JP2015095489A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2015095489A JP2015095489A JP2013232448A JP2013232448A JP2015095489A JP 2015095489 A JP2015095489 A JP 2015095489A JP 2013232448 A JP2013232448 A JP 2013232448A JP 2013232448 A JP2013232448 A JP 2013232448A JP 2015095489 A JP2015095489 A JP 2015095489A
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- semiconductor chip
- relay substrate
- adhesive layer
- conductive
- protruding electrode
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Abstract
Description
[第1の実施の形態に係る半導体装置の構造]
図1は、第1の実施の形態に係る半導体装置を例示する図であり、図1(a)は断面図、図1(b)は中継基板のみを例示する平面図である。図1を参照するに、半導体装置1は、支持体10と、接着層15と、半導体チップ20と、接着層25と、中継基板30と、接着層35と、半導体チップ40と、ボンディングワイヤ51〜53とを有する。
図3及び図4は、第1の実施の形態に係る半導体装置の製造工程を例示する図である。まず、図3に示す工程では中継基板30を作製する。具体的には、図3(a)に示すように、最終的に個片化されて基体31となるシリコンウェハ310を準備する。但し、シリコンウェハに代えて、樹脂基板やガラス基板等を準備してもよい。シリコンウェハ310は薄型化されてなく、その厚さは、例えば600〜800μm程度とすることができる。なお、Cはシリコンウェハ310等を切断する位置(以降、切断位置Cとする)を示している。シリコンウェハ310は、切断位置Cにより、図1(b)に示すような中継基板30となる矩形状の複数の領域に区分されている。
第1の実施の形態の変形例では、第1の実施の形態とは異なる中継基板を用いる例を示す。なお、第1の実施の形態の変形例において、既に説明した実施の形態と同一構成部品についての説明は省略する。
第2の実施の形態では、半導体チップ40の裏面に印加するのと同一の電圧を半導体チップ20の裏面にも印加する例を示す。なお、第2の実施の形態において、既に説明した実施の形態と同一構成部品についての説明は省略する。
第3の実施の形態では、半導体チップ40の裏面に印加するのと異なる電圧を半導体チップ20の裏面に印加する例を示す。なお、第3の実施の形態において、既に説明した実施の形態と同一構成部品についての説明は省略する。
10 支持体
11、31 基体
12 配線
15、25、25B、35、45 接着層
20、40 半導体チップ
21、41 半導体基板
22、42 パッド
30、30A、30B、30C 中継基板
31A、31C 金属板
32、32B 導電部
33、33B、33C 突起電極
34 貫通電極
51、52、53、54 ボンディングワイヤ
60 バンプ
70 アンダーフィル樹脂
310 シリコンウェハ
320 金属膜
Claims (8)
- 配線を備えた支持体と、
前記支持体上に積層された第1半導体チップと、
前記第1半導体チップ上に非導電性接着層を介して積層された中継基板と、
前記中継基板上に非導電性接着層を介してフェイスアップ状態で積層された第2半導体チップと、を有し、
前記中継基板は、導電部と、前記導電部と電気的に接続された突起電極と、を備え、
前記導電部は、前記中継基板の前記第2半導体チップと対向する面側に接続された金属線を介して前記支持体上の配線と電気的に接続され、
前記突起電極は、前記非導電性接着層を貫通して前記第2半導体チップの非回路形成面と接して導通している半導体装置。 - 前記第1半導体チップは、前記支持体上にフェイスダウン状態で積層され、
前記中継基板は、第2非導電性接着層を介して前記第1半導体チップ上に積層され、
前記中継基板は、前記導電部と電気的に接続され前記第2非導電性接着層を貫通して前記第1半導体チップの非回路形成面と接して導通する第2突起電極を備えている請求項1記載の半導体装置。 - 前記第1半導体チップは、前記支持体上にフェイスダウン状態で積層され、
前記第1半導体チップと前記中継基板との間に配置され、第2非導電性接着層を介して前記第1半導体チップ上に積層された第2中継基板を有し、
前記第2中継基板は、
前記導電部と絶縁された第2導電部と、
前記第2導電部と電気的に接続され前記第2非導電性接着層を貫通して前記第1半導体チップの非回路形成面と接して導通する第2突起電極と、を備え、
前記第2導電部は、金属線を介して前記支持体上の前記配線とは電位の異なる他の配線と電気的に接続されている請求項1記載の半導体装置。 - 前記中継基板は、樹脂で形成された基体を有し、
前記導電部は、前記基体の前記第2半導体チップと対向する面側に形成された導体層である請求項1又は3記載の半導体装置。 - 前記中継基板は、樹脂で形成された基体を有し、
前記導電部は、前記基体の両面に形成された導体層であり、
前記基体の両面に形成された導体層は、前記基体に形成された貫通電極を介して電気的に接続されている請求項2記載の半導体装置。 - 前記中継基板の前記突起電極が形成されている面は、全面が導電性である請求項1乃至5の何れか一項記載の半導体装置。
- 突起電極33は径が太い部分と径が細い部分とを有するバンプであり、
前記径が太い部分側が前記中継基板と接続され、前記径が細い部分側が半導体チップと接続されている請求項1乃至6の何れか一項記載の半導体装置。 - 前記第2半導体チップの平面形状は、前記中継基板の平面形状よりも大きい請求項1乃至7の何れか一項記載の半導体装置。
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JP2013110188A (ja) * | 2011-11-18 | 2013-06-06 | Semiconductor Components Industries Llc | 半導体装置及びその製造方法 |
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