JP2016113666A - Electrical element, and connector - Google Patents

Electrical element, and connector Download PDF

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JP2016113666A
JP2016113666A JP2014253432A JP2014253432A JP2016113666A JP 2016113666 A JP2016113666 A JP 2016113666A JP 2014253432 A JP2014253432 A JP 2014253432A JP 2014253432 A JP2014253432 A JP 2014253432A JP 2016113666 A JP2016113666 A JP 2016113666A
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terminal
thin film
base material
connector
contact
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隼 豊泉
Jun Toyoizumi
隼 豊泉
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Yazaki Corp
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Abstract

PROBLEM TO BE SOLVED: To provide an inexpensive electrical element and connector that can prevent reliability degradation of a product caused by oxidation of a base material, keep an actual contact area large even for a small electric contact point of a low contact load and suppress increase of contact resistance.SOLUTION: A male terminal 32 is electrically connected with a female terminal 34 by being inserted in the female terminal 34 for contacting. A FTO thin film 36 doped with an element is installed on the smooth surface of a base material 12 at least in a region where the male terminal 32 contacts the female terminal 34 on the base material 12, wherein the element is an element that contributes to electrical conductivity.SELECTED DRAWING: Figure 2

Description

本発明は、コネクタ用電気接点として有用な電気素子及びコネクタに関する。   The present invention relates to an electrical element and a connector useful as an electrical contact for a connector.

一般にコネクタ用電気接点を構成する端子は、主にCu合金から形成されているが、Cu合金をそのまま用いると、表面が酸化し電気抵抗率が高くなり、製品の信頼性が低下するという問題点がある。とくに、小型かつ低接触荷重の端子では、高抵抗の酸化膜により接点部での金属同士が接触する面(真実接触面)が非常に小さくなってしまい、接触抵抗が上昇するという問題がある。   In general, the terminals constituting the electrical contacts for connectors are mainly made of a Cu alloy. However, if the Cu alloy is used as it is, the surface is oxidized to increase the electrical resistivity, and the reliability of the product is lowered. There is. In particular, a small terminal with a low contact load has a problem that the surface (true contact surface) where the metal contacts at the contact portion becomes very small due to the high resistance oxide film, and the contact resistance increases.

そこで、通常は、Cu合金の表面に金や銀等の貴金属めっきを行って貴金属めっき層を形成し、Cu合金の表面の酸化を防止し、製品の信頼性を確保している。なお耐腐食性や耐摩耗性を確保するためには、貴金属めっき層にある程度の厚さを設けている。これとは別に、電気自動車の蓄電池の充電に使用されるような、数十〜数百アンペアという比較的大電流で使用される場合にも、貴金属メッキ層を厚くする必要がある。   Therefore, normally, noble metal plating such as gold or silver is formed on the surface of the Cu alloy to form a noble metal plating layer, thereby preventing the surface of the Cu alloy from being oxidized and ensuring the reliability of the product. In order to ensure corrosion resistance and wear resistance, the noble metal plating layer is provided with a certain thickness. In addition to this, even when used at a relatively large current of several tens to several hundreds of amperes, such as used for charging a storage battery of an electric vehicle, it is necessary to increase the thickness of the noble metal plating layer.

しかし、貴金属めっき層を厚くすればするほど、コストが高くなるという問題点があり、当業界では使用される貴金属量を低減する技術が求められていた。
また、貴金属めっき層としてAgを用いた場合、Agは硫化等の腐食に弱く、すぐに変色するという問題点がある。そこで、Agめっき層の表面に変色防止剤を塗布しているが、得られる塗布膜は通常、非常に脆く、プラス成形や接点の嵌合等により剥がれてしまい、Agの変色を有効に防止できないという問題点もあった。
However, there is a problem that the thicker the noble metal plating layer, the higher the cost, and a technique for reducing the amount of noble metal used in the industry has been demanded.
Further, when Ag is used as the noble metal plating layer, Ag is vulnerable to corrosion such as sulfidation and has a problem that it quickly changes color. Therefore, although the anti-discoloring agent is applied to the surface of the Ag plating layer, the obtained coating film is usually very brittle and peels off due to plus molding, contact fitting, etc., and Ag discoloration cannot be effectively prevented. There was also a problem.

例えば下記特許文献1には、基材上に例えばSnからなる金属層を形成し、その表面に形成された酸化物層を除去した後、該金属の金属表面を水酸化処理してSnOのような酸化物層を形成するコネクタ用電気接点材料の製造方法が開示されている。 For example, in Patent Document 1 below, a metal layer made of, for example, Sn is formed on a base material, an oxide layer formed on the surface is removed, and then the metal surface of the metal is subjected to hydroxylation treatment to form SnO 2 . A method of manufacturing an electrical contact material for a connector that forms such an oxide layer is disclosed.

特開2012−237055号公報JP 2012-237055 A

しかしながら、上記のような先行技術では、貴金属めっき層を使用しないものの、金属層の形成や、その金属層の表面処理、さらには水酸化処理など工程数が増加して、コストを十分に下げることができない。
また、このような金属層を形成しない場合には、端子が小型化されると、接触荷重が低くなることに起因して、コネクタ嵌合時にSn表面の酸化膜が破壊されず、接触抵抗の上昇が十分に抑制できないという問題が発生した。
また、上記のような従来技術では、コネクタが有する端子数が増加すると、一方の端子を他方の端子に挿入する際の挿入力が増加し、コネクタ嵌合の作業性が低下するという問題もあった。
However, in the prior art as described above, although no precious metal plating layer is used, the number of steps such as formation of the metal layer, surface treatment of the metal layer, and further hydroxylation treatment is increased, thereby sufficiently reducing the cost. I can't.
Further, when such a metal layer is not formed, when the terminal is downsized, the contact load is reduced, so that the oxide film on the Sn surface is not destroyed when the connector is fitted, and the contact resistance is reduced. There was a problem that the rise could not be suppressed sufficiently.
Further, in the conventional technology as described above, when the number of terminals included in the connector is increased, the insertion force when inserting one terminal into the other terminal is increased, and the workability of connector fitting is reduced. It was.

したがって本発明の目的は、低コストであり、かつ、基材の酸化による製品の信頼性の低下を防止するとともに、小型かつ低接触荷重の電気接点であっても、真実接触面を大きく保つことができ、接触抵抗の上昇の問題も解決し得るとともに、端子数が増加してもコネクタ嵌合時の作業性が低下しない電気素子及びコネクタを提供することにある。   Therefore, the object of the present invention is low cost, prevents deterioration of product reliability due to oxidation of the base material, and keeps the true contact surface large even for a small and low contact load electrical contact. An object of the present invention is to provide an electrical element and a connector that can solve the problem of an increase in contact resistance and that does not deteriorate the workability at the time of connector fitting even when the number of terminals increases.

前述した目的を達成するために、本発明に係る電気素子及びコネクタは、下記(1)〜(5)を特徴としている。   In order to achieve the above-described object, an electrical element and a connector according to the present invention are characterized by the following (1) to (5).

(1) 相手側端子に挿入され接触することにより相手側端子と導通接続される電気素子であって、
基材上において少なくとも相手側端子と接触する領域に、元素をドープした酸化物薄膜が設けられ、
前記酸化物薄膜は、前記基材の表面を平滑にした状態で前記基材に設けられ、
前記元素が、導電性発現に寄与する元素であることを特徴とする電気素子。
(2) 前記導電性発現に寄与する元素が、F、In、Ga、Tl、As、SbおよびBiからなる群から選択された少なくとも1種であることを特徴とする上記(1)に記載の電気素子。
(3) 前記導電性発現に寄与する元素が、少なくともFを含むことを特徴とする上記(2)に記載の電気素子。
(4) 前記電気素子は、前記相手側端子に挿入される端子であることを特徴とする上記(1)ないし(3)のいずれかに記載の電気素子。
(5) 上記(4)に記載の前記端子を備えたコネクタ。
(1) An electrical element that is electrically connected to the counterpart terminal by being inserted into and brought into contact with the counterpart terminal,
An oxide thin film doped with an element is provided at least in a region in contact with the counterpart terminal on the substrate,
The oxide thin film is provided on the substrate in a state where the surface of the substrate is smooth,
An electric element, wherein the element is an element contributing to the development of conductivity.
(2) The element contributing to the development of conductivity is at least one selected from the group consisting of F, In, Ga, Tl, As, Sb, and Bi, as described in (1) above Electrical element.
(3) The electric element according to (2), wherein the element contributing to the development of conductivity includes at least F.
(4) The electrical element according to any one of (1) to (3), wherein the electrical element is a terminal inserted into the counterpart terminal.
(5) The connector provided with the said terminal as described in said (4).

本発明の電気素子は、基材上に特定の酸化物薄膜を設けているので、低コストであり、かつ、基材の酸化による製品の信頼性の低下を防止するとともに、小型かつ低接触荷重の電気素子であっても、接触抵抗の上昇の問題も解決し得る電気素子及びコネクタを提供することができる。   Since the electrical element of the present invention is provided with a specific oxide thin film on a base material, it is low in cost and prevents deterioration of product reliability due to oxidation of the base material, and is small and has a low contact load. Even with this electrical element, it is possible to provide an electrical element and a connector that can solve the problem of increased contact resistance.

酸化物薄膜が設けられた電気素子を説明するための模式図である。It is a schematic diagram for demonstrating the electric element provided with the oxide thin film. 本発明の実施形態に係る端子の断面図である。It is sectional drawing of the terminal which concerns on embodiment of this invention. 図2の部分拡大図である。FIG. 3 is a partially enlarged view of FIG. 2.

以下、本発明をさらに詳細に説明する。
図1は、酸化物薄膜が設けられた電気素子の断面を示す模式図である。
図1において、電気素子1は、基材12上に、元素をドープした酸化物薄膜16を設けてなる。
基材12の材質としては、とくに制限されず、用途に応じて適宜選択することができるが、コネクタ用の端子としては、一般的にCuや黄銅等のCu合金を用いることができる。これとは別に、Al、Feまたはこれらの合金を用いることもできる。基材12の厚さは用途に応じて適宜決定することができ、また基材12の形状は矩形型、円柱型、その他の異形型であることができる。なお、本実施形態においては、基材12を用いてオス端子32およびメス端子34が形成される。
Hereinafter, the present invention will be described in more detail.
FIG. 1 is a schematic view showing a cross section of an electric element provided with an oxide thin film.
In FIG. 1, the electric element 1 is formed by providing an oxide thin film 16 doped with an element on a base 12.
The material of the base material 12 is not particularly limited and can be appropriately selected depending on the application. However, as a connector terminal, a Cu alloy such as Cu or brass can be generally used. Apart from this, Al, Fe or alloys thereof can also be used. The thickness of the base material 12 can be appropriately determined according to the application, and the shape of the base material 12 can be a rectangular shape, a cylindrical shape, or other irregular shapes. In the present embodiment, the male terminal 32 and the female terminal 34 are formed using the base material 12.

酸化物薄膜16を構成する酸化物の材質としては、SnO、SnO、NiO、Ni、ZnO、CuO、CuAlO、In、またはこれらの混合物等が挙げられる。中でも本発明の効果が向上するという観点から、酸化物は、SnOおよび/またはSnOであるのが好ましい。 Examples of the material of the oxide constituting the oxide thin film 16 include SnO, SnO 2 , NiO, Ni 2 O 3 , ZnO, CuO 2 , CuAlO 2 , In 2 O 3 , or a mixture thereof. From the viewpoint of inter alia improving the effect of the present invention, the oxide is preferably a SnO and / or SnO 2.

酸化物薄膜16にドープされる元素としては、導電性発現に寄与する元素が好ましく、例えばF、In、Ga、Tl、As、SbおよびBiからなる群から選択された少なくとも1種が挙げられる。中でも本発明の効果の観点から、また、導電性、耐摩耗性に優れるという観点から、Fが好ましく、酸化物薄膜16は、フッ素ドープ酸化錫(FTO)であるのがとくに好ましい。
酸化物薄膜16の厚さとしては、例えば10nm〜1μmである。
The element doped in the oxide thin film 16 is preferably an element that contributes to the development of conductivity, and includes, for example, at least one selected from the group consisting of F, In, Ga, Tl, As, Sb, and Bi. Among these, from the viewpoint of the effects of the present invention and from the viewpoint of excellent conductivity and wear resistance, F is preferable, and the oxide thin film 16 is particularly preferably fluorine-doped tin oxide (FTO).
The thickness of the oxide thin film 16 is, for example, 10 nm to 1 μm.

なお、基材12上には、必要に応じて、基材12に含まれる例えばCuまたはCu合金が酸化物薄膜16上に拡散するのを防止するために、Niめっき層を設けてもよい。Niめっき層は、Niのほか、Fe−Ni合金やSn−Ni合金等のNi合金を使用することができる。Niめっき層の厚さは、当該目的を達成できればよく、適宜決定される。   Note that a Ni plating layer may be provided on the base material 12 in order to prevent, for example, Cu or Cu alloy contained in the base material 12 from diffusing on the oxide thin film 16 as necessary. For the Ni plating layer, Ni alloy such as Fe—Ni alloy or Sn—Ni alloy can be used in addition to Ni. The thickness of the Ni plating layer is determined as appropriate as long as the object can be achieved.

次に、酸化物薄膜が設けられた端子の製造方法について説明する。
まず、基材12を準備し、酸化物薄膜16としての後述するFTO薄膜36を設ける領域の表面を研磨する。研磨は、機械研磨、化学研磨など、表面を平滑化するための公知の方法により行われる。また、必要に応じて基材12の表面にNiめっき層を形成する。Niめっき層は、公知のめっき法など、表面の平滑化が保たれる方法により形成できる。例えば、電解めっき法は、慣用的に行なわれている方法であり、装置構成も簡易で、また層厚の制御も比較的容易であることから好ましい。
Next, a method for manufacturing a terminal provided with an oxide thin film will be described.
First, the base material 12 is prepared, and the surface of a region where an FTO thin film 36 described later as the oxide thin film 16 is provided is polished. Polishing is performed by a known method for smoothing the surface, such as mechanical polishing or chemical polishing. Moreover, a Ni plating layer is formed on the surface of the substrate 12 as necessary. The Ni plating layer can be formed by a method that keeps the surface smooth, such as a known plating method. For example, the electrolytic plating method is a method that is conventionally performed, and is preferable because the apparatus configuration is simple and the control of the layer thickness is relatively easy.

次に、基材12上に、元素をドープした酸化物薄膜16を設ける。この酸化物薄膜16は、例えばスプレー熱分解(SPD:Spray Pyrolysis Deposition)法により設けることができる。SPD法はよく知られているように、基材12を成膜温度まで加熱し、そこに向けて霧化器等の噴霧手段を用いて膜の原料となる溶液を噴霧することにより、反応初期には、基材表面に付着した液滴中の溶媒の蒸発と、溶質の熱分解に続く加水分解反応および熱酸化反応することにより結晶を形成させ、反応が進むにつれその結晶上に、液滴が付着し、液滴中の溶媒蒸発と共に、溶質および下部の結晶間で結晶成長を進行させ、薄膜を形成する方法である。SPD法を採用することにより、酸化物薄膜16をピンポイントで、および/または、任意の形状で成膜することができる。なお酸化物薄膜16は、SPD法以外にも公知の方法を採用し、形成することができる。   Next, an oxide thin film 16 doped with an element is provided on the substrate 12. The oxide thin film 16 can be provided by, for example, a spray pyrolysis (SPD) method. As is well known in the SPD method, the substrate 12 is heated to a film formation temperature, and a solution as a film raw material is sprayed toward the substrate 12 using a spraying means such as an atomizer. In this method, a crystal is formed by the evaporation of the solvent in the droplet attached to the substrate surface and the hydrolysis reaction and thermal oxidation reaction following the thermal decomposition of the solute, and as the reaction proceeds, a droplet is formed on the crystal. Is a method of forming a thin film by causing crystal growth to proceed between the solute and the lower crystal as the solvent evaporates in the droplet. By employing the SPD method, the oxide thin film 16 can be formed in a pinpoint and / or arbitrary shape. The oxide thin film 16 can be formed by employing a known method other than the SPD method.

このようにして形成された酸化物薄膜16は、導電性(例えば比抵抗値が1×10Ω・cm以下)を有し、かつ、上記の本発明の効果を奏するとともに、また、耐摩耗性、耐腐食性、耐熱性等に優れる。 The oxide thin film 16 formed in this manner has conductivity (for example, a specific resistance value of 1 × 10 7 Ω · cm or less), exhibits the effects of the present invention, and wear resistance. Excellent in corrosion resistance, corrosion resistance, heat resistance, etc.

図2は、本発明の実施形態に係る端子の断面図である。図3は、図2に示す端子の一部拡大図である。図2に示すように、オス端子32およびメス端子34は、コネクタ用電気接点として機能する。オス端子32およびメス端子34は、それぞれ図示しないオスコネクタ、メスコネクタの端子収容室に収容され保持されている。なお、図2は、オス端子32およびメス端子34が互いに接触する箇所の周辺を示しているが、オス端子32およびメス端子34は、公知の形状を有していればよい。メス端子34は、バネ部35を有しており、オス端子32はメス端子34のバネ部35と接触することによりメス端子34と導通接続される。   FIG. 2 is a cross-sectional view of the terminal according to the embodiment of the present invention. FIG. 3 is a partially enlarged view of the terminal shown in FIG. As shown in FIG. 2, the male terminal 32 and the female terminal 34 function as connector electrical contacts. The male terminal 32 and the female terminal 34 are housed and held in terminal housing chambers of male connectors and female connectors (not shown), respectively. Note that FIG. 2 shows the vicinity of a place where the male terminal 32 and the female terminal 34 are in contact with each other, but the male terminal 32 and the female terminal 34 may have a known shape. The female terminal 34 has a spring portion 35, and the male terminal 32 is electrically connected to the female terminal 34 by contacting the spring portion 35 of the female terminal 34.

図3の一部拡大図に示されるように、オス端子32とメス端子34の嵌合部において、オス端子32は、表面が研磨により平滑化された基材12にFTO薄膜36が形成され、メス端子34側に接触している。   As shown in the partially enlarged view of FIG. 3, in the fitting portion between the male terminal 32 and the female terminal 34, the male terminal 32 has the FTO thin film 36 formed on the base material 12 whose surface is smoothed by polishing, It is in contact with the female terminal 34 side.

基材12としては黄銅からなるCu合金を用いている。そして、表面が平滑化された基材12の上に、FTO薄膜36をSPD法により設け、オス端子32を製造した。なお、オス端子32とメス端子34の基材の材質が互いに異なっていてもよい。また、本実施形態においては、オス端子32のみにFTO薄膜36が形成されているが、メス端子34にもFTO薄膜36が形成されていてもよい。   As the substrate 12, a Cu alloy made of brass is used. And the FTO thin film 36 was provided by SPD method on the base material 12 with which the surface was smooth | blunted, and the male terminal 32 was manufactured. In addition, the material of the base material of the male terminal 32 and the female terminal 34 may differ from each other. In this embodiment, the FTO thin film 36 is formed only on the male terminal 32, but the FTO thin film 36 may be formed on the female terminal 34.

本実施形態のオス端子32は、FTO薄膜36を設けない場合と比べ、オスコネクタとメスコネクタとを嵌合する際のオス端子32とメス端子34との間の摩擦係数が低下し、かつ、基材12を構成する金属の酸化膜が表面に形成されることを抑制できる。したがって、コネクタが有する端子数が増加したとしても、コネクタ同士の嵌合の際に挿入力が増加しコネクタ嵌合の作業性が低下するということを防止できる。また、FTO薄膜36が設けられていない場合には、オス端子32及びメス端子34が小型化されると接触荷重が低下するため一方の端子の表面に形成される酸化膜を他方の端子により破壊することができなくなるが、FTO薄膜36が形成されていると、このような酸化膜を破壊する必要がなくなるため、接触抵抗が増加することを防止することができる。   Compared with the case where the FTO thin film 36 is not provided, the male terminal 32 of the present embodiment has a reduced coefficient of friction between the male terminal 32 and the female terminal 34 when fitting the male connector and the female connector, and It can suppress that the metal oxide film which comprises the base material 12 is formed in the surface. Therefore, even if the number of terminals included in the connector is increased, it is possible to prevent the insertion force from being increased when the connectors are fitted to each other and the workability of the connector fitting to be lowered. Further, when the FTO thin film 36 is not provided, the contact load is reduced when the male terminal 32 and the female terminal 34 are downsized, so that the oxide film formed on the surface of one terminal is destroyed by the other terminal. However, if the FTO thin film 36 is formed, it is not necessary to destroy such an oxide film, so that an increase in contact resistance can be prevented.

ここで、上述した本発明に係る電気素子及びコネクタの実施形態の特徴をそれぞれ以下[1]〜[5]に簡潔に纏めて列記する。
[1] 相手側端子(メス端子34)に挿入され接触することにより相手側端子(メス端子34)と導通接続される電気素子(オス端子32)であって、
基材(12)上において少なくとも相手側端子(メス端子34)と接触する領域に、元素をドープした酸化物薄膜が設けられ、
前記酸化物薄膜は、前記基材(12)の表面を平滑にした状態で前記基材(12)に設けられ、
前記元素が、導電性発現に寄与する元素であることを特徴とする端子(オス端子32)。
[2] 前記導電性発現に寄与する元素が、F、In、Ga、Tl、As、SbおよびBiからなる群から選択された少なくとも1種であることを特徴とする上記[1]に記載の電気素子。
[3] 前記導電性発現に寄与する元素が、少なくともFを含むことを特徴とする上記[2]に記載の電気素子(オス端子32)。
[4] 前記電気素子は、前記相手側端子に挿入される端子(オス端子32)であることを特徴とする上記[1]ないし[3]のいずれかに記載の電気素子。
[5] 上記[4]に記載の前記端子(オス端子32)を備えたコネクタ。
Here, the features of the embodiments of the electrical element and the connector according to the present invention described above are briefly summarized and listed in the following [1] to [5], respectively.
[1] An electrical element (male terminal 32) that is electrically connected to the counterpart terminal (female terminal 34) by being inserted into and brought into contact with the counterpart terminal (female terminal 34),
On the base material (12), an oxide thin film doped with an element is provided at least in a region in contact with the counterpart terminal (female terminal 34),
The oxide thin film is provided on the base material (12) in a state where the surface of the base material (12) is smooth,
The terminal (male terminal 32), wherein the element is an element that contributes to conductivity.
[2] The element according to [1], wherein the element contributing to the development of conductivity is at least one selected from the group consisting of F, In, Ga, Tl, As, Sb, and Bi. Electrical element.
[3] The electric element (male terminal 32) according to the above [2], wherein the element contributing to the development of conductivity includes at least F.
[4] The electrical element according to any one of [1] to [3], wherein the electrical element is a terminal (male terminal 32) inserted into the counterpart terminal.
[5] A connector comprising the terminal (male terminal 32) according to [4].

1 電気素子
12 基材
16 酸化物薄膜
32 オス端子(端子)
34 メス端子(相手側端子)
35 バネ部
36 FTO薄膜
DESCRIPTION OF SYMBOLS 1 Electric element 12 Base material 16 Oxide thin film 32 Male terminal (terminal)
34 Female terminal (mating terminal)
35 Spring 36 FTO thin film

Claims (5)

相手側端子に挿入され接触することにより相手側端子と導通接続される電気素子であって、
基材上において少なくとも相手側端子と接触する領域に、元素をドープした酸化物薄膜が設けられ、
前記酸化物薄膜は、前記基材の表面を平滑にした状態で前記基材に設けられ、
前記元素が、導電性発現に寄与する元素であることを特徴とする電気素子。
An electrical element that is electrically connected to the counterpart terminal by being inserted into and contacted with the counterpart terminal,
An oxide thin film doped with an element is provided at least in a region in contact with the counterpart terminal on the substrate,
The oxide thin film is provided on the substrate in a state where the surface of the substrate is smooth,
An electric element, wherein the element is an element contributing to the development of conductivity.
前記導電性発現に寄与する元素が、F、In、Ga、Tl、As、SbおよびBiからなる群から選択された少なくとも1種であることを特徴とする請求項1に記載の電気素子。   The electric element according to claim 1, wherein the element contributing to the expression of conductivity is at least one selected from the group consisting of F, In, Ga, Tl, As, Sb, and Bi. 前記導電性発現に寄与する元素が、少なくともFを含むことを特徴とする請求項2に記載の電気素子。   The electric element according to claim 2, wherein the element contributing to the development of conductivity includes at least F. 前記電気素子は、前記相手側端子に挿入される端子であることを特徴とする請求項1ないし3のいずれか1項に記載の電気素子。   The electric element according to any one of claims 1 to 3, wherein the electric element is a terminal inserted into the counterpart terminal. 請求項4に記載の前記端子を備えたコネクタ。
The connector provided with the said terminal of Claim 4.
JP2014253432A 2014-07-14 2014-12-15 Electrical element, and connector Abandoned JP2016113666A (en)

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JP2005512302A (en) * 2001-12-13 2005-04-28 オウトクンプ オサケイティオ ユルキネン Contact terminal with doped coating
JP2005048201A (en) * 2003-07-29 2005-02-24 Fcm Kk Terminal, and component and product having the same
JP2009004297A (en) * 2007-06-25 2009-01-08 Nippon Telegr & Teleph Corp <Ntt> Inter-connector and solid oxide fuel cell
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