JP2021511228A - 光学効果層の製造プロセス - Google Patents
光学効果層の製造プロセス Download PDFInfo
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- JP2021511228A JP2021511228A JP2020538961A JP2020538961A JP2021511228A JP 2021511228 A JP2021511228 A JP 2021511228A JP 2020538961 A JP2020538961 A JP 2020538961A JP 2020538961 A JP2020538961 A JP 2020538961A JP 2021511228 A JP2021511228 A JP 2021511228A
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Abstract
Description
a)上記基材(x10)にコーティング層(x20)を形成するように、上記基材(x10)の表面に板状の磁性又は磁化可能な顔料粒子を含むコーティング組成物を塗布するステップであって、上記コーティング組成物が第1の状態である、ステップと、
b)上記コーティング層(x20)を担持した上記基材(x10)を、第1の磁場ベクトル成分を提供する第1の磁場発生装置(x30)に配置するステップであって、上記第1の磁場発生装置(x30)が転写装置(TD)に取り付けられ、以て上記板状の磁性又は磁化可能な顔料粒子に上記第1の磁場ベクトル成分を受けさせる、ステップと、
コーティング層(x20)を担持した上記基材(x10)と上記第1の磁場発生装置(x30)を同時に、静止した第2の磁場発生装置(x40)の近傍で移動させるステップであって、上記第2の磁場発生装置(x40)が第2の磁場ベクトル成分を提供し、第1の磁場発生装置(x30)の磁束密度と第2の磁場発生装置(x40)の磁束密度との比率が、約4.0未満、好ましくは約1.9未満、より好ましくは約1.5と約0.5との間である、ステップと、
以て、上記板状の磁性又は磁化可能な顔料粒子の少なくとも一部が二軸方向に配向されるように、上記板状の磁性又は磁化可能な顔料粒子に、上記第1及び第2の磁場ベクトル成分によって形成される時間依存性の合成磁場を受けさせる、ステップと、
c)上記板状の磁性又は磁化可能な顔料粒子を採用された位置及び配向に固定するように、上記コーティング組成物を第2の状態に硬化させるステップと、
を含む。
[015]以下の定義は、本明細書で議論され、特許請求の範囲に記載されている用語の意味を解釈するために使用される。
a)上記基材(x10)に本明細書に記載のコーティング層(x20)を形成するように、本明細書に記載の板状の磁性又は磁化可能な顔料粒子を含むコーティング組成物を本明細書に記載の基材(x10)表面に塗布するステップであって、上記コーティング組成物が第1の状態にある、ステップと、
b)コーティング層(x20)を担持した基材(x10)を本明細書に記載の第1の磁場発生装置(x30)に配置し、本明細書に記載の第1の磁場ベクトル成分を提供するステップであって、上記第1の磁場発生装置(x30)が転写装置(TD)に取り付けられ、以て、板状の磁性又は磁気可能な顔料粒子に上記第1の磁場ベクトル成分を受けさせる、ステップと、
コーティング層(x20)を担持した上記基材(x10)と上記第1の磁場発生装置(x30)を同時に、本明細書に記載の静止した(すなわち、転写装置(TD)と共に移動しない)第2の磁場発生装置(x40)の近傍で移動させるステップであって、上記第2の磁場発生装置(x40)が本明細書に記載の第2の磁場ベクトル成分を提供し、第1の磁場発生装置(x30)の磁束密度と第2の磁場発生装置(x40)の磁束密度との比率が、約4.0未満、好ましくは約1.9未満、より好ましくは約1.5と約0.5との間である、ステップと、
以て、板状の磁性又は磁化可能な顔料粒子の少なくとも一部が二軸方向に配向されるように、板状の磁性又は磁化可能な顔料粒子に、本明細書に記載された第1及び第2の磁場ベクトル成分によって形成される時間依存性の合成磁場を受けさせる、ステップと、
c)板状の磁性又は磁化可能な顔料粒子を採用された位置及び配向に固定するように、コーティング組成物を第2の状態に硬化させるステップと、を含む。
[0133]第1の磁場発生装置として、NdFeB N40からなる棒双極磁石(430)を用いた。棒双極磁石(430)は、30mm(L1)×18mm(L2)×6mm(L3)の寸法を有していた。図4B〜Cに示すように、棒双極磁石(430)は、高密度ポリエチレン(HDPE)製の非磁性ホルダ(431)に埋め込まれ、40mm(L7)×40mm(L8)×25mm(L9)の寸法を有していた。棒双極磁石(430)の上面は、非磁性ホルダ(431)の上面から約15mmの距離(A2)に配置した。
[0138]第2の磁場発生装置(440)として、一対の棒双極磁石(441a、441b)を用いた。2つの棒双極磁石(441a、441b)のそれぞれは、48mm(L4)×24mm(L5)×10mm(L6)の寸法を有しており、NdFeB N40を用いた。2つの棒双極磁石(441a、441b)のそれぞれの磁気軸は、上記磁石の長さ(L4)に対して実質的に平行であり(すなわち、基材(410)表面に対して実質的に垂直であり)、上記2つの棒双極磁石(441a)の第1の磁気方向は、上記2つの棒双極磁石(441b)の第2の磁気方向とは反対であった。2つの棒双極磁石(441a、441b)は、互いに距離(A1=48mm)を置いて配置され、ポリオキシメチレン(POM)製の一対の非磁性ホルダ(442a、442b)に独立して埋め込まれていた。
[0143]25mm×25mmの正方形の複数のサンプルを、約20μmの厚さを有するコーティング層(420)を形成するように、T90スクリーンを使用した実験室用スクリーン印刷装置で、表1のUV硬化性スクリーン印刷インクを用いて、黒紙基材(GascogneLaminates M−cote 120)(410)に独立に印刷した。
[0147]複数の比較サンプル2−1〜2−4は、以下のステップを含む従来技術国際公開第2015/086257A1号に従った一般的な手順に従って独立して調製した。
ステップi)約20μmの厚さを有するコーティング層を形成するように、25mm×25mmの正方形のサンプルを黒紙基材(Gascogne Laminates M−cote 120)に、T90スクリーンを用いた実験室用スクリーン印刷装置を用いて、表1のUV硬化性スクリーン印刷インクを用いて印刷する。
ステップii)コーティング層がまだ湿潤でまだ硬化していない状態である間に、基材を、サンプル1−1〜1−4について説明したが、第1の磁場発生装置を欠いている非磁性ホルダに置き、上記コーティング層(420)の中心を非磁性ホルダの中心上に置く。上述の支持ブロック(432)とトラック(433)の助けを借りて、コーティング層を上述の第2の磁場発生装置の磁場に曝し、サンプル1−1〜1−4に記載の第2の磁場発生装置の近傍を約10cm/sの線速度で8回前後に移動させ、非磁性ホルダの中心を各棒双極磁石から約24mmの距離に配置し、基材の最下面を双極棒磁石の最下面と面一にする。
ステップiii)コーティング層を担持した基材を第2の磁場発生装置の磁場から除去し、上述の第1の磁場発生装置の磁場に曝露する。コーティング層を担持した基材は、上記第1の磁場発生装置の上面から約2〜約15mm(表2に示す値)の距離(A2)に配置される。
ステップiv)ステップiii)と部分的に同時に、コーティング層は、OELを形成するように、コーティング層を担持した基材の上面から約30mmの距離に配置されたPhoseon製のUV−LEDランプ(Type FireFlex 50×75mm、395nm,8W/cm2)に約0.5秒間露光されて硬化した。
[0148]サンプル1−1〜1−4及びサンプル2−1〜2−4の第1の磁場発生装置(530)の磁束密度(mT、ミリテスラ)は、ガウスメーターGM−08(Hirst MAGNETIC Instruments Ltd)に接続されたホールプローブ(560)(Hirst Magnetic Instruments Ltd.横方向プローブTp002)を、長さ(L2)と幅(L1)に関連して中心が第1の磁場発生装置(530)の中心に配置された状態で、第1の磁場発生装置(530)の上面から約2mm〜約15mm(表2に記載の値)の間の距離(A2)に配置して独立して測定された。
サンプル1−1〜1−4及びサンプル2−1〜2−4のOELの明るさの測定
Claims (14)
- 基材(x10)に光学効果層(OEL)を製造するプロセスであって、
a)前記基材(x10)にコーティング層(x20)を形成するように、前記基材(x10)の表面に板状の磁性又は磁化可能な顔料粒子を含むコーティング組成物を塗布するステップであって、前記コーティング組成物が第1の状態である、ステップと、
b)前記コーティング層(x20)を担持した前記基材(x10)を、第1の磁場ベクトル成分を提供する第1の磁場発生装置(x30)に配置するステップであって、前記第1の磁場発生装置(x30)が転写装置(TD)に取り付けられ、以て前記板状の磁性又は磁化可能な顔料粒子に前記第1の磁場ベクトル成分を受けさせる、ステップと、
コーティング層(x20)を担持した前記基材(x10)と前記第1の磁場発生装置(x30)を同時に、静止した第2の磁場発生装置(x40)の近傍で移動させるステップであって、前記第2の磁場発生装置(x40)が第2の磁場ベクトル成分を提供し、前記第1の磁場発生装置(x30)の磁束密度と前記第2の磁場発生装置(x40)の磁束密度との比率が、約4.0未満、好ましくは約1.9未満、より好ましくは約1.5と約0.5との間である、ステップと、
以て、前記板状の磁性又は磁化可能な顔料粒子の少なくとも一部が二軸方向に配向されるように、前記板状の磁性又は磁化可能な顔料粒子に、前記第1及び第2の磁場ベクトル成分によって形成される時間依存性の合成磁場を受けさせる、ステップと、
c)前記板状の磁性又は磁化可能な顔料粒子を採用された位置及び配向に固定するように、前記コーティング組成物を第2の状態に硬化させるステップと、
を含む、プロセス。 - 前記転写装置(TD)が回転磁気シリンダ(RMC)である、請求項1に記載のプロセス。
- 前記コーティング組成物を前記基材(x10)に塗布する前記ステップが、凹版印刷、スクリーン印刷、輪転グラビア印刷及びフレキソ印刷からなる群から選択される印刷プロセスによって実施される、請求項1又は2に記載のプロセス。
- 前記コーティング組成物が、UV−Vis硬化性組成物であり、前記硬化させるステップが、UV−Vis硬化によって実行される、請求項1〜3のいずれか一項に記載のプロセス。
- 前記コーティング組成物を硬化させる前記ステップc)が、前記ステップb)と部分的に同時に実行される、請求項1〜4のいずれか一項に記載のプロセス。
- 前記第1の磁場発生装置(x30)が、双極磁石、四極磁石及びそれらの組み合わせからなる群から選択される、請求項1〜5のいずれか一項に記載のプロセス。
- 前記第2の磁場発生装置(x40)が、a)千鳥状に線形配置された少なくとも3個の磁石であって、前記3個の磁石のそれぞれが、前記基材(x10)表面に対して実質的に垂直な磁気軸を有し、フィードパスの同じ側にある前記少なくとも3個の磁石が、前記フィードパスの反対側の磁石の極性とは反対である、同じ極性を有する、少なくとも3個の磁石、b)線形永久磁石ハルバッハアレイ、c)2つの棒双極磁石の1つ又は複数の対であって、前記2つの棒双極磁石のそれぞれが、前記基材(x10)の表面に実質的に平行な磁気軸を有し、前記2つの棒双極磁石が、反対の磁気方向を有する、2つの棒双極磁石の1つ又は複数の対、d)2つの棒双極磁石(x41a、x41b)の1つ又は複数の対であって、前記2つの棒双極磁石のそれぞれが、前記基材(x10)表面に対して実質的に垂直な磁気軸を有し、前記2つの棒双極磁石が、反対の磁気方向を有する、2つの棒双極磁石(x41a、x41b)の1つ又は複数の対、又はe)U字型磁石、を含む、請求項1〜6のいずれか一項に記載のプロセス。
- 前記板状の磁性又は磁化可能な顔料粒子が、板状の磁性薄膜干渉顔料粒子、板状の磁性コレステリック液晶顔料粒子、磁性材料を含む板状の干渉コーティング顔料粒子、及びこれらの2種以上の混合物からなる群から選択される板状の光学的に可変な磁性又は磁化可能な顔料粒子である、請求項1〜7のいずれか一項に記載のプロセス。
- 前記基材が、紙又はその他の繊維性材料、紙含有材料、ガラス、金属、セラミック、プラスチック及びポリマー、金属化プラスチック又はポリマー、複合材料及び混合物又はそれらの組み合わせからなる群から選択される、請求項1〜8のいずれか一項に記載のプロセス。
- 転写装置(TD)、好ましくは回転磁気シリンダ(RMC)、及び請求項1〜8のいずれか一項に記載の少なくとも1つの前記第2の磁場発生装置(x40)、を備える印刷装置であって、
前記転写装置(TD)、好ましくは前記回転磁気シリンダ(RMC)が、前記転写装置に取り付けられた、請求項1〜9のいずれか一項に記載の少なくとも1つの前記第1の磁場発生装置(x30)を備える、印刷装置。 - 基材誘導システムをさらに備える、請求項10に記載の印刷装置。
- 請求項1〜9のいずれか一項に記載のプロセスにより製造された、又は請求項10又は11に記載の印刷装置を使用して製造された、光学効果層(OEL)。
- 請求項12に記載の1つ又は複数の光学効果層(OEL)を含むセキュリティ文書又は装飾的な要素又は物体。
- セキュリティ文書又は装飾的な要素又は物体の製造方法であって、
a)セキュリティ文書又は装飾的な要素又は物体を用意するステップと、
b)請求項1〜9のいずれか一項に記載のプロセスに従って光学効果層を用意して、前記光学効果層が、セキュリティ文書又は装飾的な要素又は物体に含まれるようにするステップと、を含む、方法。
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