JP2016053466A - Heat treatment device - Google Patents

Heat treatment device Download PDF

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JP2016053466A
JP2016053466A JP2014180366A JP2014180366A JP2016053466A JP 2016053466 A JP2016053466 A JP 2016053466A JP 2014180366 A JP2014180366 A JP 2014180366A JP 2014180366 A JP2014180366 A JP 2014180366A JP 2016053466 A JP2016053466 A JP 2016053466A
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muffle
heating element
planar heating
disposed
heat treatment
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JP6358904B2 (en
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山森 健太郎
Kentaro Yamamori
健太郎 山森
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JTEKT Thermo Systems Corp
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Koyo Thermo Systems Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a heat treatment device capable of quickly raising a temperature of a muffle, and improving thermal uniformity in the muffle after the rise of temperature.SOLUTION: A heat treatment device 1 includes a furnace body 2 the inside of which is formed into the substantially rectangular shape, a muffle 3 disposed in the furnace body 2 while extending in an axial direction, and accommodating a heat treatment object, a high output heating element 4 for entirely heating the muffle 3 in the longitudinal direction, and planar heating elements 5a-5e heating the muffle 3 with an output lower than the high output heating element 4. A plurality of high output heating elements 4 are disposed in an axial direction of the muffle 3 at both outer sides in one direction substantially orthogonal to an axial direction of the muffle 3 at prescribed internals. The pair of planar heating elements 5b and 5c are disposed at both outer sides in one direction with respect to the high output heating elements 4.SELECTED DRAWING: Figure 3

Description

本発明は、被処理物を高出力発熱体により熱処理する熱処理装置に関する。   The present invention relates to a heat treatment apparatus for heat-treating an object to be processed with a high-power heating element.

従来より、炉体内の筒状のマッフルに収容された被処理物を加熱、熱処理する熱処理装置として、SiCヒータ等の高出力で加熱する高出力発熱体を備えたものが知られている(例えば、特許文献1参照)。   2. Description of the Related Art Conventionally, as a heat treatment apparatus for heating and heat-treating an object to be processed contained in a cylindrical muffle in a furnace body, one having a high-output heating element that heats at a high output such as a SiC heater is known (for example, , See Patent Document 1).

特開平10−141859号公報JP 10-141859 A

従来の熱処理装置では、高出力発熱体によりマッフルを速やかに昇温することはできるが、その反面、昇温した後にマッフル内の均熱性を保ちにくいという問題があった。
本発明は、前記問題点に鑑みてなされたものであり、マッフルを速やかに昇温することができ、且つ昇温後のマッフル内の均熱性を向上することができる熱処理装置を提供することを目的とする。
In the conventional heat treatment apparatus, although the muffle can be quickly heated by the high-power heating element, there is a problem that it is difficult to maintain the heat uniformity in the muffle after the temperature is raised.
The present invention has been made in view of the above problems, and provides a heat treatment apparatus capable of quickly raising the temperature of the muffle and improving the heat uniformity in the muffle after the temperature increase. Objective.

本発明の熱処理装置は、内部が略矩形状に形成された炉本体と、前記炉本体内に配置されるとともに軸方向に延びて形成され、熱処理される被処理物を収容するマッフルと、前記マッフルをその長手方向全体にわたって加熱する高出力発熱体と、略面状に形成され、前記マッフルを前記高出力発熱体よりも低出力で加熱する面状発熱体と、を備え、前記高出力発熱体は、前記マッフルの軸方向と略直交する一方向の両外側において、前記マッフルの軸方向に沿って互いに所定の間隙を介して複数配置されており、前記面状発熱体は、少なくとも、前記高出力発熱体よりも前記一方向の両外側に一対配置されていることを特徴とする。   The heat treatment apparatus of the present invention includes a furnace main body having an inside formed in a substantially rectangular shape, a muffle disposed in the furnace main body and extending in the axial direction and containing an object to be heat treated, A high-power heating element that heats the muffle over its entire length, and a sheet-like heating element that is formed in a substantially planar shape and heats the muffle at a lower output than the high-power heating element. A plurality of bodies are arranged on both outer sides in one direction substantially orthogonal to the axial direction of the muffle, with a predetermined gap therebetween along the axial direction of the muffle, and the planar heating element includes at least the A pair is arranged on both outer sides in the one direction with respect to the high-power heating element.

本発明によれば、高出力発熱体と面状発熱体とによりマッフルを加熱するため、マッフルを目標温度まで速やかに昇温させることができる。また、面状発熱体によりマッフルを低出力で加熱するため、昇温後におけるマッフル内の均熱性を向上することができる。
また、高出力発熱体が面状発熱体よりも内側(マッフル側)に配置されているため、高出力発熱体が放射した熱はマッフルへ有効に伝達される。また、複数の高出力発熱体は互いに所定の間隙を介して配置されているため、高出力発熱体の外側に配置された面状発熱体が放射した熱は、前記間隙を通過してマッフルへ有効に伝達される。これにより、マッフルを効果的に加熱することができ、かつマッフルを均一に加熱することができる。
According to the present invention, since the muffle is heated by the high-power heating element and the planar heating element, the muffle can be quickly raised to the target temperature. Further, since the muffle is heated by the planar heating element at a low output, the heat uniformity in the muffle after the temperature rise can be improved.
Further, since the high-power heating element is disposed on the inner side (muffle side) than the planar heating element, the heat radiated from the high-output heating element is effectively transmitted to the muffle. Further, since the plurality of high-power heating elements are arranged with a predetermined gap between each other, the heat radiated from the planar heating element arranged outside the high-power heating element passes through the gap to the muffle. Effectively communicated. Thereby, a muffle can be heated effectively and a muffle can be heated uniformly.

前記熱処理装置において、前記面状発熱体における、前記マッフルの軸方向と略直交する方向であって且つ前記一方向と略直交する方向である他方向の長さが、前記マッフルの外径よりも長く設定されているのが好ましい。
この場合、面状発熱体はマッフルの外径よりも幅広に形成されるので、面状発熱体によりマッフルを効果的に加熱することができ、かつマッフルを均一に加熱することができる。
In the heat treatment apparatus, the length of the planar heating element in the other direction, which is a direction substantially orthogonal to the axial direction of the muffle and a direction substantially orthogonal to the one direction, is larger than the outer diameter of the muffle. It is preferable to set it long.
In this case, since the planar heating element is formed wider than the outer diameter of the muffle, the muffle can be effectively heated by the planar heating element, and the muffle can be heated uniformly.

前記熱処理装置において、前記マッフルは略円筒形状に形成されており、前記面状発熱体は、前記マッフルを挟んで、前記一方向の両外側、及び前記マッフルの軸方向と略直交する方向であって且つ前記一方向と略直交する方向である他方向の両外側にそれぞれ配置されているのが好ましい。
この場合、面状発熱体は、マッフルを挟んで上記一方向の両側及び上記他方向の両側にそれぞれ配置されるので、すなわち、マッフルの外周全体を囲むように面状発熱体が配置されるので、マッフルをより効果的に加熱することができ、かつマッフルをより均一に加熱することができる。
また、マッフルは、略円筒形状に形成され、対称性の優れた形状であるため、熱的負荷に対する機械強度に優れる。また、マッフルは、対称性の優れた形状であるため、伝熱を均一に行うことができ、マッフル内の均熱性をさらに向上させることができる。
In the heat treatment apparatus, the muffle is formed in a substantially cylindrical shape, and the planar heating element has a direction substantially perpendicular to both outer sides of the one direction and the axial direction of the muffle with the muffle interposed therebetween. In addition, it is preferably arranged on both outer sides in the other direction, which is a direction substantially orthogonal to the one direction.
In this case, the planar heating element is disposed on both sides of the one direction and the other direction on both sides of the muffle, that is, the planar heating element is disposed so as to surround the entire outer periphery of the muffle. The muffle can be heated more effectively, and the muffle can be heated more uniformly.
Moreover, since the muffle is formed in a substantially cylindrical shape and has an excellent symmetry, it has excellent mechanical strength against a thermal load. Moreover, since the muffle has a shape with excellent symmetry, heat transfer can be performed uniformly, and the heat uniformity in the muffle can be further improved.

前記熱処理装置において、前記高出力発熱体は、前記炉本体の上部から当該炉本体内の下方に延びるように配置されており、前記高出力発熱体の下端が、前記マッフル内の被処理物の配置位置よりも下方に配置されているのが好ましい。
この場合、高出力発熱体により、マッフル内に配置された被処理物の全体を均一に昇温させることができる。
In the heat treatment apparatus, the high-power heating element is disposed so as to extend downward from the upper part of the furnace main body, and the lower end of the high-power heating element is disposed on the workpiece in the muffle. It is preferable to arrange below the arrangement position.
In this case, it is possible to uniformly raise the temperature of the entire object to be processed disposed in the muffle by the high output heating element.

前記熱処理装置において、前記面状発熱体における前記炉本体内に臨む内面が、前記炉本体の内壁面と略面一になるように配置されているのが好ましい。
この場合、面状発熱体の炉本体内に臨む内面が、炉本体の内壁面よりも内部に突出するのを抑制することができる。
In the heat treatment apparatus, it is preferable that an inner surface of the planar heating element facing the furnace body is substantially flush with an inner wall surface of the furnace body.
In this case, it can suppress that the inner surface which faces the furnace main body of a planar heating element protrudes inside rather than the inner wall surface of a furnace main body.

本発明の熱処理装置によれば、マッフルを速やかに昇温することができ、且つ昇温後のマッフル内の均熱性を向上することができる。   According to the heat treatment apparatus of the present invention, it is possible to quickly raise the temperature of the muffle and to improve the heat uniformity in the muffle after the temperature rise.

本発明の一実施形態に係る熱処理装置を示す斜視図である。It is a perspective view which shows the heat processing apparatus which concerns on one Embodiment of this invention. 熱処理装置の内部を示す斜視図である。It is a perspective view which shows the inside of a heat processing apparatus. 熱処理装置を示す断面図である。It is sectional drawing which shows the heat processing apparatus. 熱処理装置の温度分布を示すグラフである。It is a graph which shows the temperature distribution of a heat processing apparatus. 熱処理装置の温度測定点を示す説明図である。It is explanatory drawing which shows the temperature measurement point of a heat processing apparatus.

次に、本発明の好ましい実施形態について添付図面を参照しながら説明する。図1は、本発明の一実施形態に係る熱処理装置を示す斜視図である。また、図2は、その熱処理装置の内部を示す斜視図である。図1及び図2において、熱処理装置1は、例えば、CIGS太陽電池等の被処理物を熱処理するために用いられるものである。熱処理装置1は、内部が略矩形状に形成された炉本体2と、開閉扉3aを有する略円筒形状のマッフル3と、マッフル3を加熱する高出力発熱体4及び面状発熱体5a〜5eとを備えている。
なお、図1に示すように、本明細書においては、炉本体2を前記出入口3a側から見た前側を「前」、その後側を「後」、その右側を「右」、及びその左側を「左」と定義して、熱処理装置1の各構成を説明している。
Next, preferred embodiments of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a perspective view showing a heat treatment apparatus according to an embodiment of the present invention. FIG. 2 is a perspective view showing the inside of the heat treatment apparatus. 1 and 2, the heat treatment apparatus 1 is used for heat-treating an object to be processed such as a CIGS solar cell, for example. The heat treatment apparatus 1 includes a furnace body 2 having a substantially rectangular shape inside, a substantially cylindrical muffle 3 having an opening / closing door 3a, a high-power heating element 4 and planar heating elements 5a to 5e for heating the muffle 3. And.
As shown in FIG. 1, in this specification, the front side of the furnace body 2 viewed from the entrance / exit 3a side is “front”, the rear side is “rear”, the right side is “right”, and the left side is Each component of the heat treatment apparatus 1 is described as “left”.

炉本体2は、前壁部6、後壁部7、右壁部8、左壁部9、天壁部10及び底壁部11によって前後方向に長い直方体形状に形成されており、これら壁部6〜11によって囲まれた略矩形状の空間が加熱室2aとされている(図3参照)。本実施形態の加熱室2aは、左右方向の幅寸法が約1000mm、高さ寸法が約850mm、前後方向の長さ寸法が約1800mmに設定されている。   The furnace body 2 is formed in a rectangular parallelepiped shape that is long in the front-rear direction by the front wall portion 6, the rear wall portion 7, the right wall portion 8, the left wall portion 9, the top wall portion 10, and the bottom wall portion 11, and these wall portions. A substantially rectangular space surrounded by 6 to 11 is the heating chamber 2a (see FIG. 3). In the heating chamber 2a of this embodiment, the width dimension in the left-right direction is set to about 1000 mm, the height dimension is set to about 850 mm, and the length dimension in the front-rear direction is set to about 1800 mm.

マッフル3は、その軸方向に延びて形成されており、当該軸方向を前後方向として、大部分が加熱室2a内に配置されている。マッフル3の軸方向一端部は、炉本体2の前壁部6を貫通した状態で支持されており、その端面には、マッフル3内に被処理物を収容する際に開閉される開閉扉3aが設けられている。マッフル3内には、窒素ガスや水素ガス等の不活性ガスが充填されるようになっている。これにより、マッフル3内に収容された被処理物は、不活性ガス雰囲気中で熱処理が行われる。本実施形態におけるマッフル3は、内径が約750mm、軸方向(前後方向)の長さ寸法は約2000mmに設定されている。   The muffle 3 is formed to extend in the axial direction, and most of the muffle 3 is disposed in the heating chamber 2a with the axial direction as the front-rear direction. One end portion in the axial direction of the muffle 3 is supported in a state of penetrating the front wall portion 6 of the furnace body 2, and an opening / closing door 3 a that is opened and closed when the workpiece is accommodated in the muffle 3 on the end surface. Is provided. The muffle 3 is filled with an inert gas such as nitrogen gas or hydrogen gas. Thereby, the to-be-processed object accommodated in the muffle 3 is heat-processed in inert gas atmosphere. The muffle 3 in this embodiment has an inner diameter of about 750 mm and an axial direction (front-rear direction) length of about 2000 mm.

図3は、熱処理装置1を示す断面図である。図2及び図3において、高出力発熱体4は、マッフル3をその長手方向全体に亘って高出力で加熱するものであり、例えば、棒状のSiC(シリコンカーバイト)ヒータからなる。高出力発熱体4は、加熱室2a内の中央部に配置されたマッフル3の左右方向(一方向)の両外側に配置されており、その上端部は天壁部10に支持されている。高出力発熱体4の上下方向の長さは、その下端がマッフル3内の被処理物の配置位置よりも下方に配置される長さに設定されている。
また、高出力発熱体4は、マッフル3の軸方向に沿って互いに所定の間隙を介して複数配置されており、マッフル3の外周面を左右両側から加熱するようになっている。本実施形態の高出力発熱体4は、左右それぞれ12本ずつ配置されている。
FIG. 3 is a cross-sectional view showing the heat treatment apparatus 1. 2 and 3, the high-power heating element 4 heats the muffle 3 with a high output over the entire length thereof, and is made of, for example, a rod-like SiC (silicon carbide) heater. The high-power heating element 4 is disposed on both outer sides in the left-right direction (one direction) of the muffle 3 disposed in the center portion in the heating chamber 2 a, and the upper end portion thereof is supported by the top wall portion 10. The length of the high-power heating element 4 in the vertical direction is set such that the lower end of the high-power heating element 4 is disposed below the position where the object to be processed in the muffle 3 is disposed.
A plurality of high-power heating elements 4 are arranged along the axial direction of the muffle 3 with a predetermined gap therebetween, and the outer peripheral surface of the muffle 3 is heated from both the left and right sides. Twelve high-power heating elements 4 of the present embodiment are arranged on each of the left and right sides.

図1及び図2に示すように、炉本体2の壁部7〜11の内壁面には、面状発熱体5a〜5eが設けられている。面状発熱体5a〜5eは、マッフル3を高出力発熱体4よりも低出力で加熱するものであり、略面状に形成されている。具体的には、面状発熱体5a〜5eは、例えば、セラミックファイバーからなる断熱材と、蛇行状に形成された金属線からなる発熱体とを真空成型により一体化した平板状のモルダサームヒータ((株)光洋サーモシステムが製造、販売するヒータ製品の商品名)からなる。   As shown in FIGS. 1 and 2, planar heating elements 5 a to 5 e are provided on the inner wall surfaces of the wall portions 7 to 11 of the furnace body 2. The planar heating elements 5a to 5e heat the muffle 3 with a lower output than the high-output heating element 4, and are formed in a substantially planar shape. Specifically, the planar heating elements 5a to 5e are, for example, flat plate-like mold thermother heaters, in which a heat insulating material made of ceramic fibers and a heating element made of a metal wire formed in a meandering shape are integrated by vacuum forming. (Product name of heater product manufactured and sold by Koyo Thermo System Co., Ltd.).

面状発熱体5a〜5eは、炉本体2内の均熱性を向上させるために、当該面状発熱体5a〜5eの全てに対する高出力発熱体4の全ての出力比率が5/7以上となるように設定されるのが好ましい。なお、高出力発熱体4及び面状発熱体5は、所定の熱処理温度に達した後は、前記出力比率を維持しながら双方の出力を低減させることで、前記熱処理温度を維持するようになっている。   In the sheet heating elements 5a to 5e, all the output ratios of the high-power heating elements 4 to all the sheet heating elements 5a to 5e are 5/7 or more in order to improve the heat uniformity in the furnace body 2. It is preferable to set as follows. The high-power heating element 4 and the planar heating element 5 maintain the heat treatment temperature by reducing both outputs while maintaining the output ratio after reaching the predetermined heat treatment temperature. ing.

面状発熱体5a〜5eは、後壁部7の内壁面に固定された第1面状発熱体5aと、右壁部8の内壁面に固定された第2面状発熱体5bと、左壁部9の内壁面に固定された第3面状発熱体5cと、天壁部10の内壁面(下壁面)に固定された第4面状発熱体5dと、底壁部11の内壁面(上壁面)に固定された第5面状発熱体5eとからなる。   The planar heating elements 5a to 5e include a first planar heating element 5a fixed to the inner wall surface of the rear wall portion 7, a second planar heating element 5b fixed to the inner wall surface of the right wall portion 8, and a left The third planar heating element 5c fixed to the inner wall surface of the wall portion 9, the fourth planar heating element 5d fixed to the inner wall surface (lower wall surface) of the top wall portion 10, and the inner wall surface of the bottom wall portion 11 It consists of the 5th planar heating element 5e fixed to (upper wall surface).

図2に示すように、第1面状発熱体5aは、矩形平板状に形成された一対の第1面状発熱部5a1によって構成されている。これら第1面状発熱部5a1は、その長手方向を上下方向として、後壁部7の内壁面に沿って左右方向に所定間隔をあけて配置されている。第1面状発熱体5aは後壁部7に埋め込まれており、第1面状発熱体5aの炉本体2内に臨む内面は後壁部7の内壁面と面一に配置されている。また、図3に示すように、各第1面状発熱部5a1は、後壁部7において、マッフル3の後端部の中央部を除く左右両側部にそれぞれ対向して配置されており、第1面状発熱部5a1の上下方向の長さは、マッフル3の外径よりも長く設定されている。これにより、第1面状発熱体5aは、マッフル3の後端部を加熱するようになっている。   As shown in FIG. 2, the first sheet heating element 5a is constituted by a pair of first sheet heating parts 5a1 formed in a rectangular flat plate shape. These first sheet-like heat generating portions 5a1 are arranged at predetermined intervals in the left-right direction along the inner wall surface of the rear wall portion 7, with the longitudinal direction thereof being the vertical direction. The first sheet heating element 5 a is embedded in the rear wall 7, and the inner surface of the first sheet heating element 5 a facing the furnace body 2 is flush with the inner wall surface of the rear wall 7. Moreover, as shown in FIG. 3, each 1st planar heat-emitting part 5a1 is each arrange | positioned in the back wall part 7 so as to oppose each right and left both sides except the center part of the rear-end part of the muffle 3, The length in the vertical direction of the single sheet heating portion 5 a 1 is set longer than the outer diameter of the muffle 3. Thereby, the 1st planar heating element 5a heats the rear-end part of the muffle 3.

図2及び図3に示すように、第2面状発熱体5bは、マッフル3の右外側に配置された高出力発熱体4の右外側に配置されている。また、第3面状発熱体5cは、マッフル3の左外側に配置された高出力発熱体4の左外側に配置されている。
また、図3に示すように、第2及び第3面状発熱体5b,5cの上下方向(他方向)の長さは、マッフル3の外径よりも長く設定されている。
As shown in FIGS. 2 and 3, the second planar heating element 5 b is arranged on the right outer side of the high-power heating element 4 arranged on the right outer side of the muffle 3. The third planar heating element 5 c is disposed on the left outer side of the high-power heating element 4 disposed on the left outer side of the muffle 3.
Further, as shown in FIG. 3, the lengths of the second and third planar heating elements 5 b, 5 c in the vertical direction (other direction) are set longer than the outer diameter of the muffle 3.

図1及び図2に示すように、第2及び第3面状発熱体5b,5cは、矩形平板状に形成された複数の第2及び第3面状発熱部5b1,5c1によって構成されている。これら第2及び第3面状発熱部5b1,5c1は、その長手方向を上下方向として前後方向に連続して複数配置されている。図3に示すように、第2及び第3面状発熱体5b,5cは、それぞれ右壁部8及び左壁部9に埋め込まれており、第2面状発熱体5bの炉本体2内に臨む内面は右壁部8の内壁面と面一に配置され、第3面状発熱体5cの炉本体2内に臨む内面は左壁部9の内壁面と面一に配置されている。また、第2及び第3面状発熱体5b,5cは、右壁部8及び左壁部9の上下方向の中央部に配置され、マッフル3の外周面を左右両側からそれぞれ加熱するようになっている。   As shown in FIGS. 1 and 2, the second and third planar heating elements 5b and 5c are constituted by a plurality of second and third planar heating elements 5b1 and 5c1 formed in a rectangular flat plate shape. . A plurality of the second and third planar heating portions 5b1 and 5c1 are continuously arranged in the front-rear direction with the longitudinal direction as the vertical direction. As shown in FIG. 3, the second and third planar heating elements 5b and 5c are embedded in the right wall portion 8 and the left wall portion 9, respectively, and are placed in the furnace body 2 of the second planar heating element 5b. The inner surface facing the inner wall surface of the right wall portion 8 is disposed flush with the inner wall surface of the third wall heating element 5c, and the inner surface facing the furnace body 2 of the third planar heating element 5c is disposed flush with the inner wall surface of the left wall portion 9. Further, the second and third planar heating elements 5b, 5c are arranged in the center in the vertical direction of the right wall portion 8 and the left wall portion 9, and heat the outer peripheral surface of the muffle 3 from the left and right sides, respectively. ing.

図3に示すように、第4面状発熱体5dは、マッフル3の上外側に配置されている。また、第5面状発熱体5eは、マッフル3の下外側に配置されている。
また、第4及び第5面状発熱体5d,5eの左右方向(一方向)の長さは、マッフル3の外径よりも長く設定されている。
As shown in FIG. 3, the fourth planar heating element 5 d is disposed on the upper and outer sides of the muffle 3. Further, the fifth planar heating element 5e is disposed on the lower outer side of the muffle 3.
The lengths of the fourth and fifth planar heating elements 5d, 5e in the left-right direction (one direction) are set longer than the outer diameter of the muffle 3.

図1及び図2に示すように、第4及び第5面状発熱体5d,5eは、矩形平板状に形成された複数の第4及び第5面状発熱部5d1,5e1によって構成されている。これら第4及び第5面状発熱部5d1,5e1は、その長手方向を左右方向として前後方向に連続して複数配置されている。図3に示すように、第4及び第5面状発熱体5d,5eは、それぞれ天壁部10及び底壁部11に埋め込まれており、第4面状発熱体5dの炉本体2内に臨む内面(下面)は天壁部10の内壁面(下壁面)と面一に配置され、第5面状発熱体5eの炉本体2内に臨む内面(上面)は底壁部11の内壁面(上壁面)と面一に配置されている。また、第4及び第5面状発熱体5d,5eは、天壁部10及び底壁部11の左右方向の中央部に配置されており、マッフル3の外周面を上下両側からそれぞれ加熱するようになっている。   As shown in FIGS. 1 and 2, the fourth and fifth planar heating elements 5d, 5e are constituted by a plurality of fourth and fifth planar heating parts 5d1, 5e1 formed in a rectangular flat plate shape. . A plurality of the fourth and fifth planar heating portions 5d1 and 5e1 are continuously arranged in the front-rear direction with the longitudinal direction as the left-right direction. As shown in FIG. 3, the fourth and fifth planar heating elements 5d and 5e are embedded in the top wall 10 and the bottom wall 11, respectively, and are placed in the furnace body 2 of the fourth planar heating element 5d. The inner surface (lower surface) facing the inner wall surface (lower wall surface) of the top wall portion 10 is flush with the inner wall surface (upper surface) of the fifth planar heating element 5e. It is arranged flush with the (upper wall surface). Further, the fourth and fifth planar heating elements 5d and 5e are arranged at the center in the left-right direction of the top wall 10 and the bottom wall 11 so as to heat the outer peripheral surface of the muffle 3 from both the upper and lower sides. It has become.

図4は、所定の試験条件下における熱処理装置1の温度分布を示すグラフである。図5は、その試験における熱処理装置1の温度測定点を示す説明図である。
この試験では、高出力発熱体4の最大出力合計値を略70kWに設定し、面状発熱体5b〜5eの最大出力合計値を略50kWに設定し、面状発熱体5の全ての出力に対する高出力発熱体4の全ての出力の比率が略5/7となるように設定した。そして、高出力発熱体4及び面状発熱体5b〜5eによりマッフル3の内部を600℃まで昇温した後に90分間均熱させるように制御し、そのときのマッフル3内に配置された測定容器Cの左後方上側の測定点P1、右前方上側の測定点P2、右後方下側の測定点P3、左前方下側の測定点P4及び中央の測定点P5の合計5点における各温度を測定した。なお、図4における実線は、マッフル3の外部の温度分布を示し、図4における破線は、マッフル3の内部の前記5点の平均温度分布を示している。
FIG. 4 is a graph showing the temperature distribution of the heat treatment apparatus 1 under predetermined test conditions. FIG. 5 is an explanatory diagram showing temperature measurement points of the heat treatment apparatus 1 in the test.
In this test, the maximum output total value of the high-power heating element 4 is set to approximately 70 kW, the maximum output total value of the planar heating elements 5b to 5e is set to approximately 50 kW, The ratio of all the outputs of the high-power heating element 4 was set to be approximately 5/7. Then, the inside of the muffle 3 is heated to 600 ° C. by the high output heating element 4 and the planar heating elements 5b to 5e, and then controlled to soak for 90 minutes, and the measurement container disposed in the muffle 3 at that time Measure each temperature at a total of 5 points: C left upper left measurement point P1, right front upper measurement point P2, right rear lower measurement point P3, left front lower measurement point P4, and central measurement point P5. did. Note that the solid line in FIG. 4 indicates the temperature distribution outside the muffle 3, and the broken line in FIG. 4 indicates the average temperature distribution at the five points inside the muffle 3.

図4に示すように、前記5点における200℃から500℃までの平均昇温レートは18.2℃/minであり、面状発熱体5b〜5eのみで加熱した場合の平均昇温レートが約10℃/minであるのに比べて高い値を示しているのが分かる。
また、図4に示すように、均熱90分間におけるマッフル3内部の最高温度と最低温度との温度差(幅)が2.5℃となっており、小さい幅で均熱されているのが分かる。
なお、面状発熱体5b〜5eに面状発熱体5aを加えて加熱すると、平均昇温レートをさらに高めることができる。
As shown in FIG. 4, the average temperature increase rate from 200 ° C. to 500 ° C. at the five points is 18.2 ° C./min, and the average temperature increase rate when heated only by the planar heating elements 5b to 5e is It can be seen that the value is higher than that of about 10 ° C./min.
In addition, as shown in FIG. 4, the temperature difference (width) between the maximum temperature and the minimum temperature inside the muffle 3 in the soaking 90 minutes is 2.5 ° C., and the soaking is carried out in a small width. I understand.
If the sheet heating element 5a is added to the sheet heating elements 5b to 5e and heated, the average temperature rise rate can be further increased.

以上のように構成された本実施形態の熱処理装置1によれば、高出力発熱体4と面状発熱体5とによりマッフル3を加熱するため、マッフル3を目標温度まで速やかに昇温させることができる。また、面状発熱体5によりマッフル3を低出力で加熱するため、昇温後におけるマッフル3内の均熱性を向上することができる。
また、高出力発熱体4が第2及び第3面状発熱体5b,5cよりも内側(マッフル3側)に配置されているため、高出力発熱体4が放射した熱はマッフル3へ有効に伝達される。また、複数の高出力発熱体4は互いに所定の間隙を介して配置されているため、高出力発熱体4の外側に配置された第2及び第3面状発熱体5b,5cが放射した熱は、前記間隙を通過してマッフル3へ有効に伝達される。これにより、マッフル3を効果的に加熱することができ、かつマッフル3を均一に加熱することができる。
According to the heat treatment apparatus 1 of the present embodiment configured as described above, the muffle 3 is heated by the high-power heating element 4 and the planar heating element 5, so that the muffle 3 is quickly raised to the target temperature. Can do. Further, since the muffle 3 is heated by the planar heating element 5 at a low output, the heat uniformity in the muffle 3 after the temperature rise can be improved.
Further, since the high output heating element 4 is arranged on the inner side (muffle 3 side) than the second and third planar heating elements 5b and 5c, the heat radiated from the high output heating element 4 is effectively applied to the muffle 3. Communicated. Further, since the plurality of high-power heating elements 4 are arranged with a predetermined gap therebetween, the heat radiated from the second and third planar heating elements 5b and 5c arranged outside the high-output heating element 4 is obtained. Is effectively transmitted to the muffle 3 through the gap. Thereby, the muffle 3 can be heated effectively and the muffle 3 can be heated uniformly.

また、第2及び第3面状発熱体5b,5cの上下方向の長さ、及び第4及び第5面状発熱体5d,5eの左右方向の長さは、いずれもマッフル3の外径よりも長く設定されているため、面状発熱体5b〜5eはマッフル3の外径よりも幅広に形成される。したがって、面状発熱体5b〜5eによりマッフル3を効果的に加熱することができ、かつマッフル3を均一に加熱することができる。   Further, the vertical lengths of the second and third planar heating elements 5b and 5c and the horizontal lengths of the fourth and fifth planar heating elements 5d and 5e are both larger than the outer diameter of the muffle 3. The sheet heating elements 5 b to 5 e are formed wider than the outer diameter of the muffle 3. Therefore, the muffle 3 can be effectively heated by the planar heating elements 5b to 5e, and the muffle 3 can be heated uniformly.

また、面状発熱体5b〜5eは、マッフル3を挟んで左右方向の両側及び上下方向の両側にそれぞれ配置されるので、すなわち、マッフル3の外周全体を囲むように面状発熱体5b〜5eが配置されるので、マッフル3をより効果的に加熱することができ、かつマッフル3をより均一に加熱することができる。
また、マッフル3は、略円筒形状に形成され、対称性の優れた形状であるため、熱的負荷に対する機械強度に優れる。また、マッフル3は、対称性の優れた形状であるため、伝熱を均一に行うことができ、マッフル3内の均熱性をさらに向上させることができる。
Further, the planar heating elements 5b to 5e are disposed on both sides in the left and right direction and both sides in the vertical direction with the muffle 3 interposed therebetween, that is, the planar heating elements 5b to 5e so as to surround the entire outer periphery of the muffle 3. Therefore, the muffle 3 can be heated more effectively and the muffle 3 can be heated more uniformly.
Moreover, since the muffle 3 is formed in a substantially cylindrical shape and has an excellent symmetry, the mechanical strength against a thermal load is excellent. Further, since the muffle 3 has a shape with excellent symmetry, heat transfer can be performed uniformly, and the heat uniformity in the muffle 3 can be further improved.

また、高出力発熱体4は、炉本体2の上部から炉本体2内の下方に延びるように配置されており、高出力発熱体4の下端が、マッフル3内の被処理物の配置位置よりも下方に配置されているため、高出力発熱体4により、マッフル3内に配置された被処理物の全体を均一に昇温させることができる。
また、面状発熱体5における炉本体2内に臨む内面が、炉本体2の内壁面と略面一になるように配置されているため、面状発熱体5の炉本体2内に臨む内面が、炉本体2の内壁面よりも内部に突出するのを抑制することができる。
Further, the high-power heating element 4 is disposed so as to extend from the upper part of the furnace body 2 to the lower side in the furnace body 2, and the lower end of the high-power heating element 4 is located from the position of the workpiece in the muffle 3. Since the high-power heating element 4 can also raise the temperature of the entire object to be processed arranged in the muffle 3 uniformly.
Further, since the inner surface of the planar heating element 5 facing the inside of the furnace body 2 is disposed so as to be substantially flush with the inner wall surface of the furnace body 2, the inner surface of the planar heating element 5 facing the furnace body 2 is arranged. However, it can suppress projecting inside rather than the inner wall surface of the furnace main body 2.

なお、本発明は、上記各実施形態に限定されるものではない。例えば、上記本実施形態の面状発熱体は、高出力発熱体の両外側(マッフルの左右方向の両外側)、及びマッフルの上下方向の両外側にそれぞれ配置されているが、少なくとも高出力発熱体の両外側に配置されていればよい。また、高出力発熱体4及び面状発熱体5の個数は、熱処理の条件に応じて任意に設定することができる。   The present invention is not limited to the above embodiments. For example, the planar heating element of the present embodiment is disposed on both outer sides of the high-output heating element (both outer sides in the left-right direction of the muffle) and on both outer sides in the vertical direction of the muffle. It only has to be arranged on both outer sides of the body. Further, the number of the high-power heating elements 4 and the planar heating elements 5 can be arbitrarily set according to the heat treatment conditions.

1 熱処理装置
2 炉本体
3 マッフル
4 高出力発熱体
5a 第1面状発熱体
5b 第2面状発熱体
5c 第3面状発熱体
5d 第4面状発熱体
5e 第5面状発熱体
DESCRIPTION OF SYMBOLS 1 Heat processing apparatus 2 Furnace main body 3 Muffle 4 High output heating element 5a 1st planar heating element 5b 2nd planar heating element 5c 3rd planar heating element 5d 4th planar heating element 5e 5th planar heating element

Claims (5)

内部が略矩形状に形成された炉本体と、
前記炉本体内に配置されるとともに軸方向に延びて形成され、熱処理される被処理物を収容するマッフルと、
前記マッフルをその長手方向全体にわたって加熱する高出力発熱体と、
略面状に形成され、前記マッフルを前記高出力発熱体よりも低出力で加熱する面状発熱体と、を備え、
前記高出力発熱体は、前記マッフルの軸方向と略直交する一方向の両外側において、前記マッフルの軸方向に沿って互いに所定の間隙を介して複数配置されており、
前記面状発熱体は、少なくとも、前記高出力発熱体よりも前記一方向の両外側に一対配置されていることを特徴とする熱処理装置。
A furnace body whose inside is formed in a substantially rectangular shape;
A muffle that is disposed in the furnace body and extends in the axial direction and accommodates an object to be heat treated,
A high-power heating element that heats the muffle throughout its longitudinal direction;
A sheet heating element that is formed in a substantially planar shape and heats the muffle at a lower output than the high output heating element,
A plurality of the high-output heating elements are disposed on both outer sides in one direction substantially orthogonal to the axial direction of the muffle, with a predetermined gap therebetween along the axial direction of the muffle,
A pair of the planar heating elements is disposed at least on both outer sides in the one direction with respect to the high-power heating element.
前記面状発熱体における、前記マッフルの軸方向と略直交する方向であって且つ前記一方向と略直交する方向である他方向の長さが、前記マッフルの外径よりも長く設定されている請求項1に記載の熱処理装置。   In the planar heating element, the length in the other direction, which is a direction substantially orthogonal to the axial direction of the muffle and a direction substantially orthogonal to the one direction, is set longer than the outer diameter of the muffle. The heat treatment apparatus according to claim 1. 前記マッフルは略円筒形状に形成されており、
前記面状発熱体は、前記マッフルを挟んで、前記一方向の両外側、及び前記マッフルの軸方向と略直交する方向であって且つ前記一方向と略直交する方向である他方向の両外側にそれぞれ配置されている請求項1又は2に記載の熱処理装置。
The muffle is formed in a substantially cylindrical shape,
The planar heating element has both outer sides in the one direction across the muffle and both outer sides in the other direction that is a direction substantially orthogonal to the axial direction of the muffle and a direction substantially orthogonal to the one direction. The heat treatment apparatus according to claim 1, wherein the heat treatment apparatus is disposed respectively.
前記高出力発熱体は、前記炉本体の上部から当該炉本体内の下方に延びるように配置されており、
前記高出力発熱体の下端が、前記マッフル内の被処理物の配置位置よりも下方に配置されている請求項1〜3のいずれか1項に記載の熱処理装置。
The high-power heating element is disposed so as to extend from the upper part of the furnace body to the lower part in the furnace body,
The heat processing apparatus of any one of Claims 1-3 with which the lower end of the said high output heat generating body is arrange | positioned below rather than the arrangement position of the to-be-processed object in the said muffle.
前記面状発熱体における前記炉本体内に臨む内面が、前記炉本体の内壁面と略面一になるように配置されている請求項1〜4のいずれか1項に記載の熱処理装置。   The heat processing apparatus of any one of Claims 1-4 arrange | positioned so that the inner surface which faces in the said furnace main body in the said planar heating element may become substantially flush with the inner wall surface of the said furnace main body.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58193311A (en) * 1982-04-30 1983-11-11 Chugai Ro Kogyo Kaisha Ltd Batchwise heat treatment furnace
JPH04268186A (en) * 1991-02-20 1992-09-24 Murata Mfg Co Ltd Burning furnace
JPH06221764A (en) * 1993-01-27 1994-08-12 Asahi Glass Co Ltd Device for heat treatment and its heat-treated object
JPH076686U (en) * 1993-06-30 1995-01-31 光洋リンドバーグ株式会社 Continuous furnace with muffle
WO2001082342A1 (en) * 2000-04-26 2001-11-01 Wafermasters Incorporated Gas assisted rapid thermal annealing
JP2012233649A (en) * 2011-05-06 2012-11-29 Murata Mfg Co Ltd Continuous heat treatment furnace

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58193311A (en) * 1982-04-30 1983-11-11 Chugai Ro Kogyo Kaisha Ltd Batchwise heat treatment furnace
JPH04268186A (en) * 1991-02-20 1992-09-24 Murata Mfg Co Ltd Burning furnace
JPH06221764A (en) * 1993-01-27 1994-08-12 Asahi Glass Co Ltd Device for heat treatment and its heat-treated object
JPH076686U (en) * 1993-06-30 1995-01-31 光洋リンドバーグ株式会社 Continuous furnace with muffle
WO2001082342A1 (en) * 2000-04-26 2001-11-01 Wafermasters Incorporated Gas assisted rapid thermal annealing
JP2012233649A (en) * 2011-05-06 2012-11-29 Murata Mfg Co Ltd Continuous heat treatment furnace

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