JP2014194460A - Opaque plate, display board, and display system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an opaque plate, a display board, and a display system capable of obtaining such a visual effect that a pattern to be visually recognized can be changed according to an illumination condition, an observation position or the illumination condition and the observation position, without depending on a display panel which has a number of restrictions.SOLUTION: An opaque plate 10 and a display board 20 include an antireflection minute ruggedness formed region 2A and an antireflection minute ruggedness non-formed region 2B which are formed in a pattern shape on at least one surface 1a of an opaque substrate 1. The antireflection minute ruggedness formed region includes antireflection minute ruggedness 3. The antireflection minute ruggedness is formed of a minute protrusion group 4G that is an assembly of a large number of minute protrusions 4, and a maximum inter-protrusion distance Dmax of minute protrusions with respect to a maximum wavelength λmax of visible light satisfies Dmax≤λmax. Preferably, the minute protrusion group includes a high/low minute protrusion group in which a low-height minute protrusion is surrounded by a high-height minute protrusion. The display system includes this display board and a light source lighting up the display board.

Description

  The present invention relates to an opaque plate, a display plate, and a display system using the same.

Conventionally, a colored pattern layer is formed on the surface of an opaque substrate that constitutes walls, partitions, etc. by printing colored ink, pasting a printed sheet or a cut colored sheet, etc. It is done to display. When the pattern is a character, a message or the like is displayed. When the pattern is a graphic, a logo mark or the like is displayed. When the pattern is a pattern, a design or the like is displayed. And by these displays, advertisements such as merchandise, stores, companies, and services are displayed, or various information such as doorway, smoking cessation, and business are displayed. In the perspective view of FIG. 14, the colored pattern layer 6 is formed on one surface of the opaque substrate 1, and this is used as the display board 40.
Furthermore, various techniques for enhancing the visual effect with respect to the display by the colored pattern layer 6 have been proposed (Patent Document 1, Patent Document 2, and Patent Document 3).

Japanese Patent Laid-Open No. 6-12007 Japanese Utility Model Publication No. 3-45932 Utility Model Registration No. 3152336

However, since the conventional display board 40 as illustrated in FIG. 14 has a simple configuration of pattern formation, the same pattern is visually recognized by an observer at any position. It was impossible to make the pattern visible only from a specific position.
Further, for example, the same pattern is visually recognized by all the observers who observe the display board 40 installed on the wall. For example, it is invisible to an observer viewed from the front, and only visible to an observer viewed from an oblique direction. As such, it was not possible to selectively display to observers at different positions.

  On the other hand, as means capable of changing the pattern to be displayed, means using various display panels such as a liquid crystal display panel has been adopted at present. However, the display panel is still expensive and expensive compared to the printed pattern. In addition, display panels are actually subject to various restrictions such as construction methods and installation space for drive units, and power supply is required, and the power consumption is much higher than that of mere illuminated signs. It becomes. On the other hand, in the case of a signboard with lighting, a display rich in change could not be made.

  That is, an object of the present invention is to provide an opaque plate, a display, and a display pattern that can be changed according to the illumination condition, the observation position, or the illumination condition and the observation position, regardless of the display panel having many restrictions. It is to provide a board and display system.

Therefore, in the present invention, an opaque plate, a display plate, and a display system having the following configurations are provided.
(1) An antireflection fine unevenness forming region formed in a pattern on one surface of an opaque substrate, and an antireflective fine unevenness forming region other than the antireflection fine unevenness forming region. Have
The antireflection fine unevenness forming region has antireflection fine unevenness on the one surface of the opaque substrate,
The antireflective fine unevenness non-formation region has a smooth surface on the one surface of the opaque substrate,
The antireflection fine irregularities are formed by a group of microprojections that are an assembly of a plurality of microprojections,
The maximum protrusion distance Dmax of the minute protrusions is Dmax ≦ λmax with respect to the maximum wavelength λmax of visible light.
Opaque board.
(2) The microprojection group is an aggregate of microprojections having a non-constant altitude, and a low altitude microprojection having a relatively low altitude and a high altitude microprojection having an altitude relatively higher than the low altitude microprojection. The opaque plate according to (1), further comprising a group of high and low microprojections surrounded by the high altitude microprojections.
(3) The anti-reflective fine irregularities include, as the fine protrusions, multimodal microprotrusions having a plurality of vertices at the top, and the multimodal microprotrusions are formed by radial grooves formed on the top. The opaque plate according to the above (1) or (2), wherein is divided at each vertex.
(4) The opaque plate according to any one of (1) to (3), having a colored pattern layer on the one surface of the opaque substrate.

(5) The display board which displays by the pattern of the reflected light intensity difference in the surface of the side which has the said antireflection fine unevenness formation area | region of the opaque board in any one of said (1)-(4).
(6) A display system comprising: the display plate of (5); and a light source that irradiates visible light onto a surface of the display plate having the antireflection fine unevenness forming region.

  According to the present invention, it is possible to obtain a visual effect capable of changing a visually recognized pattern depending on the illumination condition, the observation position, or the illumination condition and the observation position, regardless of the display panel having many restrictions.

Sectional drawing (a), a top view (b), a partial enlarged sectional view (c), and a partial enlarged sectional view of a pattern-shaped antireflection fine unevenness forming region showing an embodiment of an opaque plate and a display plate according to the present invention (D). The photograph for demonstrating the calculation method of the largest protrusion distance Dmax. The photograph which attached | subjected the maximum point for demonstrating the calculation method of the largest distance Dmax between protrusions. The photograph which attached the Delaunay figure for demonstrating the calculation method of the largest distance Dmax between protrusions. Sectional drawing (a) and a perspective view (b) explaining a high and low minute protrusion group. A photograph showing high and low microprojections. The perspective view (a) and top view (b) explaining the groove | channel of the top part of a multimodal microprotrusion. It is a photograph which shows multimodal microprotrusion, and shows 2 vertex (a), 3 vertex (b), and 4 vertex (c). Sectional drawing which illustrates the deformation | transformation form (colored pattern layer) of the opaque board and display board by this invention. The perspective view which shows the basic composition of the display system by this invention. The figure explaining the display change obtained with the display system by this invention. The perspective view (a) and top view (b) which show one Embodiment of the display system by this invention. The figure explaining the display variable example visually recognized by embodiment of FIG. The perspective view which shows an example of the conventional display board.

    Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the drawings are conceptual diagrams, and the scale relations, aspect ratios, and the like of components may be exaggerated as appropriate for convenience of explanation.

<< 1 >> Definition of Terms Here, definitions of main terms used in the present invention will be described.

“Fine” in “microprotrusions” means that the maximum inter-projection distance Dmax of “microprotrusions” is small such that Dmax ≦ λmax with respect to the maximum wavelength λmax of visible light.
The “plate surface” is one surface or the other surface of the opaque substrate 1 or a surface parallel to these surfaces. In FIG. 1, the surface is parallel to the XY plane. When the opaque substrate 1 is an uneven plate or the like and the “plate surface” is an uneven surface, it means an envelope surface of the uneven surface, and the envelope surface is a surface parallel to the XY plane. Further, when the “plate surface” is a curved surface such as the opaque substrate 1 is a curved surface, this means the curved surface.
“Plan view” means viewing from the direction of the normal line set on the “plate surface”. In FIG. 1, the Z-axis direction is the normal direction.
“Light” means light in a narrow sense, that is, visible light. The wavelength band of visible light is usually 380 to 780 nm, although it depends somewhat on the individual difference of the observer, illumination conditions, and the like.
“Transparent”, “opaque”, “reflection (prevention)” and the like mean performance and characteristics with respect to visible light.

<< 2 >> Opaque Plate and Display Plate First, the opaque plate and the display plate according to the present invention will be described with reference to an embodiment shown in FIG.

The opaque plate 10 and the display plate 20 according to the present invention shown in the cross-sectional view of FIG. 1 (a), the plan view of FIG. 1 (b), and the partially enlarged cross-sectional views of FIG. 1 (c) and FIG. Anti-reflective property which is a region other than the opaque substrate 1 and the anti-reflective fine unevenness forming region 2A and the anti-reflective fine unevenness forming region 2A formed in a pattern on one surface 1a of the opaque substrate 1 And a fine unevenness non-formation region 2B.
1A is a cross-sectional view taken along line CC in the plan view of FIG. The partial enlarged cross-sectional view of FIG. 1C is a cross-sectional view paying attention to the portion of the antireflection fine unevenness 3 of the antireflection fine unevenness forming region 2A formed in the pattern shape in FIG. The partial enlarged cross-sectional view 1 (d) is a cross-sectional view focusing on the microprojection imparting layer 5 in FIG.

The antireflection fine unevenness forming region 2 </ b> A formed in a pattern is a region having the antireflection fine unevenness 3 on the surface 1 a of the opaque substrate 1. The anti-reflection fine unevenness 3 is formed by a microprojection group 4G that is an aggregate of a plurality of microprojections 4. The anti-reflective fine unevenness 3 is anti-reflective with respect to visible light when the maximum protrusion distance Dmax of the fine protrusions 4 is Dmax ≦ λmax with respect to the maximum wavelength λmax of visible light. .
Moreover, it is preferable that each microprotrusion 4 has a shape in which a cross-sectional area when cut along a cutting plane parallel to the plate surface of the opaque substrate 1 decreases as the distance from the opaque substrate 1 increases.

In this embodiment, as shown in FIG. 1C and FIG. 1D, the minute protrusion 4 is not formed on the surface of one surface 1 a of the opaque substrate 1, but one of the opaque substrate 1. It is formed on the surface of the microprojection imparting layer 5 laminated on the surface 1a. The microprojection providing layer 5 further includes a microprojection forming layer 5A having the microprojections 4 on the surface, a forming base material layer 5B used as a base material when forming the microprojection forming layer 5A, and a microprojection providing layer. And a bonding layer 5C for bonding the forming base material layer 5B to the one surface 1a of the opaque substrate 1 in order to bond 5 to the one surface 1a of the opaque substrate 1.
On the other hand, the anti-reflective fine unevenness non-formation region 2 </ b> B is the surface itself of the one surface 1 a of the opaque substrate 1.
In the following, “antireflection fine unevenness formation region 2A” is abbreviated as “formation region 2A” or “region 2A”, and “antireflection fine unevenness formation region 2B” is “non-formation” as appropriate. It is abbreviated as “region 2B” or “region 2B”.

  In this embodiment, the opaque substrate 1 is a white resin plate, the microprojection forming layer 5A is a cured layer of an opaque ultraviolet curable acrylic resin, and the forming base layer 5B is a polyester resin film. The bonding layer 5C is an opaque acrylic pressure-sensitive adhesive layer. As the microprojection imparting layer 5, a laminated film obtained by laminating the microprojection forming layer 5 </ b> A, the forming base layer 5 </ b> B, and the bonding layer 5 </ b> C is cut into a predetermined pattern shape and bonded to a predetermined position on the opaque substrate 1. The opaque plate 10 and the display plate 20 in the present embodiment are manufactured by pasting with the layer 5C.

  With the above configuration, the opaque plate 10 and the display plate 20 in the present embodiment have many restrictions due to the antireflection fine unevenness forming region 2A and the antireflection fine unevenness forming region 2B formed in a pattern. Regardless of this, it is possible to obtain a visual effect of changing the visually recognized pattern depending on the illumination condition, the observation position, or the illumination condition and the observation position.

  Hereinafter, each component will be described in detail.

<< Opaque substrate 1 >>
The opaque substrate 1 is not particularly limited as long as it is an opaque substrate. For example, non-metallic inorganic plates made of ceramics such as various ceramics, cement, natural stone, metal plates made of aluminum, iron, copper, cedar, These include wooden boards made of firewood, firewood, etc., resin boards, and glass boards such as opaque frosted glass. A specific example of the resin plate is a resin plate made of a resin such as an acrylic resin, a polycarbonate resin, or a styrene resin. With the resin plate, the curved surface is also easy. The opaque substrate 1 may be colored chromatic if it is opaque. One surface 1a and the other surface 1b of the non-transparent substrate 1 are shaped like a concavo-convex glass such as a haze glass or a satin glass in addition to a smooth and flat surface such as a mirror surface. An uneven surface may be used.
The opaque substrate 1 may be used in such a way as to make use of the pattern of the opaque substrate 1 itself, such as a stone pattern of the natural stone itself, or a wood grain pattern of the wooden board itself.
The thickness of the opaque substrate 1 is, for example, about 0.5 to 20 mm depending on the application.

<< Anti-reflective fine unevenness formation region 2A and Anti-reflective fine unevenness formation region 2B >>
The antireflection fine unevenness forming region 2A is an antireflection property region formed on the one surface 1a of the opaque substrate 1 in a pattern as shown in FIGS. 1 (a) and 1 (b). In the antireflection fine unevenness forming region 2 </ b> A, the antireflection fine unevenness 3 is provided on the surface as the opaque plate 10 or the display plate 20. The antireflection fine unevenness 3 imparts antireflection properties for visible light. Visible light incident on the antireflection fine irregularities 3 is not substantially reflected and absorbed.

The antireflection fine unevenness non-formation region 2B is formed on the surface on the one surface 1a side of the opaque substrate 1 on which the antireflection fine unevenness formation region 2A is formed in a pattern, except for the antireflection fine unevenness formation region 2A. It is an area. In other words, the antireflection fine unevenness non-formation region 2B is formed in a complementary pattern with an opposite pattern like the antireflection fine unevenness formation region 2A like a negative image and a positive image in terms of photographs. This is a region that is not antireflective. Accordingly, since the antireflection fine unevenness non-formation region 2B is also in a pattern shape, it can be said to be “an antireflection fine unevenness formation region formed in a pattern shape”.
In the present embodiment, the antireflection fine unevenness forming region 2A is formed on one surface 1a of the opaque substrate 1 and not formed on the other surface 1b. On the one surface 1a of the opaque substrate 1 on which the antireflection fine unevenness forming region 2A is formed, the region is a region other than the antireflection fine unevenness forming region 2A.

In the present invention, the anti-reflective fine unevenness forming region 2A exhibits anti-reflective properties because the micro-projections 4 of the anti-reflective fine unevenness 3 to such an extent that they can be visually discerned by the eyes prevent reflection of visible light. This means that the performance has been enhanced. On the other hand, the state that is not anti-reflective exhibited by the anti-reflective fine unevenness non-formation region 2B means that the anti-reflective performance is higher than the state in which the anti-reflective performance is enhanced by the microprotrusions 4 so that it can be visually discerned. Means low. Therefore, the antireflection fine unevenness forming region 2A exhibits antireflection properties. The antireflection fine unevenness forming region 2A has relatively higher antireflection performance than the antireflection fine unevenness forming region 2B. It means that visual recognition is possible, and it does not mean that the reflectance with respect to visible light is below a specific value. However, in general, the difference in light reflectance between the region 2A and the region 2B is preferably 2% or more and more preferably 5% or more after visual recognition between the region 2A and the region 2B. In addition, the light reflectance of the surface of the antireflection fine unevenness forming region 2A is usually preferably 1% or less, and more preferably 0.1% or less.
In this embodiment, the antireflection fine unevenness forming region 2A is formed on one surface 1a of the opaque substrate 1 with a microprojection imparting layer 5 as shown in FIG. 3 is formed. However, in the present invention, in addition to such a configuration, the antireflection fine unevenness 3 may be formed directly on the one surface 1a of the opaque substrate 1 without the microprojection providing layer 5. Yes (not shown).

[Anti-reflective fine irregularity non-formation region 2B having a smooth surface]
The antireflective fine unevenness non-formation region 2B has a smooth surface in addition to the fact that the antireflective fine unevenness 3 is not formed on the surface in the region. Here, the smooth surface means a surface having a surface roughness Rz ≦ 50 nm (0.05 μm) when expressed by a 10-point average roughness Rz defined in JIS B 0601 (1994). Such a smooth surface has a surface roughness sufficiently smaller than the minimum projection height Have = 88 nm of the microprojections 4 constituting the antireflection fine irregularities 3 in this embodiment described later, and the light reflection of the surface is also a mirror surface. Since it becomes a reflection, it looks like a highly light-reflecting mirror surface in terms of visual appearance.
In the present embodiment, the antireflection fine unevenness non-forming region 2B has a smooth surface in the entire region. For this reason, the pattern of the antireflection fine unevenness forming region 2A can be made more conspicuous as compared with a form in which the entire region of the antireflection fine unevenness forming region 2B is not a smooth surface.
In the present invention, the anti-reflective fine unevenness non-formation region 2B includes a smooth surface in a part rather than the entire surface, and the indented portion of the anti-reflective fine unevenness non-formation region is not matted, for example. However, for example, a part of the uneven surface such as a glass surface of an uneven cloudy glass plate or a tile surface of an uneven tile may be included. A pattern different from the pattern formed by the antireflection fine unevenness forming region 2A and the antireflection fine unevenness non-forming region 2B can also be expressed by the unevenness pattern of the uneven surface area.
In this embodiment, the antireflective fine unevenness non-formation region 2B is formed by making one surface 1a of the opaque substrate 1 itself a smooth surface as shown in FIG. However, in the present invention, in addition to such a form, a layer having a smooth surface is applied by coating a coating film on one surface 1a of the opaque substrate 1 or by bonding a resin film, a metal foil or the like. By doing so, the antireflection fine unevenness non-formation region 2B can also be configured (not shown).

<Anti-reflective fine unevenness 3>
The antireflection fine unevenness 3 is an unevenness formed by the microprojection group 4G which is an aggregate of a plurality of microprojections 4 and exhibiting antireflection performance with respect to visible light.

<< Fine protrusion 4 >>
The minute protrusion 4 is a protrusion whose maximum protrusion distance Dmax is Dmax ≦ λmax with respect to the maximum wavelength λmax of the visible light wavelength band.
In the present invention, as described above, the maximum wavelength λmax of visible light is 780 nm. On the other hand, the minimum wavelength λmin of visible light is 380 nm. This condition is a condition that exhibits an antireflection effect for light having the maximum wavelength λmax in the visible light wavelength band. The design of a specific value for the maximum protrusion distance Dmax will be described later.
As a result, the antireflection fine unevenness 3 having the microprojection group 4G which is an aggregate of the microprojections 4 has antireflection performance for visible light.

[Maximum distance Dmax]
The maximum inter-projection distance Dmax is equal to the arrangement period when the microprotrusions 4 are regularly arranged with a constant period.
In this embodiment, the microprotrusions 4 do not have a constant arrangement period. Accordingly, when attention is paid to the individual microprojections 4, the distance from the microprojections 4 arranged adjacent to the periphery of the microprojections 4 is not constant but varies. Thus, when the distance between adjacent microprotrusions 4 is not constant and varies, the maximum value of the distance between adjacent microprotrusions 4 is set as the “maximum interprotrusion distance”. Could also do. However, in practice, in order to find a set of two microprotrusions 4 that give the maximum value, it is necessary to measure the entire region of the antireflection fine unevenness 3, which is not realistic. In addition, when using such a method, for some reason, a very small number of abnormal values that protrude specifically compared to the distance between other adjacent microprotrusions are adopted as the maximum interprotrusion distance, and the true overall This is because the characteristics may not be reflected. Therefore, in the present invention, the “maximum inter-protrusion distance Dmax” is defined using a statistical method. This will be described below.

(1) First, with respect to the anti-reflective fine unevenness 3, an atomic force microscope (AFM) or a scanning electron microscope (SEM) is used to make a microscopic measurement in a plane parallel to the plate surface using an atomic force microscope (AFM) or a scanning electron microscope (Scanning Electron Microscope: SEM). The arrangement of the protrusions 4 is detected, the distance between each adjacent minute protrusion 4 is measured from the in-plane arrangement, and the maximum inter-protrusion distance Dmax is statistically calculated therefrom. The photograph in FIG. 2 is an enlarged photograph actually obtained by an atomic force microscope.
In the present invention, all the photographs in FIG. 3 and FIG. 4 including FIG. 2 are photographs in plan view when the minute protrusions 4 are captured from the normal direction with respect to the plate surface.
In the present embodiment, an atomic force microscope is used to detect the in-plane arrangement of the microprotrusions 4, but in the present invention, a detection method other than the above may be employed.

  The area of the region for detecting the arrangement of the minute protrusions 4 is the average distance and standard deviation of the maximum protrusion distance Dmax involved in the antireflection performance required for the product specifications of the opaque plate 10 or the display plate 20 using a statistical method. Therefore, it is sufficient if the area is the number of microprojections 4 that can be calculated within an allowable error range. For example, the number of microprojections 4 is 200 or more, and 500 or more for higher accuracy.

  (2) Next, the maximum point of the height of each minute protrusion 4 is obtained. The measurement direction of the height is the Z-axis direction in FIG. 1, and the reference height serving as a reference for the height is arbitrary. However, when waviness is present on the surface connecting the valleys of the microprojections 4, the height from which the waviness is removed is taken as the reference height. When waviness exists, the absolute height that is larger in the plate surface direction than the dimension of the maximum inter-protrusion distance Dmax and that is not an altitude difference from the reference height of the maximum point of the fine protrusion 4 changes. The removal of the undulation is calculated, for example, in an area sufficient for the average value of the heights of the plurality of valley bottoms to converge with respect to the height of the valley bottom between the microprotrusions 4, and the height of the average value is set as the reference height. By moving the area of the area for calculating the average value, it is possible to obtain a reference height from which undulation in an area larger than the area is removed.

The measurement of the maximum point can be obtained by image processing the image data of the in-plane arrangement of the microprojections 4. In the present embodiment, the maximum point is obtained in units of 1 nm.
At this time, if there is noise in the image data and an erroneous detection of the maximum point is expected, it is preferable to remove the noise by applying, for example, a low-pass filter based on Gaussian characteristics to the image data.
FIG. 3 is an enlarged photograph in which black spots are added to the maximum points detected by image processing of the image data of the enlarged photograph of FIG.

Here, the distance between adjacent maximum points will be referred to as “distance between adjacent maximum points”.
Assuming that the distance between adjacent maximum points is the distance between adjacent microprotrusions 4, a Delaunay diagram can be used as one method for obtaining the distance between adjacent maximum points.
A Delaunay diagram is obtained by performing Voronoi division using each local maximum as a generating point, defining generating points adjacent to each other in Voronoi regions as adjacent generating points, and connecting the adjacent generating points with line segments 3 It is a net-like figure consisting of a square aggregate. Each triangle is called a Delaunay triangle, and each side of the triangle corresponds to a line segment connecting adjacent generating points and is called a Delaunay line.
By the way, the Delaunay diagram has a dual relationship with the Voronoi diagram. Voronoi division means that a plane is divided by a net-like figure composed of a set of closed polygons defined by perpendicular bisectors of line segments (Droney lines) connecting between adjacent generating points. A network figure obtained by Voronoi division is a Voronoi diagram, and each closed region is a Voronoi region.
4 is an enlarged photograph in which the Delaunay line of the Delaunay diagram created from FIG. 3 is superimposed on FIG. 3 as a white line segment.
The length of the Delaunay line corresponds to the distance between adjacent maximum points.

(3) Next, the distance between the adjacent maximum points is measured, and the average value Dave and the standard deviation σ are obtained. The maximum inter-protrusion distance Dmax is calculated from the average value Dave and the standard deviation σ.
In the present invention, the maximum interprotrusion distance Dmax is calculated by the following equation [1].

  Maximum protrusion distance Dmax = Dave + 2σ [1]

As can be seen from the equation [1], the maximum inter-protrusion distance Dmax is not the maximum value obtained by measuring the distance between adjacent maximum points. Statistically, of the total number of measured distances between adjacent maximum points, about 95% is in the Dave ± 2σ region, so about 2.5%, which is half of the remaining 5%, is the maximum. Some of them exceed the interprotrusion distance Dmax. Nevertheless, approximately 97.5% indicates a distance between adjacent maximum points that is equal to or less than the maximum inter-protrusion distance Dmax.
Even if it is assumed that the wavelength of visible light targeted for antireflection is only 780 nm, which is the maximum wavelength λmax, the microprojections 4 of about 2.5% have a small contribution to antireflection. However, unless the microprotrusions 4 that give the distance between adjacent maximum points that exceed λmax are consciously formed, the microprojections 4 that give the distance between adjacent maximum points that exceed the maximum wavelength λmax. Are scattered throughout the plane. Accordingly, the distance between adjacent maximum points as a whole, including the distance between adjacent maximum points exceeding the maximum wavelength λmax, is averaged within the region, and generally, the adjacent maximum exceeding the maximum wavelength λmax is exceeded. Even when the distance between the points is about 2.5% as described above, the antireflection performance can be obtained over the entire region where the microprojections 4 are formed with respect to the maximum wavelength λmax of visible light.
In the present embodiment, the minute protrusions 4 are formed by anodizing treatment and etching treatment, and as can be seen from the photograph in FIG. 2, the distance between adjacent maximum points is extremely small compared to the others. The protrusion 4 is not actually localized.
As described above, the maximum inter-projection distance Dmax can be statistically set as the above equation [1] in terms of the antireflection effect brought about by the microprojections 4.

  Incidentally, in the example of the photograph of FIG. 2, the average value Dave = 158 nm, the standard deviation σ = 38 nm, and the maximum interprotrusion distance Dmax = 234 nm. Therefore, the antireflection effect can be obtained over the entire wavelength band of visible light.

The maximum inter-protrusion distance Dmax is the minimum wavelength λmin of visible light when the wavelength of visible light to be subject to reflection is the entire visible light region.
It is preferable that Dmax ≦ λmin.
In general, when the minimum wavelength that is the object of antireflection in visible light is Λmin,
Dmax ≦ Λmin may be satisfied,
Preferably, Dmax ≦ 0.8Λmin,
More preferably, Dmax ≦ 0.5Λmin.
As described above, when Dmax is set, the antireflection effect can be obtained more reliably.
Note that Λmin is not necessarily Λmin = λmin = 380 nm. The actual value of Λmin is determined in accordance with the minimum wavelength of the visible light band for which the antireflection effect is actually obtained in design, depending on the individual case. For example, when the antireflection effect is obtained for all wavelengths in the visible light wavelength band, Λmin = λmin = 380 nm under the above design conditions. In addition, when an antireflection effect is obtained for light having a wavelength of 500 nm or longer, Λmin = 500 nm is set under the above design conditions.

  The lower limit of the maximum inter-projection distance Dmax is 50 nm, more preferably 100 nm. This is because if the lower limit of the maximum protrusion distance Dmax is less than the above value, the antireflection effect may be impaired.

[Calculation of maximum inter-protrusion distance Dmax when multimodal microprotrusions 4M are present]
In the microprotrusions 4, there may be a multimodal microprotrusion 4M having a plurality of local maximum points (vertices) at the top. The multimodal microprotrusions 4M will be described in detail later. When the multimodal microprotrusions 4M exist, one microprotrusion 4M gives a plurality of local maximum points. The number of points does not match. As shown in the photographs of FIGS. 2 and 3, the subscript “4M” is an example of the multimodal microprotrusion 4M. 2 and 3, the multi-modal microprotrusion 4M at the lower center of the drawing is an example having two vertices, and the multi-modal micro-projection 4M on the right side of the drawing is an example having three vertices. On the other hand, the microprotrusion 4 on the upper side of the drawing is an example of a single-peak microprotrusion 4S having one apex.

Therefore, in calculating the maximum inter-protrusion distance Dmax, when the multimodal microprotrusions 4M are present, the following may be performed. Also in the present embodiment, the following is performed.
For one multimodal microprotrusion 4M, the distance between adjacent maximum points obtained from a plurality of local maximum points belonging to one multimodal microprotrusion 4M is the adjacent maximum point obtained from the plurality of single-peak microprojections 4S. Clearly, the distance is significantly different. Therefore, about 5 to 20 adjacent single-peaked microprojections 4S are selected and sampled, and values that clearly deviate from the numerical range of a plurality of values of the distance between adjacent maximum points in the sampled extraction. Is excluded. For example, a value less than 1/2 of the average value of the distances between adjacent maximum points in the sampled sample is excluded. In the present embodiment, the average value after reducing the contribution of the multimodal microprotrusions 4M is less than the value of 56 μm, which is about 1/3 of the average value Dave = 158 nm. Excluded. The value of 56 μm is a numerical value that becomes a boundary portion between the peak of the frequency distribution with respect to the average value Dave = 158 nm mainly caused by the single-peak microprojections 4S and the peak of the frequency distribution caused by the multi-peak microprojections 4M. is there.
The above-mentioned maximum inter-projection distance Dmax = 234 nm is a value obtained by reducing the contribution of the multimodal microprotrusions 4M in this way.

[Average protrusion height Have]
The average protrusion height Have is an average value of the heights H of the individual micro protrusions 4. From the image data obtained by the atomic force microscope used to calculate the maximum inter-protrusion distance Dmax or the three-dimensional coordinate data that is the basis of this image data, the height H (hereinafter referred to as “maximum”) of each microprotrusion 4 is obtained. The point height "is also simply referred to as" height "or" altitude "), from which the average protrusion height Have can be obtained. Here, similarly to the above-described maximum protrusion distance Dmax, it is not necessary to measure the entire region of the antireflection fine unevenness forming region 2A. The sample can be statistically sampled, and the average value can be used as the average protrusion height Have.
In this embodiment, the average protrusion height Have = 178 nm and the standard deviation σ = 30 nm.
Incidentally, the minimum protrusion height Hmin of the minute protrusions 4 constituting the antireflection fine unevenness 3 of the present embodiment can be regarded statistically as Have-3σ = 88 nm. This value is larger than the upper limit (Rz = 50 nm) of the Rz value of the smooth surface, and the protrusion height is sufficiently different from the optical behavior (high light reflectivity) of the smooth surface even with the minute protrusion 4 near the minimum protrusion height Hmin. It is considered that optical characteristics (low photoreactivity) can be expressed.
At this time, when there is a multimodal microprotrusion 4M in which microprotrusions having the same buttocks have a plurality of vertices, the altitude is the highest among a plurality of maximum points of the multimodal microprotrusion 4M. The high maximum point may be measured as the projection height of the multimodal microprojection 4M. Further, in the multi-modal microprotrusions 4M, when the heights of all local maximum points are the same, the height of the microprotrusions 4M is defined as the height of the common local maximum points.
The ratio Have / Dmax of the average protrusion height Have to the maximum protrusion distance Dmax is about 0.5 to 2.0.

[High and low minute projection group 4GHL]
FIG. 5 is a diagram schematically showing the high and low microprojection group 4GHL. FIG. 5A is a cross-sectional view, and FIG. 5B is a perspective view. The cross-sectional view of FIG. 5A is a cross-sectional view including a broken line that connects the maximum points of the heights of adjacent microprotrusions 4 in plan view. The Z-axis direction is the height direction of the minute protrusions 4. The photograph of FIG. 6 is an enlarged photograph by an atomic force microscope showing the high and low minute protrusion group 4GHL.

In this way, the microprojection group 4G is an aggregate of microprojections 4 whose altitudes are not constant, and a low altitude microprojection 4L having an altitude lower than the relatively adjacent microprojections 4 and the low altitude microprojections 4L. A group of high and low micro-projections 4GHL that includes a high-altitude micro-projection 4H that is adjacent and relatively higher than the low-altitude micro-projections 4L, and that is surrounded by the high-altitude micro-projections 4H. Preferably it comprises. This is because the effect of improving the scratch resistance can be expected by the high and low microprojection group 4GHL.
In the “microprojections 4 whose altitudes are not constant”, “altitude” means “height” as an altitude difference between the reference height of the valley bottom and the height of the local maximum point. This corresponds to a height H of 4.
The heights of the plurality of high-altitude microprotrusions 4H surrounding the low-altitude microprotrusions 4L need not be the same.
Both the low-altitude microprotrusions 4L and the high-altitude microprotrusions 4H may be multimodal microprotrusions 4M described later. When the low-altitude microprotrusion 4L or the high-altitude microprotrusion 4H is a multimodal microprotrusion 4M, the altitude is captured by the maximum height among a plurality of maximum points existing on one apex. .

  In the high and low microprojection group 4GHL, in the manufacturing process of the mold for forming the microprojections 4 to be described later, the variation in the depth of the fine holes manufactured in the (B) anodizing process is increased. Thus, it can be formed. Specifically, the variation can be increased by increasing the applied voltage (formation voltage) of the anodizing treatment.

  When an external force is applied to the antireflection fine unevenness forming region 2A by the high and low microprojection group 4GHL, the high altitude microprotrusion 4H receives the external force before the surrounding low altitude microprojections 4L and is sacrificed and damaged. By doing so, damage to the low-altitude microprotrusions 4L can be prevented. As a result, the local antireflection performance deterioration of the antireflection fine unevenness forming region 2A can be alleviated, and as a result, the effect of improving the scratch resistance can be reduced. can get.

The ratio of the number of high and low microprojections 4GHL to the total number of microprojections 4 is preferably 10% or more, more preferably 30% or more, and even more preferably 50% or more. This is because if the ratio is less than the above value, the effect of improving the scratch resistance may not be sufficiently exhibited.
If the ratio of the high and low microprojections 4GHL becomes too high, the ratio of the high altitude microprotrusions 4H becomes too high, and a small number of high altitude microprotrusions 4H sacrifices damage and wear due to external force, resulting in low altitude microprojections The effect of protecting the protrusion 4L is no longer achieved. For this reason, the ratio of the high and low microprojections 4GHL to the total microprojections 4 is preferably 90% or less, more preferably 80% or less, and even more preferably 70% or less.
The distribution of the high and low micro projection groups 4GHL in the entire micro projection group 4G is random and distributed over the entire surface in which the micro projection groups 4G are formed (high and low micro projection groups per unit area). The number of 4GHL) is preferably distributed uniformly. This is because if the distribution density of the high and low microprojection group 4GHL is unevenly distributed in a specific region, the high and low microprojection group 4GHL cannot sufficiently exhibit the effect of improving scratch resistance by sacrificing damage caused by external force. Because of that.

[Multimodal microprotrusions 4M]
As illustrated in FIGS. 7 and 8, the multimodal microprotrusion 4 </ b> M is a microprotrusion 4 having a plurality of apexes at the top as a result of one microprotrusion 4 having one or more grooves 4 g at the top. Means. If the vertex is expressed as a peak, having a plurality of vertices means having a plurality of peaks, and such a microprojection 4 will be referred to as a multimodal microprojection 4M. In other words, the multi-modal microprotrusions 4M mean microprotrusions 4 in which one microprotrusion 4 has two or more apexes (maximum points) at the top, resulting in one or more grooves 4g on the top. To do. The groove 4g can be said to be a recessed portion between the apexes at one apex.
In the present embodiment, as shown in FIG. 7 and FIG. 8, the multi-peak microprotrusions 4M are arranged so that the peaks related to the respective vertices surround the center of the protrusions, and the grooves forming the boundaries between the peaks. It is divided by 4g, and each peak (vertex) has a shape arranged by grooves 4g formed radially from the center. Such an arrangement form of peaks is preferable in order to achieve an effect of exhibiting scratch resistance.

  FIG. 7 is a diagram schematically showing the multimodal microprotrusions 4M. FIG. 7A is a perspective view, and FIG. 7B is a plan view. The Z-axis direction is the height direction of the minute protrusions 4. The photograph of FIG. 8 is an enlarged photograph showing the multimodal microprotrusions 4M. 8A and 8C are enlarged photographs taken with a scanning electron microscope, and FIG. 8B is an enlarged photograph taken with an atomic force microscope. FIG. 8A shows a bimodal microprotrusion 4M having two vertices by a top groove 4g, and FIG. 8B shows a trimodal microprojection 4M having three vertices by a top groove 4g. FIG. 8C shows a four-peak microprotrusion 4M having four vertices by a groove 4g at the top.

Multimodality means that a certain microprotrusion 4 has a plurality of peaks, that is, vertices or maximum points in terms of height, when it is regarded as one peak. One mountain has one hem. Therefore, it can be said that the multimodal microprotrusions 4M are microprotrusions 4 in which a plurality of local maximum points (tops) existing at the apex share one skirt. Between the plural maximum points (tops), there is a groove 4g.
Thus, it is preferable that the microprotrusion group 4G includes the multimodal microprotrusions 4M. This is because the multimodal microprotrusions 4M can be expected to improve the scratch resistance.

As will be described later, the multi-peak microprotrusion 4M has a fine hole formed in the proximity of the (B) anodizing process in the forming step for forming the microprotrusion 4 as described below. (C) It is formed by adjusting the conditions of (B) anodizing treatment step and (C) etching treatment step so as to be integrally formed by the etching treatment step.

Compared with the single-peak microprojection 4S, the multi-peak microprojection 4M has a hem thickness (the mechanical strength of the microprojection 4 corresponding to the maximum projection distance Dmax, that is, the antireflection performance) relative to the dimension at the top. Is relatively thick. For this reason, it can be said that the multimodal microprotrusions 4M exhibit the same antireflection performance as compared with the single-peak microprotrusions 4S, and also have better mechanical strength. As a result, it is considered that the multi-peak microprotrusions 4M can hardly cause scratches in the antireflection fine unevenness forming region 2A.
In addition, when an external force is applied to the antireflection fine unevenness formation region 2A by the multimodal microprotrusions 4M, the highest peak among the plurality of apexes existing at the top first receives the external force. Thus, the sacrificial damage can prevent damage to the apex that is lower than the highest peak. As a result, local deterioration of the antireflection performance of the antireflection fine unevenness forming region 2A can be alleviated, and consequently the display by the antireflection fine unevenness forming region 2A formed in a pattern can be reduced. The effect of improving scratch resistance is obtained. In addition, sufficient antireflection performance can be exhibited.

The ratio of the number of multimodal microprotrusions 4M to the total number of microprotrusions 4 is preferably 10% or more, more preferably 30% or more, and even more preferably 50% or more. This is because if the ratio is less than the above value, the effect of improving the scratch resistance may not be sufficiently exhibited.
However, if the ratio of the multimodal microprotrusions 4M is increased to some extent, the effect of the multimodal microprotrusions 4M is saturated and the manufacturing conditions of the mold become difficult. From this viewpoint, the ratio is 90% or less. It is preferable to do.

[Method of forming microprojections 4]
In the present invention, the method for forming the microprojections 4 is not particularly limited. In the present embodiment, a molding die is created by alternately repeating anodizing treatment and etching treatment of aluminum, and the resin layer (microprojection forming layer 5A) is formed using the ultraviolet curable resin and the 2P method with this molding die. Microprojections 4 were formed on the surface.

  The formation of the high and low microprojections 4GHL and the multimodal microprojections 4M can be controlled by adjusting the conditions and the number of repetitions of the anodizing treatment and the etching treatment.

[Manufacturing method of mold by anodic oxidation and etching]
Here, a method for producing a mold that can be employed in the present invention will be described. By using this molding die, the antireflection fine unevenness 3 having the microprojection group 4G as an aggregate of the microprojections 4 on the surface can be formed by a known molding method such as 2P method or hot press method.

In the manufacturing method of the shaping | molding die demonstrated below, (A) type | mold prototype preparation process, (B) anodizing process process, (C) 3 steps of an etching process process are included, and after the said (A) process, The step (B) and the step (C) are alternately repeated a plurality of times. That is,
(A) Process → {(B) Process → (C) Process} _N → {(B) Process} _M
It becomes. Here, N is an integer of 2 or more, M is 0 or 1, and “→” is a symbol indicating that the steps are performed in this order.

(A) Mold prototype preparation process:
In the mold master preparation step, first, the surface of the base material as the mold surface is made into a super mirror surface (electropolishing) by using an electrolytic composite polishing method in which electrolytic elution action and abrasion action by abrasive grains are combined. Next, aluminum is sputtered onto the ultra-mirror surface to form a high purity aluminum layer having a purity of 99% or more, preferably 99.9% or more, and a prototype is produced. The mold prototype is a flat plate shape, a cylindrical shape, a columnar shape, or the like.

(B) Anodizing treatment step:
In the anodizing treatment step, fine holes are produced on the aluminum surface as the mold surface of the above-described prototype by an anodizing method, and the produced fine holes are further dug. Various methods for aluminum can be applied to the anodizing treatment itself. For example, a carbon rod, a stainless plate, etc. can be used for the negative electrode. Various neutral or acidic solution can be used as the solution. For example, a sulfuric acid aqueous solution, an oxalic acid aqueous solution, a phosphoric acid aqueous solution, or the like can be used as the solution.
The size and depth of the fine holes can be controlled by adjusting the liquid temperature, applied voltage, processing time, and the like.

(C) Etching process:
In the etching process, the hole diameter of the fine hole produced in the anodizing process is enlarged, and the hole shape is shaped so that the hole diameter becomes smooth and gradually smaller in the depth direction. As the etching solution, various etching solutions applied to this type of treatment can be used. For example, a sulfuric acid aqueous solution, an oxalic acid aqueous solution, a phosphoric acid aqueous solution, or the like can be used as the etching solution.

By repeating the (B) anodic oxidation treatment step and the (C) etching treatment step alternately a plurality of times, the desired microprojections 4 can be produced.
The shape of the microprojections 4 is (A) the purity (impurity amount) and crystal grain size of aluminum on the mold surface in the mold master preparation process, and (B) the various processes in the anodizing process and (C) etching process. Conditions can be controlled by adjusting.

(Generation of high and low microprojections 4GHL and multimodal microprojections 4M)
The high and low microprojections 4GHL and the multimodal microprotrusions 4M can be generated by varying the shape and depth of the fine holes produced in the (B) anodizing process. One means is to control the applied voltage in the (B) anodizing process. As the applied voltage is increased, the variation increases. Further, the applied voltage may be varied so as to include a voltage value that causes a large variation. For example, a variable voltage obtained by adding an AC voltage to a DC voltage is used. For example, the applied voltage is a variable voltage that varies between 15 and 35V.

(Formation method of multimodal microprotrusions 4M)
The method for forming the multimodal microprotrusions 4M will be further described in detail.
When forming a microhole group corresponding to the microprotrusion group 4G on the metal mold surface by an anodic oxidation method, it is known that the interval between adjacent holes is proportional to the applied voltage (Japanese Patent Laid-Open No. 2003-43203). Gazettes). In order to form the microprotrusion group 4G including the multimodal microprotrusions 4M as shown in FIG. 2 by utilizing this phenomenon, the conditions of the (B) anodizing process in the above process, particularly the applied voltage Setting is important.
That is, the combination of [(B) anodizing treatment step → (C) etching step] is performed three or more times, and the applied voltage in each step in each (B) anodizing treatment step is changed.

In particular,
In the first anodic oxidation treatment step, the minimum voltage in each step is a voltage that becomes an adjacent hole interval corresponding to 1/3 to 1/8 of the maximum inter-projection distance Dmax of the microprojection 4 to be finally obtained. To do.
-In the second and subsequent anodizing treatment steps, the voltage is an integral multiple of the voltage of the first anodizing treatment step and sequentially higher than the applied voltage of the previous anodizing treatment step (about 2 to 3 times). As a voltage, the interval between adjacent holes is made wider than the hole formed previously. At the same time, the depth of the hole is made deeper than the previously formed hole.
Accordingly, when the hole diameter is widened in the etching process after each anodizing process, the depths formed by the subsequent anodic oxidation are deep and widely spaced. Absorb and merge shallow and closely spaced holes. As a result, a plurality of deepest points (valley bottoms) corresponding to a plurality of vertices (peaks) of the multimodal microprotrusions 4M are formed at the bottom of the deep hole having a wide opening diameter.
Such an anodizing treatment step is paired with the immediately subsequent etching treatment step and performed once or more.
In the final anodic oxidation process, the voltage is returned to the low voltage of the first anodic oxidation process, and the depth of the deepest point (valley bottom) is increased.

Examples of each process including processing conditions include the following processes.
(A) Process for preparing the mold prototype;
A prototype is prepared by depositing an aluminum thin film having a thickness of 29.99 μm and a purity of 99.99% on the surface of an aluminum cylinder whose surface has been electropolished.
(B1) first anodizing treatment step;
The mold is immersed in an oxalic acid aqueous solution having a concentration of 0.02 M and a liquid temperature of 20 ° C., and is processed at an applied voltage of 10 V and a processing time of 120 s.
(C1) first etching treatment step;
Next, the substrate is immersed in an aqueous phosphoric acid solution having a concentration of 1.0 M and a liquid temperature of 20 ° C., and is treated at a treatment time of 300 s.
(B2) second anodizing treatment step;
The process is performed under the same conditions as in the step (B1) except that the applied voltage is changed to 20V.
(C2) a second etching process step;
Next, processing is performed under the same conditions as in the first etching processing step.
(B3) Third anodizing treatment step;
The process is performed under the same conditions as in the step (B1) except that the applied voltage is changed to 60V.
(C3) Third etching treatment step;
Next, processing is performed under the same conditions as in the first etching processing step.
(B4) Fourth anodizing treatment step;
The applied voltage is changed to 10 V, and processing is performed under the same conditions as in the step (B1).
(C4) Fourth etching treatment step);
Next, processing is performed under the same conditions as in the first etching processing step.

  The process of each process is performed in the above order to obtain a mold having on the surface a micropore group corresponding to the microprojection group 4G including the multimodal microprojections 4M and the single-peak microprojections 4S as shown in FIG. Can do.

Note that {(B) step → (C) step} _N, above is merely one example, the desired maximum projection distance Dmax, the average projection height Have, in multimodal all microprotrusions 4 Each condition is appropriately adjusted according to the ratio of the microprotrusions 4M and the single-peak microprotrusions 4S.

<< Microprojection imparting layer 5 >>
The microprojection imparting layer 5 is a layer that imparts the microprojections 4 to the opaque substrate 1. Specifically, the microprojection imparting layer 5 has the antireflection fine unevenness forming region 2 </ b> A formed on the opaque substrate 1 by the antireflection fine unevenness 3 having the microprojection group 4 </ b> G that is an aggregate of a plurality of microprojections 4. It is a layer to be applied.
The microprojection imparting layer 5 is preferably colorless and transparent. This is because the display of the same pattern is visually recognized regardless of the observation conditions as in the case of the conventional colored pattern layer 6 regardless of whether it is colored or opaque.
In the present invention, when the antireflection fine unevenness 3 can be directly formed on the opaque substrate 1 without any other layer, the microprojection imparting layer 5 is omitted and the antireflection property is provided on the opaque substrate. The fine irregularities 3 may be directly formed.

In the present embodiment, the microprojection imparting layer 5 includes a microprojection forming layer 5A, a forming base material layer 5B using the microprojection forming layer 5A as a base material at the time of formation, and the forming base material layer 5B. Therefore, it is composed of a bonding layer 5 </ b> C for bonding the microprojection providing layer 5 to one surface 1 a of the opaque substrate 1.
In the present invention, the microprojection imparting layer 5 can be omitted when the microprojections 4 are formed on the surface of the opaque substrate 1 itself. For example, when producing the resin glass made of resin as the opaque substrate 1, the microprojections 4 are formed on the surface thereof, or the microprojections 4 are formed on the opaque substrate 1 by a method such as embossing.

  Hereinafter, the microprojection forming layer 5A, the forming base material layer 5B, and the bonding layer 5C employed in the present embodiment will be described.

  In the present embodiment, as the microprojection imparting layer 5, microprojections are formed on one side of the polyester resin film as the forming base layer 5B by the 2P method (photopolymer method) using an ultraviolet curable resin and a mold. The pressure-sensitive adhesive film obtained by forming the layer 5A and forming the acrylic pressure-sensitive adhesive layer as the bonding layer 5C on the other surface of the forming base material layer 5B was cut into the shape and size of the target pattern. A thing was used.

[Microprojection forming layer 5A]
The microprojection forming layer 5A is a layer having the microprojections 4 on its surface. The microprojection forming layer 5A is not particularly limited as long as it is a material that can form the microprojections 4. For example, an ionizing radiation curable resin that is cured by ionizing radiation such as ultraviolet rays or an electron beam, a thermosetting resin, or a thermoplastic resin. Such as resin. By forming the microprotrusions 4 using these resins and a mold, the microprotrusion forming layer 5A in which the microprotrusions 4 are formed on the surface of the resin layer of these resins can be formed.
A known method can be appropriately employed as the molding method. For example, the 2P method can be used for the ionizing radiation curable resin, and the hot press method (embossing) can be used for the thermosetting resin. As the thermoplastic resin, a hot press method, an injection molding method, an extrusion molding method, or the like can be used.

[Forming substrate layer 5B]
As the base material layer 5B for formation, a resin film can be typically used, but there is no particular limitation as long as it has mechanical strength. As the resin of the resin film, for example, a resin such as a polyester resin, an acrylic resin, a polycarbonate resin, a cellulose resin, and a polyolefin resin can be used.
The forming base material layer 5B can be omitted if the microprojection forming layer 5A is formed by an injection molding method or an extrusion molding method.

[Junction layer 5C]
The bonding layer 5 </ b> C is a layer for bonding the microprojection imparting layer 5 to the opaque substrate 1. For the bonding layer 5C, an adhesive layer, an adhesive layer, or the like is used. For these, a pressure-sensitive adhesive such as acrylic, polyester, or chicone or an adhesive can be used. The bonding layer 5C can be omitted when the microprojection forming layer 5A or the forming base layer 5B has adhesiveness, or when the opaque substrate 1 has adhesiveness.

<< Difference between opaque board 10 and display board 20 >>
A state in which the opaque plate 10 is used for a specific application, such as wall-mounted art described later, and functions as the specific application is referred to as a display board 20. That is, the opaque plate 10 is in a state before being used for its application, for example, stored in a warehouse before sale, displayed as a product, and used after sale. This is the state before being attached.
The content displayed on the display board 20 is a simple pattern, a character having a meaning as information such as a message to a human being, a graphic such as a logo mark, or a combination thereof.
And the display board 20 displays by the pattern by the reflected light intensity difference in the surface of the side which has the anti-reflective fine unevenness formation area | region 2A of the opaque board 10. FIG.

<Deformation>
The opaque plate 10 and the display plate 20 of the present invention can take various forms other than the above-described forms. Some of them will be described below.

[Colored pattern layer 6]
In the present invention, the opaque plate 10 and the display plate 20 can further have a colored pattern layer 6. The sectional view of FIG. 9 shows an example of the opaque plate 10 and the display plate 20 having the colored pattern layer 6. FIG. 9A and FIG. 9B both show an example in which the colored pattern layer 6 is provided on one surface 1a of the opaque substrate 1 on the side having the antireflection fine unevenness forming region 2A. .

  In the embodiment shown in FIG. 9A, the antireflection fine unevenness forming region 2A is formed only on the surface of the colored pattern layer 6, and the pattern of the colored pattern layer 6 is the antireflection fine unevenness forming region 2A. It is a form example which coincides with the pattern and overlaps each other in plan view. In this embodiment, since the pattern of the antireflection fine unevenness formation region 2A and the pattern of the colored pattern layer 6 are the same, the pattern of the antireflection fine unevenness formation region 2A (glossy) depends on the illumination conditions or the observation conditions. Although it is not invisible, it is not visible, but the appearance of the reflected light intensity pattern is superimposed on the pattern by the colored pattern layer 6 depending on the observation conditions of the anti-reflective fine unevenness formation region 2A itself. It becomes possible to do.

  In the embodiment shown in FIG. 9B, the antireflection fine unevenness forming region 2A and the colored pattern layer 6 formed in a pattern are formed so that there is no overlapping portion in plan view. The pattern of the layer 6 and the pattern of the antireflection fine unevenness forming region 2A do not coincide with each other, and different patterns can be expressed. The colored pattern layer 6 displays a constantly visible pattern, and the antireflection fine unevenness formation region 2A formed in a pattern changes a visible state and an invisible state depending on illumination conditions or incident light conditions. Can be displayed.

  The colored pattern layer 6 can be formed by a conventional method such as printing of a colored ink or attaching a colored adhesive sheet cut into a pattern shape. The colored pattern layer 6 may be transparent, opaque, or not depending on the intended display content.

  The colored pattern layer 6 may be either a single layer or two or more layers.

As described above, by adopting a form having the colored pattern layer 6 as well, a pattern by the colored pattern layer 6 can be displayed in addition to the pattern by the antireflection fine unevenness forming region 2A. The display by the colored pattern layer 6 can provide a pattern that can be visually recognized at all times as long as it has light, regardless of the illumination conditions and the observation position.
For example, if an outdoor landscape image is expressed by the colored pattern layer 6, the display board 20 can be used for a pseudo-window.

[Other layers]
In the present invention, the opaque plate 10 or the display plate 20 can appropriately include layers other than those described above.

  For example, it is a functional layer for imparting a predetermined function to the entire surface on the side where the microprojections 4 are not formed. Examples of the functional layer include a colored layer for coloring in a predetermined color, a dew condensation preventing layer, a contamination preventing layer, and an electromagnetic wave shielding layer. A known layer can be used for these. By these functional layers, the functions possessed by the functional layers can be imparted.

[Replaceable microprojection imparting layer 5]
In the antireflection fine unevenness forming region 2A, a weak adhesive layer can be used for the bonding layer 5C of the microprojection imparting layer 5 for forming this. As a result, the pattern of the antireflection fine unevenness forming region 2A can be easily replaced as a pattern that can be pasted, and can be used in various ways.

<Application>
The use of the opaque plate 10 and the display plate 20 according to the present invention is not particularly limited as long as the application of the pattern-shaped antireflection effect for visible light by the minute protrusions 4 can be utilized.

  Therefore, the use of the opaque board 10 and the display board 20 according to the present invention is, for example, a wall of a building such as a house, a store, an office, a school, a hospital or a clinic, a ceiling, a door, a partition, a window partition, and a wall art. Or guides, advertisements, boards for various information displays, posters, calendars installed on part or all of the walls, ceilings, doors, partitions, windows, bulkheads of vehicles such as cars, trains, ships, airplanes, etc. It is used for wall arts, plate materials used for show windows and product display boxes in stores, exhibition windows and display boxes for museum exhibits, and interior decorations such as wall hanging arts, posters and hanging shafts.

<3> Display system 100
The display system according to the present invention is a display system including at least the above-described display board 20 and a light source that illuminates the display board 20 with visible light.
FIG. 10 is a perspective view showing a basic configuration of the display system 100 according to the present invention. A display system according to the present invention will be described below as an embodiment for this basic configuration.
In the figure, the display panel 20 is formed by laminating a colorless and transparent biaxially stretched polyethylene terephthalate (PET) film having a smooth surface with Rz = 10 nm on one surface of a black (light-absorbing) polyester resin plate. And a microprojection imparting layer 5 having a layer structure shown in FIG. 1C is cut out and pasted on a part of one surface (PET film side surface) of FIG. It has a pattern-shaped antireflection fine unevenness formation region 2A, and the surface other than the formation region 2A is formed as a smooth antireflection fine unevenness formation region 2B. The incident light Li from the light source 30 composed of an EL (electroluminescence) emitter that emits white light with a uniform luminance distribution over the entire surface, which is disposed obliquely above the surface having the formation region 2A, is formed in the formation region 2A. In this portion, the light passes through the microprojection imparting layer 5 without being reflected and is absorbed by the opaque substrate 1. On the other hand, incident light is reflected and reflected light Lr on the surface of the non-formation region 2B, and the display plate 20 is observed in the direction of specular reflection light from the light source 30 on the display plate 20. The pattern reaches the observer O, and the pattern of the formation area 2A is visually recognized as a dark pattern in the background of the glossy surface of the light source light of the surrounding non-formation area 2B (white). .

  Hereinafter, components and the like constituting the display system 100 will be described.

<< Display board 20 >>
Since the display board 20 has already been described above, further description is omitted here.

<< Light source 30 >>
The light source 30 is not particularly limited as long as the light source 30 can irradiate visible light onto the surface of the display plate 20 on which the antireflection fine unevenness forming region 2A is formed. Incandescent light bulbs, halogen lamps, fluorescent lamps, LED (light emitting diode) light sources, EL (electroluminescent) light sources, and the like.
The light source 30 may be a liquid crystal display panel, a plasma display panel, an electroluminescent panel, a projector, or the like as an image display panel that can display a variable pattern by itself. These image display panels may display a moving image, a still image, or a color including any white color that is plain and has no pattern. By using the image display panel as the light source 30, the display plate 20 is irradiated with light corresponding to these display contents, and more complicated display contents can be obtained.
What is necessary is just to install the position which arrange | positions the light source 30 in the position according to the visual effect obtained by the display system 100. FIG.
The light source 30 may have directivity like a spotlight. The light source 30 having directivity can make the display stand out particularly in a dark place such as at night.
At least one light source 30 is installed, but a plurality of light sources 30 may be installed adjacent to each other or separated from each other.

《Visual effects》
FIG. 11 is a diagram illustrating a difference in a state in which the observer O is visually recognized when the light source 30 is turned off and when the light source 30 is turned on as an example of the visual effect obtained by the display system 100. In addition, when the light source 30 is turned off, other light sources that supply light that can be incident as specular reflection light on the eyes of the observer O are in an environment that does not include natural light and artificial light sources.
First, when the light source 30 is turned off, there is no light Li from the light source 30 as shown in FIG. 11A, so that the light that is regularly reflected from the antireflection fine unevenness forming region 2A to the observer O. Of course, there is no regular reflection from the anti-reflective fine unevenness non-formation region 2B. Therefore, the observer O cannot see the pattern of the formation region 2A. The display board 20 appears as a solid black board.
On the other hand, when the light source 30 is turned on, as shown in FIG. 11B, the observer O cannot see the reflected light of the light Li only in the formation region 2A, and the specular reflection light from the light source 30 only in the non-formation region 2B. The white reflected light Lr becomes visible. Therefore, only when the light source 30 is turned on, the observer O visually recognizes the pattern of the formation region 2A in black in the entire white light source image in which the light Li from the light source 30 is reflected on the surface of the display plate 20. Is done.

Next, the difference in appearance depending on the position of the observer O will be described. As shown in FIG. 11C, the pattern of the reflected light of the light Li from the light source 30 in which the pattern of the antireflection fine unevenness forming region 2A is cut out as described in FIG. The light source 30 installed at the position is visible only to the viewer O on the right side of the drawing at a position where it can be visually recognized as specularly reflected light. The observer O on the left side of the drawing in a position where the light source 30 cannot be viewed with regular reflection cannot see the hollowed pattern of the formation region 2A. Conversely, the light source 30 is installed at a predetermined position where the observer O can see the hollowed pattern of the formation region 2 by the regular reflection light of the light Li from the light source 30.
Thus, the pattern of the formation region 2A can be made visible or invisible depending on whether the light source 30 is turned on / off, the illumination condition depending on the installation position, and the position of the observer O.
As a result, a visual effect can be obtained in which a visually recognized pattern can be changed depending on the illumination condition, the observation position, or the illumination condition and the observation position, regardless of the display panel having many restrictions.

[Visual effects indoors]
12A and 12B are diagrams showing an embodiment when the display system 100 according to the present invention is applied indoors. FIG. 12A is a perspective view and FIG. 12B is a plan view. FIG. 13 is a diagram illustrating indoor visual effects obtained by the display system 100 shown in FIG.

A display system 100 shown in FIG. 12 schematically shows an indoor state partitioned by a wall 81 from the outdoors. A wall-hanging art 82 is installed on a part of the wall 81, and this wall-hanging art 82 is a wall-hanging comprising the display board 20 having the antireflection fine unevenness forming region 2A and the antireflection fine unevenness forming region 2B as described above. An art body 83 is fixed to the frame 84. The formation area 2A and the non-formation area 2B of the display panel 20 face the indoor side. Further, the planar light source 30 is installed on the upper wall 81 in the drawing orthogonal to the wall 81 on which the wall-mounted art 82 is installed. In addition, a ceiling illumination 31 for illuminating the interior is installed on the ceiling.
On the floor 85, a dining table 86 and a chair 87 surrounding the dining table 86 are installed as a guest seat 88. The space on the light source 30 side of the floor 85 is a hallway 89, and the direction on the right side of the drawing is the exit direction.

The light L1 and the light L2 that have been regularly reflected by hitting the anti-reflective fine unevenness non-forming region 2B on the display panel 20 used as the wall-mounted art 82 reach the table 86. On the other hand, of the light from the light source 30, the light that hits the formation area 2 </ b> A on the display panel 20 used as the wall-hanging art 82 is not specularly reflected and does not reach the table 86. Therefore, from the audience seat 88, the pattern of the formation area 2A is based on the same principle described in the description of FIGS. 10 and 11, and the background of the glossy surface in which the light source light color of the surrounding non-formation area 2B is colored. It is visually recognized as a dark pattern. In the drawing, in order to facilitate understanding, the light L1 and the light L2 are drawn on the upper surface of the table 86. However, the light reaches the eye position of the customer sitting on the chair 87 with respect to the table 86.
Therefore, as can be clearly seen from the plan view of FIG. 12B, the light hitting the display board 20 from the light source 30 reaches the chair 87 of the passenger seat 88 but does not reach the corridor 89. That is, the wall-mounted art 82 can be seen as a solid black plate entirely from the observer located in the direction of the exit or the corridor 89.
Although not shown, the light from the ceiling illumination 31 reaches the floor 85 when the light is specularly reflected by hitting the non-formation region 2B of the display board 20 used as the wall-mounted art 82. Not reach. In other words, the ceiling lighting 31 does not affect the visual effect of the wall-mounted art 82 (one form of the display board) (the wall-mounted art 82 is arranged as such).

In such a display system 100, as shown in FIG. 13, the wall-mounted art 82 was seen when the light source 30 was turned off and turned on, when the ceiling light 31 was turned off and turned on, and in the seats 88 and the hallway 89. A visual effect that looks different from time to time is obtained.
In FIG. 13, the light source 30 is described as “irradiation light source”.

<When the ceiling light 31 is on and the light source 30 is on>
From the side of the passenger seat 88, the pattern of the antireflection fine unevenness forming region 2A can be seen. The planar shape of the light source 30 can also be seen.
From the corridor 89 side, the formation area 2A is not visible, and only the frame 84 of the wall-mounted art 82 can be seen. However, the rectangular planar shape of the light source 30 cannot be seen.
<When the ceiling light 31 is on and the light source 30 is off>
From both the passenger seat 88 side and the corridor 89 side, the formation area 2A cannot be seen, and only the frame 84 of the wall-mounted art 82 can be seen. Of course, the planar shape of the light source 30 cannot be seen.

<When the ceiling light 31 is turned off and the light source 30 is turned on>
From the side of the passenger seat 88, the pattern of the antireflection fine unevenness forming region 2A can be seen, and the frame 84 of the wall-mounted art 82 cannot be seen. However, the planar shape of the light source 30 can be seen.
From the corridor 89 side, the formation area 2A cannot be seen, and the frame 84 of the wall hanging art 82 cannot be seen. Further, the planar shape of the light source 30 cannot be seen.
<When the ceiling light 31 is off and the light source 30 is off>
Both the formation area 2A and the frame 84 of the wall-mounted art 82 are not visible from both the passenger seat 88 side and the corridor 89 side. Of course, the planar shape of the light source 30 cannot be seen.

<Pseudo landscape painting with colored pattern layer 6>
In FIG. 13, the landscape image is also indicated by a one-dot chain line for the visual effect when the landscape image is formed by the colored pattern layer 6 and the wall-mounted art 82 functions as a pseudo window. When the ceiling light 31 is turned on, a landscape image can be seen from both the passenger seat 88 and the corridor 89 in both cases where the light source 30 is turned on and off, but when the ceiling light 31 is turned off, either the light source 30 is turned on or off. In this case, the landscape image cannot be seen from both the passenger seat 88 and the corridor 89.

<Overview of visual effects>
As described above, in this embodiment, when the light source 30 is turned on when the ceiling illumination 31 is turned on and off, the position of the seat 88 where the customer is set in advance in a state where the wall-mounted art 82 is illuminated by the light source 30. It is possible to observe the pattern displayed by the antireflection fine unevenness forming region 2A on the wall-mounted art 82 for the first time when it arrives at. However, when the ceiling lighting 31 is turned on, a normal field of view can be obtained in addition to this, and the entire wall-mounted art 82 can be observed. If the wall-mounted art body 83 has a normal pattern such as a ground pattern, The pattern can be observed.
Therefore, it is possible to give visual effects that are different in appearance when the wall hanging art 82 is viewed in the lighting conditions by the light source 30 and the ceiling lighting 31 and the passenger seat 88 and the corridor 89 to the passenger in the passenger seat.
For this reason, it can be expected that the interest of the passengers in the audience seat is fresh and sustainable.

As described above, in the display system 100 of the present invention, for example, when the display board 20 is the wall-hanging art 82, the specific target person position and the line-of-sight direction with respect to the wall-hanging art 82 are set. A combination is set so that the positional relationship between the ground pattern of the opaque substrate 1 of the wall-mounted art 82 and the pattern of the colored pattern layer 6 and the pattern of the anti-reflective fine unevenness formation region 2 </ b> A may give the subject some interest. Is desirable.
Furthermore, when installing the light source 30 for projection so as to cover the entire surface of the wall-mounted art 82 or the pattern of the formation area 2A, the light source 30 is usually a simple indoor illumination, preferably a surface that illuminates the display object. Illumination, spotlights, or a combination of these may be used.

<Deformation>
The display system 100 of the present invention can take various forms other than the above-described forms. Some of them will be described below.

[Plural display boards 20]
In the embodiment, the number of the display plate 20 and the light source 30 that allows the regular reflected light to reach the observer to be noticed is one. However, in the present invention, a plurality of display boards 20 or light sources 30 may be installed in one room. By using a plurality, a more complicated display is possible.

<Application>
The display system 100 according to the present invention can be applied to various applications. For example, walls, ceilings, doors, partitions, opaque windows, fake windows, bulkheads, wall art, or automobiles, trains, ships, aircraft, etc. for buildings such as houses, stores, offices, schools, hospitals or clinics Boxes used for vehicle walls, ceilings, doors, partitions, opaque windows, artificial windows, partition walls, wall art, store windows and product display boxes, exhibition windows and display boxes for museum exhibits, etc. It is used for interior decorations such as wall hanging arts, posters, hanging shafts, etc., which are provided on a wall surface in a room such as a material or a building or a vehicle.
Examples of uses include the use of directing audience seats by visual effects that change the display according to lighting conditions and observation positions, such as artificial windows and wall-mounted art at restaurants.

DESCRIPTION OF SYMBOLS 1 Opaque board | substrate 1a One surface 2A Antireflection fine unevenness formation area 2B Antireflection fine unevenness formation area 3 Antireflection fine unevenness 4 Microprotrusion 4g Groove 4G Microprotrusion group 4GHL High and low microprotrusion group 4H High altitude microprotrusion 4L Low altitude microprotrusions 4M Multimodal microprotrusions 4S Monomodal microprotrusions 5 Microprotrusion imparting layer 5A Microprotrusion forming layer 5B Formation base layer 5C Bonding layer 6 Colored pattern layer 10 Opaque plate 20 Display plate 30 Light source 31 Ceiling illumination 40 Conventional display board 81 Wall 82 Wall-mounted art 83 Wall-mounted art main body 84 Frame 85 Floor 86 Dining table 87 Chair 88 Guest seat 89 Corridor 100 Display system Dmax Maximum inter-protrusion distance Li light Lr Reflected light O Observer λmax Maximum wavelength of visible light

Claims (6)

On one surface of the opaque substrate, there is an antireflection fine unevenness formation region formed in a pattern, and an antireflection fine unevenness non-formation region that is a region other than the antireflection fine unevenness formation region,
The antireflection fine unevenness forming region has antireflection fine unevenness on the one surface of the opaque substrate,
The antireflective fine unevenness non-formation region has a smooth surface on the one surface of the opaque substrate,
The antireflection fine irregularities are formed by a group of microprojections that are an assembly of a plurality of microprojections,
The maximum protrusion distance Dmax of the minute protrusions is Dmax ≦ λmax with respect to the maximum wavelength λmax of visible light.
Opaque board.     The group of microprojections includes a group of microprojections having a non-constant altitude, and includes a low altitude microprojection having a relatively low altitude and a high altitude microprojection having a relatively higher altitude than the low altitude microprojection. The opaque plate according to claim 1, wherein the low-altitude microprotrusions comprise a group of high-low microprojections surrounded by the high-altitude microprotrusions.   The anti-reflective fine irregularities include, as the fine protrusions, multi-peak micro protrusions having a plurality of vertices at the top, and the multi-peak micro protrusions are each apexes formed by radial grooves formed on the top. The opaque plate according to claim 1, wherein the opaque plate is divided into two.   The opaque board in any one of Claims 1-3 which has a colored pattern layer on said one surface of the said opaque board | substrate.   The display board which displays by the pattern of the reflected light intensity difference in the surface of the side which has the said antireflection fine unevenness formation area | region of the opaque board in any one of Claims 1-4.   A display system comprising: the display plate according to claim 5; and a light source that irradiates visible light onto a surface of the display plate having the antireflection fine unevenness forming region.