅合金板は、全
面が均一であり、銀スポットの痕跡も認められなかっ
た。この銅合金板に再度5μmの銀スポットめっきを施
したが、用いたテストピースの外観となんら差異は認め
られず、基体の腐蝕はなく、再使用が可能であった。
After 4 minutes the silver had completely dissolved. After the copper plate after the silver peeling was washed with water, pickled and dried, the obtained copper alloy plate was uniform on the entire surface and no trace of silver spots was observed. This copper alloy plate was again subjected to silver spot plating of 5 μm, but no difference was observed with the appearance of the test piece used, and there was no corrosion of the substrate, and reuse was possible.

又、この銀剥離液に、銀粉1.2g/を添加、溶解後、
同様にテストピースを処理したところ、6分後に銀は完
全に溶解し、銀の置換析出も見られず、銀粉の添加、溶
解前と同様な結果が得られた。
In addition, 1.2g / of silver powder was added to this silver stripping solution, and after dissolution,
When the test piece was treated in the same manner, the silver was completely dissolved after 6 minutes, no substitution precipitation of silver was observed, and the same results as before the addition and dissolution of the silver powder were obtained.

比較例1 クロロ安息香酸0.001g/、安息香酸アンモニウム100
g/、過酸化水素200g/を含有する水溶液からなる剥
離液を調製し、安息香酸又は28%アンモニア水をpH調整
試薬として用いて該剥離液のpHを5.0、温度を30℃に調
整した。次に、この剥離液に、25×40mm、厚さ1mmの銅
板に銅をストライクめっきしたものの上に厚さ5μmの
銀スポットめっきを施したものをテストピースとして浸
漬した。
Comparative Example 1 Chlorobenzoic acid 0.001 g /, ammonium benzoate 100
A stripping solution consisting of an aqueous solution containing g /, hydrogen peroxide 200 g / was prepared, and the pH of the stripping solution was adjusted to 5.0 and the temperature was adjusted to 30 ° C. using benzoic acid or 28% ammonia water as a pH adjusting reagent. Then, a strip of 25 × 40 mm and a thickness of 1 mm, which was strike-plated with copper, and spot-plated with silver having a thickness of 5 μm, was immersed in this stripping solution as a test piece.

15分後に銀はほぼ溶解した。銀剥離後の銅板を水洗、
酸洗、乾燥をした後、得られたその銅板は、銀が置換析
出し、全面が白色であった。
After 15 minutes the silver had almost dissolved. Rinse the copper plate after removing the silver,
After pickling and drying, the obtained copper plate had silver replaced and deposited, and the entire surface was white.

比較例2 クロロ酢酸5g/、過酸化水素200g/を含有する水溶
液からなる剥離液を調製し、酢酸又は水酸化ナトリウム
をpH調整試薬として用いて該剥離液のpHを5.0、温度を3
0℃に調整した。次に、この剥離液に、厚さ25×40mm、
厚さ1mmの銅板に銅をストライクめっきしたものの上に
厚さ5μmの銀スポットめっきを施したものをテストピ
ースとして浸漬した。
Comparative Example 2 A stripping solution consisting of an aqueous solution containing 5 g / chloroacetic acid and 200 g / hydrogen peroxide was prepared, and the pH of the stripping solution was 5.0 and the temperature was 3 using acetic acid or sodium hydroxide as a pH adjusting reagent.
The temperature was adjusted to 0 ° C. Next, in this stripper, a thickness of 25 × 40 mm,
A 1 mm-thick copper plate, which was strike-plated with copper, was plated with 5 μm-thick silver spots, and was immersed as a test piece.

15分後にテストピースを水洗、酸洗、乾燥をした後、
得られたそのテストピースは、銀の溶解は認められず、
基体表面は腐蝕され、黒変が認められた。
After 15 minutes, wash the test piece with water, pickle it and dry it,
In the obtained test piece, no silver dissolution was observed,
The surface of the substrate was corroded and blackening was observed.

比較例3 クロロプロピオン酸1g/、酢酸アンモニウム80g/
、過酸化水素3g/を含有する水溶液からなる剥離液
を調製し、プロピオン酸又は28%アンモニア水をpH調整
試薬として用いて該剥離液のpHを3.5、温度を40℃に調
整した。次に、この剥離液に、厚さ0.25mmの錫入り銅合
金のリードフレームに銅をストライクめっきしたものの
上に厚さ5μm(スポットA)と0.05μm(スポット
B)の銀スポットめっきを施したものをテストピースと
して浸漬した。
Comparative Example 3 Chloropropionic acid 1 g /, ammonium acetate 80 g /
A stripping solution consisting of an aqueous solution containing 3 g / of hydrogen peroxide was prepared, and the pH of the stripping solution was adjusted to 3.5 and the temperature was adjusted to 40 ° C. using propionic acid or 28% ammonia water as a pH adjusting reagent. Next, the stripping solution was plated with copper on a lead frame made of a tin-containing copper alloy having a thickness of 0.25 mm and was subjected to silver spot plating having a thickness of 5 μm (spot A) and 0.05 μm (spot B). The thing was immersed as a test piece.

20秒後にスポットBの銀は完全に溶解した。銀剥離後
のリードフレームを水洗、酸洗、乾燥をした後、スポッ
トAの銀膜厚は4.9μmであり、やや光沢がなくなった
以外外観は慨ね良好であった。しかし、銅部分は腐蝕さ
れ、ムラ、変色が認められた。
After 20 seconds, the silver in spot B was completely dissolved. After the lead frame after the peeling of silver was washed with water, pickled and dried, the silver film thickness of spot A was 4.9 μm, and the appearance was good, except that the gloss was slightly lost. However, the copper part was corroded, and unevenness and discoloration were observed.

比較例4 ニトロベンゼンスルフォン酸50g/、シアン化カリウ
ム40g/を含有する水溶液からなる剥離液を調製し、水
酸化カリウムをpH調整試薬として用いて該剥離液のpHを
11、温度を55℃に調整した。次に、この剥離液に、25×
40mm、厚さ1mmの銅板に銅をストライクめっきしたもの
の上に厚さ5μmの銀スポットめっきを施したものをテ
ストピースとして浸漬した。
Comparative Example 4 A stripping solution comprising an aqueous solution containing 50 g / nitrobenzenesulfonic acid and 40 g / potassium cyanide was prepared, and the pH of the stripping solution was adjusted by using potassium hydroxide as a pH adjusting reagent.
11, the temperature was adjusted to 55 ℃. Next, add 25x to this stripper
A 40 mm, 1 mm thick copper plate, which was strike-plated with copper, was plated with 5 μm thick silver spots, and was immersed as a test piece.

7分後に銀は完全に溶解した。銀剥離後の銅板を水
洗、酸洗、乾燥をした後、得られたその銅板は、基体表
面も侵蝕され黒変した。
After 7 minutes the silver had completely dissolved. After the copper plate after the silver peeling was washed with water, pickled and dried, the obtained copper plate was also corroded on the surface of the substrate and turned black.

比較例5 エチレンジアミン四酢酸2ナトリウム10g/、過酸化
水素17g/を含有する水溶液からなる剥離液を調製し、
該剥離液の温度を30℃に調整した。次に、この剥離液
に、厚さ25×40mm、厚さ1mmの銅板に銅をストライクめ
っきしたものの上に厚さ5μmの銀スポットめっきを施
したものをテストピースとして浸漬した。
Comparative Example 5 A stripping solution composed of an aqueous solution containing 10 g / of disodium ethylenediaminetetraacetic acid and 17 g / of hydrogen peroxide was prepared,
The temperature of the stripping solution was adjusted to 30 ° C. Next, a test piece was dipped in this stripping solution as a test piece having a thickness of 25 × 40 mm and a thickness of 1 mm, which was strike-plated with copper and then silver-plated with a thickness of 5 μm.

8分後に銀はほぼ溶解した。銀剥離後の銅板を水洗、
酸洗、乾燥をした後、得られたその銅合金板は、全面が
ほぼ均一であり、銀スポットの痕跡も殆ど認められなか
った。
After 8 minutes the silver had almost dissolved. Rinse the copper plate after removing the silver,
After pickling and drying, the obtained copper alloy plate was almost uniform on the entire surface, and traces of silver spots were hardly observed.

又、この剥離液に、銀粉0.1g/を添加、溶解後、同
様にテストピースを処理したところ、銀の溶解は認めら
れず、基体表面に置換析出が見られた。
Further, when 0.1 g / g of silver powder was added to this stripping solution and dissolved, and then the test piece was treated in the same manner, dissolution of silver was not observed and substitutional precipitation was observed on the surface of the substrate.

比較例6 エチレンジアミン四酢酸2ナトリウム50g/、過酸化
水素200g/を含有する水溶液からなる剥離液を調製
し、該剥離液の温度を30℃に調整した。次に、この剥離
液に、25×40mm、厚さ1mmの銅板に銅をストライクめっ
きしたものの上に厚さ5μmの銀スポットめっきを施し
たものをテストピースとして浸漬した。
Comparative Example 6 A stripping solution composed of an aqueous solution containing 50 g of disodium ethylenediaminetetraacetic acid and 200 g of hydrogen peroxide was prepared, and the temperature of the stripping solution was adjusted to 30 ° C. Then, a strip of 25 × 40 mm and a thickness of 1 mm, which was strike-plated with copper, and spot-plated with silver having a thickness of 5 μm, was immersed in this stripping solution as a test piece.

5分後に銀はほぼ溶解した。銀剥離後の銅板を水洗、
酸洗、乾燥をした後、得られたその銅合金板は、若干腐
蝕が見られ銀スポットの痕跡も殆ど認められなかった。
After 5 minutes the silver had almost dissolved. Rinse the copper plate after removing the silver,
After pickling and drying, the obtained copper alloy plate was slightly corroded, and traces of silver spots were hardly recognized.

又、この剥離液に、銀粉0.1g/を添加、溶解後、同
様にテストピースを処理したところ、銀の溶解は認めら
れず、基体表面に置換析出が見られた。
Further, when 0.1 g / g of silver powder was added to this stripping solution and dissolved, and then the test piece was treated in the same manner, dissolution of silver was not observed and substitutional precipitation was observed on the surface of the substrate.

比較例7 アンモニア63g/、過酸化水素17g/を含有する水溶
液からなる剥離液を調製し、該剥離液の温度を30℃に調
整した。次に、この剥離液に、25×40mm、厚さ1mmの銅
板に銅をストライクめっきしたものの上に厚さ5μmの
銀スポットめっきを施したものをテストピースとして浸
漬した。
Comparative Example 7 A stripping solution composed of an aqueous solution containing 63 g / ammonia and 17 g / hydrogen peroxide was prepared, and the temperature of the stripping solution was adjusted to 30 ° C. Then, a strip of 25 × 40 mm and a thickness of 1 mm, which was strike-plated with copper, and spot-plated with silver having a thickness of 5 μm, was immersed in the stripping solution as a test piece.

15分後に銀はほぼ溶解した。銀剥離後の銅板を水洗、
酸洗、乾燥をした後、得られたその銅板は、基体表面の
一部に銀の置換析出が見られ、全体に基体が腐蝕され黒
変した。
After 15 minutes the silver had almost dissolved. Rinse the copper plate after removing the silver,
After pickling and drying, in the obtained copper plate, substitutional deposition of silver was found on a part of the surface of the substrate, and the substrate was corroded and turned black throughout.

(発明の効果) 以上詳細に説明した様に、本発明の銀剥離液を使用す
れば、従来の銀剥離液では困難であった多量の銀の溶解
処理が可能であり、その際金属基体を損傷することなが
なく、金属基体は再使用することができ、さらに、不必
要な部分に薄い銀皮膜があるために製品として認められ
ないものを、必要な部分の厚い銀皮膜を損なうことなく
不必要な部分の薄い銀皮膜を剥離することによって、修
正して製品とすることができる。
(Effects of the Invention) As described in detail above, by using the silver stripping solution of the present invention, it is possible to dissolve a large amount of silver, which has been difficult with the conventional silver stripping solution. Without damage, the metal substrate can be reused, and what is not recognized as a product due to the thin silver film on unnecessary parts can be used without damaging the thick silver film on necessary parts. The product can be modified into a product by peeling off the thin silver film on unnecessary portions.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】溶液中において遊離の塩素イオンを生じせ
しめ得る塩素化有機化合物から選ばれる少なくとも1種
を0.01〜50g/、及びアンモニウム塩、アミノ基及び/
又はイミノ基を含有する化合物から選ばれる少なくとも
1種を0.01〜70g/含有し、さらに、過酸化水素を1〜
250g/含有することを特徴とする銀剥離液。
1. At least one kind selected from chlorinated organic compounds capable of generating free chlorine ions in a solution, 0.01 to 50 g /, and an ammonium salt, an amino group and / or
Or 0.01 to 70 g / containing at least one selected from imino group-containing compounds, and 1 to 1 hydrogen peroxide.
A silver stripping solution characterized by containing 250 g /.
JP18374487A 1987-07-24 1987-07-24 Silver stripper Expired - Lifetime JP2553574B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18374487A JP2553574B2 (en) 1987-07-24 1987-07-24 Silver stripper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18374487A JP2553574B2 (en) 1987-07-24 1987-07-24 Silver stripper

Publications (2)

Publication Number Publication Date
JPS6428385A JPS6428385A (en) 1989-01-30
JP2553574B2 true JP2553574B2 (en) 1996-11-13

Family

ID=16141218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18374487A Expired - Lifetime JP2553574B2 (en) 1987-07-24 1987-07-24 Silver stripper

Country Status (1)

Country Link
JP (1) JP2553574B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
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JP4161691B2 (en) * 2002-11-21 2008-10-08 ソニー株式会社 Method for manufacturing a liquid crystal display having an etching process
JP4078971B2 (en) * 2002-12-24 2008-04-23 東ソー株式会社 Composition for dissolving tantalum and dissolution method using the same
KR100712879B1 (en) * 2005-04-06 2007-04-30 주식회사 잉크테크 Etching solutions
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101017390B1 (en) * 2002-11-26 2011-02-28 간토 가가꾸 가부시키가이샤 Etchant compositions for metal thin films having as the major component silver

Also Published As

Publication number Publication date
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