JP2019198898A - Chamfering grinding device - Google Patents

Chamfering grinding device Download PDF

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JP2019198898A
JP2019198898A JP2018092656A JP2018092656A JP2019198898A JP 2019198898 A JP2019198898 A JP 2019198898A JP 2018092656 A JP2018092656 A JP 2018092656A JP 2018092656 A JP2018092656 A JP 2018092656A JP 2019198898 A JP2019198898 A JP 2019198898A
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grinding
tape
workpiece
axis
chamfering
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JP7158701B2 (en
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比宇麻 岩瀬
Hiuma Iwase
比宇麻 岩瀬
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Nakamura Tome Precision Industry Co Ltd
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Priority to TW108205561U priority patent/TWM586653U/en
Priority to CN201920675542.7U priority patent/CN210115769U/en
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  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

To provide a chamfering grinding device using a grinding tape, which can create a shape of a work-piece into various shapes of chamfering and is superior in stability of chamfering quality.SOLUTION: The chamfering grinding device comprises a rotary table on which a disk-like work-piece is placed and rotation thereof is controlled, and a grinding tape that is contacted with a peripheral end part of the work-piece to perform chamfering grinding. The grinding tape, attached to a tape holding device having a feeding-out part and a winding-up part, is protruded toward the peripheral end part of the work-piece by a back-up roller provided in the tape holding device. With respect to a relative moving locus of the back-up roller and the work-piece, an X-axis in a horizontal direction, a Z-axis in a vertical direction and a c-axis around the Z-axis are synchronously controlled by an NC program.SELECTED DRAWING: Figure 1

Description

本発明は、半導体デバイスに用いられるウエハ等の円盤形状をした、ワークの周端部を面取り加工するための研削装置に関し、特に研削テープを用いた研削装置に係る。   The present invention relates to a grinding apparatus for chamfering a peripheral end portion of a workpiece having a disk shape such as a wafer used in a semiconductor device, and more particularly to a grinding apparatus using a grinding tape.

半導体デバイスに用いられるウエハは、シリコン結晶基板,炭化ケイ素基板,水晶基板,サファイア基板等、脆性材料が用いられている。
これらの材料は、端部がシャープエッジのままであると、取り扱い時に割れたり一部が欠けたりする恐れがある。
また、他のウエハの表面を傷つける恐れもある。
この種の面取り加工においては、回転砥石が使用されているが砥石の摩耗により面取り形状が変化する技術課題もあることから、この砥石の代わりに研磨テープを用いた技術が特許文献1,2等に開示されている。
これらに開示する技術は、ワークに研磨テープを接触させるためにシリンダーを用いて可動ローラ等をワークに押し付けるものであり、ワークの周端部を、荷重を制御した倣い加工でみがく程度の面取り加工ができても、いろいろな面取り形状に形状創成するだけの硝削力を有していない。
Brittle materials such as silicon crystal substrates, silicon carbide substrates, quartz substrates, and sapphire substrates are used for wafers used in semiconductor devices.
If these materials have sharp edges at the ends, they may be cracked or partially chipped during handling.
In addition, the surface of another wafer may be damaged.
In this type of chamfering, a rotating grindstone is used, but there is also a technical problem that the chamfering shape changes due to wear of the grindstone. Therefore, a technique using an abrasive tape instead of this grindstone is disclosed in Patent Documents 1, 2, etc. Is disclosed.
The technology disclosed in these is a technique in which a movable roller or the like is pressed against the work using a cylinder to bring the polishing tape into contact with the work, and the peripheral edge of the work is chamfered to the extent that it is rubbed by copying with controlled load. Even if it is possible, it does not have enough glass cutting power to create various chamfered shapes.

特開2014−58038号公報JP 2014-58038 A 特開2011−93057号公報JP 2011-93057 A

本発明は、各種面取り形状に形状創成が可能であり、面取り品質の安定性に優れた研削テープによる面取り研削装置の提供を目的とする。   An object of the present invention is to provide a chamfering and grinding apparatus using a grinding tape that can create shapes in various chamfered shapes and has excellent chamfering quality stability.

本発明による面取り研削装置は、円盤状のワークを載置及び回転制御する回転テーブルと、前記ワークの周端部に接触させて面取り研削を行うための研削テープとを備え、前記研削テープは送出部と巻取部とを有するテープ保持装置に装着されているとともに前記テープ保持装置に設けたバックアップローラにより、ワークの周端部に向けて突設してあり、前記バックアップローラと前記ワークとの相対的移動軌跡はNCプログラムにより相互の水平方向のX軸、上下方向のZ軸及びZ軸廻りのC軸が同期的に制御されていることを特徴とする。   A chamfering grinding apparatus according to the present invention comprises a rotary table for placing and controlling rotation of a disk-shaped workpiece, and a grinding tape for performing chamfering grinding in contact with a peripheral edge of the workpiece, and the grinding tape is sent out. And a backup roller provided in the tape holding device and projecting toward the peripheral end of the work, and the backup roller and the work The relative movement trajectory is characterized in that the horizontal X axis, the vertical Z axis, and the C axis around the Z axis are controlled synchronously by the NC program.

研削テープは、リボン状のテープ表面に砥粒を接着させたものであり、送りローラ等の送出部と送り出されたテープを巻き取るための巻き取りローラ等の巻取部を有することで、一方のローラからテープを送り出し、他方のローラで送り出されたテープを巻き取ることができるが、このローラの回転方向を相互に反転させることで研削テープを往復運動させてもよい。   A grinding tape is made by adhering abrasive grains to the surface of a ribbon-like tape, and has a take-up part such as a take-up roller for taking up the fed-out part and a feed-out part such as a feed roller. The tape can be fed from one roller and the tape fed by the other roller can be taken up. However, the grinding tape may be reciprocated by reversing the rotation directions of the rollers.

本発明において、バックアップローラは研削テープを背面側からワークの周端部に押し付けつつ、周端部の上面側と下面側の間を移動することで、その移動軌跡がワークの面取り形状となる。
従って、バックローラはワークの周端部を研削できる程度に、この研削テープを強く押し付けるためのものである。
この点において、特許文献1がシリンダーにて微小振動を与えながら押し付けるのと相違する。
In the present invention, the back-up roller moves between the upper surface side and the lower surface side of the peripheral end portion while pressing the grinding tape against the peripheral end portion of the workpiece from the back side, so that the movement locus becomes the chamfered shape of the workpiece.
Therefore, the back roller is for pressing the grinding tape strongly to the extent that the peripheral edge of the workpiece can be ground.
In this respect, Patent Document 1 is different from pressing while applying minute vibrations with a cylinder.

本発明において、前記ワークは周端部が前記回転テーブルの外周端部から所定の寸法だけオーバーハングさせた状態で当該回転テーブルに載置してあり、前記オーバーハング量Hは前記ワークの厚みTmmに対して、10×Tmm以内に設定してあるのが好ましく、この場合に、前記バックアップローラの外周半径Rは、前記オーバーハング量Hの1/2以下であるのが好ましい。
ウエハとしては、φ10〜300mmのものが多く使用され、その厚みは200〜800μmのものが大きさに合せて使用されている。
オーバーハング量Hが大きくなると、面取り時に不安定になる。
そこで、オーバーハング量Hを10×Tmm以内にしたものであり、好ましくはHを5×Tmm以内にするのがよい。
In the present invention, the workpiece is placed on the rotary table in a state where the peripheral end portion is overhanged by a predetermined dimension from the outer peripheral end portion of the rotary table, and the overhang amount H is the thickness Tmm of the workpiece. On the other hand, it is preferably set within 10 × Tmm. In this case, the outer peripheral radius R of the backup roller is preferably ½ or less of the overhang amount H.
A wafer having a diameter of 10 to 300 mm is often used, and a wafer having a thickness of 200 to 800 μm is used according to the size.
When the overhang amount H becomes large, it becomes unstable during chamfering.
Therefore, the overhang amount H is set within 10 × Tmm, and preferably H is set within 5 × Tmm.

本発明に係る面取り研削装置においては、バックローラとワークとの間のX軸方向,Z軸方向及びC軸の相対移動規制を同期的にNCプログラム制御したので、ワークの周端部の面取り形状を各種形状に形成創成できるので、面取り形状の設定自由度が高い。
また、バックローラに弾性変形が生じる場合にあっては、その変形量をNCプログラムにて補正することができる。
研削テープは新たな砥粒を加工点に供給できるので、従来の砥石のような摩耗による面取り形状の品質変化や砥石の取り替え等の問題が生じなくなる。
In the chamfering grinding apparatus according to the present invention, the relative movement restriction of the X axis direction, the Z axis direction, and the C axis between the back roller and the workpiece is controlled by the NC program synchronously. Can be formed and created in various shapes, so there is a high degree of freedom in setting chamfered shapes.
Further, when elastic deformation occurs in the back roller, the deformation amount can be corrected by the NC program.
Since the grinding tape can supply new abrasive grains to the processing point, problems such as a change in the quality of the chamfered shape due to wear and replacement of the grinding wheel as in the conventional grinding stone do not occur.

(a)は本発明に係る面取り研削装置の構成例を示し、(b)はバックローラの移動軌跡を示す。(A) shows the structural example of the chamfering grinding apparatus which concerns on this invention, (b) shows the movement locus | trajectory of a back roller. ワークの周端部の面取り形状の創成例を示す。An example of the creation of a chamfered shape at the peripheral edge of a workpiece will be shown.

図1に本発明に係る面取り研削装置の構成例を示すが、本発明はこれに限定されない。
図1(a)に示すように円盤状のワーク1を芯出しした状態で載置及び保持する回転テーブル2を有する。
回転テーブル2は、図示を省略した駆動載置により回転速度Wに回転制御されており、減圧吸引口等の保持手段を用いてワーク1を回転テーブル2上に保持する。
円盤形状のワーク1は、回転テーブル2の外周端部(外周壁)2aからオーバーハング量Hmmだけ、オーバーハングさせた状態で回転テーブル2に載置される。
Although the structural example of the chamfering grinding apparatus which concerns on FIG. 1 at this invention is shown, this invention is not limited to this.
As shown to Fig.1 (a), it has the rotary table 2 which mounts and hold | maintains the disk-shaped workpiece | work 1 in the centered state.
The turntable 2 is driven by placing, not shown are rotationally controlled in the rotational speed W 1, to hold the workpiece 1 on the turntable 2 by using a retaining means such as a vacuum suction port.
The disk-shaped work 1 is placed on the turntable 2 in an overhang state from the outer peripheral end (outer peripheral wall) 2a of the turntable 2 by an overhang amount Hmm.

テープ保持装置3は、研削テープ4の送りローラ3bと巻取りローラ3c及び研削テープ4をワーク1の周端部に押し付けるためのバックアップローラ3aを有する。
バックアップローラ3aは、ワーク1の周端部1aを各種面取り形状に研削するために、研削テープ4を背面側から押し付けるためのものであり、テープ保持装置3の本体部から突設されている。
研削テープ4はガイドローラ3d,張りローラ3e等を用いて張設されている。
よって、バックアップローラ3aはテープ保持装置3の本体部から剛性のあるフレーム材等を用いて突設支持されている。
The tape holding device 3 includes a feed roller 3 b and a take-up roller 3 c for the grinding tape 4 and a backup roller 3 a for pressing the grinding tape 4 against the peripheral end of the work 1.
The backup roller 3 a is for pressing the grinding tape 4 from the back side in order to grind the peripheral end portion 1 a of the workpiece 1 into various chamfered shapes, and protrudes from the main body portion of the tape holding device 3.
The grinding tape 4 is stretched using a guide roller 3d, a tension roller 3e, and the like.
Therefore, the backup roller 3a is supported by protruding from the main body of the tape holding device 3 using a rigid frame material or the like.

テープ保持装置3のバックアップローラ3aと回転テーブル2に載置したワーク1とは、このバックアップローラ3aと回転テーブル2の一方、又は両方に図示を省略した移動制御機構を設けてあり、NCプログラムにより水平方向のX軸,上下方向のZ軸,Z軸廻りのC軸の位置が同期して制御されている。   The backup roller 3a of the tape holding device 3 and the work 1 placed on the rotary table 2 are provided with a movement control mechanism (not shown) on one or both of the backup roller 3a and the rotary table 2, and can be controlled by an NC program. The positions of the horizontal X-axis, the vertical Z-axis, and the C-axis around the Z-axis are controlled synchronously.

バックアップローラ3aは図1(b)に示すように、ワークの周端部の面取り上面1b,面取り先端部1c及び面取り下面1dとの間を目的とする面取り形状に研削されるように移動する。
図1(b)では、バックアップローラ3aの移動軌跡を2点鎖線で示し、バックアップローラ3aの中心の軌跡を1点鎖線で示す。
ワークの周端部の面取り下面1dを研削創成する際には、回転テーブル2の外周壁2aとの干渉を避けるためにバックアップローラ3aの半径Rが、オーバーハング量Hの1/2以下になるように設定してある。
この際に研削テープ4の厚みも考慮する必要があるが、研削テープは薄いので、その分を省略した。
As shown in FIG. 1B, the backup roller 3a moves between the chamfered upper surface 1b, the chamfered tip 1c, and the chamfered lower surface 1d of the peripheral edge of the workpiece so as to be ground into a desired chamfered shape.
In FIG. 1B, the movement locus of the backup roller 3a is indicated by a two-dot chain line, and the center locus of the backup roller 3a is indicated by a one-dot chain line.
When grinding the chamfered lower surface 1d at the peripheral edge of the workpiece, the radius R of the backup roller 3a is ½ or less of the overhang amount H in order to avoid interference with the outer peripheral wall 2a of the rotary table 2. It is set as follows.
At this time, the thickness of the grinding tape 4 also needs to be taken into consideration, but the grinding tape is thin, so that portion is omitted.

研削テープ4にて、ワークの周端部を面取り研削する際に、研削テープ4を長手方向あるいは幅方向に往復運動させたり、ローラのテープ経路を幅方向に変化させると、研削屑の排出を促進させることができる。   When chamfering and grinding the peripheral edge of the workpiece with the grinding tape 4, if the grinding tape 4 is reciprocated in the longitudinal direction or the width direction, or the tape path of the roller is changed in the width direction, the grinding dust is discharged. Can be promoted.

図2はワークの周端部の研削領域1eに対して、下面側と上面側とで研削代を異なるように設定した例を示す。
これにより、面取り上面1bと面取り下面1dの形状を自由に設定することもできる。
FIG. 2 shows an example in which the grinding allowance is set to be different between the lower surface side and the upper surface side with respect to the grinding region 1e at the peripheral end portion of the workpiece.
Thereby, the shape of the chamfered upper surface 1b and the chamfered lower surface 1d can be set freely.

1 ワーク
2 回転テーブル
3 テープ保持装置
3a バックアップローラ
4 研削テープ
1 Workpiece 2 Rotary table 3 Tape holding device 3a Backup roller 4 Grinding tape

Claims (3)

円盤状のワークを載置及び回転制御する回転テーブルと、前記ワークの周端部に接触させて面取り研削を行うための研削テープとを備え、
前記研削テープは送出部と巻取部とを有するテープ保持装置に装着されているとともに前記テープ保持装置に設けたバックアップローラにより、ワークの周端部に向けて突設してあり、
前記バックアップローラと前記ワークとの相対的移動軌跡はNCプログラムにより相互の水平方向のX軸、上下方向のZ軸及びZ軸廻りのC軸が同期的に制御されていることを特徴とする面取り研削装置。
A rotary table for placing and controlling the rotation of a disk-shaped workpiece, and a grinding tape for chamfering grinding by contacting the peripheral edge of the workpiece,
The grinding tape is mounted on a tape holding device having a delivery portion and a winding portion, and is projected toward the peripheral end of the workpiece by a backup roller provided on the tape holding device,
The relative movement trajectory between the backup roller and the workpiece is controlled by an NC program in which the horizontal X axis, the vertical Z axis, and the C axis around the Z axis are controlled synchronously. Grinding equipment.
前記ワークは周端部が前記回転テーブルの外周端部から所定の寸法だけオーバーハングさせた状態で当該回転テーブルに載置してあり、
前記オーバーハング量Hは前記ワークの厚みTmmに対して、10×Tmm以内に設定してあることを特徴とする請求項1記載の面取り研削装置。
The workpiece is placed on the rotary table in a state where the peripheral end portion is overhanged by a predetermined dimension from the outer peripheral end portion of the rotary table,
The chamfering grinding apparatus according to claim 1, wherein the overhang amount H is set within 10 × Tmm with respect to the thickness Tmm of the workpiece.
前記バックアップローラの外周半径Rは、前記オーバーハング量Hの1/2以下であることを特徴とする請求項2記載の面取り研削装置。   The chamfering grinding apparatus according to claim 2, wherein an outer peripheral radius R of the backup roller is ½ or less of the overhang amount H.
JP2018092656A 2018-05-14 2018-05-14 chamfering grinder Active JP7158701B2 (en)

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JP2018092656A JP7158701B2 (en) 2018-05-14 2018-05-14 chamfering grinder
TW108205561U TWM586653U (en) 2018-05-14 2019-05-06 Chamfering and grinding device
CN201920675542.7U CN210115769U (en) 2018-05-14 2019-05-13 Chamfer grinding device

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57184662A (en) * 1981-05-09 1982-11-13 Hitachi Ltd Chamfering method and device of wafer
JPH11345788A (en) * 1998-05-29 1999-12-14 Shin Etsu Handotai Co Ltd Working method of sheet edge section and working machine
US20080293329A1 (en) * 2007-05-21 2008-11-27 Applied Materials, Inc. Methods and apparatus for identifying a substrate edge profile and adjusting the processing of the substrate according to the identified edge profile
JP2010247273A (en) * 2009-04-15 2010-11-04 Daito Electron Co Ltd Method for chamfering wafer
JP2011093057A (en) * 2009-10-30 2011-05-12 Tokyo Seimitsu Co Ltd Wafer edge polishing apparatus and edge polishing method used therein
JP2012076201A (en) * 2010-10-05 2012-04-19 Seiko Instruments Inc Method for polishing outer periphery of wafer, method for manufacturing piezoelectric vibrating reed, piezoelectric vibrating reed, piezoelectric vibrator, oscillator, electronic device, and radio-controlled timepiece
JP2016111116A (en) * 2014-12-04 2016-06-20 株式会社Sumco Suction chuck, chamfer polishing device, and chamfer polishing method of silicon wafer
WO2017122580A1 (en) * 2016-01-14 2017-07-20 株式会社荏原製作所 Polishing device and polishing method

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57184662A (en) * 1981-05-09 1982-11-13 Hitachi Ltd Chamfering method and device of wafer
JPH11345788A (en) * 1998-05-29 1999-12-14 Shin Etsu Handotai Co Ltd Working method of sheet edge section and working machine
US20080293329A1 (en) * 2007-05-21 2008-11-27 Applied Materials, Inc. Methods and apparatus for identifying a substrate edge profile and adjusting the processing of the substrate according to the identified edge profile
JP2010247273A (en) * 2009-04-15 2010-11-04 Daito Electron Co Ltd Method for chamfering wafer
JP2011093057A (en) * 2009-10-30 2011-05-12 Tokyo Seimitsu Co Ltd Wafer edge polishing apparatus and edge polishing method used therein
JP2012076201A (en) * 2010-10-05 2012-04-19 Seiko Instruments Inc Method for polishing outer periphery of wafer, method for manufacturing piezoelectric vibrating reed, piezoelectric vibrating reed, piezoelectric vibrator, oscillator, electronic device, and radio-controlled timepiece
JP2016111116A (en) * 2014-12-04 2016-06-20 株式会社Sumco Suction chuck, chamfer polishing device, and chamfer polishing method of silicon wafer
US20170330783A1 (en) * 2014-12-04 2017-11-16 Sumco Corporation Vacuum chuck, beveling/polishing device, and silicon wafer beveling/polishing method
WO2017122580A1 (en) * 2016-01-14 2017-07-20 株式会社荏原製作所 Polishing device and polishing method

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TWM586653U (en) 2019-11-21
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