|
JPS63102148A
(ja)
*
|
1986-10-17 |
1988-05-07 |
Akashi Seisakusho Co Ltd |
電子線装置
|
|
US4933552A
(en)
*
|
1988-10-06 |
1990-06-12 |
International Business Machines Corporation |
Inspection system utilizing retarding field back scattered electron collection
|
|
JP3261792B2
(ja)
*
|
1993-03-16 |
2002-03-04 |
株式会社日立製作所 |
走査電子顕微鏡
|
|
US5493116A
(en)
*
|
1993-10-26 |
1996-02-20 |
Metrologix, Inc. |
Detection system for precision measurements and high resolution inspection of high aspect ratio structures using particle beam devices
|
|
JP3774953B2
(ja)
*
|
1995-10-19 |
2006-05-17 |
株式会社日立製作所 |
走査形電子顕微鏡
|
|
US5945672A
(en)
|
1998-01-29 |
1999-08-31 |
Fei Company |
Gaseous backscattered electron detector for an environmental scanning electron microscope
|
|
US6501077B1
(en)
|
1998-09-25 |
2002-12-31 |
Hitachi, Ltd. |
Scanning electron microscope
|
|
US6300629B1
(en)
*
|
1998-09-30 |
2001-10-09 |
Applied Materials, Inc. |
Defect review SEM with automatically switchable detector
|
|
KR20000034962A
(ko)
|
1998-11-19 |
2000-06-26 |
하이든 마틴 |
하전입자의 이중-모드 검출 장치 및 방법
|
|
US6642520B2
(en)
*
|
1999-04-13 |
2003-11-04 |
Kabushiki Kaisha Topcon |
Scanning electron microscope
|
|
JP4073149B2
(ja)
|
2000-05-26 |
2008-04-09 |
株式会社日立製作所 |
電子線装置
|
|
JP2003068241A
(ja)
|
2000-11-08 |
2003-03-07 |
Seiko Instruments Inc |
走査型電子線装置
|
|
JP2003157790A
(ja)
|
2001-11-20 |
2003-05-30 |
Advantest Corp |
微細凹凸量測定装置及び走査型電子顕微鏡
|
|
US6670610B2
(en)
|
2001-11-26 |
2003-12-30 |
Applied Materials, Inc. |
System and method for directing a miller
|
|
US6897442B2
(en)
|
2003-04-25 |
2005-05-24 |
Applied Materials Israel, Ltd. |
Objective lens arrangement for use in a charged particle beam column
|
|
US7067807B2
(en)
|
2004-09-08 |
2006-06-27 |
Applied Materials, Israel, Ltd. |
Charged particle beam column and method of its operation
|
|
EP1648018B1
(en)
|
2004-10-14 |
2017-02-22 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Focussing lens and charged particle beam device for non zero landing angle operation
|
|
JP4691453B2
(ja)
*
|
2006-02-22 |
2011-06-01 |
株式会社日立ハイテクノロジーズ |
欠陥表示方法およびその装置
|
|
US8709269B2
(en)
|
2007-08-22 |
2014-04-29 |
Applied Materials Israel, Ltd. |
Method and system for imaging a cross section of a specimen
|
|
JP5677236B2
(ja)
|
2011-08-22 |
2015-02-25 |
株式会社日立ハイテクノロジーズ |
荷電粒子線装置
|
|
JP5814741B2
(ja)
|
2011-10-20 |
2015-11-17 |
株式会社日立ハイテクノロジーズ |
走査電子顕微鏡
|
|
US8604427B2
(en)
|
2012-02-02 |
2013-12-10 |
Applied Materials Israel, Ltd. |
Three-dimensional mapping using scanning electron microscope images
|
|
EP2629317B1
(en)
*
|
2012-02-20 |
2015-01-28 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Charged particle beam device with dynamic focus and method of operating thereof
|
|
US9190241B2
(en)
|
2013-03-25 |
2015-11-17 |
Hermes-Microvision, Inc. |
Charged particle beam apparatus
|
|
EP3174085A1
(en)
|
2015-11-30 |
2017-05-31 |
FEI Company |
Filter assembly for discriminating secondary and backscattered electrons in a non-transmission charged particle microscope
|
|
US20180364563A1
(en)
|
2017-06-20 |
2018-12-20 |
Applied Materials, Inc. |
Method and apparatus for inspecting a sample
|
|
US10777382B2
(en)
*
|
2017-11-21 |
2020-09-15 |
Focus-Ebeam Technology (Beijing) Co., Ltd. |
Low voltage scanning electron microscope and method for specimen observation
|
|
WO2019233991A1
(en)
*
|
2018-06-08 |
2019-12-12 |
Asml Netherlands B.V. |
Semiconductor charged particle detector for microscopy
|
|
DE112018007565B4
(de)
*
|
2018-07-02 |
2024-02-08 |
Hitachi High-Tech Corporation |
Rasterelektronenmikroskop
|
|
US11440151B2
(en)
*
|
2019-06-07 |
2022-09-13 |
Applied Materials Israel Ltd. |
Milling a multi-layered object
|
|
US11404244B1
(en)
*
|
2021-02-10 |
2022-08-02 |
Applied Materials Israel Ltd. |
High-resolution x-ray spectroscopy surface material analysis
|
|
US11626267B2
(en)
*
|
2021-04-28 |
2023-04-11 |
Applied Materials Israel Ltd. |
Back-scatter electrons (BSE) imaging with a SEM in tilted mode using cap bias voltage
|