JP2015224184A - Hydrogen supply system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a hydrogen supply system that can sufficiently remove the water content contained in the raw-material supplied to dehydrogenation reactor.SOLUTION: A hydrogen supply system 100 includes: a MCH tank 1 for storing MCH; a dehydrogenation reactor 3 for producing hydrogen-containing gas by dehydrogenating MCH supplied from the MCH tank 1; and a water content remover 14A for removing the water content contained in MCH supplied from the MCH tank 1 to dehydrogenation reactor 3.

Description

  The present invention relates to a hydrogen supply system that supplies hydrogen.

  As a conventional hydrogen supply system, for example, one disclosed in Patent Document 1 is known. The hydrogen supply system of Patent Document 1 includes a tank for storing a raw material aromatic hydrocarbon hydride, a dehydrogenation reactor for obtaining hydrogen by dehydrogenating a raw material supplied from the tank, and a reactor. A gas-liquid separator that gas-liquid separates the obtained hydrogen and a hydrogen purifier that purifies the gas-liquid separated hydrogen are provided.

JP 2006-232607 A

  In the hydrogen supply system as described above, moisture contained in the raw material supplied to the dehydrogenation reactor may be a problem. For example, when the raw material is supplied to the dehydrogenation reactor in a state where the raw material contains moisture, it is considered that a catalyst such as Pt is dissolved by the water and the pores where the catalyst is arranged are blocked. In this case, the contact efficiency between the raw material and the catalyst is lowered, and the progress of the dehydrogenation reaction of the raw material may be insufficient. Moreover, when the water | moisture content exceeding a specification value is contained in the hydrogen after dehydrogenation, there exists a possibility that the quality of the hydrogen as a product may fall.

  The present invention has been made to solve the above problems, and an object of the present invention is to provide a hydrogen supply system capable of sufficiently removing moisture contained in a raw material supplied to a dehydrogenation reactor.

  In order to solve the above-mentioned problems, a hydrogen supply system according to the present invention is a hydrogen supply system that supplies hydrogen, by dehydrogenating a storage unit that stores raw materials and a raw material supplied from the storage units. A dehydrogenation reaction unit that obtains a hydrogen-containing gas and a moisture removal unit that removes moisture contained in the raw material supplied from the storage unit to the dehydrogenation reaction unit.

  This hydrogen supply system includes a water removal unit that removes water contained in the raw material supplied from the storage unit to the dehydrogenation reaction unit. Since the raw material is supplied to the dehydrogenation reaction unit with the moisture removed sufficiently by this moisture removal unit, the contact efficiency between the raw material and the catalyst can be secured, and the dehydrogenation reaction of the raw material in the dehydrogenation reaction unit can be sufficiently performed. Can be advanced. Moreover, the water | moisture content contained in hydrogen after dehydrogenation can be reduced, and the quality of the hydrogen as a product can be ensured favorable.

  The hydrogen supply system is disposed between the storage unit and the dehydrogenation reaction unit, and further includes a vaporization unit for vaporizing the raw material, and the moisture removal unit is provided by an adsorbent disposed between the storage unit and the vaporization unit, You may remove the water | moisture content in the raw material which is a liquid. In this case, moisture in the raw material that is liquid can be suitably removed by the adsorbent.

  The hydrogen supply system is further disposed between the storage unit and the dehydrogenation reaction unit, and further includes a vaporization unit for vaporizing the raw material, and the moisture removal unit is provided by an adsorbent disposed between the vaporization unit and the dehydrogenation reaction unit. The moisture in the raw material that is a gas may be removed. In this case, moisture in the raw material which is a gas can be suitably removed by the adsorbent.

  The hydrogen supply system removes the dehydrogenation product from the hydrogen-containing gas obtained in the dehydrogenation reaction unit, obtains a purified gas containing high-purity hydrogen, and the purified gas purified in the hydrogen purification unit from the outside And a cooling unit that cools the hydrogen supplied from the hydrogen purification unit to the supply unit, wherein the moisture removing unit includes at least part of the cooling medium from the cooling unit. The storage may be cooled upon receipt of the supply. In this case, by efficiently cooling the storage unit using the cooling medium used in the cooling unit, water in the raw material stored in the storage unit can be frozen and separated / removed.

  According to the present invention, water contained in the raw material supplied to the dehydrogenation reactor can be sufficiently removed.

It is a block diagram which shows the structure of the hydrogen supply system which concerns on 1st Embodiment. It is a principal block diagram which shows an example of a structure of the water | moisture-content removal part in the hydrogen supply system shown in FIG. It is a principal part block diagram which shows the other example of a structure of the water | moisture-content removal part in the hydrogen supply system shown in FIG. It is a principal part block diagram which shows an example of a structure of the water | moisture-content removal part in the hydrogen supply system which concerns on 2nd Embodiment.

Hereinafter, preferred embodiments of a hydrogen supply system according to the present invention will be described in detail with reference to the drawings. In the following description, the same or corresponding parts are denoted by the same reference numerals, and redundant description is omitted.
[First Embodiment]

  FIG. 1 is a block diagram showing the configuration of the hydrogen supply system according to the first embodiment. The hydrogen supply system 100 according to the first embodiment uses an organic compound (liquid at normal temperature) as a raw material. In the process of hydrogen purification, the dehydrogenated product (organic compound (liquid at room temperature)) obtained by dehydrogenating the organic compound (liquid at room temperature) as a raw material is removed. Examples of the raw material organic compound include organic hydride. An organic hydride is preferably a hydride obtained by reacting a large amount of hydrogen produced in a refinery with an aromatic hydrocarbon. In addition, the organic hydride is not limited to an aromatic hydrogenated compound, and there is a system of 2-propanol (hydrogen and acetone are generated). The organic hydride can be transported to the hydrogen supply system 100 as a liquid fuel by a tank lorry as in the case of gasoline. In this embodiment, methylcyclohexane (hereinafter referred to as MCH) is used as the organic hydride. In addition, hydrides of aromatic hydrocarbons such as cyclohexane, dimethylcyclohexane, ethylcyclohexane, decalin, methyldecalin, dimethyldecalin, and ethyldecalin can be used as organic hydrides (Note that aromatic compounds have a particularly high hydrogen content. This is a preferred example). The hydrogen supply system 100 can supply hydrogen to a fuel cell vehicle (FCV) or a hydrogen engine vehicle. The present invention can also be applied to the production of hydrogen from liquid hydrocarbon raw materials such as natural gas mainly composed of methane, LPG mainly composed of propane, or gasoline, naphtha, kerosene, and light oil.

  In the present embodiment, the hydrogen supply system 100 will be described using a hydrogen station that supplies high-purity hydrogen to the FCV 10 as an example. As shown in FIG. 1, a hydrogen supply system 100 according to this embodiment includes an MCH tank (storage unit) 1, a vaporizer (vaporization unit) 2, a dehydrogenation reactor (dehydrogenation reaction unit) 3, and a gas-liquid separator. 4, a toluene tank 5, a hydrogen purifier (hydrogen purifying unit) 6, a compressor 7, a pressure accumulator 8, a dispenser (supply unit) 9, a heat source 11, a cold heat source 12, and a cold heat source (cooling unit) 13. . Further, the hydrogen supply system 100 includes lines L1 to L9. In the present embodiment, an example will be described in which MCH is employed as a raw material, and the dehydrogenation product removed in the process of hydrogen purification is toluene. In practice, not only toluene but also unreacted MCH and a small amount of by-products and impurities are present, but in this embodiment, the same behavior as toluene is exhibited when mixed with toluene. Therefore, in the following description, what is referred to as “toluene” includes unreacted MCH and by-products.

  Lines L1 to L9 are flow paths through which MCH, toluene, hydrogen-containing gas, off-gas, or high-purity hydrogen passes. Line L1 connects MCH tank 1 and vaporizer 2. Line L2 connects vaporizer 2 and dehydrogenation reactor 3. The line L3 connects the dehydrogenation reactor 3 and the gas-liquid separator 4. The line L4 connects the gas-liquid separator 4 and the hydrogen purifier 6. The line L5 connects the gas / liquid separator 4 and the toluene tank 5. The line L6 connects the hydrogen purifier 6 and the compressor 7. The line L7 connects the hydrogen purifier 6 and the vaporizer 2. The line L7 functions as a recycle line for refluxing off-gas discharged from the hydrogen purifier 6 to the upstream side of the dehydrogenation reactor 3. In the following description, the line L7 will be referred to as “recycle line L7”. The line L8 connects the compressor 7 and the pressure accumulator 8. Line L9 connects pressure accumulator 8 and dispenser 9.

  The MCH tank 1 is a tank that stores MCH as a raw material. MCH transported from outside by a tank lorry or the like is stored in the MCH tank 1. MCH stored in the MCH tank 1 is supplied to the vaporizer 2 via a line L1 by a compressor (not shown).

  The vaporizer 2 is a device that vaporizes MCH supplied from the MCH tank 1 via an injector or the like. The vaporized MCH is supplied to the dehydrogenation reactor 3 through the line L2 together with the off gas supplied from the hydrogen purifier 6 through the recycle line L7.

  The dehydrogenation reactor 3 is a device that obtains hydrogen by dehydrogenating MCH. That is, the dehydrogenation reactor 3 is a device that extracts hydrogen from MCH by a dehydrogenation reaction using a dehydrogenation catalyst. The dehydrogenation catalyst is not particularly limited, and is selected from, for example, a platinum catalyst, a palladium catalyst, and a nickel catalyst. These catalysts may be supported on a carrier such as alumina, silica and titania. The organic hydride reaction is a reversible reaction, and the direction of the reaction changes depending on the reaction conditions (temperature, pressure) (restricted by chemical equilibrium). On the other hand, the dehydrogenation reaction is a reaction in which the number of molecules always increases by an endothermic reaction. Therefore, high temperature and low pressure conditions are advantageous. Since the dehydrogenation reaction is an endothermic reaction, the dehydrogenation reactor 3 is supplied with heat from the heat source 11 via a heat medium. The dehydrogenation reactor 3 has a mechanism capable of exchanging heat between the MCH flowing in the dehydrogenation catalyst and the heat medium from the heat source 11. Any heat source 11 may be adopted as long as it can heat the dehydrogenation reactor 3. For example, the heat source 11 may directly heat the dehydrogenation reactor 3. For example, the MCH supplied to the dehydrogenation reactor 3 is heated by heating the vaporizer 2 or the lines L1 and L2. Also good. Further, the heat source 11 may heat both the dehydrogenation reactor 3 and the MCH supplied to the dehydrogenation reactor 3. For example, a burner or an engine can be adopted as the heat source 11. The hydrogen-containing gas taken out by the dehydrogenation reactor 3 is supplied to the gas-liquid separator 4 via the line L3. The hydrogen-containing gas in the line L3 is supplied to the gas-liquid separator 4 in a state where the liquid toluene is contained as a mixture.

  The gas-liquid separator 4 is a tank that separates toluene from the hydrogen-containing gas. The gas-liquid separator 4 gas-liquid separates hydrogen as a gas and toluene as a liquid by storing a hydrogen-containing gas containing toluene as a mixture. The gas-liquid separator 4 is cooled by a cooling medium from the cold heat source 12. The gas-liquid separator 4 has a mechanism capable of exchanging heat between the hydrogen-containing gas in the gas-liquid separator 4 and the cooling medium from the cold heat source 12. As long as the cold-heat source 12 can cool the gas-liquid separator 4, what kind of thing may be employ | adopted. For example, a cooler such as a chiller can be employed as the cold heat source 12. The toluene separated by the gas-liquid separator 4 is supplied to the toluene tank 5 via the line L5. The hydrogen-containing gas separated by the gas-liquid separator 4 is supplied to the hydrogen purifier 6 via the line L4. When the hydrogen-containing gas is cooled, a part of the gas (toluene) is liquefied and can be separated from the gas (hydrogen) that is not liquefied by the gas-liquid separator 4. The efficiency of the separation is improved when the gas is at a low temperature, and the liquefaction of toluene further proceeds when the pressure is increased.

  The toluene tank 5 is a tank that stores liquid toluene separated by the gas-liquid separator 4. The toluene stored in the toluene tank 5 can be recovered and used.

  The hydrogen purifier 6 removes a dehydrogenation product (toluene in this embodiment) from the hydrogen-containing gas obtained by the dehydrogenation reactor 3 and gas-liquid separated by the gas-liquid separator 4. Thereby, the hydrogen purifier 6 purifies the hydrogen-containing gas to obtain high-purity hydrogen gas (high-purity hydrogen). The obtained high-purity hydrogen is supplied to the line L6, and the off gas containing hydrogen and a dehydrogenation product is discharged to the recycle line L7. The off gas supplied to the recycle line L7 is supplied to the vaporizer 2 via a compressor (not shown), and is supplied to the dehydrogenation reactor 3 via the line L2.

  The hydrogen purifier 6 differs depending on the hydrogen purification method employed. Specifically, when membrane separation is used as the hydrogen purification method, the hydrogen purifier 6 is a hydrogen separation apparatus including a hydrogen separation membrane, and is a PSA (Pressure Swing Adsorption) method. Alternatively, when a TSA (Temperature swing adsorption) method is used, the adsorption / removal apparatus includes a plurality of adsorption towers that store adsorbents that adsorb impurities.

  The case where the hydrogen purifier 6 uses membrane separation will be described. In this method, a hydrogen-containing gas pressurized to a predetermined pressure by a compressor (not shown) is permeated through a membrane heated to a predetermined temperature, thereby removing dehydrogenated products and high-purity hydrogen (purified gas). ) Can be obtained. The pressure of the permeated gas that has permeated the membrane is lower than the pressure before permeating the membrane. On the other hand, the pressure of the non-permeating gas that has not permeated the membrane is substantially the same as the predetermined pressure before permeating the membrane. At this time, the non-permeating gas that has not permeated the membrane corresponds to the off-gas of the hydrogen purifier 6.

  The type of membrane applied to the hydrogen purifier 6 is not particularly limited, and is a porous membrane (separated by molecular flow, separated by surface diffusion flow, separated by capillary condensation, or separated by molecular sieving. Etc.) and non-porous membranes can be applied. Examples of membranes applied to the hydrogen purifier 6 include metal membranes (PbAg, PdCu, Nb, etc.), zeolite membranes, inorganic membranes (silica membrane, carbon membrane, etc.), polymer membranes (polyimide membrane, etc.). Can be adopted.

  The hydrogen recovery rate of the hydrogen purifier 6 by membrane separation is 70 to 90%. The separation factor of “hydrogen / toluene” of the membrane used in the hydrogen purifier 6 is preferably 1000 or more, and more preferably 10,000 or more.

  A case where the PSA method is adopted as a method for removing the hydrogen purifier 6 will be described. The adsorbent used in the PSA method has the property of adsorbing toluene contained in the hydrogen-containing gas under high pressure and desorbing the adsorbed toluene under low pressure. The PSA method utilizes such properties of the adsorbent. That is, by setting the inside of the adsorption tower at a high pressure, toluene contained in the hydrogen-containing gas is adsorbed and removed by the adsorbent to obtain high-purity hydrogen gas (purified gas). If the adsorption function of the adsorbent in the adsorption tower decreases due to adsorption, the toluene adsorbed on the adsorbent is desorbed and a part of the purified gas removed is caused to flow backward by lowering the pressure in the adsorption tower. By removing the desorbed toluene from the inside of the adsorption tower, the adsorption function of the adsorbent is regenerated (at this time, the hydrogen containing at least hydrogen and toluene discharged by removing toluene from the inside of the adsorption tower) The gas corresponds to the off-gas from the hydrogen purifier 6).

  The method for adjusting the pressure in the adsorption tower is not particularly limited, and can be adjusted for each adsorption tower by, for example, closing a valve provided for each adsorption tower. Therefore, for the adsorption tower in which the adsorption function of the adsorbent is lowered, the adsorbent is regenerated by reducing the pressure and off-gas is discharged. On the other hand, with respect to the remaining adsorption tower, toluene contained in the hydrogen-containing gas is removed by being adsorbed to the adsorbent by pressurization and high-purity hydrogen is obtained. When the adsorbent regeneration for the adsorption tower being regenerated is completed, the adsorption tower starts to remove toluene by pressurization and obtains high-purity hydrogen. On the other hand, for all or part of the adsorption tower from which toluene has been removed, regeneration of the adsorbent is started by reducing the pressure and off-gas is discharged. Thus, by repeatedly switching the adsorption tower for regeneration and the adsorption tower for removing toluene, the hydrogen supply system 100 as a whole can obtain high-purity hydrogen and off-gas continuously. The hydrogen recovery rate when the hydrogen purifier 6 employs the PSA method is about 60 to 90%, depending on the number of adsorption towers.

  A case where the TSA method is employed as a method for removing the hydrogen purifier 6 will be described. The adsorbent used in the TSA method has the property of adsorbing toluene contained in the hydrogen-containing gas at room temperature and desorbing the adsorbed toluene at high temperature. The TSA method utilizes such properties of the adsorbent. That is, by setting the inside of the adsorption tower to room temperature, toluene contained in the hydrogen-containing gas is adsorbed and removed by the adsorbent to obtain high-purity hydrogen gas (high-purity hydrogen). If the adsorption function of the adsorbent in the adsorption tower is reduced due to adsorption, the toluene adsorbed on the adsorbent is desorbed by raising the temperature in the adsorption tower, and a part of the high-purity hydrogen that has been removed is backflowed. By removing the desorbed toluene from the adsorption tower, the adsorption function of the adsorbent is regenerated (at this time, at least hydrogen and hydrogen containing toluene discharged by removing toluene from the adsorption tower) The contained gas corresponds to the off-gas from the hydrogen purifier 6).

  The method for adjusting the temperature in the adsorption tower is not particularly limited. For example, the temperature can be adjusted for each adsorption tower by an operation such as switching ON / OFF of a heater provided for each adsorption tower. Therefore, for the adsorption tower in which the adsorption function of the adsorbent is lowered, the adsorbent is regenerated and the off-gas is discharged by raising the temperature. On the other hand, with respect to the remaining adsorption towers, the toluene contained in the hydrogen-containing gas is removed by adsorbing the adsorbent while maintaining the room temperature, and high-purity hydrogen is obtained. When the adsorbent regeneration for the adsorption tower being regenerated is completed, the removal of toluene is started and high purity hydrogen is obtained for the adsorption tower by keeping the inside of the adsorption tower at room temperature. On the other hand, for all or part of the adsorption tower from which toluene has been removed, regeneration of the adsorbent is started and the off-gas is discharged by raising the temperature in the adsorption tower. Thus, by repeatedly switching the adsorption tower for regeneration and the adsorption tower for removing toluene, the hydrogen supply system 100 as a whole can obtain high-purity hydrogen and off-gas continuously. The hydrogen recovery rate when the hydrogen purifier 6 employs the TSA method is about 60 to 90%, depending on the number of adsorption towers.

  The compressor 7 puts the high purity hydrogen obtained in the hydrogen purifier 6 into a high pressure state. The compressor 7 makes high-purity hydrogen into a high-pressure state at a pressure of 20 to 90 MPa, for example. The compressor 7 is in a high pressure state so that high purity hydrogen can be supplied to the FCV (hydrogen consuming apparatus) 10 and then supplied to the pressure accumulator 8 via the line L8. In addition, according to the target pressure, it is good also as a structure which provides multiple compression units which compress, and performs compression in steps.

  The pressure accumulator 8 stores high purity hydrogen in a high pressure state. The high purity hydrogen stored in the pressure accumulator 8 is supplied to the FCV 10 by the dispenser 9 via the line L9. Since the pressure accumulator 8 can store a certain amount of high-purity hydrogen in the hydrogen supply system 100, hydrogen can be stably supplied to the FCV 10. However, since the pressure accumulator 8 is not essential for supplying hydrogen, it may be omitted. The high purity hydrogen passing through the line L9 is cooled to, for example, about −40 ° C. by the cooling medium from the cold heat source 13. The line L9 has a mechanism capable of exchanging heat between the high purity hydrogen flowing through the line L9 and the heat medium from the cold heat source 13. Any cooling source 13 may be used as long as it can cool the high purity hydrogen flowing through the line L9. For example, a cooler such as a chiller can be employed as the cold heat source 13.

  Subsequently, a moisture removal mechanism of the raw material in the hydrogen supply system 100 described above will be described.

  In the hydrogen supply system 100, moisture contained in the MCH (raw material) supplied to the dehydrogenation reactor 3 may be a problem. For example, when MCH is supplied to the dehydrogenation reactor 3 in a state where moisture is contained in MCH, it is considered that a catalyst such as Pt is dissolved by moisture and the pores where the catalyst is arranged are blocked. In this case, the contact efficiency between the MCH and the catalyst may be reduced, and the progress of the MCH dehydrogenation reaction may be insufficient. Moreover, when the water | moisture content exceeding a specification value is contained in the hydrogen after dehydrogenation, there exists a possibility that the quality of the hydrogen supplied to FCV10 from the dispenser 9 as a product may fall.

  In response to such a problem, the hydrogen supply system 100 is provided with a moisture removing unit 14A as shown in FIGS. In the present embodiment, the moisture removing unit 14A is configured by an adsorbent 15 provided on a line L1 connecting the MCH tank 1 and the vaporizer 2, for example, as shown in FIG. As the adsorbent 15, for example, a molecular sieve which is a kind of zeolite can be used. The adsorbent 15 is preferably an adsorbent that adsorbs molecules having an effective diameter of less than 0.5 nm from the viewpoint of preventing the adsorption of hydrocarbons (MCH in this system). The adsorbent 15 is disposed on the line L1 while being stored in an adsorption tower, for example, and removes moisture from the liquid MCH supplied from the MCH tank 1 to the vaporizer 2. It is preferable that the moisture in the MCH supplied to the vaporizer 2 is less than the standard value (for example, 5 ppm) of the residual amount of moisture in hydrogen as a product by the adsorbent 15. As the adsorbent 15, other materials such as activated carbon may be used as long as the adsorbent adsorbs molecules having an effective diameter of less than 0.5 nm.

  Note that the water removal unit only needs to be arranged upstream of the dehydrogenation reactor 3, that is, between the MCH tank 1 and the dehydrogenation reactor 3. For example, as in the water removal unit 14B shown in FIG. The adsorbent 16 may be provided in a line L2 connecting the vaporizer 2 and the dehydrogenation reactor 3. As the adsorbent 16, for example, the same adsorbent 15 can be used. The adsorbent 16 removes moisture from the gaseous MCH vaporized by the vaporizer 2.

As described above, the hydrogen supply system 100 includes the water removal unit 14A or the water removal unit 14B that removes the water contained in the MCH supplied from the MCH tank 1 to the dehydrogenation reactor 3. Since the MCH is supplied to the dehydrogenation reactor 3 with the moisture removed sufficiently by the moisture removal units 14A and 14B, the contact efficiency between the MCH and the catalyst can be ensured, and the dehydration of MCH in the dehydrogenation reactor 3 can be ensured. The elementary reaction can be sufficiently advanced. Moreover, the water | moisture content contained in hydrogen after dehydrogenation can be reduced, and the quality of the hydrogen as a product can be ensured favorable. In the hydrogen supply system 100, moisture is not introduced and generated in each component after the vaporizer 2, and therefore, the residual amount of moisture in the MCH supplied to the vaporizer 2 is used as the residual amount of moisture in hydrogen as a product. The quality of hydrogen as a product can be easily improved by reducing it below the standard value.
[Second Embodiment]

  FIG. 4 is a principal block diagram showing an example of the configuration of the moisture removing unit in the hydrogen supply system according to the second embodiment. The hydrogen supply system 200 according to the second embodiment is different from the first embodiment in that the moisture removing unit 14C is configured using a cooling medium used in the cold heat source 13 without using an adsorbent.

  More specifically, the moisture removing unit 14C includes a line L10 that supplies at least a part of the cooling medium used in the cold heat source 13 to the MCH tank 1 side, as shown in FIG. The pipe constituting the line L10 is wound around an outer wall portion of the MCH tank 1 so as to cover the MCH tank 1, for example. Thereby, the moisture removing unit 14C directly cools the MCH tank 1 with the cooling medium flowing through the line L10, and freezes the moisture in the MCH stored in the MCH tank 1. Since the frozen water settles in the MCH tank 1, the water can be easily separated and removed from the MCH. In addition, it is preferable to arrange a heat insulating material around the MCH tank 1 and the pipe wound around the MCH tank 1 from the viewpoint of stably maintaining the temperature of the MCH in the MCH tank 1 below a certain temperature.

  In such a hydrogen supply system 200 as well, since MCH is supplied to the dehydrogenation reactor 3 in a state where moisture is sufficiently removed by the moisture removing unit 14C, the contact efficiency between the MCH and the catalyst can be ensured, and the dehydrogenation reaction is performed. The dehydrogenation reaction of MCH in the vessel 3 can sufficiently proceed. Moreover, the water | moisture content contained in hydrogen after dehydrogenation can be reduced, and the quality of the hydrogen as a product can be ensured favorable. Furthermore, since the MCH tank 1 can be efficiently cooled using the cooling medium used in the cold heat source 13, the water in the MCH stored in the MCH tank 1 can be frozen, separated and removed.

  The present invention is not limited to the above embodiment. For example, in the above-described embodiment, the configuration in which the moisture removing units 14A, 14B, and 14C are separately provided is illustrated, but two or more of the moisture removing units 14A, 14B, and 14C are combined and provided in the hydrogen supply system. Also good. Moreover, in the said embodiment, although the hydrogen station for FVC was illustrated as a hydrogen supply system, the hydrogen supply system for distributed power supplies, such as a household power supply and an emergency power supply, may be sufficient, for example.

  DESCRIPTION OF SYMBOLS 1 ... MCH tank (storage part), 2 ... Vaporizer (vaporization part), 3 ... Dehydrogenation reactor (dehydrogenation reaction part), 6 ... Hydrogen refiner (hydrogen purification part), 9 ... Dispenser (supply part), DESCRIPTION OF SYMBOLS 10 ... FCV (hydrogen consuming apparatus), 13 ... Cold heat source (cooling part), 14A-14C ... Water | moisture-content removal part, 15, 16 ... Adsorbent, 100,200 ... Hydrogen supply system.

Claims (4)

A hydrogen supply system for supplying hydrogen,
A storage section for storing raw materials;
A dehydrogenation reaction unit that obtains a hydrogen-containing gas by dehydrogenating the raw material supplied from the storage unit;
A hydrogen supply system comprising: a water removal unit that removes water contained in the raw material supplied from the storage unit to the dehydrogenation reaction unit. A vaporizing unit disposed between the storage unit and the dehydrogenation reaction unit and vaporizing the raw material;
The hydrogen supply system according to claim 1, wherein the moisture removing unit removes moisture in the raw material that is a liquid by using an adsorbent disposed between the storage unit and the vaporizing unit. A vaporizing unit disposed between the storage unit and the dehydrogenation reaction unit and vaporizing the raw material;
2. The hydrogen supply system according to claim 1, wherein the moisture removing unit removes moisture in the raw material that is a gas by an adsorbent disposed between the vaporizing unit and the dehydrogenation reaction unit. A hydrogen purification unit for removing a dehydrogenation product from the hydrogen-containing gas obtained in the dehydrogenation reaction unit to obtain a purified gas containing high-purity hydrogen;
A supply unit for supplying the purified gas purified by the hydrogen purification unit to an external hydrogen consumption device;
A cooling unit for cooling the hydrogen supplied from the hydrogen purification unit to the supply unit,
The said moisture removal part is a hydrogen supply system as described in any one of Claims 1-3 which receives the supply of at least one part of a cooling medium from the said cooling part, and cools the said storage part.

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