JP2017024386A - Glass laminate, and protective material for display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a glass laminate in which warpage thereof or breakage of a glass can be suppressed even when the glass laminate is exposed to high temperature high humidity environment and which is excellent in impact resistance, and to provide a protective material for a display device.SOLUTION: A laminate 10 is provided which comprises a resin layer 11 on one surface of a thin film glass 13 via an adhesive layer 12, and in which reference temperature of the adhesive layer 12 is 20°C, a ratio of a storage elastic modulus G'(1.59 Hz) at a frequency of 1.59 Hz and a storage elastic modulus G'(1.59×10Hz) at a frequency of 1.59×10Hz, (G'(1.59 Hz)/G'(1.59×10Hz)) is 6 or more and G'(1.59×10Hz) is 5.0×10MPa or less, a ratio of adhesive layer 12 thickness and resin layer 11 thickness (adhesive layer thickness/resin layer thickness) is 0.08 to 2 and warpage quantity of the laminate 10 after standing the laminate 10 in a constant temperature and constant humidity tank at a temperature of 60°C and a relative humidity of 95% for 24 hours after standing the laminate in a constant temperature and constant humidity tank at a temperature of 23°C and a relative humidity of 50% for 3 hours is 2.0 mm or less.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a glass laminate, and more specifically, impact resistance, chemical resistance, gas barrier properties, scratch resistance, surface smoothness, transparency and hardness are excellent, such as liquid crystal display devices and touch panels even in harsh environments. The present invention relates to a laminate of a glass layer, an adhesive layer, and a resin layer that can be suitably used as a protective material for electronic devices.

  In recent years, touch panels having a touch input function such as a liquid crystal display device, a smartphone, an electronic book, a tablet PC, and an in-vehicle display have been widely used. A protective material for protecting the device is arranged on the outermost surface side of these electronic devices. In the above-mentioned devices that are often carried around or operated by hand, a protective material that is lightweight and excellent in scratch resistance, impact resistance, and hardness is required.

Glass substrates and plastic substrates are used as protective materials for electronic devices such as liquid crystal display devices and touch panels.
As the glass substrate, tempered glass having higher strength than normal glass is used. Glass substrates are excellent in impact resistance, chemical resistance, gas barrier properties, scratch resistance, surface smoothness, transparency and hardness, but have problems of high specific gravity and heavy weight. When it is made thin, there is a problem that the strength is lowered.
In addition, tempered glass is difficult to cut and drill, and has a problem in processing.
A plastic substrate is lightweight and excellent in workability, transparency, and impact resistance. However, the chemical resistance, gas barrier property, scratch resistance, and hardness are not as good as those of a glass substrate.

  Therefore, recently, a laminated body in which a plastic material is laminated on a thin glass (hereinafter referred to as a thin film glass), is lightweight and excellent in workability, and has improved impact resistance, scratch resistance, chemical resistance, and the like. Proposed.

As a laminated body of thin film glass and plastic material, for example, there is the following disclosure.
Patent Document 1 includes a glass having a thickness of 20Myuemu～200myuemu, on one side of the glass, a specific gravity of ^{0.9g / cm 3 ~1.5g / cm 3} , and flexural modulus of the resin layer of 1000MPa~8000MPa A protective substrate for a display device having an adhesive layer between glass and a resin layer is disclosed.
Patent Document 2 discloses a glass laminate including a layer composed of a glass sheet, a layer composed of a resin layer, and an adhesive layer that adheres the glass sheet and the resin layer. A glass laminate having a spectral transmittance of 90% or more in a wavelength region of 680 nm and an adhesive layer thickness of 50 to 800 μm is disclosed.

JP 2013-37207 A International Publication No. 2014/007313 Pamphlet

  However, according to the studies by the present inventors, the protective substrate for glass and the glass laminate disclosed in Patent Document 1 and Patent Document 2 have different coefficients of thermal expansion and humidity between the glass and the resin layer. In addition, when exposed to high-temperature and high-humidity environments, stress is generated in the glass and resin layers, the substrate is warped, and the glass is damaged by the stress applied to the glass, so it can be used in high-temperature and high-humidity environments. It has been found that there is a possibility that it cannot be used as a protective material for electronic devices such as liquid crystal display devices and touch panels.

  The present invention has been made in view of the above circumstances, and its purpose is to suppress generation of warpage and glass breakage even when exposed to a high-temperature and high-humidity environment, and a glass laminate excellent in impact resistance, and a display It is to provide a protective material for a device.

As a result of intensive studies to solve the above problems, the inventors of the present invention have, on one surface of the thin film glass, a storage elastic modulus G ′ (1 at a reference temperature of 20 ° C., frequencies of 1.59 Hz and 1.59 × 10 ⁻⁴ Hz. .59 Hz) and a storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) through an adhesive layer having a specific range, and a resin layer having a specific relationship with the thickness of the adhesive layer. It was found that the laminate obtained by the above method can suppress warpage and breakage of glass even when exposed to an environment of high temperature and high humidity (for example, a temperature of 60 ° C. and a relative humidity of 95%), and is excellent in impact resistance. Reached.
That is, the present invention is as follows.

[1] A laminate comprising a resin layer on one surface of a thin film glass having a thickness of 10 μm or more and 200 μm or less via an adhesive layer,
Reference temperature 20 ° C. of the adhesive layer, frequency 1.59 Hz and 1.59 × ¹⁰ storage modulus at -4 Hz G '(1.59Hz) and the storage modulus ^{G' (1.59 × 10 -4 Hz} ) Ratio (G ′ (1.59 Hz) / G ′ (1.59 × 10 ⁻⁴ Hz)) is 6 or more,
Storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) is 5.0 × 10 ⁻¹ MPa or less,
The ratio of the adhesive layer thickness to the resin layer thickness (adhesive layer thickness / resin layer thickness) is 0.08 or more and 2 or less,
The amount of warping of the laminate after leaving the laminate in a constant temperature and humidity chamber having a temperature of 60 ° C. and a relative humidity of 95% for 24 hours, and then leaving the laminate in a constant temperature and humidity chamber having a temperature of 23 ° C. and a relative humidity of 50% for 3 hours. A glass laminate having a thickness of 2.0 mm or less.
[2] Storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) and storage elasticity at a reference temperature of 20 ° C., frequencies of 1.59 × 10 ⁻⁴ Hz and 1.59 × 10 ⁻⁷ Hz of the adhesive layer. The ratio of the rate G ′ (1.59 × 10 ⁻⁷ Hz) (G ′ (1.59 × 10 ⁻⁴ Hz) / G ′ (1.59 × 10 ⁻⁷ Hz)) is 20 or less. The glass laminate according to [1].
[3] The storage elastic modulus G ′ (1.59 Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 Hz of the adhesive layer is 8.0 × 10 ⁻² MPa or more [1] or [2] ] The glass laminated body as described in.
[4] The glass laminate according to any one of [1] to [3], wherein the thickness of the laminate is 100 μm or more and 4500 μm or less.
[5] The glass laminate according to any one of [1] to [4], wherein the adhesive layer includes an acrylic curable resin.
[6] The glass laminate according to any one of [1] to [4], wherein the adhesive layer contains a silicone-based curable resin.
[7] A protective material for a display device using the glass laminate according to any one of [1] to [6].
[8] A laminated sheet for protecting a thin film with a release film for forming the glass laminate described in any one of [1] to [6].
[9] A display device using the glass laminate described in any one of [1] to [6].

According to the present invention, storage elastic modulus G ′ (1.59 Hz) and storage elastic modulus G ′ (at a reference temperature of 20 ° C., frequencies of 1.59 Hz and 1.59 × 10 ⁻⁴ Hz are applied to one surface of the thin film glass. 1.59 × 10 ⁻⁴ Hz) is provided with a resin layer whose thickness is in a specific relationship with the thickness of the adhesive layer through the adhesive layer in a specific range. Can suppress warpage and glass breakage even when exposed to high temperature and high humidity (for example, temperature 60 ° C and relative humidity 95%), impact resistance, chemical resistance, gas barrier properties, scratch resistance, surface smoothness, A glass laminate excellent in transparency and surface hardness can be provided, and can be suitably used as a protective material for electronic devices such as liquid crystal display devices and touch panels.

It is a schematic sectional drawing of the glass laminated body by preferable embodiment of this invention. It is a schematic sectional drawing of the touchscreen using the protective material for display apparatuses by preferable embodiment of this invention. These are the schematic diagrams which show a mode that the amount of curvature of the wet heat test of the glass laminated body by embodiment of this invention is measured.

Embodiments of a glass laminate and a protective material for a display device according to the present invention will be described in detail below, but the following description will explain an example (representative example) of an embodiment of the present invention. Is not limited to these contents.
In the present specification, for convenience, the “glass laminate” may be referred to as “the present laminate”.
In the present specification, thin glass, specifically, glass having a thickness of 200 μm or less is referred to as “thin film glass”.

FIG. 1 is a schematic cross-sectional view of a glass laminate according to a preferred embodiment of the present invention. The glass laminate 10 includes a resin layer 11 on one surface of the thin film glass 13 via an adhesive layer 12.
FIG. 2 is a schematic cross-sectional view of a touch panel using a protective material for a display device according to a preferred embodiment of the present invention. The protective material 20 for a display device includes a resin layer 21 on one surface of a thin film glass 23 via an adhesive layer 22, and touch panel sensor unit 25 via optical transparent adhesive layers 24 and 26, The touch panel 28 is formed by being laminated with the liquid crystal display unit 27.
Below, in the glass laminated body of this invention, and the protective material for display apparatuses, a thin film glass, an adhesive layer, a resin layer, and the materials used are demonstrated in detail. These materials and the like are used in the glass laminate manufacturing method described later.

(1) Resin layer The resin layer used in the present invention is a layer attached to one surface of a thin film glass through an adhesive layer, and plays a role of protecting the thin film glass having low strength.

The thickness of the resin layer used in the present invention is preferably 10 μm or more. 50 μm or more is more preferable, 100 μm or more is further preferable, and 150 μm or more is particularly preferable. On the other hand, it is preferable that it is 4000 micrometers or less. 2000 micrometers or less are more preferable, 1000 micrometers or less are more preferable, and 500 micrometers or less are especially preferable.
If the thickness of the resin layer is 10 μm or more, when attached to thin film glass, there is a tendency that the thin film glass having low strength is protected and impact resistance is improved, and the rigidity of the glass laminate can be secured. If the thickness is 4000 μm or less, a glass laminate with a small overall thickness is obtained when pasted on thin film glass, and when used as a protective material for electronic devices such as display devices, the thickness of the entire electronic device is suppressed. There is a tendency to be able to.

The resin layer preferably has a shrinkage ratio of 1.5% or less when held at a temperature of 60 ° C. and a relative humidity of 95% for 120 hours. 1% or less is more preferable, and 0.5% or less is more preferable. On the other hand, the lower limit is not particularly limited, but is usually 0% or more.
If the shrinkage rate when the resin temperature is kept at 60 ° C. and a relative humidity of 95% for 120 hours is 1.5% or less, the warpage of the glass laminate resulting from the resin layer shrinkage under high temperature and high humidity can be suppressed. It tends to be possible.
The shrinkage rate of the resin layer can be measured according to JIS K 7133.

The linear expansion coefficient of the resin layer is preferably 70 ppm / K or less. 50 ppm / K or less is more preferable, and 30 ppm / K or less is more preferable. On the other hand, the lower limit is not particularly limited, but is usually 0.01 ppm / K or more.
If the linear expansion coefficient of the resin layer is 70 ppm / K or less, the adhesive layer can relieve the expansion and contraction difference between the glass and the resin layer due to temperature change, and the warp of the glass laminate tends to be suppressed.
The linear expansion coefficient of the resin layer can be measured in accordance with JIS K 7197.

The humidity expansion coefficient of the resin layer is preferably 20 ppm /% RH or less, and more preferably 15 ppm /% RH or less. On the other hand, the lower limit is not particularly limited, but is usually 0.01 ppm /% RH or more.
If the humidity expansion coefficient of the resin layer is 20 ppm /% RH or less, the adhesive layer can relieve the expansion and contraction difference between the glass and the resin layer due to humidity change, and the warpage of the glass laminate tends to be suppressed.
For example, after the sample is held at a temperature of 60 ° C. and a relative humidity of 0% for 9 hours, the temperature is set to 60 ° C. and a relative humidity of 95%. It can be calculated by measuring the expansion coefficient.

The water absorption rate of the resin layer is preferably 2% or less. 1% or less is more preferable, and 0.5% or less is more preferable. On the other hand, the lower limit is not particularly limited, but is usually 0.01% or more.
If the water absorption rate of the resin layer is 2% or less, humidity expansion of the resin layer under high temperature and high humidity tends to be suppressed.
The water absorption rate of the resin layer can be measured according to JIS K 7209.

Any appropriate resin can be adopted as the material constituting the resin layer as long as the material satisfies the above characteristics and the effects of the present invention are obtained. Examples of the resin include a thermoplastic resin, a cured resin cured by heat or active energy rays, and the like, and a thermoplastic resin is preferable from the viewpoint of impact resistance and workability.
Specific examples of the thermoplastic resin include fluorine resin, polyether sulfone resin, polycarbonate resin, acrylic resin, silicone resin, cycloolefin resin, thermoplastic polyimide resin, polyamide resin, and polyamideimide. Resin, polyarylate resin, polysulfone resin, polyetherimide resin, polyether ether ketone resin, polyether silicon resin, polyethylene terephthalate, polyethylene naphthalate, polyester resin such as polybutylene terephthalate, polyphenylene sulfide Examples thereof include resins.
Of these, polyester resins, cycloolefin resins, acrylic resins, and polycarbonate resins are preferred from the viewpoints of transparency and expansion / contraction characteristics in a high temperature and high humidity environment. Among these, as the resin layer, a polyester film containing a polyester resin as a main component is more preferable, and a polyethylene terephthalate film containing polyethylene terephthalate as a main component is particularly preferable.
In addition, the main component means the component that is most contained among the components that usually form the resin layer. The component that occupies 50% by mass or more in each layer may be the main component, and the component that occupies 80% by mass or more may be the main component. The main component may be 90% by mass or more.
Specific examples of the cured resin cured by the heat or active energy ray include an epoxy resin, a silicone resin, an acrylic resin, a urethane resin, a polyimide resin, and the like, under transparency and high temperature and high humidity environment. From the viewpoint of the expansion and contraction characteristics, acrylic resins are preferred.
These can be used alone or in combination of two or more resins.

As the resin layer, it is also possible to use a resin layer that has been subjected to an annealing treatment for relaxing expansion and contraction under high temperature and high humidity so that the laminate is not warped even when exposed to a high temperature and high humidity environment. .
Prior to laminating the resin layer with the thin film glass, the resin layer is preliminarily annealed to reduce thermal shrinkage of the resin layer under high temperature and high humidity. It tends to be able to suppress warping when exposed to an environment with a humidity of 95%.

  Among them, a biaxially stretched polyester film, particularly a biaxially stretched polyethylene terephthalate film, which has been subjected to an annealing treatment for alleviating thermal shrinkage, is a preferred example of the resin layer.

  In the annealing treatment of the resin layer, it is preferable to heat-treat the resin layer at a temperature of Tg to Tg + 100 ° C. for 0.1 to 180 minutes when the glass transition temperature of the resin layer is Tg.

  A specific method for the annealing treatment is not particularly limited as long as it is a method capable of maintaining a necessary temperature and time. For example, a method of storing in an oven or temperature-controlled room set to the required temperature, a method of blowing hot air, a method of heating with an infrared heater, a method of irradiating light with a lamp, a direct contact with a hot roll or hot plate A method of imparting a light, a method of irradiating with a microwave, or the like can be used. Alternatively, the heat treatment may be performed after cutting the resin layer into a size that can be easily handled, or the heat treatment may be performed while the resin layer is wound and in a roll shape. Furthermore, as long as the required time and temperature can be obtained, a heating device can be incorporated in a part of the resin layer manufacturing apparatus such as a coater or slitter, and heating can be performed in the manufacturing process.

  In the resin layer, in addition to the above-mentioned resins, a silane coupling agent, a sensitizer, a crosslinking agent, an ultraviolet absorber, a polymerization inhibitor, a surfactant, a filler, a mold release, as long as the object of the present invention is not impaired. Agents can optionally be added. In addition, these can be used 1 type or in combination of 2 or more types as appropriate.

  The resin layer may be subjected to a surface treatment as necessary separately from the adhesive layer described later. As the surface treatment, for example, a coupling agent treatment with a silane coupling agent, a titanium coupling agent, etc., a chemical treatment such as an ozone treatment or an ion treatment, a plasma treatment, a glow discharge treatment, an arc discharge treatment, a discharge treatment such as a corona treatment, Various surface treatments such as electromagnetic wave irradiation treatment such as ultraviolet ray treatment, X-ray treatment, gamma ray treatment, and laser treatment can be mentioned. In particular, from the viewpoint of improving the adhesion with the adhesive layer, it is preferable that the surface of the resin layer on the adhesive layer side is subjected to a discharge treatment such as a corona treatment.

(2) Adhesive layer The adhesive layer used in the present invention is a layer for adhering the thin-film glass and the resin layer, and the adhesive layer has a reference temperature of 20 ° C., a frequency of 1.59 Hz and a frequency of 1.59 × 10 ⁻⁴ Hz. Ratio of storage elastic modulus G ′ (1.59 Hz) and storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) (G ′ (1.59 Hz) / G ′ (1.59 × 10 ⁻⁴ Hz)) Is not less than 6, storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) is 5.0 × 10 ⁻¹ MPa or less, and ratio of adhesive layer thickness to resin layer thickness (adhesive layer thickness / resin layer) (Thickness) is 0.08 or more and 2 or less.
When a laminate having glass and a resin layer is exposed to a high-temperature and high-humidity environment, the thermal expansion coefficient and the humidity expansion coefficient of the glass and the resin layer are different. Is large, the resin layer may expand and contract with respect to the glass, and the laminate may be warped.
However, this glass laminated body has the storage elastic modulus G ′ (1.59 Hz) and the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) of the adhesive layer in the above ranges, and the adhesive layer thickness and the resin layer thickness. When the ratio (adhesive layer thickness / resin layer thickness) is within the above range, the glass laminate is exposed to an environment of high temperature and high humidity (for example, a temperature of 60 ° C. and a relative humidity of 95%). Even if the film expands or contracts, the adhesive layer can be deformed following the resin layer, so that the stress generated in the thin film glass and the resin layer can be relieved, the occurrence of warpage can be suppressed, and the impact resistance is excellent.

It is important that the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 × 10 ⁻⁴ Hz in the adhesive layer is 5.0 × 10 ⁻¹ MPa or less. It is. Especially, it is preferable that it is 1.5 * 10 < ^-1 > MPa or less, and it is more preferable that it is 5.0 * 10 ^<-2 > MPa or less.
On the other hand, the lower limit is usually 1.0 × 10 ⁻⁴ MPa or more.
If the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 × 10 ⁻⁴ Hz in the adhesive layer is 5.0 × 10 ⁻¹ MPa or less, this lamination Even when the body is exposed to high temperature and high humidity (for example, temperature 60 ° C. and relative humidity 95%), the adhesive layer can be deformed following the expansion and contraction of the resin layer, so that the occurrence of warpage can be suppressed.
Further, if the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 × 10 ⁻⁴ Hz in the adhesive layer is 1.0 × 10 ⁻⁴ MPa or more, Even when exposed to an environment of high temperature and high humidity (for example, a temperature of 60 ° C. and a relative humidity of 95%), the shape of the adhesive layer can be maintained.

The storage elastic modulus G ′ (1.59 Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 Hz in the adhesive layer is preferably 8.0 × 10 ⁻² MPa or more, and 5.0 × 10 ⁻¹ MPa or more. More preferably, it is 1.0 MPa or more. On the other hand, the upper limit is not particularly limited, but is usually 10 MPa or less.
If the storage elastic modulus G ′ (1.59 Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 Hz in the adhesive layer is 8.0 × 10 ⁻² MPa or more, the adhesive layer is elastic against stress applied in a short time. Thus, a glass laminate having excellent impact resistance can be obtained.

Furthermore, the storage elastic modulus G ′ (1.59 Hz) and the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ ) at a reference temperature of 20 ° C., frequencies of 1.59 Hz and 1.59 × 10 ⁻⁴ Hz in the adhesive layer. It is important that the ratio (G ′ (1.59 Hz) / G ′ (1.59 × 10 ⁻⁴ Hz)) is 6 or more. Especially, it is preferable that it is 7.6 or more, It is more preferable that it is 10 or more, It is further more preferable that it is 50 or more. On the other hand, the upper limit is not particularly limited, but is usually 10,000 or less, preferably 5000 or less.
If the ratio of the storage elastic modulus G ′ (1.59 Hz) and the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) in the adhesive layer is 6 or more, the storage elastic modulus G ′ is low in the low frequency region. In addition, even if this laminate is exposed to an environment of high temperature and high humidity (for example, temperature of 60 ° C. and relative humidity of 95%), the adhesive layer can be deformed following the expansion and contraction of the resin layer. And since the storage elastic modulus G 'is high in the frequency region (for example, 1.59 Hz) which contributes to the response to an impact, this laminated body is also excellent in impact resistance.

It is important that the ratio of the adhesive layer thickness to the resin layer thickness (adhesive layer thickness / resin layer thickness) is 0.08 or more and 2 or less.
The ratio between the adhesive layer thickness and the resin layer thickness is preferably 0.2 or more, more preferably 0.3 or more, particularly preferably 0.4 or more, and 0.5 or more. Is particularly preferred.
On the other hand, it is preferably 1.5 or less, more preferably 1 or less, and particularly preferably 0.8 or less.
If the ratio of the adhesive layer thickness to the resin layer thickness (adhesive layer thickness / resin layer thickness) is 0.08 or more, the adhesive layer thickness is sufficient with respect to the resin layer thickness. (Temperature 60 ° C, relative humidity 95%) The difference in expansion and contraction behavior of the thin film glass and resin layer when exposed to the environment can be deformed to such an extent that it can be sufficiently relaxed by the adhesive layer, and the occurrence of warpage of the laminate is suppressed. Can do. On the other hand, if it is 2 or less, since the resin layer thickness is sufficient with respect to the adhesive layer thickness, the impact resistance and rigidity of the laminate can be ensured.

As described above, the storage elastic modulus G ′ (1.59 Hz) and the storage elastic modulus G ′ (1.59 × 10 6) at a reference temperature of the adhesive layer of 20 ° C., frequencies of 1.59 Hz and 1.59 × 10 ⁻⁴ Hz. ^-4 Hz) (G ′ (1.59 Hz) / G ′ (1.59 × 10 ⁻⁴ Hz)) is 6 or more, and the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) is 5.0 × 10 ⁻¹ MPa or less, and the ratio of the adhesive layer thickness to the resin layer thickness (adhesive layer thickness / resin layer thickness) is 0.08 or more and 2 or less. Even when exposed to an environment (for example, a temperature of 60 ° C. and a relative humidity of 95%), it is possible to suppress the occurrence of warping and breakage of the glass, and to obtain a laminate excellent in impact resistance.

The storage elastic modulus G ′ (1.59 × 10 ⁻⁷ Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 × 10 ⁻⁷ Hz in the adhesive layer is preferably 5.0 × 10 ⁻¹ MPa or less. 1.5 × 10 ⁻¹ MPa or less is more preferable, and 5.0 × 10 ⁻² MPa or less is more preferable. On the other hand, the upper limit is not particularly limited, but is usually 1.0 × 10 ⁻⁴ MPa or more.
If the storage elastic modulus G ′ (1.59 × 10 ⁻⁷ Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 × 10 ⁻⁷ Hz in the adhesive layer is 5.0 × 10 ⁻¹ MPa or less, the temperature is high. Even in a humid environment (for example, a temperature of 60 ° C. and a relative humidity of 95%), the adhesive layer can be deformed following the expansion and contraction of the resin layer, so that the occurrence of warpage can be suppressed.
Moreover, if the storage elastic modulus G ′ (1.59 × 10 ⁻⁷ Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 × 10 ⁻⁷ Hz in the adhesive layer is 1.0 × 10 ⁻⁴ MPa or more, The shape of the adhesive layer can be maintained even in an environment of high temperature and high humidity (for example, a temperature of 60 ° C. and a relative humidity of 95%).

Storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) and storage elastic modulus G ′ () at a reference temperature of 20 ° C. and frequencies of 1.59 × 10 ⁻⁴ Hz and 1.59 × 10 ⁻⁷ Hz in the adhesive layer. the ratio of ^{1.59 × 10 -7 Hz) (G} '(1.59 × 10 -4 Hz) / G' (1.59 × 10 -7 Hz)) is preferably 20 or less. Especially, it is more preferable that it is 10 or less, and it is still more preferable that it is 5.0 or less. On the other hand, the lower limit is not particularly limited, but is usually 1.0 or more.
If the ratio of the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) and the storage elastic modulus G ′ (1.59 × 10 ⁻⁷ Hz) in the adhesive layer is 20 or less, the environment (for example, high temperature and humidity) Since there is no significant difference in the follow-up deformation behavior of the adhesive layer against the expansion and contraction of the resin layer in the room (for example, temperature 60 ° C. relative humidity 95%) and indoors (for example, temperature 23 ° C. relative humidity 50%), There is a tendency that warp generation and glass breakage when taken out indoors can be further suppressed.

Warpage and glass breakage when taken out from a high temperature and high humidity environment (for example, temperature 60 ° C., relative humidity 95%) into the room (for example, temperature 23 ° C., relative humidity 50%) are further suppressed and excellent in impact resistance. From the viewpoint of obtaining a laminate, in this laminate, the storage elastic modulus G ′ (1.59 Hz) and the storage elastic modulus G at a reference temperature of the adhesive layer of 20 ° C., frequencies of 1.59 Hz and 1.59 × 10 ⁻⁴ Hz. 'ratio of ^{(1.59 × 10 -4 Hz) (} G' (1.59Hz) / G '(1.59 × 10 -4 Hz)) is at least 6,
Storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) is 5.0 × 10 ⁻¹ MPa or less,
The ratio of the adhesive layer thickness to the resin layer thickness (adhesive layer thickness / resin layer thickness) is 0.08 or more and 2 or less,
Furthermore, the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) and the storage elastic modulus G ′ at a reference temperature of 20 ° C. and frequencies of 1.59 × 10 ⁻⁴ Hz and 1.59 × 10 ⁻⁷ Hz are used. (1.59 × 10 ⁻⁷ Hz) ratio (G ′ (1.59 × 10 ⁻⁴ Hz) / G ′ (1.59 × 10 ⁻⁷ Hz) is 20 or less,
The storage elastic modulus G ′ (1.59 Hz) of the adhesive layer is particularly preferably 8.0 × 10 ⁻² MPa or more.

The storage elastic modulus G ′ at a reference temperature of 20 ° C., a frequency of 1.59 Hz, a frequency of 1.59 × 10 ⁻⁴ Hz and a frequency of 1.59 × 10 ⁻⁷ Hz in the adhesive layer is determined by a viscoelasticity measuring device such as Rheometrics. Using a viscoelasticity measuring device "Dynamic Analyzer RDAII" manufactured by the manufacturer, measure the storage elastic modulus G while changing the frequency and temperature, and read by creating a temperature-time converted master curve with 20 ° C as the reference temperature. Can do.

  Examples of the method for adjusting the storage elastic modulus G ′ in the adhesive layer include, for example, a method for adjusting the molecular weight and the number of functional groups of monomers and oligomers used as the raw material for the adhesive layer to an appropriate crosslinking density, and a raw material for the adhesive layer. And a method of appropriately adjusting the amount of the crosslinking agent or tackifier added.

The material constituting the adhesive layer is not particularly limited as long as the physical properties described above are satisfied, but an adhesive resin composition containing a curable resin is preferable.
As the curable resin, a curable resin that is cured by moisture curing or heat or active energy ray irradiation is preferable from the viewpoint of durability and heat and moisture resistance, and in particular, curing that is cured by irradiation of active energy rays from the simplicity of the curing treatment. Is preferred.
Specific examples of curable resins that cure by moisture curing or irradiation with heat or active energy rays include epoxy resins, silicone resins, acrylic resins, urethane resins, polyimide resins, and the like. From the viewpoint of easy adjustment of the storage elastic modulus described above, acrylic and silicone resins are preferred.
The adhesive resin composition is a solvent-free system that does not contain a solvent, and it is preferable to form a film by thermally melting (hot-melting) the adhesive resin composition. A hot melt adhesive resin composition suitable for use in the method is not fluid at 25 ° C., but is fluid at temperatures ranging from 50 ° C. to 150 ° C., or from 70 ° C. to 130 ° C.

(Adhesive resin composition containing silicone-based curable resin)
The adhesive resin composition containing the silicone-based curable resin may be a hydrosilylation reaction curable composition, a condensation reaction curable composition, or a combination thereof, and the composition is subjected to addition reaction or condensation reaction after film formation. Thus, an adhesive layer can be obtained.
Among these, a condensation reaction curable composition is preferable because it can be formed into a film by hot-melting, and the condensation reaction curable composition has an average of at least two silicon bonds per molecule of polyorganosiloxane resin. It preferably contains a polyorganosiloxane having a hydrolyzable group and a silane crosslinking agent.
By arbitrarily adjusting the molecular weight of the polyorganosiloxane and the amount of the silane crosslinking agent, the storage elastic modulus after curing of the resin layer can be adjusted.

(Polyorganosiloxane resin)
The polyorganosiloxane resin has a structure represented by the following formula.
(R ⁴ SiO _3/2 ) _n (R ⁴ ₂ SiO _2/2 ) ₀ (R ⁴ ₃ SiO _1/2 ) _p (SiO _4/2 ) _q (X ′) _r
Each R ⁴ represents a substituted or unsubstituted monovalent hydrocarbon group as described above, and X ′ is a hydrolyzable group or an organic group having terminal aliphatic unsaturation such as an alkenyl group. Suitable hydrolyzable groups as X ′ are hydroxy groups, for example alkoxy groups such as methoxy, ethoxy and the like, alkenyloxy groups such as isopropenyloxy, ketoximo groups such as methylethylketoximo, carboxy groups such as acetoxy, eg acetamidoxy And amidoxy groups such as N, N-dimethylaminoxy and the like. The subscript o is 0 or a positive number, the subscript p is 0 or a positive number, the subscript q is 0 or a positive number, and the subscript r is greater than or equal to 0, or at least 2. is there. The number (p + q) is 1 or more, and the number (n + o) is 1 or more.

Polyorganosiloxane resins are suitable for liquid organic solvents such as liquid hydrocarbons exemplified by benzene, toluene, xylene, heptane, etc., and liquid organosilicon compounds such as low viscosity, cyclic and linear polydiorganosiloxanes. It is melted. The polyorganosiloxane resin has R ⁴ ₃ SiO _1/2 and SiO _4/2 units (molar ratios in the range of 0.5 / 1 to 1.5 / 1, or 0.6 / 1 to 0.9 / 1). In). These molar ratios are conveniently measured by Si ²⁹ nuclear magnetic resonance (nmr) spectroscopy.

The number average molecular weight M _n for achieving the desired flow properties of the polyorganosiloxane resin is at least one of the molecular weight of the polyorganosiloxane resin present in this component and the type of hydrocarbon group represented by R ^4. Dependent. As used herein, M _n represents the molecular weight measured using gel permeation chromatography (with the peak representing neopentamer removed from the measurement). The _Mn of the polyorganosiloxane resin is greater than 3,000, or _Mn is between 4500 and 7500.

  The polyorganosiloxane resin can be produced by any suitable method. Such resins can be prepared by co-hydrolysis of the corresponding silane or by silica hydrosol capping methods known in the art. See, for example, Doubt et al U.S. Pat. No. 2,676,182; Rivers-Farrell et al U.S. Pat. No. 4,611,042; and Butler U.S. Pat. No. 4,774,310. A hydrosol capping method can be used.

The intermediates used to make the resin include the formula R ⁴ ₃ SiX ″, a triorganosilane of the formula (where X ″ represents a hydrolyzable group), and four hydrolyzable groups such as halogen, It can be either a silane having an alkoxy or hydroxy or an alkali metal silicate.

The silicon-bonded hydroxy group (eg, HOR ⁴ ₂ SiO _1/2 or HOSiO _3/2 group) in the polyorganosiloxane resin is preferably 0.7% or less, or 0.3% or less of the weight of the resin. Silicon-bonded hydroxy groups formed during the production of the resin can be converted to trihydrocarbylsiloxy groups or hydrolyzable groups by reacting the resin with a silane, disiloxane or disilazane having appropriate end groups. Silanes having hydrolyzable groups are usually added in excess of the amount required to react with the silicon-bonded hydroxy groups of the resin.

  One type of polyorganosiloxane resin or a combination of two or more types of polyorganosiloxane resins that differ in at least one of the following characteristics may be used. When the adhesive resin composition is 100 parts by mass, the polyorganosiloxane resin is usually 55 to 75 parts by mass.

(Polyorganosiloxane having silicon-bonded hydrolyzable groups)
The polyorganosiloxane is composed of bifunctional units of the formula R ⁵ R ⁶ SiO and terminal or branched units of the formula R ⁷ ₃ X ³ _3-S SiG-. Wherein R ⁵ is an alkoxy group or a monovalent unsubstituted or substituted hydrocarbon group such as an alkyl group or an alkenyl group, R ⁶ is an unsubstituted or substituted monovalent hydrocarbon group, and R ⁷ is an aminoalkyl Or R ⁴ , X ³ is a hydrolyzable group, G is a divalent group connecting the silicon atom of the terminal unit and another silicon atom, and the subscript s is 0 or 1) . The polyorganosiloxane can optionally contain up to about 20% trifunctional units of the formula R ⁶ SiO _3/2 , where R ⁶ is as previously described. At least 50%, alternatively at least 80% of the groups represented by R ⁵ and R ⁶ in the R ⁵ R ⁵ SiO unit may be alkyl groups of 1 to 6 carbon atoms, such as methyl.

The terminal unit of the polyorganosiloxane is represented by the formula R ⁷ ₃ X ³ _3-S SiG- (wherein X ³ , R ⁷ , G, and the subscript s are as described above).
Examples of the hydrolyzable group represented by X ³ include, but are not limited to, alkoxy such as hydroxy, methoxy and ethoxy, alkenyloxy groups such as isopropenyloxy, ketoximo groups such as methylethylketoximo, carboxy groups such as acetoxy, acetamide And an amidoxy group such as xy and an aminoxy group such as N, N-dimethylaminoxy.

When s is 0 at the end group, the group represented by X ³ can be alkoxy, ketoximo, alkenyloxy, carboxy, aminooxy, or amidoxy. If s is 1, X ³ can be alkoxy and R ⁷ can be an alkyl such as methyl or ethyl, or an aminoalkyl such as aminopropyl or 3- (2-aminoethylamino) propyl. The amino part of the aminoalkyl group is primary, secondary or tertiary.

In the formula of the terminal unit, G is a divalent group or a hydrolytically stable atom. Hydrolytically stable is not hydrolyzable and is not hydrolysable in the polyorganosiloxane so that the terminal units are not removed during curing of the composition and the curing reaction is not adversely affected. It means to be linked to a silicon atom. Hydrolytically stable linkages represented by G include, but are not limited to, hydrogens containing one or more heteroatoms selected from oxygen atoms, hydrocarbylene groups such as alkylene and phenylene, oxygen, nitrogen and sulfur. Carbylene, as well as combinations of these linking groups. G is a silalkylene linking group such as — (OSiMe ₂ ) CH ₂ CH ₂ —, — (CH ₂ CH ₂ SiMe ₂ ) (OSiMe ₂ ) CH ₂ CH ₂ —, — (CH ₂ CH ₂ SiMe ₂ ) O—, _{- (CH 2 CH 2 SiMe 2} ) (OSiMe 2) O -, - (CH 2 CH 2 SiMe 2) CH 2 CH 2 -, and _-CH 2 CH ₂ -, and the like, and siloxane linking group, e.g. - (OSiMe ₂ ) Represents O- and the like.

Specific examples of preferred terminal units include, but are not limited to, (MeO) ₃ SiCH ₂ CH ₂ —, (MeO) ₃ SiO—, Me (MeO) ₂ SiO—, H ₂ NCH ₂ CH ₂ N (H) ( _{CH 2) 3 SiO -, (} EtO) 3 SiO -, (MeO) 2 SiCH 2 CH 2 Si (Me 2) OSi (Me 2) CH 2 CH 2 -, (MeO) 3 SiCH 2 CH 2 Si (Me 2 ) OSi (Me ₂ ) CHCH ₃ —, Me ₂ NOSiO—, MeC (O) N (H) SiO— and CH ₂ ═C (CH ₃ ) OSiO—. In these formulas, Me represents methyl and Et represents ethyl.

When X ₃ has an alkoxy group, the X ₃ group is preferably separated from the nearest siloxane unit by an alkylene group such as ethylene. In this case, R ⁷ ₃ X ³ _3-S SiG- may be (MeO) ₃ SiCH ₂ CH ₂ Si (Me ₂ ) O-. Methods for converting hydroxy groups to trialkoxysilylalkyl groups are known in the art. For example, a moisture reactive group having the formula (MeO) ₃ SiO— and Me (MeO) ₂ SiO— can be converted to a silanol-terminated polyorganosiloxane by a compound having the formula (MeO) ₄ Si and Me (MeO) ₃ Si, respectively. Can be introduced. Alternatively, each of the compounds having the formula (MeO) ₃ SiH and Me (MeO) ₂ SiH has a polyorganosiloxane containing a silanol group or an aliphatic unsaturated organic group such as an alkenyl group (eg, vinyl), and for example It can be used when including a hydrosilylation reaction catalyst. It will be appreciated that other hydrolyzable groups such as dialkylketoximo, alkenyloxy and carboxy can replace the alkoxy group.

The viscosity of the polyorganosiloxane can be between 0.02 Pa · s and 100 Pa · s at 25 ° C., or between 0.35 Pa · s and 60 Pa · s.
The polyorganosiloxane having silicon-bonded hydrolyzable groups can be a combination of one polyorganosiloxane or two or more polyorganosiloxanes that differ in at least one of the following characteristics.
When the adhesive resin composition is 100 parts by mass, the polyorganosiloxane having a silicon bond hydrolyzable group is usually 25 to 45 parts by mass.

(Silane crosslinking agent)
The silane crosslinker is represented by the formula R ⁴ _t SiZ _(4-t) , where R ⁴ is as previously described, and Z is at least poly under ambient conditions to form a cured material. A hydrolyzable group which reacts with the end group of the organosiloxane and t is 0, 1 or 2). Suitable hydrolyzable groups represented by Z include, but are not limited to, alkoxy having 1 to 4 carbon atoms, carboxy such as acetoxy, ketoximo such as methylethylketoximo, and aminoxy. When t is 2 for the silane crosslinker, the polyorganosiloxane may contain ³ X ³ groups (ie, s is 0).

  Suitable silane crosslinkers include, but are not limited to, methyltrimethoxysilane, isobutyltrimethoxysilane, methyltris (methylethylketoximo) silane, methyltriethoxysilane, isobutyltriethoxysilane, methyltriacetoxysilane, and, for example, ethyl orthosilicate Orthosilicates such as

The silane crosslinking agent used is usually not contained or added to 0.5 to 15% based on the total content of the polyorganosiloxane resin and the polyorganosiloxane having a silicon-bonded hydrolyzable group.
When the crosslinking agent is added at 15% or less, the adhesive resin composition tends to be able to suppress a decrease in strength before curing and a curing rate. If the silane crosslinker is volatile, it is necessary to use an excess during processing to reach 0.5-15% in the final adhesive resin composition.

(Other additives)
The adhesive resin composition containing the silicone curable resin may optionally further contain one or more additional components. Additional components are exemplified by reaction catalysts, adhesion promoters, fillers, polyorganosiloxane waxes, other resins, or combinations thereof.

(Adhesive composition containing acrylic curable resin)
The adhesive resin composition containing an acrylic curable resin is a (meth) acrylic acid ester-based polymer (including a copolymer, hereinafter referred to as “acrylic acid ester” from the viewpoints of tackiness, transparency, and weather resistance. It is preferable to use a "base (co) polymer") as the base resin.

  As the base resin, an acrylic ester-based (co) polymer is prepared by appropriately selecting the type, composition ratio, polymerization conditions, and the like of (meth) acrylic monomer and other monomers used for polymerizing the glass. It can be prepared by appropriately adjusting physical properties such as transition temperature (Tg) and molecular weight. The acrylate copolymer is preferably a graft copolymer using a macromonomer or an acrylate random copolymer.

Also, among acrylic ester (co) polymers, graft copolymers using macromonomers and acrylic ester random copolymers, and among them, the glass transition temperature of each monomer component constituting the copolymer ( Tg), that is, for each monomer component constituting the acrylic ester random copolymer, a macromonomer containing two types of monomers having a large difference in glass transition temperature (Tg) of polymers polymerized by only a single monomer. It is preferable to use the graft copolymer or acrylic ester random copolymer used.
In this case, the difference between the glass transition temperatures (Tg) of the two types of monomer components is preferably 25 to 300 ° C., particularly 40 ° C. or more and 200 ° C. or less, particularly 60 ° C. or more or 180 ° C. or less, and further 100 It is even more preferable that the temperature is not lower than 180 ° C or not higher than 180 ° C.
Specifically, the glass transition temperature (Tg) of one monomer component is −100 to 0 ° C., particularly −80 to −20 ° C., and the glass transition temperature (Tg) of the other monomer component is 0 to 250 ° C. In particular, the temperature is preferably 20 to 180 ° C, and particularly preferably 30 to 120 ° C. In this case, the Tg of the monomer component refers to the glass transition temperature of a polymer obtained by copolymerizing only the monomer component.

Examples of the (meth) acrylic acid ester monomer which is an acrylic ester random copolymer component include 2-ethylhexyl acrylate, n-octyl acrylate, isooctyl acrylate, n-butyl acrylate, ethyl acrylate, methyl methacrylate, methyl acrylate, and the like. Mention may be made of (meth) acrylic acid ester monomers. These include hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, acrylic acid, methacrylic acid, glycidyl acrylate, acrylamide, N, N-dimethylacrylamide, acrylonitrile, methacrylate having hydrophilic groups and organic functional groups. Ronitrile and the like can also be used.
Also, various vinyl monomers such as vinyl acetate, alkyl vinyl ether, and hydroxyalkyl vinyl ether that can be copolymerized with the acrylic monomer and methacryl monomer can be used.
In order to obtain the above-mentioned adhesive layer exhibiting the storage elastic modulus, it is preferable to contain (meth) acrylic acid ester monomer and (meth) acrylic acid as an acrylic ester random copolymer component, and additionally contain vinyl monomer. More preferably.

(Crosslinking agent)
The adhesive composition containing an acrylic curable resin preferably contains a cross-linking agent.
After bonding the thin film glass and the resin layer through the adhesive layer, the adhesive layer tends to exhibit a high cohesive force in a high temperature environment by crosslinking the crosslinking agent.

  As the crosslinking agent, for example, an epoxy crosslinking agent, an isocyanate crosslinking agent, an oxetane compound, a silane compound, an acrylic compound, or the like can be appropriately selected. Especially, the polyfunctional (meth) acrylate which has 3 or more of (meth) acryloyl groups is preferable at the point of the reactivity or the intensity | strength of the hardened | cured material obtained.

Examples of such polyfunctional (meth) acrylates include 1,4-butanediol di (meth) acrylate, glycerin di (meth) acrylate, glycerin glycidyl ether di (meth) acrylate, and 1,6-hexanediol di (meth) acrylate. ) Acrylate, 1,9-nonanediol di (meth) acrylate, tricyclodecane dimethanol di (meth) acrylate, bisphenol A polyethoxydi (meth) acrylate, bisphenol A polypropoxy di (meth) acrylate, bisphenol F polyethoxydi (meth) Acrylate, ethylene glycol di (meth) acrylate, trimethylolpropane trioxyethyl (meth) acrylate, ε-caprolactone modified tris (2-hydroxyethyl) isocyanurate tri (meth) Acrylate, pentaerythritol tri (meth) acrylate, propoxylated pentaerythritol tri (meth) acrylate, ethoxylated pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, propoxylated pentaerythritol tetra (meth) acrylate, ethoxylated Pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, polyethylene glycol di (meth) acrylate, tris (acryloxyethyl) isocyanurate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate , Dipentaerythritol penta (meth) acrylate, tripentaerythritol hexa (meth) Acrylate, tripentaerythritol penta (meth) acrylate, hydroxybivalic acid neopentyl glycol di (meth) acrylate, di (meth) acrylate of ε-caprolactone adduct of hydroxybivalic acid neopentyl glycol, trimethylolpropane tri (meta ) Acrylates, trimethylolpropane polyethoxytri (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate and other UV curable polyfunctional monomers, as well as polyester (meth) acrylate, epoxy (meth) acrylate, urethane (meta And polyfunctional acrylic oligomers such as acrylate and polyether (meth) acrylate.

(Photopolymerization initiator)
When the photopolymerization initiator includes a polymerization reaction of the above-mentioned (meth) acrylic acid ester-based polymer or a crosslinking agent, the photopolymerization initiator functions as a reaction initiation aid in the crosslinking reaction. As the photopolymerization initiator, those currently known can be used as appropriate. Among these, a photopolymerization initiator that is sensitive to ultraviolet rays having a wavelength of 380 nm or less is preferable from the viewpoint of easy control of the crosslinking reaction.

(Other additives)
In addition to the base resin, the crosslinking agent, and the photopolymerization initiator, the adhesive composition containing the acrylic curable resin includes a tackifier resin, an antioxidant, a light stabilizer, a metal deactivator, an anti-aging agent, Various additives such as a hygroscopic agent can be appropriately contained.
Moreover, you may contain reaction catalyst (A tertiary amine type compound, a quaternary ammonium type compound, a lauric acid tin compound, etc.) suitably as needed.

The adhesive layer may have a configuration in which a plurality of layers such as a layer on the thin film glass side / a layer on the resin layer side and a plurality of layers such as an outer layer / middle layer / outer layer are laminated as long as the above-described physical properties are satisfied.
For example, when the adhesive layer has a laminated structure including an outer layer / intermediate layer / outer layer, the outer layer preferably has both warp reduction and impact resistance. Examples of the material for the outer layer include the adhesive resin composition described above. Specifically, as the base resin, an adhesive resin composition containing a (meth) acrylic acid ester monomer and an acrylic acid ester random copolymer containing (meth) acrylic acid as a copolymer component is preferable. An adhesive resin composition based on an acrylic acid ester random copolymer containing a vinyl monomer as a copolymer component in addition to the (meth) acrylic acid ester monomer and (meth) acrylic acid is more preferred.
When the laminate is used as a protective material for a display device, the middle layer does not contribute to adhesion to the display device component, and therefore does not impair the transparency and does not impair the curing reaction of the outer layer. In addition, it is preferable that the adhesiveness with the outer layer can be ensured, and the cut property and the handle property are improved. Examples of the material for the middle layer include the adhesive resin composition described above. Specifically, an adhesive resin composition having an acrylic ester random copolymer as a base resin as in the case of the outer layer is preferable, and a cross-linking agent is further preferably included in order to improve cutability and handling properties.

The thickness of the adhesive layer used in the present invention is preferably 20 μm or more. 50 μm or more is more preferable, and 100 μm or more is more preferable. On the other hand, it is preferably 500 μm or less, more preferably 400 μm or less, and even more preferably 300 μm or less.
If the thickness of the adhesive layer is 20 μm or more, it tends to be able to relax the expansion / contraction difference between the thin film glass and the resin layer when pasted to the thin film glass, and if the thickness is 500 μm or less, it is pasted to the thin film glass. When worn, a glass laminate having a thin overall thickness is obtained, and when used as a protective material for an electronic device such as a display device, the thickness of the entire electronic device tends to be suppressed.

(3) Thin film glass As long as the thin film glass used in the present invention has a thickness of 10 μm or more and 200 μm or less, any appropriate glass can be adopted.

  The thickness of the thin film glass is important to be 10 μm or more, preferably 30 μm or more, and more preferably 50 μm or more. On the other hand, it is important that it is 200 μm or less, preferably 150 μm or less, more preferably 100 μm or less. By setting the thickness to 10 μm or more, extreme reduction in mechanical strength can be prevented. On the other hand, by setting the thickness to 200 μm or less, it is possible to obtain a thin film glass excellent in handling properties without deteriorating the production efficiency of a single glass.

The material of the thin film glass is not particularly limited. For example, almost all glass compositions such as soda lime glass, borosilicate glass, and alkali-free glass can be applied, and those subjected to secondary processing such as tempering and surface treatment are also applicable. These can be used properly depending on the application. As secondary processing, for example, coupling agent treatment with a silane coupling agent, titanium coupling agent, etc., chemical treatment such as acid treatment, alkali treatment, ozone treatment, ion treatment, plasma treatment, glow discharge treatment, arc discharge treatment, Various surface treatments such as discharge treatment such as corona treatment, ultraviolet ray treatment, X-ray treatment, gamma ray treatment, electromagnetic wave irradiation treatment such as laser treatment, and other surface treatment such as flame treatment can be given. In particular, the surface treatment with a silane coupling agent is preferable from the viewpoint of improving the adhesion with the adhesive layer.
As a specific example of the thin film glass marketed, the product name “OA-10G” of Nippon Electric Glass Co., Ltd., which is an alkali-free glass, can be mentioned.

(4) Glass Laminate The glass laminate of the present invention has a configuration in which a resin layer is provided on one surface of a thin film glass with an adhesive layer interposed therebetween. The storage elastic modulus G ′ (1.59 Hz) and the storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) at 59 Hz and 1.59 × 10 ⁻⁴ Hz are in a specific range, and the resin layer Since the thickness ratio of the adhesive layer is in a specific range, it is possible to suppress warpage even when exposed to high-temperature and high-humidity environments (for example, a temperature of 60 ° C. and a relative humidity of 95%), and is excellent in impact resistance. And

It is important that the glass laminate of the present invention can suppress the occurrence of warp even when exposed to an environment of high temperature and high humidity (for example, a temperature of 60 ° C. and a relative humidity of 95%). The amount of warping after being allowed to stand for 24 hours in a constant temperature and humidity chamber at a temperature of 60 ° C. and a relative humidity of 95% is 2.0 mm or less after being left in a constant temperature and humidity chamber at a temperature of 23 ° C. and a relative humidity of 50% for 3 hours. is important. Preferably it is 1.0 mm or less, More preferably, it is 0.5 mm or less. On the other hand, the lower limit is not particularly limited, but is 0.0 mm or more.
In this laminate, after being left for 24 hours in a constant temperature and humidity chamber having a temperature of 60 ° C. and a relative humidity of 95%, the amount of warping after being left for 3 hours in a constant temperature and humidity chamber having a temperature of 23 ° C. and a relative humidity of 50% is 2. If it is 0 mm or less, it can be used for applications that may be exposed to high-temperature and high-humidity environments. For example, when used as a protective material for a display device such as a liquid crystal display device or a touch panel, the display device is Even when exposed to an environment of humidity (for example, a temperature of 60 ° C. and a relative humidity of 95%), there is a low possibility that peeling or bubbles occur between the protective material and other members, or the device itself is deformed. Therefore, this laminated body can be used suitably as a protective material for display devices.

The thickness of the glass laminate of the present invention is preferably 100 μm or more, more preferably 200 μm or more, still more preferably 250 μm or more, and particularly preferably 300 μm or more. On the other hand, it is preferably 4500 μm or less, more preferably 3000 μm or less, further preferably 1500 μm or less, and particularly preferably 1000 μm or less.
If the thickness of the glass laminate of the present invention is 100 μm or more, there is a tendency that the physical properties necessary as a protective material for electronic devices such as a display device and the like can be secured, and if it is 4500 μm or less, the display device or the like. When used as a protective material for electronic devices, the total thickness of the electronic device tends to be suppressed.

The total light transmittance of the glass laminate of the present invention is preferably 80% or more, more preferably 85% or more, and particularly preferably 90% or more. The haze value is preferably 2% or less, particularly preferably 1% or less. By having such optical characteristics, for example, the laminate can be suitably used as a protective material for a display device such as a liquid crystal display device or a touch panel.
In addition, a total light transmittance and a haze value can be measured by the method based on JISK7361, for example. At this time, for example, a transmittance meter (“HR-100” manufactured by Murakami Color Research Laboratory) can be used.

In the glass laminate of the present invention, the surface hardness (pencil hardness) of the thin film glass side surface is preferably 6H or more, more preferably 8H or more.
If it is 6H or more, it can be suitably used as a protective material for a display device or the like.
Examples of the method for adjusting the surface hardness (pencil hardness) include a method for adjusting the thickness of the thin film glass and a method for adjusting the storage elastic modulus of the adhesive layer.
In addition, surface hardness (pencil hardness) can be measured by the method based on JISK-5600-5-4, for example. At this time, for example, an electric pencil scratch hardness tester (“533-M” manufactured by Yasuda Seiki Seisakusho) can be used.

The apparent bending elastic modulus of the glass laminate of the present invention is preferably 500 MPa or more, more preferably 1000 MPa or more, still more preferably 1500 MPa or more, and particularly preferably 2000 MPa or more. On the other hand, it is preferably 10,000 MPa or less, more preferably 9000 MPa or less, further preferably 8000 MPa or less, and particularly preferably 6000 MPa or less.
If the apparent elastic modulus of the laminate is 500 MPa or more, the impact resistance is high, and the thin-film glass tends not to be damaged even when an impact is applied.
If the apparent elastic modulus of the laminate is 10000 MPa or less, for example, when the laminate is used as a protective material for a touch panel as shown in FIG. 3, it is in an environment of high temperature and high humidity (for example, a temperature of 60 ° C. and a relative humidity of 95%). Even if stress is generated in a direction in which the present laminate is warped by being exposed to, peeling between the touch panel sensor portion and the protective material tends to be suppressed.

As a method of adjusting the apparent bending elastic modulus of the glass laminate, a method of adjusting the thickness of each layer, a molecular weight of monomers and oligomers as raw materials for the adhesive layer, and an appropriate crosslinking density are selected by appropriately selecting the number of functional groups. In addition, the method etc. are mentioned In addition, the apparent bending elastic modulus of a glass laminated body can be measured based on JISK7074. Specifically, using an all-purpose test apparatus, a 100 mm square test piece is used, and a three-point bending measurement is performed with an inter-test distance of 50 mm, and an apparent bending elastic modulus can be calculated.

(5) Manufacturing method of glass laminated body The manufacturing method of the glass laminated body of this invention is not specifically limited. For example, a method of applying and forming an adhesive resin composition using a resin layer as a coating substrate, and sticking it to a thin film glass; a method of applying and forming an adhesive resin composition using a thin film glass as a coating substrate; And a method of laminating while sandwiching the adhesive resin composition from both sides between the resin layer and the thin film glass.
In addition, once a laminated sheet having a structure having an adhesive layer between the resin layer and the release film (hereinafter, also referred to as a laminated sheet for protecting a thin film with a release film) is peeled off, the release film is peeled off, A glass laminate can also be produced by sticking the adhesive layer surface to thin film glass.
Furthermore, in the case of using an adhesive layer composed of a plurality of layers, after preparing a laminated sheet in which each layer constituting the adhesive layer is sandwiched between the release films from both sides, the release film is peeled off to constitute the adhesive layer. A glass laminate can also be produced by laminating each layer to produce an adhesive layer, and finally laminating the adhesive layer between both sides with a resin layer and thin film glass.
In addition, when the adhesive layer requires a curing treatment, it may be subjected to a curing treatment as necessary, and after the resin layer, the adhesion layer and the thin film glass are bonded together, the purpose is to improve transparency by removing bubbles. Further, an autoclave treatment may be performed.

  The release film described above may be a known release film or the like, for example, a release treatment with a known release agent such as a silicone-based, long-chain alkyl-based, fluorine-based, aliphatic amide-based, silica-based, etc. Examples thereof include plastic films such as polyethylene terephthalate film, polyester film, polyvinyl chloride film, polycarbonate film, and polyimide film.

(6) Use of glass laminate The glass laminate of the present invention has various uses such as buildings, windows, frames, display cases, and covers for electronic devices as protective materials, but in particular electronic devices such as liquid crystals. It can be suitably used as a protective material for a display device such as a display device or a touch panel.
For example, as shown in FIG. 2, when the laminate is used as a protective material and disposed on the outermost surface of the display device, the laminate is excellent in impact resistance and surface hardness. Even if an impact is applied from the laminated body side, the surface of the display device is hardly damaged and is not easily damaged. Further, even when exposed to a high-temperature and high-humidity environment of, for example, a temperature of 60 ° C. and a relative humidity of 95%, the laminate is less likely to warp, that is, the stress generated in the thin film glass or the resin layer is small. Peeling between the layer 21 and the optical transparent pressure-sensitive adhesive layer 24 or between the optical transparent pressure-sensitive adhesive layer 24 and the touch panel sensor unit 25 and generation of bubbles due to this can be suppressed. Can be used.

  There is no restriction | limiting in particular as an electronic device which can apply this laminated body, The glass laminated body of this invention can be used as a protective material in various things. Examples of the electronic device include a display device such as a liquid crystal display device or a touch panel. Details of the liquid crystal display device are described in, for example, International Publication No. 2013/175717, International Publication No. 2013/0275548, International Publication No. 2010/125703, International Publication No. 2011/108437, The description is incorporated herein by reference. Details of the touch panel are described in, for example, JP-T-2011-511357, JP-A-2010-164938, JP-A-2008-310550, JP-T-2003-511799, and JP-T-2010-541109. The description of which is incorporated herein by reference.

(Explanation of terms)
In general, "film" refers to a thin flat product that is extremely small compared to its length and width and whose maximum thickness is arbitrarily limited, and is usually supplied in the form of a roll (Japan) (Industrial standard JIS K-6900), “sheet” generally refers to a product that is thin by definition in JIS and generally has a thickness that is small instead of length and width. However, since the boundary between the sheet and the film is not clear and it is not necessary to distinguish the two in terms of the present invention, in the present invention, even when the term “film” is used, the term “sheet” is included and the term “sheet” is used. In some cases, “film” is included.

  EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to the aspect described in a following example.

(Evaluation)
The glass laminates obtained in the examples and comparative examples were evaluated by the following methods. The results are shown in Table 1.
In addition, all evaluation was implemented using the glass laminated body after performing the hardening process of an contact bonding layer.
Moreover, about the adhesive layer used for the Example and the comparative example, it sandwiched and laminated | stacked from the both sides with the polyethylene terephthalate film which peel-processed the adhesive resin composition, and it shape | molded in the sheet form, Then, a hardening process was performed and a release film Was peeled off to obtain a single adhesive layer. The obtained adhesive layer single layer was evaluated by the following methods.

(1) Frequency dependence of the storage elastic modulus G ′ of the adhesive layer The storage elastic modulus at each temperature in the adhesive layer is measured under the following conditions using a viscoelasticity measuring device “Dynamic Analyzer RDAII” manufactured by Rheometrics. did.
Measurement condition:
Temperature: 0 ° C, 10 ° C, 20 ° C, 30 ° C, 40 ° C, 50 ° C, 60 ° C, 70 ° C, 80 ° C, 90 ° C, 100 ° C, 110 ° C, 120 ° C, 130 ° C, 140 ° C
Parallel plate: 25mmφ
Distortion amount: 0.1%
Angular frequency: 0.19 to 314 rad / sec
Further, a temperature-time converted master curve is created with 20 ° C. as the reference temperature, a reference temperature of 20 ° C., a frequency of 1.59 × 10 ⁻⁴ Hz (angular frequency of 1.0 × 10 ⁻³ rad / sec), and a frequency of 1. The storage elastic modulus G ′ at 59 × 10 ⁻⁷ Hz (angular frequency 1.0 × 10 ⁻⁶ rad / sec) and frequency 1.59 Hz (angular frequency 10 rad / sec) was read.
In the adhesive layers of Comparative Example 1, Comparative Example 3, and Comparative Example 4, the storage elastic modulus G ′ could not be measured in the shear mode because the storage elastic modulus was too high. The storage elastic modulus E ′ of was determined.

(2) Frequency Dependency of Storage Elastic Modulus E ′ of Adhesive Layer A dynamic viscoelasticity measuring device (“DVA-200” manufactured by IT Measurement Control Co., Ltd.) is used according to the dynamic viscoelasticity measuring method described in JISK-7198A. Was measured under the following conditions with a chuck publication distance of 25 mm and a strain of 0.3%.
Measurement condition:
Temperature: 0 ° C, 10 ° C, 20 ° C, 30 ° C, 40 ° C, 50 ° C, 60 ° C, 70 ° C, 80 ° C, 90 ° C, 100 ° C, 110 ° C, 120 ° C, 130 ° C, 140 ° C
Angular frequency: 0.19 to 314 rad / sec
Further, a temperature-time converted master curve is created with 20 ° C. as the reference temperature, a reference temperature of 20 ° C., a frequency of 1.59 × 10 ⁻⁴ Hz (angular frequency of 1.0 × 10 ⁻³ rad / sec), and a frequency of 1. The storage elastic modulus E ′ at 59 × 10 ⁻⁷ Hz (angular frequency 1.0 × 10 ⁻⁶ rad / sec) and frequency 1.59 Hz (angular frequency 10 rad / sec) was read.
In the case of isotropic materials such as the adhesive layers of Comparative Example 1, Comparative Example 3, and Comparative Example 4, it is generally known that E ′ is equal to 3G ′, and G ′ = 1 / 3E. “G” was calculated.

(3) Evaluation of warpage after wet heat test A glass laminate having a sample size of 10 cm square was placed in a constant temperature and humidity chamber at a temperature of 60 ° C. and a relative humidity of 95% for 24 hours to perform a wet heat test.
After the wet heat test, the glass laminate was placed in a constant temperature and humidity chamber having a temperature of 23 ° C. and a relative humidity of 50% for 3 hours, and then the glass laminate was taken out of the constant temperature and humidity chamber and allowed to stand on a horizontal surface plate. When the glass laminate was warped, the glass laminate was placed so that the center portion of the glass laminate was in contact with the surface plate and the end portion was lifted from the surface plate.
As shown in FIG. 3, the vertical distance from the surface plate to the center of each side on the lower surface of the glass laminate was measured, and the average value was calculated as the amount of warpage of the glass laminate after the wet heat test.
The evaluation criteria are as follows.
(Double-circle): The curvature amount of a glass laminated body is 1.0 mm or less.
○: The warp amount of the glass laminate is 2.0 mm or less.
X: The curvature amount of a glass laminated body is larger than 2.0 mm.
Incidentally, about the glass laminated body obtained by the Example and the comparative example, before the wet heat test, neither laminated body warped, and the curvature amount was zero.

(4) Falling ball impact test 1 cm of both ends of a 10 cm square glass laminate was sandwiched with a jig, and the glass laminate was fixed horizontally so that the side on which the falling ball collided was thin film glass.
A steel ball having a weight of 133 g and a diameter of 3.17 cm is freely dropped from the position of a height of 15 cm on the surface of the glass laminate to the surface of the glass laminate, and the appearance of the glass laminate after the collision with the steel ball is observed. Observed. Moreover, when there was no change in the appearance of the glass laminate in the falling ball impact test from a position with a height of 15 cm, the height of the steel ball was changed to 20 cm, and a falling ball impact test was further performed.
The evaluation criteria are as follows.
A: Even when the height of the steel ball is changed to 20 cm, the appearance does not change.
○: No change in appearance (steel ball height 15cm)
Δ: Scratches and cracks do not occur in the thin film glass, but the glass laminate is deformed after the falling ball impact test. (Steel ball height 15cm)
X: The glass laminate is damaged, or scratches and cracks occur in the thin film glass. (Steel ball height 15cm)

(5) Apparent bending elastic modulus of the glass laminate A three-point bending test was performed by changing the size of the measurement sample and the inter-test distance in accordance with JIS K7074. At this time, a universal testing apparatus was used.
Specifically, a 100 mm square glass laminate is used, the distance between tests is 50 mm, and the indenter at the center of the test piece is displaced (deflection) at a constant speed (1 mm / min) with respect to the thin film glass surface. The strength was measured, and the apparent bending elastic modulus was calculated by the following formula in the region where the linear relationship between displacement and strength was established.
Apparent flexural modulus = (Load of straight line x Distance between fulcrums ³ ) / (4 x Specimen width x Specimen thickness ³ x Deflection)

(6) Evaluation of surface hardness (pencil hardness) The surface hardness (pencil hardness) on the thin film glass side in the glass laminate was measured according to JIS K-5600-5-4. The load applied during the test was 1000 gf.

[Example 1]
(Preparation of laminated sheet 1 for protecting thin film glass with release film)
Polyethylene terephthalate film (referred to as “release film”) from which an adhesive resin composition (trade name “HM2510” manufactured by Toray Dow Corning Co., Ltd.) containing a moisture curable silicone resin is removed (“NP75Z01” manufactured by Panac Co., Ltd.) And a polyethylene terephthalate film annealed at a temperature of 200 ° C. for 10 minutes (trade name “Diafoil O-300” manufactured by Mitsubishi Plastics Co., Ltd., thickness: 250 μm) (hereinafter referred to as “resin layer 1”). Then, the adhesive resin composition is shaped into a sheet shape using a laminator so as to have a thickness of 140 μm to produce a laminated sheet 1 for protecting a thin film with a release film, and left at 23 ° C. and 50 RH% for 7 days. The adhesive resin composition was moisture cured.
In addition, about the resin layer 1, as a result of measuring the shrinkage | contraction rate in 200 degreeC 30 minutes of a flow direction (MD), it was 0.3%.
(Production of glass laminate)
After laminating thin film glass (trade name “OA-10G” manufactured by Nippon Electric Glass Co., Ltd., thickness: 50 μm) and the release film of laminated sheet 1 for protecting thin film glass with release film so as to match, Autoclave treatment (80 ° C., gauge pressure 0.2 MPa, 20 minutes) was applied and finished and a glass laminate was produced. The thickness of the adhesive layer after finishing and sticking was 140 μm.
The obtained glass laminate was evaluated. The results are shown in Table 1.

[Example 2]
A glass laminate was produced in the same manner as in Example 1 except that the thickness of the thin film glass (trade name “OA-10G” manufactured by Nippon Electric Glass Co., Ltd.) was changed from 50 μm to 100 μm.
The obtained glass laminate was evaluated. The results are shown in Table 1.

[Example 3]
(Synthesis of macromonomer)
In a polymerization apparatus equipped with a stirrer, a condenser, and a thermometer, 900 parts by mass of deionized water, 60 parts by mass of sodium 2-sulfoethyl methacrylate, 10 parts by mass of potassium methacrylate, and 12 parts by mass of methacrylic acid (MMA). The mixture was stirred and heated to 50 ° C. while purging the inside of the polymerization apparatus with nitrogen. To this, 0.08 parts by mass of 2,2′-azobis (2-methylpropionamidine) dihydrochloride as a polymerization initiator was added, and the temperature was further raised to 60 ° C. MMA was dripped continuously for 75 minutes at the speed | rate of 0.24 mass part / min using the dripping pump after temperature rising. The reaction solution was held at 60 ° C. for 6 hours and then cooled to room temperature to obtain Dispersant 1 having a solid content of 10% by mass as a transparent aqueous solution.
In a polymerization apparatus equipped with a stirrer, a condenser, and a thermometer, 145 parts by mass of deionized water, 0.1 part by mass of sodium sulfate, and 0.25 part by mass of dispersant 1 (solid content 10% by mass) are stirred. To obtain a uniform aqueous solution. Next, 100 parts by weight of methacrylic acid, 0.004 parts by weight of bis [(difluoroboryl) diphenylglyoxymate] cobalt (II) as a chain transfer agent, and 1,1,3,3-tetramethyl as a polymerization initiator 0.4 parts by mass of butyl peroxy 2-ethylhexanoate (Nippon Yushi Co., Ltd., trade name “Perocta O”) was added to form an aqueous suspension.
Next, the inside of the polymerization apparatus was purged with nitrogen, heated to 80 ° C. and reacted for 1 hour, and further heated to 90 ° C. and held for 1 hour in order to increase the polymerization rate. Thereafter, the reaction solution was cooled to 40 ° C. to obtain an aqueous suspension containing the polymer. This aqueous suspension was filtered, and the filtrate was washed with deionized water, dehydrated, and dried at 40 ° C. for 16 hours to obtain a macromonomer. The number average amount of this macromonomer was 2.5 × 10 ³ .
(Manufacture of acrylic copolymer)
In a four-necked flask equipped with a stirrer, thermometer, condenser, and nitrogen gas inlet, 40 parts by mass of ethyl acetate, 4.5 parts by mass of isopropanol, 15 parts by mass of the macromonomer obtained by the above synthesis, nitrogen gas The temperature was raised to 85 ° C. under aeration. After reaching 85 ° C., a mixture comprising 20 parts by mass of ethyl acetate, 81 parts by mass of n-butyl acrylate, 4 parts by mass of acrylic acid, and 0.04 parts by mass of benzoyl peroxide was added dropwise over 4.5 hours. After maintaining for 1 hour after the completion of dropping, a mixture composed of 0.5 parts by mass of perocta O and 10 parts by mass of ethyl acetate was added over 1 hour. After holding for 2 hours, 0.5 parts by mass of hindered phenol antioxidant (trade name “Irganox 1010” manufactured by BASF) was added as an antioxidant, and 20.5 parts by mass of ethyl acetate were added. Was cooled to obtain a methacrylic copolymer.
The weight average molecular weight of the obtained methacrylic copolymer was 240,000.
The prepared acrylic copolymer was desolvated to obtain a solid resin.
100 kg of glycerin dimethacrylate as a crosslinking agent and 15 g of diphenyl-2,4,6-trimethylbenzoylphosphine oxide as a photopolymerization initiator are uniformly mixed with 1 kg of a solid resin of an acrylic copolymer to obtain an acrylic curable resin. The adhesive resin composition containing was produced.
(Preparation of laminated sheet 2 for protecting thin film glass with release film)
The adhesive resin composition is sandwiched between a release-treated polyethylene terephthalate film (referred to as “release film”) and the resin layer 1, and the adhesive resin composition is formed into a sheet shape using a laminator so as to have a thickness of 100 μm. It formed and produced the laminated sheet 2 for thin film glass protection with a release film.
(Production of glass laminate)
Instead of the laminated sheet 1 for protecting thin film glass with a release film, the laminated sheet 2 for protecting thin film glass with a release film is subjected to autoclave treatment, and then the integrated light quantity at 365 nm becomes 2000 mJ / cm ² with a high-pressure mercury lamp. A glass laminate was obtained in the same manner as in Example 1 except that ultraviolet rays were irradiated with a high pressure mercury lamp. The thickness of the adhesive layer after finishing and sticking was 100 μm.
The obtained glass laminate was evaluated. The results are shown in Table 1.

[Example 4]
(Laminated sheet 1 for forming adhesive layer (middle layer))
An acrylic ester copolymer obtained by random copolymerization of 75 parts by mass of 2-ethylhexyl acrylate, 20 parts by mass of vinyl acetate, and 5 parts by mass of acrylic acid was prepared. The weight average molecular weight of the obtained acrylic ester copolymer was 440,000.
To 1 kg of this acrylate copolymer, 100 g of propoxypentaerythritol triacrylate (trade name “ATM-4PL”, manufactured by Shin-Nakamura Chemical Co., Ltd.) which is an ultraviolet curable resin as a crosslinking agent, and 4 as a photopolymerization initiator. -15 g of methylbenzophenone was mixed to prepare an adhesive resin composition for an adhesive layer (middle layer) containing an acrylic curable resin.
The adhesive resin composition for the adhesive layer (middle layer) is heated and melted to a peeled polyethylene terephthalate (PET) film 1 (trade name “NP75Z01”, thickness: 75 μm, manufactured by Panac Corporation) to a thickness of 110 μm. After coating with an applicator, the PET film 2 (trade name “E7006” manufactured by Toyobo Co., Ltd., thickness: 38 μm) was coated with a release film, and PET film 1 / adhesive layer (middle layer) A (thickness 76 μm) A laminate sheet 1 for forming an adhesive layer (middle layer) made of / PET film 2 was produced.
(Laminated sheet 1 for forming adhesive layer (outer layer))
To 1 kg of the acrylic ester copolymer, 20 g of 4-methylbenzophenone as a photopolymerization initiator was added and mixed to prepare an adhesive resin composition for an adhesive layer (outer layer) containing an acrylic curable resin.
This adhesive resin composition for outer layer (outer layer) is melted by heating, and a polyethylene terephthalate (PET) film 3 subjected to release treatment as a coating substrate (trade name “MRA75” manufactured by Mitsubishi Plastics, thickness: 75 μm) On top, it is coated and molded into a sheet shape so as to have a thickness of 37 μm, and the resin layer 1 is coated, and an adhesive layer comprising PET film 3 / adhesive layer (outer layer) B (thickness 37 μm) / resin layer 1 The (outer layer) forming laminated sheet 1 was produced.
(Laminated sheet 1 ′ for forming an adhesive layer (outer layer))
A polyethylene terephthalate (PET) film obtained by subjecting a coated base material to a release-treated polyethylene terephthalate (PET) film 5 (trade name “MRF50” manufactured by Mitsubishi Plastics, Inc., thickness: 50 μm) and a release treatment applied to the resin layer 1 PET film 5 / adhesive layer (outer layer) B ′ (thickness 35 μm) / like the laminated sheet 1 for forming the adhesive layer (outer layer), except that it is replaced with 2 (Toyobo “E7006”, thickness 38 μm) A laminated sheet 1 ′ for forming an adhesive layer (outer layer) made of a PET film 2 was produced.
(Preparation of laminated sheet 3 for protecting thin film glass with release film)
The PET films 1 and 2 on both sides of the adhesive layer (intermediate layer) A in the adhesive layer (intermediate layer) forming laminate sheet 1 are sequentially peeled and removed, and the adhesive layers (outer layer) in the adhesive layer (outer layer) forming laminate sheets 1 and 1 ′ are removed. ) Peeled polyethylene terephthalate film B and PET film 3 and 2 on one side of B ′ were peeled off, and the exposed adhesive surfaces were sequentially laminated on both surfaces of adhesive layer (middle layer) A with a laminator, and resin layer A multilayer sheet composed of 1 / adhesive layer (outer layer) B / adhesive layer (intermediate layer) A / adhesive layer (outer layer) B ′ / PET film 5 was produced.
Via the polyethylene terephthalate (PET) films 4 and 5 remaining on the surfaces of the adhesive layers (outer layers) B and B ′, ultraviolet rays are irradiated with a high-pressure mercury lamp so that the integrated light quantity at 365 nm is 1000 mJ / cm ^2. (Outer layer) B, Adhesive layer (Middle layer) A and Adhesive layer (Outer layer) B ′ are UV-crosslinked to provide a release film-attached thin film glass protecting laminated sheet 3 (transparent double-sided adhesive sheet before secondary curing) (total thickness 150 μm) ) Was produced.
(Production of glass laminate)
In place of the laminated sheet 2 for protecting the thin film glass with the release film, the ultraviolet ray curing was performed in the same manner as in Example 3 except that the laminated sheet 3 for protecting the thin film glass with the release film was used to prepare a glass laminate. .
The thickness of the adhesive layer after finishing and sticking was 150 μm.
The obtained glass laminate was evaluated. The results are shown in Table 1.

[Example 5]
For 700 g of the acrylic copolymer solid resin obtained in Example 3, 300 g of acrylic acid-modified rosin (trade name “Pine Crystal KE-604” manufactured by Arakawa Chemical Industries, Ltd.) as a tackifier resin, 10 g of glycerin dimethacrylate and 10 g of diphenyl-2,4,6-trimethylbenzoylphosphine oxide as a photopolymerization initiator are uniformly mixed to produce an adhesive resin composition containing an acrylic curable resin, and the thickness of the thin film glass is reduced. A glass laminate was produced in the same manner as in Example 3 except that the thickness was changed to 100 μm.
The thickness of the adhesive layer after finishing and sticking was 180 μm.
The obtained glass laminate was evaluated. The results are shown in Table 1.

[Example 6]
A glass laminate was produced in the same manner as in Example 2 except that the adhesive layer was changed to an adhesive resin composition containing a moisture-curable silicone resin (trade name “HM2500” manufactured by Toray Dow Corning Co., Ltd.).
The obtained glass laminate was evaluated. The results are shown in Table 1.

[Comparative Example 1]
A UV curable epoxy resin (trade name “KRX-690-5” manufactured by ADEKA Co., Ltd.) as an adhesive resin composition was applied onto the resin layer 1 with a bar coater, and a thin film glass (manufactured by Nippon Electric Glass Co., Ltd.) The name “OA-10G” (thickness: 50 μm) was laminated to the coated surface of the resin layer 1 with a hand roll (hardness: 90 °). High pressure mercury lamp (integrated light quantity: 370 mJ / cm ² ) was irradiated to produce a glass laminate having an adhesive layer thickness of 10 μm.
The obtained glass laminate was evaluated. The results are shown in Table 1.

[Comparative Example 2]
A glass laminate was obtained in the same manner as in Example 3 except that the thickness of the adhesive layer after finish bonding was adjusted to 10 μm.
The obtained glass laminate was evaluated. The results are shown in Table 1.

[Comparative Example 3]
An ethylene vinyl acetate copolymer (trade name EVAFLEX “EV560” manufactured by Mitsui DuPont Polychemical Co., Ltd.) was formed into a sheet shape. Thin glass (made by Nippon Electric Glass Co., Ltd., trade name “OA-10G”, thickness: 100 μm) and resin layer 1 were laminated while sandwiching an ethylene vinyl acetate copolymer sheet to obtain a glass laminate. The thickness of the adhesive layer of the obtained glass laminate, that is, the layer made of an ethylene vinyl acetate copolymer was 150 μm.
The obtained glass laminate was evaluated. The results are shown in Table 1.

[Comparative Example 4]
As a resin layer, a glass laminate was obtained in the same manner as in Comparative Example 3 except that a polycarbonate plate (trade name “Carbo Glass Polish” manufactured by Asahi Glass Co., Ltd., thickness: 1000 μm) was used instead of the resin layer 1.
The obtained glass laminate was evaluated. The results are shown in Table 1.
In addition, as a result of carrying out the wet heat test about the obtained glass laminated body, since the glass cracked immediately after taking out from the constant temperature and humidity chamber of temperature 60 degreeC relative humidity 95%, the curvature amount of the laminated body was unmeasurable. .

(Discussion 1)
From the results of Examples 1-5, Example 6 and Comparative Examples 1-4, the storage elastic modulus G ′ (1...) At a reference temperature of 20 ° C., frequencies of 1.59 Hz and 1.59 × 10 ⁻⁴ Hz in the adhesive layer. 59 Hz) and storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) (G ′ (1.59 Hz) / G ′ (1.59 × 10 ⁻⁴ Hz)) is 6 or more, and storage elasticity The rate G ′ (1.59 × 10 ⁻⁴ Hz) is 5.0 × 10 ⁻¹ MPa or less, and the ratio of the adhesive layer thickness to the resin layer thickness (adhesive layer thickness / resin layer thickness) is 0.08 or more, It was found that a glass laminate having a warpage amount after the moist heat test was suppressed and an excellent impact resistance was obtained by being 2 or less.

(Discussion 2)
From the results of Examples 1 to 5 and Example 6, the storage elastic modulus G ′ (1.59 Hz) of the adhesive layer is 8.0 × 10 ⁻² MPa or more, and further 5.0 × 10 ⁻¹ MPa or more. Thus, it was found that a glass laminate having more excellent impact resistance can be obtained.

(Discussion 3)
From the results of Examples 1 to 6, the storage elastic modulus G ′ (1.59 × 10 ^{−4 at a} reference temperature of 20 ° C., frequencies of 1.59 × 10 ⁻⁴ Hz and 1.59 × 10 ⁻⁷ Hz in the adhesive layer. Hz) and storage elastic modulus G ′ (1.59 × 10 ⁻⁷ Hz) (G ′ (1.59 × 10 ⁻⁴ Hz) / G ′ (1.59 × 10 ⁻⁷ Hz)) is 20 or less. It was found that a glass laminate in which the amount of warpage after the wet heat test was further suppressed was obtained.

The glass laminate of the present invention is excellent in transparency, impact resistance, and surface hardness, and the occurrence of warpage is suppressed even after exposure to a high temperature and high humidity environment.
Therefore, it can be suitably used as a protective material for electronic devices such as display devices.

DESCRIPTION OF SYMBOLS 10, 30 Glass laminated body 20 Display apparatus protective material 11, 21 Resin layer 12, 22 Adhesive layer 13, 23 Thin glass 24, 26 Optical transparent adhesive layer 25 Touch panel sensor unit 27 Liquid crystal display unit 28 Touch panel 38 Surface plate 39 Vertical distance

Claims (9)

A laminate having a resin layer on one surface of a thin film glass having a thickness of 10 μm or more and 200 μm or less via an adhesive layer,
Reference temperature 20 ° C. of the adhesive layer, frequency 1.59 Hz and 1.59 × ¹⁰ storage modulus at -4 Hz G '(1.59Hz) and the storage modulus ^{G' (1.59 × 10 -4 Hz} ) Ratio (G ′ (1.59 Hz) / G ′ (1.59 × 10 ⁻⁴ Hz)) is 6 or more,
Storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) is 5.0 × 10 ⁻¹ MPa or less,
The ratio of the adhesive layer thickness to the resin layer thickness (adhesive layer thickness / resin layer thickness) is 0.08 or more and 2 or less,
The amount of warping of the laminate after leaving the laminate in a constant temperature and humidity chamber having a temperature of 60 ° C. and a relative humidity of 95% for 24 hours, and then leaving the laminate in a constant temperature and humidity chamber having a temperature of 23 ° C. and a relative humidity of 50% for 3 hours. A glass laminate having a thickness of 2.0 mm or less. Storage elastic modulus G ′ (1.59 × 10 ⁻⁴ Hz) and storage elastic modulus G ′ at a reference temperature of 20 ° C. and frequencies of 1.59 × 10 ⁻⁴ Hz and 1.59 × 10 ⁻⁷ Hz of the adhesive layer. the ratio of ^{(1.59 × 10 -7 Hz) (} G '(1.59 × 10 -4 Hz) / G' (1.59 × 10 -7 Hz)) is claimed, characterized in that more than 20 Item 2. A glass laminate according to Item 1. 3. The glass according to claim 1, wherein the adhesive layer has a storage elastic modulus G ′ (1.59 Hz) at a reference temperature of 20 ° C. and a frequency of 1.59 Hz of 8.0 × 10 ⁻² MPa or more. Laminated body.   The thickness of a laminated body is 100 micrometers or more and 4500 micrometers or less, The glass laminated body in any one of Claims 1-3 characterized by the above-mentioned.   The glass laminate according to claim 1, wherein the adhesive layer contains an acrylic curable resin.   The glass laminate according to claim 1, wherein the adhesive layer contains a silicone-based curable resin.   The protective material for display apparatuses using the glass laminated body as described in any one of Claims 1-6.   The laminated sheet for thin film glass protection with a release film for forming the glass laminated body in any one of Claims 1-6.   A display device comprising the glass laminate according to claim 1.

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