JP2014090110A - Wiring board manufacturing method - Google Patents

Wiring board manufacturing method Download PDF

Info

Publication number
JP2014090110A
JP2014090110A JP2012239964A JP2012239964A JP2014090110A JP 2014090110 A JP2014090110 A JP 2014090110A JP 2012239964 A JP2012239964 A JP 2012239964A JP 2012239964 A JP2012239964 A JP 2012239964A JP 2014090110 A JP2014090110 A JP 2014090110A
Authority
JP
Japan
Prior art keywords
insulating sheet
conductor
wiring
resin film
paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012239964A
Other languages
Japanese (ja)
Other versions
JP5881173B2 (en
Inventor
Seiichi Takami
征一 高見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera SLC Technologies Corp
Original Assignee
Kyocera SLC Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera SLC Technologies Corp filed Critical Kyocera SLC Technologies Corp
Priority to JP2012239964A priority Critical patent/JP5881173B2/en
Publication of JP2014090110A publication Critical patent/JP2014090110A/en
Application granted granted Critical
Publication of JP5881173B2 publication Critical patent/JP5881173B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Abstract

PROBLEM TO BE SOLVED: To provide a wiring board having high insulation reliability between wiring conductors.SOLUTION: A wiring board manufacturing method comprises: forming a plurality of through holes 3a, 3b in insulation sheets 1a, 1b; subsequently filling the through holes 3a, 3b with conductive pastes 5a, 5b so as to protrude from both sides of the insulation sheets 1a, 1b; subsequently transferring and embedding wiring conductors 6a, 6b in both sides of the insulation sheets 1a so as to cover the conductive paste 5a; subsequently transferring and embedding a wiring conductor 6c on one side of the insulation sheet 1b so as to cover the conductive paste 5b and stacking the other surface of the insulation sheet 1b on one surface of the insulation sheet 1a; subsequently hardening the insulation sheets 1a, 1b and the conductive pastes 5a, 5b. A sum of heights of both ends of the conductive paste 5a, which protrude from both surfaces of the insulation sheet 1 is set to be smaller than a sum of heights of both ends of the conductive paste 5b, which protrude from the insulation sheet 1b.

Description

本発明は、半導体集積回路素子等の半導体素子を搭載するために用いられる配線基板の製造方法に関するものである。   The present invention relates to a method of manufacturing a wiring board used for mounting a semiconductor element such as a semiconductor integrated circuit element.

半導体集積回路素子等の半導体素子を搭載するための配線基板の製造方法として、配線導体の形成に転写方法を用いたものがある。   As a method of manufacturing a wiring board for mounting a semiconductor element such as a semiconductor integrated circuit element, there is a method using a transfer method for forming a wiring conductor.

このような配線基板の製造方法における従来の例を図7〜図10を基に説明する。先ず、図7(a)に示すように、絶縁シート11aと、樹脂フィルム12a・12bとを準備する。絶縁シート11aは、厚みが30〜200μm程度、幅および長さがそれぞれ20〜60cm程度の長方形であり、耐熱繊維の束を縦横に織ってシート状にした耐熱繊維基材に未硬化の熱硬化性樹脂組成物を含浸させた後、乾燥あるいは半硬化状態としたものである。また、樹脂フィルム12a・12bは、厚みが10〜30μm程度であり、例えばポリエチレンテレフタレート等の熱可塑性樹脂から成るフィルムが用いられる。   A conventional example of such a method of manufacturing a wiring board will be described with reference to FIGS. First, as shown to Fig.7 (a), the insulating sheet 11a and resin film 12a * 12b are prepared. The insulating sheet 11a is a rectangle having a thickness of about 30 to 200 μm, a width and a length of about 20 to 60 cm, respectively. The resin composition is impregnated and then dried or semi-cured. The resin films 12a and 12b have a thickness of about 10 to 30 μm, and a film made of a thermoplastic resin such as polyethylene terephthalate is used.

次に、図7(b)に示すように、絶縁シート11aの上下両主面に樹脂フィルム12a・12bを、図示しない粘着層を介して剥離可能に貼着する。次に、図7(c)に示すように、上下面に樹脂フィルム12a・12bが貼着された絶縁シート11aに複数の貫通孔13aを形成する。貫通孔13aの形成は、上下に樹脂フィルム12a・12bが貼着された絶縁シート11aを図示しない平坦な吸着テーブル上に載置するとともに、その上面側からレーザ光を照射することにより行われる。このとき上面側の樹脂フィルム12b上には、貫通孔13aの開口部に樹脂フィルム12bの一部が溶けてできたリング状の突起14が形成される。   Next, as shown in FIG.7 (b), resin film 12a * 12b is stuck to the upper and lower main surfaces of the insulating sheet 11a so that peeling is possible through the adhesive layer which is not shown in figure. Next, as shown in FIG.7 (c), the several through-hole 13a is formed in the insulating sheet 11a by which resin film 12a * 12b was stuck on the upper and lower surfaces. The through-hole 13a is formed by placing the insulating sheet 11a with the resin films 12a and 12b attached on the top and bottom on a flat suction table (not shown) and irradiating laser light from the upper surface side. At this time, a ring-shaped protrusion 14 formed by melting a part of the resin film 12b in the opening of the through hole 13a is formed on the resin film 12b on the upper surface side.

次に、図8(a)に示すように、樹脂フィルム12a・12bおよび絶縁シート11aを連通する貫通孔13a内に導体ペースト15aを充填する。貫通孔13a内に導体ペースト15aを充填するには、上面側の樹脂フィルム12b上に導体ペースト15aを供給するとともに、その上を硬質ゴム製のスキージを導体ペースト15aを掻きながら摺動させることにより充填する方法が採用される。このとき、貫通孔13a内に充填された導体ペースト15aは、突起14の高さまで充填される。   Next, as shown in FIG. 8A, the conductive paste 15a is filled into the through holes 13a that connect the resin films 12a and 12b and the insulating sheet 11a. In order to fill the through hole 13a with the conductive paste 15a, the conductive paste 15a is supplied onto the resin film 12b on the upper surface side, and a squeegee made of hard rubber is slid on the conductive paste 15a while scraping the conductive paste 15a. A filling method is adopted. At this time, the conductor paste 15a filled in the through hole 13a is filled up to the height of the protrusions 14.

次に、図8(b)に示すように、絶縁シート11aの両主面から樹脂フィルム12a・12bを剥離して除去する。このとき、貫通孔13aに充填された導体ペースト15aは、樹脂フィルム12a・12bの厚みに応じた高さだけ絶縁シート11aの上下面から突出した状態となる。なお、絶縁シート11aの上面側に突出する導体ペースト15aは、突起14の高さ分がさらに高くなる。   Next, as shown in FIG.8 (b), resin film 12a * 12b is peeled and removed from both the main surfaces of the insulating sheet 11a. At this time, the conductor paste 15a filled in the through-hole 13a protrudes from the upper and lower surfaces of the insulating sheet 11a by a height corresponding to the thickness of the resin films 12a and 12b. In addition, the conductor paste 15a protruding to the upper surface side of the insulating sheet 11a further increases the height of the protrusion 14.

次に、図9(a)に示すように、別途、ポリエチレンナフタレート等の樹脂フィルムから成る支持フィルム17a・17bの一方の主面上に銅箔等の金属箔から成る配線導体16a・16bが剥離可能に貼着された転写シート18a・18bを準備する。この転写シート18a・18bの配線導体16a・16bは、支持フィルム17a・17bの一方の主面に銅箔等の金属箔を間に図示しない粘着材を介して貼着した後、その金属箔をフォトリソグラフィー技術により所定のパターンにエッチングすることにより形成される。配線導体16a・16bの厚みは5〜30μm程度である。   Next, as shown in FIG. 9A, wiring conductors 16a and 16b made of metal foil such as copper foil are separately provided on one main surface of support films 17a and 17b made of resin film such as polyethylene naphthalate. Transfer sheets 18a and 18b attached so as to be peelable are prepared. The wiring conductors 16a and 16b of the transfer sheets 18a and 18b are formed by attaching a metal foil such as a copper foil to one of the main surfaces of the support films 17a and 17b with an adhesive (not shown) between them, It is formed by etching into a predetermined pattern by a photolithography technique. The thickness of the wiring conductors 16a and 16b is about 5 to 30 μm.

次に、図9(b)に示すように、配線導体16a・16bが導体ペースト15aの端部を覆うようにして転写シート18a・18bを絶縁シート11aの上下面に重ねて上下からプレスすることにより配線導体16a・16bを絶縁シート11aに埋入した後、図9(c)に示すように、支持フィルム17a・17bを除去することにより、配線導体16a・16bを両面に転写する。   Next, as shown in FIG. 9B, the transfer sheets 18a and 18b are stacked on the upper and lower surfaces of the insulating sheet 11a and pressed from above and below so that the wiring conductors 16a and 16b cover the ends of the conductor paste 15a. After embedding the wiring conductors 16a and 16b in the insulating sheet 11a, as shown in FIG. 9C, the supporting films 17a and 17b are removed to transfer the wiring conductors 16a and 16b to both surfaces.

さらに、図10(a)に示すように、貫通孔13b内に導体ペースト15bが充填されている絶縁シート11bと、支持フィルム17cの一方の主面上に銅箔等の金属箔から成る配線導体16cが剥離可能に貼着された転写シート18cとを別途準備し、配線導体16a・16bが転写された絶縁シート11a上に配置する。なお、絶縁シート11bおよび導体ペースト15bは、絶縁シート11aおよび導体ペースト15aと同様の材料および同様の方法により形成されている。また、転写シート17cは、転写シート17a・17bと同様の材料および同様の方法により形成されている。   Further, as shown in FIG. 10 (a), a wiring conductor made of an insulating sheet 11b filled with a conductive paste 15b in a through hole 13b and a metal foil such as a copper foil on one main surface of a support film 17c. A transfer sheet 18c to which 16c is detachably attached is separately prepared and placed on the insulating sheet 11a to which the wiring conductors 16a and 16b are transferred. The insulating sheet 11b and the conductive paste 15b are formed by the same material and the same method as the insulating sheet 11a and the conductive paste 15a. The transfer sheet 17c is formed of the same material and the same method as the transfer sheets 17a and 17b.

次に、図10(b)に示すように、配線導体16bが導体ペースト15bの端部を覆うようにして絶縁シート11bを絶縁シート11a上に重ねるとともに、配線導体16cが導体ペースト15bの端部を覆うようにして転写シート18cを絶縁シート11b上に重ねて上下からプレスすることにより導体ペースト15bと配線導体16bとの間、絶縁シート11bと絶縁シート11aおよび配線導体16aとの間を密着させるとともに配線導体16cを絶縁シート11bに埋入する。   Next, as shown in FIG. 10B, the insulating sheet 11b is overlaid on the insulating sheet 11a so that the wiring conductor 16b covers the end of the conductive paste 15b, and the wiring conductor 16c is the end of the conductive paste 15b. The transfer sheet 18c is stacked on the insulating sheet 11b so as to cover the sheet, and pressed from above and below to closely contact the conductor paste 15b and the wiring conductor 16b, and between the insulating sheet 11b, the insulating sheet 11a, and the wiring conductor 16a. At the same time, the wiring conductor 16c is embedded in the insulating sheet 11b.

最後に、図10(c)に示すように、支持フィルム17cを除去することにより積層体を形成した後、この積層体を上下から加圧しながら加熱して絶縁シート11a・11bおよび導体ペースト15a・15bを熱硬化させることにより配線基板20が完成する。   Finally, as shown in FIG. 10 (c), after forming the laminate by removing the support film 17c, the laminate is heated while being pressed from above and below to insulate the sheets 11a and 11b and the conductor paste 15a. The wiring board 20 is completed by thermally curing 15b.

しかしながら、上述した方法によると、絶縁シート11bでは、その片面のみに配線導体16cが埋入されるものの、絶縁シート11aにおいては、その両面に配線導体16a・16bが埋入される。つまり、絶縁シート11bの導体ペースト15bは絶縁シート11bの上下面から突出した高さに加えて配線導体16cの1層分だけ圧縮されることになり、他方、絶縁シート11aの導体ペースト15aは絶縁シート11aの上下面から突出した高さに加えて配線導体16aおよび16bの2層分だけ圧縮されることになる。したがって、絶縁シート11aの導体ペースト15aの方が絶縁シート11bの導体ペースト15bより大きく圧縮されてしまい、貫通孔13a内に収容しきれない分の導体ペースト15aが絶縁シート11aの表面と配線導体16bとの間に押し広げられて配線導体16bの外側に食み出してしまいやすくなる。このような食み出しは、配線導体16b同士の間の電気的な絶縁信頼性を低下させてしまう。   However, according to the above-described method, in the insulating sheet 11b, the wiring conductor 16c is embedded only on one surface thereof, but in the insulating sheet 11a, the wiring conductors 16a and 16b are embedded on both surfaces thereof. That is, the conductor paste 15b of the insulating sheet 11b is compressed by one layer of the wiring conductor 16c in addition to the height protruding from the upper and lower surfaces of the insulating sheet 11b, while the conductor paste 15a of the insulating sheet 11a is insulated. In addition to the height protruding from the upper and lower surfaces of the sheet 11a, the wiring conductors 16a and 16b are compressed by two layers. Therefore, the conductor paste 15a of the insulating sheet 11a is compressed more greatly than the conductor paste 15b of the insulating sheet 11b, and the conductor paste 15a that cannot be accommodated in the through hole 13a becomes the surface of the insulating sheet 11a and the wiring conductor 16b. Between the wire conductor 16b and the wire conductor 16b. Such protrusions reduce the electrical insulation reliability between the wiring conductors 16b.

特開2010−109198号公報JP 2010-109198 A 特開2009−260263号公報JP 2009-260263 A

本発明は、絶縁シートに埋入された配線導体から導体ペーストが食み出すことを有効に防止して配線導体間の絶縁信頼性が高い配線基板を提供することを課題とする。   It is an object of the present invention to provide a wiring board having high insulation reliability between wiring conductors by effectively preventing the conductor paste from protruding from the wiring conductor embedded in the insulating sheet.

本発明の配線基板の製造方法は、未硬化の熱硬化性樹脂を含有する第1および第2の絶縁シートを準備する工程と、前記第1および第2の絶縁シートに複数の貫通孔を形成する工程と、前記貫通孔内に導体ペーストを前記第1および第2の絶縁シートの両面から突出するように充填する工程と、前記第1の絶縁シートの両面に前記導体ペーストを覆うようにして金属箔から成る配線導体を転写埋入する工程と、前記第2の絶縁シートの一方の面に前記導体ペーストを覆うようにして金属箔から成る配線導体を転写埋入するとともに該第2の絶縁シートの他方の面を前記第1の絶縁シートの一方の面に積層する工程と、前記第1および第2の絶縁シートならびに前記導体ペーストを硬化させる工程とを行なう配線基板の製造方法において、前記第1の絶縁シートの両面から突出する前記導体ペーストの両方の高さの和を、前記第2の絶縁シートの両面から突出する前記導体ペーストの両方の高さの和よりも小さいものとしておくことを特徴とするものである。   The method for manufacturing a wiring board according to the present invention includes a step of preparing first and second insulating sheets containing an uncured thermosetting resin, and a plurality of through holes formed in the first and second insulating sheets. A step of filling the through hole with a conductive paste so as to protrude from both sides of the first and second insulating sheets, and covering the conductive paste on both sides of the first insulating sheet. A step of transferring and embedding a wiring conductor made of a metal foil, and transferring and embedding the wiring conductor made of a metal foil so as to cover the conductor paste on one surface of the second insulating sheet; In the method for manufacturing a wiring board, comprising: laminating the other surface of the sheet on one surface of the first insulating sheet; and curing the first and second insulating sheets and the conductive paste. The sum of the heights of both of the conductor pastes protruding from both surfaces of one insulating sheet is set to be smaller than the sum of the heights of both of the conductor pastes protruding from both surfaces of the second insulating sheet. It is a feature.

本発明の配線基板によれば、両面に配線導体が転写埋入される第1の絶縁シートの両面から突出する導体ペーストの両方の高さの和を、片面に配線導体が転写埋入される第2の絶縁シートの両面から突出する導体ペーストの両方の高さの和よりも低いものとしておくことから、第1の絶縁シートの両面に導体ペーストを覆うようにして配線導体を転写埋入させた際に、第1の絶縁シートの導体ペーストが大きく圧縮されることを低減することができる。その結果、絶縁シートに埋入された配線導体から導体ペーストが食み出すことを有効に防止して配線導体間の絶縁信頼性が高い配線基板を提供することができる。   According to the wiring board of the present invention, the wiring conductor is transferred and embedded on one side with the sum of the heights of both conductor pastes protruding from both sides of the first insulating sheet on which the wiring conductor is transferred and embedded on both sides. Since the conductor paste protruding from both sides of the second insulating sheet is lower than the sum of both heights, the wiring conductor is transferred and embedded so as to cover the conductor paste on both sides of the first insulating sheet. In this case, it is possible to reduce the fact that the conductor paste of the first insulating sheet is greatly compressed. As a result, it is possible to effectively prevent the conductive paste from protruding from the wiring conductor embedded in the insulating sheet, and to provide a wiring board having high insulation reliability between the wiring conductors.

図1は、本発明の配線基板の製造方法の実施形態の一例を説明するための概略断面図である。FIG. 1 is a schematic cross-sectional view for explaining an example of an embodiment of a method for manufacturing a wiring board according to the present invention. 図2は、本発明の配線基板の製造方法の実施形態の一例を説明するための概略断面図である。FIG. 2 is a schematic cross-sectional view for explaining an example of an embodiment of a method for manufacturing a wiring board according to the present invention. 図3は、本発明の配線基板の製造方法の実施形態の一例を説明するための概略断面図である。FIG. 3 is a schematic cross-sectional view for explaining an example of an embodiment of a method for manufacturing a wiring board according to the present invention. 図4本発明の配線基板の製造方法の実施形態の一例を説明するための概略断面図である。4 is a schematic cross-sectional view for explaining an example of an embodiment of a method for manufacturing a wiring board of the present invention. 図5は、本発明の配線基板の製造方法の実施形態の一例を説明するための概略断面図である。FIG. 5 is a schematic cross-sectional view for explaining an example of an embodiment of a method for manufacturing a wiring board according to the present invention. 図6は、本発明の配線基板の製造方法の実施形態の一例を説明するための概略断面図である。FIG. 6 is a schematic cross-sectional view for explaining an example of an embodiment of a method for manufacturing a wiring board according to the present invention. 図7は、従来の配線基板の製造方法を説明するための概略断面図である。FIG. 7 is a schematic cross-sectional view for explaining a conventional method for manufacturing a wiring board. 図8は、従来の配線基板の製造方法を説明するための概略断面図である。FIG. 8 is a schematic cross-sectional view for explaining a conventional method for manufacturing a wiring board. 図9は、従来の配線基板の製造方法を説明するための概略断面図である。FIG. 9 is a schematic cross-sectional view for explaining a conventional method for manufacturing a wiring board. 図10は、従来の配線基板の製造方法を説明するための概略断面図である。FIG. 10 is a schematic cross-sectional view for explaining a conventional method for manufacturing a wiring board.

次に、本発明の配線基板の製造方法における実施形態の一例を添付の図1〜図6を基にして説明する。先ず、図1(a)に示すように、絶縁シート1aと樹脂フィルム2aおよび2bとを準備する。   Next, an example of an embodiment of the method for manufacturing a wiring board according to the present invention will be described with reference to FIGS. First, as shown in FIG. 1A, an insulating sheet 1a and resin films 2a and 2b are prepared.

絶縁シート1aは、耐熱繊維の束を縦横に織ってシート状にした耐熱繊維基材に未硬化の熱硬化性樹脂を含浸させた後、乾燥あるいは半硬化状態としたものであり、厚みが30〜200μm程度、幅および長さがそれぞれ20〜60cm程度の長方形である。耐熱繊維としては、例えばガラス繊維やアラミド繊維・全芳香族エステル繊維等が用いられる。また熱硬化性樹脂としては、例えばエポキシ樹脂やビスマレイミドトリアジン樹脂、アリル変性ポリフェニレンエーテル樹脂等が用いられる。   The insulating sheet 1a is obtained by impregnating an uncured thermosetting resin into a heat-resistant fiber base material obtained by weaving a bundle of heat-resistant fibers vertically and horizontally into a sheet shape, and then drying or semi-curing the sheet. It is a rectangle having a width of about 200 μm and a width and length of about 20-60 cm. Examples of the heat resistant fiber include glass fiber, aramid fiber, wholly aromatic ester fiber, and the like. As the thermosetting resin, for example, an epoxy resin, a bismaleimide triazine resin, an allyl-modified polyphenylene ether resin, or the like is used.

樹脂フィルム2aは、例えばポリエチレンテレフタレート等の耐熱性を有する熱可塑性樹脂から成り、厚みが5〜15μm程度である。また、樹脂フィルム2bは、2枚の樹脂樹脂フィルム2baと樹脂フィルム2bbとが剥離可能に積層された積層フィルムであり、樹脂フィルム2baの厚みが樹脂フィルム2aと同じ5〜15μm程度、樹脂フィルム2bbの厚みがそれよりも厚い20〜100μm程度である。樹脂フィルム2ba・2bbは、共にポリエチレンテレフタレート等の耐熱性を有する熱可塑性樹脂から成る。なお、樹脂フィルム2a・2bの絶縁シート1a側の表面には図示しない粘着層が被着されている。   The resin film 2a is made of a heat-resistant thermoplastic resin such as polyethylene terephthalate and has a thickness of about 5 to 15 μm. The resin film 2b is a laminated film in which two resin resin films 2ba and 2bb are detachably laminated, and the resin film 2ba has the same thickness as the resin film 2a, about 5 to 15 μm, and the resin film 2bb. Is about 20 to 100 μm thicker. The resin films 2ba and 2bb are both made of a heat-resistant thermoplastic resin such as polyethylene terephthalate. A pressure-sensitive adhesive layer (not shown) is attached to the surface of the resin films 2a and 2b on the insulating sheet 1a side.

次に、図1(b)に示すように、絶縁シート1aの下面に粘着層を介して樹脂フィルム2aを貼着するとともに絶縁シート1aの上面に粘着層を介して樹脂フィルム2bを貼着する。なお、この場合、樹脂フィルム2baと樹脂フィルム2bbとの間の密着力を、樹脂フィルム2baと絶縁シート1aとの間の密着力よりも弱いものとしておく。   Next, as shown in FIG. 1B, the resin film 2a is adhered to the lower surface of the insulating sheet 1a via an adhesive layer, and the resin film 2b is adhered to the upper surface of the insulating sheet 1a via an adhesive layer. . In this case, the adhesion force between the resin film 2ba and the resin film 2bb is set to be weaker than the adhesion force between the resin film 2ba and the insulating sheet 1a.

次に、図1(c)に示すように、樹脂フィルム2a・2bが貼着された絶縁シート1aに樹脂フィルム2bの側から複数の貫通孔3aを形成する。貫通孔3aの形成は、樹脂フィルム2a・2bが貼着された絶縁シート1aを図示しない平坦な吸着テーブル上に樹脂フィルム2aを下にして載置するとともに、その上面側からレーザ光を照射することにより行われる。このとき上面側の樹脂フィルム2bにおいては、貫通孔3aの開口部に上面側の樹脂フィルム2bbの一部が溶けてできたリング状の突起4aが形成される。   Next, as shown in FIG.1 (c), the some through-hole 3a is formed from the resin film 2b side in the insulating sheet 1a with which resin film 2a * 2b was stuck. The through-hole 3a is formed by placing the insulating sheet 1a on which the resin films 2a and 2b are adhered on a flat suction table (not shown) with the resin film 2a facing down and irradiating a laser beam from the upper surface side. Is done. At this time, in the resin film 2b on the upper surface side, a ring-shaped protrusion 4a formed by melting a part of the resin film 2bb on the upper surface side is formed in the opening of the through hole 3a.

次に、図2(a)に示すように、樹脂フィルム2bにおける下面側の樹脂フィルム2ba上から上面側の樹脂フィルム2bbを剥離して除去する。これにより絶縁シート1aの上面にはリング状の突起4aのない樹脂フィルム2baが残ることとなる。このとき、樹脂フィルム2baと樹脂フィルム2bbとの間の密着力が樹脂フィルム2baと絶縁シート1aとの間の密着力よりも弱いので、樹脂フィルム2ba上から樹脂フィルム2bbを剥離しても樹脂フィルム2baと絶縁シート1aとの間に剥離が起こることはなく、極めて容易かつ良好に樹脂フィルム2ba上から樹脂フィルム2bbを剥離することができる。   Next, as shown in FIG. 2A, the resin film 2bb on the upper surface side is peeled off from the resin film 2ba on the lower surface side in the resin film 2b. Thereby, the resin film 2ba without the ring-shaped protrusion 4a remains on the upper surface of the insulating sheet 1a. At this time, since the adhesive force between the resin film 2ba and the resin film 2bb is weaker than the adhesive force between the resin film 2ba and the insulating sheet 1a, even if the resin film 2bb is peeled off from the resin film 2ba, the resin film No peeling occurs between 2ba and the insulating sheet 1a, and the resin film 2bb can be peeled off from the resin film 2ba very easily and satisfactorily.

次に、図2(b)に示すように、絶縁シート1および樹脂フィルム2a・2baを連通する貫通孔3a内に導体ペースト5aを充填する。貫通孔3a内に導体ペースト5aを充填するには、上面側の樹脂フィルム2ba上に導体ペースト5aを供給するとともに、その上を硬質ゴム製のスキージを導体ペースト5aを掻きながら摺動させることにより充填する方法が採用される。このとき、上面側の樹脂フィルム2ba上には突起4aが残っていないので、樹脂フィルム2baの貫通孔3a内には樹脂フィルム2baの厚みに応じた分だけの導体ペースト5aが充填されることになる。   Next, as shown in FIG. 2B, a conductor paste 5a is filled into the through hole 3a that communicates the insulating sheet 1 and the resin films 2a and 2ba. In order to fill the through hole 3a with the conductor paste 5a, the conductor paste 5a is supplied onto the resin film 2ba on the upper surface side, and a squeegee made of hard rubber is slid on the conductor paste 5a while scraping the conductor paste 5a. A filling method is adopted. At this time, since the protrusion 4a does not remain on the resin film 2ba on the upper surface side, the conductor paste 5a corresponding to the thickness of the resin film 2ba is filled in the through hole 3a of the resin film 2ba. Become.

導体ペースト5aは、例えば錫と銀とビスマスと銅との合金から成る金属粉末とトリアリルシアヌレートやトリアリルイソシアヌレート、トリスエポキシプロピルイソシアヌレート、トリス(2−ヒドロキシエチル)イソシアヌレート等のトリアジン系熱硬化性樹脂とを含有している。そして、金属粉末同士の接触により導電性を呈する。なお、金属粉末の含有量は、導体ペースト5aの総量に対して、80〜95重量%が好ましい。金属粉末の含有量が80重量%より少ないと、トリアジン系熱硬化性樹脂により金属粉末同士の接続が妨げられ、導通抵抗が上昇してしまう傾向があり、95重量%を超えると、金属粉末およびトリアジン系熱硬化性樹脂を含有した導体ペーストの粘度が上がり過ぎて良好に充填ができない傾向にある。したがって、金属粉末の含有量は80〜95重量%が好ましい。   The conductive paste 5a is, for example, a metal powder made of an alloy of tin, silver, bismuth and copper and a triazine type such as triallyl cyanurate, triallyl isocyanurate, trisepoxypropyl isocyanurate or tris (2-hydroxyethyl) isocyanurate. Containing thermosetting resin. And electroconductivity is exhibited by the contact of metal powder. In addition, as for content of a metal powder, 80 to 95 weight% is preferable with respect to the total amount of the conductor paste 5a. When the content of the metal powder is less than 80% by weight, the connection between the metal powders is hindered by the triazine-based thermosetting resin, and the conduction resistance tends to increase. When the content exceeds 95% by weight, the metal powder and There is a tendency that the viscosity of the conductor paste containing the triazine-based thermosetting resin is so high that it cannot be satisfactorily filled. Therefore, the content of the metal powder is preferably 80 to 95% by weight.

次に、図2(c)に示すように、絶縁シート1aの両主面から樹脂フィルム2a・2baを剥離して除去する。このとき、樹脂フィルム2baの貫通孔3a内には、上述したように樹脂フィルム2baの厚みに応じた分だけの導体ペースト5aが充填されているので、導体ペースト5aは樹脂フィルム2a・2baの厚みに応じた分だけ絶縁シート1aの上下面から突出した状態となる。なおこのとき、樹脂フィルム2a・2baの厚みが5μm未満であると、絶縁シート1aの主面から突出する導体ペースト5aの高さが低いものとなって、後述するように、絶縁シート1aの両面に導体ペースト5aの端部を覆うように配線導体6a・6bを積層する際に、導体ペースト5aと配線導体6a・6bとの密着が弱いものとなる危険性が高くなり、逆に15μmを超えると、絶縁シート1aの主面から突出する導体ペースト5aの高さが高いものとなって、絶縁シート1aの表面に導体ペースト5aの端部を覆うように配線導体6a・6bを積層する際に、導体ペースト5aの突出部が横に大きく潰れて配線導体6a・6bからはみ出してしまう危険性が高くなる。したがって、樹脂フィルム2a・2baの厚みは5〜15μmの範囲が好ましい。   Next, as shown in FIG.2 (c), resin film 2a * 2ba is peeled and removed from both main surfaces of the insulating sheet 1a. At this time, since the through-hole 3a of the resin film 2ba is filled with the conductor paste 5a corresponding to the thickness of the resin film 2ba as described above, the conductor paste 5a has the thickness of the resin films 2a and 2ba. It will be in the state which protruded from the upper and lower surfaces of the insulating sheet 1a by the part according to this. At this time, if the thickness of the resin films 2a and 2ba is less than 5 μm, the height of the conductor paste 5a protruding from the main surface of the insulating sheet 1a is low, and as will be described later, both surfaces of the insulating sheet 1a When the wiring conductors 6a and 6b are laminated so as to cover the end portions of the conductive paste 5a, there is a high risk that the adhesion between the conductive paste 5a and the wiring conductors 6a and 6b is weak, and conversely exceeds 15 μm. When the conductors 5a projecting from the main surface of the insulating sheet 1a have a high height, the wiring conductors 6a and 6b are stacked on the surface of the insulating sheet 1a so as to cover the end portions of the conductor paste 5a. In addition, there is a high risk that the protruding portion of the conductor paste 5a is largely crushed laterally and protrudes from the wiring conductors 6a and 6b. Therefore, the thickness of the resin films 2a and 2ba is preferably in the range of 5 to 15 μm.

次に、図3(a)に示すように、別途、ポリエチレンナフタレート等の樹脂フィルムから成る支持フィルム7a・7bの一方の主面上に銅箔等の金属箔から成る配線導体6a・6bが剥離可能に貼着された転写シート8a・8bを準備する。この転写シート8a・8bの配線導体6a・6bは、支持フィルム7a・7bの一方の主面に銅箔等の金属箔を間に図示しない粘着材を介して貼着した後、その金属箔をフォトリソグラフィー技術により所定のパターンにエッチングすることにより形成される。配線導体6a・6bの厚みは5〜30μm程度である。   Next, as shown in FIG. 3A, wiring conductors 6a and 6b made of metal foil such as copper foil are separately provided on one main surface of support films 7a and 7b made of resin film such as polyethylene naphthalate. Transfer sheets 8a and 8b attached so as to be peelable are prepared. The wiring conductors 6a and 6b of the transfer sheets 8a and 8b are formed by attaching a metal foil such as a copper foil to one of the main surfaces of the support films 7a and 7b with an adhesive material (not shown) between them. It is formed by etching into a predetermined pattern by a photolithography technique. The thickness of the wiring conductors 6a and 6b is about 5 to 30 μm.

次に、図3(b)に示すように、絶縁シート1aの上に転写シート8a・8bの配線導体6a・6bを導体ペースト5aの端部を覆うように重ねてプレスすることにより積層した後、図3(c)に示すように、支持フィルム7a・7bを除去することにより、配線導体6a・6bを転写する。このとき、導体ペースト5aは絶縁シート1の表面から樹脂フィルム2a・2baの厚みに応じた適正な高さだけ突出した状態となっていたので、導体ペースト5aが配線導体6a・6bからはみ出すことが有効に防止される。   Next, as shown in FIG. 3 (b), the wiring conductors 6a and 6b of the transfer sheets 8a and 8b are stacked on the insulating sheet 1a by overlapping and pressing so as to cover the ends of the conductive paste 5a. As shown in FIG. 3C, the wiring films 6a and 6b are transferred by removing the support films 7a and 7b. At this time, since the conductor paste 5a protrudes from the surface of the insulating sheet 1 by an appropriate height according to the thickness of the resin films 2a and 2ba, the conductor paste 5a may protrude from the wiring conductors 6a and 6b. Effectively prevented.

さらに、図4(a)に示すように、絶縁シート1bと樹脂フィルム2c・2dとを別途準備する。絶縁シート1bは、上述した絶縁シート1aと同様の材料および大きさである。また、樹脂フィルム2c・2dは、上述した樹脂フィルム2aと同様の材料であり、厚みが10〜30μm程度でる。   Furthermore, as shown to Fig.4 (a), the insulating sheet 1b and resin film 2c * 2d are prepared separately. The insulating sheet 1b has the same material and size as the insulating sheet 1a described above. The resin films 2c and 2d are made of the same material as the resin film 2a described above, and have a thickness of about 10 to 30 μm.

次に、図4(b)に示すように、絶縁シート1bの上下両主面に樹脂フィルム2b・2cを、図示しない粘着層を介して剥離可能に貼着する。次に、図4(c)に示すように、上下面に樹脂フィルム2c・2dが貼着された絶縁シート1bに複数の貫通孔3bを形成する。貫通孔3bの形成は、上下に樹脂フィルム2c・2dが貼着された絶縁シート1bを図示しない平坦な吸着テーブル上に載置するとともに、その上面側からレーザ光を照射することにより行われる。このとき上面側の樹脂フィルム2d上には、貫通孔3bの開口部に樹脂フィルム2dの一部が溶けてできたリング状の突起4bが形成される。   Next, as shown in FIG. 4B, the resin films 2b and 2c are detachably attached to the upper and lower main surfaces of the insulating sheet 1b through an adhesive layer (not shown). Next, as shown in FIG.4 (c), the several through-hole 3b is formed in the insulating sheet 1b by which resin film 2c * 2d was stuck on the upper and lower surfaces. The through-hole 3b is formed by placing the insulating sheet 1b with the resin films 2c and 2d attached on the top and bottom on a flat suction table (not shown) and irradiating laser light from the upper surface side. At this time, a ring-shaped protrusion 4b formed by melting a part of the resin film 2d at the opening of the through hole 3b is formed on the resin film 2d on the upper surface side.

次に、図5(a)に示すように、樹脂フィルム2c・2dおよび絶縁シート11bを連通する貫通孔3b内に導体ペースト5bを充填する。貫通孔3b内に導体ペースト5bを充填するには、上述した導体ペースト5aと同様の方法が用いられる。このとき、貫通孔3b内に充填された導体ペースト5bは、突起4bの高さまで充填される。   Next, as shown in FIG. 5A, the conductive paste 5b is filled into the through hole 3b that communicates the resin films 2c and 2d and the insulating sheet 11b. In order to fill the through-hole 3b with the conductor paste 5b, the same method as the above-described conductor paste 5a is used. At this time, the conductor paste 5b filled in the through hole 3b is filled up to the height of the protrusion 4b.

次に、図5(b)に示すように、絶縁シート1bの両主面から樹脂フィルム2c・2dを剥離して除去する。このとき、貫通孔3bに充填された導体ペースト5bは、樹脂フィルム2c・2dの厚みに応じた高さだけ絶縁シート1bの上下面から突出した状態となる。なお、絶縁シート1bの上面側に突出する導体ペースト5bは、突起4bの高さ分がさらに高くなる。したがって、絶縁シート1bの上下面から突出する導体ペースト5bの両方の高さの和は、絶縁シート1aの上下面から突出する導体ペースト5aの両方の高さの和よりも大きいものとなる。   Next, as shown in FIG. 5B, the resin films 2c and 2d are peeled off and removed from both main surfaces of the insulating sheet 1b. At this time, the conductor paste 5b filled in the through hole 3b is in a state of protruding from the upper and lower surfaces of the insulating sheet 1b by a height corresponding to the thickness of the resin films 2c and 2d. In addition, the conductor paste 5b protruding to the upper surface side of the insulating sheet 1b further increases the height of the protrusion 4b. Therefore, the sum of both heights of the conductor paste 5b protruding from the upper and lower surfaces of the insulating sheet 1b is larger than the sum of both heights of the conductor paste 5a protruding from the upper and lower surfaces of the insulating sheet 1a.

さらに、図6(a)に示すように、支持フィルム7cの一方の主面上に銅箔等の金属箔から成る配線導体6cが剥離可能に貼着された転写シート8cを別途準備し、配線導体6a・6bが転写された絶縁シート1上に、導体ペースト5bが充填された絶縁シート1bを挟んで配置する。なお、転写シート8cは、転写シート8a・8bと同様の材料および同様の方法により形成されている。また、絶縁シート1bは、導体ペースト5bの突出高さが高い方を絶縁シート1a側に向ける。   Further, as shown in FIG. 6 (a), a transfer sheet 8c is prepared separately in which a wiring conductor 6c made of a metal foil such as a copper foil is detachably attached to one main surface of the support film 7c. The insulating sheet 1b filled with the conductive paste 5b is disposed on the insulating sheet 1 to which the conductors 6a and 6b are transferred. The transfer sheet 8c is formed of the same material and the same method as the transfer sheets 8a and 8b. Moreover, the insulating sheet 1b directs the one where the protrusion height of the conductor paste 5b is higher to the insulating sheet 1a side.

次に、図6(b)に示すように、配線導体6bが導体ペースト5bの端部を覆うようにして絶縁シート1bを絶縁シート1a上に重ねるとともに配線導体6cが導体ペースト5bの端部を覆うようにして転写シート8cを絶縁シート1b上に重ねて上下からプレスすることにより導体ペースト5bと配線導体6bとの間、絶縁シート1bと絶縁シート1aおよび配線導体6aとの間を密着させるとともに配線導体6cを絶縁シート1bに埋入する。このとき、導体ペースト5bは、絶縁シート1bの一方の面から突出する高さが突起4bの高さ分高くなっていることから、配線導体6cの埋入により十分に圧縮されて配線導体6b・6cと電気的に良好に接続される。また、導体ペースト5bは絶縁シート1bの上下面から突出した高さに加えて配線導体6cの1層分だけ圧縮されることから、導体ペースト5aの場合と比較してその圧縮量が大きくなることはない。したがって、導体ペースト5bが配線導体6b・6cから食み出すことはない。   Next, as shown in FIG. 6B, the insulating sheet 1b is overlaid on the insulating sheet 1a so that the wiring conductor 6b covers the end of the conductive paste 5b, and the wiring conductor 6c covers the end of the conductive paste 5b. The transfer sheet 8c is overlapped on the insulating sheet 1b so as to be covered and pressed from above and below to bring the conductor paste 5b and the wiring conductor 6b into close contact with each other and between the insulating sheet 1b, the insulating sheet 1a and the wiring conductor 6a. The wiring conductor 6c is embedded in the insulating sheet 1b. At this time, the height of the conductor paste 5b protruding from one surface of the insulating sheet 1b is increased by the height of the protrusion 4b. It is electrically connected to 6c. Further, since the conductor paste 5b is compressed by one layer of the wiring conductor 6c in addition to the height protruding from the upper and lower surfaces of the insulating sheet 1b, the amount of compression is larger than that of the conductor paste 5a. There is no. Therefore, the conductor paste 5b does not protrude from the wiring conductors 6b and 6c.

最後に、図6(c)に示すように、支持フィルム7cを除去することにより積層体を形成した後、この積層体を上下から加圧しながら加熱して絶縁シート1a・1bおよび導体ペースト5a・5bを熱硬化させることにより配線基板10が完成する。かくして本発明の配線基板の製造方法によれば、絶縁シート1a・1bに埋入された配線導体6a・6b・6cから導体ペースト5a・5bが食み出すことを有効に防止して配線導体6a・6b・6c間の絶縁信頼性が高い配線基板10を提供することができる。   Finally, as shown in FIG. 6 (c), after forming the laminated body by removing the support film 7c, the laminated body is heated while being pressed from above and below to insulate the insulating sheets 1a and 1b and the conductor paste 5a. The wiring board 10 is completed by thermosetting 5b. Thus, according to the method for manufacturing a wiring board of the present invention, the conductor pastes 5a and 5b are effectively prevented from protruding from the wiring conductors 6a, 6b and 6c embedded in the insulating sheets 1a and 1b. The wiring board 10 with high insulation reliability between 6b and 6c can be provided.

1a・1b 絶縁層
3a・3b 貫通孔
5a・5b 導体ペースト
6a・6b・6c 配線導体
1a, 1b Insulating layer 3a, 3b Through hole 5a, 5b Conductive paste 6a, 6b, 6c Wiring conductor

Claims (1)

未硬化の熱硬化性樹脂を含有する第1および第2の絶縁シートを準備する工程と、前記第1および第2の絶縁シートに複数の貫通孔を形成する工程と、前記貫通孔内に導体ペーストを前記第1および第2の絶縁シートの両面から突出するように充填する工程と、前記第1の絶縁シートの両面に前記導体ペーストを覆うようにして金属箔から成る配線導体を転写埋入する工程と、前記第2の絶縁シートの一方の面に前記導体ペーストを覆うようにして金属箔から成る配線導体を転写埋入するとともに該第2の絶縁シートの他方の面を前記第1の絶縁シートの一方の面に積層する工程と、前記第1および第2の絶縁シートならびに前記導体ペーストを硬化させる工程とを行なう配線基板の製造方法において、前記第1の絶縁シートの両面から突出する前記導体ペーストの両方の高さの和を、前記第2の絶縁シートの両面から突出する前記導体ペーストの両方の高さの和よりも小さいものとしておくことを特徴とする配線基板の製造方法。   A step of preparing first and second insulating sheets containing an uncured thermosetting resin, a step of forming a plurality of through holes in the first and second insulating sheets, and a conductor in the through holes The step of filling the paste so as to protrude from both surfaces of the first and second insulating sheets, and the transfer conductor embedding the wiring conductor made of metal foil so as to cover the conductor paste on both surfaces of the first insulating sheet And a step of transferring and embedding a wiring conductor made of a metal foil so as to cover the conductor paste on one surface of the second insulating sheet, and placing the other surface of the second insulating sheet on the first surface. In a method for manufacturing a wiring board, comprising a step of laminating on one surface of an insulating sheet and a step of curing the first and second insulating sheets and the conductive paste, the wiring sheet protrudes from both surfaces of the first insulating sheet. The sum of the heights of both of the conductor pastes is smaller than the sum of the heights of both of the conductor pastes protruding from both surfaces of the second insulating sheet. .
JP2012239964A 2012-10-31 2012-10-31 Wiring board manufacturing method Active JP5881173B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012239964A JP5881173B2 (en) 2012-10-31 2012-10-31 Wiring board manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012239964A JP5881173B2 (en) 2012-10-31 2012-10-31 Wiring board manufacturing method

Publications (2)

Publication Number Publication Date
JP2014090110A true JP2014090110A (en) 2014-05-15
JP5881173B2 JP5881173B2 (en) 2016-03-09

Family

ID=50791783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012239964A Active JP5881173B2 (en) 2012-10-31 2012-10-31 Wiring board manufacturing method

Country Status (1)

Country Link
JP (1) JP5881173B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114641122A (en) * 2020-12-16 2022-06-17 深南电路股份有限公司 Circuit board and preparation method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1084186A (en) * 1996-09-06 1998-03-31 Matsushita Electric Ind Co Ltd Manufacturing method of interconnection board and interconnection board
JP2002064270A (en) * 2000-08-17 2002-02-28 Matsushita Electric Ind Co Ltd Circuit board and its manufacturing method
JP2002344103A (en) * 2001-05-17 2002-11-29 Asahi Kasei Corp Multilayered sheet and via hole-filled double-sided board and via hole-filled double-sided printed board using the sheet
WO2006118141A1 (en) * 2005-04-28 2006-11-09 Matsushita Electric Industrial Co., Ltd. Multilayer wiring board and method for producing same
JP2010129909A (en) * 2008-11-28 2010-06-10 Kyocer Slc Technologies Corp Method of manufacturing wiring board

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1084186A (en) * 1996-09-06 1998-03-31 Matsushita Electric Ind Co Ltd Manufacturing method of interconnection board and interconnection board
JP2002064270A (en) * 2000-08-17 2002-02-28 Matsushita Electric Ind Co Ltd Circuit board and its manufacturing method
JP2002344103A (en) * 2001-05-17 2002-11-29 Asahi Kasei Corp Multilayered sheet and via hole-filled double-sided board and via hole-filled double-sided printed board using the sheet
WO2006118141A1 (en) * 2005-04-28 2006-11-09 Matsushita Electric Industrial Co., Ltd. Multilayer wiring board and method for producing same
JP2010129909A (en) * 2008-11-28 2010-06-10 Kyocer Slc Technologies Corp Method of manufacturing wiring board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114641122A (en) * 2020-12-16 2022-06-17 深南电路股份有限公司 Circuit board and preparation method thereof

Also Published As

Publication number Publication date
JP5881173B2 (en) 2016-03-09

Similar Documents

Publication Publication Date Title
KR102107037B1 (en) Printed circuit board and method of manufacturing the same
JP6009228B2 (en) Manufacturing method of electronic component built-in substrate
JP5093353B2 (en) Manufacturing method of component built-in module and component built-in module
US9807874B2 (en) Wiring substrate, component embedded substrate, and package structure
CN103188882B (en) A kind of circuit board and preparation method thereof
JPH1145955A (en) Device built-in multilayered printed circuit board and its manufacture
CA2947519A1 (en) Circuit board, power storage device, battery pack, and electronic device
JP2014130856A (en) Wiring board manufacturing method
JP5664475B2 (en) Semiconductor device
JP2014146650A (en) Wiring board and manufacturing method of the same
KR20180090941A (en) Manufacturing Method of Flexible Printed Circuit Board Using Temporary Bonding and De-bonding Adhesives
CN212752722U (en) Battery protection board and mobile terminal
JP5881173B2 (en) Wiring board manufacturing method
JP5198302B2 (en) Wiring board manufacturing method
JP4114629B2 (en) Component built-in circuit board and manufacturing method thereof
JP5585035B2 (en) Circuit board manufacturing method
JP2010129909A (en) Method of manufacturing wiring board
JP2014099577A (en) Method of manufacturing printed circuit board
JP2016207763A (en) Component build-in wiring board and manufacturing method therefor
JP2004200501A (en) Wiring board
JP2017208512A (en) Method for manufacturing wiring substrate, method for manufacturing light-emitting device by use thereof, wiring substrate, and light-emitting device arranged by use thereof
JP3924453B2 (en) WIRING BOARD AND ELECTRONIC DEVICE USING THE SAME
JP2004031814A (en) Wiring board and electronic device using the same
JP5859678B1 (en) Method for manufacturing printed wiring board
JP5430002B2 (en) Wiring board and manufacturing method thereof

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150601

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160120

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20160121

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160128

R150 Certificate of patent or registration of utility model

Ref document number: 5881173

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350