JP2018099811A - Gas barrier optical film and organic EL display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a gas barrier optical film having improved light transmissivity while maintaining high gas barrier properties and flex resistance, and an organic EL display having improved display quality.SOLUTION: A gas barrier optical film 10 has is an optical isotropic base material 11, and an atomic layer deposition film 12 formed on one of front and rear faces of the optical isotropic base material 11. The atomic layer deposition film 12 has a refractive index that is -0.13 to +0.27 with respect to a refractive index of the optical isotropic base material 11.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a gas barrier optical film and an organic EL display, and more particularly to a gas barrier film having an atomic layer deposition layer and an organic EL display using the gas barrier film.

  In recent years, next-generation devices such as organic EL displays, organic EL lighting, organic solar cells, and electronic paper using organic semiconductor technology have been developed, and some have been put into practical use. The element that is the basic configuration of these devices is formed of a material that has a precise structure and is easily affected by the outside. For this reason, for example, a structure or material may be deteriorated by the influence of a trace amount or a trace amount of moisture or oxygen, and the function of the device may be lowered. In order to cope with this, for example, a structure in which an organic EL element is deteriorated by a glass substrate that has an excellent sealing effect for blocking the element from air, has high moisture resistance, and is light transmissive is adopted. ing.

  However, the structure using a glass base material has difficulty in handling glass, its thickness and weight. Therefore, using a transparent gas barrier film instead of a glass substrate has been studied due to the demand for development of mobile devices and the like that are rapidly expanding in the market. For example, in order to achieve a high water vapor barrier property, a gas barrier film in which a gas barrier layer made of a dense inorganic material thin film is formed on a plastic film substrate, and an organic material and an inorganic material to compensate for the weakness of the inorganic material A gas barrier film having a composite gas barrier layer formed by laminating and has been developed.

  For example, Patent Literature 1 discloses a gas barrier film including a first barrier layer containing an inorganic substance from the film substrate side and a second barrier layer formed by applying polysilazane.

International Publication No. 2013/161894

By the way, also in an organic EL display, the request | requirement of thickness reduction is increasing with the high-intensity and high-definition of an image. By reducing the thickness of the organic EL display, the design can be improved. In addition, flexibility can be enhanced by reducing the thickness. In that case, the application destination of the organic EL display increases, which may lead to further expansion of demand.
In addition, in recent years, it has been demanded to further improve the display quality (for example, visibility) of the organic EL display. As an example, there is room for improvement in improving the light transmittance of the gas barrier film used in the organic EL display. there were.

  Therefore, the present invention has been made in view of such circumstances, and has a gas barrier optical film with improved light transmission while maintaining high gas barrier properties and bending resistance, and an organic EL with improved display quality. The object is to provide a display.

  In order to solve the above problems, a gas barrier optical film according to an aspect of the present invention includes an optical isotropic substrate, and an atomic layer deposition film formed on at least one surface of the optical isotropic substrate, The refractive index of the atomic layer deposition film is −0.13 to +0.27 with respect to the refractive index of the optically isotropic substrate.

  Moreover, the organic EL display which concerns on 1 aspect of this invention is equipped with said gas-barrier optical film, an adhesion layer, and the organic EL element to which the sealing layer was attached, It is characterized by the above-mentioned.

  According to one embodiment of the present invention, it is possible to provide a gas barrier optical film with improved light transmittance and an organic EL display with improved display quality while maintaining high gas barrier properties and flex resistance.

It is sectional drawing which shows the 1st structural example of the gas barrier optical film 10 which concerns on 1st Embodiment of this invention. 3 is a cross-sectional view showing a second configuration example of the gas barrier optical film 10. FIG. 4 is a cross-sectional view showing a third configuration example of the gas barrier optical film 10. FIG. 6 is a cross-sectional view showing a fourth configuration example of the gas barrier optical film 10. FIG. 6 is a cross-sectional view showing a fifth configuration example of the gas barrier optical film 10. FIG. It is sectional drawing which shows the 1st structural example of the gas barrier optical film 20 which concerns on 2nd Embodiment of this invention. 3 is a cross-sectional view showing a second configuration example of the gas barrier optical film 20. FIG. 4 is a cross-sectional view showing a third configuration example of the gas barrier optical film 20. FIG. 6 is a cross-sectional view showing a fourth configuration example of the gas barrier optical film 20. FIG. 6 is a cross-sectional view showing a fifth configuration example of the gas barrier optical film 20. FIG. It is sectional drawing which shows the 1st structural example of the organic electroluminescent display 50 which concerns on 3rd Embodiment of this invention. 4 is a cross-sectional view showing a second configuration example of an organic EL display 50. FIG. 6 is a cross-sectional view illustrating a third configuration example of an organic EL display 50. FIG. It is sectional drawing which shows the structural example of the organic electroluminescent display which concerns on Example 1 of this invention.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the same reference numerals are given to portions corresponding to each other in the drawings to be described below, and description of the overlapping portions will be omitted as appropriate. Further, the embodiment of the present invention exemplifies a configuration for embodying the technical idea of the present invention, and specifies the material, shape, structure, arrangement, dimensions, etc. of each part as follows. Not. The technical idea of the present invention can be variously modified within the technical scope defined by the claims described in the claims.

<First Embodiment>
The gas barrier optical film 10 according to the first embodiment of the present invention will be described with reference to a plurality of configuration examples.

(1) First Configuration Example FIG. 1 is a cross-sectional view showing a first configuration example of the gas barrier optical film 10 according to the first embodiment of the present invention. As shown in FIG. 1, the gas barrier optical film 10 includes an optical isotropic substrate 11, an atomic layer deposition film 12 (ALD film), an adhesive layer 13, and a circularly polarizing plate 14.

(1.1) Optically isotropic substrate 11
Generally, a display panel is designed by combining with a phase difference plate or a circularly polarizing plate that gives a predetermined polarization to incident light. The optically isotropic substrate 11 is an optically isotropic film so as not to hinder its design. The optically isotropic substrate 11 includes a transparent extruded polymer film such as cycloolefin polymer, (COP), cyclic olefin copolymer (COC), polycarbonate (PC), polyarylate, acrylic resin, norbornene. A resin or the like can be used. Further, a coat layer such as a hard coat layer may be provided on one side or both sides of the optically isotropic substrate 11. By providing the coat layer, for example, the weakness of a COP film or the like is complemented, and the workability is improved. For example, the hard coat layer may have the composition described in the fourth configuration example.

(1.2) Atomic layer deposition film 12
The atomic layer deposition film 12 is a film formed on the surface of the optically isotropic substrate 11 by an ALD (Atomic Layer Deposition) method. Here, the ALD method is a method in which a surface-adsorbed substance is formed one layer at a time by a chemical reaction on the surface. Specifically, in the ALD method, an active gas called a precursor or a precursor and a reactive gas are alternately used to alternately perform adsorption on the surface of the optically isotropic substrate 11 and subsequent chemical reaction. This is a film forming method in which atomic layers are grown one layer at a time on the surface of the optically isotropic substrate 11. The ALD method can form a dense film with fewer film formation defects (that is, a film with excellent gas barrier properties) as compared with a vacuum deposition method, a sputtering method, or a general CVD method.

A specific film formation method of the ALD method is performed by the following method.
First, using the so-called self-limiting effect, the unreacted precursor is exhausted when only one layer of the precursor is adsorbed on the optically isotropic substrate 11 (first step). Here, the self-limiting effect refers to a phenomenon in which, when the surface is adsorbed on the optically isotropic substrate 11, if the surface is covered with a certain kind of gas, no further gas adsorption occurs.

  Next, a reactive gas is introduced into the chamber, and the precursor adsorbed on the surface of the optically isotropic substrate 11 is reacted with the reactive gas to form only a thin film having a desired composition. Thereafter, the reactive gas is exhausted (second step). In the ALD method, the first and second steps are defined as one cycle, and this cycle is repeated to form a thin film on the optically isotropic substrate 11 one by one at the atomic level.

  In each embodiment of the present invention, the atomic layer deposition film 12 contains a precursor (for example, a metal-containing precursor such as TMA: Tri-Methyl Aluminum or Tris-dimethylaminosilane) that is a raw material for the atomic layer deposition film 12. In addition, the precursor located on the surface of the optically isotropic substrate 11 and the adsorption site of the optically isotropic substrate 11 are combined.

  As the atomic layer deposition film 12, for example, an inorganic oxide film containing an element such as Al, Ti, Si, Sn, Ta, Nb, a nitride film or an oxynitride film containing these elements, or a mixed compound thereof is used. Can do. For example, the atomic layer deposition film 12 is made of AlSiOx, TiAlOx, TaOx, or NbOx. Further, as the atomic layer deposition film 12, for example, an oxide film, a nitride film, an oxynitride film, a mixed compound thereof, or the like containing other elements (for example, Zr, Hf) can be used.

  As the atomic layer deposition film 12, a film containing at least one element of Al, Si, and Ti (for example, a film as described above) is used from the viewpoints of water vapor barrier properties, durability, and cost. Good. By using a film containing such an element as the atomic layer deposition film 12, high water vapor barrier properties and high durability can be obtained, and costs can be reduced.

  The thickness of the atomic layer deposition film 12 is preferably not less than 0.5 nm and not more than 200 nm, for example. If the thickness of the atomic layer deposition film is less than 0.5 nm, an atomic layer deposition film having a sufficient water vapor barrier property cannot be formed from the viewpoint of manufacturing technology. If the thickness of the atomic layer deposition film exceeds 200 nm, it is not preferable because it requires cost and film formation time.

  Therefore, by setting the thickness of the atomic layer deposition film 12 within the range of 0.5 nm or more and 200 nm or less, the atomic layer deposition film 12 having a sufficient water vapor barrier property can be obtained in a short time.

  The refractive index of the atomic layer deposition film 12 is −0.13 to +0.9, and preferably −0.13 to +0.27 with respect to the refractive index of the optically isotropic substrate 11. For example, when a cycloolefin polymer (COP) having a refractive index of 1.53 is employed as the material of the optically isotropic substrate 11, the material of the atomic layer deposition film 12 may be AlOx having a refractive index of 1.52 to 1.62. SiOx with a refractive index of 1.40 to 1.46, AlSiOx with a refractive index of 1.40 to 1.62, TiAiOx with a refractive index of 1.50 to 2.4, and a refractive index of 1.60 to 1.80. SnSiOx is mentioned. When the refractive index of the atomic layer deposition film 12 is outside the range of −0.13 to +0.9 with respect to the refractive index of the optically isotropic substrate 11, the light transmittance is remarkably lowered and used for an organic EL display. In this case, it is difficult to obtain a preferable video display.

(1.3) Adhesive layer 13
The adhesive layer 13 is provided between the optically isotropic substrate 11 and the circularly polarizing plate 14 and has a function of bonding the optically isotropic substrate 11 and the circularly polarizing plate 14. As the adhesive layer 13, a photo-curing adhesive resin, a thermosetting adhesive resin, a two-component curable adhesive resin made of an epoxy resin, an acrylic resin, a silicone resin, or the like, or an acid-modified product such as polyethylene or polypropylene A method of curing a thermoplastic adhesive resin composed of a main component having a hydroxyl group such as rubber, silicone, acrylic and urethane with an isocyanate curing agent is used. Of these, one obtained by polymerizing and curing one-component or two-component reactive polyurethane resin and trifunctional isocyanate is preferable. The processing is preferably a laminating method, and a gravure coater, a dip coater, a reverse coater, a wire bar coater, a die coater or the like can be used as a coating method.

  Moreover, the adhesion layer 13 may contain the curable moisture absorbent, respectively. In that case, the content ratio of the curable hygroscopic agent in the adhesive layer 13 is preferably 5% by mass or more and 60% by mass or less, more preferably 10% by mass or more and 45% by mass or less, when the total mass is 100% by mass. It is.

  The curable moisture absorbent is a mixture of a moisture absorbent and a curing agent. The content of the hygroscopic agent (compound) in the curable hygroscopic agent is preferably 20% by mass or more and 80% by mass or less, more preferably 25% by mass or more and 60% by mass or less when the total mass is 100% by mass. is there. When the content of the hygroscopic agent is within this range, the action of capturing moisture can be effectively expressed in the curable hygroscopic agent.

(1.4) Circularly polarizing plate 14
The circularly polarizing plate 14 is a transparent film laminated on the surface side of the optically isotropic substrate 11 with an adhesive layer 13 interposed therebetween. The circularly polarizing plate 14 has a function of preventing reflection of external light, reflection of a background, and the like. For example, in the organic EL display shown in FIGS. 11 to 13 described later, the circularly polarizing plate 14 is provided on the viewing side with respect to the optically isotropic substrate 11. An organic EL display is provided with a highly reflective metal layer (for example, an anode positioned between the TFT element and the organic EL layer). It is possible to prevent the light reflected and scattered inside the light from being emitted to the outside (that is, the viewing side).

The circularly polarizing plate 14 is obtained by laminating a polarizing plate and a retardation plate via an adhesive layer or the like (not shown), and the polarizing plate is provided on the viewing side with respect to the retardation plate.
The phase difference plate is a transparent film that gives a predetermined phase difference to incident light. Examples of the retardation plate include a quarter wavelength plate or a combination of a quarter wavelength plate and a half wavelength plate. For the retardation plate, a transparent uniaxially stretched polymer film such as polyvinyl alcohol, polycarbonate (PC), polysulfone, polystyrene, polyarylate, cycloolefin polymer (COP), cyclic olefin copolymer (COC), norbornene resin, etc. Can be used. In addition, since the polymer film constituting the retardation plate has a wavelength dependency of the refractive index, sufficient performance may not be obtained with one type of retardation plate for light having a wide wavelength region. For this reason, retardation films having different retardation values may be bonded to each other while shifting their optical axes to constitute a retardation plate in which a half-wave plate and a quarter-wave plate are combined in a wide wavelength range. .
The polarizing plate is a film that converts incident light into linearly polarized light, and cannot pass through the polarizing plate when incident light is reflected inside the organic EL display due to the combination with the retardation plate. That is, the reflected light is not visually recognized.
As the polarizing plate, for example, a film obtained by uniaxially stretching a film such as polyvinyl alcohol (PVA) on which a dichroic dye such as iodine is adsorbed and imparting polarization can be used. As the protective layer, a structure sandwiched between optically isotropic films such as triacetyl cellulose (TAC) is used.

(1.5) Example of order of steps In the first configuration example, the atomic layer deposition film 12 is formed on the back surface (the lower surface in FIG. 1) of the optically isotropic substrate 11. Before and after this, the circularly polarizing plate 14 is bonded to the surface of the optically isotropic substrate 11 (in FIG. 1, the upper surface, hereinafter also referred to as “front surface”) through the adhesive layer 13. To do.

(2) Second Configuration Example FIG. 2 is a cross-sectional view showing a second configuration example of the gas barrier optical film 10.
As shown in FIG. 2, the gas barrier optical film 10 may further include an undercoat layer 15 made of an inorganic material formed between the optically isotropic substrate 11 and the atomic layer deposition film 12.

(2.1) Undercoat layer 15
That is, in the gas barrier optical film 10, the undercoat layer 15 may be disposed between the optically isotropic substrate 11 and the atomic layer deposition film 12. The undercoat layer 15 is made of, for example, only an inorganic material. Examples of the undercoat layer 15 include SiOx, AlOx, TaOx, and NbOx. Examples of the method for forming the undercoat layer 15 include a PVD method, a CVD method, and a sol-gel method. Here, the ALD method is included in the CVD method.

  The inorganic material contained in the undercoat layer 15 has a larger number of adsorption sites (portions to which precursors that are raw materials for the atomic layer deposition film 12 are bonded) than the organic material. This shortens the period from the start of the formation process of the atomic layer deposition film 12 to the formation of a dense film by two-dimensional growth.

  The thickness of the undercoat layer 15 is preferably, for example, 1 nm or more and 1000 nm or less. If the thickness of the undercoat layer is less than 1 nm, the surface of the optically isotropic substrate cannot be completely covered, and the density of adsorption sites is insufficient. There is a possibility that the period until a dense film is formed by two-dimensional growth cannot be shortened. That is, the atomic layer deposition film 12 having a sufficient water vapor barrier property cannot be formed. On the other hand, if the thickness of the undercoat layer exceeds 1000 nm, cost and film formation time are required, and cracks and defects may occur in the undercoat layer.

  Further, as a method of increasing the density of the adsorption sites, it is possible to increase the density of the adsorption sites by performing plasma treatment or hydrolysis treatment on the surface of the optically isotropic substrate instead of the undercoat layer 15.

  In FIG. 2, as an example, the case where the undercoat layer 15 is disposed so as to cover the entire back surface of the optically isotropic substrate 11 has been described as an example. However, the undercoat layer 15 may be disposed on at least a part of the back surface of the optically isotropic substrate 11 and is not limited to the configuration shown in FIG.

  In FIG. 2, the case where the undercoat layer 15 is disposed between the optically isotropic substrate 11 and the atomic layer deposition film 12 has been described as an example. However, for example, an adhesion layer (not shown) may be disposed between the optically isotropic substrate 11 and the undercoat layer 15. The adhesion layer is made of, for example, a resin layer containing an organic polymer. Thus, when an adhesion layer is provided between the optically isotropic substrate 11 and the undercoat layer 15, the adhesion strength between the optically isotropic substrate 11 and the undercoat layer 15 can be improved.

(2.2) Example of order of steps In the second configuration example, the undercoat layer 15 is formed on the back surface (the lower surface in FIG. 2) of the optically isotropic substrate 11, and then the atomic layer deposition film 12 is formed. To do. Further, before and after this, the circularly polarizing plate 14 is bonded to the front surface (the upper surface in FIG. 2) of the optically isotropic substrate 11 through the adhesive layer 13.

(3) Third Configuration Example FIG. 3 is a cross-sectional view showing a third configuration example of the gas barrier optical film 10.
As shown in FIG. 3, the gas barrier optical film 10 is an overcoat formed on the surface opposite to the surface facing the optical isotropic substrate 11 of the atomic layer deposition film 12 (the lower surface in FIG. 3). A layer 16 may further be provided. Further, the gas barrier film further includes a release film formed so as to be peelable on the surface opposite to the surface facing the optically isotropic substrate 11 of the atomic layer deposition film 12 (the lower surface in FIG. 3). You may prepare. FIG. 3 illustrates the case where the surface of the overcoat layer 16 is covered with the release film 17.

(3.1) Overcoat layer 16
In FIG. 3, the overcoat layer 16 is a protective film that protects the atomic layer deposition film 12. It is possible to prevent the atomic layer deposited film from being damaged during the processing or transportation of the gas barrier optical film, thereby impairing the barrier property. The overcoat layer 16 may be a layer containing an inorganic material similar to the undercoat layer 15 or may be a layer containing an organic material. For example, the overcoat layer 16 can be formed by a PVD method or a CVD method when an inorganic material is included, and a bar coat method, a spin coat method, a spray coat method, or a die coat method when an organic material is included. Or the like. A sheet-like overcoat layer may be laminated. The overcoat layer 16 may be a layer obtained by dry laminating a plastic film.

(3.2) Release film 17
The release film 17 is a protective film that protects the surface of the atomic layer deposition film 12 opposite to the surface facing the optically isotropic substrate 11. It is possible to prevent the atomic layer deposited film from being damaged during the processing or transportation of the gas barrier optical film and the barrier property from being impaired, or the overcoat layer from being damaged and the optical properties from being impaired. In FIG. 3, the release film covers and protects the surface of the overcoat layer 16. Although not shown, the release film has a base material and an adhesive provided on one surface of the base material. The adhesive of the release film is adhered to a film to be protected such as the atomic layer deposition film 12 or the overcoat layer 16. Moreover, the adhesive force with respect to the base material of an adhesive is larger than the adhesive force with respect to the to-be-protected film of an adhesive. For this reason, when a peeling film is peeled from a to-be-protected film, an adhesive will remove | separate from a to-be-protected film and will be removed with a base material.

  The substrate may be paper or a resin film. Examples of the paper include fine paper and kraft paper. Examples of the resin film include a polyethylene terephthalate (PET) film. The pressure-sensitive adhesive may be a silicone-based pressure-sensitive adhesive containing silicone or a non-silicone-based pressure-sensitive adhesive not containing silicone.

(3.3) Example of Process Order In the third configuration example, the atomic layer deposition film 12 is formed on the back surface (the lower surface in FIG. 3) of the optical isotropic substrate 11, and then the overcoat layer 16 is formed. Further, a release film is attached to the overcoat layer 16. Before and after this, the circularly polarizing plate 14 is attached to the front surface (the upper surface in FIG. 3) of the optically isotropic substrate 11 via the adhesive layer 13.

(4) Fourth Configuration Example FIG. 4 is a cross-sectional view showing a fourth configuration example of the gas barrier optical film 10.

(4.1) First hard coat layer 18
As shown in FIG. 4, the gas barrier optical film 10 is a first hard coat formed on the surface opposite to the surface facing the optically isotropic substrate 11 of the circularly polarizing plate 14 (the upper surface in FIG. 4). A layer 18 may be further provided. The upper surface of the circularly polarizing plate 14 is protected by the first hard coat layer 18 formed on the upper surface of the circularly polarizing plate 14.

  As a material used for the first hard coat layer 18, a material having visible light permeability can be used. For example, various transparent resins such as acrylic resins such as acrylic esters, acrylamides, methacrylic esters, and methacrylamides, organic silicon resins, and thermosetting polysiloxane resins are used as the material for the first hard coat layer 18. May be used as

  The refractive index of the first hard coat layer 18 is preferably −0.13 to +0.07 with respect to the refractive index of the optically isotropic substrate 11. For example, when a cycloolefin polymer (COP) having a refractive index of 1.53 is used as the material of the optically isotropic substrate 11, the material of the first hard coat layer 18 is acrylic having a refractive index of 1.40 to 1.60. Based resins.

  The first hard coat layer 18 can be formed by a thin film forming method corresponding to the material for forming the first hard coat layer 18. The first hard coat layer 18 is prepared by, for example, dissolving a resin as described above as a main component and a material that absorbs ultraviolet rays in a solvent to prepare a coating liquid, and this coating liquid is a die coater, a curtain flow coater, It is formed by applying to the optically isotropic substrate 11 using a roll coater, reverse roll coater, gravure coater, knife coater, bar coater, spin coater, micro gravure coater, etc., and curing the coating film by irradiation of ultraviolet rays or the like. Also good.

  The thickness of the first hard coat layer 18 is, for example, 1 μm or more and 10 μm or less. However, the thickness of the first hard coat layer 18 is not limited to this range. Further, the first hard coat layer 18 may be provided on both surfaces of the circularly polarizing plate 14.

  Although not shown, the gas barrier optical film 10 may further include a release film that covers the upper surface of the first hard coat layer 18. This release film may have the same composition as the release film 17 shown in FIG.

(4.2) Example of order of steps In the fourth configuration example, the atomic layer deposition film 12 is formed on the back surface (the lower surface in FIG. 4) of the optical isotropic substrate 11, and then the overcoat layer is formed. . Also, before and after this, a circularly polarizing plate 14 is attached to the front surface (the upper surface in FIG. 4) of the optically isotropic substrate 11 via the adhesive layer 13, A first hard coat layer 18 is formed.

(5) Fifth Configuration Example FIG. 5 is a cross-sectional view showing a fifth configuration example of the gas barrier optical film 10.
In this configuration example, as shown in FIG. 5, a second hard coat layer 19 is provided in place of the undercoat layer 15 in the fourth configuration example. In the gas barrier optical film 10 according to the present invention, the present configuration shown in FIG. 5 is preferable.

(5.1) Second hard coat layer 19
As shown in FIG. 5, the gas barrier optical film 10 may further include a second hard coat layer 19 formed between the optical isotropic substrate 11 and the undercoat layer 12. In FIG. 5, the second hard coat layer 19 is formed on the lower surface of the optically isotropic substrate 11 to improve the mechanical strength, abrasion resistance, etc. of the optically isotropic substrate 11, and so on during processing and transportation. It is possible to prevent the anisotropic base material from being damaged. The second hard coat layer 19 may have the same composition as the hard coat of the circularly polarizing plate 14 or a different composition. Moreover, the formation method may be the same or different. The second hard coat layer 19 may be provided with antiglare properties and low reflectivity.

  As with the first hard coat layer 18, the refractive index of the second hard coat layer 19 is preferably −0.13 to +0.07 with respect to the refractive index of the optically isotropic substrate 11. For example, when a cycloolefin polymer (COP) having a refractive index of 1.53 is adopted as the material of the optical isotropic substrate 11, the material of the second hard coat layer 19 is acrylic having a refractive index of 1.40 to 1.60. Based resins.

(5.2) Example of Process Order In the fifth configuration example, the second hard coat layer 19 and the atomic layer deposition film 12 are sequentially formed on the back surface (the lower surface in FIG. 5) of the optically isotropic substrate 11. Subsequently, an overcoat layer may be formed, or the undercoat layer 12 may be provided between the second hard coat layer 19 and the atomic layer deposition film 12. Before and after this, the circularly polarizing plate 14 is attached to the front surface (the upper surface in FIG. 5) of the optically isotropic substrate 11 via the adhesive layer 13.

(6) Effects of the First Embodiment The first embodiment of the present invention has the following effects.
(6.1) The atomic layer deposition film 12 is a thin single layer and has a high barrier property (10 −4 to 10 −6 g / m ² / day). For this reason, the gas barrier layer in the gas barrier optical film can be made thinner (or the number of layers can be reduced), leading to process reduction and cost reduction.

(6.2) The undercoat layer 15 has the effect of increasing the adsorption sites of the precursor that forms the atomic layer deposition film 12. Efficient and dense film formation is possible compared to direct film formation on the hard coat layer. It is preferable to adjust the difference in refractive index with the atomic layer deposition film 12, and in that case, the optical characteristics can be maintained high. However, if the second hard coat layer 19 has sufficient precursor adsorption sites for forming the atomic layer deposition film 12, the undercoat layer 15 may not be provided.

(6.3) By having one atomic layer deposition film 12 as a gas barrier layer, the water vapor transmission rate of the gas barrier optical film 10 can be, for example, 0.01 g / (m ² · day) or less. Thereby, the gas barrier optical film 10 can be used as a protective film for an electronic member such as an organic EL element.

(6.4) By using the atomic layer deposition film 12 as a gas barrier layer, it is not necessary to form a multilayer film so that the water vapor transmission rate of the barrier film is, for example, 0.01 g / (m ² · day) or less. The number of laminated gas barrier optical films can be reduced. Thereby, the process reduction of a gas barrier optical film, cost reduction, and the improvement of a light transmittance can be aimed at.

Second Embodiment
The gas barrier optical film 20 according to the second embodiment of the present invention will be described with a plurality of configuration examples.

(1) First Configuration Example FIG. 6 is a cross-sectional view showing a first configuration example of the gas barrier optical film 20 according to the second embodiment of the present invention. As shown in FIG. 6, the gas barrier optical film 20 includes an optically isotropic substrate 11, an atomic layer deposition film 12 (ALD film), an adhesive layer 13, a circularly polarizing plate 14, and an atomic layer deposition film 12. And an adhesive layer 21 formed on the surface opposite to the surface facing the optical isotropic substrate 11 (the lower surface in FIG. 6). In FIG. 6, the case where the adhesive layer is directly formed on the lower surface of the atomic layer deposition film 12 is illustrated. However, when the organic layer is bonded to the organic EL element, the adhesive layer is interposed on the sealing layer. If the gas barrier optical film can be bonded, an adhesive layer may be formed on the sealing layer side.

(1.1) Adhesive layer 21
The pressure-sensitive adhesive layer 21 may be a pressure-sensitive adhesive sheet or a layer coated with a pressure-sensitive adhesive. Moreover, although the kind of the adhesion layer 21 is not particularly limited, for example, an adhesive or an adhesive sheet described below can be used as the adhesion layer 21.

(1.2) Pressure-sensitive adhesive used as pressure-sensitive adhesive layer 21 The pressure-sensitive adhesive used as pressure-sensitive adhesive layer 21 is a photocurable adhesive resin or a thermosetting adhesive resin made of epoxy resin, acrylic resin, silicone resin, or the like. Cured with isocyanate curing agents to two-component curable adhesive resins, thermoplastic adhesive resins made of acid-modified products such as polyethylene and polypropylene, and main components with hydroxyl groups such as rubber, silicone, acrylic and urethane. The method to make is mentioned. Of these, one obtained by polymerizing and curing one-component or two-component reactive polyurethane resin and trifunctional isocyanate is preferable. The processing is preferably a dry laminating method, and as a coating method, a gravure coater, a dip coater, a reverse coater, a wire bar coater, a die coater or the like can be used.

The pressure-sensitive adhesive used for the pressure-sensitive adhesive layer 21 may contain a hygroscopic agent or a curable hygroscopic agent.
The curable moisture absorbent is a mixture of a moisture absorbent and a curing agent. The content of the hygroscopic agent (compound) in the curable hygroscopic agent is preferably 20% by mass or more and 80% by mass or less, more preferably 25% by mass or more and 60% by mass or less when the total mass is 100% by mass. is there. When the content ratio of the hygroscopic agent is within the above range, the action of capturing moisture can be effectively expressed in the curable hygroscopic agent.

  The hygroscopic agent may contain an organometallic compound having a structural unit represented by the following general formula (i).

-[Al (OR) -O] _n- (i)

  In formula (i), R represents a substituted or unsubstituted alkyl group, aryl group or alkylcarbonyl group. n represents an integer of 2 to 6. Here, a plurality of R may be the same or different, and may have a linear, cyclic or branched chain. Carbon number of R becomes like this. Preferably it is 5-30, More preferably, it is 6-20, Especially preferably, it is 7-18. One of the functions of the compound having the structural unit represented by the general formula (1) is to absorb moisture when an Al—OR bond present in the compound reacts with moisture. By using such a compound, a hygroscopic agent excellent in hygroscopic performance can be obtained.

  As the curing agent, a thermosetting agent or an ultraviolet curing agent can be used. The thermosetting agent contains a curable monomer and an initiator. The curable monomer is not particularly limited as long as it is a compound having translucency and having one or more polymerizable reactive groups in the molecule. Examples of such a polymerizable reactive group include a (meth) acryloyl group, a vinyl group, and a vinyl ether group, and a (meth) acryloyl group is more preferable. As the compound having a (meth) acryloyl group, a polyfunctional (meth) acrylate having two or more (meth) acryloyl groups in the molecule, or a monofunctional (meth) methacrylate having one (meth) acryloyl group in the molecule. ) Acrylates. These monofunctional (meth) acrylates and polyfunctional (meth) acrylates may be used in combination.

  The initiator is not particularly limited as long as it can be decomposed by heating to generate active species capable of polymerizing the curable monomer. The ultraviolet curing agent includes a translucent monomer and a photopolymerization initiator. As the light-transmitting monomer, a monofunctional to trifunctional or higher polyfunctional acrylate (acrylic ester) or a monofunctional to trifunctional or higher polyfunctional methacrylate (methacrylic ester) can be used. In addition, about an acrylate and a methacrylate, only any one may be used and it is also possible to mix and use it suitably. The photopolymerization initiator is preferably colorless and transparent, but may be added in an amount of 1 to 3% by mass, so that even if there is a color, there is no particular problem because the cured product obtained after ultraviolet irradiation becomes transparent.

(1.3) Pressure-sensitive adhesive sheet used as the pressure-sensitive adhesive layer 21 The pressure-sensitive adhesive sheet used as the pressure-sensitive adhesive layer 21 may be either a single layer or a laminated structure. For example, an adhesive sheet having a structure in which a first organic sheet layer, a hygroscopic substance, and a second organic sheet layer are laminated may be used as the adhesive layer 21. Moreover, each of the 1st organic sheet layer and the 2nd organic sheet layer may be formed with the hardened | cured material which has thermosetting or photocurability, or the uncured material which has adhesiveness.

  The thicknesses of the first organic sheet layer and the second organic sheet layer are preferably thicker (larger) than the particle diameter (average particle diameter) of the hygroscopic substance. In other words, each of the values of the film thickness of the first organic sheet layer and the film thickness of the second organic sheet layer is preferably set to a value equal to or greater than the average particle diameter of the hygroscopic substance. If each value of the film thickness of the first organic sheet layer and the film thickness of the second organic sheet layer is a value equal to or larger than the average particle diameter of the hygroscopic substance, the hygroscopic property is produced during the production of the organic EL display described later. The possibility that the substance presses the cathode of the organic EL element can be reduced, and the possibility that a part of the cathode is pushed by the hygroscopic substance to come into contact with the anode (that is, short-circuit) can be reduced.

  Further, the first organic sheet layer and the second organic sheet layer may have the same thickness or different thicknesses. However, when the second organic sheet layer is located closer to the atomic layer deposition layer than the first organic sheet layer, the thickness of the first organic sheet layer is thicker than the thickness of the second organic sheet layer ( That is, it is desirable that the thickness of the first organic sheet layer> the thickness of the second organic sheet layer). This is likely to further reduce the possibility that the hygroscopic substance presses the cathode of the organic EL element.

  As the hygroscopic substance sandwiched between the first organic sheet layer and the second organic sheet layer, a chemical hygroscopic substance or a physical hygroscopic substance can be used. More specifically, the hygroscopic substance may be a hygroscopic substance containing at least one of a chemical hygroscopic substance and a physical hygroscopic substance.

Examples of the chemical hygroscopic substance include diphosphorus pentoxide (P ₂ O ₅ ), calcium oxide (CaO), and barium oxide (BaO). Examples of the physical hygroscopic substance include aluminum oxide (Al ₂ O ₃ ), zeolite (alumina silicate), silica gel, activated alumina, and the like.

  The particle diameter (average particle diameter) of the hygroscopic substance is 0.01 to 1000 μm, preferably 0.1 to 100 μm. Moreover, content of a hygroscopic substance is 1-90 mass%, Preferably it is 15-65 mass%. One or several types of chemical hygroscopic substances can be used. Similarly, one or several physical hygroscopic substances can be used.

It is preferable that the first organic sheet layer and the second organic sheet layer do not transmit water vapor as much as possible, and the water vapor transmission rate is preferably less than 10 g / m ² / day. Even if water vapor enters the first organic sheet layer and the second organic sheet layer, the water vapor is embedded in the first organic sheet layer and the second organic sheet layer. To absorb moisture.

(1.4) An example of a product that can be used as the adhesive layer 21 A product that can be used as the adhesive layer 21 is illustrated below. In addition, the adhesion layer 21 is not limited to the following commercial items.
・ Siden Chemical Co., Ltd. “OC-3405”
・ Mitsui Chemicals Co., Ltd. “XMF-T”
・ Mitsubishi Gas Chemical Co., Ltd. “Maxive”
・ Tesa “61500 ・ 61501”
-Daicel Corporation "CELVENUS"
・ Sekisui Chemical Co., Ltd. “Photorec E”
・ DIC Corporation "PASLIM"

(1.5) Example of order of steps In the first configuration example, the atomic layer deposition film 12 is formed on the back surface (the lower surface in FIG. 6) of the optically isotropic substrate 11, and then the adhesive layer 21 is formed. . Before and after this, the circularly polarizing plate 14 is bonded to the front surface (the upper surface in FIG. 6) of the optically isotropic substrate 11 via the adhesive layer 13.

(2) Second Configuration Example FIG. 7 is a cross-sectional view showing a second configuration example of the gas barrier optical film 20.
As shown in FIG. 7, the gas barrier optical film 20 may further include an undercoat layer 15 made of an inorganic material formed between the optically isotropic substrate 11 and the atomic layer deposition film 12.

  In the second configuration example, the undercoat layer 15 is formed on the back surface (the lower surface in FIG. 7) of the optical isotropic substrate 11, then the atomic layer deposition film 12 is formed, and then the adhesive layer 21 is formed. . Further, before and after this, the circularly polarizing plate 14 is bonded to the front surface (the upper surface in FIG. 7) of the optically isotropic substrate 11 through the adhesive layer 13.

(3) Third Configuration Example FIG. 8 is a cross-sectional view showing a third configuration example of the gas barrier optical film 20.
As shown in FIG. 8, the gas barrier optical film 20 has an overcoat formed on the surface opposite to the surface facing the optically isotropic substrate 11 of the atomic layer deposition film 12 (the lower surface in FIG. 8). A layer 16 may further be provided. Further, the gas barrier film further includes a release film formed so as to be peelable on the surface opposite to the surface facing the optically isotropic substrate 11 of the atomic layer deposition film 12 (the lower surface in FIG. 8). You may prepare. In FIG. 8, the case where the peeling film 17 has covered the surface of the adhesion layer 21 is illustrated.

  In the third configuration example, the atomic layer deposition film 12 is formed on the back surface (the lower surface in FIG. 8) of the optically isotropic substrate 11, then the overcoat layer 16 is formed, and the adhesive layer 21 is further formed. Thereafter, the release film 17 is attached to the adhesive layer 21. Further, before and after this, the circularly polarizing plate 14 is attached to the front surface (the upper surface in FIG. 8) of the optically isotropic substrate 11 through the adhesive layer 13.

(4) Fourth Configuration Example FIG. 9 is a cross-sectional view showing a fourth configuration example of the gas barrier optical film 20.
As shown in FIG. 9, the gas barrier optical film 20 is formed on the first surface formed on the opposite surface (the upper surface in FIG. 9) side of the surface of the circularly polarizing plate 14 facing the optically isotropic substrate 11. A hard coat layer 18 may be further provided. The upper surface of the circularly polarizing plate 14 is protected by the first hard coat layer 18 formed on the upper surface of the circularly polarizing plate 14. The first hard coat layer 18 may have hard coat properties, antiglare properties, low reflectivity, and the like. Although not shown, the gas barrier optical film 20 may further include a release film that covers the upper surface of the first hard coat layer 18.

  In the fourth configuration example, the atomic layer deposition film 12 is formed on the back surface (the lower surface in FIG. 9) of the optical isotropic substrate 11, and the adhesive layer 21 is further formed. Also, before and after this, a circularly polarizing plate 14 is attached to the front surface (the upper surface in FIG. 9) of the optically isotropic substrate 11 via the adhesive layer 13, A first hard coat layer 18 is formed.

(5) Fifth Configuration Example FIG. 10 is a cross-sectional view illustrating a fifth configuration example of the gas barrier optical film 20.
As shown in FIG. 10, the gas barrier optical film 20 may further include a second hard coat layer 19 formed between the optical isotropic substrate 11 and the undercoat layer 15. In FIG. 10, the second hard coat layer 19 is formed on the lower surface of the optical isotropic substrate 11 and improves the mechanical strength, abrasion resistance, and the like of the optical isotropic substrate 11.

  In the fifth configuration example, the second hard coat layer 19 is formed on the back surface (the lower surface in FIG. 10) of the optically isotropic substrate 11, then the undercoat layer 15 is formed, and then the atomic layer deposition film 12 is formed. And the adhesive layer 21 is further formed. Before and after this, the circularly polarizing plate 14 is attached to the front surface (the upper surface in FIG. 10) of the optically isotropic substrate 11 through the adhesive layer 13.

(6) Effects of the Second Embodiment The second embodiment has the same effects as the first embodiment. Moreover, in addition to the effect of 1st Embodiment, there exist the following effects.
(6.1) The pressure-sensitive adhesive layer 21 is already formed on the gas barrier optical film 20. For this reason, it is not necessary for a panel manufacturer or the like to apply an adhesive or attach an adhesive sheet in order to bond the gas barrier optical film 20 to the organic EL element. The pressure-sensitive adhesive layer 21 functions as a protective layer for protecting the atomic layer deposition film 12 until immediately before bonding to the organic EL element (for example, during transportation), and also functions as an adhesive layer when bonding the organic EL element. . Therefore, it is possible to reduce processes in panel manufacturers and the like.

(6.2) When the pressure-sensitive adhesive layer 21 has a barrier property, end face leakage from the side surface side of the organic EL element can be suppressed. For example, the organic EL element is likely to be deteriorated due to the influence of moisture and oxygen in the atmosphere, but the adhesion layer 21 covers the organic EL element, so that entry of moisture from the outside can be blocked.

<Third Embodiment>
The organic EL display 50 according to the third embodiment of the present invention will be described with reference to a plurality of configuration examples.

(1) First Configuration Example FIG. 11 is a cross-sectional view showing a first configuration example of an organic EL display 50 according to the third embodiment of the present invention. As shown in FIG. 11, the organic EL display 50 includes the gas barrier optical film 10 (excluding the release film) described in the first embodiment, the organic EL element 30, the organic EL element 30, and the gas barrier optical. An adhesive layer 21 that bonds the film 10 is provided. Alternatively, the organic EL display 50 may be configured to include the gas barrier optical film 20 described in the second embodiment and the organic EL element 30 attached to the adhesive layer 21 side of the gas barrier optical film 20.

  The organic EL element 30 includes a support substrate 31, an element body 32 formed on one surface of the support substrate 31 (upper surface in FIG. 11), and an element body 32 formed on one surface of the support substrate 31. And a sealing layer 33 that seals. The sealing layer 33 is made of an inorganic film, for example. Although not shown, the element body 32 has a structure in which a TFT element, an anode, an organic EL layer, and a cathode are laminated in this order from the support substrate 31 side.

  As shown in FIG. 11, in the organic EL display 50, the sealing layer 33 of the organic EL element 30 is closer to the surface closer to the optically isotropic substrate 11 than the circularly polarizing plate 14 out of both surfaces of the gas barrier optical film. Is attached. The surface and side surfaces of the sealing layer 33 are covered with the adhesive layer 21.

  Further, as shown in FIG. 11, the organic EL display 50 may further include a cover glass 42 attached to the circularly polarizing plate 14 via the adhesive layer 41, for example, as a part of the gas barrier optical film. . Moreover, although not shown in figure, this organic EL display 50 may further be provided with the touchscreen layer provided in the surface side facing the adhesion layer 41 of the cover glass 42, for example as a part of gas-barrier optical film. Below, the adhesion layer 41, the cover glass 42, and a touch panel layer are demonstrated.

(1.1) Adhesive layer 41
The adhesive layer 41 is provided between the circularly polarizing plate 14 and the cover glass, and has a function of bonding the circularly polarizing plate 14 and the cover glass 42.

  As the adhesive layer 41, a photo-curing adhesive resin, a thermosetting adhesive resin, a two-component curable adhesive resin made of an epoxy resin, an acrylic resin, a silicone resin, or the like, or an acid-modified product such as polyethylene or polypropylene A method of curing a thermoplastic adhesive resin composed of a main component having a hydroxyl group such as rubber, silicone, acrylic and urethane with an isocyanate curing agent is used. Of these, one obtained by polymerizing and curing one-component or two-component reactive polyurethane resin and trifunctional isocyanate is preferable. The processing is preferably a dry laminating method, and as a coating method, a gravure coater, a dip coater, a reverse coater, a wire bar coater, a die coater or the like can be used.

  The adhesive layer 41 may contain a curable hygroscopic agent. In that case, the content of the curable hygroscopic agent in the adhesive layer 41 is preferably 5% by mass or more and 60% by mass or less, more preferably 10% by mass or more and 45% by mass or less, when the total mass is 100% by mass. It is.

  The curable moisture absorbent is a mixture of a moisture absorbent and a curing agent. The content of the hygroscopic agent (compound) in the curable hygroscopic agent is preferably 20% by mass or more and 80% by mass or less, more preferably 25% by mass or more and 60% by mass or less when the total mass is 100% by mass. is there. When the content of the hygroscopic agent is within this range, the action of capturing moisture can be effectively expressed in the curable hygroscopic agent.

(1.2) Cover glass 42
The cover glass 42 is a front plate serving as the outermost surface, and is reinforced with aluminosilicate glass containing at least one kind of alkali metal oxide selected from SiO ₂ , Al ₂ O ₃ , Li ₂ O and Na ₂ O. The processed one is used. Moreover, the cover glass 42 may be comprised with the resin base material.

(1.3) Touch Panel Layer The touch panel sensor has a lead-out wiring, two transparent electrodes for the X direction and Y direction, and an insulating layer between the two transparent electrodes. The touch panel sensor is attached to the cover glass 42 via a transparent pressure-sensitive adhesive sheet (Optical Clear Adhesive; OCA) or the like.
In addition, the arrangement | positioning position of a touchscreen sensor is not limited to the above, You may provide anywhere on the sealing layer 33 (FIGS. 11-13) if it is under a cover glass.

(2) Second Configuration Example FIG. 12 is a cross-sectional view showing a second configuration example of the organic EL display 50.
As shown in FIG. 12, the atomic layer deposition film 12 may be formed between the optically isotropic substrate 11 and the adhesive layer 13 instead of between the optically isotropic substrate 11 and the adhesive layer 21. That is, the atomic layer deposition film 12 may be formed on the front surface instead of the back surface of the optically isotropic substrate 11.

(3) Third Configuration Example FIG. 13 is a cross-sectional view showing a third configuration example of the organic EL display 50.
As shown in FIG. 13, the atomic layer deposition film 12 may be formed between the optical isotropic substrate 11 and the adhesive layer 21 and between the optical isotropic substrate 11 and the adhesive layer 13. That is, the atomic layer deposition film 12 may be formed on both surfaces of the optically isotropic substrate 11.

(4) Effects of the Third Embodiment The third embodiment has the same effects as the first and second embodiments. In addition to the effects of the first and second embodiments, the following effects are achieved.

(4.1) In order to further promote the spread of the organic EL display 50, there is a demand for a reduction in production cost and a reduction in the number of processes. For example, when the sealing layer 33 has a laminated structure, the greater the number of laminated layers, the larger the number of steps, which increases the manufacturing cost. For example, when the sealing layer 33 has a three-layer structure of inorganic layer (SiN) / organic layer / inorganic layer (SiN), it is necessary to form these three layers by the CVD method or the like, and the number of steps is large. However, in each embodiment of the present invention, the atomic layer deposition film 12 having a high gas barrier property even though it is thin is used for the gas barrier optical film covering the sealing layer 33. For this reason, the number of layers of the sealing layer 33 can be reduced, and the number of steps can be reduced. Thereby, the number of steps of the organic EL display 50 can be reduced, and the production cost can be reduced.

(4.2) The organic EL display 50 requires the optically isotropic substrate 11 and the circularly polarizing plate 14. The organic EL display 50 in which these layers are laminated tends to be thick. In contrast, each embodiment of the present invention has the atomic layer deposition film 12 as a gas barrier layer of a gas barrier optical film. For this reason, it is possible to reduce the number of laminated sealing layers while maintaining the gas barrier property of the organic EL display, and it is possible to shorten the passage distance of light emitted from the organic EL element. Therefore, the organic EL display 50 can be thinned and the light transmittance can be improved.

FIG. 14 is a cross-sectional view showing a configuration example of an organic EL display according to Example 1 of the invention.
As shown in FIG. 14, the organic EL display according to Example 1 includes an organic EL element (support substrate 31, element body 32, and sealing layer 33) and a gas barrier optical film (base material 11, atomic layer deposition film 12). , Adhesive layer 13 and circularly polarizing plate 14), and adhesive layer 21 for joining the organic EL element and the gas barrier optical film.

Example 1
A gas barrier optical film of Example 1 was produced according to the above-described “fifth configuration example of the first embodiment”. Specifically, first, a base material 11 (thickness: 50 μm) made of COP having a refractive index of 1.53 was prepared.
Thereafter, the first hard coat layer 18 was formed on one surface of the substrate 11 with a thickness of 1 μm.
Thereafter, a second hard coat layer 19 was formed with a thickness of 1 μm on the other surface of the substrate 11 (opposite the one surface).
Thereafter, an ALD method was used to grow atomic layers one by one on the surface of the second hard coat layer 19 to form an ALD layer 12 having a thickness of 15 nm. The material constituting the ALD layer was AlSiOx.
Thereafter, an overcoat layer 16 was formed on the ALD layer to obtain a gas barrier optical film of Example 1.

(Examples 2 to 5)
Gas barrier optical films of Examples 2 to 5 were produced in the same manner as in Example 1 except that the material of the ALD layer 12 in Example 1 was changed to the material shown in Table 1.

(Comparative Example 1)
A gas barrier optical film of Comparative Example 1 was produced in the same manner as in Example 1 except that the overcoat layer 16, the first hard coat layer 18, and the second hard coat layer 19 were not provided in Example 1.

(Comparative Example 2)
A gas barrier optical film of Comparative Example 2 was produced in the same manner as in Example 1 except that the material of the substrate 11 in Example 1 was changed to PET (polyethylene terephthalate).

(Comparative Example 3)
A gas barrier optical film of Comparative Example 3 was produced in the same manner as in Example 1 except that the material of the ALD layer 12 in Example 1 was changed to “TiOx” as shown in Table 1.

<Evaluation>
[Gas barrier properties]
For the produced gas barrier optical films of Examples 1 to 5 and Comparative Examples 1 to 3, the water vapor permeability [g / (m ² · day)] was evaluated according to JIS-K-7129-1992 as an evaluation of gas barrier properties. Measured and judged. The measurement results are shown in Table 1.

[Visibility]
As evaluation of visibility, the light transmittance and birefringence were evaluated in the following manner for the gas barrier optical films of Examples 1 to 5 and Comparative Examples 1 to 3.
-Light transmittance-
About the gas-barrier optical films of Examples 1 to 5 and Comparative Examples 1 to 3, a 20 mm × 20 mm × 2 mm flat test piece was prepared, and the light transmittance (total light transmittance) was measured and determined according to ASTM D1003. did. The determination results are shown in Table 1.

-Birefringence-
About the gas-barrier optical films of Examples 1 to 5 and Comparative Examples 1 to 3, a 20 mm × 20 mm × 2 mm flat test piece was prepared, and a polarizing microscope (manufactured by Nikon Corporation, trade name: Eclipse E400POL). The birefringence amount (nm) in the thickness direction was determined by measuring the phase difference δ (degree) at a location 10 mm from the gate with a light beam having a wavelength of 546 nm. The determination results are shown in Table 1. The lower limit of the birefringence measurement was 3 nm.

[Flexibility]
Flex resistance was evaluated for the gas barrier optical films of Examples 1 to 5 and Comparative Examples 1 to 3. The determination results are shown in Table 1.

As shown in Table 1, the gas barrier optical films of Examples 1 to 5 were compared with the gas barrier optical films of Comparative Examples 1 to 3, as “gas barrier properties (water vapor permeability)”, “flex resistance”, In addition to “visibility”, “light transmittance” was found to be good.
In addition, even when a simple organic EL display was produced using the gas barrier optical films of Examples 1 to 5 and Comparative Example 1, the organic EL displays of Examples 1 to 5 were changed to the organic EL display of Comparative Example 1. Compared with display quality.
Therefore, according to the present invention, it is possible to provide a gas barrier optical film with improved light transmittance and an organic EL display with improved display quality while maintaining high gas barrier properties and flex resistance.

DESCRIPTION OF SYMBOLS 10 Gas barrier optical film 11 Optical isotropic base material 12 Atomic layer deposition film 13 Adhesive layer 14 Circular polarizing plate 15 Undercoat layer 16 Overcoat layer 17 Release film 18 1st hard coat layer 19 2nd hard coat layer 20 Gas barrier optical film 21 Adhesive layer 30 Organic EL element 31 Support substrate 32 Element main body 33, 330 Sealing layer 41 Adhesive layer 42 Cover glass 50 Organic EL display 331, 333 Inorganic layer 332 Organic layer

Claims (6)

An optically isotropic substrate;
An atomic layer deposition film formed on at least one surface of the optically isotropic substrate,
The gas barrier optical film according to claim 1, wherein a refractive index of the atomic layer deposition film is -0.13 to +0.27 with respect to a refractive index of the optically isotropic substrate. A first hard coat layer formed on the surface opposite to the surface facing the atomic layer deposition film of the optically isotropic substrate;
An undercoat layer made of an inorganic material, or a second hard coat layer, formed between the optically isotropic substrate and the atomic layer deposition film;
The refractive index of the first hard coat layer and the refractive index of the undercoat layer or the second hard coat layer are -0.13 to +0.07 with respect to the refractive index of the optically isotropic substrate. 2. The gas barrier optical film as described in 1. An overcoat layer formed on the surface of the atomic layer deposition film opposite to the surface facing the optically isotropic substrate;
The gas barrier optical film according to claim 1 or 2, wherein the refractive index of the overcoat layer is -0.13 to +0.07 with respect to the refractive index of the optically isotropic substrate.   The gas barrier optical film according to any one of claims 1 to 3, further comprising a release film formed to be peelable on a surface opposite to the surface facing the optically isotropic substrate of the atomic layer deposition film.   The gas barrier according to any one of claims 1 to 4, further comprising a circularly polarizing plate laminated via an adhesive layer on a surface opposite to the surface on which the atomic layer deposition film of the optically isotropic substrate is formed. Optical film. Gas barrier optical film according to any one of claims 1 to 5,
An organic EL element including an element body, a sealing layer, and a support substrate,
An organic EL display which is bonded to the gas barrier optical film via an adhesive layer.

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