JP2021144211A - フォトマスクを測定するための方法 - Google Patents

フォトマスクを測定するための方法 Download PDF

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Publication number
JP2021144211A
JP2021144211A JP2021024113A JP2021024113A JP2021144211A JP 2021144211 A JP2021144211 A JP 2021144211A JP 2021024113 A JP2021024113 A JP 2021024113A JP 2021024113 A JP2021024113 A JP 2021024113A JP 2021144211 A JP2021144211 A JP 2021144211A
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JP
Japan
Prior art keywords
mask
spatial image
alignment
image
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021024113A
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English (en)
Japanese (ja)
Inventor
シマコフ ドミトリー
simakov Dmitry
シマコフ ドミトリー
ターラー トーマス
Thaler Thomas
ターラー トーマス
スタイナート シュテッフェン
Steinert Steffen
スタイナート シュテッフェン
バイアー ディルク
Beyer Dirk
バイアー ディルク
ブットゲライト ウーテ
Buttgereit Ute
ブットゲライト ウーテ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of JP2021144211A publication Critical patent/JP2021144211A/ja
Priority to JP2023097154A priority Critical patent/JP2023129405A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2021024113A 2020-02-18 2021-02-18 フォトマスクを測定するための方法 Pending JP2021144211A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023097154A JP2023129405A (ja) 2020-02-18 2023-06-13 フォトマスクを測定するための方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102020104167.5 2020-02-18
DE102020104167.5A DE102020104167B4 (de) 2020-02-18 2020-02-18 Verfahren zur Vermessung von Photomasken

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023097154A Division JP2023129405A (ja) 2020-02-18 2023-06-13 フォトマスクを測定するための方法

Publications (1)

Publication Number Publication Date
JP2021144211A true JP2021144211A (ja) 2021-09-24

Family

ID=77060607

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021024113A Pending JP2021144211A (ja) 2020-02-18 2021-02-18 フォトマスクを測定するための方法
JP2023097154A Pending JP2023129405A (ja) 2020-02-18 2023-06-13 フォトマスクを測定するための方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023097154A Pending JP2023129405A (ja) 2020-02-18 2023-06-13 フォトマスクを測定するための方法

Country Status (6)

Country Link
US (1) US11899358B2 (https=)
JP (2) JP2021144211A (https=)
KR (1) KR102638175B1 (https=)
CN (1) CN113340564B (https=)
DE (1) DE102020104167B4 (https=)
TW (1) TWI788783B (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021112547A1 (de) * 2021-05-14 2022-11-17 Carl Zeiss Smt Gmbh Verfahren zur Ermittlung eines Registrierungsfehlers

Citations (7)

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JP2009200499A (ja) * 2008-02-22 2009-09-03 Interuniv Micro Electronica Centrum Vzw 二重パターニングのための分割および設計指針
JP2009294308A (ja) * 2008-06-03 2009-12-17 Nec Electronics Corp パターン検証方法、パターン検証装置、プログラム、及び半導体装置の製造方法
JP2010038944A (ja) * 2008-07-31 2010-02-18 Toshiba Corp フォトマスクの製造方法及びこのフォトマスクを用いた半導体デバイスの製造方法
JP2010199462A (ja) * 2009-02-27 2010-09-09 Hitachi High-Technologies Corp パターン測定装置
JP2014082516A (ja) * 2009-12-29 2014-05-08 Hitachi Ltd パターン位置およびオーバレイ測定方法および装置
JP2015527740A (ja) * 2012-08-01 2015-09-17 ケーエルエー−テンカー コーポレイション ウェーハの検査、及び／又はウェーハ上に形成されるデバイスの一つ若しくは複数の特性の予測
JP2017058397A (ja) * 2015-09-14 2017-03-23 大日本印刷株式会社 フォトマスクの転写特性評価方法と転写特性評価システムおよびフォトマスクの製造方法

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US5504793A (en) * 1995-02-17 1996-04-02 Loral Federal Systems Company Magnification correction for 1-X proximity X-Ray lithography
WO2000025181A1 (en) * 1998-10-23 2000-05-04 Hitachi, Ltd. Method for fabricating semiconductor device and method for forming mask suitable therefor
JP2005251983A (ja) * 2004-03-04 2005-09-15 Renesas Technology Corp 荷電粒子線マスク検査方法及び荷電粒子線マスク検査装置
US7617477B2 (en) * 2005-09-09 2009-11-10 Brion Technologies, Inc. Method for selecting and optimizing exposure tool using an individual mask error model
KR100924335B1 (ko) * 2007-03-27 2009-11-02 주식회사 하이닉스반도체 멀티 도즈 시뮬레이션을 이용한 광근접보정 방법
KR100881194B1 (ko) * 2007-05-16 2009-02-05 삼성전자주식회사 공간 영상 검사 장비를 이용한 마스크 측정 방법
KR100914297B1 (ko) * 2007-12-28 2009-08-27 주식회사 하이닉스반도체 웨이퍼 패턴 계측 데이터를 이용한 광근접효과보정 방법
DE102008015631A1 (de) 2008-03-20 2009-09-24 Carl Zeiss Sms Gmbh Verfahren und Vorrichtung zur Vermessung von Masken für die Photolithographie
DE102009038558A1 (de) * 2009-08-24 2011-03-10 Carl Zeiss Sms Gmbh Verfahren zur Emulation eines fotolithographischen Prozesses und Maskeninspektionsmikroskop zur Durchführung des Verfahrens
JP5254270B2 (ja) * 2010-04-09 2013-08-07 株式会社ニューフレアテクノロジー 検査方法および検査装置
WO2012013638A1 (en) 2010-07-26 2012-02-02 Carl Zeiss Sms Ltd. Lithographic targets for uniformity control
TWI518446B (zh) 2011-12-19 2016-01-21 聯華電子股份有限公司 修正佈局圖案的方法以及製作光罩的方法
JP2016021008A (ja) * 2014-07-15 2016-02-04 凸版印刷株式会社 マルチパターニング用マスクのパターン評価方法およびパターン評価装置
EP3037878B1 (en) 2014-12-23 2020-09-09 Aselta Nanographics Method of applying vertex based corrections to a semiconductor design
US10572990B2 (en) * 2017-04-07 2020-02-25 Nuflare Technology, Inc. Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system
US10176966B1 (en) 2017-04-13 2019-01-08 Fractilia, Llc Edge detection system
CN107121893B (zh) * 2017-06-12 2018-05-25 中国科学院上海光学精密机械研究所 光刻投影物镜热像差在线预测方法
DE102017115365B4 (de) * 2017-07-10 2020-10-15 Carl Zeiss Smt Gmbh Inspektionsvorrichtung für Masken für die Halbleiterlithographie und Verfahren
DE102017219217B4 (de) * 2017-10-26 2021-03-25 Carl Zeiss Smt Gmbh Masken für die Mikrolithographie, Verfahren zur Bestimmung von Kantenpositionen der Bilder der Strukturen einer derartigen Maske und System zur Durchführung eines derartigen Verfahrens
DE102018111972A1 (de) 2018-05-18 2019-05-29 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung von Registrationsfehlern auf einer Photomaske für die Halbleiterlithographie
DE102018210315B4 (de) * 2018-06-25 2021-03-18 Carl Zeiss Smt Gmbh Verfahren zur Erfassung einer Struktur einer Lithografiemaske sowie Vorrichtung zur Durchführung des Verfahrens

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009200499A (ja) * 2008-02-22 2009-09-03 Interuniv Micro Electronica Centrum Vzw 二重パターニングのための分割および設計指針
JP2009294308A (ja) * 2008-06-03 2009-12-17 Nec Electronics Corp パターン検証方法、パターン検証装置、プログラム、及び半導体装置の製造方法
JP2010038944A (ja) * 2008-07-31 2010-02-18 Toshiba Corp フォトマスクの製造方法及びこのフォトマスクを用いた半導体デバイスの製造方法
JP2010199462A (ja) * 2009-02-27 2010-09-09 Hitachi High-Technologies Corp パターン測定装置
JP2014082516A (ja) * 2009-12-29 2014-05-08 Hitachi Ltd パターン位置およびオーバレイ測定方法および装置
JP2015527740A (ja) * 2012-08-01 2015-09-17 ケーエルエー−テンカー コーポレイション ウェーハの検査、及び／又はウェーハ上に形成されるデバイスの一つ若しくは複数の特性の予測
JP2017058397A (ja) * 2015-09-14 2017-03-23 大日本印刷株式会社 フォトマスクの転写特性評価方法と転写特性評価システムおよびフォトマスクの製造方法

Also Published As

Publication number Publication date
JP2023129405A (ja) 2023-09-14
KR102638175B1 (ko) 2024-02-19
US20210255541A1 (en) 2021-08-19
CN113340564B (zh) 2024-12-06
DE102020104167B4 (de) 2023-01-26
US11899358B2 (en) 2024-02-13
TW202136901A (zh) 2021-10-01
DE102020104167A1 (de) 2021-08-19
CN113340564A (zh) 2021-09-03
TWI788783B (zh) 2023-01-01
KR20210105838A (ko) 2021-08-27

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