JP2021150368A - Positioning method and positioning device - Google Patents

Positioning method and positioning device Download PDF

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JP2021150368A
JP2021150368A JP2020046319A JP2020046319A JP2021150368A JP 2021150368 A JP2021150368 A JP 2021150368A JP 2020046319 A JP2020046319 A JP 2020046319A JP 2020046319 A JP2020046319 A JP 2020046319A JP 2021150368 A JP2021150368 A JP 2021150368A
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liquid
hydrophilic portion
chip
support surface
hydrophilic
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JP7461183B2 (en
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忠知 山田
Tadatomo Yamada
忠知 山田
利彰 毛受
Toshiaki Menju
利彰 毛受
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Lintec Corp
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Lintec Corp
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Priority to JP2020046319A priority Critical patent/JP7461183B2/en
Priority to KR1020210028363A priority patent/KR20210116253A/en
Priority to TW110108274A priority patent/TW202141673A/en
Priority to CN202110281171.6A priority patent/CN113410173A/en
Publication of JP2021150368A publication Critical patent/JP2021150368A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J11/00Manipulators not otherwise provided for
    • B25J11/0095Manipulators transporting wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00Gripping heads and other end effectors
    • B25J15/0023Gripper surfaces directly activated by a fluid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Programme-controlled manipulators
    • B25J9/16Programme controls
    • B25J9/20Programme controls fluidic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

To provide a positioning method and a positioning device that can prevent a decrease in processing capacity per unit time.SOLUTION: A positioning method of positioning a flake CP in place using surface tension of liquid includes a support step of supporting a flake CP by a hydrophilic portion 12F of a support surface 12A provided with the hydrophilic portion 12F having hydrophilicity, a liquid supply step of supplying the liquid to the hydrophilic portion 12F, and a liquid recovery step of recovering liquid from the hydrophilic portion 12F.SELECTED DRAWING: Figure 1

Description

本発明は、位置決め方法および位置決め装置に関する。 The present invention relates to a positioning method and a positioning device.

液体の表面張力を用いて複数の片状体を所定の位置に位置決めする位置決め方法が知られている(例えば、特許文献1参照)。 A positioning method for positioning a plurality of pieces at a predetermined position using the surface tension of a liquid is known (see, for example, Patent Document 1).

特開2010−245452号公報JP-A-2010-245452

特許文献1に記載された位置決め方法では、支持基板31(支持部材)の上面(支持面)に形成された親水膜31a(親水部)上に水(液体)を塗布し、親水部にチップ20(片状体)を配置することで、親水部における液体の表面張力で片状体を所定位置に位置決めした後、片状体が支持面に支持されるまで親水部の液体が蒸発することを待たなければならないので、単位時間当たりの処理能力が低下するという不都合がある。 In the positioning method described in Patent Document 1, water (liquid) is applied onto the hydrophilic film 31a (hydrophilic portion) formed on the upper surface (support surface) of the support substrate 31 (support member), and the chip 20 is applied to the hydrophilic portion. By arranging the (flake), after positioning the flake in a predetermined position by the surface tension of the liquid in the hydrophilic part, the liquid in the hydrophilic part evaporates until the flake is supported by the support surface. Since it is necessary to wait, there is an inconvenience that the processing capacity per unit time is reduced.

本発明の目的は、単位時間当たりの処理能力が低下することを防止することができる位置決め方法および位置決め装置を提供することにある。 An object of the present invention is to provide a positioning method and a positioning device capable of preventing a decrease in processing capacity per unit time.

本発明は、請求項に記載した構成を採用した。 The present invention has adopted the configuration described in the claims.

本発明によれば、支持面における親水部から液体を回収するため、片状体が支持面に支持されるまで親水部の液体が蒸発することを待つ必要がなく、単位時間当たりの処理能力が低下することを防止することができる。
また、支持面を有する支持部材の内部に設けられた流路で親水部に液体を供給すれば、親水部に確実に液体を供給することができる。
また、親水部から回収した液体を親水部に再供給すれば、液体の消費量を抑制することができる。
According to the present invention, since the liquid is recovered from the hydrophilic portion on the support surface, it is not necessary to wait for the liquid on the hydrophilic portion to evaporate until the flake is supported by the support surface, and the processing capacity per unit time is increased. It is possible to prevent the decrease.
Further, if the liquid is supplied to the hydrophilic portion through the flow path provided inside the support member having the support surface, the liquid can be reliably supplied to the hydrophilic portion.
Further, if the liquid recovered from the hydrophilic portion is resupplied to the hydrophilic portion, the consumption of the liquid can be suppressed.

本発明の一実施形態に係る位置決め方法を実施する位置決め装置の説明図。The explanatory view of the positioning apparatus which carries out the positioning method which concerns on one Embodiment of this invention.

以下、本発明の一実施形態を図1に基づいて説明する。
なお、本実施形態におけるX軸、Y軸、Z軸は、それぞれが直交する関係にあり、X軸およびY軸は、所定平面内の軸とし、Z軸は、前記所定平面に直交する軸とする。さらに、本実施形態では、Y軸と平行な図1の手前方向から観た場合を基準とし、方向を示した場合、「上」がZ軸の矢印方向で「下」がその逆方向、「左」がX軸の矢印方向で「右」がその逆方向、「前」がY軸と平行な図1中手前方向で「後」がその逆方向とする。
Hereinafter, an embodiment of the present invention will be described with reference to FIG.
The X-axis, Y-axis, and Z-axis in the present embodiment are orthogonal to each other, the X-axis and the Y-axis are axes in a predetermined plane, and the Z-axis is an axis orthogonal to the predetermined plane. do. Further, in the present embodiment, when viewed from the front direction of FIG. 1 parallel to the Y axis, when the direction is indicated, "up" is the direction of the arrow on the Z axis, "down" is the opposite direction, and ""Left" is the direction of the arrow on the X-axis, "right" is the opposite direction, "front" is the middle front direction parallel to the Y-axis, and "rear" is the opposite direction.

本発明の位置決め装置EAは、水やアルコール溶液等の液体LQの表面張力を用いて片状体としての半導体チップ(以下、単に「チップ」ともいう)CPを所定の位置に位置決めする装置であって、親水性を有する親水部12Fが設けられた支持面12Aの親水部12FでチップCPを支持する支持手段10と、親水部12Fに液体LQを供給する液体供給手段20と、親水部12Fから液体LQを回収する液体回収手段30とを備え、複数のチップCPが貼付された接着シートASに張力を付与し、それらチップCPの相互間隔を広げる離間手段40と、チップCPから接着シートASを剥離する剥離手段50との近傍に配置されている。 The positioning device EA of the present invention is a device that positions a semiconductor chip (hereinafter, simply referred to as “chip”) CP as a flake body at a predetermined position by using the surface tension of a liquid LQ such as water or an alcohol solution. From the support means 10 that supports the chip CP by the hydrophilic portion 12F of the support surface 12A provided with the hydrophilic portion 12F having hydrophilicity, the liquid supply means 20 that supplies the liquid LQ to the hydrophilic portion 12F, and the hydrophilic portion 12F. A liquid collecting means 30 for recovering the liquid LQ is provided, tension is applied to the adhesive sheet AS to which a plurality of chip CPs are attached, and the separating means 40 for widening the mutual spacing between the chip CPs and the adhesive sheet AS from the chip CP are provided. It is arranged in the vicinity of the peeling means 50 to be peeled off.

支持手段10は、駆動機器としての直動モータ11と、直動モータ11の出力軸11Aに支持され、減圧ポンプや真空エジェクタ等の減圧手段23によって吸着保持が可能な支持面12Aを有する支持部材としてのテーブル12とを備えている。本実施形態の場合、減圧手段23は、支持手段10と液体回収手段30とで共有する構成となっている。
テーブル12は、上面に設けられた凹部12Bと、テーブル12の内部に設けられ、凹部12Bと連通する流路12Cと、凹部12B内に配置され、その上面が支持面12Aとされた多孔質樹脂等の多孔質部材12Dとを備えている。
支持面12Aには、図1(A)中AAを付した図に示すように、疎水性を有する疎水部12Eが格子状に形成され、当該疎水部12Eによって親水部12Fが区画されている。
本実施形態では、疎水部12Eは、支持面12Aに格子状に形成された溝の内面に、接着剤や樹脂等の撥水材料12Gが塗布された構成とされ、親水部12Fは、粗面加工、ブラスト加工等を行う粗面形成手段によって、ザラザラした粗い面となる粗面処理が施された構成とされている。
The support means 10 is a support member having a linear motion motor 11 as a drive device and a support surface 12A supported by the output shaft 11A of the linear motion motor 11 and capable of being attracted and held by a decompression means 23 such as a decompression pump or a vacuum ejector. The table 12 and the like are provided. In the case of the present embodiment, the decompression means 23 is shared by the support means 10 and the liquid recovery means 30.
The table 12 is a porous resin provided in a recess 12B provided on the upper surface, a flow path 12C provided inside the table 12 and communicating with the recess 12B, and a porous resin whose upper surface is a support surface 12A. The porous member 12D and the like are provided.
On the support surface 12A, as shown in the figure with AA in FIG. 1A, hydrophobic portions 12E are formed in a grid pattern, and the hydrophilic portions 12F are partitioned by the hydrophobic portions 12E.
In the present embodiment, the hydrophobic portion 12E has a configuration in which a water-repellent material 12G such as an adhesive or a resin is applied to the inner surface of a groove formed in a grid pattern on the support surface 12A, and the hydrophilic portion 12F has a rough surface. The structure is such that a rough surface treatment is performed to obtain a rough rough surface by a rough surface forming means for processing, blasting, or the like.

液体供給手段20は、液体LQを収容するタンク21と、加圧ポンプやタービン等の加圧手段22と、減圧手段23と、タンク21に対する加圧手段22および減圧手段23の連通状態を切り替える切替弁24と、配管25Aを介して流路12Cに接続され、タンク21に対する流路12Cの連通位置をタンク21の上部および底部で切り替える切替弁25とを備え、支持面12Aを有するテーブル12の内部に設けられた流路12Cで親水部12Fに液体LQを供給する構成になっている。なお、タンク21は、加圧側配管21Aと減圧側配管21Bとを介して切替弁25に連通している。 The liquid supply means 20 switches the communication state between the tank 21 for accommodating the liquid LQ, the pressurizing means 22 such as a pressurizing pump or a turbine, the depressurizing means 23, and the pressurizing means 22 and the depressurizing means 23 for the tank 21. Inside a table 12 having a support surface 12A, including a valve 24 and a switching valve 25 that is connected to the flow path 12C via a pipe 25A and switches the communication position of the flow path 12C with respect to the tank 21 at the top and bottom of the tank 21. The liquid LQ is supplied to the hydrophilic portion 12F by the flow path 12C provided in. The tank 21 communicates with the switching valve 25 via the pressurizing side pipe 21A and the depressurizing side pipe 21B.

液体回収手段30は、液体供給手段20と兼用する構成が採用され、支持面12Aを有するテーブル12の内部に設けられた流路12Cで親水部12Fから液体LQを回収する構成になっている。 The liquid recovery means 30 adopts a configuration that also serves as the liquid supply means 20, and has a configuration in which the liquid LQ is recovered from the hydrophilic portion 12F by the flow path 12C provided inside the table 12 having the support surface 12A.

離間手段40は、駆動機器としての複数の直動モータ41と、各直動モータ41の出力軸41Aに支持され、一対の把持爪42Aを有する保持手段であって駆動機器としてのチャックシリンダ42とを備えている。 The separating means 40 is a holding means supported by a plurality of linear motion motors 41 as a drive device and an output shaft 41A of each linear motion motor 41 and having a pair of gripping claws 42A, and is a chuck cylinder 42 as a drive device. It has.

剥離手段50は、駆動機器としてのリニアモータ51と、リニアモータ51のスライダ51Aに支持され、一対の把持爪52Aを有する保持手段であって駆動機器としてのチャックシリンダ52とを備えている。 The peeling means 50 includes a linear motor 51 as a drive device, and a holding means supported by a slider 51A of the linear motor 51 and having a pair of gripping claws 52A, and a chuck cylinder 52 as a drive device.

以上の位置決め装置EAの動作を説明する。なお、位置決め装置EAによって実施される以下の工程は、チップCPを備えた半導体装置の製造方法で実施されるものである。
先ず、図1(A)で示す初期位置に各部材が配置された位置決め装置EAに対し、当該位置決め装置EAの使用者(以下、単に「使用者」という)、または、多関節ロボットやベルトコンベア等の図示しない搬送手段が、接着シートASに貼付された複数のチップCPをテーブル12上方の所定位置に搬送すると、離間手段40が直動モータ41およびチャックシリンダ42を駆動し、図1(A)中二点鎖線で示すように、一対の把持爪42Aで接着シートASを把持する。次いで、離間手段40が直動モータ41を駆動し、図1(B)に示すように、接着シートASに張力を付与して複数のチップCPの相互間隔を広げる(離間工程)。この際、各チップCPは、支持面12Aの各親水部12Fにそれぞれ対向配置するように、相互間隔が広げられる。
The operation of the above positioning device EA will be described. The following steps carried out by the positioning device EA are carried out by a method of manufacturing a semiconductor device provided with a chip CP.
First, with respect to the positioning device EA in which each member is arranged at the initial position shown in FIG. 1 (A), the user of the positioning device EA (hereinafter, simply referred to as “user”), or an articulated robot or a belt conveyor. When a plurality of chip CPs attached to the adhesive sheet AS are conveyed to a predetermined position above the table 12, the separating means 40 drives the linear motion motor 41 and the chuck cylinder 42, and FIG. 1 (A) ) As shown by the alternate long and short dash line, the adhesive sheet AS is gripped by the pair of gripping claws 42A. Next, the separation means 40 drives the linear motion motor 41 to apply tension to the adhesive sheet AS to widen the mutual distance between the plurality of chip CPs (separation step). At this time, the mutual spacing is widened so that the chip CPs are arranged to face each of the hydrophilic portions 12F of the support surface 12A.

その後、支持手段10が直動モータ11を駆動し、図1(B)に示すように、テーブル12を上昇させて支持面12AをチップCPに当接させた後、減圧手段23を駆動し、支持面12AでのチップCPの吸着保持を開始する(支持工程)。次に、離間手段40がチャックシリンダ42を駆動し、把持爪42Aでの接着シートASの把持を解除した後、支持手段10が直動モータ11を駆動し、接着シートASがチャックシリンダ52左方の所定の高さ位置に到達するまでテーブル12を下降させる。 After that, the support means 10 drives the linear motion motor 11, and as shown in FIG. 1 (B), the table 12 is raised to bring the support surface 12A into contact with the chip CP, and then the decompression means 23 is driven. Adsorption and holding of the chip CP on the support surface 12A is started (support step). Next, the separating means 40 drives the chuck cylinder 42 to release the grip of the adhesive sheet AS by the gripping claw 42A, then the support means 10 drives the linear motion motor 11, and the adhesive sheet AS moves to the left of the chuck cylinder 52. The table 12 is lowered until it reaches a predetermined height position.

そして、剥離手段50がリニアモータ51およびチャックシリンダ52を駆動し、一対の把持爪52Aで接着シートASの右端部を把持する。次いで、支持手段10が直動モータ11を駆動し、テーブル12を下降させて初期位置に復帰させつつ、剥離手段50がリニアモータ51を駆動し、図1(C)に示すように、チャックシリンダ52を左方に移動させてチップCPから接着シートASを剥離する(剥離工程)。 Then, the peeling means 50 drives the linear motor 51 and the chuck cylinder 52, and the pair of gripping claws 52A grips the right end portion of the adhesive sheet AS. Next, the support means 10 drives the linear motor 11, and the table 12 is lowered to return to the initial position, while the peeling means 50 drives the linear motor 51, and as shown in FIG. 1C, the chuck cylinder. The adhesive sheet AS is peeled from the chip CP by moving the 52 to the left (peeling step).

全てのチップCPから接着シートASが剥離されると、剥離手段50がリニアモータ51の駆動を停止した後、チャックシリンダ52を駆動し、把持爪52Aでの接着シートASの把持を解除して、剥離した接着シートASの下方に位置する回収箱や回収袋等の図示しない回収手段内に落下させる。その後、支持手段10が減圧手段23の駆動を停止し、支持面12AでのチップCPの吸着保持を解除すると、液体供給手段20が切替弁24、25を駆動し、図1(D)に示すように、加圧側配管21Aを介して凹部12Bと加圧手段22とを連通させた後、当該加圧手段22を駆動し、タンク21内の圧力を上昇させる。これにより、加圧側配管21A、切替弁25、配管25A、流路12Cおよび多孔質部材12Dを通じて、支持面12Aの親水部12Fに液体LQが供給される(液体供給工程)。液体LQが親水部12Fに供給されると、当該液体LQは、親水部12F内で盛り上がり、図1(D)に示すように、チップCPを押し上げる。チップCPが液体LQによって押し上げられると、当該チップCPは、図1(D)中二点鎖線で示すように、液体LQの表面張力によって所定の位置に位置決めされる。 When the adhesive sheet AS is peeled from all the chip CPs, the peeling means 50 stops driving the linear motor 51, then drives the chuck cylinder 52 to release the gripping of the adhesive sheet AS by the gripping claws 52A. Drop it into a collection means (not shown) such as a collection box or a collection bag located below the peeled adhesive sheet AS. After that, when the support means 10 stops driving the pressure reducing means 23 and releases the suction holding of the chip CP on the support surface 12A, the liquid supply means 20 drives the switching valves 24 and 25, as shown in FIG. 1 (D). As described above, after the recess 12B and the pressurizing means 22 are communicated with each other via the pressurizing side pipe 21A, the pressurizing means 22 is driven to increase the pressure in the tank 21. As a result, the liquid LQ is supplied to the hydrophilic portion 12F of the support surface 12A through the pressurizing side pipe 21A, the switching valve 25, the pipe 25A, the flow path 12C, and the porous member 12D (liquid supply step). When the liquid LQ is supplied to the hydrophilic portion 12F, the liquid LQ rises in the hydrophilic portion 12F and pushes up the chip CP as shown in FIG. 1 (D). When the chip CP is pushed up by the liquid LQ, the chip CP is positioned at a predetermined position by the surface tension of the liquid LQ as shown by the alternate long and short dash line in FIG. 1 (D).

次に、液体供給手段20が加圧手段22の駆動を停止すると、液体回収手段30が切替弁24、25を駆動し、図1(E)に示すように、減圧側配管21Bを介して凹部12Bと減圧手段23とを連通させた後、当該減圧手段23を駆動し、タンク21内の圧力を下降させる。これにより、多孔質部材12D、流路12C、配管25A、切替弁25および減圧側配管21Bを通じて、支持面12Aの親水部12F上にあった液体LQをタンク21内に回収する(液体回収工程)。親水部12F上にあった液体LQが回収されると、チップCPが支持面12Aに当接し、当該支持面12AでのチップCPの吸着保持が開始される。この際、各チップCPは、所定の位置、所定の角度で位置決めされ、所定の位置に位置決めした状態で支持面12Aに支持される。なお、液体回収工程で親水部12Fから回収した液体LQは、次回の液体供給工程で親水部12Fに再供給される。 Next, when the liquid supply means 20 stops driving the pressurizing means 22, the liquid recovery means 30 drives the switching valves 24 and 25, and as shown in FIG. 1 (E), a recess is provided via the pressure reducing side pipe 21B. After communicating the 12B and the decompression means 23, the decompression means 23 is driven to reduce the pressure in the tank 21. As a result, the liquid LQ that was on the hydrophilic portion 12F of the support surface 12A is recovered into the tank 21 through the porous member 12D, the flow path 12C, the pipe 25A, the switching valve 25, and the pressure reducing side pipe 21B (liquid recovery step). .. When the liquid LQ on the hydrophilic portion 12F is recovered, the chip CP comes into contact with the support surface 12A, and adsorption and holding of the chip CP on the support surface 12A is started. At this time, each chip CP is positioned at a predetermined position and a predetermined angle, and is supported by the support surface 12A in a state of being positioned at a predetermined position. The liquid LQ recovered from the hydrophilic portion 12F in the liquid recovery step is resupplied to the hydrophilic portion 12F in the next liquid supply step.

そして、支持手段10が減圧手段23の駆動を停止し、支持面12AでのチップCPの吸着保持を解除した後、図示しない搬送手段が支持面12AからチップCPを搬送し、リードフレームや基板等に積層する(積層工程)。次いで、全てのチップCPが支持面12Aから搬送されると、各手段がそれぞれの駆動機器を駆動し、各部材を初期位置に復帰させ、以降上記同様の工程が繰り返される。 Then, after the support means 10 stops driving the decompression means 23 and releases the suction and holding of the chip CP on the support surface 12A, a transfer means (not shown) conveys the chip CP from the support surface 12A, and the lead frame, substrate, etc. (Laminating process). Next, when all the chip CPs are conveyed from the support surface 12A, each means drives each drive device to return each member to the initial position, and the same steps as described above are repeated thereafter.

以上のような実施形態によれば、支持面12Aにおける親水部12Fから液体LQを回収するため、チップCPが支持面12Aに支持されるまで親水部12Fの液体LQが蒸発することを待つ必要がなく、単位時間当たりの処理能力が低下することを防止することができる。 According to the above embodiment, in order to recover the liquid LQ from the hydrophilic portion 12F on the support surface 12A, it is necessary to wait for the liquid LQ on the hydrophilic portion 12F to evaporate until the chip CP is supported by the support surface 12A. Therefore, it is possible to prevent a decrease in processing capacity per unit time.

以上のように、本発明を実施するための最良の構成、方法等は、前記記載で開示されているが、本発明は、これに限定されるものではない。すなわち、本発明は、主に特定の実施形態に関して特に図示され、かつ説明されているが、本発明の技術的思想および目的の範囲から逸脱することなく、以上述べた実施形態に対し、形状、材質、数量、その他の詳細な構成において、当業者が様々な変形を加えることができるものである。また、上記に開示した形状、材質などを限定した記載は、本発明の理解を容易にするために例示的に記載したものであり、本発明を限定するものではないから、それらの形状、材質などの限定の一部もしくは全部の限定を外した部材の名称での記載は、本発明に含まれる。 As described above, the best configuration, method, etc. for carrying out the present invention are disclosed in the above description, but the present invention is not limited thereto. That is, although the present invention is particularly illustrated and described primarily with respect to specific embodiments, the shape, with respect to the embodiments described above, without departing from the scope of the technical ideas and objectives of the present invention. Various modifications can be made by those skilled in the art in terms of material, quantity, and other detailed configurations. Further, the description limiting the shape, material, etc. disclosed above is exemplarily described for facilitating the understanding of the present invention, and does not limit the present invention. Therefore, those shapes, materials, etc. The description by the name of the member which removes a part or all of the limitation such as is included in the present invention.

例えば、支持手段10は、液体回収手段30から独立した減圧手段によって支持面12AでチップCPを吸着保持してもよいし、液体回収工程の後に支持面12AでチップCPを吸着保持しなくてもよい。
疎水部12Eは、疎水性を有するシート、フィルム、テープ等を支持面12Aに貼付ししたり、疎水性を発揮する表面処理やコーティングを支持面12Aに施したりして構成してもよい。
親水部12Fは、親水性を有するシート、フィルム、テープ等を支持面12Aに貼付ししたり、親水性を発揮する表面処理やコーティングを支持面12Aに施したりして構成してもよい。
For example, the support means 10 may adsorb and hold the chip CP on the support surface 12A by a decompression means independent of the liquid recovery means 30, or may not adsorb and hold the chip CP on the support surface 12A after the liquid recovery step. good.
The hydrophobic portion 12E may be configured by attaching a hydrophobic sheet, film, tape or the like to the support surface 12A, or applying a surface treatment or coating that exhibits hydrophobicity to the support surface 12A.
The hydrophilic portion 12F may be configured by attaching a hydrophilic sheet, film, tape or the like to the support surface 12A, or by applying a surface treatment or coating that exhibits hydrophilicity to the support surface 12A.

液体供給手段20は、ノズルやホース等でテーブル12の外側から支持面12A上に液体LQを供給してもよいし、液体回収工程で親水部12Fから回収した液体LQを親水部12Fに再供給しない構成でもよい。 The liquid supply means 20 may supply the liquid LQ onto the support surface 12A from the outside of the table 12 with a nozzle, a hose, or the like, or resupply the liquid LQ recovered from the hydrophilic portion 12F in the liquid recovery step to the hydrophilic portion 12F. It may not be configured.

液体回収手段30は、液体供給手段20と別体に設けてもよく、この場合、テーブル12の流路12Cを液体供給手段20と共用して当該流路12Cから液体LQを回収してもよいし、テーブル12に流路12Cとは別の回収用の流路を設け、当該回収用の流路から液体LQを回収してもよい。 The liquid recovery means 30 may be provided separately from the liquid supply means 20, and in this case, the flow path 12C of the table 12 may be shared with the liquid supply means 20 to recover the liquid LQ from the flow path 12C. Then, the table 12 may be provided with a flow path for recovery different from the flow path 12C, and the liquid LQ may be recovered from the flow path for recovery.

離間手段40は、接着シートASに、例えば、上下方向に張力を付与したり、右方、左方、前方および後方の4方向、右方および左方の2方向、左前方、左後方および右方の3方向または、前後左右方向の成分を含む5方向以上に張力を付与したりして、チップCPの相互間隔を広げてもよいし、接着シートASを介してチップCPと一体化されたリングフレーム等のフレーム部材が用いられる場合、フレーム部材を支持して接着シートASに張力を付与することで、チップCPの相互間隔を広げてもよいし、レーザ照射装置や薬液付与装置等の脆弱化手段で物理的または化学的に形成された脆弱層や、カッター刃等の切断手段で形成された凹溝や切欠によって、複数のチップCPに個片化可能な状態とされた半導体ウエハ(以下、単に「ウエハ」ともいう)が貼付された接着シートASに張力を付与することで、ウエハを複数のチップCPに分割してチップCPの相互間隔を広げてもよい。
離間手段40は、本発明の位置決め装置EAに備わっていてもよいし、備わっていなくてもよく、離間手段40が備わっていない場合、他の装置でチップCPの相互間隔を広げてもよい。
The separating means 40 applies tension to the adhesive sheet AS in the vertical direction, for example, in four directions of right, left, front and rear, two directions of right and left, left front, left rear and right. Tension may be applied in three directions, or in five or more directions including components in the front-back and left-right directions, to widen the mutual spacing between the chip CPs, or to be integrated with the chip CP via an adhesive sheet AS. When a frame member such as a ring frame is used, the mutual interval between the chip CPs may be widened by supporting the frame member and applying tension to the adhesive sheet AS, or the laser irradiation device, the chemical solution applying device, or the like is fragile. A semiconductor wafer that can be separated into a plurality of chip CPs by means of a fragile layer physically or chemically formed by a chemical means, or a recess or notch formed by a cutting means such as a cutter blade (hereinafter referred to as a semiconductor wafer). By applying tension to the adhesive sheet AS to which the wafer is attached, the wafer may be divided into a plurality of chip CPs to widen the mutual spacing between the chip CPs.
The separating means 40 may or may not be provided in the positioning device EA of the present invention, and when the separating means 40 is not provided, the mutual spacing of the chip CPs may be widened by another device.

剥離手段50は、本発明の位置決め装置EAに備わっていてもよいし、備わっていなくてもよく、剥離手段50が備わっていない場合、他の装置で接着シートASを剥離してもよいし、切断刃等の切断手段や、ノズル等の気体吹付手段による気体吹き付けによって、接着シートASを複数のチップCPの間隙に沿って切断し、切断された接着シートASがチップCPに貼付されたままにしてもよい。 The peeling means 50 may or may not be provided in the positioning device EA of the present invention. If the peeling means 50 is not provided, the adhesive sheet AS may be peeled by another device. The adhesive sheet AS is cut along the gaps between a plurality of chip CPs by a cutting means such as a cutting blade or a gas spraying means such as a nozzle, and the cut adhesive sheet AS is left attached to the chip CP. You may.

位置決め装置EAは、押圧ローラ等の押圧部材でチップCPまたはウエハに接着シートASを貼付する貼付手段が備わっていてもよいし、ウエハを切断して複数のチップCPに個片化するレーザ照射装置や切断刃等の切断手段が備わっていてもよいし、接着シートASを介してチップCPまたはウエハとフレーム部材とを一体化する一体化手段が備わっていてもよいし、接着シートASに貼付されていない複数のチップCPを図示しない搬送手段で搬送し、支持面12Aの親水部12F上に載置する構成でもよい。
位置決め装置EAで用いる液体LQは、一定の表面張力を有するものであれば特に限定されず、例えば、エタノール、プロパノール、グリセリン等を含むアルコール溶液であってもよい。
前記実施形態では、片状体として複数のチップCPを位置決めするものを例示したが、片状体としては、1つのチップCPでもよい。
支持工程および液体供給工程は、どちらを先に実施してもよく、支持工程を実施した後に液体供給工程を実施してもよいし、液体供給工程を実施した後に支持工程を実施してもよい。液体供給工程を実施した後に支持工程を実施する場合、他の装置でチップCPをその相互間隔を維持したまま接着シートASから剥離し、剥離したチップCPを液体供給工程が実施された後で支持面12Aに転写して支持させてもよい
積層工程や回収工程は、実施してもよいし、実施しなくてもよい。
フレーム部材は、リングフレーム以外に、環状でない(外周が繋がっていない)ものや、円形、楕円形、多角形、その他の形状であってもよい。
The positioning device EA may be provided with a sticking means for sticking the adhesive sheet AS to the chip CP or the wafer with a pressing member such as a pressing roller, or a laser irradiation device that cuts the wafer and separates it into a plurality of chip CPs. A cutting means such as a cutting blade or a cutting blade may be provided, or an integrating means for integrating the chip CP or the wafer and the frame member via the adhesive sheet AS may be provided, or the chip CP or the wafer may be attached to the adhesive sheet AS. A plurality of chip CPs that are not provided may be conveyed by a conveying means (not shown) and placed on the hydrophilic portion 12F of the support surface 12A.
The liquid LQ used in the positioning device EA is not particularly limited as long as it has a constant surface tension, and may be, for example, an alcohol solution containing ethanol, propanol, glycerin, or the like.
In the above-described embodiment, a device that positions a plurality of chip CPs as a piece is exemplified, but a single chip CP may be used as the piece.
Either of the support step and the liquid supply step may be carried out first, the liquid supply step may be carried out after the support step is carried out, or the support step may be carried out after the liquid supply step is carried out. .. When the support step is carried out after the liquid supply step is carried out, the chip CP is peeled from the adhesive sheet AS while maintaining the mutual spacing with another device, and the peeled chip CP is supported after the liquid supply step is carried out. The laminating step and the collecting step, which may be transferred to the surface 12A and supported, may or may not be carried out.
In addition to the ring frame, the frame member may have a non-annular shape (the outer periphery is not connected), a circular shape, an elliptical shape, a polygonal shape, or any other shape.

本発明における手段および工程は、それら手段および工程について説明した動作、機能または工程を果たすことができる限りなんら限定されることはなく、まして、前記実施形態で示した単なる一実施形態の構成物や工程に全く限定されることはない。例えば、支持工程は、親水性を有する複数の親水部が設けられた支持面の親水部で片状体を支持するものであればどのような工程でもよく、出願当初の技術常識に照らし合わせてその技術範囲内のものであればなんら限定されることはない(その他の手段および工程も同じ)。 The means and processes in the present invention are not limited as long as they can perform the operations, functions or processes described for the means and processes, much less the components of the mere embodiment shown in the above-described embodiment. It is not limited to the process at all. For example, the support step may be any step as long as it supports the flake with the hydrophilic part of the support surface provided with a plurality of hydrophilic parts having hydrophilicity, in light of the common general technical knowledge at the time of filing. There is no limitation as long as it is within the technical scope (the same applies to other means and processes).

接着シートASや片状体の材質、種別、形状等は、特に限定されることはない。例えば、接着シートASや片状体は、円形、楕円形、多角形、その他の形状であってもよいし、接着シートASは、感圧接着性、感熱接着性等の接着形態のものであってもよい。また、このような接着シートASは、例えば、接着剤層だけの単層のもの、基材と接着剤層との間に中間層を有するもの、基材の上面にカバー層を有する等3層以上のもの、更には、基材を接着剤層から剥離することのできる所謂両面接着シートのようなものであってもよく、両面接着シートは、単層又は複層の中間層を有するものや、中間層のない単層又は複層のものであってよい。また、片状体としては、例えば、食品、樹脂容器、シリコン半導体チップや化合物半導体チップ等の半導体チップ、回路基板、光ディスク等の情報記録基板、ガラス板、鋼板、陶器、木板または樹脂等の単体物であってもよいし、それら2つ以上で形成された複合物であってもよく、任意の形態の部材や物品なども対象とすることができる。なお、接着シートASは、機能的、用途的な読み方に換え、例えば、情報記載用ラベル、装飾用ラベル、保護シート、ダイシングテープ、ダイアタッチフィルム、ダイボンディングテープ、記録層形成樹脂シート等の任意のシート、フィルム、テープ等でもよい。 The material, type, shape, etc. of the adhesive sheet AS and the flake body are not particularly limited. For example, the adhesive sheet AS and the flake body may have a circular shape, an elliptical shape, a polygonal shape, and other shapes, and the adhesive sheet AS has an adhesive form such as pressure-sensitive adhesiveness and heat-sensitive adhesiveness. You may. Further, such an adhesive sheet AS has three layers, for example, a single layer having only an adhesive layer, a material having an intermediate layer between the base material and the adhesive layer, and a cover layer on the upper surface of the base material. Further, it may be a so-called double-sided adhesive sheet capable of peeling the base material from the adhesive layer, and the double-sided adhesive sheet may have a single layer or a multi-layer intermediate layer. , It may be a single layer or a multi-layer without an intermediate layer. Further, as the flake body, for example, food, resin container, semiconductor chip such as silicon semiconductor chip or compound semiconductor chip, circuit substrate, information recording substrate such as optical disk, glass plate, steel plate, pottery, wood plate or resin alone. It may be a thing, or it may be a composite formed by two or more of them, and a member or an article of any form can be targeted. The adhesive sheet AS can be read in a functional and versatile manner, for example, an information description label, a decorative label, a protective sheet, a dicing tape, a die attach film, a die bonding tape, a recording layer forming resin sheet, or the like. Sheets, films, tapes, etc. may be used.

前記実施形態における駆動機器は、回動モータ、直動モータ、リニアモータ、単軸ロボット、2軸または3軸以上の関節を備えた多関節ロボット等の電動機器、エアシリンダ、油圧シリンダ、ロッドレスシリンダおよびロータリシリンダ等のアクチュエータ等を採用することができる上、それらを直接的又は間接的に組み合せたものを採用することもできる。
前記実施形態において、押圧ローラや押圧ヘッド等の押圧手段や押圧部材といった被押圧物を押圧するものが採用されている場合、上記で例示したものに代えてまたは併用して、ローラ、丸棒、ブレード材、ゴム、樹脂、スポンジ等の部材を採用したり、大気やガス等の気体の吹き付けにより押圧する構成を採用したりしてもよいし、押圧するものをゴムや樹脂等の変形可能な部材で構成してもよいし、変形しない部材で構成してもよいし、支持(保持)手段や支持(保持)部材等の被支持部材(被保持部材)を支持(保持)するものが採用されている場合、メカチャックやチャックシリンダ等の把持手段、クーロン力、接着剤(接着シート、接着テープ)、粘着剤(粘着シート、粘着テープ)、磁力、ベルヌーイ吸着、吸引吸着、駆動機器等で被支持部材を支持(保持)する構成を採用してもよいし、切断手段や切断部材等の被切断部材を切断または、被切断部材に切込や切断線を形成するものが採用されている場合、上記で例示したものに代えてまたは併用して、カッター刃、レーザカッタ、イオンビーム、火力、熱、水圧、電熱線、気体や液体等の吹付け等で切断するものを採用したり、適宜な駆動機器を組み合わせたもので切断するものを移動させて切断するようにしたりしてもよい。
The drive device in the above embodiment is an electric device such as a rotary motor, a linear motor, a linear motor, a single-axis robot, an articulated robot having two or three or more axes of joints, an air cylinder, a hydraulic cylinder, and a rodless. An actuator such as a cylinder and a rotary cylinder can be adopted, and a combination thereof can also be adopted directly or indirectly.
In the above-described embodiment, when a pressing means such as a pressing roller or a pressing head or a pressing member for pressing a pressed object is adopted, a roller, a round bar, or a roller, a round bar, may be used in place of or in combination with the above-exemplified one. A member such as a blade material, rubber, resin, or sponge may be adopted, or a structure of pressing by blowing a gas such as air or gas may be adopted, or the material to be pressed can be deformed such as rubber or resin. It may be composed of a member, may be composed of a member that does not deform, or may be a member that supports (holds) a supported member (held member) such as a supporting (holding) means or a supporting (holding) member. If so, use gripping means such as mechanical chucks and chuck cylinders, Coulomb force, adhesive (adhesive sheet, adhesive tape), adhesive (adhesive sheet, adhesive tape), magnetic force, Bernoulli suction, suction suction, drive equipment, etc. A configuration that supports (holds) the supported member may be adopted, or a structure that cuts the cut member such as a cutting means or a cutting member, or forms a cut or a cutting line in the cut member is adopted. In this case, instead of or in combination with the ones exemplified above, a cutter blade, a laser cutter, an ion beam, a thermal power, a heat, a water pressure, a heating wire, a material that cuts by spraying gas or liquid, etc. may be adopted. It is also possible to move what is to be cut with a combination of appropriate drive devices so as to cut.

EA…位置決め装置
10…支持手段
12…テーブル(支持部材)
12A…支持面
12C…流路
12F…親水部
20…液体供給手段
30…液体回収手段
CP…チップ(片状体)
LQ…液体
EA ... Positioning device 10 ... Support means 12 ... Table (support member)
12A ... Support surface 12C ... Flow path 12F ... Hydrophilic part 20 ... Liquid supply means 30 ... Liquid recovery means CP ... Chip (fragment)
LQ ... Liquid

Claims (4)

液体の表面張力を用いて片状体を所定の位置に位置決めする位置決め方法であって、
親水性を有する親水部が設けられた支持面の前記親水部で前記片状体を支持する支持工程と、
前記親水部に液体を供給する液体供給工程と、
前記親水部から前記液体を回収する液体回収工程とを実施することを特徴とする位置決め方法。
It is a positioning method that positions a flake body in a predetermined position using the surface tension of a liquid.
A support step of supporting the flake with the hydrophilic part of the support surface provided with the hydrophilic part having hydrophilicity, and
A liquid supply step of supplying a liquid to the hydrophilic part and
A positioning method comprising carrying out a liquid recovery step of recovering the liquid from the hydrophilic portion.
前記液体供給工程では、前記支持面を有する支持部材の内部に設けられた流路で前記親水部に前記液体を供給することを特徴とする請求項1に記載の位置決め方法。 The positioning method according to claim 1, wherein in the liquid supply step, the liquid is supplied to the hydrophilic portion by a flow path provided inside the support member having the support surface. 前記液体供給工程では、前記液体回収工程で前記親水部から回収した液体を前記親水部に再供給することを特徴とする請求項1または請求項2に記載の位置決め方法。 The positioning method according to claim 1 or 2, wherein in the liquid supply step, the liquid recovered from the hydrophilic portion in the liquid recovery step is resupplied to the hydrophilic portion. 液体の表面張力を用いて片状体を所定の位置に位置決めする位置決め装置であって、
親水性を有する親水部が設けられた支持面の前記親水部で前記片状体を支持する支持手段と、
前記親水部に液体を供給する液体供給手段と、
前記親水部から前記液体を回収する液体回収手段とを備えていることを特徴とする位置決め装置。
A positioning device that positions a flake in a predetermined position using the surface tension of a liquid.
Supporting means for supporting the flake with the hydrophilic part of the support surface provided with the hydrophilic part having hydrophilicity, and
A liquid supply means for supplying a liquid to the hydrophilic portion and
A positioning device including a liquid recovery means for recovering the liquid from the hydrophilic portion.
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Citations (3)

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Publication number Priority date Publication date Assignee Title
JP2007311748A (en) * 2006-05-17 2007-11-29 National Tsing-Hua Univ Apparatus and method for positioning microchip on substrate
JP2015154031A (en) * 2014-02-19 2015-08-24 株式会社ディスコ Chip arrangement table and chip arrangement method
JP2019179805A (en) * 2018-03-30 2019-10-17 東レエンジニアリング株式会社 Chip component placement jig and chip component placement method

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Publication number Priority date Publication date Assignee Title
JP2011192663A (en) 2010-03-11 2011-09-29 Tokyo Electron Ltd Mounting method and mounting device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007311748A (en) * 2006-05-17 2007-11-29 National Tsing-Hua Univ Apparatus and method for positioning microchip on substrate
JP2015154031A (en) * 2014-02-19 2015-08-24 株式会社ディスコ Chip arrangement table and chip arrangement method
JP2019179805A (en) * 2018-03-30 2019-10-17 東レエンジニアリング株式会社 Chip component placement jig and chip component placement method

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